CN113035686B - Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device - Google Patents

Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device Download PDF

Info

Publication number
CN113035686B
CN113035686B CN202110233360.6A CN202110233360A CN113035686B CN 113035686 B CN113035686 B CN 113035686B CN 202110233360 A CN202110233360 A CN 202110233360A CN 113035686 B CN113035686 B CN 113035686B
Authority
CN
China
Prior art keywords
support body
electrode
needle
ion
helium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110233360.6A
Other languages
Chinese (zh)
Other versions
CN113035686A (en
Inventor
李华
杜晓霞
朱鸿成
曾鸿达
李明磊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guilin University of Electronic Technology
Original Assignee
Guilin University of Electronic Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guilin University of Electronic Technology filed Critical Guilin University of Electronic Technology
Priority to CN202110233360.6A priority Critical patent/CN113035686B/en
Publication of CN113035686A publication Critical patent/CN113035686A/en
Application granted granted Critical
Publication of CN113035686B publication Critical patent/CN113035686B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/105Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622Ion mobility spectrometry
    • G01N27/624Differential mobility spectrometry [DMS]; Field asymmetric-waveform ion mobility spectrometry [FAIMS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/0027Methods for using particle spectrometers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/0027Methods for using particle spectrometers
    • H01J49/0031Step by step routines describing the use of the apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

The application discloses an ion source, a FAIMS device and a method for improving resolution and sensitivity of the FAIMS device. The ion source comprises a first support body, a second support body and an air flow pipeline, wherein the first support body and the second support body are arranged at intervals to form an ion channel, the first support body is provided with a needle electrode, the second support body is provided with an annular electrode, and the tip end of the needle electrode extends into the annular electrode; the gas flow conduit is directed toward the tip of the needle electrode for introducing helium gas to the needle tip. An annular cavity surrounded by the annular electrode is used for introducing nitrogen. According to the ion source provided by the embodiment of the application, the helium environment is arranged around the tip end of the needle-shaped electrode, more ions are ionized in the helium environment, the ion concentration at the entrance of the migration zone is increased, and the ion signal intensity is increased along with the increase of the ion concentration. The ions with increased ionization are larger than the ions lost by the impact migration polar plate, so that the overall ion signal intensity is enhanced, and the resolution and the sensitivity of the high-field asymmetric waveform ion migration spectrum are improved at the same time.

Description

离子源、FAIMS装置及提高其分辨率和灵敏度的方法Ion source, FAIMS device and method for improving its resolution and sensitivity

技术领域technical field

本发明涉及化学检测技术领域,具体涉及离子源、FAIMS装置及提高其分辨率和灵敏度的方法。The invention relates to the technical field of chemical detection, in particular to an ion source, a FAIMS device and a method for improving its resolution and sensitivity.

背景技术Background technique

高场非对称波形离子迁移谱(FAIMS)是在离子迁移谱的基础上发展起来的一种快速化学检测技术,其机理是通过载气携带气态的化学物质进入离子源区域电离成带电的离子,电离后的离子在高低电场条件下由于离子迁移率的不同,可以进行分离,从而检测不同的物质。High-field asymmetric waveform ion mobility spectrometry (FAIMS) is a rapid chemical detection technology developed on the basis of ion mobility spectrometry. Its mechanism is to carry gaseous chemical substances into the ion source area through the carrier gas and ionize into charged ions. The ionized ions can be separated due to the difference in ion mobility under high and low electric field conditions, so as to detect different substances.

FAIMS装置中所用的载气一般为氮气,载气不同,FAIMS所对应的分辨率也不同,根据相关原理,在FAIMS装置中所用载气为氮气的基础上,在其中掺入质量较轻、体积较小的氦气,可以提高离子的运动振幅,从而提高分辨率。然而该种方式在提高分辨率的同时,带来了离子信号强度的减弱。The carrier gas used in the FAIMS device is generally nitrogen, and the resolution corresponding to FAIMS is also different for different carrier gases. Smaller helium, which increases the amplitude of ion motion, increases resolution. However, this method brings about the weakening of ion signal intensity while improving the resolution.

发明内容Contents of the invention

本申请实施例的目的在于提供一种离子源、FAIMS装置及提高其分辨率和灵敏度的方法,以解决现有技术中FAIMS装置分辨率和灵敏度无法均衡,在提高分辨率的同时,带来了离子信号强度的减弱的技术问题。The purpose of the embodiments of the present application is to provide an ion source, a FAIMS device and a method for improving its resolution and sensitivity, so as to solve the problem that the resolution and sensitivity of the FAIMS device in the prior art cannot be balanced, and while improving the resolution, it brings A technical problem with the reduction of ion signal strength.

为实现上述目的,本申请采用的技术方案是:In order to achieve the above object, the technical scheme adopted by the application is:

一种离子源,包括第一支撑体、第二支撑体和气流管道,第一支撑体和第二支撑体间隔设置形成离子通道,第一支撑体设有针状电极,第二支撑体设有环状电极,针状电极的尖端伸入环状电极内;气流管道指向针状电极的尖端,用于导入氦气至针尖。An ion source, comprising a first support body, a second support body and an air flow channel, the first support body and the second support body are arranged at intervals to form ion channels, the first support body is provided with needle electrodes, and the second support body is provided with The ring electrode, the tip of the needle electrode extends into the ring electrode; the gas flow pipe points to the tip of the needle electrode, and is used to introduce helium gas to the needle tip.

环状电极围绕的环状空腔,用于导入氮气。The annular cavity surrounded by the annular electrode is used to introduce nitrogen gas.

在其中一个实施例中,针状电极内部具有贯通至针尖的通孔形成气流管道。In one embodiment, the inside of the needle-shaped electrode has a through hole extending to the needle tip to form a gas flow channel.

在其中一个实施例中,环状空腔的直径为气流管道的直径的3~6倍,优选地,气流管道的直径为0.5~1mm,环状空腔的直径为3mm~6mm。In one embodiment, the diameter of the annular cavity is 3-6 times the diameter of the airflow duct, preferably, the diameter of the airflow duct is 0.5-1 mm, and the diameter of the annular cavity is 3 mm-6 mm.

在其中一个实施例中,针状电极与环状电极同心设置,且针状电极的尖端位于环状电极的轴线中部;In one of the embodiments, the needle electrode and the ring electrode are arranged concentrically, and the tip of the needle electrode is located in the middle of the axis of the ring electrode;

第二支撑体设有贯穿的安装孔,安装孔的孔壁环绕设有金属导电层形成环状电极,第二支撑体设有与环状空腔连通的进气管。The second supporting body is provided with a penetrating installation hole, and the hole wall of the installation hole is surrounded by a metal conductive layer to form an annular electrode, and the second supporting body is provided with an air intake pipe communicating with the annular cavity.

一种高场非对称波形离子迁移谱,包括具有一端开口的壳体,壳体的容纳腔设有迁移极板组、检测极板组和上述的离子源,离子通道朝向开口;A high-field asymmetric waveform ion mobility spectrometer, comprising a housing with an opening at one end, the accommodation chamber of the housing is provided with a migration plate set, a detection plate set and the above-mentioned ion source, and the ion channel faces the opening;

离子源、迁移极板组和检测极板组在远离开口的方向上由远及近依次设置。The ion source, the moving pole plate group and the detection pole plate group are arranged in order from far to near in the direction away from the opening.

在其中一个实施例中,壳体包括平行布置且间隔一定距离的两块绝缘板以及设置于绝缘板之间的侧板,侧板部分环绕绝缘板,在壳体形成开口;In one of the embodiments, the casing includes two insulating plates arranged in parallel and separated by a certain distance, and a side plate arranged between the insulating plates, the side plate partially surrounds the insulating plate and forms an opening in the casing;

离子源的第一支撑体和第二支撑体相对设置,且分布于不同的绝缘板;迁移极板组包括两个相对设置的迁移极板,两个迁移极板分布于不同的绝缘板;检测极板组包括两个相对设置的检测极板,两个检测极板分布于不同的绝缘板。The first support body and the second support body of the ion source are arranged oppositely, and are distributed on different insulating plates; the moving plate group includes two moving plates arranged oppositely, and the two moving plates are distributed on different insulating plates; The pole plate group includes two opposite detection pole plates, and the two detection pole plates are distributed on different insulating plates.

在其中一个实施例中,第一支撑体与相应的绝缘板为一体式结构,第二支撑体与相应的绝缘板为一体式结构。In one of the embodiments, the first support body and the corresponding insulation board are integrated, and the second support body and the corresponding insulation board are integrated.

在其中一个实施例中,两个迁移极板之间的距离为0.2mm~1mm,和/或两个检测极板之间的距离为0.2mm~1mm。In one embodiment, the distance between the two moving plates is 0.2mm˜1mm, and/or the distance between the two detecting plates is 0.2mm˜1mm.

一种提高高场非对称波形离子迁移谱的分辨率和灵敏度的方法,包括以下步骤:A method for improving the resolution and sensitivity of high-field asymmetric waveform ion mobility spectrometry, comprising the steps of:

采用上述的高场非对称波形离子迁移谱,在气流管道内通入氦气,在环状电极的环状空腔内通入氮气;其中,氦气的流量为氮气的流量的10~40%。Using the above-mentioned high-field asymmetric waveform ion mobility spectrometry, helium gas is passed into the gas flow pipeline, and nitrogen gas is passed into the ring-shaped cavity of the ring electrode; wherein, the flow rate of helium gas is 10-40% of the flow rate of nitrogen gas .

在其中一个实施例中,氦气的流量为0.25~1L/min,氮气的流量为1.5~2.25L/min。In one embodiment, the flow rate of helium is 0.25-1 L/min, and the flow rate of nitrogen is 1.5-2.25 L/min.

本申请实施例提供的离子源,当其用于高场非对称波形离子迁移谱时,由于针状电极具有气流管道,氦气从气流管道进入,使针状电极的尖端的周围是氦气环境,而氦气比氮气更容易电离,因此,随着氦气的加入,放电电流呈现增大趋势,说明在氦气的环境下有更多的离子被电离,迁移区入口处离子浓度增大,因此离子信号强度随离子浓度的增加而增加。由于氦气是一种比较轻的气体,在氮气中混合氦气之后离子在迁移区更容易撞击迁移极板而被损失掉,但由于电离增多的离子大于撞击迁移极板损失的离子,因此整体的离子信号强度增强,这样就同时提高了高场非对称波形离子迁移谱的分辨率和灵敏度。The ion source provided by the embodiment of the present application, when it is used for high-field asymmetric waveform ion mobility spectrometry, since the needle-shaped electrode has a gas flow channel, helium enters from the gas flow channel, so that the surrounding of the tip of the needle-shaped electrode is a helium environment , and helium is easier to ionize than nitrogen. Therefore, with the addition of helium, the discharge current tends to increase, indicating that more ions are ionized in the environment of helium, and the ion concentration at the entrance of the migration zone increases. Therefore, the ion signal intensity increases with the increase of ion concentration. Since helium is a relatively light gas, after mixing helium in nitrogen, the ions are more likely to hit the migration plate in the migration area and be lost, but because the ionized increased ions are greater than the ions lost by hitting the migration plate, the overall The ion signal intensity of the ion is enhanced, which improves the resolution and sensitivity of the high-field asymmetric waveform ion mobility spectrometry at the same time.

附图说明Description of drawings

为了更清楚地说明本申请实施例中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the accompanying drawings that need to be used in the descriptions of the embodiments or the prior art will be briefly introduced below. Obviously, the accompanying drawings in the following description are only for the present application For some embodiments, those of ordinary skill in the art can also obtain other drawings based on these drawings without paying creative efforts.

图1为本申请实施例提供的离子源的结构示意图;Fig. 1 is the structural representation of the ion source provided by the embodiment of the present application;

图2为本申请另一实施例提供的离子源的结构示意图;FIG. 2 is a schematic structural diagram of an ion source provided by another embodiment of the present application;

图3为本申请实施例提供的高场非对称波形离子迁移谱的爆炸结构示意图;Figure 3 is a schematic diagram of the explosion structure of the high-field asymmetric waveform ion mobility spectrum provided by the embodiment of the present application;

图4为本申请另一实施例提供的高场非对称波形离子迁移谱的结构示意图;Fig. 4 is a schematic structural diagram of a high-field asymmetric waveform ion mobility spectrum provided by another embodiment of the present application;

图5为图4的高场非对称波形离子迁移谱的爆炸结构示意图;Fig. 5 is a schematic diagram of the explosive structure of the high-field asymmetric waveform ion mobility spectrum in Fig. 4;

图6a-6d分别为不同氮气流速下添加氦气对FAIMS谱图的影响;Figures 6a-6d are the effects of adding helium on the FAIMS spectra at different nitrogen flow rates;

图7a-7d分别为不同氮气流速下添加氦气对补偿电压的影响;Figures 7a-7d show the effects of adding helium on the compensation voltage at different nitrogen flow rates;

图8a-8d分别为不同氮气流速下添加氦气对离子信号强度的影响;Figures 8a-8d show the effects of adding helium on ion signal intensity at different nitrogen flow rates;

图9a-9c为增加氦气对离子信号强度影响的分析,其中(9a)为放电电流,(9b)为起始放电电压,(9c)为电流(信号)值;Fig. 9a-9c is the analysis of increasing the influence of helium on the ion signal intensity, wherein (9a) is the discharge current, (9b) is the initial discharge voltage, and (9c) is the current (signal) value;

图10a-10b为不同气体流速下的FAIMS谱图,其中(10a)为纯氮气,(10b)为氮气+氦气;Figures 10a-10b are FAIMS spectra at different gas flow rates, wherein (10a) is pure nitrogen, and (10b) is nitrogen+helium;

图11为相同混合气体流速下氦气和氮气的FAIMS谱图比较;Fig. 11 is the FAIMS spectrum comparison of helium and nitrogen under the same mixed gas flow rate;

图12为添加不同气体的离子强度和分辨率;Figure 12 is the ion intensity and resolution of adding different gases;

图13a-13d分别为不同射频条件下添加He对FAIMS谱图的影响;Figures 13a-13d are the effects of adding He on the FAIMS spectrum under different radio frequency conditions;

图14a-14b为不同射频电压下的分辨率;其中(14a)为峰1的分辨率,(14b)为双峰分离度;Fig. 14a-14b is the resolution under different radio frequency voltages; Wherein (14a) is the resolution of peak 1, (14b) is the double-peak resolution;

图15a-15c为不同射频条件下氦气对离子信号强度的影响,其中(15a)为峰1,(15b)为峰2,(15c)为峰3。Figures 15a-15c show the effect of helium on ion signal intensity under different radio frequency conditions, where (15a) is peak 1, (15b) is peak 2, and (15c) is peak 3.

附图标记说明:Explanation of reference signs:

10.离子源;110.第一支撑体;120.第二支撑体;130.气流管道;111.针状电极;121.环状电极;122.安装孔;20.迁移极板组;30.检测极板组;40.壳体;210.迁移极板;310.检测极板;510.开口;410.绝缘板;420.侧板;411.上绝缘板;412.下绝缘板。10. Ion source; 110. First support body; 120. Second support body; 130. Airflow duct; 111. Needle electrode; 121. Ring electrode; 122. Installation hole; 20. Migration plate group; 30. Detecting plate group; 40. shell; 210. moving plate; 310. detecting plate; 510. opening; 410. insulating plate; 420. side plate; 411. upper insulating plate; 412. lower insulating plate.

具体实施方式Detailed ways

为了使本申请所要解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图及实施例,对本申请进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本申请,并不用于限定本申请。In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, not to limit the present application.

需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者间接在该另一个元件上。当一个元件被称为是“连接于”另一个元件,它可以是直接连接到另一个元件或间接连接至该另一个元件上。It should be noted that when an element is referred to as being “fixed” or “disposed on” another element, it may be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

需要理解的是,术语“长度”、“宽度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。It is to be understood that the terms "length", "width", "top", "bottom", "front", "rear", "left", "right", "vertical", "horizontal", "top" , "bottom", "inner", "outer" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the application and simplifying the description, rather than indicating or implying No device or element must have a particular orientation, be constructed, and operate in a particular orientation, and thus should not be construed as limiting the application.

此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" and "second" may explicitly or implicitly include one or more of these features. In the description of the present application, "plurality" means two or more, unless otherwise specifically defined.

申请人在注意到现有FAIMS装置中所用载气为氮气的基础上在其中掺入质量较轻、体积较小的氦气,存在提高分辨率的同时,带来了离子信号强度的减弱的问题之后,对FAIMS装置进行研究,进而发现虽然氦气掺杂可提高分辨率,但由于氦气的质量小,分子量低,使离子的运动振幅增大,碰撞到极板上湮没掉的离子数量增加,此外,扩散运动增大,也使离子产生损释,因此,提高分辨率的同时,带来了离子信号强度的减弱。The applicant noticed that the carrier gas used in the existing FAIMS device is nitrogen, and helium with lighter mass and smaller volume was added to it, which brought about the problem of weakening ion signal intensity while improving the resolution. After that, the FAIMS device was studied, and it was found that although helium doping can improve the resolution, due to the small mass and low molecular weight of helium, the movement amplitude of the ions increases, and the number of ions that collide with the polar plate and annihilates increases. , In addition, the increased diffusion movement also causes ion loss and release. Therefore, while the resolution is improved, the ion signal intensity is weakened.

基于申请人发现的上述问题,申请人对离子源的结构进行改进,下面对本申请实施例进行进一步描述。Based on the above problems discovered by the applicant, the applicant improved the structure of the ion source, and the following further describes the embodiments of the present application.

为了更好地理解本申请,下面结合图1至图5对本申请实施例进行描述。In order to better understand the present application, the following describes the embodiment of the present application with reference to FIG. 1 to FIG. 5 .

参照图1~2,本申请实施例提供一种离子源10,包括第一支撑体110、第二支撑体120和气流管道130,第一支撑体110和第二支撑体120间隔设置形成离子通道,第一支撑体110设有针状电极111,第二支撑体120设有环状电极121,针状电极111的尖端伸入环状电极121内;气流管道130指向针状电极111的尖端,用于导入氦气至针尖。1-2, the embodiment of the present application provides an ion source 10, including a first support body 110, a second support body 120 and a gas flow channel 130, the first support body 110 and the second support body 120 are arranged at intervals to form ion channels , the first support body 110 is provided with a needle-shaped electrode 111, the second support body 120 is provided with a ring-shaped electrode 121, and the tip of the needle-shaped electrode 111 extends into the ring-shaped electrode 121; the airflow duct 130 points to the tip of the needle-shaped electrode 111, Used to introduce helium gas to the needle tip.

可以理解的是,离子源10可包括具有至少一个开孔的外壳,第一支撑体110和第二支撑体120可为外壳的两相对的壁体。该开孔为离子源10产生的离子的流出孔。应用其他设备时,只要将开孔朝向离子目标区域即可,如在高场非对称波形离子迁移谱中,开孔朝向迁移极板组20、检测极板组30所在方向。It can be understood that the ion source 10 may include a housing with at least one opening, and the first support body 110 and the second support body 120 may be two opposite walls of the housing. The opening is an outflow hole for ions generated by the ion source 10 . When other devices are used, it is only necessary to direct the opening toward the ion target area. For example, in high-field asymmetric waveform ion mobility spectrometry, the opening faces the direction where the moving plate set 20 and the detecting plate set 30 are located.

当然,离子源10自身也可不设置外壳。当其应用于其他设备时,离子源10设置于其他设备的壳体40内,第一支撑体110、第二支撑体120和壳体40围合成形成离子流动的通道,同样的如在高场非对称波形离子迁移谱中,可合理布置离子源10的位置,使得离子流动的离子通道朝向迁移极板组20、检测极板组30所在方向。Certainly, the ion source 10 itself may not be provided with a casing. When it is applied to other equipment, the ion source 10 is arranged in the housing 40 of other equipment, and the first support body 110, the second support body 120 and the housing 40 are surrounded to form a channel for ion flow, the same as in high field In the asymmetric waveform ion mobility spectrometer, the position of the ion source 10 can be reasonably arranged so that the ion channel of the ion flow faces the direction where the migration plate set 20 and the detection plate set 30 are located.

环状电极121围绕的环状空腔,用于导入氮气。第一支撑体110和第二支撑体120相对设置,二者彼此间隔一定距离,如平行或呈一定角度设置。第一支撑体110和第二支撑体120之间的空间为离子通道,氮气和氦气电离产生的离子可沿第一支撑体110和第二支撑体120之间的空间流动。The annular cavity surrounded by the annular electrode 121 is used for introducing nitrogen gas. The first supporting body 110 and the second supporting body 120 are arranged opposite to each other, and they are spaced apart from each other by a certain distance, such as being arranged in parallel or at a certain angle. The space between the first support 110 and the second support 120 is an ion channel, and ions generated by ionization of nitrogen and helium can flow along the space between the first support 110 and the second support 120 .

第一支撑体110和第二支撑体120分别用于固定针状电极111和环状电极121。第一支撑体110和第二支撑体120其形状和尺寸无特殊要求,当然也可采用厚度相对较薄的板材,以便于安装相应电极。第一支撑体110和第二支撑体120可为绝缘材料,如PVC等。The first support body 110 and the second support body 120 are used to fix the needle electrode 111 and the ring electrode 121 respectively. The shape and size of the first support body 110 and the second support body 120 have no special requirements, and of course relatively thin plates may also be used to facilitate the installation of corresponding electrodes. The first support body 110 and the second support body 120 can be insulating materials, such as PVC and the like.

环状电极121可嵌入第二支撑体120内,如在第二支撑体120开设有贯通的环状空腔,腔壁环绕有电极材料,形成环状电极121。氮气源可与环状空腔连通,导入氮气。环状电极121也可延伸设置于第二支撑体120外,如第二支撑体120设有一突出于表面的中空筒体,中空筒体贯穿第二支撑体120,且远离第二支撑体120的端部环绕有电极材料,形成环状电极121。氮气源可与中空筒体连通,导入氮气。氮气源可通过导管与中空筒体连通。The ring electrode 121 can be embedded in the second support body 120 , for example, a through ring cavity is opened in the second support body 120 , and the cavity wall is surrounded by electrode material to form the ring electrode 121 . The nitrogen source can communicate with the annular cavity to introduce nitrogen. The annular electrode 121 can also be extended outside the second support body 120, such as the second support body 120 is provided with a hollow cylinder protruding from the surface, the hollow cylinder runs through the second support body 120, and is away from the second support body 120. The end is surrounded by electrode material to form a ring-shaped electrode 121 . The nitrogen source can be communicated with the hollow cylinder to introduce nitrogen. A source of nitrogen can communicate with the hollow cylinder through a conduit.

参照图1~2,针状电极111的尖端伸入环状电极121内。气流管道130一端与外界的氦气源连通,另一端指向针状电极111的尖端,将氦气导入至针状电极111的尖端附近。气流管道130可为金属管道,如钢管、铜管等,也可为非金属管道,如塑料管、橡胶管等。优选为非金属管,以减小对针状电极111和环状电极121之间放电的干扰。氦气导入至针状电极111的尖端附近,使得针状电极111的尖端的周围是氦气环境,而氦气比氮气更容易电离,因此,随着氦气的加入,放电电流呈现增大趋势。说明在氦气的环境下有更多的离子被电离,迁移区入口处离子浓度增大,因此离子信号强度随离子浓度的增加而增加。由于氦气是一种比较轻的气体,在氮气中混合氦气之后离子在迁移区更容易撞击迁移极板210而被损失掉,但由于电离增多的离子大于撞击迁移极板210损失的离子,因此整体的离子信号强度增强,这样就同时提高了高场非对称波形离子迁移谱的分辨率和灵敏度。Referring to FIGS. 1-2 , the tip of the needle electrode 111 protrudes into the ring electrode 121 . One end of the gas flow pipe 130 is connected with an external helium gas source, and the other end points to the tip of the needle-shaped electrode 111 , so that the helium gas is introduced to the vicinity of the tip of the needle-shaped electrode 111 . The airflow pipe 130 can be metal pipes, such as steel pipes, copper pipes, etc., or non-metal pipes, such as plastic pipes, rubber pipes, etc. It is preferably a non-metallic tube to reduce interference with the discharge between the needle electrode 111 and the ring electrode 121 . Helium gas is introduced into the vicinity of the tip of the needle-shaped electrode 111, so that the surrounding of the tip of the needle-shaped electrode 111 is a helium environment, and helium is more easily ionized than nitrogen. Therefore, with the addition of helium, the discharge current tends to increase . It shows that more ions are ionized in the environment of helium, and the ion concentration at the entrance of the migration region increases, so the ion signal intensity increases with the increase of ion concentration. Because helium is a relatively light gas, after mixing helium in nitrogen, ions are more likely to hit the migration plate 210 in the migration region and be lost, but because the ions increased by ionization are greater than the ions lost by hitting the migration plate 210, Therefore, the overall ion signal intensity is enhanced, which simultaneously improves the resolution and sensitivity of the high-field asymmetric waveform ion mobility spectrum.

参照图1,在其中一个实施例中,针状电极111内部具有贯通至针尖的通孔形成气流管道130。Referring to FIG. 1 , in one embodiment, the needle electrode 111 has a through hole extending to the needle tip to form a gas flow channel 130 .

在本实施例中,针状电极111为中空结构,贯通至针尖,气流管道130集成在针状电极111中部。针状电极111可为医用一次性无菌注射针头。远离针尖的一端与氦气连通,将氦气导入针尖处。氦气直接从针尖处流出,需要克服氮气的阻碍较小,在较低的流速下即可包围针尖,提供氦气氛围。氦气从针尖的端面流出,因而针尖周围的氦气浓度分布较为均匀。此外,气流管道130集成在针状电极111中部,整个装置集成度高,结构精简,体积减小。In this embodiment, the needle-shaped electrode 111 is a hollow structure that penetrates to the needle tip, and the gas flow channel 130 is integrated in the middle of the needle-shaped electrode 111 . The needle electrode 111 can be a medical disposable sterile injection needle. The end away from the needle tip is connected with helium gas, and the helium gas is introduced into the needle tip. The helium gas flows directly from the needle tip, and there is less resistance to overcome the nitrogen gas, and the needle tip can be surrounded at a lower flow rate to provide a helium atmosphere. Helium flows out from the end face of the needle tip, so the helium concentration distribution around the needle tip is relatively uniform. In addition, the airflow duct 130 is integrated in the middle of the needle electrode 111, the whole device has a high degree of integration, a simplified structure and a reduced volume.

优选地,气流管道130设置于针状电极111的轴心,针尖周围的氦气浓度分布更为均匀。Preferably, the gas flow channel 130 is arranged at the axis of the needle electrode 111, and the helium concentration distribution around the needle tip is more uniform.

参照图1,在其中一个实施例中,环状空腔的直径为气流管道130的直径的3~6倍,优选地,气流管道130的直径为0.5~1mm,环状空腔的直径为3mm~6mm。Referring to Fig. 1, in one of the embodiments, the diameter of the annular cavity is 3 to 6 times the diameter of the airflow duct 130, preferably, the diameter of the airflow duct 130 is 0.5 to 1 mm, and the diameter of the annular cavity is 3 mm ~6mm.

参照图1,在其中一个实施例中,针状电极111与环状电极121同心设置,且针状电极111的尖端位于环状电极121的轴线中部;第二支撑体120设有贯穿的安装孔,安装孔的孔壁环绕设有金属导电层形成环状电极121,第二支撑体120设有与环状空腔连通的进气管安装孔。Referring to FIG. 1 , in one embodiment, the needle electrode 111 and the ring electrode 121 are arranged concentrically, and the tip of the needle electrode 111 is located in the middle of the axis of the ring electrode 121; the second support body 120 is provided with a through mounting hole The hole wall of the installation hole is surrounded by a metal conductive layer to form an annular electrode 121, and the second support body 120 is provided with an air intake pipe installation hole communicating with the annular cavity.

第二支撑体120的壁体设置贯穿的安装孔,安装孔的孔壁环绕设有金属导电层形成环状电极121,环状电极121集成设置在第二支撑体120的壁体上,缩减环状电极121与第二支撑体120的总厚度,结构也更为精简。The wall of the second support body 120 is provided with a through installation hole, and the hole wall of the installation hole is surrounded by a metal conductive layer to form a ring electrode 121. The ring electrode 121 is integrated on the wall body of the second support body 120, reducing the ring size. The total thickness of the shape electrode 121 and the second support body 120 is reduced, and the structure is more simplified.

一种高场非对称波形离子迁移谱,参照图3~5,包括具有一端开口510的壳体40,壳体40的容纳腔设有迁移极板组20、检测极板组30和上述的离子源10,离子通道朝向开口510;离子源10、迁移极板组20和检测极板组30在远离开口510的方向上由远及近依次设置。A high-field asymmetric waveform ion mobility spectrometer, referring to FIGS. 3 to 5 , includes a housing 40 with an opening 510 at one end, and the accommodation chamber of the housing 40 is provided with a migration plate set 20, a detection plate set 30 and the above-mentioned ion mobility spectrometer. The source 10 and the ion channel are facing the opening 510 ; the ion source 10 , the transfer plate set 20 and the detection plate set 30 are arranged in sequence from far to near in the direction away from the opening 510 .

离子源10在壳体40的区域为电离区,迁移极板组20在壳体40的区域为迁移区,检测极板组30在壳体40的区域为检测区。The area of the ion source 10 in the shell 40 is the ionization area, the area of the transfer plate set 20 in the shell 40 is the transfer area, and the area of the detection plate set 30 in the shell 40 is the detection area.

离子源10包括针状电极111与环状电极121,样品气体在电离区被电离成带电离子之后,载气携带其进入迁移区。迁移极板组20包括两块相对设置的迁移极板210,两块迁移极板210可加有频率1MHz、占空比30%的高压非对称波和扫描范围为-13V~13V的补偿电压。在迁移区过滤掉不符合实验要求的带电离子后,其余离子到达检测区域,检测区域的包括两块相对设置的检测极板310,两块检测极板310上加有9V的电压,使离子能够偏转到达检测基板,从而被后续的微弱电流检测器检测到,并将检测到的微弱信号值上传到微处理器控制器。The ion source 10 includes a needle electrode 111 and a ring electrode 121. After the sample gas is ionized into charged ions in the ionization region, the carrier gas carries it into the migration region. The moving plate set 20 includes two moving plates 210 opposite to each other. The two moving plates 210 can be supplied with a high-voltage asymmetric wave with a frequency of 1 MHz and a duty ratio of 30% and a compensation voltage with a scanning range of -13V to 13V. After the charged ions that do not meet the experimental requirements are filtered out in the migration area, the rest of the ions reach the detection area. The detection area includes two opposite detection pole plates 310, and a voltage of 9V is added to the two detection pole plates 310, so that the ions can The deflection reaches the detection substrate and is detected by the subsequent weak current detector, and the detected weak signal value is uploaded to the microprocessor controller.

上述高场非对称波形离子迁移谱,由于采用了上述离子源10,电离增多的离子大于撞击迁移极板210损失的离子,因此整体的离子信号强度增强,这样就同时提高了高场非对称波形离子迁移谱的分辨率和灵敏度。For the above-mentioned high-field asymmetric waveform ion mobility spectrum, due to the use of the above-mentioned ion source 10, the ionization increased ions are greater than the ions lost by hitting the migration plate 210, so the overall ion signal strength is enhanced, thus improving the high-field asymmetric waveform at the same time. Resolution and sensitivity of ion mobility spectrometry.

在其中一个实施例中,参照图3~5,壳体40包括平行布置且间隔一定距离的两块绝缘板410以及设置于绝缘板410之间的侧板420,侧板420部分环绕绝缘板410,在壳体40形成开口510;离子源10的第一支撑体110和第二支撑体120相对设置,且分布于不同的绝缘板410;迁移极板组20包括两个相对设置的迁移极板210,两个迁移极板210分布于不同的绝缘板410;检测极板组30包括两个相对设置的检测极板310,两个检测极板310分布于不同的绝缘板410。In one of the embodiments, referring to FIGS. 3 to 5 , the housing 40 includes two insulating plates 410 arranged in parallel and spaced at a certain distance, and a side plate 420 disposed between the insulating plates 410 , the side plate 420 partially surrounds the insulating plate 410 , an opening 510 is formed in the casing 40; the first support body 110 and the second support body 120 of the ion source 10 are arranged oppositely, and are distributed on different insulating plates 410; the moving plate group 20 includes two moving moving plates arranged oppositely 210 , the two moving plates 210 are distributed on different insulating plates 410 ; the detecting plate group 30 includes two oppositely disposed detecting plates 310 , and the two detecting plates 310 are distributed on different insulating plates 410 .

两个迁移极板210可以是两块相对设置的敷铜电极,每块敷铜电极对应设置在一绝缘板410上。同样的,两个检测极板310可以是两块相对设置的敷铜电极,每块敷铜电极对应设置在一绝缘板410上。第一支撑体110固定在一绝缘板410上,第二支撑体120固定在另一绝缘板410上。The two transfer plates 210 may be two opposing copper-clad electrodes, and each copper-clad electrode is correspondingly arranged on an insulating plate 410 . Similarly, the two detection pole plates 310 may be two oppositely arranged copper-clad electrodes, and each copper-clad electrode is correspondingly arranged on an insulating plate 410 . The first supporting body 110 is fixed on an insulating board 410 , and the second supporting body 120 is fixed on another insulating board 410 .

在其中一个实施例中,参照图3~5,第一支撑体110与相应的绝缘板410为一体式结构,第二支撑体120与相应的绝缘板410为一体式结构。该设计将一绝缘板410作为第一支撑体110,另一绝缘板410作为第二支撑。整个装置的集成度更高,结构更为精简。In one embodiment, referring to FIGS. 3-5 , the first support body 110 and the corresponding insulating plate 410 are integrally structured, and the second support body 120 and the corresponding insulating plate 410 are integrally structured. In this design, one insulating plate 410 is used as the first supporting body 110, and the other insulating plate 410 is used as the second supporting body. The integration degree of the whole device is higher, and the structure is more streamlined.

在其中一个实施例中,参照图3~5,两个迁移极板210之间的距离为0.2mm~1mm,和/或两个检测极板310之间的距离为0.2mm~1mm。In one embodiment, referring to FIGS. 3-5 , the distance between the two moving plates 210 is 0.2 mm˜1 mm, and/or the distance between the two detecting plates 310 is 0.2 mm˜1 mm.

一种提高高场非对称波形离子迁移谱的分辨率和灵敏度的方法,包括以下步骤:A method for improving the resolution and sensitivity of high-field asymmetric waveform ion mobility spectrometry, comprising the steps of:

采用上述的高场非对称波形离子迁移谱,在气流管道130内通入氦气,在环状电极121的环状空腔内通入氮气;其中,氦气的流量为氮气的流量的10~40%。Using the above-mentioned high-field asymmetric waveform ion mobility spectrometry, helium gas is passed into the gas flow pipe 130, and nitrogen gas is passed into the annular cavity of the ring electrode 121; wherein, the flow rate of helium gas is 10-10% of the flow rate of nitrogen gas. 40%.

在其中一个实施例中,氦气的流量为0.25~1L/min,氮气的流量为1.5~2.25L/min。In one embodiment, the flow rate of helium is 0.25-1 L/min, and the flow rate of nitrogen is 1.5-2.25 L/min.

以下结合具体实施例对本申请的技术方案进行介绍。The technical solution of the present application will be introduced below in combination with specific embodiments.

一.实验装置1. Experimental device

FAIMS实验平台由进样模块(氦气单元和进样单元)、FAIMS装置、微弱电流检测器、电源模块、微处理器控制器以及谱图显示模块构成。实验使用的载气为高纯氮气和高纯氦气(广西瑞达化工科技有限公司生产,99.999%),流量计为D08-1F型流量显示仪和CS200A数字式气体质量流量控制器(北京七星华创电子股份有限公司生产),可测到的气体流量范围为0-5L min-1,调节精度为0.01L min-1;实验样品为未做处理的挥发性有机物乙醇(CH3CH2OH,西陇化工股份有限公司,99.7%),实验在常温常压下进行。The FAIMS experimental platform consists of a sampling module (helium unit and sampling unit), a FAIMS device, a weak current detector, a power supply module, a microprocessor controller and a spectrum display module. The carrier gas used in the experiment is high-purity nitrogen and high-purity helium (produced by Guangxi Ruida Chemical Technology Co., Ltd., 99.999%), and the flowmeter is D08-1F flow display instrument and CS200A digital gas mass flow controller (Beijing Qixing Huachuang Electronics Co., Ltd.), the measurable gas flow range is 0-5L min -1 , and the adjustment accuracy is 0.01L min -1 ; the experimental sample is untreated volatile organic ethanol (CH3CH2OH, Xilong Chemical Co., Ltd., 99.7%), the experiment was carried out at normal temperature and pressure.

将装有乙醇样品的小烧瓶放入样品池(高度4cm,直径3.5cm)中,整个样品单元由气管通过气动接口连接,通入载气氦气,使样品被氦气携带至FAIMS装置的电离区中。Put the small flask containing the ethanol sample into the sample cell (height 4cm, diameter 3.5cm), the entire sample unit is connected by a gas pipe through a pneumatic interface, and the carrier gas helium is passed through, so that the sample is carried by the helium to the ionization unit of the FAIMS device. in the district.

二.FAIMS装置的设计和制造2. Design and manufacture of FAIMS device

基于PCB的FAIMS装置结构示意图如图1所示,为便于描述,将两块绝缘板410定义为上绝缘板411和下绝缘板412。上绝缘板411和下绝缘板412采用PCB技术制作,绝缘板410之间采用PCB钎焊工艺密封。该装置在基于钎焊工艺的FAIMS系统板上面增加了氦气的通气装置,上绝缘板411和下绝缘板412尺寸大小分别为60mm×40mm和60mm×55mm,上绝缘板411和下绝缘板412之间放置0.2mm的垫片。上绝缘板411由直径1mm的孔以及两块敷铜电极构成,下绝缘板412由直径3mm的孔以及两块敷铜电极构成,两块敷铜电极(尺寸15mm×10mm和10mm×8mm)分别用来作为迁移区极板和检测极板310。The structural diagram of the PCB-based FAIMS device is shown in FIG. 1 , and for the convenience of description, two insulating plates 410 are defined as an upper insulating plate 411 and a lower insulating plate 412 . The upper insulating plate 411 and the lower insulating plate 412 are manufactured by PCB technology, and the insulating plates 410 are sealed by PCB brazing process. This device adds a helium ventilation device on the FAIMS system board based on the brazing process. The upper insulating plate 411 and the lower insulating plate 412 are 60mm×40mm and 60mm×55mm in size respectively, and the upper insulating plate 411 and the lower insulating plate 412 Place a 0.2mm spacer between them. The upper insulating plate 411 is composed of a hole with a diameter of 1 mm and two copper-clad electrodes, and the lower insulating plate 412 is composed of a hole with a diameter of 3 mm and two copper-clad electrodes. It is used as a transition zone plate and a detection plate 310 .

针-环放电结构用作离子源10,样品气体在电离区被电离成带电离子之后,载气携带其进入迁移区,迁移区上加有频率1MHz、占空比30%的高压非对称波和扫描范围为-13V~13V的补偿电压。在迁移区过滤掉不符合实验要求的带电离子后,其余离子到达检测区域,检测区域的偏转基板上加有9V的电压,使离子能够偏转到达检测基板,从而被后续的微弱电流检测器检测到,并将检测到的微弱信号值上传到微处理器控制器。The needle-ring discharge structure is used as the ion source 10. After the sample gas is ionized into charged ions in the ionization region, the carrier gas carries it into the migration region, where a high-voltage asymmetric wave with a frequency of 1 MHz and a duty ratio of 30% and The scanning range is -13V~13V compensation voltage. After the charged ions that do not meet the experimental requirements are filtered out in the migration area, the rest of the ions reach the detection area, and a voltage of 9V is applied to the deflection substrate in the detection area, so that the ions can be deflected and reach the detection substrate, so that they are detected by the subsequent weak current detector , and upload the detected weak signal value to the microprocessor controller.

三.空心针-环离子源3. Hollow needle-ring ion source

为了提高FAIMS的分辨率和灵敏度,设计了一种氦气氮气相对的通气结构,电离区域由针-环状电极构成。针状电极111是中空的,氦气从针状电极111的中空部分进入电离区,通过这种方式,氦气可以通过中空的针状电极111,使针尖被氦气包围,它可以增加尖端的放电电流,提高电离效率。针状电极111为医用一次性无菌注射针头,空心内径为0.26mm,外径为0.5mm,长度60mm,针的固定结构采用PLA聚乳酸材料通过3D打印而成,由上下两个直径为16mm的大圆柱通过高8mm,底面直径3mm小圆柱组合而成,在针的固定结构和上绝缘板411上设计直径1mm小孔用空心针通过,氦气从空心针通入,同时保证空心针处于环状电极121正中间。下级板3mm的孔上敷铜作为放电阳极,与上级板的空心针组合成为电离源,实验过程中,氮气携带样品从下绝缘板412的3mm的孔进入针-环电离源进行电离。为保证气密性,设计制作了材料为紫铜的氮气进样装置,装置由内外直径分别为16mm和10mm的圆柱构成,并通过气动接头,直接连接外径4mm的聚四氟乙烯管。In order to improve the resolution and sensitivity of FAIMS, a helium-nitrogen relative ventilation structure is designed, and the ionization region is composed of needle-ring electrodes. The needle electrode 111 is hollow, and helium enters the ionization region from the hollow part of the needle electrode 111. In this way, helium can pass through the hollow needle electrode 111, so that the needle tip is surrounded by helium, which can increase the Discharge current, improve ionization efficiency. The needle-shaped electrode 111 is a medical disposable sterile injection needle with a hollow inner diameter of 0.26mm, an outer diameter of 0.5mm, and a length of 60mm. The fixed structure of the needle is made of PLA polylactic acid material through 3D printing. The large cylinder is composed of small cylinders with a height of 8mm and a bottom diameter of 3mm. A small hole with a diameter of 1mm is designed on the needle fixing structure and the upper insulating plate 411 to pass through the hollow needle. Helium gas is passed through the hollow needle while ensuring that the hollow needle is in the The ring electrode 121 is right in the middle. The 3mm hole of the lower plate is coated with copper as the discharge anode, which is combined with the hollow needle of the upper plate to form an ionization source. During the experiment, nitrogen carries the sample from the 3mm hole of the lower insulating plate 412 into the needle-ring ionization source for ionization. In order to ensure airtightness, a nitrogen sampling device made of copper was designed and manufactured. The device is composed of cylinders with inner and outer diameters of 16mm and 10mm, respectively, and is directly connected to a PTFE tube with an outer diameter of 4mm through a pneumatic joint.

针状电极111通过6MΩ镇流电阻连接负直流高压电源的负极,其中镇流电阻用于限制放电回路电流并抑制火花放电,环状电极121通过1kΩ测试电阻连接负直流高压电源的地。在测试电阻两端加载示波器和万用表,用来得到针-环不对称电极放电产生的放电波形和放电电流,负直流高压电源(HB-F203-5AC)的范围为0~-20kV。The needle electrode 111 is connected to the negative pole of the negative DC high voltage power supply through a 6MΩ ballast resistor, wherein the ballast resistor is used to limit the discharge circuit current and suppress spark discharge, and the ring electrode 121 is connected to the ground of the negative DC high voltage power supply through a 1kΩ test resistor. Load an oscilloscope and a multimeter at both ends of the test resistor to obtain the discharge waveform and discharge current generated by the needle-ring asymmetrical electrode discharge. The negative DC high voltage power supply (HB-F203-5AC) ranges from 0 to -20kV.

四.实验结果4. Experimental results

4.1提高离子信号强度和分辨率4.1 Improve ion signal intensity and resolution

在放电电压-2kV,镇流电阻6M,射频电压300V,样品为乙醇的条件下,不同N2流量下加入0.2L min-1,0.3L min-1,0.5L min-1,1L min-1He时的He占比如表1所示。随着N2流量的增加,相同流量下的He占比降低,当N2,He均为1L min-1时,He占比达到最大,为50%,所以本实验中He占比的范围为0-50%,该范围考虑了He的击穿特性,为实验的安全范围。Under the conditions of discharge voltage -2kV, ballast resistance 6M, RF voltage 300V, and sample ethanol, add 0.2L min -1 , 0.3L min -1 , 0.5L min -1 , 1L min -1 at different N 2 flow rates The proportion of He when He is shown in Table 1. As the flow of N 2 increases, the proportion of He decreases under the same flow rate. When both N 2 and He are 1L min -1 , the proportion of He reaches the maximum, which is 50%. Therefore, the range of He proportion in this experiment is 0-50%, this range takes into account the breakdown characteristics of He, which is the safe range of the experiment.

表1不同氮气流量下的氦气比例Table 1 Helium ratio at different nitrogen flow rates

Figure SMS_1
Figure SMS_1

图6(a-d)分别为N2流量在1L min-1,1.5L min-1,2L min-1,2.5L min-1的条件下添加不同He比例的FAIMS谱图。由图可知,不同N2流量下增加He的比例能提高FAIMS谱图的分离能力且离子峰强度有所提高,一般认为偏置较大的补偿电压峰是单体峰,其次是二聚体峰,偏置最小的是聚合物峰,在此,三个峰被命名为峰1,峰1,峰3。以图6c为例,当N2流量为2L/min,He比例为9%,峰1离子信号强度达到最大,为33.45pA。He比例增加到20%,离子峰的个数由原来的两个变为三个。继续增加He比例到33%,信号强度虽然有下降的趋势,但还是较不加He时大了1.56倍,且三个峰分离越来越明显,说明随着He比例的增加,离子种类的分离效果越来越好且信号强度有所提高。Figure 6(ad) shows the FAIMS spectra of different He ratios added under the conditions of N 2 flow rate of 1L min -1 , 1.5L min -1 , 2L min -1 , and 2.5L min -1 . It can be seen from the figure that increasing the proportion of He under different N 2 flow rates can improve the separation ability of the FAIMS spectrum and the ion peak intensity has increased. It is generally believed that the offset voltage peak with a large offset is the monomer peak, followed by the dimer peak , the least biased is the polymer peak, where the three peaks are named peak 1, peak 1, and peak 3. Taking Figure 6c as an example, when the N 2 flow rate is 2 L/min and the He ratio is 9%, the peak 1 ion signal intensity reaches the maximum, which is 33.45 pA. The proportion of He increased to 20%, and the number of ion peaks changed from two to three. Continue to increase the He ratio to 33%, although the signal intensity has a downward trend, it is still 1.56 times larger than that without He, and the separation of the three peaks becomes more and more obvious, indicating that with the increase of the He ratio, the separation of ion species The effect is getting better and the signal strength has improved.

图7(a-d)为对应FAIMS谱图的补偿电压位置图,由图可知,随着He比例的增加,峰1、峰2、峰3的补偿电压位置也随之改变。以图7a为例,随着He比例的增加,峰1和峰2的位置向下偏移,而峰3的位置向上偏移,且峰1向下偏移的幅度大于峰2,这样使得三个峰之间的距离原来越大。Figure 7(a-d) is the compensation voltage position map corresponding to the FAIMS spectrum. It can be seen from the figure that as the proportion of He increases, the compensation voltage positions of peak 1, peak 2 and peak 3 also change. Taking Figure 7a as an example, as the proportion of He increases, the positions of peaks 1 and 2 shift downward, while the position of peak 3 shifts upward, and the magnitude of the downward shift of peak 1 is greater than that of peak 2, so that the three The distance between the two peaks becomes larger.

分辨率可以用单体峰的峰宽,不同峰之间的分离度或者三个峰之间补偿电压的差值来表示。补偿电压之间的距离越大,分辨率越高,反之则分辨率逐渐降低。所以由图可知,在不同的N2流量下,随着He比例的升高,分辨率提高。Resolution can be expressed in terms of the peak width of a single peak, the separation between different peaks, or the difference in offset voltage between three peaks. The larger the distance between the compensation voltages, the higher the resolution, otherwise the resolution will gradually decrease. Therefore, it can be seen from the figure that under different N2 flow rates, the resolution increases with the increase of the He ratio.

为了更加直观、清晰的看到峰1与峰2、峰2与峰3之间的补偿电压差值比较,将图7中不同N2流量下施加He对补偿电压的影响通过数值的方式表述,如表2、3所示(其中“-”表示峰3还未出现)。表2为峰1与峰2之间的补偿电压差值,在相同的N2流量下随着He比例的增高,可看到补偿电压之间的差值逐渐增高,峰1与峰2之间的分离度也越来越高;表3中有峰2与峰3之间不存在差值的情况,是由于该条件下峰3还未出现,随着He比例的增加,峰3出现,且与峰2的距离越来越大,峰2与峰3之间的分离度越来越高,所以再一次验证随着He比例的升高,分辨率会随之提高。In order to more intuitively and clearly see the comparison of the compensation voltage difference between peak 1 and peak 2, peak 2 and peak 3, the influence of applying He on the compensation voltage under different N2 flow rates in Figure 7 is expressed numerically, As shown in Tables 2 and 3 (wherein "-" indicates that peak 3 has not yet appeared). Table 2 shows the compensation voltage difference between peak 1 and peak 2. Under the same N2 flow rate, as the proportion of He increases, it can be seen that the difference between the compensation voltage increases gradually, and the difference between peak 1 and peak 2 The degree of separation is getting higher and higher; there is no difference between peak 2 and peak 3 in table 3, because peak 3 has not yet appeared under this condition, and with the increase of He ratio, peak 3 appears, and As the distance from peak 2 increases, the resolution between peak 2 and peak 3 increases, so it is verified again that the resolution increases as the proportion of He increases.

表2峰1和峰2之间的补偿电压比较Table 2 Compensation voltage comparison between peak 1 and peak 2

Figure SMS_2
Figure SMS_2

表3峰2与峰3之间的补偿电压比较Table 3 Compensation voltage comparison between peak 2 and peak 3

Figure SMS_3
Figure SMS_3

补偿电压的计算公式如下所示:

Figure SMS_4
其中Kh和Kl分别为高场和低场条件下的离子迁移率,g为迁移板之间的距离,d为给定的单个射频占空比,Epp为单个射频高压幅值,dH为高场占空比。The formula for calculating the compensation voltage is as follows:
Figure SMS_4
where K h and K l are the ion mobility under high-field and low-field conditions, respectively, g is the distance between the migration plates, d is a given single radio frequency duty cycle, E pp is a single radio frequency high voltage amplitude, d H is the high field duty cycle.

布朗定理认为混合载气的离子迁移率与混合气体的比例有关且其非线性变化远远超过单气体下的离子迁移率变化,由上式可知,补偿电压的值会随着离子迁移率的变化而变化,(Kh-Kl)的值越大,补偿电压的值也越大,实验现象与理论研究相符。Brown's theorem holds that the ion mobility of the mixed carrier gas is related to the ratio of the mixed gas and its nonlinear change far exceeds the ion mobility change under a single gas. From the above formula, the value of the compensation voltage will vary with the ion mobility However, the greater the value of (K h -K l ), the greater the value of the compensation voltage. The experimental phenomenon is consistent with the theoretical research.

图8(a-d)为N2流量分别为1L min-1,1.5L min-1,2L min-1,2.5L min-1时添加不同He比例的离子信号强度图。由图可知,He比例较小时,峰3不会出现,随着He比例的增加,三个峰的离子信号强度基本上呈现先增后减小的趋势,且峰1、峰2分别在0.2,0.3L min-1He时峰值达到最大,随后降低。Fig. 8(ad) shows the ion signal intensities of different He ratios when the N 2 flow rates are 1L min -1 , 1.5L min -1 , 2L min -1 , and 2.5L min -1 respectively. It can be seen from the figure that when the proportion of He is small, peak 3 will not appear. As the proportion of He increases, the ion signal intensities of the three peaks basically show a trend of first increasing and then decreasing, and peak 1 and peak 2 are respectively at 0.2, The peak value reached the maximum at 0.3L min -1 He and then decreased.

图9(a-c)为对增加氦气流量可以提高离子信号强度的分析,实验条件为氮气流量1.5L min-1,镇流电阻6MΩ,在负直流高压作用下,针-环状电极产生电晕放电和辉光放电,而电路中的放电电流是表征放电严重程度的一个重要参数。放电电压为-2KV的条件下,观察连接在1KΩ测试电阻上的放电电流如图9a所示,由图观察可知,在氮气流量1.5L min-1的基础上施加氮气,对放电电流没有影响,而施加相同比例的氦气,放电电流会逐渐增加,电流值增加可能是由于随着氦气的加入电离区有更多的样品离子被电离。图9b为施加He对初始放电电压的影响,由图可知,在氮气的基础上继续增加氮气,对放电电压没有影响,而增加氦气会降低起始放电电压。图9c为在补偿电压持续扫描的情况下,不施加射频电压,在氮气的基础上添加不同流量氦气对离子信号强度的影响,由图可知,随着氦气的增加,离子信号越来越强,这就可以确定随着氦气流量的增加,电离区有更多的离子被电离。Figure 9(ac) shows the analysis of increasing the ion signal intensity by increasing the helium flow rate. The experimental conditions are nitrogen flow rate 1.5L min -1 , ballast resistance 6MΩ, under negative DC high voltage, the needle-ring electrode produces corona Discharge and glow discharge, and the discharge current in the circuit is an important parameter to characterize the severity of the discharge. Under the discharge voltage of -2KV, observe the discharge current connected to the 1KΩ test resistor as shown in Figure 9a. From the observation in the figure, it can be seen that applying nitrogen gas on the basis of the nitrogen flow rate of 1.5L min -1 has no effect on the discharge current. When the same proportion of helium is applied, the discharge current will gradually increase, and the increase in current value may be due to the fact that more sample ions are ionized as helium is added to the ionization region. Figure 9b shows the effect of applying He on the initial discharge voltage. It can be seen from the figure that adding nitrogen on the basis of nitrogen has no effect on the discharge voltage, while increasing helium will reduce the initial discharge voltage. Figure 9c shows the effect of adding different flows of helium on the ion signal intensity on the basis of nitrogen without applying radio frequency voltage under the condition of continuous scanning of the compensation voltage. It can be seen from the figure that with the increase of helium, the ion signal becomes more and more Strong, it can be confirmed that with the increase of helium flow rate, more ions are ionized in the ionization region.

离子信号强度计算公式如下所示:The formula for calculating ion signal intensity is as follows:

Figure SMS_5
式中:nin为迁移区入口处的离子浓度,Q为载气流量,tres为离子经过迁移区的时间,D为离子的扩散系数,ge为迁移区的有效间距,kB为波尔兹曼常数,q为离子电荷数,g为迁移区基板间距,T为开氏温度,VH为方波射频电压幅值,d为占空比,f为方波射频电压频率。
Figure SMS_5
In the formula: n in is the ion concentration at the entrance of the migration zone, Q is the flow rate of the carrier gas, t res is the time for the ion to pass through the migration zone, D is the diffusion coefficient of the ion, g e is the effective distance of the migration zone, k B is the wave Biltzmann's constant, q is the number of ion charges, g is the distance between the substrates in the migration zone, T is the Kelvin temperature, V H is the amplitude of the square wave radio frequency voltage, d is the duty cycle, and f is the frequency of the square wave radio frequency voltage.

随着He的加入,放电电流呈现增大趋势,说明在He的环境下有更多的离子被电离,迁移区入口处离子浓度nin增大,由上式可知,信号强度H随离子浓度nin的增加而增加。由于He是一种比较轻的气体,在N2中混合He之后离子在迁移区更容易撞击迁移极板210而被损失掉,当由于电离增多的离子大于撞击迁移极板210损失的离子,离子信号强度增强,反之则减小,这也就解释了为什么增加氦气比例后离子信号强度先增大后减小。在本发明前期试验的平板型FAIMS中,氮气和氦气在进入电离区域之前已被混合,加入氦气后,并不能带来离子源电离效率的提升,反而在迁移区由于离子迁移率的提高使运动振幅增大,扩散和空间电荷作用等使离子撞击到基板上湮没掉的概率增大,从而使信号减小。With the addition of He, the discharge current tends to increase, indicating that more ions are ionized in the He environment, and the ion concentration n in at the entrance of the migration zone increases. From the above formula, the signal intensity H increases with the ion concentration n increase with the increase of in . Because He is a relatively light gas, after mixing He in N , ions are more likely to hit the migration plate 210 in the migration region and be lost. The signal intensity increases, and vice versa, it decreases, which explains why the ion signal intensity first increases and then decreases after increasing the proportion of helium. In the flat plate FAIMS in the early stage test of the present invention, nitrogen and helium have been mixed before entering the ionization region. After adding helium, the ionization efficiency of the ion source cannot be improved, but in the migration region due to the improvement of ion mobility The movement amplitude increases, and the diffusion and space charge effects increase the probability of ions hitting the substrate and annihilating them, thereby reducing the signal.

4.2流量对照实验4.2 Flow control experiment

为了排除增加氦气对FAIMS谱图的影响是由于流量增大引起的,做了以下对照实验:在N2流量为2L min-1的条件下,一组掺杂气体加入0.2L min-1,0.3Lmin-1,0.5L min-1和1L min-1的He,另一组对照组掺杂气体加入同样流量的N2,观察两组FAIMS谱图变化。图10(a-b)是在射频电压200V,镇流电阻6M,放电电压-2KV条件下得到的FAIMS谱图,由图10a可看到,在2L min-1的基础上逐渐增加N2只会对信号强度有影响,不会影响补偿电压的值,且曲线峰宽逐渐变宽,分辨率下降;图10b是在N2为2L min-1的基础上逐渐增加He,由图观察可知,随着He比例的增多补偿电压向左偏移,信号强度先增加后减小且逐渐出现了峰2,分辨率提高。In order to rule out the effect of adding helium on the FAIMS spectrum due to the increase in flow rate, the following control experiment was done: under the condition of N 2 flow rate of 2L min -1 , a group of dopant gas was added at 0.2L min -1 , 0.3Lmin -1 , 0.5L min -1 and 1L min -1 of He, another group of control group doped gas with the same flow rate of N 2 , observe the changes of the FAIMS spectra of the two groups. Figure 10(ab) is the FAIMS spectrum obtained under the conditions of RF voltage 200V, ballast resistance 6M, and discharge voltage -2KV. It can be seen from Figure 10a that gradually increasing N 2 on the basis of 2L min -1 will only affect The signal strength is affected, but it will not affect the value of the compensation voltage, and the peak width of the curve gradually widens, and the resolution decreases; Figure 10b shows that He is gradually increased on the basis of N 2 being 2L min -1 , it can be seen from the figure that with The increase of the He ratio compensates for the voltage shift to the left, the signal intensity first increases and then decreases, and peak 2 gradually appears, and the resolution improves.

在初始N2流速为2L min-1的条件下,在混合气体中加入相同流量的N2和He放在一起进行比较,如图11所示。观察增加0.3L min-1He和增加0.3L min-1N2的图发现,其信号强度、补偿电压值、波峰数量均不同。在总的流速都为2.3L min-1的条件下,添加0.3L min-1氦气后离子峰信号强度为197.3pA,是添加0.3L min-1氮气时信号强度70pA的2.83倍,同时,补偿电压也由-1.98V增大到-2.37V,其他流速情况下也如此,说明增加He比例引起的实验现象并不是仅仅是由于流速增大引起的。Under the condition that the initial N 2 flow rate was 2L min -1 , the same flow of N 2 and He were added to the mixed gas for comparison, as shown in Figure 11. Observing the graphs of adding 0.3L min -1 He and adding 0.3L min -1 N 2 , it is found that the signal intensity, compensation voltage value and number of peaks are different. Under the condition that the total flow rate is 2.3L min -1 , the ion peak signal intensity after adding 0.3L min -1 helium gas is 197.3pA, which is 2.83 times of the signal intensity 70pA when adding 0.3L min -1 nitrogen gas. At the same time, The compensation voltage is also increased from -1.98V to -2.37V, and the same is true for other flow rates, indicating that the experimental phenomenon caused by increasing the proportion of He is not only caused by the increase of flow rate.

图12为在N2流速为2L min-1时,分别加0L min-1,0.2L min-1,0.3L min-1,0.5Lmin-1,1L min-1的N2、He离子强度和分辨率对比图。由图可知,随着N2的增加,离子信号强度从原来的52.76pA逐渐增加到了85.68pA,且只有一个波峰,该信号强度的增大是由于流速引起的。而随着所加He比例的增加,离子信号强度先增后减,加入0.3L min-1He时,信号强度达到了197.26pA,为增加0.3L/min-1N2信号强度的2.83倍,且在该条件下,出现了幅值为15.22pA的第二个波峰,出现第二个波峰的原因是由于分辨率的提高。Figure 12 shows the N 2 , He ionic strength and Resolution comparison chart. It can be seen from the figure that with the increase of N 2 , the ion signal intensity gradually increases from the original 52.76pA to 85.68pA, and there is only one peak. The increase of the signal intensity is caused by the flow velocity. With the increase of the proportion of He added, the ion signal intensity first increased and then decreased. When 0.3L min -1 He was added, the signal intensity reached 197.26pA, which was 2.83 times the signal intensity of 0.3L/min -1 N 2 . And under this condition, a second peak with an amplitude of 15.22pA appeared, and the reason for the appearance of the second peak was due to the improvement of the resolution.

峰1的分辨率计算公式如下所示:

Figure SMS_6
The formula for calculating the resolution of peak 1 is as follows:
Figure SMS_6

其中,VH为方波射频电压的幅值,KL为低电场条件下的离子迁移率,α(E/N)为离子迁移率系数,d为占空比,kB为玻尔兹曼常数,T为开尔文温度,q为离子电荷,tres为离子通过迁移区的时间,R为分辨率,CV为补偿电压值,FWHM为半峰宽。Among them, V H is the amplitude of the square wave RF voltage, K L is the ion mobility under low electric field conditions, α(E/N) is the ion mobility coefficient, d is the duty cycle, and k B is the Boltzmann Constant, T is the Kelvin temperature, q is the ion charge, tres is the time for the ion to pass through the migration region, R is the resolution, CV is the compensation voltage value, and FWHM is the half-peak width.

由上式可知,随着N2流速的增加,离子通过迁移区的时间tres降低,从而导致分辨率下降。在2L min-1N2的条件下逐渐加入He,分辨率逐渐增高,这是因为He是一种比较轻的气体,随着He的增加,会加速离子在迁移区的振荡,从而提高离子分辨率,该对照实验验证了加入He对FAIMS谱图的影响并不是由于流速增大的原因。It can be seen from the above formula that with the increase of N2 flow rate, the time tres for ions to pass through the migration region decreases, resulting in a decrease in resolution. Gradually add He under the condition of 2L min -1 N 2 , and the resolution gradually increases. This is because He is a relatively light gas. With the increase of He, the oscillation of ions in the migration region will be accelerated, thereby improving the ion resolution. The control experiment verified that the effect of adding He on the FAIMS spectrum is not due to the increase of the flow rate.

4.3不同射频条件4.3 Different RF Conditions

在放电电压-2kV,镇流电阻6MΩ,N2流速2L min-1的条件下,图13(a-d)分别为施加200V,250V,300V,350V射频下添加不同He流速的FAIMS谱图。由图可知,在不同的射频条件下,随着He比例的增加,离子信号强度先增大后减小,但总体信号强度较不添加He还是大。以图13b为例,当增加He为0.2L min-1,即氦气比例为9%(与表1相对应)时,峰1的信号强度由没有He加入的26.82pA增加到了84.75pA,增加了3.15倍。继续增加He,信号强度逐渐降低,当He比例达到该N2流量下的最大值33%时,离子信号强度降到了61.37pA,但其比不加入He时信号强度仍然要大2.29倍。同时观察图13b峰2也具有同样的规律,当不加入He时,峰2的离子信号强度仅有4.02pA,随着He的加入,离子信号强度在0.3L min-1He时达到了8.36pA,之后又随之减小,降到了5.9pA,但仍然比4.02pA大。该实验现象证明了增加He可以提高离子的灵敏度(信号强度)。两个峰之间分离度的计算公式如下所示:

Figure SMS_7
其中,R1为双峰的分离度,CV1与CV2分别为峰1与峰2的补偿电压值,W1与W2分别为峰1与峰2的峰宽。Under the conditions of discharge voltage -2kV, ballast resistance 6MΩ, and N 2 flow rate 2L min -1 , Fig. 13(ad) shows the FAIMS spectra of different He flow rates under the application of 200V, 250V, 300V, and 350V RF, respectively. It can be seen from the figure that under different radio frequency conditions, with the increase of the proportion of He, the ion signal intensity first increases and then decreases, but the overall signal intensity is still greater than that without adding He. Taking Figure 13b as an example, when adding He to 0.2L min -1 , that is, when the proportion of helium is 9% (corresponding to Table 1), the signal intensity of peak 1 increases from 26.82pA without He addition to 84.75pA, increasing increased by 3.15 times. Continue to increase He, and the signal intensity gradually decreases. When the He ratio reaches the maximum value of 33% under the N 2 flow, the ion signal intensity drops to 61.37pA, but it is still 2.29 times greater than that without He. At the same time, the peak 2 in Figure 13b also has the same rule. When no He is added, the ion signal intensity of peak 2 is only 4.02pA. With the addition of He, the ion signal intensity reaches 8.36pA at 0.3L min -1 He , and then decreased to 5.9pA, but still larger than 4.02pA. This experimental phenomenon proves that increasing He can increase the sensitivity (signal intensity) of ions. The formula for calculating the resolution between two peaks is as follows:
Figure SMS_7
Among them, R 1 is the separation degree of the double peaks, CV 1 and CV 2 are the compensation voltage values of peak 1 and peak 2 respectively, W 1 and W 2 are the peak widths of peak 1 and peak 2 respectively.

图14a为不同射频条件下通过公式计算来的峰1分辨率值,由图可知,随着He比例的增加,峰宽变窄,补偿电压变大,单体峰的分辨率提高,在射频200V,250V,300V,350V的条件下,加入1L min-1He时,分辨率达到最高,较不加He分别提高了1.61,1.90,1.61,2.34倍。图14b为通过公式计算的峰1与峰2在射频电压250V,300V,350V条件下的分离度,随着He比例的增加,双峰之间的分离度越来越大,进一步提高了分辨率。由图14a可知,射频电压为200V,He比例为13%时,出现了双峰,但由于峰2未完全与峰1分离,很难由公式计算出具体的分离度,增加He导致第二个波峰的出现从另一个角度证明增加He可以提高分辨率;当射频电压为分别为300V,350V时,随着He比例的增加,逐渐出现了第三个峰,同样说明分辨率随着He的加入会逐渐提高,此外,射频电压越大,加入氦气后分辨率的提高幅度也越大。射频电压为200V,250V,300V,350V时,单体峰的分辨率分别由2.13提高到3.42,由2.67提高到5.09,由3.39提高到6.55,由5.31提高到12.43,增大的倍数为1.61,1.91,1.93,2.34。射频电压为250V,300V,350V时,双峰分离度分别由1.57提高到2.6,由2.33提高到4.37,由4.17提高到9.51,增大的倍数为1.66,1.88,2.28。Figure 14a shows the resolution value of peak 1 calculated by the formula under different radio frequency conditions. It can be seen from the figure that as the proportion of He increases, the peak width becomes narrower, the compensation voltage becomes larger, and the resolution of the monomer peak increases. , 250V, 300V, and 350V, when 1L min -1 He was added, the resolution reached the highest, which was 1.61, 1.90, 1.61, and 2.34 times higher than that without He, respectively. Figure 14b shows the separation between peak 1 and peak 2 calculated by the formula under the conditions of RF voltage 250V, 300V, and 350V. As the proportion of He increases, the separation between the two peaks becomes larger and further improves the resolution. . It can be seen from Figure 14a that when the RF voltage is 200V and the He ratio is 13%, double peaks appear, but because peak 2 is not completely separated from peak 1, it is difficult to calculate the specific degree of separation by the formula, and increasing He leads to the second The appearance of the peak proves from another angle that increasing He can improve the resolution; when the RF voltage is 300V and 350V respectively, as the proportion of He increases, the third peak gradually appears, which also shows that the resolution increases with the addition of He In addition, the greater the RF voltage, the greater the increase in resolution after adding helium. When the radio frequency voltage is 200V, 250V, 300V, and 350V, the resolution of the monomer peak is increased from 2.13 to 3.42, from 2.67 to 5.09, from 3.39 to 6.55, from 5.31 to 12.43, and the increase is 1.61. 1.91, 1.93, 2.34. When the RF voltage is 250V, 300V, and 350V, the double-peak separation degree increases from 1.57 to 2.6, from 2.33 to 4.37, and from 4.17 to 9.51, and the increasing multiples are 1.66, 1.88, and 2.28.

图15(a-c)分别为不同射频条件下峰1,峰2和峰3随着He比例增加的信号强度变化图,由图可知,随着He比例的增加,峰1,峰2,峰3的信号强度均有先增后减的趋势,只是在不同的He比例下峰值能达到最大。当射频电压为200V,峰1与峰2在He流速为0.3L min-1时达到最大。继续增大He,信号强度降低,但仍然比不加入He时要大,此时峰3还未出现。而当射频电压为300V时,峰1在0.2L min-1He时信号值最大,峰2在0.3L min-1He时峰值最高,峰3在0.5L min-1He时出现,且达到该射频条件下的最大值,随后峰值降低。总之,在不同的射频条件下,增加He均可提高灵敏度,射频电压对灵敏度的影响与对分辨率的影响正好相反。对于峰1,射频电压幅值越小,增加氦气对提高信号强度的作用越明显,当射频电压为200V,加入0.3L min-1氦气时信号强度最高可增大3.74倍,当射频电压为350V时,信号强度仅可提高1.7倍;峰2和峰3信号强度的变化规律也类似,但需要较高的射频电压或者同一电压条件下需要加入较多的氦气才能出现峰2和峰3。Figure 15(ac) is the signal intensity change diagram of peak 1, peak 2 and peak 3 with the increase of He ratio under different radio frequency conditions. It can be seen from the figure that with the increase of He ratio, the The signal strength has a tendency to increase first and then decrease, but the peak value can reach the maximum under different He ratios. When the RF voltage is 200V, peak 1 and peak 2 reach the maximum when the flow rate of He is 0.3L min -1 . Continue to increase He, and the signal intensity decreases, but it is still greater than that without adding He. At this time, peak 3 has not yet appeared. When the RF voltage is 300V, the signal value of peak 1 is the largest at 0.2L min -1 He, peak 2 is the highest at 0.3L min -1 He, peak 3 appears at 0.5L min -1 He, and reaches the Maximum value at RF conditions, followed by decreasing peak value. In a word, under different radio frequency conditions, increasing He can improve sensitivity, and the influence of radio frequency voltage on sensitivity is just opposite to that on resolution. For peak 1, the smaller the amplitude of the RF voltage, the more obvious the effect of adding helium on improving the signal strength. When the RF voltage is 200V, the signal strength can be increased by a maximum of 3.74 times when 0.3L min -1 helium is added. When the RF voltage When it is 350V, the signal strength can only be increased by 1.7 times; the change law of the signal strength of peak 2 and peak 3 is also similar, but a higher RF voltage is required or more helium gas needs to be added under the same voltage condition to appear peak 2 and peak 3.

本发明实验结果显示,在1L min-1,1.5L min-1,2L min-1and 2.5L min-1N2流速下,He的加入增加了补偿电压的值,离子峰的数量从两个变成三个,不同离子峰之间的补偿电压距离增大,这表明FAIMS的分辨率提高。另一方面,离子峰的信号强度也有提高,说明FAIMS的灵敏度也提高,在氮气流速为2L min-1的条件下,添加相同流量的氦气和氮气作为混合载气,使总流量相同,不同射频电压下加入氦气的实验也同样证明增加氦气可以同时提高FAIMS的分辨率和灵敏度。The experimental results of the present invention show that at 1L min -1 , 1.5L min -1 , 2L min -1 and 2.5L min -1 N 2 flow rates, the addition of He increases the value of the compensation voltage, and the number of ion peaks changes from two Changed to three, the offset voltage distance between different ion peaks increases, which indicates the improved resolution of FAIMS. On the other hand, the signal intensity of the ion peak also increased, indicating that the sensitivity of FAIMS also increased. Under the condition of nitrogen flow rate of 2L min -1 , the same flow rate of helium and nitrogen was added as the mixed carrier gas, so that the total flow rate was the same and different The experiment of adding helium under RF voltage also proves that adding helium can improve the resolution and sensitivity of FAIMS at the same time.

以上仅为本申请的较佳实施例而已,并不用以限制本申请,凡在本申请的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本申请的保护范围之内。The above are only preferred embodiments of the application, and are not intended to limit the application. Any modifications, equivalent replacements and improvements made within the spirit and principles of the application should be included in the protection scope of the application. Inside.

Claims (8)

1. The ion source is characterized by comprising a first support body, a second support body and an air flow pipeline, wherein the first support body and the second support body are arranged at intervals to form an ion channel, the first support body is provided with a needle electrode, the second support body is provided with an annular electrode, and the tip end of the needle electrode stretches into the annular electrode; the airflow pipeline points to the tip of the needle-shaped electrode and is used for introducing helium gas to the needle tip; the annular cavity is surrounded by the annular electrode and is used for introducing nitrogen; the needle electrode is internally provided with a through hole penetrating to the needle point to form the air flow pipeline; the needle-shaped electrode and the annular electrode are concentrically arranged, and the tip end of the needle-shaped electrode is positioned in the middle of the axis of the annular electrode; the second support body is provided with a penetrating mounting hole, a metal conducting layer is arranged around the hole wall of the mounting hole to form the annular electrode, and the second support body is provided with an air inlet pipe communicated with the annular cavity.
2. The ion source of claim 1, wherein the annular cavity has a diameter of 3-6 times the diameter of the gas flow conduit, the gas flow conduit has a diameter of 0.5-1 mm, and the annular cavity has a diameter of 3-6 mm.
3. A FAIMS device comprising a housing having an opening at one end, a receiving cavity of the housing provided with a set of transfer plates, a set of detection plates, and the ion source of any one of claims 1-2, an ion channel facing the opening; the ion source, the migration polar plate group and the detection polar plate group are sequentially arranged from far to near in the direction away from the opening.
4. A FAIMS device according to claim 3, wherein the housing comprises two insulating plates arranged in parallel and spaced apart a distance and a side plate disposed between the insulating plates, the side plate partially surrounding the insulating plates, an opening being formed in the housing; the first support body and the second support body of the ion source are arranged opposite to each other and distributed on different insulating plates; the migration polar plate group comprises two migration polar plates which are oppositely arranged, and the two migration polar plates are distributed on different insulating plates; the detection polar plate group comprises two detection polar plates which are oppositely arranged, and the two detection polar plates are distributed on different insulating plates.
5. The FAIMS device of claim 4, wherein the first support is of unitary construction with the corresponding insulator plate and the second support is of unitary construction with the corresponding insulator plate.
6. The FAIMS device of claim 4, wherein the distance between the two displacement plates is between 0.2mm and 1mm and the distance between the two detection plates is between 0.2mm and 1mm.
7. A method of improving resolution and sensitivity of a FAIMS device comprising the steps of: introducing helium into the airflow pipeline and introducing nitrogen into the annular cavity of the annular electrode by adopting the FAIMS device as claimed in any one of claims 4 to 6; wherein the flow rate of the helium gas is 10-40% of the flow rate of the nitrogen gas.
8. The method of claim 7, wherein the helium flow is 0.25-1L/min and the nitrogen flow is 1.5-2.25L/min.
CN202110233360.6A 2021-03-03 2021-03-03 Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device Active CN113035686B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110233360.6A CN113035686B (en) 2021-03-03 2021-03-03 Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110233360.6A CN113035686B (en) 2021-03-03 2021-03-03 Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device

Publications (2)

Publication Number Publication Date
CN113035686A CN113035686A (en) 2021-06-25
CN113035686B true CN113035686B (en) 2023-06-16

Family

ID=76465936

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110233360.6A Active CN113035686B (en) 2021-03-03 2021-03-03 Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device

Country Status (1)

Country Link
CN (1) CN113035686B (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0123552A1 (en) * 1983-04-20 1984-10-31 Yale University Method and apparatus for the mass spectrometric analysis of solutions
JPH0676789A (en) * 1992-08-26 1994-03-18 Hitachi Ltd Esi mass spectrometer
JP2005174619A (en) * 2003-12-09 2005-06-30 Hitachi Ltd Ion mobility spectrometer and ionic mobility spectroscopy
JP2005183328A (en) * 2003-12-24 2005-07-07 Hitachi High-Technologies Corp Ion trap/time-of-flight mass spectrometer
CN101946300A (en) * 2008-02-12 2011-01-12 普度研究基金会 Low temperature plasma probe and methods of use thereof
CN102263006A (en) * 2011-06-28 2011-11-30 中国科学院化学研究所 A mass spectrometry ion source device and ionization analysis method based on heat-assisted glow discharge
JP2012028157A (en) * 2010-07-23 2012-02-09 Hitachi High-Technologies Corp Ion source and mass spectroscope
CN103094050A (en) * 2013-01-08 2013-05-08 中国科学院化学研究所 Sensitive glow discharge direct ionization method and device thereof
WO2015015641A1 (en) * 2013-08-02 2015-02-05 株式会社島津製作所 Ionization device and mass spectroscopy device
CN107195528A (en) * 2017-05-19 2017-09-22 北京大学 A kind of multi-functional open type compound ion source and its application method
WO2020080464A1 (en) * 2018-10-18 2020-04-23 Shimadzu Corporation Dielectric barrier discharge ionization, analytical instrument and ionization method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6815668B2 (en) * 1999-07-21 2004-11-09 The Charles Stark Draper Laboratory, Inc. Method and apparatus for chromatography-high field asymmetric waveform ion mobility spectrometry
JP2004157057A (en) * 2002-11-08 2004-06-03 Hitachi Ltd Mass analyzing apparatus
CN100593717C (en) * 2007-01-23 2010-03-10 清华大学 Ionization method for analyzing sample, and dedicated ionization source
CN102176403B (en) * 2010-12-31 2013-04-17 清华大学 Ionic focusing method for high-field asymmetric waveform ion mobility spectrometer with flat plate structure
CN103441058B (en) * 2013-04-12 2017-01-11 浙江大学苏州工业技术研究院 Micro-hollow cathode discharge ionization source integrated FAIMS

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0123552A1 (en) * 1983-04-20 1984-10-31 Yale University Method and apparatus for the mass spectrometric analysis of solutions
JPH0676789A (en) * 1992-08-26 1994-03-18 Hitachi Ltd Esi mass spectrometer
JP2005174619A (en) * 2003-12-09 2005-06-30 Hitachi Ltd Ion mobility spectrometer and ionic mobility spectroscopy
JP2005183328A (en) * 2003-12-24 2005-07-07 Hitachi High-Technologies Corp Ion trap/time-of-flight mass spectrometer
CN101946300A (en) * 2008-02-12 2011-01-12 普度研究基金会 Low temperature plasma probe and methods of use thereof
JP2012028157A (en) * 2010-07-23 2012-02-09 Hitachi High-Technologies Corp Ion source and mass spectroscope
CN102263006A (en) * 2011-06-28 2011-11-30 中国科学院化学研究所 A mass spectrometry ion source device and ionization analysis method based on heat-assisted glow discharge
CN103094050A (en) * 2013-01-08 2013-05-08 中国科学院化学研究所 Sensitive glow discharge direct ionization method and device thereof
WO2015015641A1 (en) * 2013-08-02 2015-02-05 株式会社島津製作所 Ionization device and mass spectroscopy device
CN105431921A (en) * 2013-08-02 2016-03-23 株式会社岛津制作所 Ionization devices and mass spectrometers
CN107195528A (en) * 2017-05-19 2017-09-22 北京大学 A kind of multi-functional open type compound ion source and its application method
WO2020080464A1 (en) * 2018-10-18 2020-04-23 Shimadzu Corporation Dielectric barrier discharge ionization, analytical instrument and ionization method

Also Published As

Publication number Publication date
CN113035686A (en) 2021-06-25

Similar Documents

Publication Publication Date Title
CN109688688A (en) A kind of gas medium barrier discharge plasma generation device
WO2015179709A4 (en) Instruments for measuring ion size distribution and concentration
CN106769707B (en) Potential well voltage-adjustable particle size spectrum measurement device and measurement method thereof
CN102778499B (en) Gas detection method
CN103442507B (en) A kind of device and method producing homogenous atmospheric-pressure discharge
RU2016121637A (en) CONCENTRIC SOURCE OF IONIZATION OF SURFACES OF IONIZATION FOR CARRYING OUT CHEMICAL IONIZATION AT ATMOSPHERIC PRESSURE (CHIAD), ION WIRE AND METHOD OF APPLICATION
CN204168591U (en) A kind of air forces down isothermal plasma generation device
CN109828190A (en) Enameled wire breakdown voltage test system and test method
CN113035686B (en) Ion source, FAIMS device and method for improving resolution and sensitivity of FAIMS device
CN103776818A (en) Glow discharge-based plasma generator and spectrum detection system formed by same
CN109884166B (en) Ionization sensor with both detection and detection method for p-nitrotoluene
CN103441058A (en) Integrated FAIMS of micro hollow cathode discharge ionization source
CN105203021A (en) Measuring device and method of roughness coefficient of high-voltage conducting wire
CN111739783B (en) Atmospheric pressure arc ion source for small mass spectrometer and its detection method
CN105632874A (en) DC non-uniform electric field ion migration tube
Zou et al. Measurement method of ionic mobilities in direct current corona discharge in air
CN105719937B (en) One kind is used for ion mobility spectrometry efficient radio frequency VUV light ionization source
CN102109492B (en) Carbon nanotube film ionization gas humidity sensor and its humidity measurement method
CN102103039A (en) Surface desorption sampling method and device
WO2013090157A1 (en) Atmospheric pressure chemical ionization detection
CN106290546B (en) Ionic migration spectrometer
CN105651760B (en) A kind of microplasma device of the metallic element analysis suitable for gas
CN106644856A (en) Panel device for miniaturized-rapidly measuring fine particle size distribution and measuring method thereof
RU196523U1 (en) GAS-SENSITIVE SENSOR BASED ON CARBON NANOSTRUCTURES
CN104062350B (en) Multi-electrode microsensor for detecting copper metal vapor concentration

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
EE01 Entry into force of recordation of patent licensing contract

Application publication date: 20210625

Assignee: Guilin Xingyuan Technology Co.,Ltd.

Assignor: GUILIN University OF ELECTRONIC TECHNOLOGY

Contract record no.: X2023980045835

Denomination of invention: Ion source, FAIMS device, and methods for improving their resolution and sensitivity

Granted publication date: 20230616

License type: Common License

Record date: 20231107

EE01 Entry into force of recordation of patent licensing contract
EC01 Cancellation of recordation of patent licensing contract

Assignee: Guilin Xingyuan Technology Co.,Ltd.

Assignor: GUILIN University OF ELECTRONIC TECHNOLOGY

Contract record no.: X2023980045835

Date of cancellation: 20241012

EC01 Cancellation of recordation of patent licensing contract
EE01 Entry into force of recordation of patent licensing contract

Application publication date: 20210625

Assignee: Guilin Xingyuan Technology Co.,Ltd.

Assignor: GUILIN University OF ELECTRONIC TECHNOLOGY

Contract record no.: X2024980033712

Denomination of invention: Ion source, FAIMS device and methods to improve its resolution and sensitivity

Granted publication date: 20230616

License type: Common License

Record date: 20241211

EE01 Entry into force of recordation of patent licensing contract