CN112987369A - Display panel, preparation method of display panel and display device - Google Patents

Display panel, preparation method of display panel and display device Download PDF

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Publication number
CN112987369A
CN112987369A CN202110183767.2A CN202110183767A CN112987369A CN 112987369 A CN112987369 A CN 112987369A CN 202110183767 A CN202110183767 A CN 202110183767A CN 112987369 A CN112987369 A CN 112987369A
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CN
China
Prior art keywords
layer
groove
touch
display panel
common electrode
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Pending
Application number
CN202110183767.2A
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Chinese (zh)
Inventor
聂晓辉
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to CN202110183767.2A priority Critical patent/CN112987369A/en
Publication of CN112987369A publication Critical patent/CN112987369A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

The invention discloses a display panel, a preparation method of the display panel and a display device. According to the invention, the touch wiring layer is arranged on the interlayer insulating layer and covers the second groove to form the first groove, the common electrode layer is connected with the touch wiring layer through the via hole, the via hole is positioned in the area where the first groove is positioned, and the surface of the common electrode layer facing the touch wiring layer is connected with the groove bottom and the side wall of the first groove, so that when the common electrode layer positioned at the groove bottom is broken, the common electrode layer positioned at the side wall can still be in contact with the touch wiring layer, thereby ensuring signal transmission and improving the reliability of the touch function.

Description

Display panel, preparation method of display panel and display device
Technical Field
The present invention relates to a panel technology, and in particular, to a display panel, a method for manufacturing the display panel, and a display device.
Background
The display device mainly includes a Liquid Crystal Display (LCD), a Plasma Display Panel (PDP), an Organic Light Emitting Diode (OLED), and an Active Matrix Organic Light Emitting Diode (AMOLED), and has a wide application space in vehicle-mounted, mobile phone, tablet, computer and television products.
In order to realize integration of liquid crystal display and touch control functions, in the field of medium and small size display, Common electrodes are generally patterned to serve as Common electrodes (Common ITO) of liquid crystal display and sensing electrodes of touch control functions, and the display and touch control functions are simultaneously driven through time-sharing operation. The technology is classified into an On Cell (i.e., a touch panel is embedded In a color filter substrate and a polarizer of a display panel) technology and an In Cell (i.e., a touch panel function is embedded In a liquid crystal pixel) technology according to the degree of embedding of the sensing electrode In the liquid crystal panel. The In Cell TP technology completely embeds the touch function into the liquid crystal pixels, so that the touch screen has the outstanding advantages of thin thickness of the whole machine, excellent display effect, excellent penetration rate and the like, and is a preferred scheme In high-end markets. Specifically, the In Cell TP technology is divided into a mutual capacitance type touch technology and a self-capacitance type touch technology according to different working principles. The planarization layer is an organic material whose cure rate is affected by temperature. In an actual manufacturing process, since the metal routing density in the output area of the touch electrode is high, and the heat absorption and conduction capability is high, in the high-temperature curing process of the flat layer, the connection hole connected with the touch routing layer (i.e. the film layer where the metal routing is located) is cured and formed in advance, so that the side wall of the connection hole is steep, and the common electrode layer has poor continuity during film formation, and the film layer is easy to break, thereby causing the problem of poor touch function.
Disclosure of Invention
The embodiment of the invention provides a display panel, a preparation method of the display panel and a display device, and effectively solves the problem that in the high-temperature curing process of a flat layer, a connecting hole connected with a touch routing layer is cured and formed in advance, so that the side wall of the connecting hole is steep, the continuity of a common electrode layer is poor during film forming, the film layer is easy to break, and the touch function is poor.
According to an aspect of the present invention, there is provided a display panel including: a substrate; an interlayer insulating layer disposed on the substrate; the touch wiring layer is arranged on the interlayer insulating layer, and a first groove is formed in the surface, away from the substrate, of the touch wiring layer; the flat layer is arranged on the interlayer insulating layer and covers the surface, far away from the substrate, of the touch wiring layer; and a common electrode layer disposed on the planarization layer; the common electrode layer is connected with the touch routing layer through a via hole, the via hole is located in the area where the first groove is located, and the surface, facing the touch routing layer, of the common electrode layer is connected with the groove bottom and the side wall of the first groove.
Furthermore, a second groove is formed in the position, corresponding to the first groove, of the interlayer insulating layer, which is far away from the surface of the substrate.
Further, the depth of the second groove is smaller than or equal to the thickness of the touch routing layer.
Furthermore, the common electrode layer includes a plurality of touch electrodes distributed in an array in the touch area of the display panel.
Further, the display panel further includes: and the grid insulating layer is arranged between the substrate and the interlayer insulating layer.
According to another aspect of the present invention, there is provided a method of manufacturing a display panel, comprising the steps of: providing a substrate; depositing an interlayer insulating layer on the substrate; forming a touch wiring layer on the interlayer insulating layer, and forming a first groove on the surface of the touch wiring layer away from the substrate; coating a flat layer on the interlayer insulating layer, covering the touch wiring layer, and forming a via hole on the flat layer; and depositing a common electrode layer on the planarization layer; the common electrode layer is connected with the touch routing layer through a via hole, the via hole is located in the area where the first groove is located, and the common electrode layer covers the groove bottom and the side wall of the first groove.
Further, the step of depositing an interlayer insulating layer on the substrate further comprises: and manufacturing a second groove on the surface of the interlayer insulating layer, which is far away from the substrate and corresponds to the first groove.
Further, the depth of the second groove is smaller than or equal to the thickness of the touch routing layer.
Further, the method comprises the steps of: and forming a plurality of touch electrodes on the common electrode layer by an etching process, and distributing the touch electrodes in an array in a touch area of the display panel.
According to another aspect of the present invention, there is provided a display device including the display panel according to any one of the embodiments of the present invention.
According to the invention, the touch wiring layer is arranged on the interlayer insulating layer and covers the first groove to form the second groove, the common electrode layer is connected with the touch wiring layer through the via hole, the via hole is positioned in the area where the second groove is positioned, and the surface of the common electrode layer close to the substrate is connected with the groove bottom and the side wall of the second groove, so that when the common electrode layer positioned at the groove bottom is broken, the common electrode layer positioned at the side wall can still be in contact with the touch wiring layer, thereby ensuring the signal transmission and improving the reliability of the touch function.
Drawings
The technical solution and other advantages of the present invention will become apparent from the following detailed description of specific embodiments of the present invention, which is to be read in connection with the accompanying drawings.
Fig. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
Fig. 2 is a flowchart illustrating steps of a method for manufacturing a display panel according to an embodiment of the invention.
Fig. 3 is a process flow diagram of step S210 and step S220 according to the embodiment of the present invention.
FIG. 4 is a flowchart of the process of step S230 according to the embodiment of the present invention
Fig. 5 is a process flow chart of step S240 according to the embodiment of the invention.
Fig. 6 is a process flow chart of step S250 according to the embodiment of the invention.
Fig. 7 is a schematic structural diagram of a display device according to an embodiment of the present invention.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
Fig. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention. The display panel includes: the touch screen comprises a substrate 10, an interlayer insulating layer 20, a touch wiring layer 40, a flat layer 50 and a common electrode layer 60.
In the present embodiment, the substrate 10 may be a glass substrate, but is not limited thereto. For example, the substrate 10 may also be a plastic substrate, or a substrate 10 made of PI material.
The interlayer insulating layer 20 is disposed on the substrate 10, and a second groove 30 is disposed on the interlayer insulating layer 20. In the embodiment, the material is SiOx or SiNx, or a multi-layer film composed of SiOx and SiOx, the thickness of which is 3000 angstroms (1000A), and the material of the interlayer insulating layer 20 can be Mo, Al, Cu, Ti, etc., or an alloy, and the thickness of which can be 10000 angstroms (2000A). The depth of the second groove 30 is less than or equal to the thickness of the touch routing layer 40. Preferably, the depth of the second groove 30 is equal to the thickness of the touch routing layer 40, and the width of the second groove 30 matches with the width of the touch routing layer 40.
The touch routing layer 40 is disposed on the interlayer insulating layer 20. In this embodiment, the touch routing layer 40 is made of metal. The touch wiring layer 40 covers the second groove 30 to form a first groove 70. Of course, in other embodiments, the second groove is not disposed on the interlayer insulating layer 20, and only the first groove is disposed on the touch routing layer 40.
The flat layer 50 is disposed on the interlayer insulating layer 20 and covers the surface of the touch routing layer 40 away from the substrate 10. In this embodiment, a via hole is further disposed in the planar layer 50, and the via hole is located at the position of the first groove 70.
The common electrode layer 60 is disposed on the planarization layer 50. In this embodiment, the common electrode layer 60 is connected to the touch routing layer 40 through a via hole, the via hole is located in the area of the first groove 70, and the surface of the common electrode layer 60 close to the substrate 10 is connected to the bottom and the side wall of the first groove 70. When the common electrode layer 60 at the bottom of the groove is partially broken, the common electrode layer 60 at the side wall can still be connected with the touch wiring layer 40, so that signal transmission is ensured, and the reliability of the touch function is improved.
The common electrode layer 60 includes a plurality of touch electrodes, and the touch electrodes are distributed in an array in the touch area of the display panel, so as to implement a touch sensing function.
According to the invention, the touch wiring layer is arranged on the interlayer insulating layer and covers the second groove to form the first groove, the common electrode layer is connected with the touch wiring layer through the via hole, the via hole is positioned in the area where the first groove is positioned, and the surface of the common electrode layer facing the touch wiring layer is connected with the groove bottom and the side wall of the first groove, so that when the common electrode layer positioned at the groove bottom is broken, the common electrode layer positioned at the side wall can still be in contact with the touch wiring layer, thereby ensuring signal transmission and improving the reliability of the touch function.
Fig. 2 is a flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present invention. The method comprises the following steps:
step S200: a substrate is provided.
In the present embodiment, the substrate may be a glass substrate, but is not limited thereto. For example, the substrate may be a plastic substrate, or a substrate made of PI material.
S210: an interlayer insulating layer is deposited on the substrate.
In this embodiment, the interlayer insulating layer material is SiOx or SiNx, or a multi-layer thin film composed of SiOx and SiOx, and has a thickness of 3000 angstroms (1000 angstroms), and the interlayer insulating layer material may be Mo, Al, Cu, Ti, or the like, or an alloy, and has a thickness of 10000 angstroms (2000 angstroms).
As shown in fig. 3.
Step S220: and manufacturing a second groove on the surface of the interlayer insulating layer, which is far away from the substrate and corresponds to the first groove.
In this embodiment, the interlayer insulating layer is manufactured by a chemical vapor deposition process, and the second groove is manufactured by an exposure and etching process, wherein the depth of the second groove is smaller than or equal to the thickness of the touch routing layer, preferably, the depth of the second groove is equal to the thickness of the touch routing layer, and the width of the second groove is matched with the width of the touch routing layer.
As shown in fig. 4.
Step S230: and forming a touch wiring layer on the interlayer insulating layer, and forming a first groove on the surface of the touch wiring layer far away from the substrate.
In this embodiment, the touch routing layer is made of metal, and the touch routing layer is formed by patterning a metal thin film through exposure and etching processes. The touch wiring layer covers the second groove to form a first groove.
As shown in fig. 5.
Step S240: and coating a flat layer on the interlayer insulating layer, covering the touch wiring layer, and forming a via hole on the flat layer.
In this embodiment, a via hole is further disposed in the planarization layer, and the via hole is formed by exposure and etching processes and located at the position of the first groove.
As shown in fig. 6.
Step S250: and depositing a common electrode layer on the flat layer.
In this embodiment, a common electrode layer is manufactured by physical vapor deposition, the common electrode layer is connected with the touch routing layer through a via hole, the via hole is located in the area where the first groove is located, and the surface of the common electrode layer, which is close to the substrate, is connected with the bottom and the side wall of the first groove. When the common electrode layer part at the groove bottom is broken, the common electrode layer at the side wall can still be connected with the touch wiring layer, so that signal transmission is ensured, and the reliability of the touch function is improved.
Step S260: and forming a plurality of touch electrodes on the common electrode layer by an etching process.
In this embodiment, the plurality of touch electrodes are manufactured through exposure and etching processes, and the plurality of touch electrodes are distributed in an array in the touch area of the display panel, so that a touch sensing function is realized.
According to the invention, the touch wiring layer is arranged on the interlayer insulating layer and covers the second groove to form the first groove, the common electrode layer is connected with the touch wiring layer through the via hole, the via hole is positioned in the area where the first groove is positioned, and the surface of the common electrode layer facing the touch wiring layer is connected with the groove bottom and the side wall of the first groove, so that when the common electrode layer positioned at the groove bottom is broken, the common electrode layer positioned at the side wall can still be in contact with the touch wiring layer, thereby ensuring signal transmission and improving the reliability of the touch function.
As shown in fig. 7, which is a schematic structural diagram of a display device according to a third embodiment of the present invention, the display device 200 includes the display panel 100 according to the third embodiment. The display device 200 may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like.
When the display panel 100 of the above embodiment is adopted in the display device 200 of the present embodiment, the display effect is better.
Of course, other conventional structures, such as a power supply unit, a display driving unit, and the like, may also be included in the display device 200 of the present embodiment.
The principles and embodiments of the present invention have been described herein using specific examples, which are provided only to help understand the method and the core concept of the present invention; meanwhile, for those skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.

Claims (10)

1. A display panel, comprising:
a substrate;
an interlayer insulating layer disposed on the substrate;
the touch wiring layer is arranged on the interlayer insulating layer, and a first groove is formed in the surface, away from the substrate, of the touch wiring layer;
the flat layer is arranged on the interlayer insulating layer and covers the surface, far away from the substrate, of the touch wiring layer; and
the common electrode layer is arranged on the flat layer; the common electrode layer is connected with the touch routing layer through a via hole, the via hole is located in the area where the first groove is located, and the surface, facing the touch routing layer, of the common electrode layer is connected with the groove bottom and the side wall of the first groove.
2. The display panel according to claim 1, wherein a second groove is provided in a position corresponding to the first groove on a surface of the interlayer insulating layer remote from the substrate.
3. The display panel of claim 2, wherein the depth of the second groove is less than or equal to the thickness of the touch routing layer.
4. The display panel of claim 1, wherein the common electrode layer comprises a plurality of touch electrodes distributed in an array in the touch area of the display panel.
5. The display panel according to claim 1, characterized in that the display panel further comprises: and the grid insulating layer is arranged between the substrate and the interlayer insulating layer.
6. A method for manufacturing a display panel, comprising the steps of:
providing a substrate;
depositing an interlayer insulating layer on the substrate;
forming a touch wiring layer on the interlayer insulating layer, and forming a first groove on the surface of the touch wiring layer away from the substrate;
coating a flat layer on the interlayer insulating layer, covering the touch wiring layer, and forming a via hole on the flat layer; and
depositing a common electrode layer on the planarization layer; the common electrode layer is connected with the touch routing layer through a via hole, the via hole is located in the area where the first groove is located, and the common electrode layer covers the groove bottom and the side wall of the first groove.
7. The method of claim 6, wherein the step of depositing an interlayer insulating layer on the substrate further comprises: and manufacturing a second groove on the surface of the interlayer insulating layer, which is far away from the substrate and corresponds to the first groove.
8. The method according to claim 6, wherein the depth of the second groove is less than or equal to the thickness of the touch routing layer.
9. The method for manufacturing a display panel according to claim 6, wherein the method further comprises the steps of:
and forming a plurality of touch electrodes on the common electrode layer by an etching process, and distributing the touch electrodes in an array in a touch area of the display panel.
10. A display device characterized by comprising the display panel according to any one of claims 1 to 9.
CN202110183767.2A 2021-02-08 2021-02-08 Display panel, preparation method of display panel and display device Pending CN112987369A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170121674A (en) * 2016-04-22 2017-11-02 삼성디스플레이 주식회사 Flexible display device
CN109960438A (en) * 2019-03-19 2019-07-02 京东方科技集团股份有限公司 Substrate and preparation method thereof, touch control display apparatus
CN110931531A (en) * 2019-11-27 2020-03-27 武汉华星光电半导体显示技术有限公司 OLED display panel and preparation method thereof
CN111077687A (en) * 2019-12-13 2020-04-28 武汉华星光电技术有限公司 Display panel, preparation method thereof and display device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170121674A (en) * 2016-04-22 2017-11-02 삼성디스플레이 주식회사 Flexible display device
CN109960438A (en) * 2019-03-19 2019-07-02 京东方科技集团股份有限公司 Substrate and preparation method thereof, touch control display apparatus
CN110931531A (en) * 2019-11-27 2020-03-27 武汉华星光电半导体显示技术有限公司 OLED display panel and preparation method thereof
CN111077687A (en) * 2019-12-13 2020-04-28 武汉华星光电技术有限公司 Display panel, preparation method thereof and display device

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