CN112987362A

CN112987362A - Liquid crystal display substrate and forming method thereof, liquid crystal display panel and forming method thereof

Info

Publication number: CN112987362A
Application number: CN201911302209.2A
Authority: CN
Inventors: 张莉; 李欣; 王群
Original assignee: Inesa Display Materials Co ltd
Current assignee: Inesa Display Materials Co ltd
Priority date: 2019-12-17
Filing date: 2019-12-17
Publication date: 2021-06-18

Abstract

A liquid crystal display substrate and a forming method thereof, a liquid crystal display panel and a forming method thereof are provided, wherein the forming method of the liquid crystal display substrate comprises the following steps: providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light-transmitting areas and a plurality of light-shielding areas, and the light-shielding areas are positioned between adjacent light-transmitting areas; forming a mark structure on a part of the non-display area, wherein the mark structure has a first thickness; after the mark structure is formed, a light-shielding material film is formed on the display region and the non-display region, the light-shielding material film has a second thickness, and the first thickness is greater than the second thickness. The method is beneficial to providing the accuracy of alignment, so that the performance of the formed liquid crystal display substrate is higher.

Description

Liquid crystal display substrate and forming method thereof, liquid crystal display panel and forming method thereof

Technical Field

The invention relates to the technical field of display, in particular to a liquid crystal display substrate and a forming method thereof, and a liquid crystal display panel and a forming method thereof.

Background

The lcd substrate is one of the most widely used flat panel displays due to its advantages of high display quality, low price, portability, etc., and has gradually become a display with a high resolution color screen widely used in various electronic devices such as mobile phones, Personal Digital Assistants (PDAs), digital cameras, computer screens, or notebook computer screens.

Most of the existing liquid crystal displays in the market are backlight liquid crystal displays (lcds), which include a liquid crystal display (lcd) substrate and a backlight module (backlight module). Generally, a Liquid Crystal display Substrate is composed of a Color Filter (CF) Substrate, a Thin Film Transistor Array (TFT) Substrate, and a Liquid Crystal Layer (Liquid Crystal Layer) disposed between the two substrates, and the Liquid Crystal display Substrate has an operation principle that a driving voltage is applied to the two substrates to control rotation of Liquid Crystal molecules of the Liquid Crystal Layer, so as to refract light of a backlight module to generate a picture.

In order to improve the aperture opening ratio of the liquid crystal display substrate and reduce the parasitic capacitance effect, a color film can be integrally manufactured On one side of the TFT array substrate by adopting a COA (color Filter On array) technology in the process of preparing the liquid crystal display substrate.

However, the performance of the liquid crystal display substrate formed by the COA technology is poor.

Disclosure of Invention

The invention aims to provide a liquid crystal display substrate and a forming method thereof, a liquid crystal display panel and a forming method thereof, so as to improve the accuracy of alignment and ensure that the formed liquid crystal display substrate has higher performance.

In order to solve the above technical problems, a technical solution of the present invention provides a method for forming a liquid crystal display substrate, including: providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light-transmitting areas and a plurality of light-shielding areas, and the light-shielding areas are positioned between adjacent light-transmitting areas; forming a mark structure on a part of the non-display area, wherein the mark structure has a first thickness; after the mark structure is formed, a light-shielding material film is formed on the display region and the non-display region, the light-shielding material film has a second thickness, and the first thickness is greater than the second thickness.

Optionally, a ratio of the first thickness to the second thickness is greater than 2.

Optionally, the first thickness ranges from 1 micron to 15 microns; the second thickness ranges from 0.5 microns to 2 microns.

Alternatively, the light-shielding material film may be made of a material having an optical density in a range of more than 3.5.

Optionally, the material of the light-shielding material film includes: black photosensitive resin material or metallic chrome.

Optionally, the method further includes: before the light shading material film is formed, a light filtering structure is formed on the light transmitting areas, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

Optionally, the method further includes: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

Optionally, the method further includes: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

Optionally, the method further includes: patterning the light-shielding material film to form a light-shielding layer on the light-shielding region; after the light shading layer is formed, a light filtering structure is formed on the light transmitting area, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

Optionally, the method further includes: and before the second pixel electrode layer is formed, a flat protective layer is formed on the display area, and the flat protective layer is positioned at the bottom of the second pixel electrode layer.

Optionally, the first pixel layer is further located on a part of the non-display area; the marking structure includes: and a first pixel layer on the non-display area.

Optionally, the second pixel layer is further located on a portion of the non-display area; the marking structure includes: and a second pixel layer on the non-display area.

Optionally, the filter structure is further located on a part of the non-display area; the marking structure includes: a light filtering structure on the non-display area; the thickness of the light filtering structure on the non-display area is smaller than or equal to that of the light filtering structure on the display area.

Optionally, the flat protective layer is further located on a part of the non-display area; the marking structure includes: a flat protective layer on the non-display area; the thickness of the flat protective layer on the non-display area is smaller than or equal to that of the flat protective layer on the display area.

Correspondingly, the technical scheme of the invention also provides a method for forming the liquid crystal display substrate by adopting any one method, which comprises the following steps: the display device comprises a first substrate, a second substrate and a third substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light transmission areas and a plurality of light shading areas, and the light shading areas are positioned between adjacent light transmission areas; the mark structure is positioned on part of the non-display area and has a first thickness; and the shading material film is positioned on the display area and the non-display area and covers the surface of the mark structure, the shading material film has a second thickness, and the first thickness is greater than the second thickness.

Correspondingly, the technical scheme of the invention also provides a method for forming the liquid crystal display panel, which comprises the following steps: providing the liquid crystal display substrate; providing a second substrate; attaching the second substrate to the liquid crystal display substrate to form a cavity; and filling liquid crystal in the cavity.

Correspondingly, the technical scheme of the invention also provides the liquid crystal display panel formed by adopting the forming method.

Compared with the prior art, the technical scheme of the embodiment of the invention has the following beneficial effects:

in the method for forming a liquid crystal display substrate according to the technical solution of the present invention, the first substrate includes: the display device comprises a display area and a non-display area, wherein a mark structure is formed on the non-display area and has a first thickness; and forming a light-shielding material film on the display area, wherein the light-shielding material film has a second thickness, and the first thickness is larger than the second thickness, so that the sum of the thicknesses of the mark structure and the light-shielding material film is obviously higher than the height of the light-shielding material film, namely, the mark structure on the non-display area is protruded, and the light reflected by the mark structure on the non-display area and the light-shielding material film is different from the light reflected by the light-shielding material film on the non-display area. And further be favorable to follow-up through discerning the light condition difference that reflects back, realize more accurate counterpoint.

Further, when the light filtering structure is also positioned on part of the non-display area, the light filtering structure positioned on the non-display area is used as a part of the mark structure. Because the thickness of the filtering structure on the non-display area is smaller than that of the filtering structure on the display area, the mark structure on the non-display area is not too thick, and the process requirement is met.

Further, when the flat protective layer is also positioned on part of the non-display area, the flat protective layer positioned on the non-display area is used as a part of the mark structure. Because the thickness of the flat protective layer on the non-display area is smaller than that of the flat protective layer on the display area, the mark structure on the non-display area is not too thick, and the process requirement is met.

Drawings

FIGS. 1 to 4 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate;

fig. 5 to 13 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate according to an embodiment of the invention.

Detailed Description

As described in the background, the conventional liquid crystal display substrate has poor performance.

The reason why the performance of the liquid crystal display substrate is poor will be described in detail below with reference to the accompanying drawings, and fig. 1 to 4 are schematic structural diagrams of steps of a method for forming a liquid crystal display substrate.

Referring to fig. 1, a first substrate 100 is provided, where the first substrate 100 includes: the display area A and the non-display area B, and a plurality of printing opacity district I and a plurality of shading district II, just shading district I is located between the adjacent printing opacity district II.

Referring to fig. 2, a pixel electrode layer 110 is formed on the display area a and a portion of the non-display area B.

Referring to fig. 3, a color photoresist layer 120 is formed on the transmissive region I.

Referring to fig. 4, after the color photoresist layer 120 and the pixel electrode layer 110 are formed, a light-shielding layer 130 is formed on the light-shielding region II.

In the above method, the color photoresist layer 120 and the pixel electrode layer 110 are both formed on the same side surface of the first substrate 100, which is beneficial to reducing the parasitic capacitance effect and realizing a curved or fixed curvature liquid crystal display substrate. Meanwhile, the pixel electrode layer 110 on a part of the non-display region B may be used as a mark, thereby facilitating accurate alignment during subsequent film formation.

Since the light-shielding layer 130 is formed, alignment processing is required. The alignment treatment process comprises the following steps: the mark formed on the non-display area B and the mark in the mask plate are aligned, and the pattern in the mask plate is accurately transferred to the light shielding layer 130. However, since the material of the light-shielding layer 130 is usually opaque, the lens cannot identify the mark located at the bottom of the light-shielding layer 130 to achieve alignment, which results in poor accuracy of the alignment process and poor performance of the formed liquid crystal display substrate.

In order to solve the above technical problems, a technical solution of the present invention provides a liquid crystal display substrate and a method for forming the same, including: providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light-transmitting areas and a plurality of light-shielding areas, and the light-shielding areas are positioned between adjacent light-transmitting areas; forming a mark structure on a part of the non-display area, wherein the mark structure has a first thickness; after the mark structure is formed, a light-shielding material film is formed on the display area, the light-shielding material film has a second thickness, and the first thickness is greater than the second thickness. The method is beneficial to accurate alignment, so that the performance of the formed liquid crystal display substrate is higher.

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.

Referring to fig. 5, a first substrate 200 is provided, where the first substrate 200 includes a display area a and a non-display area B, the display area a includes a plurality of light-transmitting areas I and a plurality of light-shielding areas II, and the light-shielding areas II are located between adjacent light-transmitting areas I.

The display area A is used for forming a pixel structure subsequently, and the non-display area B is used for forming a mark subsequently.

In this embodiment, the display area a includes: a transparent area I and a shading area II.

The material of the first substrate 200 includes silicon oxide, Polyimide (PI), polyethylene terephthalate (PET), or Triacetylcellulose (TAC).

In this embodiment, the material of the first substrate 200 is silicon oxide.

Then, a mark structure is formed on a portion of the non-display region B, and the mark structure has a first thickness.

In this embodiment, before the light-shielding material film is formed subsequently, a filter structure is formed on the light-transmitting area I, where the filter structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

In other embodiments, after the light-shielding material film is subsequently formed, a light-filtering structure is formed on the light-transmitting areas I, the light-filtering structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

In this embodiment, the method for forming the liquid crystal display panel further includes: forming a first pixel electrode layer on the display area A before forming the light filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area A; and forming a spacer on the light shielding region II.

In other embodiments, after the filtering structure is formed, a first pixel electrode layer may be formed on the display region; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

Referring to fig. 6, a first pixel electrode material film 210 is formed on the display area a and the non-display area B.

The first pixel electrode material film 210 is used for providing a material for a first pixel electrode layer to be formed later.

In the embodiment, the first pixel electrode material film 210 is also located on the surface of the non-display region B, and the first pixel electrode material film 210 located on the surface of the non-display region B is used to form a part of the mark structure.

The material of the first pixel electrode material film 210 includes: a metal oxide comprising indium tin oxide, fluorine doped tin oxide or aluminum doped zinc oxide.

The formation process of the first pixel electrode material film 210 includes: a sputtering process, a deposition process, or a coating process.

In the present embodiment, the process of forming the first pixel electrode material film 210 is a sputtering process.

In this embodiment, the material of the first pixel electrode material film 210 is indium tin oxide.

In other embodiments, the material of the first pixel electrode material film may also be a metal, such as chromium.

Referring to fig. 7, a first patterning process is performed on the first pixel electrode material film 210 to form a first pixel electrode layer 211 on the display region a.

The first pixel electrode layer 211 on the surface of the display area a is used to provide a conductive structure for forming an electrical path.

The method of the first patterning layer comprises: forming a first patterned layer (not shown) on the surface of the first pixel electrode material film 210; the first pixel electrode material film 210 is etched using the first patterning layer as a mask until the surface of the first substrate 200 is exposed, thereby forming the first pixel electrode layer 211.

In this embodiment, the first pixel electrode layer 211 is also located on a portion of the surface of the non-display region B. The first pixel electrode layer 211 on the surface of the non-display region B is used for providing alignment marks for the subsequent formation of the light shielding layer, the light filtering structure, the second pixel electrode layer, the flat protection layer and the spacer.

The shape of the first pixel electrode layer 211 on the surface of the non-display region B includes: one or more of a positive direction, a rectangle, a cross and a rhombus.

The first pixel electrode layer 211 on the surface of the non-display area B corresponds to the position and size of a mark on an adopted mask plate, and the mask plate is used for an exposure process to realize pattern transfer.

The shape of the first pixel electrode layer 211 includes: one or more of a positive direction, a rectangle, a cross and a rhombus.

The first pixel electrode layer 211 corresponds to the position and size of a mark on an adopted mask plate, and the mask plate is used for an exposure process to realize pattern transfer.

Referring to fig. 8, a filter structure (not shown) is formed on the light-transmitting area a, wherein the filter structure includes a plurality of filter layers, and each light-transmitting area I has one filter layer thereon; the filter layers are a red filter layer 2221, a green filter layer 2222, or a blue filter layer 2223.

The light filtering structure enables light rays to be changed into monochromatic light after passing through the light filtering structure, so that the requirements of the device are met.

In this embodiment, after the first pixel electrode layer 211 is formed, the filter structure is formed. In other embodiments, the filtering structure is formed before the first pixel electrode layer is formed.

The first pixel electrode layer 211 located on the non-display area B is used as a mark for forming the filtering structure, and in the process of an exposure process, accurate alignment is realized by comparing the position and the size of the mark in the mask with the position and the size of the first pixel electrode layer 211 on the non-display area B.

In this embodiment, the filter structure is further located on the non-display region B, and the position and the size of the filter structure located on the non-display region B correspond to the position and the size of the first pixel electrode layer 211 one to one.

In other embodiments, the filtering structure may not be formed on the non-display region.

The method for forming the red filter layer 2221 includes: forming a red filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the red filter layer material is exposed and developed, and the red filter layer 2221 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.

In this embodiment, the method further includes: the red filter layer 2221 is formed on a portion of the non-display area B. In other embodiments, the red filter layer is only located on one light-transmitting area and is not located on the non-display area.

The method for forming the green filter layer 2222 includes: forming a green filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the green filter layer material is exposed and developed, and a green filter layer 2222 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.

In this embodiment, the method further includes: the green filter layer 2222 is formed on a portion of the non-display area B. In other embodiments, the green filter layer is only located on one light-transmitting area and is not located on the non-display area.

The method for forming the blue filter layer 2223 includes: forming a blue filter layer material (not shown) on the first pixel electrode layer 211 and the surface of the non-display region B; the blue filter layer material is exposed and developed, and the blue filter layer 2223 is formed on the surface of the first pixel electrode layer 211 in one light-transmitting area a.

In this embodiment, the method further includes: the blue filter layer 2223 is formed on a portion of the non-display area B. In other embodiments, the blue filter layer is only located on one light-transmitting region and not located on the non-display region.

It should be noted that the forming order of the red filter layer 2221, the green filter layer 2222, and the blue filter layer 2223 is not sequentially distinguished.

In this embodiment, the filter structure located on the non-display area B includes: a red filter layer 2221, a green filter layer 2222, and a blue filter layer 2223. In other embodiments, the light filtering structure includes: one or two of a red filter layer, a green filter layer and a blue filter layer.

In this embodiment, the thickness of the filter structure located on the non-display area B is smaller than that of the filter structure located on the display area a. Specifically, the thickness of the red filter layer 2221 located on the non-display area B is smaller than the thickness of the red filter layer 2221 located on the display area a; the thickness of the green filter layer 2222 located on the non-display area B is smaller than the thickness of the green filter layer 2222 located on the display area a; the thickness of the blue filter layer 2223 positioned on the non-display area B is smaller than the thickness of the blue filter layer 2223 positioned on the display area a, so that the thickness of the filter structure positioned on the non-display area B is smaller than the thickness of the filter structure on the display area a.

Because the thickness of the filtering structure on the non-display area B is smaller than that of the filtering structure on the display area A, the mark structure on the non-display area B is not too thick, and the process requirement is met.

In other embodiments, the thickness of the filtering structure on the non-display area may also be equal to the thickness of the filtering structure on the display area.

Referring to fig. 9, after the filter structure is formed, a flat protection layer 231 is formed on the display area a.

In this embodiment, the flat protection layer 231 is further located on the portion of the non-display region B, and the position and the size of the flat protection layer 231 located on the non-display region B correspond to the position and the size of the first pixel electrode layer 211 and the position and the size of the filter structure one by one, and are used as a part of the mark structure.

The flat protection layer 231 on the display region B plays a role of insulation protection, and on the other hand, the top surface of the flat protection layer 231 is flat, so that the heights of the subsequently formed spacers are consistent.

The material of the flat protective layer 231 includes: a transparent photosensitive resin.

The method for forming the flat protection layer 231 comprises the following steps: forming a flat material film (not shown) on the display area a and the non-display area B using a coating process; the flat material film is subjected to an exposure process and a development process to form the flat protection layer 231.

In the present embodiment, the thickness of the flat protective layer 231 located on the non-display area B is smaller than the thickness of the flat protective layer 231 on the display area a.

Since the flat protection layer 231 is a part of the mark structure, the thickness of the flat protection layer 231 on the non-display area B is smaller than the thickness of the flat protection layer 231 on the display area a, so that the mark structure on the non-display area B is not too thick, thereby satisfying the process requirements.

In other embodiments, the thickness of the flat protective layer on the non-display area is equal to the thickness of the flat protective layer on the display area.

The first pixel electrode layer 211 and the filter structure on the non-display area B are used as marks for forming the flat protection layer 231, so that in the process of an exposure process, accurate alignment is realized by comparing the positions and sizes of the marks in the mask and the first pixel electrode layer 211 and the filter structure.

In other embodiments, the flat protection layer may also be formed before forming the filtering structure.

After forming the flat protection layer 231, a second pixel electrode layer is formed on the display area a, the flat protection layer 231 is located at the bottom of the second pixel electrode layer, and please refer to fig. 10 to 11 for a specific process of forming the second pixel electrode layer.

Referring to fig. 10, a second pixel electrode material film 240 is formed on the display area a and the non-display area B.

The second pixel electrode material film 240 is used for providing a material for a second pixel electrode layer to be formed later.

The material of the second pixel electrode material film 240 includes: a metal oxide comprising indium tin oxide, fluorine doped tin oxide or aluminum doped zinc oxide.

In this embodiment, the material of the second pixel electrode material film 240 is indium tin oxide.

The formation process of the second pixel electrode material film 240 includes: a sputtering process, a deposition process, or a coating process.

In this embodiment, the forming process of the second pixel electrode material film 240 includes: and (4) sputtering.

In other embodiments, the material of the second pixel electrode material film may also be a metal, such as chromium.

Referring to fig. 11, an exposure process and a development process are performed on the second pixel electrode material film 240 to form a second pixel electrode layer 241 on the surface of the display region a.

In this embodiment, the second pixel electrode layer 241 is further located on a portion of the non-display region B, and the position and size of the second pixel electrode layer 241 located on the portion of the non-display region B correspond to the position and size of the first pixel electrode layer 211, the position and size of the filter structure, and the position and size of the flat protection layer 231 one by one, and are used as a part of the mark structure.

In other embodiments, the second pixel electrode layer is not located on the non-display region.

The second pixel electrode layer 241 is used to provide a conductive structure for forming an electrical path.

In this embodiment, the first pixel electrode layer 211, the filter structure located on the surface of the first pixel electrode layer, and the flat protective layer 231 located on the surface of the filter structure, which are located on the non-display area B, are used as marks for forming the second pixel electrode layer 241, so that in the process of the exposure process, accurate alignment is realized by comparing the marks in the mask and the positions and sizes of the first pixel electrode layer 211 and the flat protective layer 231.

Since the second pixel electrode material film 240 is made of indium tin oxide, and the second pixel electrode material film 240 made of the material is transparent, a lens of an apparatus performing an exposure process can accurately capture the mark located at the bottom of the second pixel electrode material film 240, that is, the first pixel electrode layer 211 and the flat protective layer 231, so that the alignment can be accurately performed according to the mark on the mask and the positions and sizes of the first pixel electrode layer 211 and the flat protective layer 231.

Referring to fig. 11, in the present embodiment, the first pixel electrode layer 211 on the surface of the partial non-display region B, the filter structure on the surface of the first pixel electrode layer 211, the flat protection layer 231 on the surface of the filter structure, and the second pixel electrode layer 241 on the surface of the flat protection layer 231 form a mark structure 250, and the mark structure 250 has a first thickness H1.

In this embodiment, the filtering structure includes: a red filter layer 2221, a filter layer 2222, and a blue filter layer 2223.

Before the light-shielding material film is formed, the order of formation of the first pixel electrode layer 211, the filter structure, the planarization protective layer 231, and the second pixel electrode layer 241 is not limited.

Referring to fig. 12, after the mark structure 250 is formed, a light-shielding material film 260 is formed on the display area a and the non-display area B, the light-shielding material film 260 has a second thickness H2, and the first thickness H1 is greater than the second thickness H2.

Since the mark structure 250 has the first thickness H1, the light-shielding material film 260 has the second thickness H2, and the first thickness H1 is greater than the second thickness H2, the sum of the thicknesses of the mark structure 250 and the light-shielding material film 260 is significantly higher than the height of the light-shielding material film 260, that is, the mark structure 250 on the non-display area B protrudes, so that the light reflected back by the mark structure 250 and the light-shielding material film 260 on the non-display area B is different from the light reflected back by the light-shielding material film 260 on the non-display area B. And further be favorable to follow-up through discerning the light condition difference that reflects back, realize more accurate counterpoint.

The ratio of the first thickness H1 to the second thickness H2 is greater than 2.

The first thickness H1 ranges from 1 micron to 15 microns; the second thickness H2 ranges from 0.5 microns to 2 microns.

The light-shielding material film 260 is made of a material having an optical density in a range of more than 3.5.

The material of the light shielding material film 260 includes: black photosensitive resin material or metallic chrome.

In the present embodiment, the material of the light-shielding material film 260 is a black photosensitive resin material.

Referring to fig. 13, the light-shielding material film 260 is patterned to form a light-shielding layer 270 in the light-shielding region II.

The light-shielding layer 270 is used to prevent crosstalk between the second color resist layers formed on the adjacent light-transmitting regions a.

The method of patterning the light shielding material film 260 includes: identifying the marking structure 250 and carrying out alignment processing; after the alignment treatment, an exposure process is performed on the light-shielding material film 260; after the exposure process, a development process and a baking process are performed to form the light shielding layer 270.

In other embodiments, after forming the light-shielding layer, a light-filtering structure is formed on the light-transmitting area, where the light-filtering structure includes a plurality of filter layers, and each light-transmitting area has one filter layer thereon; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

In the present embodiment, after the light-shielding layer 270 is formed, a spacer (not shown) is formed on the light-shielding region II.

The spacer is used for providing support between the first substrate 200 and a second substrate formed subsequently, so that the cavity between the first substrate and the second substrate is reduced to deform greatly, the stability of the thickness of the cavity is kept, and the display effect of the liquid crystal display panel is improved.

Accordingly, an embodiment of the present invention further provides a liquid crystal display substrate formed by the above method, with reference to fig. 12, including: the display panel comprises a first substrate 200, wherein the first substrate 200 comprises a display area A and a non-display area B, the display area A comprises a plurality of light transmission areas I and a plurality of light shading areas II, and the light shading areas II are positioned between adjacent light transmission areas I; the mark structure 250 is positioned on part of the surface of the non-display area B, and the mark structure 250 has a first thickness H1; a light-shielding material film 260 covering the surface of the mark structure 250 on the display area A and the non-display area B, the light-shielding material film 260 having a second thickness H2, and the first thickness H1 being greater than the second thickness H2.

The light-shielding material film 260 has a material with an optical density in a range of more than 3.5.

Correspondingly, the embodiment of the invention also provides a method for forming the liquid crystal display panel, which comprises the following steps: providing the liquid crystal display substrate; providing a second substrate; attaching the second substrate to the liquid crystal display substrate to form a cavity; and filling liquid crystal in the cavity.

Correspondingly, the embodiment of the invention also provides the liquid crystal display panel formed by adopting the method.

Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims

1. A method for forming a liquid crystal display substrate, comprising:

providing a first substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light-transmitting areas and a plurality of light-shielding areas, and the light-shielding areas are positioned between adjacent light-transmitting areas;

forming a mark structure on a part of the non-display area, wherein the mark structure has a first thickness;

after the mark structure is formed, a light-shielding material film is formed on the display region and the non-display region, the light-shielding material film has a second thickness, and the first thickness is greater than the second thickness.

2. The method of claim 1, wherein a ratio of the first thickness to the second thickness is greater than 2.

3. The method of forming a liquid crystal display substrate according to claim 2, wherein the first thickness is in a range of 1 to 15 micrometers; the second thickness ranges from 0.5 microns to 2 microns.

4. The method of forming a liquid crystal display substrate according to claim 1, wherein a material of the light-shielding material film has an optical density in a range of more than 3.5.

5. The method of forming a liquid crystal display substrate according to claim 1, wherein a material of the light-shielding material film comprises: black photosensitive resin material or metallic chrome.

6. The method of forming a liquid crystal display substrate according to claim 1, further comprising: before the light shading material film is formed, a light filtering structure is formed on the light transmitting areas, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

7. The method of forming a liquid crystal display substrate according to claim 6, further comprising: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

8. The method of forming a liquid crystal display substrate according to claim 6, further comprising: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

9. The method of forming a liquid crystal display substrate according to claim 1, further comprising: patterning the light-shielding material film to form a light-shielding layer on the light-shielding region; after the light shading layer is formed, a light filtering structure is formed on the light transmitting area, the light filtering structure comprises a plurality of light filtering layers, and each light transmitting area is provided with one light filtering layer; the filter layer is a red filter layer, a green filter layer or a blue filter layer.

10. The method of forming a liquid crystal display substrate according to claim 9, further comprising: forming a first pixel electrode layer on the display region before forming the filtering structure; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

11. The method of forming a liquid crystal display substrate according to claim 9, further comprising: after the light filtering structure is formed, a first pixel electrode layer is formed on the display area; after the first pixel electrode layer is formed, forming a second pixel electrode layer on the display area; and forming a spacer pillar on the light shielding region.

12. The method of forming a liquid crystal display substrate according to any one of claims 7, 8, 10 and 11, further comprising: and before the second pixel electrode layer is formed, a flat protective layer is formed on the display area, and the flat protective layer is positioned at the bottom of the second pixel electrode layer.

13. The method for forming a liquid crystal display substrate according to claim 12, wherein the first pixel layer is further located on a part of the non-display region; the marking structure includes: and a first pixel layer on the non-display area.

14. The method of forming a liquid crystal display substrate according to claim 12, wherein the second pixel layer is further located on a part of the non-display region; the marking structure includes: and a second pixel layer on the non-display area.

15. The method of claim 12, wherein the filter structure is further located on a portion of the non-display region; the marking structure includes: a light filtering structure on the non-display area; the thickness of the light filtering structure on the non-display area is smaller than or equal to that of the light filtering structure on the display area.

16. The method of forming a liquid crystal display substrate according to claim 12, wherein the flat protective layer is further provided on a part of the non-display region; the marking structure includes: a flat protective layer on the non-display area; the thickness of the flat protective layer on the non-display area is smaller than or equal to that of the flat protective layer on the display area.

17. A liquid crystal display substrate formed by the method of any one of claims 1 to 16, comprising:

the display device comprises a first substrate, a second substrate and a third substrate, wherein the first substrate comprises a display area and a non-display area, the display area comprises a plurality of light transmission areas and a plurality of light shading areas, and the light shading areas are positioned between adjacent light transmission areas;

the mark structure is positioned on part of the non-display area and has a first thickness;

and the shading material film is positioned on the display area and the non-display area and covers the surface of the mark structure, the shading material film has a second thickness, and the first thickness is greater than the second thickness.

18. A method for forming a liquid crystal display panel, comprising:

providing a liquid crystal display substrate according to claim 17;

providing a second substrate;

attaching the second substrate to the liquid crystal display substrate to form a cavity;

and filling liquid crystal in the cavity.

19. A liquid crystal display panel formed by the forming method according to claim 18.