CN112917364A - Panel finish polishing device - Google Patents
Panel finish polishing device Download PDFInfo
- Publication number
- CN112917364A CN112917364A CN202110176586.7A CN202110176586A CN112917364A CN 112917364 A CN112917364 A CN 112917364A CN 202110176586 A CN202110176586 A CN 202110176586A CN 112917364 A CN112917364 A CN 112917364A
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- China
- Prior art keywords
- vacuum adsorption
- fine polishing
- plate
- main machine
- adsorption platform
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/02—Frames; Beds; Carriages
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
- B24B47/04—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by mechanical gearing only
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to a plate fine polishing device which comprises a reciprocating feeding mechanism, a fine polishing main machine, a vacuum adsorption platform, a lifting mechanism and a spraying mechanism, wherein the reciprocating feeding mechanism is arranged on a gantry base, the vacuum adsorption platform is arranged on the reciprocating feeding mechanism, a plate is fixed on the vacuum adsorption platform in a vacuum adsorption mode, the fine polishing main machine is arranged in the middle of the gantry base and positioned above the plate, the fine polishing main machine is arranged on the lifting mechanism, the lifting mechanism is fixedly connected with the gantry base, the reciprocating feeding mechanism drives the vacuum adsorption platform and the plate to reciprocate, the fine polishing main machine grinds the plate passing through the lower part of the fine polishing main machine, the spraying mechanism is arranged on the outer side of the fine polishing main machine, and the spraying mechanism sprays grinding fluid onto a grinding station, so that the problem that the plate is inconvenient to fix is solved, Loose, large processing vibration, multiple manual operations and the like.
Description
Technical Field
The utility model relates to the technical field of machining, especially, relate to a panel finish polishing device.
Background
The traditional plate fine polishing machine has the defects of old machining mode, inconvenient and insecure plate fixation, large machining vibration, influence on machining precision, inconvenient adjustment of machining depth and the like. The above problems of the traditional abrasive belt fine polishing machine are highlighted day by day, and a new generation of plate fine polishing device capable of solving the problems becomes the most urgent requirement on the market.
Disclosure of Invention
The utility model aims to provide a panel finish polishing device adopts planer-type grinding, and the fixed middle part that sets up of finish polishing host computer adopts the vacuum adsorption mode to fix panel, and reciprocal feeding mechanism drives panel reciprocating motion and carries out the grinding operation to solve the current difficult problem that proposes in the above-mentioned background art.
In order to achieve the above purpose, the present disclosure provides the following technical solutions:
a plate fine polishing device comprises a reciprocating feeding mechanism, a fine polishing host, a vacuum adsorption platform, a lifting mechanism and a spraying mechanism, wherein the reciprocating feeding mechanism is arranged on a gantry base, the vacuum adsorption platform is arranged on the reciprocating feeding mechanism, a plate is fixed on the vacuum adsorption platform in a vacuum adsorption mode,
the fine polishing main machine is arranged in the middle of the gantry base and positioned above the plate, the fine polishing main machine is arranged on the lifting mechanism, the lifting mechanism is fixedly connected with the gantry base, the reciprocating feeding mechanism drives the vacuum adsorption platform and the plate to reciprocate, the fine polishing main machine grinds the plate passing below the fine polishing main machine,
the spraying mechanism is arranged on the outer side of the fine polishing main machine and sprays grinding fluid to a grinding station.
The vacuum adsorption platform is an open type vacuum adsorption platform, and the vacuum adsorption platform comprises one to six independent vacuum adsorption areas.
The vacuum adsorption platform further comprises water-gas separators, and the number of the water-gas separators is one to six.
And the grinding fluid separated by the water-gas separator flows into the automatic paper tape filter for filtering operation.
Further, the automatic paper tape filter adopts a triple filtering device: the first filtering is carried out by adopting a stainless steel filter screen; the second filtration adopts self-propelled filter paper for filtration; the third filtration adopts a sedimentation step type water tank, and the sedimentation step type water tank adopts self-overflow sedimentation filtration.
And elastic rubber compression roller mechanisms are further arranged on two sides of the fine polishing host machine, are arranged above the plates, and compress the plates below the elastic rubber compression roller mechanisms. The lifting mechanism is driven by a servo motor to lift, and is further provided with a servo motor soft limiting device and an upper travel switch limiting device and a lower travel switch limiting device.
The reciprocating feeding mechanism adopts a servo motor screw rod structure to drive the linear guide rail so as to achieve reciprocating motion.
And an eddy fan air knife is further arranged on the outer side of the fine polishing main machine and used for cutting air on the upper surface of the plate to remove the cutting fluid on the surface of the plate.
And a water retaining curtain is arranged on the outer side of the fine polishing main machine to block cutting fluid splashed in the machining process.
Compared with the prior art, the beneficial effect of this disclosure is:
1. the gantry base is adopted, the grinding mode of reciprocating motion of the fixed fine polishing main machine and the workpiece is adopted, the grinding work is stable, the grinding state is convenient to observe, the installation and the unloading are easy, the automatic operation is convenient to match, and the butt joint of the gantry base and the workpiece is convenient for modern industrial control.
2. The servo motor is used as power to drive the workpiece to reciprocate, the feeding amount and the feeding speed are adjustable, the automatic control is convenient, and the butt joint of the workpiece and the workpiece in the modern industrial control is convenient.
3. The vacuum adsorption mode is adopted to fix the plates, complex clamp clamping is not needed, fixing is convenient, manual operation is saved, automatic control is facilitated, and butt joint of modern industrial control is facilitated.
4. The vacuum adsorption platform is set to be one to a plurality of independent subareas, so that plates with different sizes can be conveniently fixed, and the stability and reliability of adsorption are enhanced.
5. And elastic rubber compression roller mechanisms are arranged on two sides of the fine polishing host machine and are used for assisting in compressing the plates, enhancing the stability of the workpiece and ensuring the processing precision.
6. The lifting mechanism is driven by a servo motor to lift, and is further provided with a servo motor soft limiting device and an upper travel switch limiting device and a lower travel switch limiting device, so that misoperation is effectively prevented, emergency stop is conveniently carried out when a fault occurs, the fine polishing host is lifted, the panel is separated, and grinding operation is stopped.
7. The spraying grinding fluid is adopted, so that the grinding operation is protected by the grinding fluid, and the influence on the processing precision and the service life of a grinding part of the grinding main machine due to overhigh temperature is avoided.
8. The paper bag filter adopts a multiple filtering device, effectively separates waste in the grinding fluid and recycles the grinding fluid.
Drawings
The accompanying drawings, which are included to provide a further understanding of the disclosure and are incorporated in and constitute a part of this specification, illustrate exemplary embodiments of the disclosure and together with the description serve to explain the principles of the disclosure.
Fig. 1 is a schematic structural diagram of a plate finishing polishing device according to the present disclosure.
Fig. 2 is a schematic view of a lifting structure of a plate polishing device according to the present disclosure.
Fig. 3 is a schematic view of an assembly of a plate finishing polishing device according to the present disclosure.
In the figure: the device comprises a reciprocating feeding mechanism-100, a fine polishing host-200, a vacuum adsorption platform-300, a lifting mechanism-400, a spraying mechanism-500, a gantry base-600, a plate-700, a water-gas separator-800, an automatic paper tape filter-900, an elastic rubber compression roller mechanism-1000 and a vortex fan air knife-1100.
Detailed Description
The present disclosure will be described in further detail with reference to the drawings and embodiments. It is to be understood that the specific embodiments described herein are for purposes of illustration only and are not to be construed as limitations of the present disclosure. It should be further noted that, for the convenience of description, only the portions relevant to the present disclosure are shown in the drawings.
It should be noted that the embodiments and features of the embodiments in the present disclosure may be combined with each other without conflict. The present disclosure will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
Referring to fig. 1-3, the present disclosure provides a technical solution:
a plate fine polishing device comprises a reciprocating feeding mechanism 100, a fine polishing host 200, a vacuum adsorption platform 300, a lifting mechanism 400 and a spraying mechanism 500, wherein the reciprocating feeding mechanism 100 is arranged on a gantry base 600, the vacuum adsorption platform 300 is arranged on the reciprocating feeding mechanism 100, a plate 700 is fixed on the vacuum adsorption platform 300 through vacuum adsorption,
the fine polishing main machine 200 is arranged in the middle of the gantry base 600 and above the plate 700, the fine polishing main machine 200 is mounted on the lifting mechanism 400, the lifting mechanism 400 is fixedly connected with the gantry base 600, the reciprocating feeding mechanism 100 drives the vacuum adsorption platform 300 and the plate 700 to reciprocate, and the fine polishing main machine 200 grinds the plate 700 passing below the fine polishing main machine.
The spraying mechanism 500 is arranged outside the fine polishing main machine 200, and the spraying mechanism 500 sprays the grinding fluid to the grinding station.
The vacuum adsorption stage 300 is an open vacuum adsorption stage 300, and the vacuum adsorption stage 300 includes one to six independent vacuum adsorption regions.
The open vacuum negative pressure adsorption system is adopted, the frequency conversion and speed regulation of the fan are realized, and the air quantity and the adsorption force are adjustable. Different vacuum adsorption areas can be selected and started according to the size of the plate.
The vacuum adsorption platform 300 further comprises water-gas separators 800, and the number of the water-gas separators 800 is one to six. A silencer is added at the air outlet of the vacuum adsorption platform 300 to reduce noise.
The grinding fluid separated by the automatic paper tape filter 900 and the water-gas separator 800 flows into the automatic paper tape filter 900 to be filtered.
The vacuum adsorption platform 300 is equipped with a water-gas separator 800 for grinding fluid separation and negative pressure air adsorption. By adopting a constant pressure adjustment method, pressure balance is achieved between the vacuum negative pressure adsorption pressure and the water tank water pressure and high pressure pump, so that water-gas separation is realized, and the separated grinding fluid flows back to the automatic paper tape filter 900.
The automatic tape filter 900 employs a triple filter device: the first filtering is carried out by adopting a stainless steel filter screen; the second filtration adopts self-propelled filter paper for filtration; the third filtration adopts a sedimentation step type water tank, and the sedimentation step type water tank adopts self-overflow sedimentation filtration.
And filtering by a first stainless steel filter screen to filter larger dust particles in the grinding fluid. The second filtering is performed by using 10-100 mu m filter paper, and the filter paper has an automatic paper feeding function, and the filter paper automatically feeds paper when the amount of filter dust reaches a certain amount. And a third settling step type water tank adopts a self-overflow mode to settle and isolate fine dust.
The two sides of the fine polishing host machine 200 are also provided with elastic rubber roller mechanisms 1000, the elastic rubber roller mechanisms 1000 are arranged above the plate 700, and the plate 700 below the elastic rubber roller mechanisms 1000 is compressed by the elastic rubber roller mechanisms 1000.
The two ends of the elastic rubber compression roller mechanism 1000 are provided with spring pressing devices, the pressure is adjustable, and the compression roller height is adjustable. The compression roller of the elastic rubber compression roller mechanism 1000 is made of elastic rubber materials, and one of the selectable materials is as follows: polyurethane glue, wear-resisting resistant oil effectively increases the frictional force between pay-off panel and the gyro wheel, can effectively prevent that the panel from skidding.
The lifting mechanism 400 is driven by a servo motor to lift, and the lifting mechanism 400 is further provided with a servo motor soft limiting device and an up-down travel switch limiting device.
The lifting mechanism 400 is controlled by the servo motor to lift, and the height position of the grinding head of the fine polishing host machine 200 is adjusted, so that the height difference between the grinding head of the fine polishing host machine 200 and the plate 700 is adjusted, and the adjustment of the grinding depth is completed.
The control system of the lifting mechanism 400 is provided with an emergency stop automatic rising function, and when an emergency occurs, the grinding machine head automatically rises, so that a workpiece is quickly separated from the main contact roller abrasive belt of the grinding station, the workpiece is effectively prevented from being damaged, and meanwhile, the grinding head of the fine polishing main machine 200 is prevented from being damaged.
One of the implementation modes of the servo motor soft limiting device and the up-down travel switch limiting device is as follows: set up the soft spacing of servo motor and upper and lower travel switch spacing on the lifter, duplicate protection prevents that servo motor from going up and down to exceed the stroke.
The reciprocating feeding mechanism 100 adopts a servo motor screw rod structure to drive a linear guide rail to achieve reciprocating motion. One of the specific implementation modes is as follows: the linear guide rail is arranged on the gantry base 600, the reciprocating component is arranged on the linear guide rail, the linear guide rail is driven by a screw rod structure of the servo motor to drive the reciprocating component to reciprocate, and the operation is stable and reliable.
The outer side of the fine polishing main machine 200 is also provided with a vortex fan air knife 1100 for performing air cutting treatment on the upper surface of the plate 700 to remove the cutting fluid on the surface of the plate 700.
The outer side of the fine polishing main machine 200 is also provided with a water retaining curtain, the water retaining curtain adopts common water retaining design and materials, one of the implementation modes is that common non-metal materials such as plastics and rubber or common metal materials such as stainless steel and aluminum are adopted for enclosure protection, and cutting fluid splashed in the machining process is blocked.
The working principle is as follows: the processing steps of the plate are as follows: placing a plate to be processed on a vacuum adsorption platform, starting the vacuum adsorption platform to vacuumize, and firmly adsorbing the plate on the vacuum adsorption platform; the reciprocating feeding mechanism is started to drive the plates to reciprocate, the plates passing below the precise polishing main machine are ground by the precise polishing main machine, the elastic rubber compression roller mechanism assists in compressing the plates to reduce machining vibration, and the spraying mechanism sprays grinding fluid to assist in grinding machining. The fine polishing main machine is arranged on the lifting mechanism, and the height of the lifting mechanism is adjusted, namely the height of a grinding head of the fine polishing main machine is adjusted, so that the grinding depth of grinding processing is adjusted, and grinding operation is performed step by step.
And the vacuum adsorption platform is provided with a water-gas separator, the water-gas separator is used for separating grinding fluid, the separated grinding fluid flows into the automatic paper tape filter for filtering and impurity removal, clean grinding fluid is obtained, and the grinding fluid is recycled.
Through the processing procedures, the plate fine polishing operation is completed.
In the description herein, reference to the description of the terms "one embodiment/mode," "some embodiments/modes," "example," "specific example," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment/mode or example is included in at least one embodiment/mode or example of the application. In this specification, the schematic representations of the terms used above are not necessarily intended to be the same embodiment/mode or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments/modes or examples. Furthermore, the various embodiments/aspects or examples and features of the various embodiments/aspects or examples described in this specification can be combined and combined by one skilled in the art without conflicting therewith.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present application, "plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
It will be understood by those skilled in the art that the foregoing embodiments are merely for clarity of illustration of the disclosure and are not intended to limit the scope of the disclosure. Other variations or modifications may occur to those skilled in the art, based on the foregoing disclosure, and are still within the scope of the present disclosure.
Claims (10)
1. The utility model provides a panel finish polishing device which characterized in that: comprises a reciprocating feeding mechanism, a fine polishing host machine, a vacuum adsorption platform, a lifting mechanism and a spraying mechanism, wherein the reciprocating feeding mechanism is arranged on a gantry base, the vacuum adsorption platform is arranged on the reciprocating feeding mechanism, a plate is fixed on the vacuum adsorption platform in a vacuum adsorption mode,
the fine polishing main machine is arranged in the middle of the gantry base and positioned above the plate, the fine polishing main machine is arranged on the lifting mechanism, the lifting mechanism is fixedly connected with the gantry base, the reciprocating feeding mechanism drives the vacuum adsorption platform and the plate to reciprocate, the fine polishing main machine grinds the plate passing below the fine polishing main machine,
the spraying mechanism is arranged on the outer side of the fine polishing main machine and sprays grinding fluid to a grinding station.
2. A sheet finishing polishing device according to claim 1, wherein: the vacuum adsorption platform is an open type vacuum adsorption platform, and the vacuum adsorption platform comprises one to six independent vacuum adsorption areas.
3. A sheet finishing polishing device according to claim 1, wherein: the vacuum adsorption platform further comprises water-gas separators, and the number of the water-gas separators is one to six.
4. A sheet finishing polishing device according to claim 3, wherein: the automatic paper tape filtering machine is characterized by further comprising an automatic paper tape filtering machine, and grinding liquid separated by the water-gas separator flows into the automatic paper tape filtering machine for filtering operation.
5. The sheet finishing polishing device according to claim 4, wherein: the automatic paper tape filter adopts a triple filtering device: the first filtering is carried out by adopting a stainless steel filter screen; the second filtration adopts self-propelled filter paper for filtration; the third filtration adopts a sedimentation step type water tank, and the sedimentation step type water tank adopts self-overflow sedimentation filtration.
6. A sheet finishing polishing device according to claim 1, wherein: and elastic rubber compression roller mechanisms are further arranged on two sides of the fine polishing host machine, are arranged above the plates, and compress the plates below the elastic rubber compression roller mechanisms.
7. A sheet finishing polishing device according to claim 1, wherein: the lifting mechanism is driven by a servo motor to lift, and is further provided with a servo motor soft limiting device and an upper travel switch limiting device and a lower travel switch limiting device.
8. A sheet finishing polishing device according to claim 1, wherein: the reciprocating feeding mechanism adopts a servo motor screw rod structure to drive the linear guide rail so as to achieve reciprocating motion.
9. A sheet finishing polishing device according to claim 1, wherein: and an eddy fan air knife is further arranged on the outer side of the fine polishing main machine and used for cutting air on the upper surface of the plate to remove the cutting fluid on the surface of the plate.
10. A sheet finishing polishing device according to claim 1, wherein: and a water retaining curtain is arranged on the outer side of the fine polishing main machine to block cutting fluid splashed in the machining process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110176586.7A CN112917364A (en) | 2021-02-09 | 2021-02-09 | Panel finish polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110176586.7A CN112917364A (en) | 2021-02-09 | 2021-02-09 | Panel finish polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112917364A true CN112917364A (en) | 2021-06-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110176586.7A Pending CN112917364A (en) | 2021-02-09 | 2021-02-09 | Panel finish polishing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112917364A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105965352A (en) * | 2016-06-13 | 2016-09-28 | 东莞市劲畅机械有限公司 | Precise plane abrasive belt grinding machine |
| CN108014919A (en) * | 2017-12-29 | 2018-05-11 | 无锡强工机械工业有限公司 | A kind of magnetic separator and paper tape filtering all-in-one machine |
| CN109732464A (en) * | 2019-03-08 | 2019-05-10 | 苏州亨允晟机电科技有限公司 | A kind of polishing mechanism being exclusively used in building stone and/or plate |
| CN111469019A (en) * | 2019-01-23 | 2020-07-31 | 湖南安冠智能科技有限公司 | Novel 3D glass polishing equipment |
-
2021
- 2021-02-09 CN CN202110176586.7A patent/CN112917364A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105965352A (en) * | 2016-06-13 | 2016-09-28 | 东莞市劲畅机械有限公司 | Precise plane abrasive belt grinding machine |
| CN108014919A (en) * | 2017-12-29 | 2018-05-11 | 无锡强工机械工业有限公司 | A kind of magnetic separator and paper tape filtering all-in-one machine |
| CN111469019A (en) * | 2019-01-23 | 2020-07-31 | 湖南安冠智能科技有限公司 | Novel 3D glass polishing equipment |
| CN109732464A (en) * | 2019-03-08 | 2019-05-10 | 苏州亨允晟机电科技有限公司 | A kind of polishing mechanism being exclusively used in building stone and/or plate |
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Application publication date: 20210608 |
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