CN112905049B - Touch substrate, preparation method thereof and display device - Google Patents
Touch substrate, preparation method thereof and display device Download PDFInfo
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- CN112905049B CN112905049B CN202110184210.0A CN202110184210A CN112905049B CN 112905049 B CN112905049 B CN 112905049B CN 202110184210 A CN202110184210 A CN 202110184210A CN 112905049 B CN112905049 B CN 112905049B
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- 239000000758 substrate Substances 0.000 title claims abstract description 234
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000010410 layer Substances 0.000 claims abstract description 347
- 239000002346 layers by function Substances 0.000 claims abstract description 36
- 229910052751 metal Inorganic materials 0.000 claims description 123
- 239000002184 metal Substances 0.000 claims description 123
- 238000000034 method Methods 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 19
- 230000001105 regulatory effect Effects 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 5
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 5
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- 239000011800 void material Substances 0.000 claims 1
- 230000000007 visual effect Effects 0.000 abstract description 25
- 229920002120 photoresistant polymer Polymers 0.000 description 40
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- 238000000576 coating method Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 9
- 239000003292 glue Substances 0.000 description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
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- 238000005530 etching Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 238000004383 yellowing Methods 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 2
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- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
Abstract
The embodiment of the disclosure provides a touch substrate, a preparation method thereof and a display device. The touch substrate includes a visual area, and the touch substrate includes: a cover substrate; the touch control structure layer is positioned on one side of the cover plate substrate; and the chromaticity functional layer is at least positioned in the visible area and is configured to reduce yellow chromaticity of the visible area of the touch substrate. The chromaticity functional layer can reduce the yellow chromaticity of the visible area of the touch substrate, and avoids the yellow chromaticity of the visible area of the touch substrate.
Description
Technical Field
The application relates to the technical field of display, in particular to a touch substrate, a preparation method thereof and a display device.
Background
In the field of touch, capacitive touch screen structures include GG (glass+glass) structures and OGM (OGS METAL MESH) structures. The GG structure is formed by jointing cover glass with touch glass. The touch screen with the GG structure has double-layer glass, is thick and heavy in whole and has poor experience. The touch screen with the OGM structure is used for manufacturing the touch control film layer on the cover plate glass, so that cover plate touch control integration is realized. Compared with the touch screen with the GG structure, the touch screen with the OGM structure has good experience effect, and is a structure which is relatively easy to use In the field of medium and large-size touch control, such as a notebook computer (NB), a function integrated machine (All In One, AIO), a vehicle-mounted device and the like.
The touch screen with the OWM structure in the prior art presents obvious yellowing problem in a visible area (VA area).
Disclosure of Invention
The embodiment of the application provides a touch substrate, a preparation method thereof and a display device, which are used for solving or relieving one or more technical problems in the prior art.
As an aspect of the embodiment of the present application, the embodiment of the present application provides a touch substrate, including a visible region, the touch substrate including:
A cover substrate;
The touch control structure layer is positioned on one side of the cover plate substrate; and
The chromaticity functional layer is positioned at least in the visible area and is configured to reduce yellow chromaticity of the visible area of the touch substrate.
In some possible implementations, the chromaticity functional layer includes a chromaticity adjusting layer, the chromaticity adjusting layer being located between the cover substrate and the touch-control structure layer, chromaticity index b of the chromaticity adjusting layer satisfying-3 < b < -1; or alternatively
The chromaticity functional layer comprises a chromaticity regulating layer, the chromaticity regulating layer is positioned on one side of the cover plate substrate, which is far away from the touch control structural layer, and the chromaticity index b of the chromaticity regulating layer meets the requirement of-3 < b < -1.
In some of the possible implementations of the present invention,
The material of the chromaticity regulating layer comprises niobium pentoxide; and/or the number of the groups of groups,
The chromaticity adjusting layer has a thickness of 150 to 250.
In some possible implementations, the touch structure layer includes a first metal layer, a first insulating layer, a second metal layer, and a second insulating layer that are sequentially stacked, the first metal layer facing the cover substrate,
The chromaticity functional layer comprises a first insulating layer, the first insulating layer is positioned on one side, away from the cover plate substrate, of the first metal layer, and at least one first hollow-out in the visible area is formed in the first insulating layer.
In some possible implementations, the first metal layer includes a first electrode located in the visible area, the first electrode is in a first grid shape, the first hollowed-out portion corresponds to a first grid defined by the first electrode, and orthographic projection of the first hollowed-out portion on the cover substrate is located in an orthographic projection range of the first grid on the cover substrate.
In some possible implementations, the touch structure layer includes a first metal layer, a first insulating layer, a second metal layer, and a second insulating layer that are sequentially stacked, the first metal layer facing the cover substrate,
The chromaticity functional layer comprises a second insulating layer, the second insulating layer is positioned on one side, away from the cover plate substrate, of the second metal layer, and at least one second hollow-out in the visible area is formed in the second insulating layer.
In some possible implementations, the second metal layer includes a second electrode located in the visible area, the second electrode is in a second grid shape, the second hollowed-out portion corresponds to a second grid defined by the second electrode, and orthographic projection of the second hollowed-out portion on the cover substrate is located in an orthographic projection range of the second grid on the cover substrate.
As another aspect of the embodiments of the present application, the embodiments of the present application provide a method for manufacturing a touch substrate, where the touch substrate includes a visible region, the method including:
Forming a touch control structure layer and a chromaticity functional layer on a cover plate substrate,
The touch structure layer is positioned on one side of the cover plate substrate, the chromaticity functional layer is at least positioned in the visible area and is configured to reduce yellow chromaticity of the visible area of the touch substrate.
In some possible implementations, forming the touch structure layer and the chromaticity functional layer on the cover substrate includes:
forming a chromaticity regulating layer on one side of the cover plate substrate, and forming a touch control structure layer on the other side of the cover plate substrate, wherein the chromaticity index b of the chromaticity regulating layer satisfies-3 < b < -1, or
Forming a chromaticity regulating layer on one side of the cover plate substrate, wherein the chromaticity index b of the chromaticity regulating layer satisfies-3 < b < -1; and forming a touch control structure layer on one side of the chromaticity adjusting layer, which is away from the cover plate substrate.
In some possible implementations, forming the touch structure layer includes:
Forming a first metal layer;
forming a first insulating layer on one side of the first metal layer, which is away from the cover plate substrate;
forming a second metal layer on one side of the first insulating layer, which is away from the cover plate substrate;
A second insulating layer is formed on a side of the second metal layer facing away from the cover substrate,
Wherein, at least one first fretwork that is located visual region has been seted up to first insulating layer, and/or at least one second fretwork that is located visual region has been seted up to the second insulating layer.
As still another aspect of the embodiments of the present application, the embodiments of the present application provide a display device, including a display substrate and a touch substrate in any one of the embodiments of the present disclosure, where the touch substrate is disposed opposite to the display substrate, and a side of the touch structure layer away from the cover substrate faces the display substrate.
According to the technical scheme, the chromaticity functional layer can reduce the yellow chromaticity of the visual area of the touch substrate, so that the chromaticity of the visual area of the touch substrate is prevented from being yellow, and the problem of yellow chromaticity of the visual area of the touch substrate can be effectively solved.
The foregoing summary is for the purpose of the specification only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features of the present application will become apparent by reference to the drawings and the following detailed description.
Drawings
In the drawings, the same reference numerals refer to the same or similar parts or elements throughout the several views unless otherwise specified. The figures are not necessarily drawn to scale. It is appreciated that these drawings depict only some embodiments according to the disclosure and are not therefore to be considered limiting of its scope.
Fig. 1 is a schematic structural diagram of a touch substrate in the related art;
FIG. 2 is a schematic diagram of a touch substrate according to an embodiment of the disclosure;
FIG. 3 is a schematic diagram of a touch substrate according to an embodiment of the disclosure;
FIG. 4 is a schematic top view of a touch substrate according to an embodiment of the disclosure after forming a first metal layer;
FIG. 5 is a schematic top view of a touch substrate according to an embodiment of the disclosure after forming a first insulating layer;
FIG. 6 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure;
FIG. 7 is a schematic diagram of a structure of a touch substrate after a light shielding layer is formed in the touch substrate according to an embodiment of the disclosure;
Fig. 8 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure after a first insulating layer is formed.
Reference numerals illustrate:
11. A cover substrate; 12. a light shielding layer; 13. a protective layer; 14. a first metal layer; 141. a first electrode; 142. a first metal wire; 15. a first insulating layer; 151. a first functional portion; 152. a first insulating portion; 153. a first hollow; 16. a second metal layer; 161. a second electrode; 162. a second metal wire; 17. a second insulating layer; 171. a second functional portion; 172. a second insulating portion; 173. a second hollow; 20. a touch control structure layer; 21. and a chromaticity adjusting layer.
Detailed Description
Hereinafter, only certain exemplary embodiments are briefly described. As will be recognized by those of skill in the pertinent art, the described embodiments may be modified in various different ways without departing from the spirit or scope of the present application. Accordingly, the drawings and description are to be regarded as illustrative in nature and not as restrictive.
The CIE LiW chromaticity space of the International Commission on illumination (CIE, commission Internationale de L' Eclairage/International) is one of the earliest models used. It is a three-dimensional model in which the x and y dimensions define color and the 3 rd dimension defines luminance. The CIE specified two color spaces in 1976. One is a color space for self-illumination called CIE LUV. Another color space for non-self-illumination is called CIE 1976 lxab, or CIE LAB.
The coordinates used by the CIE LAB system are called color-versus-color coordinates (opponent color coordinate). CIE LAB defines the CIE color space using the b, a and L coordinate axes. Wherein, the value L represents the luminance, and the value thereof ranges from 0 (black) to 100 (white). b and a represent chromaticity coordinates, where a represents the red-green axis, b represents the yellow-blue axis, and their values range from 0 to 10. a=b=0 represents colorless, and thus L represents a scale factor from black to white.
Brightness index L (luminance axis) represents black and white, 0 is black, 100 is white, and between 0 and 100 is gray. Chromaticity index a (red-green axis), positive for red and negative for green. Chromaticity index b (Huang Lanzhou), positive for yellow and negative for blue.
Fig. 1 is a schematic structural diagram of a touch substrate in the related art. As shown in fig. 1, the touch substrate may include a cover substrate 11, a light shielding layer 12, a protective layer 13, a first metal layer 14, a first insulating layer 15, a second metal layer 16, and a second insulating layer 17. The touch substrate comprises a visual area (VA area) and a frame area positioned at the periphery of the visual area.
The light shielding layer 12 is located at one side of the cover substrate 11, and the light shielding layer 12 is located in the visible region. The protective layer 13 is located on a side of the light shielding layer 12 facing away from the cover substrate 11. The first metal layer 14 is located on a side of the protective layer 13 facing away from the cover substrate 11, and the first metal layer 14 includes a first electrode 141 located in the visible region and a first metal trace 142 located in the frame region. The first electrode 141 has a first mesh shape in the visible region. The first insulating layer 15 is located on the side of the first metal layer 14 facing away from the cover substrate 11. The second metal layer 16 is located on a side of the first insulating layer 15 facing away from the cover substrate 11, and the second metal layer 16 includes a second electrode 161 located in the visible region and a second metal trace 162 located in the frame region. The second electrode 162 has a second mesh shape in the visible region. The second insulating layer 17 is located on the side of the second metal layer 16 facing away from the cover substrate 11.
The preparation process of the touch substrate shown in fig. 1 may include:
Tempered glass is selected as a cover plate substrate, and ultrasonic cleaning is performed on the cover plate substrate 11. A light shielding layer 12 is formed on one side of the cover substrate 11 and located in the frame area, and a yellow light coating and developing process may be used in the process of manufacturing the light shielding layer. A protective layer 13 is formed on a side of the light shielding layer 12 away from the cover substrate 11, and the protective layer 13 is made of an organic material, for example, a photoresist insulating protective layer (may also be called a photoresist OC), and in the process of forming the protective layer 13, a yellow light coating and developing process may be adopted, and curing is performed by baking at a high temperature of 200 ℃ for about 30 minutes. The first metal layer 14 is formed on the side of the protective layer 13 away from the cover substrate 11, and in the process of forming the first metal layer 14, a magnetron sputtering technology, a yellow light development and an etching process may be adopted, where the first metal layer 14 includes a first electrode 141 located in the visible region and a first metal wire 142 located in the frame region. The first insulating layer 15 is formed on the side of the first metal layer 14 facing away from the cover substrate 11, and the material of the first insulating layer 15 is an organic substance, for example, a photoresist OC, and in the process of forming the first insulating layer 15, a yellow light coating and developing process may be adopted, and curing is required to be performed by baking at a high temperature of 200 ℃ for about 30 minutes. In the process of forming the second metal layer 16 on the side of the first insulating layer 15 facing away from the cover substrate 11, a magnetron sputtering technology, a yellow light development and an etching process may be used to form the second metal layer 16, where the second metal layer 16 includes a second electrode 161 located in the visible region and a second metal trace 162 located in the frame region. The second insulating layer 17 is formed on the side of the second metal layer 16 facing away from the cover substrate, and the material of the second insulating layer 17 is an organic substance, for example, photoresist OC, and in the process of forming the second insulating layer 17, a yellow light coating and developing process may be adopted, and curing is required to be performed by baking at a high temperature of 200 ℃ for about 30 minutes.
As can be seen from the manufacturing process of the touch substrate shown in fig. 1, in the related art, the protection layer 13, the first insulation layer 15 and the second insulation layer 17 are all located in the visible region and the frame region, and the materials of the protection layer 13, the first insulation layer 15 and the second insulation layer 17 are usually organic materials, such as insulation protection glue. In the process of preparing the touch substrate, the insulating protective glue (OC glue) is used for multiple times, and the insulating protective glue needs to be baked at high temperature for multiple times. The OC glue is darkened by high temperature baking, which finally results in the visual area of the touch substrate exhibiting a distinct color shift, that is, the chromaticity index b of the visual area of the touch substrate shown in fig. 1 is greater than 0, and the average value is about 2.46.
In order to solve the above technical problems, an embodiment of the disclosure provides a touch substrate.
Fig. 2 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure. As shown in fig. 2, the touch substrate includes a visual area and a frame area located at the periphery of the visual area. The touch substrate may include a cover substrate 11 and a touch structure layer 20 disposed on one side of the cover substrate 11. The touch substrate may further include a chromaticity functional layer located at least in the visible region, the chromaticity functional layer configured to reduce yellow chromaticity of the visible region of the touch substrate.
According to the touch substrate disclosed by the embodiment of the invention, the chromaticity functional layer can reduce the yellow chromaticity of the visual area of the touch substrate, so that the chromaticity of the visual area of the touch substrate is prevented from being yellow, and the problem of yellow chromaticity of the visual area can be effectively solved.
In one embodiment, as shown in fig. 2, the touch structure layer 20 includes a first metal layer 14, a first insulating layer 15, a second metal layer 16, and a second insulating layer 17 that are sequentially stacked. The first metal layer 14 faces the cover substrate 11, the first insulating layer 15 is located on the side of the first metal layer 14 facing away from the cover substrate 11, the second metal layer 16 is located on the side of the first insulating layer 15 facing away from the cover substrate 11, and the second insulating layer 17 is located on the side of the second metal layer 16 facing away from the cover substrate 11.
In one embodiment, the chromaticity functional layer includes a chromaticity adjusting layer 21, and the chromaticity adjusting layer 21 may be located between the cover substrate 11 and the touch structure layer 20, and the chromaticity adjusting layer 21 is located at least in the visible region. The chromaticity index b of the chromaticity adjusting layer 21 satisfies-3 < b < -1. For example, the chromaticity index b may be any value greater than-3 and less than-1.
In one embodiment, the chromaticity functional layer includes a chromaticity adjusting layer, and the chromaticity adjusting layer may be located on a side of the cover substrate facing away from the touch structure layer, and the chromaticity adjusting layer is located at least in the visible region. The chromaticity index b of the chromaticity adjusting layer satisfies-3 < b < -1.
In one embodiment, the material of the chromaticity adjusting layer may include niobium pentoxide. It is understood that the material of the chromaticity adjusting layer is not limited to niobium pentoxide, and the chromaticity adjusting layer may be made of other materials, so long as the chromaticity index b of the chromaticity adjusting layer satisfies-3 < b < -1.
It is understood that the first insulating layer 15 and the second insulating layer 17 may use an insulating protective paste, and the insulating protective paste (OC paste) is used several times during the process of preparing the touch substrate, and it is required to bake the insulating protective paste several times at high temperature. The high temperature baking causes the OC glue to yellow in color, ultimately resulting in a visible area exhibiting a pronounced yellow tint.
In the embodiment of the disclosure, the chromaticity index b of the chromaticity adjusting layer 21 satisfies-3 < b < -1 >, so that the chromaticity adjusting layer 21 is self-chromaticity blue, not only can the chromaticity uniformity of the touch substrate be adjusted, but also the chromaticity blue of the chromaticity adjusting layer 21 can be neutralized with the chromaticity yellow of the OC glue, and the chromaticity of the visual area of the touch substrate is adjusted, so that the chromaticity index b of the visual area of the touch substrate is close to 0, thereby effectively improving the chromaticity yellow problem of the visual area of the touch substrate. If the chromaticity index b of the chromaticity adjusting layer is less than-3, the chromaticity adjusting layer 21 is seriously blued, and the finally obtained visual area of the touch substrate is blued; if the chromaticity index b of the chromaticity adjusting layer is greater than-1, the bluish color of the chromaticity adjusting layer cannot be completely neutralized with the yellowish phase of the OC gum. The chromaticity index b of the chromaticity adjusting layer is set to be less than-3 and less than-1, so that the chromaticity of the chromaticity adjusting layer 21 is enabled to be in the blue-yellow phase with the chromaticity of the OC glue, the blue-blue of the visible area of the touch substrate is not caused, the chromaticity index b of the visible area of the touch substrate is enabled to be close to 0, and the chromaticity of the visible area of the touch substrate is effectively improved.
The touch substrate in the embodiments of the disclosure may be applied to a display device, for example, a touch display device. In the display device, the touch structure layer of the touch substrate faces the display substrate. The chromaticity adjusting layer is arranged between the cover plate substrate and the touch control structural layer, or is arranged on one side of the cover plate substrate, which is away from the touch control structural layer, so that the chromaticity adjusting layer is far away from the display substrate relative to the touch control structural layer, and therefore, the chromaticity adjusting layer can weaken the film layer pattern in the display substrate or the touch control structural layer, and the visual experience of the display device is improved.
In one embodiment, as shown in fig. 2, the touch structure layer 20 may further include a light shielding layer 12 and a protective layer 13. The light shielding layer 12 may be located at a side of the cover substrate 11 facing the first metal layer 14, and the protective layer 13 is located at a side of the light shielding layer 12 facing away from the cover substrate 11. The first metal layer 14 is located on the side of the protective layer 13 facing away from the cover substrate 11. The chromaticity adjusting layer 21 is located between the cover substrate 11 and the light shielding layer 12. The touch substrate may further include a frame region located at the periphery of the visible region, where the light shielding layer 12 is located.
In one embodiment, the thickness of the chromaticity adjusting layer 21 may be 150 to 250 angstroms. Illustratively, the thickness of the chromaticity adjusting layer 21 may be any value from 150 to 250 angstroms. For example, the thickness of the chromaticity adjusting layer 21 may be any one of 150, 160, 170, 180, 190, 200, 210, 220, 230, 240, 250. The thickness of the chromaticity adjusting layer 21 is set to be 150-250, so that the chromaticity yellowing of the OC glue can be well adjusted, the chromaticity yellowing problem of a visible area is effectively improved, and the whole thickness of the touch substrate is not influenced.
In one embodiment, the cover substrate 11 may employ glass, for example, high-strength tempered glass. The stress value of the cap substrate 11 may be 300MPa to 450MPa (inclusive), the stress depth may be 8 μm to 12 μm (inclusive), and the thickness of the cap substrate 11 may be 0.4mm to 1.1mm.
The material of the light shielding layer 12 may include a photoresist, and illustratively, the material of the light shielding layer 12 may include carbon black, a polymer resin, a sensitizer, and the like. The thickness of the light shielding layer 12 may be any value from 1.2 μm to 1.8 μm (inclusive), and illustratively, the thickness of the light shielding layer 12 may be any value from 1.2 μm, 1.3 μm, 1.4 μm, 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm.
The material of the protective layer 13 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the protective layer 13 may be 1.5 μm to 2.5 μm (inclusive). The thickness of the protective layer 13 may be any one of 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm, 1.9 μm, 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, for example.
The first metal layer 14 may be a composite metal layer, for example, the first metal layer 14 may be a composite layer of molybdenum, copper, molybdenum, and the thickness of the first metal layer 14 may be 150 to 250 (inclusive). Illustratively, the thickness of the first metal layer 14 may be any of 150, 160, 170, 180, 190, 200, 210, 220, 230, 240, 250 meters.
In one embodiment, the first metal layer 14 may include a first electrode 141 located in the visible region and a first metal trace 142 located in the bezel region. The first electrode 141 has a first mesh shape in the visible region.
The material of the first insulating layer 15 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the first insulating layer 15 may be 1.5 μm to 2.5 μm (inclusive). The thickness of the protective layer 13 may be any one of 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm, 1.9 μm, 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, for example.
The second metal layer 16 may be a composite metal layer, for example, the second metal layer 16 may be a composite layer of molybdenum, copper, molybdenum, and the thickness of the second metal layer 16 may be 150 to 250 (inclusive). Illustratively, the thickness of the second metal layer 16 may be any of 150, 160, 170, 180, 190, 200, 210, 220, 230, 240, 250 meters.
In one embodiment, the second metal layer 16 may include a second electrode 161 located in the visible region and a second metal trace 162 located in the bezel region. The second electrode 161 has a second mesh shape in the visible region.
The material of the second insulating layer 17 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the second insulating layer 17 may be 1.5 μm to 2.5 μm (inclusive). The thickness of the protective layer 13 may be any one of 1.5 μm, 1.6 μm, 1.7 μm, 1.8 μm, 1.9 μm, 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, for example.
Fig. 3 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure, fig. 4 is a schematic plan view of the touch substrate according to an embodiment of the disclosure after forming a first metal layer, and fig. 5 is a schematic plan view of the touch substrate according to an embodiment of the disclosure after forming a first insulating layer. In one embodiment, as shown in fig. 3 and 5, the chromaticity functional layer may further include a first insulating layer 15. The first insulating layer 15 is located on a side of the first metal layer 14 facing away from the cover substrate 11, and the first insulating layer 15 covers an outer surface of the first metal layer 14. The first insulating layer 15 is provided with at least one first hollow 153, and the first hollow 153 is located in the visible area.
The first hollow 153 can reduce the area of the first insulating layer 15 in the visible area, so as to reduce the yellow chromaticity problem caused by the photoresist OC in the visible area of the touch substrate.
In one embodiment, the first insulating layer 15 includes a first functional portion 151 located in the visible region and a first insulating portion 152 located in the bezel region, and the first functional portion 151 may correspond to the first electrode 141. As illustrated in fig. 4 and 5, the first electrode 141 has a first mesh shape. The first hollowed-out portions 153 may correspond to the first grids defined by the first electrodes 141, and the first hollowed-out portions 153 are located in the corresponding grids defined by the first electrodes 141, that is, orthographic projection of the first hollowed-out portions on the cover substrate is located in orthographic projection range of the first grids on the cover substrate, and the first hollowed-out portions may correspond to the first grids defined by the first electrodes one to one. Thus, the first functional part 151 may have a mesh shape corresponding to the first electrode 141. The first hollows are formed as a mesh defined by the first functional portions 151, and the first hollows are smaller than the mesh defined by the first electrodes. In another embodiment, the first electrode may be a stripe-shaped electrode, and the first functional portion may be a stripe-shape corresponding to the first electrode. The first hollows may be located between adjacent strip electrodes. Therefore, the first insulating layer 15 is provided with a plurality of first hollows in the visible area, so that the area of the first insulating layer in the visible area is further reduced, and the problem of yellow chromaticity in the visible area is further reduced.
Fig. 6 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure. In one embodiment, as shown in fig. 6, the chromaticity functional layer may further include a second insulating layer 17. The second insulating layer 17 covers the outer surface of the second metal layer 16. The second insulating layer 17 is provided with at least one second hollow 173, and the second hollow 173 is located in the visible area.
The second hollow 173 can reduce the area of the second insulating layer 17 in the visible region, so as to reduce the yellow chromaticity problem caused by the photoresist OC in the visible region.
In one embodiment, the second insulating layer 17 includes a second functional portion 171 located in the visible region, and the second functional portion 171 may correspond to the second electrode 161. The second electrode 161 may be in a second mesh shape, for example. The second hollowed-out portions 173 may correspond to the second grids defined by the second electrodes 161, and the second hollowed-out portions 173 are located in the corresponding grids defined by the second electrodes 161, that is, the orthographic projection of the second hollowed-out portions on the cover substrate is located in the orthographic projection range of the second grids on the cover substrate, and the second hollowed-out portions may correspond to the grids defined by the second electrodes one by one. Thus, the second functional portion 171 may have a mesh shape corresponding to the second electrode 161. The second hollows are formed as a mesh defined by the second functional portion 171, and the second hollows are smaller than the mesh defined by the second electrode. In another embodiment, the second electrode is a stripe-shaped electrode, and the second functional portion may be a stripe-shape corresponding to the second electrode. The second hollows may be located between adjacent strip electrodes. Therefore, the second insulating layer 17 is provided with a plurality of second hollows in the visible area, so that the area of the second insulating layer in the visible area is further reduced, and the problem of yellow chromaticity in the visible area is further reduced.
The touch substrate of the embodiment of the present disclosure may be a capacitive touch substrate, and one of the first electrode 141 and the second electrode 151 is an induction electrode, and the other is a driving electrode. For example, the first electrode 141 may be a sensing electrode and the second electrode 151 may be a driving electrode.
In one embodiment, the chromaticity functional layer may include a first insulating layer 15 and a second insulating layer 17. The first insulating layer 15 covers the outer surface of the first metal layer 14. The first insulating layer 15 is provided with a first hollow 153, and the first hollow 153 is located in a visible area. The second insulating layer 17 covers the outer surface of the second metal layer 16. The second insulating layer 17 is provided with a second hollow 173, and the second hollow 173 is located in the visible area. For example, the first and second hollows may have overlapping areas.
In one embodiment, the first mesh may be a parallelogram mesh, such as a diamond mesh; the second mesh may be a parallelogram mesh, such as a diamond mesh. In other embodiments, the first grid shape and the second grid shape may be grids with other shapes, and may be set according to actual needs.
In order to evaluate the touch substrate in the embodiments of the present disclosure, actual measurement is performed on the chromaticity index b of the visual area of the touch substrate shown in fig. 1,2 and 3, respectively. Table 1 shows the measured chromaticity index b.
TABLE 1
As can be seen from table 1, the average value of the chromaticity index b of the touch substrate shown in fig. 1 is 2.46, and the chromaticity of the touch substrate shown in fig. 1 is yellow.
With respect to the touch substrate shown in fig. 1, the touch substrate shown in fig. 2 is provided with a chromaticity adjusting layer 21. The chromaticity adjusting layer 21 can neutralize the yellow of the photoresist OC in the touch substrate and offset a part of yellow chromaticity, so that the average value of chromaticity index b in the visual area of the touch substrate is reduced to 1.55. Compared with the touch substrate shown in fig. 1, the technical scheme shown in fig. 2 improves the problem of yellow chromaticity of the touch substrate.
With respect to the touch substrate shown in fig. 1, the touch substrate shown in fig. 3 is provided with a chromaticity adjusting layer 21, and the first insulating layer 15 is provided with a first hollow 153 located in the visible region. The chromaticity adjusting layer 21 can neutralize the yellow of the photoresist OC in the touch substrate to offset a part of yellow chromaticity, and the coverage area of the first insulating layer 15 in the visible area is greatly reduced by the arrangement of the first hollow 153, so that the average value of chromaticity index b in the visible area of the touch substrate is reduced to 0.53. Compared with the touch substrate shown in fig. 1, the technical scheme shown in fig. 3 greatly improves the problem of yellow chromaticity of the touch substrate.
The embodiment of the disclosure also provides a preparation method of the touch substrate, wherein the touch substrate comprises a visual area and a frame area positioned at the periphery of the visual area. The preparation method of the touch substrate can comprise the following steps:
And forming a touch control structure layer and a chromaticity functional layer on the cover plate substrate, wherein the touch control structure layer is positioned on one side of the cover plate substrate, and the chromaticity functional layer is positioned at least in a visible area and is configured to reduce yellow chromaticity of the visible area of the touch control substrate.
In one embodiment, forming a touch structure layer and a chromaticity functional layer on a cover substrate includes: and forming a chromaticity regulating layer on one side of the cover plate substrate, and forming a touch control structure layer on the other side of the cover plate substrate, wherein the chromaticity index b of the chromaticity regulating layer satisfies the formula-3 & ltb & lt-1, and the chromaticity functional layer comprises the chromaticity regulating layer.
In one embodiment, forming a touch structure layer and a chromaticity functional layer on a cover substrate includes: forming a chromaticity regulating layer on one side of the cover plate substrate, wherein the chromaticity index b of the chromaticity regulating layer satisfies-3 < b < -1; and forming a touch control structure layer on one side of the chromaticity adjusting layer, which is away from the cover plate substrate, wherein the chromaticity functional layer comprises the chromaticity adjusting layer.
In one embodiment, forming the touch structure layer may include: forming a first metal layer; forming a first insulating layer on one side of the first metal layer, which is away from the cover plate substrate; forming a second metal layer on one side of the first insulating layer, which is away from the cover plate substrate; and forming a second insulating layer on one side of the second metal layer, which is away from the cover plate substrate, wherein the first insulating layer is provided with at least one first hollow-out in a visible area, the chromaticity functional layer comprises a chromaticity adjusting layer and the first insulating layer, and/or the second insulating layer is provided with at least one second hollow-out in the visible area, and the chromaticity functional layer comprises a chromaticity adjusting layer and the second insulating layer.
The technical solution of the embodiments of the present disclosure is described in detail below with reference to the touch substrate shown in fig. 3. It should be understood that, as used herein, the term "patterning" includes processes such as photoresist coating, mask exposure, development, etching, photoresist stripping, etc. when the patterned material is inorganic or metal, and processes such as mask exposure, development, etc. when the patterned material is organic, evaporation, deposition, coating, etc. are all well-known processes in the related art.
FIG. 7 is a schematic diagram of a structure of a touch substrate after a light shielding layer is formed in the touch substrate according to an embodiment of the disclosure; fig. 8 is a schematic structural diagram of a touch substrate according to an embodiment of the disclosure after a first insulating layer is formed. The preparation process of the touch substrate may include the following steps:
S11, a chromaticity adjusting layer 21 is formed on one side of the cover substrate 11. This step may include: cleaning the cover substrate 11 with ultrasonic waves; then, a chromaticity adjusting film is deposited on one side of the cover substrate 11 to form a chromaticity adjusting layer 21, and illustratively, niobium pentoxide may be vacuum-sputtered on one side of the cover substrate 11 by using a magnetron sputtering technique to form the chromaticity adjusting layer 21, as shown in fig. 7.
And S12, forming a touch control structure layer 20 on one side of the chromaticity adjusting layer 21 away from the cover plate substrate 11. S12 may include steps S121 to S126.
S121: a light shielding layer 12 is formed on a side of the chromaticity adjusting layer 21 facing away from the cover substrate 11, and the light shielding layer 12 is located in the frame region. Illustratively, a coating process (e.g., yellow light coating) may be used to coat a light-shielding film on the side of the chromaticity adjusting layer 21 facing away from the cover substrate 11; the light shielding film is exposed and developed to remove the light shielding film in the visible region, and the light shielding film in the frame region is left, and the light shielding film in the frame region is formed as a light shielding layer 12, as shown in fig. 7. The material of the light shielding layer 12 may include a photoresist, and the thickness of the light shielding layer 12 may be any value from 1.2 μm to 1.8 μm (inclusive).
S122: a protective layer 13 is formed on a side of the light shielding layer 12 facing away from the cover substrate 11. Illustratively, a yellow light coating process may be employed to coat a protective film on the side of the light shielding layer 12 facing away from the cover substrate 11; the protective film is baked at high temperature to form a protective layer 13, and the protective layer 13 is located in the visible region and the frame region as shown in fig. 8. The baking temperature may be 180 ℃ to 220 ℃ (inclusive), for example, the baking temperature may be any one of 180 ℃, 190 ℃, 200 ℃, 210 ℃, 220 ℃. The baking time may be 25 minutes to 35 minutes (inclusive). In practical implementation, the temperature and time of baking can be set according to practical requirements.
The material of the protective layer 13 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the protective layer 13 may be 1.5 μm to 2.5 μm (inclusive).
S123: the first metal layer 14 is formed on a side of the protective layer 13 facing away from the cover substrate 11, and the first metal layer 14 includes a first electrode 141 located in the visible region and a first metal wire 142 located in the frame region. Illustratively, a first metal film is deposited on the side of the protective layer 13 facing away from the cover substrate 11, and illustratively, the first metal film may include a first molybdenum metal film, a copper metal film, and a second molybdenum metal film deposited in this order; coating photoresist on the upper side of the first metal film by adopting a yellow light coating process, exposing and developing the photoresist, reserving the photoresist positioned at the first metal layer, and removing the photoresist at other positions to expose the first metal film; the exposed first metal film is etched, and the remaining photoresist is stripped to form a first metal layer 14, and the first metal layer 14 includes a first electrode 141 located in a visible region and a first metal trace 142 located in a frame region, as shown in fig. 8. Illustratively, the first metal film may have a thickness of 150 to 250 (inclusive).
It is understood that the first metal trace 142 is connected to the first electrode 141. For example, a magnetron sputtering technique may be used for deposition of the metal film, and a yellow development may be used.
S124: a first insulating layer 15 is formed on a side of the first metal layer 14 facing away from the cover substrate 11, the first insulating layer 15 covers an outer surface of the first metal layer 14, and at least one first hollow 153 located in a visible area is formed on the first insulating layer 15. Illustratively, a yellow light coating process may be employed to coat a first insulating film on a side of the first metal layer 14 facing away from the cap substrate 11; the first insulating film is exposed and developed, the first insulating film located at the first hollowed-out position is removed, and the remaining first insulating film is baked at high temperature to form a first insulating layer 15. The first insulating layer 15 is provided with at least one first hollow 153 located in the visible area, the first insulating layer 15 in the visible area covers the outer surface of the first electrode 141, and the first insulating layer 15 in the frame area covers the outer surface of the first metal wire 142, as shown in fig. 8. The baking temperature may be 180 ℃ to 220 ℃ (inclusive), for example, the baking temperature may be any one of 180 ℃, 190 ℃,200 ℃, 210 ℃, 220 ℃. The baking time may be 25 minutes to 35 minutes (inclusive). In practical implementation, the temperature and time of baking can be set according to practical requirements.
Illustratively, the material of the first insulating layer 15 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the first insulating layer 15 may be 1.5 μm to 2.5 μm (inclusive).
S125: a second metal layer 16 is formed on a side of the first insulating layer 15 facing away from the cover substrate 11, and the second metal layer 16 includes a second electrode 161 located in the visible region and a second metal trace 162 located in the frame region. Illustratively, a second metal film is deposited on the side of the protective layer 13 facing away from the cover substrate 11, and illustratively, the second metal film may include a third molybdenum metal film, a copper metal film, and a fourth molybdenum metal film deposited in this order; coating photoresist on the upper side of the second metal film by adopting a yellow light coating process, exposing and developing the photoresist, reserving the photoresist positioned at the position of the second metal layer, and removing the photoresist at other positions to expose the second metal film; the exposed second metal film is etched, and the remaining photoresist is stripped to form a second metal layer 16, and the second metal layer 16 includes a second electrode 161 located in the visible region and a second metal trace 162 located in the frame region, as shown in fig. 3. Illustratively, the second metal film may have a thickness of 150 to 250 angstroms (inclusive)
It is understood that the second metal trace 162 is connected to the second electrode 161. For example, a magnetron sputtering technique may be used for deposition of the metal film, and a yellow development may be used.
S126: a second insulating layer 17 is formed on the side of the second metal layer 16 facing away from the cover substrate 11. Illustratively, a yellow light coating process may be employed to coat a second insulating film on a side of the second metal layer 16 facing away from the cap substrate 11; the first insulating film is baked at high temperature to form a second insulating layer 17, and the second insulating layer 17 is located in the viewing area and the frame area, as shown in fig. 3. The baking temperature may be 180 ℃ to 220 ℃ (inclusive), for example, the baking temperature may be any one of 180 ℃, 190 ℃, 200 ℃, 210 ℃, 220 ℃. The baking time may be 25 minutes to 35 minutes (inclusive). In practical implementation, the temperature and time of baking can be set according to practical requirements.
The material of the second insulating layer 17 may be an insulating protective photoresist, such as a photoresist OC, which is a transparent insulating protective photoresist. The thickness of the second insulating layer 17 may be 1.5 μm to 2.5 μm (inclusive).
The touch substrate shown in fig. 2 may include S21 and S22, wherein S21 may be the same as S11. S22 may include steps S221 to S226, where S221 may be the same as S121, S222 may be the same as S122, S223 may be the same as S123, S225 may be the same as S125, and S226 may be the same as S126.
S224: a first insulating layer 15 is formed on a side of the first metal layer 14 facing away from the cover substrate 11. Illustratively, a yellow light coating process may be employed to coat a first insulating film on a side of the first metal layer 14 facing away from the cap substrate 11; the first insulating film is baked at high temperature to form the first insulating layer 15. The first insulating layer 15 is located in the visible region and the frame region as shown in fig. 2. The baking temperature may be 180 ℃ to 220 ℃ (inclusive), for example, the baking temperature may be any one of 180 ℃, 190 ℃, 200 ℃, 210 ℃, 220 ℃. The baking time may be 25 minutes to 35 minutes (inclusive). In practical implementation, the temperature and time of baking can be set according to practical requirements.
The embodiment of the disclosure also provides a display device, which comprises a display substrate and the touch substrate in any one of the embodiments. The touch control substrate and the display substrate are arranged oppositely, one side, far away from the cover plate base, of the touch control structure layer faces the display substrate, and the visual area corresponds to the display area of the display substrate.
In the description of the present specification, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present application and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present application.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present application, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the present application, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; the device can be mechanically connected, electrically connected and communicated; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present application, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is less level than the second feature.
The above disclosure provides many different embodiments, or examples, for implementing different structures of the application. The foregoing description of specific example components and arrangements has been presented to simplify the present disclosure. They are, of course, merely examples and are not intended to limit the application. Furthermore, the present application may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not themselves indicate the relationship between the various embodiments and/or arrangements discussed.
The foregoing is merely illustrative of the present application, and the present application is not limited thereto, and any person skilled in the art will readily recognize that various changes and substitutions are possible within the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. A touch substrate comprising a viewable area, the touch substrate comprising:
A cover substrate;
The touch control structure layer is positioned on one side of the cover plate substrate; and
A chromaticity functional layer at least located in the visible region, the chromaticity functional layer configured to reduce yellow chromaticity of the visible region of the touch substrate;
The touch control structure layer comprises a first metal layer, a first insulating layer, a second metal layer and a second insulating layer which are sequentially stacked, and the first metal layer faces the cover plate substrate;
The chromaticity functional layer comprises a first insulating layer, and the first insulating layer is provided with at least one first hollowed-out part positioned in the visible area;
The chromaticity functional layer also comprises a chromaticity regulating layer, wherein the chromaticity index b of the chromaticity regulating layer meets the condition that b is less than-3 and less than-1;
the first metal layer comprises a first electrode positioned in the visible area, the first electrode is in a first grid shape, and the first hollowed-out parts correspond to a first grid defined by the first electrode.
2. The touch substrate of claim 1, wherein,
The chromaticity adjusting layer is positioned between the cover plate substrate and the touch control structure layer; or alternatively
The chromaticity adjusting layer is positioned on one side of the cover plate substrate, which is away from the touch control structure layer.
3. The touch substrate of claim 1, wherein,
The material of the chromaticity regulating layer comprises niobium pentoxide; and/or the number of the groups of groups,
The chromaticity adjusting layer has a thickness of 150 to 250 angstroms.
4. The touch substrate of claim 1, wherein the orthographic projection of the first hollowed-out portion on the cover substrate is located in an orthographic projection range of the first grid on the cover substrate.
5. The touch substrate according to claim 1 to 3, wherein,
The chromaticity functional layer further comprises a second insulating layer, and the second insulating layer is provided with at least one second hollowed-out part positioned in the visible area.
6. The touch substrate according to claim 5, wherein the second metal layer includes a second electrode located in the visible area, the second electrode is in a second grid shape, the second hollowed-out portion corresponds to a second grid defined by the second electrode, and orthographic projection of the second hollowed-out portion on the cover substrate is located in an orthographic projection range of the second grid on the cover substrate.
7. A method for manufacturing a touch substrate, the touch substrate comprising a viewable area, the method comprising:
Forming a touch control structure layer and a chromaticity functional layer on a cover plate substrate,
The touch structure layer is positioned on one side of the cover plate substrate, the chromaticity functional layer is at least positioned in the visible area and is configured to reduce yellow chromaticity of the visible area of the touch substrate;
Forming the touch structure layer includes:
Forming a first metal layer;
Forming a first insulating layer on one side of the first metal layer away from the cover plate substrate;
Forming a second metal layer on one side of the first insulating layer, which is away from the cover plate substrate;
forming a second insulating layer on one side of the second metal layer facing away from the cover plate substrate,
Wherein, the first insulating layer is provided with at least one first hollow-out part positioned in the visible area;
the chromaticity functional layer comprises a chromaticity regulating layer, wherein the chromaticity index b of the chromaticity regulating layer satisfies the condition that b is less than-3 and less than-1;
the first metal layer comprises a first electrode positioned in the visible area, the first electrode is in a first grid shape, and the first hollowed-out parts correspond to a first grid defined by the first electrode.
8. The method of claim 7, wherein forming the touch structure layer and the chromaticity functional layer on the cover substrate comprises:
forming the chromaticity adjusting layer on one side of the cover plate substrate, and forming the touch control structure layer on the other side of the cover plate substrate; or alternatively
Forming the chromaticity adjusting layer on one side of the cover substrate; and forming the touch control structure layer on one side of the chromaticity adjusting layer, which is away from the cover plate substrate.
9. The method of claim 7, wherein the second insulating layer is provided with at least one second void in the viewing area.
10. A display device, comprising a display substrate and the touch substrate according to any one of claims 1 to 6, wherein the touch substrate is disposed opposite to the display substrate, and a side of the touch structure layer away from the cover substrate faces the display substrate.
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| CN109937396A (en) * | 2016-10-25 | 2019-06-25 | 富士胶片株式会社 | Touch sensing, sensor conductive sheet and its preparation method, touch panel and its laminate and transparent insulating layer formation composition |
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| US8780061B2 (en) * | 2010-02-11 | 2014-07-15 | Lg Display Co., Ltd. | Electrostatic capacity type touch screen panel and method of manufacturing the same |
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| CN104903409A (en) * | 2013-01-15 | 2015-09-09 | 富士胶片株式会社 | Heat-resistant decorating coloring composition, method for producing electrostatic capacitance type input device, and electrostatic capacitance type input device, as well as image display device provided with same |
| CN105022517A (en) * | 2014-04-29 | 2015-11-04 | 杰圣科技股份有限公司 | Touch structure and manufacture method thereof |
| CN104731432A (en) * | 2015-02-03 | 2015-06-24 | 深圳南玻伟光导电膜有限公司 | White capacitive touch screen and manufacturing method thereof |
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