CN112882247A - Multi-degree-of-freedom self-adaptive adjusting device and adjusting method for two-mirror reflecting system - Google Patents
Multi-degree-of-freedom self-adaptive adjusting device and adjusting method for two-mirror reflecting system Download PDFInfo
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Abstract
The invention discloses a multi-degree-of-freedom self-adaptive adjusting device for a two-mirror reflecting system, which comprises an interferometer, a multi-degree-of-freedom self-adaptive adjusting mechanism and a standard flat crystal; the multi-degree-of-freedom self-adaptive adjusting mechanism comprises a multi-degree-of-freedom adjusting module and a closed-loop controller, wherein two mirror reflecting systems are installed on the multi-degree-of-freedom adjusting module, an interferometer is coaxially arranged in front of the two mirror reflecting systems, a standard plano is coaxially arranged behind the two mirror reflecting systems, secondary mirrors of the two mirror reflecting systems are bonded with secondary mirror frames to form secondary mirror assemblies, and the secondary mirror assemblies are installed on the multi-degree-of-freedom adjusting module; the closed-loop controller reads real-time test data of the interferometer on the wave aberration of the two-mirror reflection system, calculates and automatically optimizes according to a set wave aberration target value, and drives the multi-degree-of-freedom adjustment module to drive the secondary mirror assembly to carry out pose adjustment until the aberration test quantity reaches the target value. The invention has high efficiency, good accuracy and strong universality.
Description
Technical Field
The invention belongs to the technical field of precise adjustment of an optical system with high imaging quality, and relates to a multi-degree-of-freedom self-adaptive adjusting device and method for a two-mirror reflecting system.
Background
The multispectral common-path optical system is rapidly developed in the photoelectric system by virtue of the characteristics of long detection distance and strong resolving power. As a core component of the common-path optical system, the adjustment control precision of the two-mirror reflecting system is particularly important. The two-mirror reflective system consists of an aspheric primary mirror and a secondary mirror, and the most typical optical form is a cassegrain optical system, as shown in fig. 1. The secondary mirror has six degrees of freedom relative to the primary mirror, and the degree of coincidence of the spatial pose and the design model directly determines the optical imaging performance of the system. In addition to the rotational degree of freedom around the optical axis (z axis), the remaining five degrees of freedom of the secondary mirror all affect the wave aberration of the system, in other words, there are five-dimensional misregistration amounts in the adjustment link of the secondary mirror. The conventional debugging method for the system utilizes an interferometer to perform debugging based on wave aberration measurement: an operator obtains aberration information according to the interferometer measurement, primarily judges the maladjustment direction and the maladjustment amount, adjusts the assembly position of the secondary mirror assembly through the translation of the screw through hole or changes the space angle of the secondary mirror through adding a gasket, so that the wavefront state of the system is changed, and the secondary adjustment is carried out after the secondary measurement until the wave aberration of the system tends to the optimal value. For example, the paper of the small F number cassegrain system fitting technology published in the laser and infrared engineering 2011 introduces such a fitting method for a two-mirror reflection system.
However, by actually adjusting a plurality of projects and comparing the imaging quality of the adjusted system with the design value, the applicant finds that in the product adjusted by the conventional method, although the wave aberration of the system reaches the 'optimal value' within the adjustment controllable range, the wave aberration of the system is still more than 20% different from the design value of the system, that is, the system is not actually adjusted to the optimal state. The main reasons for this phenomenon are:
1) the manual judgment operation method is accurate in judgment of the maladjustment direction, but the judgment of the maladjustment quantity is difficult to be accurate and needs to be finished through multiple trial and error, and limited trial and error can only enable the system state to be optimal but cannot achieve the optimal state;
2) the sensitivity of the adjustment amount that can be realized by manual operation is as follows: the minimum adjustment amount of translation is more than 0.05mm, the minimum adjustment amount of inclination is more than 1', and for a long-focus high-compression ratio two-mirror system, the sensitivity is larger than the position error tolerance of an optical design to a secondary mirror by more than 1 magnitude order, so that the system can not be ensured to realize the adjustment of a near diffraction limit;
3) after the secondary mirror assembly is adjusted, the secondary mirror assembly is fastened in a screw connection mode, the fastening process brings micro pose change of the secondary mirror, and the influence of fastening contact stress causes the wave aberration of the system to deviate towards the opposite direction of the optimal value again relative to the state after the adjustment is finished.
In order to solve the problem of trial and error in manual operation, many coworkers propose a computer-aided fitting idea and perform a great deal of research, such as a master thesis "two-mirror system computer-aided fitting research" published in 2010, a "two-mirror system fitting technology research based on a vector wave aberration theory", and the like. The computer-aided debugging can solve the problem of trial and error to a certain extent by constructing a sensitivity matrix between the debugging amount and the aberration, solving the debugging amount through actually measuring the aberration and guiding an operator to debug, but is limited by linear approximation of the sensitivity matrix, the method is only suitable for the small-field small-aberration debugging process, the actual adjusting process is still manual operation, and the problems of adjusting precision and fastening exist.
Aiming at a two-lens card type system, a common assembly and adjustment method is based on the idea of optical centering, for example, a patent 'an assembly and adjustment method of a card type optical system' published in 2017, a patent 'an assembly and adjustment method of a primary reflector and a secondary reflector of a Cassegrain optical system' published in 2019, a patent 'an assembly and adjustment method based on a card type optical system' published in 2020, the accuracy of the centering assembly and adjustment method is limited by a centering instrument, the measurement accuracy of an imported instrument on the spherical center deviation of a single spherical surface is about 0.01mm, the measurement accuracy of an interval is about 0.02mm, errors introduced by a spherical centering method are adopted for the aspherical surface, and the assembly and adjustment result after the errors are accumulated is acceptable for an infrared optical system, but the requirements of a long-focus common-path two-mirror system containing visible light on the relative attitude of the primary mirror and the secondary mirror in micron order and second order can not be met, and the method has differences in precision and intuition compared with an interferometer wave aberration adjustment method.
Disclosure of Invention
Objects of the invention
The invention aims to solve the problems of realizing near diffraction limit imaging and high-efficiency adjustment of a two-mirror reflection system, and provides an automatic high-precision adjusting device and a reasonable and feasible method for realizing optimal adjustment of the two-mirror reflection system.
(II) technical scheme
In order to solve the technical problem, the invention provides a multi-degree-of-freedom self-adaptive adjusting device for a two-mirror reflecting system, which comprises an interferometer 5, a multi-degree-of-freedom self-adaptive adjusting mechanism 7 and a standard flat crystal 8; the multi-degree-of-freedom self-adaptive adjusting mechanism 7 comprises a multi-degree-of-freedom adjusting module and a closed-loop controller 12, a two-mirror reflecting system 6 is installed on the multi-degree-of-freedom adjusting module, an interferometer 5 is coaxially arranged in front of the two-mirror reflecting system 6, a standard flat crystal 8 is coaxially arranged behind the two-mirror reflecting system 6, the two-mirror reflecting system 6 comprises a main mirror assembly 1, a secondary mirror 2, a secondary mirror frame 3 and a secondary mirror frame 4, the secondary mirror 2 is installed on the secondary mirror frame 4, the secondary mirror frame 4 is installed on the secondary mirror frame 3, the secondary mirror 2 and the secondary mirror frame 4 are bonded to form a secondary mirror assembly, and the secondary mirror assembly is; the closed-loop controller 12 reads real-time test data of the interferometer 5 on the wave aberration of the two-mirror reflection system 6, calculates and automatically optimizes according to a set wave aberration target value, and drives the multi-degree-of-freedom adjustment module to drive the secondary mirror assembly to adjust the pose until the aberration test quantity reaches the target value.
The multi-degree-of-freedom adjusting module comprises an adapting mechanism 9, a five-dimensional micro-moving mechanism 10 and a three-dimensional macro-moving mechanism 11, the three-dimensional macro-moving mechanism 11 is arranged on a workbench, the five-dimensional micro-moving mechanism 10 is installed on the three-dimensional macro-moving mechanism 11, the adapting mechanism 9 is installed on the five-dimensional micro-moving mechanism 10, a closed-loop controller 12 is respectively connected with the five-dimensional micro-moving mechanism 10, the three-dimensional macro-moving mechanism 11 and the interferometer 5 through connecting cables and used for reading real-time test data of wave aberration of the two-mirror reflecting system 6 by the interferometer 5 and controlling the five-dimensional micro-moving mechanism 10 and the three-dimensional macro-moving mechanism 11 to realize the.
The secondary mirror 2 and the secondary mirror frame 4 are bonded to form a secondary mirror assembly, the secondary mirror assembly is connected with a switching mechanism 9 in the multi-degree-of-freedom adjusting module, and the closed-loop controller 12 controls the three-dimensional macro-motion mechanism 11 and the five-dimensional micro-motion mechanism 10 to move to drive the secondary mirror assembly to perform pose adjustment.
The three-dimensional macro-motion mechanism 11 translates along the x axis, the y axis on the horizontal plane and the z axis in the vertical direction in a large range, the translation precision is 0.5mm, and the translation range is adapted to the optical-mechanical parameters of the two-mirror reflecting system to be adjusted.
The five-dimensional micro-motion mechanism 10 is driven by a motor to realize accurate translation along an x axis, a y axis and a z axis, and the precision is superior to 0.5 um.
The five-dimensional micro-motion mechanism 10 is driven by a motor to realize accurate rotation around an x axis and a y axis, and the precision is superior to 2 ".
Wherein, the dimension of the five-dimensional micro-motion mechanism 10 is smaller than that of the secondary mirror assembly of the two-mirror reflection system.
The three-dimensional macro-motion mechanism and the secondary lens frame 3 in the two-lens system have the same appearance structure.
The invention also provides a multi-degree-of-freedom self-adaptive adjusting method for the two-mirror reflecting system, which comprises the following steps:
step 1: building a self-adaptive adjusting light path of the two-mirror reflection system, and connecting a closed-loop controller and an interferometer, a five-dimensional micro-motion mechanism and a cable of a three-dimensional macro-motion mechanism in the multi-degree-of-freedom self-adaptive adjusting device;
step 2: the secondary mirror assembly is arranged on the self-adaptive adjusting device through a switching mechanism, and the secondary mirror assembly extends into a secondary mirror frame of the two-mirror system and is basically positioned at a theoretical position by adjusting the three-dimensional macro-motion mechanism;
and step 3: the self-adaptive adjusting device is powered on, interference patterns are manually adjusted, the adjusting direction and the adjusting amount are manually input, and the five-dimensional micromotion mechanism is driven to move by the controller, so that interference fringes of the two-mirror system appear on the interference measurement display;
and 4, step 4: the self-adaptive adjusting device selects an 'automatic mode', sets a wave aberration target value, automatically optimizes according to real-time wave aberration information and drives the secondary mirror assembly to carry out self-adaptive adjustment, and controls the interferometer to carry out wave aberration test after each adjustment until the wave aberration test value reaches the target value;
and 5: and (4) carrying out low-stress fixed connection on the secondary mirror assembly and the secondary mirror frame, detaching the secondary mirror assembly from the switching mechanism after the fixed connection is finished, and finishing the adjustment.
Wherein in the step 3, the system wave aberration RMS is not more than 0.5 lambda; in step 4, the target value of the wave aberration is set to 0.03 λ.
(III) advantageous effects
The multi-degree-of-freedom self-adaptive adjusting device and method for the two-mirror reflecting system have the advantages that:
(1) the device is used for replacing manpower to finish the adjustment of the two-mirror reflecting system, the optimal value of the wave aberration of the system is used as a target to drive the secondary mirror to automatically optimize, and compared with manual trial and error, the device has the advantages of high efficiency and good accuracy;
(2) the adjusting precision of a five-dimensional micro-motion mechanism in the device is far higher than that of manual operation, and high image quality assembly and adjustment of the system can be realized;
(3) the method has certain universality, can optimize the structure adaptability according to the two-mirror system to be installed and adjusted, and does not introduce redundant blocking in an interference measurement light path;
(4) the adjusting method adopted in the invention lays a foundation for realizing the low-stress fixed connection of the secondary mirror assembly in the two-mirror system.
Drawings
FIG. 1 is a schematic diagram of a light-machine of a two-mirror Cassegrain reflection system as a debugging object of the present invention.
Fig. 2 is a schematic diagram of the adaptive tuning of a two-mirror reflective system.
Fig. 3 is a schematic diagram of the multiple degree of freedom adaptive adjustment mechanism shown in fig. 2.
In the figure: 1. a primary mirror assembly; 2. a secondary mirror; 3. a secondary frame; 4. a secondary mirror frame; 5. an interferometer; 6. a two mirror reflective system; 7. a multi-degree-of-freedom self-adaptive adjusting mechanism; 8. standard flat crystal; 9. a transfer mechanism; 10. a five-dimensional micro-motion mechanism; 11. a three-dimensional macro-motion mechanism; 12. a closed-loop controller.
Detailed Description
In order to make the objects, contents, and advantages of the present invention clearer, the following detailed description of the embodiments of the present invention will be made in conjunction with the accompanying drawings and examples.
Aiming at the problems in the existing two-mirror reflection system installation and adjustment technology, in order to realize the installation and adjustment of the two-mirror reflection system near diffraction limit imaging quality, the embodiment provides an automatic and high-precision adjusting device and a reasonable and feasible scheme.
Fig. 1 shows a two-mirror cassegrain reflective system, which includes a primary mirror assembly 1, a secondary mirror 2, a secondary mirror holder 3, and a secondary mirror frame 4.
Fig. 2 is a schematic diagram showing the multi-degree-of-freedom adaptive adjustment of the two-mirror reflection system, and fig. 3 is a schematic diagram showing the multi-degree-of-freedom adaptive adjustment mechanism, in which an interferometer 5, a two-mirror reflection system 6, a multi-degree-of-freedom adaptive adjustment mechanism 7, and a standard flat crystal 8 are shown; the multi-degree-of-freedom self-adaptive adjusting mechanism 7 comprises a multi-degree-of-freedom adjusting module and a closed-loop controller 12, a two-mirror reflecting system 6 is installed on the multi-degree-of-freedom adjusting module, an interferometer 5 is coaxially arranged in front of the two-mirror reflecting system 6, a standard flat crystal 8 is coaxially arranged behind the two-mirror reflecting system 6, the two-mirror reflecting system 6 comprises a main mirror assembly 1, a secondary mirror 2, a secondary mirror frame 3 and a secondary mirror frame 4, the secondary mirror 2 is installed on the secondary mirror frame 4, the secondary mirror frame 4 is installed on the secondary mirror frame 3, the secondary mirror 2 and the secondary mirror frame 4 are bonded to form a secondary mirror assembly, and the secondary mirror assembly is; the closed-loop controller 12 reads real-time test data of the interferometer 5 on the wave aberration of the two-mirror reflection system 6, calculates and automatically optimizes according to a set wave aberration target value, and drives the multi-degree-of-freedom adjustment module to drive the secondary mirror assembly to adjust the pose until the aberration test quantity reaches the target value.
The multi-degree-of-freedom adjusting module comprises an adapting mechanism 9, a five-dimensional micro-moving mechanism 10 and a three-dimensional macro-moving mechanism 11, the three-dimensional macro-moving mechanism 11 is arranged on a workbench, the five-dimensional micro-moving mechanism 10 is installed on the three-dimensional macro-moving mechanism 11, the adapting mechanism 9 is installed on the five-dimensional micro-moving mechanism 10, and a closed-loop controller 12 is respectively connected with the five-dimensional micro-moving mechanism 10, the three-dimensional macro-moving mechanism 11 and the interferometer 5 through connecting cables and used for reading real-time test data of wave aberration of the two-mirror reflecting system 6 by the interferometer 5 and controlling the five-dimensional micro-moving mechanism 10 and the three-dimensional macro-moving mechanism.
The secondary mirror 2 and the secondary mirror frame 4 are bonded to form a secondary mirror assembly, the secondary mirror assembly is connected with a switching mechanism 9 in the multi-degree-of-freedom adjusting module, and the closed-loop controller 12 controls the three-dimensional macro-motion mechanism 11 and the five-dimensional micro-motion mechanism 10 to move to drive the secondary mirror assembly to perform pose adjustment.
The three-dimensional macro-motion mechanism 11 can realize large-range translation along the x-axis, the y-axis and the z-axis in the vertical direction on the horizontal plane, the translation precision is 0.5mm, and the translation range is adapted to the optical-mechanical parameters of the two-mirror reflecting system to be adjusted.
The five-dimensional micro-motion mechanism 10 is driven by a motor to realize accurate translation along an x axis, a y axis and a z axis, and the precision is superior to 0.5 um; and accurate rotation around the x axis and the y axis is realized, and the precision is superior to 2 ".
The outline dimension of the five-dimensional micro-motion mechanism 10 is smaller than the outline dimension of the secondary mirror assembly of the two-mirror reflection system, and the outline structure of the three-dimensional macro-motion mechanism is the same as that of the secondary mirror frame 3 in the two-mirror system, so that the multi-degree-of-freedom self-adaptive adjusting device is ensured not to introduce redundant blocking in an interference measurement light path.
Based on the multi-degree-of-freedom adaptive adjusting device for the two-mirror reflecting system, the embodiment also provides a multi-degree-of-freedom adaptive adjusting method for the two-mirror reflecting system, which comprises the following steps:
step 1: building a self-adaptive adjusting light path of the two-mirror reflection system, and connecting a closed-loop controller and an interferometer, a five-dimensional micro-motion mechanism and a cable of a three-dimensional macro-motion mechanism in the multi-degree-of-freedom self-adaptive adjusting device;
step 2: the secondary mirror assembly is arranged on the self-adaptive adjusting device through a switching mechanism, and the secondary mirror assembly extends into a secondary mirror frame of the two-mirror system and is basically positioned at a theoretical position by adjusting the three-dimensional macro-motion mechanism;
and step 3: the self-adaptive adjusting device is powered on, an 'artificial mode' is selected, at the moment, the interference pattern is initially adjusted manually, the adjusting direction and the adjusting amount are manually input, the five-dimensional micromotion mechanism is driven to move through the controller, so that interference fringes of the two-mirror system appear on the interference measurement display, and the wave aberration RMS of the system is recommended to be not more than 0.5 lambda at the moment;
and 4, step 4: the adaptive adjustment device selects "automatic mode" and sets a wave aberration target value, for example: 0.03 lambda, the device automatically optimizes according to the real-time wave aberration information and drives the secondary mirror assembly to carry out self-adaptive adjustment, and after each adjustment, the device controls the interferometer to carry out wave aberration test until the wave aberration test value reaches a target value;
and 5: and (4) carrying out low-stress fixed connection on the secondary mirror assembly and the secondary mirror frame, detaching the secondary mirror assembly from the switching mechanism after the fixed connection is finished, and finishing the adjustment.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A multi-degree-of-freedom self-adaptive adjusting device for a two-mirror reflecting system is characterized by comprising an interferometer (5), a multi-degree-of-freedom self-adaptive adjusting mechanism (7) and a standard flat crystal (8); the multi-degree-of-freedom self-adaptive adjusting mechanism (7) comprises a multi-degree-of-freedom adjusting module and a closed-loop controller (12), two mirror reflecting systems (6) are installed on the multi-degree-of-freedom adjusting module, an interferometer (5) is coaxially arranged in front of the two mirror reflecting systems (6), a standard plano-crystal (8) is coaxially arranged behind the two mirror reflecting systems (6), the two mirror reflecting systems (6) comprise a main mirror assembly (1), a secondary mirror (2), a secondary mirror frame (3) and a secondary mirror frame (4), the secondary mirror (2) is installed on the secondary mirror frame (4), the secondary mirror frame (4) is installed on the secondary mirror frame (3), the secondary mirror (2) and the secondary mirror frame (4) are bonded to form a secondary mirror assembly, and the secondary mirror assembly is installed on the multi; the closed-loop controller (12) reads real-time test data of the interferometer (5) on the wave aberration of the two-mirror reflecting system (6), calculates and automatically optimizes according to a set wave aberration target value, and drives the multi-degree-of-freedom adjusting module to drive the secondary mirror assembly to carry out pose adjustment until the aberration test quantity reaches the target value.
2. The multi-degree-of-freedom adaptive adjusting device for the two-mirror reflecting system as claimed in claim 1, wherein the multi-degree-of-freedom adjusting module comprises an adapter mechanism (9), a five-dimensional micro-motion mechanism (10) and a three-dimensional macro-motion mechanism (11), the three-dimensional macro-motion mechanism (11) is arranged on the workbench, the five-dimensional micro-motion mechanism (10) is installed on the three-dimensional macro-motion mechanism (11), the adapter mechanism (9) is installed on the five-dimensional micro-motion mechanism (10), and the closed-loop controller (12) is respectively connected with the five-dimensional micro-motion mechanism (10), the three-dimensional macro-motion mechanism (11) and the interferometer (5) through connecting cables and is used for reading real-time test data of wave aberration of the two-mirror reflecting system (6) by the interferometer (5) and controlling the five-dimensional micro-motion mechanism (10) and the three-dimensional macro-motion mechanism.
3. The multi-degree-of-freedom adaptive adjusting device for the two-mirror reflecting system as claimed in claim 2, wherein the secondary mirror (2) is bonded with the secondary mirror frame (4) to form a secondary mirror assembly, the secondary mirror assembly is connected with a switching mechanism (9) in the multi-degree-of-freedom adjusting module, and the closed-loop controller (12) controls the three-dimensional macro-motion mechanism (11) and the five-dimensional micro-motion mechanism (10) to move to drive the secondary mirror assembly to perform pose adjustment.
4. The multi-degree-of-freedom adaptive adjusting device for the two-mirror reflecting system as claimed in claim 3, wherein the three-dimensional macro-motion mechanism (11) translates along the x-axis, the y-axis on the horizontal plane and the z-axis on the vertical direction in a large range, the translation precision is 0.5mm, and the translation range is adapted to the optical-mechanical parameters of the two-mirror reflecting system to be adjusted.
5. The multi-degree-of-freedom adaptive adjusting device for the two-mirror reflecting system according to claim 4, wherein the five-dimensional micro-motion mechanism (10) is driven by a motor to realize precise translation along an x axis, a y axis and a z axis, and the precision is better than 0.5 um.
6. The multi-degree-of-freedom adaptive adjustment device for the two-mirror reflection system according to claim 5, wherein the five-dimensional micro-motion mechanism (10) is driven by a motor to realize precise rotation around the x axis and the y axis, and the precision is better than 2 ".
7. The multi-degree-of-freedom adaptive adjustment device for a two-mirror reflective system according to claim 6, wherein the five-dimensional micro-motion mechanism (10) has a smaller outer dimension than that of the secondary mirror assembly of the two-mirror reflective system.
8. The multi-degree-of-freedom adaptive adjustment device for two-mirror reflection system according to claim 7, wherein the three-dimensional macro-motion mechanism is the same as the external configuration of the secondary mirror holder (3) in the two-mirror system.
9. A multiple degree of freedom adaptive adjustment method for a two-mirror reflecting system based on the multiple degree of freedom adaptive adjustment apparatus for a two-mirror reflecting system according to claim 8, characterized by comprising the steps of:
step 1: building a self-adaptive adjusting light path of the two-mirror reflection system, and connecting a closed-loop controller and an interferometer, a five-dimensional micro-motion mechanism and a cable of a three-dimensional macro-motion mechanism in the multi-degree-of-freedom self-adaptive adjusting device;
step 2: the secondary mirror assembly is arranged on the self-adaptive adjusting device through a switching mechanism, and the secondary mirror assembly extends into a secondary mirror frame of the two-mirror system and is basically positioned at a theoretical position by adjusting the three-dimensional macro-motion mechanism;
and step 3: the self-adaptive adjusting device is powered on, interference patterns are manually adjusted, the adjusting direction and the adjusting amount are manually input, and the five-dimensional micromotion mechanism is driven to move by the controller, so that interference fringes of the two-mirror system appear on the interference measurement display;
and 4, step 4: the self-adaptive adjusting device selects an 'automatic mode', sets a wave aberration target value, automatically optimizes according to real-time wave aberration information and drives the secondary mirror assembly to carry out self-adaptive adjustment, and controls the interferometer to carry out wave aberration test after each adjustment until the wave aberration test value reaches the target value;
and 5: and (4) carrying out low-stress fixed connection on the secondary mirror assembly and the secondary mirror frame, detaching the secondary mirror assembly from the switching mechanism after the fixed connection is finished, and finishing the adjustment.
10. The adaptive adjustment method with multiple degrees of freedom for a two-mirror reflective system according to claim 9, wherein in step 3, the system wave aberration RMS is not more than 0.5 λ; in step 4, the target value of the wave aberration is set to 0.03 λ.
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| CN115166970A (en) * | 2022-07-27 | 2022-10-11 | 茂莱（南京）仪器有限公司 | Method for precisely adjusting wavefront of high-reflection system by using interferometer |
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| CN110440934A (en) * | 2019-07-19 | 2019-11-12 | 北京遥感设备研究所 | A kind of multiple degrees of freedom precision control platform device of optics assembly |
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| CN115166970A (en) * | 2022-07-27 | 2022-10-11 | 茂莱（南京）仪器有限公司 | Method for precisely adjusting wavefront of high-reflection system by using interferometer |
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Application publication date: 20210601 |