CN116105860B - Method for adjusting optical system of spectrometer and optical system - Google Patents
Method for adjusting optical system of spectrometer and optical system Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0289—Field-of-view determination; Aiming or pointing of a spectrometer; Adjusting alignment; Encoding angular position; Size of measurement area; Position tracking
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0243—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows having a through-hole enabling the optical element to fulfil an additional optical function, e.g. a mirror or grating having a throughhole for a light collecting or light injecting optical fiber
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/04—Slit arrangements slit adjustment
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/06—Scanning arrangements arrangements for order-selection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2823—Imaging spectrometer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
Abstract
The invention relates to an adjustment method and an optical system of an imaging spectrometer optical system, and provides an adjustment method of the imaging spectrometer optical system, wherein the imaging spectrometer optical system comprises a frame body, a front off-axis three-reflecting light path unit, a lens light path unit, a scanning light path unit, a spectrum imaging unit and a first reference cube, and the front off-axis three-reflecting light path unit, the lens light path unit, the scanning light path unit and the spectrum imaging unit are sequentially arranged on the frame body along the light beam propagation direction; the method simplifies the adjustment process of the imaging spectrometer optical system with a plurality of optical elements and extremely complex spatial relationship, has the advantages of simple principle and method, high precision and the like, and is particularly suitable for the development of the space-borne imaging spectrometer with compact structure, light weight and miniaturization.
Description
Technical Field
The invention relates to the field of installation and adjustment of optical systems of space solar spectrometers, in particular to an installation and adjustment method of an optical system of a spectrometer and the optical system.
Background
The microminiaturization of satellites and payloads is an important trend in the field of aerospace technology, and is a necessary choice for shortening the research and development period, improving the cost performance of a transmitting task and saving the project cost to the greatest extent, so that the development of the micro-nano satellites characterized by high-level functional entity integration, integration and modularity is extremely rapid in the century, and the development cost of the aerospace loads of China is greatly saved, and meanwhile, great contribution is made to the fields of astronomical scientific research, information communication, environment and disaster monitoring, weather service and the like of China. However, compact opto-mechanical structures with extremely high functional density ratios present significant challenges to system design and tuning.
Hα (wavelength is 656.28 nm) is an important spectral line widely used for observing numerous solar activity phenomena such as flare, dark strips and the like, and a solar hα imaging spectrometer not only can acquire characteristic spectral information of solar hα and adjacent Si I and Fe I thereof, but also can acquire single-wavelength images of full-time planes near the hα wave band. The working wavelength of the laser interferometers such as ZYGO and 4D interferometers used for the traditional system installation is 632.8nm, and the system installation cannot be carried out by utilizing the laser interferometers according to the traditional installation and adjustment method due to the fact that the transmission and diffraction elements exist in the spectrometers. The number of optical elements and the degree of freedom of adjustment of the traditional optical lens are small, so that the traditional optical lens is easy to assemble and adjust, and the expansion and the application of detection equipment are easy; for imaging spectroscopic instruments having multiple aspheric reflective, lens and diffractive elements mounted in different support structures, the normal pointing of each optical element has an exceptionally complex spatial relationship, core component spatial distance compressed to millimeter level is difficult to continue to apply; the traditional spectrometer only acquires the spectrum information of the target, the position and posture accuracy of the optical element is low, the optical element can be correctly installed through visual observation and aiming of laser rays, and the like, while the solar H alpha imaging spectrometer requires that the image quality of an optical system is close to the optical diffraction limit, and the requirement on the adjustment accuracy is extremely high.
Disclosure of Invention
In view of the above problems, the present application provides a method for adjusting an optical system of a spectrometer and an optical system, which solve the problem of high-precision adjustment of an imaging spectrometer which includes a plurality of optical elements and has extremely complex spatial relationship.
In order to achieve the above object, in a first aspect, the present invention provides an adjustment method of a spectrometer optical system, where the spectrometer optical system includes a frame body, a front off-axis three-reflection optical path unit, a lens optical path unit, a scanning optical path unit, a spectrum imaging unit, and a first reference cube, and the front off-axis three-reflection optical path unit, the lens optical path unit, the scanning optical path unit, and the spectrum imaging unit are sequentially disposed on the frame body along a beam propagation direction;
the method comprises the following steps:
a first reference cube is arranged on the frame body, the first reference cube is provided with three vertical surfaces, and the normals of the three vertical surfaces are respectively parallel to the optical axis, the horizontal axis and the vertical axis of the optical system;
the front off-axis three-reflecting light path unit is adjusted, and a first reference cube is used as a reference, and a first folding mirror is arranged at a light outlet of the front off-axis three-reflecting light path unit, so that an optical axis of the front off-axis three-reflecting light path unit is deflected by 90 degrees;
the lens light path unit is assembled and adjusted, and is installed on the frame body, and the installation accuracy of the lens light path unit is ensured by adopting a special positioning screw;
the scanning light path unit is adjusted, and then a slit component is arranged at the emergent end of the scanning light path unit;
and (3) adjusting the spectral imaging unit so that the light emitted from the slit can be diffracted on the spectral imaging unit to obtain a spectral image within a preset wave band range after diffraction.
In some embodiments, the spectral imaging unit sequentially sets a first image plane device, a grating device, a second image plane device and an imaging device along the optical path direction, the optical system further includes a second reference cube, the second reference cube is set on the grating device, the first image plane device includes a first field of view, the first field of view includes a first positioning hole and a plurality of second positioning holes, the first positioning hole is set at the center of the first field of view, the second positioning holes are distributed in the circumferential direction of the first positioning hole, the second image plane device includes a second field of view, the second field of view includes a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is set at the center of the second field of view, and the fourth positioning hole is distributed in the circumferential direction of the third positioning hole;
the method further comprises the steps of:
a second reference cube is arranged on the grating device, and is provided with three mutually perpendicular surfaces, and the three mutually perpendicular surfaces of the second reference cube are respectively parallel to the three mutually perpendicular surfaces of the grating device;
suspending the grating device at the corresponding interface of the frame body by adopting a six-dimensional adjusting frame, and adjusting the posture of the grating device to a theoretical design posture by taking a first reference cube as a reference;
adjusting the grating device to rotate to a preset angle delta theta;
setting a spherical standard mirror at the emergent end of the first image surface device, and enabling the focus of the standard spherical mirror to be aligned with the center of the first positioning hole;
arranging an interferometer at the emergent end of the second image plane device, and enabling the focus of the interferometer to be aligned with the center of the third positioning hole;
and adjusting the posture of the imaging device to enable the spectrum image quality formed by the light beam on the imaging device to meet the preset requirement, and then removing the first image surface device and the spherical standard mirror.
In some embodiments, the method further comprises the steps of:
setting the first image plane device at the installation position of the second folding mirror, wherein the installation position of the second folding mirror is determined by the following steps:
the position of the second folding mirror on the frame body is determined based on the first reference cube so as to deflect the optical axis of the light beam emitted from the slit by 90 degrees.
In some embodiments, adjusting the imaging device to pass the spectral image quality formed by the light beam on the imaging device further comprises:
the second folding mirror is arranged at the position of the first image surface device after the detachment.
In some embodiments, the optical system further comprises a scanning optical path unit disposed between the lens optical path unit and the spectral imaging unit, the method further comprising the steps of:
the scanning light path unit is adjusted so that the incident light of the scanning light path unit is parallel to the emergent light of the scanning light path unit.
In some embodiments, the scanning light path unit includes a plurality of facet mirrors, the facet mirrors include a first lens, a second lens, a third lens, and a fourth lens, the first lens is disposed parallel to the second lens, the first lens is perpendicular to the fourth lens, the second lens is perpendicular to the third lens, and the third lens is disposed parallel to the fourth lens, the method further includes the steps of:
adjusting the posture of the scanning light path unit to enable the first lens to be 45 degrees with the horizontal direction of the first reference cube
Focusing an interferometer arranged at the emergent end of the second image plane device on the center of the third positioning hole;
the interval between the first lens and the second lens of the scanning light path unit and the integral posture of the scanning light path unit are adjusted, so that the light paths of all the light path units of the optical system meet the preset track;
and after the image quality of the right central end face of the third positioning hole meets the preset requirement, detecting the image quality of the rest fourth positioning holes.
In some embodiments, the method further comprises:
and after the image quality of the plurality of second view field positioning holes meets the preset requirement, recovering the rotation-delta theta angle of the grating device to the theoretical design posture.
In some embodiments, the optical system further comprises a slit assembly, the imaging device comprising a spectral image plane detector;
the method further comprises the steps of:
the slit of the slit component is arranged at the emergent end of the scanning light path unit;
detecting slit image brightness and spectral line half width received by a spectrum image surface detector by adopting a laser light source with a preset wave band;
and adjusting the position of the slit component to ensure that the brightness of the slit image is maximum, and the half width of the spectral line reaches a preset value.
In a second aspect, the present invention further provides a spectrometer optical system, which is suitable for any one of the adjustment methods provided in the first aspect, where the spectrometer optical system includes a frame body, a front off-axis three-reflection optical path unit, a lens optical path unit, a scanning optical path unit, a spectral imaging unit, and a first reference cube, the front off-axis three-reflection optical path unit, the lens optical path unit, the scanning optical path unit, and the spectral imaging unit are sequentially disposed on the frame body along a beam propagation direction, and the first reference cube is disposed on the frame body.
In some embodiments, the spectral imaging unit sequentially sets a first image plane device, a grating device, a second image plane device, and an imaging device along the optical path direction, the optical system further includes a second reference cube, the second reference cube is disposed on the grating device, the first image plane device includes a first field of view, the first field of view includes a first positioning hole and a plurality of second positioning holes, the first positioning hole is disposed at a center of the first field of view, the second positioning holes are distributed in a circumferential direction of the first positioning hole, the second image plane device includes a second field of view, the second field of view includes a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is disposed at a center of the second field of view, and the fourth positioning holes are distributed in a circumferential direction of the third positioning hole.
Compared with the prior art, the technical scheme simplifies the adjustment process of the imaging spectrometer optical system with a plurality of optical elements and extremely complex spatial relationship, has the advantages of simple principle and method, high precision and the like, and is particularly suitable for the development of the space-borne imaging spectrometer with compact structure, light weight and miniaturization.
The foregoing summary is merely an overview of the present application, and is provided to enable one of ordinary skill in the art to make more clear the present application and to be practiced according to the teachings of the present application and to make more readily understood the above-described and other objects, features and advantages of the present application, as well as by reference to the following detailed description and accompanying drawings.
Drawings
The drawings are only for purposes of illustrating the principles, implementations, applications, features, and effects of the present invention and are not to be construed as limiting the application.
In the drawings of the specification:
FIG. 1 is a schematic view of an optical path of a spectrometer tuning system according to an embodiment;
FIG. 2 is a schematic view of an optical system according to an embodiment;
FIG. 3 is a schematic diagram of a calibration optical path unit according to an embodiment;
FIG. 4 is a schematic diagram of a scanning light path unit according to an embodiment;
FIG. 5 is a schematic view of a slit member according to an embodiment;
FIG. 6 is a schematic view of a first image plane device according to an embodiment;
FIG. 7 is a schematic diagram of a grating device according to an embodiment;
FIG. 8 is a schematic diagram of a second image plane device according to an embodiment;
FIG. 9 is a schematic diagram of a theoretical pose of a grating according to an embodiment;
fig. 10 is a schematic view of a special set screw according to an embodiment.
Wherein reference numerals include: 1. a front off-axis three-reflection optical path unit; 2. a lens optical path unit; 3. a scanning light path unit; 4. a spectral imaging optical path unit; 5. a first folding mirror; 6. a second fold mirror; 7. a grating; 8. a frame body; 9. a first reference cube; 10. a lens chamber of the lens optical path unit; 11. an annular plane mirror; 12. a grating frame; 13. a second reference cube; 14. a slit assembly; 15. a first image plane device; 16. a field positioning hole; 17. mounting a screw hole I; 18. a special positioning screw; 19. positioning a conical surface; 20. a thread; 21. a second image plane device; 22. an image plane positioning hole; 23. mounting a screw hole II; 24. A grating device; 25. a second field of view; 61. a first lens; 62. a second lens; 63. a third lens; 64. and a fourth lens.
Detailed Description
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In the following description, like modules are denoted by like reference numerals. In the case of the same reference numerals, their names and functions are also the same. Therefore, a detailed description thereof will not be repeated.
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not to be construed as limiting the invention.
In a first aspect, the present invention provides a method for adjusting an optical system of a spectrometer, the optical system of the spectrometer includes a frame body 8, a front off-axis three-reflection optical path unit 1, a lens optical path unit 2, a scanning optical path unit 3, a spectrum imaging unit, and a first reference cube 9, wherein the front off-axis three-reflection optical path unit 1, the lens optical path unit 2, the scanning optical path unit 3, and the spectrum imaging unit are sequentially disposed on the frame body 8 along a beam propagation direction;
the method comprises the following steps:
a first reference cube 9 is arranged on the frame body 8, the first reference cube 9 is provided with three vertical surfaces, and the normals of the three vertical surfaces are respectively parallel to the optical axis, the horizontal axis and the vertical axis of the optical system;
the front off-axis three-reflection optical path unit 1 is assembled and adjusted, and a first reference cube 9 is used as a reference, and a first folding mirror 5 is arranged at the light outlet of the front off-axis three-reflection optical path unit 1, so that the optical axis of the front off-axis three-reflection optical path unit 1 is deflected by 90 degrees;
the lens light path unit 2 is assembled and adjusted, the lens light path unit 2 is arranged on the frame body 8, and the installation accuracy of the lens light path unit is ensured by adopting a special positioning screw 18;
the scanning light path unit 3 is assembled and adjusted, and then a slit component 14 is arranged at the emergent end of the scanning light path unit 3;
and (3) adjusting the spectral imaging unit so that the light emitted from the slit can be diffracted on the spectral imaging unit to obtain a spectral image within a preset wave band range after diffraction.
In some embodiments, the spectral imaging unit sequentially sets a first image plane device 15, a grating 7 device, a second image plane device 21 and an imaging device along the optical path direction, the optical system further includes a second reference cube 13, the second reference cube 13 is set on the grating 7 device, the first image plane device 15 includes a first field of view, the first field of view includes a first positioning hole and a plurality of second positioning holes, the first positioning hole is set at the center of the first field of view, the second positioning holes are distributed in the circumferential direction of the first positioning holes, the second image plane device 21 includes a second field of view 25, the second field of view 25 includes a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is set at the center of the second field of view 25, and the fourth positioning hole is distributed in the circumferential direction of the third positioning hole;
the method further comprises the steps of:
a second reference cube 13 is arranged on the grating 7 device, the second reference cube 13 is provided with three mutually perpendicular surfaces, and the three mutually perpendicular surfaces of the second reference cube 13 are respectively parallel to the three mutually perpendicular surfaces of the grating 7 device;
suspending the grating 7 device at the corresponding interface of the frame body 8 by adopting a six-dimensional adjusting frame, and adjusting the posture of the grating 7 device to a theoretical design posture by taking the first reference cube 9 as a reference;
adjusting the grating 7 device to rotate to a preset angle delta theta;
a spherical standard mirror is arranged at the emergent end of the first image surface device 15, and the focus of the standard spherical mirror is aligned with the center of the first positioning hole;
an interferometer is arranged at the emergent end of the second image surface device 21, and the focus of the interferometer is aligned with the center of the third positioning hole;
the posture of the imaging device is adjusted so that the spectral image quality formed by the light beam on the imaging device meets the predetermined requirement, and then the first image plane device 15 and the spherical standard mirror are removed.
In some embodiments, the method further comprises the steps of:
the first image plane device 15 is arranged at the mounting position of the second folding mirror 6, and the mounting position of the second folding mirror 6 is determined by the following steps:
the position of the second folding mirror 6 on the frame body 8 is determined with reference to the first reference cube 9 so as to deflect the optical axis of the light beam exiting the slit by 90 °.
In some embodiments, adjusting the imaging device to pass the spectral image quality formed by the light beam on the imaging device further comprises:
the second folding mirror 6 is arranged at a position where the first image plane means 15 is removed.
In some embodiments, the optical system further comprises a scanning light path unit 3, the scanning light path unit 3 being arranged between the lens light path unit 2 and the spectral imaging unit, the method further comprising the steps of:
the scanning optical path unit 3 is adjusted so that the incident light of the scanning optical path unit 3 is parallel to the outgoing light of the scanning optical path unit 3.
In some embodiments, the scanning optical path unit 3 includes a plurality of facet mirrors, the facet mirrors include a first lens 61, a second lens 62, a third lens 63, and a fourth lens 64, the first lens 61 is disposed parallel to the second lens 62, the first lens 61 is perpendicular to the fourth lens 64, the second lens 62 is perpendicular to the third lens 63, and the third lens 63 is disposed parallel to the fourth lens 64, and the method further includes the steps of:
adjusting the posture of the scanning light path unit 3 to enable the first lens 61 to form 45 degrees with the horizontal direction of the first reference cube 9;
focusing an interferometer arranged at the emergent end of the second image plane device on the center of the third positioning hole;
adjusting the interval between the first lens 61 and the second lens 62 of the scanning optical path unit 3 and the overall posture of the scanning optical path unit 3 so that the optical paths of all optical path units of the optical system meet a preset track;
and after the image quality of the right central end face of the third positioning hole meets the preset requirement, detecting the image quality of the rest fourth positioning holes.
In some embodiments, the method further comprises:
and after the image quality of the positioning holes 16 of the plurality of second view fields 25 meets the preset requirement, the rotation-delta theta angle of the grating 7 device is restored to the theoretical design posture.
In some embodiments, the optical system further comprises a slit assembly 14, the imaging device comprising a spectral image plane detector;
the method further comprises the steps of:
the slit of the slit component 14 is arranged at the emergent end of the scanning light path unit 3;
detecting slit image brightness and spectral line half width received by a spectrum image surface detector by adopting a laser light source with a preset wave band;
the slit assembly 14 position is adjusted so that the slit image brightness is maximized and the spectral line half-width reaches a predetermined value.
In a second aspect, the present invention further provides a spectrometer optical system, which is suitable for any of the adjustment methods provided in the first aspect, and the spectrometer optical system includes a frame body 8, a front off-axis three-reflection optical path unit 1, a lens optical path unit 2, a scanning optical path unit 3, a spectral imaging unit, and a first reference cube 9, where the front off-axis three-reflection optical path unit 1, the lens optical path unit 2, the scanning optical path unit 3, and the spectral imaging unit are sequentially disposed on the frame body 8 along a beam propagation direction, and the first reference cube 9 is disposed on the frame body 8.
In some embodiments, the spectral imaging unit sequentially sets the first image plane device 15, the grating 7 device, the second image plane device 21 and the imaging device along the optical path direction, the optical system further includes a second reference cube 13, the second reference cube 13 is disposed on the grating 7 device, the first image plane device 15 includes a first field of view, the first field of view includes a first positioning hole and a plurality of second positioning holes, the first positioning hole is disposed at a center of the first field of view, the second positioning holes are distributed in a circumferential direction of the first positioning hole, the second image plane device 21 includes a second field of view 25, the second field of view 25 includes a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is disposed at a center of the second field of view 25, and the fourth positioning hole is distributed in a circumferential direction of the third positioning hole.
The technical scheme simplifies the adjustment process of the imaging spectrometer optical system with a plurality of optical elements and extremely complex spatial relationship, has the advantages of simple principle and method, high precision and the like, and is particularly suitable for the development of the space-borne imaging spectrometer with compact structure, light weight and miniaturization.
The method and steps of the embodiments of the present invention will be described in detail with reference to fig. 1 to 9 in the embodiments of the present invention:
(1) After the front off-axis three-reflection optical path unit 1 is assembled and regulated, the first reference cube 9 is installed at the top of the frame body 8 after the image quality is qualified (namely, the preset standard is met), and three vertical surface normals of the first reference cube 9 are respectively parallel to the optical axis, the horizontal axis and the vertical axis of the system;
(2) Mounting a first folding mirror 5 by taking the first reference cube 9 in the step (1) as a reference, so that the optical axis of the front off-axis three-reflection optical path unit 1 is deflected by 90 degrees;
(3) The lens light path unit 2 is assembled and regulated, an annular plane mirror 11 is arranged on the end face of a mirror chamber 10 of the lens light path unit, the normal line of the annular plane mirror is parallel to the optical axis of the lens light path unit, the annular plane mirror is characterized in that an outer ring is a reflecting surface, a hollow part ensures no obstruction to the light path, the lens light path unit is installed at the rear part of a first folding mirror 5 after qualified image quality, the first reference cube 9 is taken as a reference in the step (1), and the optical axis direction of the lens light path unit 2 is regulated to be parallel to the optical axis of the front off-axis three-reflection light path unit 1 after being deflected by 90 degrees;
(4) The annular plane mirror 11 in the step (3) is taken as a reference to install a second folding mirror 6, so that the optical axis of the lens light path unit 2 is deflected by 90 degrees, a second folding mirror 6 assembly and a frame body 8 are pinned and positioned, and then the second folding mirror 6 assembly is removed;
(5) The scanning light path unit 3 is adjusted to ensure that the incident light rays are parallel to the emergent light rays and are not installed in the optical system temporarily;
(6) The grating device 24 comprises a diffraction grating frame 12 and a grating 7, wherein a second reference cube 13 is arranged on the diffraction grating frame 12, and three vertical planes of the second reference cube are adjusted to be parallel to three vertical planes of the grating 7 respectively;
(7) Suspending the grating 7 at the interface corresponding to the frame body 8 by using a six-dimensional adjusting frame, adjusting the posture of the grating 7 to a theoretical design state by using the first reference cube 9 as a reference, then calculating diffraction angle deviation delta theta caused by different detection wavelengths and system working wavelengths according to a grating diffraction formula dsin theta = k lambda, and rotating the grating 7 by a corresponding angle delta theta by using the six-dimensional adjusting frame;
(8) The method comprises the steps of mounting a first image surface device 15 to a frame body 8 (at the position of a second folding mirror 6 assembly), wherein a first view field is formed in the first image surface device, 9 view field positioning holes 16 are machined in the first view field, the view field positioning holes 16 arranged at the right center of the first view field are marked as first positioning holes according to different distribution positions of the view field positioning holes 16, the rest 8 view field positioning holes 16 surrounding the first positioning holes are marked as second positioning holes, the distribution mode of the common view field positioning holes 16 is 'field' distribution, the 9 transverse and longitudinal intersection points of the field are shown in the figure, namely, the typical view field positions of an image surface, when the image quality is adjusted and optimized, the quality of the image quality of the 9 view fields can be represented by only detecting the quality of the whole system, the 9 typical view field positions of the first image surface device are represented, the aperture diameter is preferably 1.5mm, the axial thickness is preferably 1 mm-2 mm, so that light blocking is avoided, the mounting of a screw hole 17 and the view field positioning holes 16 are machined by adopting five-axis control centers at one time, the relative positioning screw hole position is guaranteed to be more than the position of a conical surface of a lathe, and the precision positioning screw is better than the precision of a conical surface is machined by adopting a special positioning screw and the precision positioning screw and is guaranteed to be 19.01 mm, and the precision positioning screw is better than the precision is machined by adopting a positioning screw and is 19.01 mm and is better than a positioning precision than a positioning screw and is adopted to a positioning screw and is positioned;
(9) The method comprises the steps of installing a second image surface device 21, wherein a second view field 25 is arranged on the second image surface device, 9 image surface positioning holes 22 are processed on the second view field 25, the image surface positioning holes 22 arranged at the right center of the second view field 25 are marked as third positioning holes according to different distribution positions of the image surface positioning holes 22, the rest 8 image surface positioning holes 22 surrounding the third positioning holes are marked as fourth positioning holes, the common image surface positioning holes 22 are distributed in a 'field' shape, 9 transverse and longitudinal intersection points of the field shape are typical view field positions of an image surface, when the image quality is adjusted and optimized, the quality of the image quality of the 9 view fields can be represented by only detecting the quality of the image quality of the whole system, the 9 typical view field positions of the spectrum image surface are represented, the aperture is preferably phi 1.5mm, the axial thickness is preferably 1mm to 2mm so as to avoid light blocking, the installation screw holes 23 and the image surface positioning holes 22 are processed by adopting a five-axis numerical control processing center for one time, thus the relative spatial position is guaranteed, the ultra-precision positioning screw is better than the precision positioning screw is processed by adopting a special lathe, and the ultra-precision positioning screw is better than the precision positioning screw is processed by adopting a 19.01 mm, and the ultra-precision positioning screw is better than the precision positioning screw is processed by adopting a 19 mm;
(10) A spherical standard mirror is arranged in front of the first image surface device 15, the F number of the standard mirror is slightly smaller than that of the system F number, a 4D interferometer is arranged in front of the second image surface device 21, the standard spherical mirror is aligned with the first positioning hole, and the 4D interferometer is aligned with the third positioning hole;
(11) Maintaining the state of the step (10) unchanged, carrying out adjustment on the spectral imaging light path unit 4, carrying out the image quality detection of the other 8 fields of view (namely, the image quality detection of the second positioning hole and the fourth positioning hole) after the image quality detection is qualified (namely, the predetermined standard is met), dismantling the first image plane device 15 and withdrawing the standard spherical mirror after the image quality detection is qualified, installing the second folding mirror 6, and carrying out precise posture resetting by using pins;
(12) The scanning light path unit 3 is installed, a standard plane mirror (the caliber is larger than the total light transmission caliber of the system) is arranged in front of the front off-axis three-reflection light path unit 1, the standard plane mirror is adjusted to be perpendicular to the optical axis of the system by taking the first reference cube 9 as a reference, a 4D interferometer arranged in front of the second image plane device 21 is focused on a third positioning hole, all light paths of the system are correctly butted (ensuring that light beams propagate according to a preset track) by adjusting the interval of the scanning mirrors and the integral posture of the light paths, and after the image quality of the third positioning hole meets the requirement, the image quality detection of the other 8 fields (namely a fourth positioning hole) is carried out;
(13) After the image quality of the main system is qualified, the rotation-delta theta angle of the grating 7 is recovered to the theoretical posture (namely reverse rotation);
(14) And installing a slit assembly 14, detecting slit image brightness (DN value) and spectral line half width received by a spectrum image surface detector by utilizing an H alpha wave band laser light source, and adjusting the position of the slit assembly 14 to ensure that the slit image brightness is maximum, wherein the spectral line half width meets the design requirement, so that the spectrometer is assembled and adjusted.
The half-width of the spectral line is an important technical index of the spectrometer, and the satisfaction of the index means that the core index of the pixel spectral resolution of the equipment meets the requirement. The maximum slit image brightness means that the position of the physical slit is just mounted at the theoretical optimal position of the optical system, and indirectly indicates that the spectrum imaging function of the whole device is optimal.
The invention has the beneficial effects that:
(1) The complex spectrometer optical system is divided into 4 independent light path units which are respectively and independently assembled and adjusted, so that the degree of freedom and difficulty of assembling and adjusting the system are greatly reduced;
(2) The rotation of the grating is utilized, and the system is assembled and adjusted by changing the detection wavelength, so that the problem that the existing hardware equipment is inconsistent with the working wave band of the system is avoided;
(3) Each light path unit is independently detected, and interference detection after the whole system is in butt joint is realized through a folding mirror and a scanning mechanism, so that the image quality of the system can be adjusted to be close to the diffraction limit;
(4) The reference extraction of each optical element is skillfully performed by using a cubic prism (a first reference cube, a second reference cube) and a plane mirror, and accurate aiming and detection are performed by using a theodolite, so that the adjustment precision is greatly improved;
(5) The mechanical coordinate system and the optical system coordinate system are accurately corresponding by utilizing the high-precision view field and the image plane positioning tool, so that the smooth installation of each optical lens group and the frame is ensured.
Although the embodiments described above have been described in the text and drawings of the present application, the scope of the patent application is not limited thereby. All technical schemes generated by replacing or modifying equivalent structures or equivalent flows based on the essential idea of the application and by utilizing the contents recorded in the text and the drawings of the application, and the technical schemes of the embodiments are directly or indirectly implemented in other related technical fields, and the like, are included in the patent protection scope of the application.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
The above embodiments of the present invention do not limit the scope of the present invention. Any of various other corresponding changes and modifications made according to the technical idea of the present invention should be included in the scope of the claims of the present invention.
Claims (9)
1. The method is characterized in that the imaging spectrometer optical system comprises a frame body, a front off-axis three-reflection optical path unit, a lens optical path unit, a scanning optical path unit, a spectrum imaging unit and a first reference cube, wherein the front off-axis three-reflection optical path unit, the lens optical path unit, the scanning optical path unit and the spectrum imaging unit are sequentially arranged on the frame body along the light beam propagation direction;
the method comprises the following steps:
a first reference cube is arranged on the frame body, and is provided with three vertical surfaces, and the normals of the three vertical surfaces are respectively parallel to an optical axis, a horizontal axis and a vertical axis of the optical system;
the front off-axis three-reflecting light path unit is adjusted, and a first reference cube is used as a reference, and a first folding mirror is arranged at a light outlet of the front off-axis three-reflecting light path unit, so that an optical axis of the front off-axis three-reflecting light path unit is deflected by 90 degrees;
the method comprises the steps of installing and adjusting a lens light path unit, wherein the lens light path unit is installed on a frame body, and the front off-axis three-reflection light path unit is arranged at the outgoing end;
the scanning light path unit is adjusted, and a slit component is arranged at the emergent end of the scanning light path unit;
the optical spectrum imaging unit is assembled and adjusted, so that light rays emitted from the slit can be diffracted on the optical spectrum imaging unit, and a spectral image in a preset wave band range after diffraction is obtained;
the optical system comprises an optical system, a spectrum imaging unit, a first image plane device, a grating device, a second image plane device and an imaging device, wherein the optical system further comprises a second reference cube, the second reference cube is arranged on the grating device, the first image plane device comprises a first view field, the first view field comprises a first positioning hole and a plurality of second positioning holes, the first positioning hole is arranged at the center of the first view field, the second positioning holes are distributed in the circumferential direction of the first positioning holes, the second image plane device comprises a second view field, the second view field comprises a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is arranged at the center of the second view field, and the fourth positioning hole is distributed in the circumferential direction of the third positioning hole;
the method further comprises the steps of:
a second reference cube is arranged on the grating device, and is provided with three mutually perpendicular surfaces, and the three mutually perpendicular surfaces of the second reference cube are respectively parallel to the three mutually perpendicular surfaces of the grating device;
suspending the grating device at the interface corresponding to the frame body by adopting a six-dimensional adjusting frame, and adjusting the posture of the grating device to a theoretical design posture by taking the first reference cube as a reference;
adjusting the grating device to rotate to a preset angle delta theta;
setting a spherical standard mirror at the emergent end of the first image plane device, and enabling the focus of the standard spherical mirror to be aligned with the center of the first positioning hole;
arranging an interferometer at the emergent end of the second image plane device, and enabling the focus of the interferometer to be aligned with the center of the third positioning hole;
and adjusting the posture of the imaging device so that the spectrum image quality formed by the light beam on the imaging device meets the preset requirement, and then removing the first image surface device and the spherical standard mirror.
2. The method of tuning an imaging spectrometer optical system according to claim 1, further comprising the steps of:
the first image surface device is arranged at the installation position of the second folding mirror, and the installation position of the second folding mirror is determined by the following steps:
the position of the second folding mirror on the frame body is determined based on the first reference cube so as to deflect the optical axis of the light beam emitted from the slit by 90 degrees.
3. The method of tuning an optical system of an imaging spectrometer according to claim 2, wherein the qualification of the spectral image further comprises:
and arranging the second folding mirror at the position of the first image surface device after the first image surface device is removed.
4. A method of tuning an imaging spectrometer optical system according to claim 3, wherein the optical system further comprises a scanning optical path unit disposed between the lens optical path unit and the spectral imaging unit, the method further comprising the steps of:
and adjusting the scanning light path unit so that the incident light ray of the scanning light path unit is parallel to the emergent light ray of the scanning light path unit.
5. The method of adjusting an optical system of an imaging spectrometer according to claim 4, wherein the scanning optical path unit includes a plurality of facet mirrors, the facet mirrors include a first lens, a second lens, a third lens, and a fourth lens, the first lens is disposed in parallel with the second lens, the first lens is perpendicular to the fourth lens, the second lens is perpendicular to the third lens, and the third lens is disposed in parallel with the fourth lens, the method further comprising the steps of:
adjusting the posture of the scanning light path unit to enable the first lens to form 45 degrees with the horizontal direction of the first reference cube;
focusing an interferometer arranged at the emergent end of the second image plane device on the center of the third positioning hole;
the interval between the first lens and the second lens of the scanning light path unit and the integral posture of the scanning light path unit are adjusted, so that light paths of all light path units of the optical system meet a preset track;
and detecting the image quality of the rest fourth positioning holes after the image quality of the right central end surface of the third positioning hole meets the preset requirement.
6. The method of tuning an imaging spectrometer optical system according to claim 5, further comprising:
and after the image quality of the plurality of second view field positioning holes meets the preset requirement, recovering the rotation-delta theta angle of the grating device to the theoretical design posture.
7. The method of tuning an optical system of a spectrometer of claim 6, wherein the optical system further comprises a slit assembly, and the imaging device comprises a spectral image plane detector;
the method further comprises the steps of:
the slit of the slit component is arranged at the emergent end of the scanning light path unit;
detecting the slit image brightness and spectral line half width received by the spectrum image surface detector by adopting a laser light source with a preset wave band;
and adjusting the position of the slit component to enable the brightness of a slit image obtained by the spectrum image surface detector to be maximum, and enabling the half width of the spectral line to reach a preset value.
8. A spectrometer optical system, characterized in that it is suitable for the adjustment method of any one of the above claims 1-7, and comprises a frame body, a front off-axis three-reflection optical path unit, a lens optical path unit, a scanning optical path unit, a spectrum imaging unit, and a first reference cube, where the front off-axis three-reflection optical path unit, the lens optical path unit, the scanning optical path unit, and the spectrum imaging unit are sequentially disposed on the frame body along a beam propagation direction, and the first reference cube is disposed on the frame body.
9. The spectrometer optical system according to claim 8, wherein the spectral imaging unit sequentially sets a first image plane device, a grating device, a second image plane device, and an imaging device along an optical path direction, the optical system further comprises a second reference cube, the second reference cube is disposed on the grating device, the first image plane device comprises a first field of view, the first field of view comprises a first positioning hole and a plurality of second positioning holes, the first positioning hole is disposed at a center of the first field of view, the second positioning holes are distributed in a circumferential direction of the first positioning hole, the second image plane device comprises a second field of view, the second field of view comprises a third positioning hole and a plurality of fourth positioning holes, the third positioning hole is disposed at a center of the second field of view, and the fourth positioning holes are distributed in a circumferential direction of the third positioning hole.
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| CN111929878A (en) * | 2020-07-10 | 2020-11-13 | 中国科学院西安光学精密机械研究所 | Off-axis three-mirror short-focus front objective lens system of hyperspectral imager |
| CN113588082A (en) * | 2021-07-09 | 2021-11-02 | 中国科学院西安光学精密机械研究所 | High-precision quick assembling and adjusting method for off-axis prism dispersion type hyperspectral imager |
| CN115655470A (en) * | 2022-12-12 | 2023-01-31 | 中国科学院长春光学精密机械与物理研究所 | Space sun-facing imaging spectrometer |
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| CN111929878A (en) * | 2020-07-10 | 2020-11-13 | 中国科学院西安光学精密机械研究所 | Off-axis three-mirror short-focus front objective lens system of hyperspectral imager |
| CN113588082A (en) * | 2021-07-09 | 2021-11-02 | 中国科学院西安光学精密机械研究所 | High-precision quick assembling and adjusting method for off-axis prism dispersion type hyperspectral imager |
| CN115655470A (en) * | 2022-12-12 | 2023-01-31 | 中国科学院长春光学精密机械与物理研究所 | Space sun-facing imaging spectrometer |
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