CN112877646B - High-efficient vacuum plating device with mix and plate - Google Patents

Abstract

The utility model relates to a high-efficient vacuum plating device with mix and plate, belong to the electroplating device field, which comprises a frame, be provided with the vacuum hood in the frame, be provided with in the vacuum hood and electroplate frame and evaporimeter, still be provided with the material feeding unit who carries the electroplating material for the evaporimeter in the frame, material feeding unit includes conveying pipe and feeding mechanism, the conveying pipe is installed in the frame, feeding mechanism includes sieve separator and frequency controller, sieve separator and frequency controller all install in the frame, frequency controller includes the rolling disc and installs and be used for driving rolling disc pivoted driving piece in the frame, the material hole has been seted up on the rolling disc, material hole and conveying pipe cooperation have been deposited, the conveying pipe extends to in the evaporimeter. This application has the speed that can let the electroplating material get into and controls, improves the effect of electroplating efficiency.

Description

High-efficient vacuum plating device with mix and plate

Technical Field

The application relates to the field of electroplating equipment, in particular to a high-efficiency vacuum electroplating device with mixed plating.

Background

Electroplating is to form a film on the surface of a product, so that the product has higher performances such as wear resistance, strength and the like when in use. At present, vacuum plating is a new environmental protection trend in the aspect of surface treatment technology in order to meet the requirements of being safer, saving more energy, reducing noise and reducing pollutant emission. The vacuum plating is divided into several types of vacuum evaporation plating, sputtering plating and ion plating, and the vacuum evaporation plating has the advantages of simple film forming method, high film purity and compactness, unique film structure and performance and the like.

In actual production, hybrid plating is generally performed by an evaporation method, and the inventors have found that, in a vacuum evaporation process, although an instantaneous evaporation method can obtain a film having a uniform composition and can perform doping evaporation, the evaporation rate thereof is difficult to control, and thus improvement is required.

Disclosure of Invention

In order to well control the evaporation rate of the instantaneous evaporation method, the application provides an efficient vacuum plating device with mixed plating.

The application provides a high-efficient vacuum plating device with mix and plate adopts following technical scheme:

the utility model provides a high-efficient vacuum plating device with mix and plate, includes the frame, be provided with the vacuum cover in the frame, be provided with in the vacuum cover and electroplate frame and evaporimeter, still be provided with the material feeding unit who carries the electroplating material for the evaporimeter in the frame, material feeding unit includes conveying pipe and feeding mechanism, the conveying pipe is installed in the frame, feeding mechanism includes sieve separator and frequency controller, sieve separator and frequency controller all install in the frame, frequency controller includes the rolling disc and installs and be used for driving rolling disc pivoted driving piece in the frame, the material hole has been seted up on the rolling disc, deposit material hole and conveying pipe cooperation, the conveying pipe extends to in the evaporimeter.

Through adopting above-mentioned technical scheme, in electroplating material enters into frequency controller behind the sieve separator, through rolling disc and the driving piece in the frequency controller, let in proper order the electroplating material in the stock deposit in the feeder pipe that enters into, thereby let the electroplating material in order evaporate in entering into the evaporimeter, through the slew velocity of control rolling disc, thereby can let the speed that electroplating material got into reach control, and then solved the control problem of vacuum evaporation coating in-process evaporating material speed, the efficiency of electroplating has been improved.

Optionally, a shell is sleeved on the rotating disc, the shell is placed on two sides of the rotating disc and provided with a feeding hole and a blanking hole respectively, the blanking hole and the feeding hole are matched with the material storage hole, and the feeding pipe is communicated with the blanking hole.

Through adopting above-mentioned technical scheme, the setting up of casing can let the evaporation material get into in order, the chaotic condition of material entering can not appear.

Optionally, the aperture of the feeding hole is smaller than or equal to that of the material storage hole.

Through adopting above-mentioned technical scheme, the feed port aperture is less than the material storage hole, and it is downthehole to let the material in the feed port conveniently enter into the material storage, improves the degree of accuracy of feeding.

Optionally, the material storage hole is a tapered hole, and the aperture of the material storage hole close to the blanking hole is larger than the aperture of the material storage hole close to the feeding hole.

Through adopting above-mentioned technical scheme, the material stock hole sets to the bell mouth, lets it have decurrent rolling residual force to let it when with blanking hole UNICOM, the material can effectively get into.

Optionally, the aperture of the blanking hole is larger than that of the storage hole, and the blanking hole is obliquely arranged.

Through adopting above-mentioned technical scheme, the blanking hole is greater than the aperture of material storage hole, lets it can effectively receive the downthehole material of material storage, in addition, the blanking hole of slope setting, it can provide the component force of material downstream.

Optionally, the sieve separator includes the feeding dish, selects the charging tray and installs the rotating turret in selecting the charging tray, be provided with in the frame and rotate the piece, it rotates to rotate a drive rotating turret, feeding dish and selection charging tray are all fixed in the frame, the feeding dish is arranged in and is selected the charging tray top, select to have seted up the selection hole on the charging tray, and select the charging tray below to be provided with and arrange the material pipe, arrange material pipe and selection hole UNICOM.

Through adopting above-mentioned technical scheme, the cooperation of selecting the charging tray through rotating piece and selecting the material hole lets the electroplating material enter into when arranging the material pipe more orderly to once only get into a plurality of materials can not appear, thereby let the feeding more even.

Optionally, the rotating frame is provided with a rotating blade, the rotating blade is provided with a recessed portion, and the position of the recessed portion corresponds to the material selecting hole.

Through adopting above-mentioned technical scheme, rotor blade's setting can sweep into the material selection hole, through the setting of depressed part, can let the effectual gathering of electroplating material to improve the accuracy of feeding.

Optionally, the feeding tray includes feeder hopper and feeding branch fill, the feeding divides the fill setting to be close to the one side of selecting the charging tray at the feeder hopper, be provided with the unloading controller on the feeding branch fill.

By adopting the technical scheme, the blanking controller controls the speed of entering the material selecting disc from the beginning, so that the materials in the material selecting disc cannot be too much, and the material selecting disc can stably run.

Optionally, the discharging controller includes a discharging pipe and a discharging impeller installed on the discharging pipe, and a control part is arranged on the discharging pipe and drives the discharging impeller to rotate.

Through adopting above-mentioned technical scheme, the unloading impeller can let the material fall evenly to when not needing, directly stop the impeller rotation through the control, thereby reach the purpose of control unloading speed.

Optionally, the device further comprises a control module, and the control element, the rotating element and the driving element are all connected with the control module.

Through adopting above-mentioned technical scheme, control module's setting can let the control, rotate the speed of piece and driving piece can corresponding regulation to reach the more accurate purpose of control.

In summary, the present application includes at least one of the following beneficial technical effects:

1. by controlling the rotating speed of the rotating disc, the speed of the electroplating material can be controlled, the problem of controlling the speed of the evaporation material in the vacuum evaporation process is solved, and the electroplating efficiency is improved;

2. the diameters of the feeding hole, the material storage hole and the blanking hole are arranged from small to large, so that the feeding accuracy is improved, and the electroplating efficiency is improved;

3. the setting of the control module can enable the speed of the control element, the rotating element and the driving element to be correspondingly adjusted, so that the purpose of more accurate control is achieved.

Drawings

Fig. 1 is a perspective view of the whole structure of the present application.

Fig. 2 is a sectional view of the internal structure of the vacuum housing.

Fig. 3 is an overall perspective view of the sifter.

Fig. 4 is a view showing the structure of a feed tray. .

Fig. 5 is an enlarged view at a in fig. 4.

Fig. 6 is a selector plate structure diagram.

Fig. 7 is a structural diagram of a frequency controller.

FIG. 8 is a control module logic block diagram.

Reference numerals: 1. a frame; 2. a vacuum hood; 21. a vacuum device; 31. an evaporator; 32. electroplating frame; 4. a feed pipe; 5. a feeding mechanism; 6. a screener; 61. a feed tray; 611. a feed hopper; 612. feeding branch hoppers; 613. a blanking controller; 614. a discharging pipe; 615. blanking an impeller; 616. an impeller shaft; 617. a control member; 62. selecting a material tray; 621. selecting a material hole; 63. a rotating frame; 631. a rotor blade; 632. a rotating member; 633. a recessed portion; 7. a discharge pipe; 8. a frequency controller; 81. a housing; 811. a first side surface; 812. a second side surface; 813. a feed port; 814. a blanking hole; 82. rotating the disc; 821. a material storage hole; 83. a drive member; 9. and a control module.

Detailed Description

The present application is described in further detail below with reference to figures 1-8.

Referring to fig. 1 and fig. 2, the embodiment of the present application discloses a high-efficiency vacuum plating device with mixed plating, which includes a frame 1 and a vacuum plating device installed on the frame 1, wherein a vacuum cover 2 is arranged on the frame 1, a vacuum device 21 (the vacuum device 21 can adopt an air compressor) is connected to the vacuum cover 2, the vacuum plating device is installed in the vacuum cover 2, the vacuum plating device includes a plating rack 32 and an evaporator 31, and a feeding device for providing plating materials for the evaporator 31 is arranged on the frame 1. The parts to be electroplated are placed on an electroplating frame 32, the vacuum cover 2 is vacuumized through a vacuum device 21, and electroplating materials are conveyed into an evaporator 31 through a feeding device for evaporation electroplating.

As shown in fig. 1 and 2, the feeding device includes a feeding pipe 4 and a feeding mechanism 5 for controlling the speed of the plating material entering the feeding pipe 4, and the plating material is formed by metal beads for feeding convenience. Wherein, one end of the feeding pipe 4 extends into the evaporator 31, the other end is provided with the feeding mechanism 5, and the feeding pipe 4 is fixed on the frame 1. The feeding mechanism 5 comprises a screening device 6 and a frequency controller 8, the screening device 6 screens out the electroplating materials meeting the requirements, the selected electroplating materials are sent to the frequency controller 8, the frequency controller 8 sends the electroplating materials into the feeding pipe 4 in sequence, and the electroplating materials are sent into the evaporator 31 through the feeding pipe 4 to be evaporated.

As shown in fig. 3, the screening device 6 includes a feeding plate 61, a material selecting plate 62, and a rotating frame 63 installed in the material selecting plate 62, the feeding plate 61 and the material selecting plate 62 are both fixed on the frame 1, the feeding plate 61 is placed above the material selecting plate 62, the evaporation material is put into the feeding plate 61, the feeding plate 61 feeds the evaporation material into the material selecting plate 62, and the material is fed into the frequency controller 8 through the material selecting plate 62.

Referring to fig. 4 and 5, the feeding tray 61 includes a feeding hopper 611, a feeding sub-hopper 612, and a discharging controller 613, the feeding sub-hopper 612 is disposed at the bottom of the feeding hopper 611, and the feeding hopper 611 communicates with the feeding sub-hopper 612. The blanking controller 613 comprises a blanking pipe 614 and a blanking impeller 615 arranged on the blanking pipe 614, wherein an impeller shaft 616 is arranged on the blanking impeller, the impeller shaft 616 is perpendicular to the blanking direction of the blanking pipe 614, the blanking impeller 615 is fixed on the impeller shaft 616, and the impeller shaft 616 extends out of the blanking pipe 614. A control part 617 is arranged on the discharging pipe 614, the control part 617 is set to be a motor, and the control part 617 drives the impeller shaft 616 to rotate so as to drive the discharging impeller 615 to rotate, so that the purpose of controlling the discharging speed is achieved.

Referring to fig. 6, the material selecting plate 62 is provided with a plurality of material selecting holes 621, the rotating frame 63 is provided with a rotating blade 631, the rotating blade 631 is attached to the bottom of the material selecting plate 62, the frame 1 is provided with a rotating member 632, the rotating member 632 is formed by a motor, and the rotating member 632 drives the rotating frame 63 to rotate. The material selecting holes 621 are formed between adjacent rotor blades 631, and only one material selecting hole 621 is formed between the adjacent rotor blades 631. Generally, the angle between the adjacent material selecting holes 621 around the rotating frame 63 is integral multiple of the angle between the adjacent rotating blades 631, so that when the rotating blades 631 rotate, the material selecting holes 621 are always located between the two blades except the state that the rotating blades 631 and the material selecting holes 621 are overlapped, and at this time, the evaporating material can fall through the material selecting holes 621 singly. Meanwhile, in order to enable the space between each two adjacent blades to be provided with the same materials, the feeding branch hoppers 612 and the blanking pipes 614 are arranged in the same number with the rotating blades 631, the outlets of the blanking pipes 614 correspond to the material selecting holes 621, and the evaporation materials are sent to the range of the material selecting holes 621.

In order to facilitate the conveying of the evaporation material to the position of the material selecting hole 621 when the blade rotates, the rotating blade 631 is provided with a concave portion 633, the position of the concave portion 633 matches with the position of the material selecting hole 621, that is, the material selecting hole 621 is disposed at the position of the concave portion 633.

One side that deviates from rotating blade 631 at selection charging tray 62 is provided with row material pipe 7, arranges the evaporation material that material pipe 7 and selection material hole 621 correspond and will select material hole 621 to screen out and sorts, arranges in the material pipe 7 access frequency controller 8.

As shown in fig. 7, the frequency controller 8 includes a housing 81, a rotary disk 82 mounted on the housing 81, and a driving member 83 for rotating the rotary disk 82, and the discharge pipe 7 is engaged with the housing 81. The housing 81 is fixed on the frame 1, the housing 81 includes a first side 811 and a second side 812, the first side 811 and the second side 812 may be fixed on the frame 1, and the rotating disc 82 is disposed between the first side 811 and the second side 812 and respectively attached to the first side 811 and the second side 812. The rotating disc 82 is provided with a material storage hole 821, the first side surface 811 is provided with a material inlet hole 813, the second side surface 812 is provided with a material falling hole 814, the material falling hole 814 and the material inlet hole 813 are arranged in a staggered mode, and the distance from the material falling hole 814 to the rotating shaft of the rotating disc, the distance from the material storage hole 821 to the rotating shaft of the rotating disc and the distance from the material inlet hole 813 to the rotating shaft of the rotating disc are equal. The discharge pipe 7 is arranged corresponding to and communicated with the feeding hole 813, and the feeding pipe 4 is arranged corresponding to the blanking hole 814.

In order to allow the evaporation material to control its frequency of entry, the thickness of the rotating disk 82 is greater than the diameter of the evaporation material and less than twice the diameter of the evaporation material, and the stock holes 821 are provided as tapered holes having a smaller diameter through the first side 811 than the second side 812. Generally speaking, the aperture of the storage hole 821 through the first side 811 is larger than the aperture of the feeding hole 813, the aperture of the blanking hole 814 is larger than the aperture of the storage hole 821 near the second side 812, and the blanking hole 814 is disposed obliquely, so that the evaporation material can smoothly enter the feeding pipe 4.

In order to make the evaporation material smoothly fall into the evaporator 31, the horizontal heights of the feed tray 61, the material selecting tray 62 and the frequency controller 8 are set from top to bottom, and the discharge pipe 7 and the feed pipe 4 are both obliquely arranged.

In order to make the frequency control of feeding more accurate, the frequency controller 8 can be provided in a plurality of numbers, the material selecting holes 621 formed in the material selecting disc 62 can also be provided in a plurality of numbers, the number of the frequency controller 8 corresponds to the number of the material selecting holes 621, meanwhile, when the position between the frequency controller 8 and the material selecting disc 62 is inconvenient to arrange, the material selecting disc 62 and the material feeding disc 61 can also be provided in a plurality of numbers, the frequency controller 8, the material selecting disc 62 and the material feeding disc 61 can be arranged in a one-to-one correspondence manner, and the arrangement of the material selecting discs 62 and the material feeding disc 61 can make the equipment perform mixed plating.

As shown in fig. 8, a control module 9 is further installed, the control module 9 may be installed on the rack 1 (not shown on the rack 1), the control module 9 may be formed by a PLC or a central processing unit, the control element 617, the rotating element 632, and the driving element 83 are all connected to the control module 9, and the feeding speed is controlled by the control module 9, so as to achieve the purpose of controlling the frequency.

The working process is as follows: the evaporation materials are placed in the feed hopper 611 and directly dispersed in the feeding sub-hopper 612, parts to be electroplated are placed on the electroplating frame 32, the vacuum cover 2 is vacuumized through the vacuum equipment 21, the vacuumization is continuously performed after the vacuum degree in the vacuum cover 2 meets the requirement, at the moment, the evaporator 31 is started, signals are sent through the control module 9, the control part 617, the rotating part 632 and the driving part 83 work, the evaporation materials in the feeding sub-hopper 612 sequentially pass through the material selecting plate 62 and the frequency controller 8 to enter the material feeding pipe 4, and finally enter the evaporator 31 to be subjected to evaporation electroplating.

The above embodiments are preferred embodiments of the present application, and the protection scope of the present application is not limited by the above embodiments, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.

Claims (6)

1. The utility model provides an efficient vacuum electroplating device with mix and plate, includes frame (1), be provided with vacuum hood (2) in frame (1), be provided with in vacuum hood (2) and electroplate frame (32) and evaporimeter (31), its characterized in that: the electroplating machine is characterized in that a feeding device for conveying electroplating materials for the evaporator (31) is further arranged on the rack (1), the feeding device comprises a feeding pipe (4) and a feeding mechanism (5), the feeding pipe (4) is mounted on the rack (1), the feeding mechanism (5) comprises a screener (6) and a frequency controller (8), the screener (6) and the frequency controller (8) are both mounted on the rack (1), the frequency controller (8) comprises a rotating disc (82) and a driving piece (83) mounted on the rack (1) and used for driving the rotating disc (82) to rotate, a material storage hole (821) is formed in the rotating disc (82), the material storage hole (821) is matched with the feeding pipe (4), and the feeding pipe (4) extends into the evaporator (31);

the rotary disc (82) is sleeved with a shell (81), the shell (81) is arranged on two sides of the rotary disc (82) and is respectively provided with a feeding hole (813) and a blanking hole (814), the blanking hole (814) and the feeding hole (813) are matched with a storage hole (821), and the feeding pipe (4) is communicated with the blanking hole (814);

the aperture of the feeding hole (813) is smaller than or equal to that of the storage hole (821), the storage hole (821) is arranged to be a conical hole, the aperture of one side, close to the blanking hole (814), of the storage hole is larger than that of the feeding hole (813), the aperture of the blanking hole (814) is larger than that of the storage hole (821), and the blanking hole (814) is obliquely arranged;

the thickness of the rotating disc (82) is larger than the diameter of the electroplating material and smaller than the diameter twice of the electroplating material, and the blanking hole (814) and the feeding hole (813) are arranged in a staggered mode.

2. The efficient vacuum plating apparatus with hybrid plating according to claim 1, characterized in that: the sieve separator (6) include feeding dish (61), select material dish (62) and install rotating turret (63) in selecting material dish (62), be provided with in frame (1) and rotate piece (632), it rotates to rotate piece (632) drive rotating turret (63), feeding dish (61) and select material dish (62) are all fixed on frame (1), feeding dish (61) are arranged in and are selected material dish (62) top, select material hole (621) have been seted up on material dish (62), and select material dish (62) below is provided with row material pipe (7), arrange material pipe (7) and select material hole (621) UNICOM.

3. The efficient vacuum plating apparatus with hybrid plating according to claim 2, characterized in that: the rotating frame (63) is provided with a rotating blade (631), the rotating blade (631) is provided with a concave part (633), and the position of the concave part (633) corresponds to the material selecting hole (621).

4. The efficient vacuum plating apparatus with hybrid plating according to claim 2, characterized in that: the feeding disc (61) comprises a feeding hopper (611) and a feeding sub-hopper (612), the feeding sub-hopper (612) is arranged on one side, close to the material selecting disc (62), of the feeding hopper (611), and a discharging controller (613) is arranged on the feeding sub-hopper (612).

5. The efficient vacuum plating apparatus with hybrid plating according to claim 4, characterized in that: the blanking controller (613) comprises a blanking pipe (614) and a blanking impeller (615) mounted on the blanking pipe (614), wherein a control part (617) is arranged on the blanking pipe (614), and the control part (617) drives the blanking impeller (615) to rotate.

6. The efficient vacuum plating apparatus with hybrid plating according to claim 5, characterized in that: the device is characterized by further comprising a control module (9), wherein the control part (617), the rotating part (632) and the driving part (83) are all connected with the control module (9).

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