CN112864283A - 一种提升异质结太阳能电池电学性能的工艺方法 - Google Patents
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Abstract
本发明公开了一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:制绒清洗;CVD沉积非晶硅薄膜;PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。本发明使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。
Description
技术领域
本发明涉及晶体硅太阳能电池领域,尤其涉及一种提升异质结太阳能电池电学性能的工艺方法。
背景技术
目前晶体硅太阳能电池的工艺技术较为成熟,多晶在18%-19%,单晶在19-20%左右,单晶PERC在20-21%左右。经过多年的改进,晶硅电池的成本已有大幅的下降,目前继续下降的空间比较有限。而国内高效异质结太阳能电池的研发和产业化已经取得很大的突破,电池效率已经取得了较大的提升,量产也达到了22-23%左右的效率水平。
目前异质结电池效率进一步提升遇到了瓶颈,跟PREC电池相比,开路电压Voc和填充因子FF有明显的优势,但是短路电流差距比较明显。PERC电池的短路电流Isc达到10A左右,异质结电池的短路电流在9.2-9.3A,还有很大的提升空间。两者之间的差别在PREC电池的减反膜是SIN,减反射效果比较好。而异质结电池的减反膜是ITO,同时它又是导电膜,在方块电阻和透过率之间要取平衡值,这就限制了ITO作为减反膜的效果不如氮化硅。因此如何优化ITO薄膜,使其电阻率和透过率达到最佳的状态,成为异质结电池效率提升的一个重要方向。
发明内容
针对上述问题,本发明提供了一种提升异质结太阳能电池电学性能的工艺方法。
为解决上述技术问题,本发明所采用的技术方案是:一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:
制绒清洗;
CVD沉积非晶硅薄膜;
PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;
制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。
进一步的,所述制绒清洗工艺采用碱制绒,金字塔尺寸控制在1-10um。
进一步的,所述CVD沉积非晶硅薄膜工艺,本征非晶硅厚度为1-20nm,P型发射极非晶硅层厚度为1-30nm,N型背场非晶硅层厚度为1-20nm。
进一步的,所述P高透光ITO薄膜厚度为80-120nm,低电阻ITO薄膜厚度为5-20nm。
进一步的,所述金属电极为银或铜锡叠层,电极高度为10-40um。
进一步的,所述蚀刻液为酸液,蚀刻ITO薄膜厚度为10-30nm。
由上述对本发明结构的描述可知,和现有技术相比,本发明具有如下优点:
本发明在沉积完非晶硅薄膜之后,分别沉积高透光ITO薄膜和低电阻ITO薄膜;其中低电阻ITO薄膜用于跟金属电极形成欧姆接触,高透光ITO薄膜用于减反射,之后形成金属电极;最后蚀刻金属电极区域外的低电阻ITO薄膜完成电池的制作。这种电池工艺由于使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。
附图说明
构成本申请的一部分的附图用来提供对本发明的进一步理解,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。
在附图中:
图1为本发明一种提升异质结太阳能电池电学性能的工艺方法流程图;
图2为本发明一种高电学性能的异质结太阳能电池示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。
实施例
参考图1,一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:
S01、制绒清洗,所述制绒清洗工艺采用碱制绒,碱性溶液为KOH溶液,所述绒面尺寸为2um;
S02、CVD沉积非晶硅薄膜,所述CVD沉积非晶硅薄膜工艺,本征非晶厚度为10nm,P型非晶硅为15nm,N型非晶硅为5nm;
S03、PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜,所述高透光ITO薄膜厚度为110nm,低电阻ITO薄膜厚度为10nm;
S04、制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜,所述金属电极为Ag,电极厚度为30um,所述蚀刻溶液为盐酸溶液,蚀刻电极外区域的ITO厚度为10nm。
电池结构如图2所示,其自上而下包括,金属栅线电极7;低电阻ITO薄膜6;高透光ITO薄膜5;P型非晶硅薄膜3;本征非晶硅薄膜2;N型单晶硅片1:本征非晶硅层2;N型非晶硅层4;高透光ITO薄膜5;低电阻ITO薄膜6;金属栅线电极7。
本发明在沉积完非晶硅薄膜之后,分别沉积高透光ITO薄膜和低电阻ITO薄膜;其中低电阻ITO薄膜用于跟金属电极形成欧姆接触,高透光ITO薄膜用于减反射,之后形成金属电极;最后蚀刻金属电极区域外的低电阻ITO薄膜完成电池的制作。这种电池工艺由于使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。
Claims (6)
1.一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述方法包括如下步骤:
制绒清洗;
CVD沉积非晶硅薄膜;
PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;
制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。
2.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述制绒清洗工艺采用碱制绒,金字塔尺寸控制在1-10um。
3.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述CVD沉积非晶硅薄膜工艺,本征非晶硅厚度为1-20nm,P型发射极非晶硅层厚度为1-30nm,N型背场非晶硅层厚度为1-20nm。
4.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述P高透光ITO薄膜厚度为80-120nm,低电阻ITO薄膜厚度为5-20nm。
5.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述金属电极为银或铜锡叠层,电极高度为10-40um。
6.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述蚀刻液为酸液,蚀刻ITO薄膜厚度为10-30nm。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130146132A1 (en) * | 2010-08-09 | 2013-06-13 | Kaneka Corporation | Crystalline silicon-based solar cell |
CN106601855A (zh) * | 2015-10-14 | 2017-04-26 | 钧石(中国)能源有限公司 | 一种双面发电异质结太阳能电池的制备方法 |
CN207637824U (zh) * | 2017-12-11 | 2018-07-20 | 晋能光伏技术有限责任公司 | 一种高效晶硅/非晶硅异质结电池结构 |
CN109166940A (zh) * | 2017-06-19 | 2019-01-08 | 福建金石能源有限公司 | 一种高效异质结太阳能电池的电极制作方法 |
US20190148579A1 (en) * | 2017-11-15 | 2019-05-16 | Beijing Juntailnnovation Technology Co., Ltd. | Heterojunction solar cell and preparation method thereof |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130146132A1 (en) * | 2010-08-09 | 2013-06-13 | Kaneka Corporation | Crystalline silicon-based solar cell |
CN106601855A (zh) * | 2015-10-14 | 2017-04-26 | 钧石(中国)能源有限公司 | 一种双面发电异质结太阳能电池的制备方法 |
CN109166940A (zh) * | 2017-06-19 | 2019-01-08 | 福建金石能源有限公司 | 一种高效异质结太阳能电池的电极制作方法 |
US20190148579A1 (en) * | 2017-11-15 | 2019-05-16 | Beijing Juntailnnovation Technology Co., Ltd. | Heterojunction solar cell and preparation method thereof |
CN207637824U (zh) * | 2017-12-11 | 2018-07-20 | 晋能光伏技术有限责任公司 | 一种高效晶硅/非晶硅异质结电池结构 |
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