CN112864283A - 一种提升异质结太阳能电池电学性能的工艺方法 - Google Patents

一种提升异质结太阳能电池电学性能的工艺方法 Download PDF

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CN112864283A
CN112864283A CN201911086915.8A CN201911086915A CN112864283A CN 112864283 A CN112864283 A CN 112864283A CN 201911086915 A CN201911086915 A CN 201911086915A CN 112864283 A CN112864283 A CN 112864283A
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张�杰
宋广华
罗骞
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Fujian Jp Solar Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/072Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
    • H01L31/074Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a heterojunction with an element of Group IV of the Periodic System, e.g. ITO/Si, GaAs/Si or CdTe/Si solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

本发明公开了一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:制绒清洗;CVD沉积非晶硅薄膜;PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。本发明使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。

Description

一种提升异质结太阳能电池电学性能的工艺方法
技术领域
本发明涉及晶体硅太阳能电池领域,尤其涉及一种提升异质结太阳能电池电学性能的工艺方法。
背景技术
目前晶体硅太阳能电池的工艺技术较为成熟,多晶在18%-19%,单晶在19-20%左右,单晶PERC在20-21%左右。经过多年的改进,晶硅电池的成本已有大幅的下降,目前继续下降的空间比较有限。而国内高效异质结太阳能电池的研发和产业化已经取得很大的突破,电池效率已经取得了较大的提升,量产也达到了22-23%左右的效率水平。
目前异质结电池效率进一步提升遇到了瓶颈,跟PREC电池相比,开路电压Voc和填充因子FF有明显的优势,但是短路电流差距比较明显。PERC电池的短路电流Isc达到10A左右,异质结电池的短路电流在9.2-9.3A,还有很大的提升空间。两者之间的差别在PREC电池的减反膜是SIN,减反射效果比较好。而异质结电池的减反膜是ITO,同时它又是导电膜,在方块电阻和透过率之间要取平衡值,这就限制了ITO作为减反膜的效果不如氮化硅。因此如何优化ITO薄膜,使其电阻率和透过率达到最佳的状态,成为异质结电池效率提升的一个重要方向。
发明内容
针对上述问题,本发明提供了一种提升异质结太阳能电池电学性能的工艺方法。
为解决上述技术问题,本发明所采用的技术方案是:一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:
制绒清洗;
CVD沉积非晶硅薄膜;
PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;
制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。
进一步的,所述制绒清洗工艺采用碱制绒,金字塔尺寸控制在1-10um。
进一步的,所述CVD沉积非晶硅薄膜工艺,本征非晶硅厚度为1-20nm,P型发射极非晶硅层厚度为1-30nm,N型背场非晶硅层厚度为1-20nm。
进一步的,所述P高透光ITO薄膜厚度为80-120nm,低电阻ITO薄膜厚度为5-20nm。
进一步的,所述金属电极为银或铜锡叠层,电极高度为10-40um。
进一步的,所述蚀刻液为酸液,蚀刻ITO薄膜厚度为10-30nm。
由上述对本发明结构的描述可知,和现有技术相比,本发明具有如下优点:
本发明在沉积完非晶硅薄膜之后,分别沉积高透光ITO薄膜和低电阻ITO薄膜;其中低电阻ITO薄膜用于跟金属电极形成欧姆接触,高透光ITO薄膜用于减反射,之后形成金属电极;最后蚀刻金属电极区域外的低电阻ITO薄膜完成电池的制作。这种电池工艺由于使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。
附图说明
构成本申请的一部分的附图用来提供对本发明的进一步理解,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。
在附图中:
图1为本发明一种提升异质结太阳能电池电学性能的工艺方法流程图;
图2为本发明一种高电学性能的异质结太阳能电池示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。
实施例
参考图1,一种提升异质结太阳能电池电学性能的工艺方法,所述方法包括如下步骤:
S01、制绒清洗,所述制绒清洗工艺采用碱制绒,碱性溶液为KOH溶液,所述绒面尺寸为2um;
S02、CVD沉积非晶硅薄膜,所述CVD沉积非晶硅薄膜工艺,本征非晶厚度为10nm,P型非晶硅为15nm,N型非晶硅为5nm;
S03、PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜,所述高透光ITO薄膜厚度为110nm,低电阻ITO薄膜厚度为10nm;
S04、制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜,所述金属电极为Ag,电极厚度为30um,所述蚀刻溶液为盐酸溶液,蚀刻电极外区域的ITO厚度为10nm。
电池结构如图2所示,其自上而下包括,金属栅线电极7;低电阻ITO薄膜6;高透光ITO薄膜5;P型非晶硅薄膜3;本征非晶硅薄膜2;N型单晶硅片1:本征非晶硅层2;N型非晶硅层4;高透光ITO薄膜5;低电阻ITO薄膜6;金属栅线电极7。
本发明在沉积完非晶硅薄膜之后,分别沉积高透光ITO薄膜和低电阻ITO薄膜;其中低电阻ITO薄膜用于跟金属电极形成欧姆接触,高透光ITO薄膜用于减反射,之后形成金属电极;最后蚀刻金属电极区域外的低电阻ITO薄膜完成电池的制作。这种电池工艺由于使用了低电阻ITO薄膜跟金属电极形成欧姆接触,降低了接触电阻;同时使用了高透光ITO薄膜作为减反射薄膜,提升了短路电流,从而使异质结电池的转换效率有了较大的提升。所以本发明提供了一个高转换效率、低成本的提升电学性能的方案,对高效异质结电池的量产和发展具有非常重要的意义。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。

Claims (6)

1.一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述方法包括如下步骤:
制绒清洗;
CVD沉积非晶硅薄膜;
PVD分别沉积高透光ITO薄膜和低电阻ITO薄膜;
制作金属电极,以及蚀刻金属电极区域外的低电阻ITO薄膜。
2.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述制绒清洗工艺采用碱制绒,金字塔尺寸控制在1-10um。
3.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述CVD沉积非晶硅薄膜工艺,本征非晶硅厚度为1-20nm,P型发射极非晶硅层厚度为1-30nm,N型背场非晶硅层厚度为1-20nm。
4.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述P高透光ITO薄膜厚度为80-120nm,低电阻ITO薄膜厚度为5-20nm。
5.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述金属电极为银或铜锡叠层,电极高度为10-40um。
6.根据权利要求1所述一种提升异质结太阳能电池电学性能的工艺方法,其特征在于:所述蚀刻液为酸液,蚀刻ITO薄膜厚度为10-30nm。
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US20130146132A1 (en) * 2010-08-09 2013-06-13 Kaneka Corporation Crystalline silicon-based solar cell
CN106601855A (zh) * 2015-10-14 2017-04-26 钧石(中国)能源有限公司 一种双面发电异质结太阳能电池的制备方法
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