CN112835241B - Electronic equipment based on multi-color electrochromic structure and method for hiding functional components - Google Patents
Electronic equipment based on multi-color electrochromic structure and method for hiding functional components Download PDFInfo
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- CN112835241B CN112835241B CN201911165088.1A CN201911165088A CN112835241B CN 112835241 B CN112835241 B CN 112835241B CN 201911165088 A CN201911165088 A CN 201911165088A CN 112835241 B CN112835241 B CN 112835241B
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- 238000007733 ion plating Methods 0.000 description 1
- 229910001540 lithium hexafluoroarsenate(V) Inorganic materials 0.000 description 1
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 1
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002106 nanomesh Substances 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- UGFMBZYKVQSQFX-UHFFFAOYSA-N para-methoxy-n-methylamphetamine Chemical compound CNC(C)CC1=CC=C(OC)C=C1 UGFMBZYKVQSQFX-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003208 poly(ethylene sulfide) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/155—Electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The invention discloses an electronic device based on a multi-color electrochromic structure and a method for hiding functional components. The electronic device includes: the display screen, the functional component, the multi-color electrochromic structure covering the functional component, and the control circuit electrically connected with the multi-color electrochromic structure; the multi-color electrochromic structure comprises a working electrode, electrolyte and a counter electrode, wherein the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite to each other and are arranged in parallel, a dielectric layer is arranged between the working electrode and the second optical structure layer, the dielectric layer is made of electrochromic materials, the combination interfaces of the dielectric layer and the first optical structure layer and the combination interfaces of the dielectric layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity. The invention can not only realize that the functional component obtains external light by changing the light transmittance of the multi-color electrochromic structure, but also completely hide the functional component when the functional component is not used.
Description
Technical Field
The invention relates to an electrochromic device, in particular to electronic equipment based on a multi-color electrochromic structure and a method for hiding functional components of the electronic equipment based on the multi-color electrochromic structure, and belongs to the technical field of optics or photoelectricity.
Background
With the continuous development of electronic technology, electronic devices are capable of achieving more and more functions. The display screen of the electronic device needs to be provided with necessary functional components, such as a front camera, a light sensor and the like, so that holes are dug in the display screen to enable light to enter the functional components. Meanwhile, in order to be attractive, the functional components are required to be hidden as much as possible, black ink is required to be arranged on the display screen corresponding to the functional components, so that less light enters the functional components, and the effect of the functional components is affected.
Disclosure of Invention
The invention mainly aims to provide electronic equipment based on a multi-color electrochromic structure and a method for hiding functional components of the electronic equipment based on the multi-color electrochromic structure, so as to overcome the defects in the prior art.
In order to achieve the purpose of the invention, the technical scheme adopted by the invention comprises the following steps:
The embodiment of the invention provides an electronic device based on a multi-color electrochromic structure, which comprises: the display screen, the functional component, the multi-color electrochromic structure covering the functional component, and the control circuit electrically connected with the multi-color electrochromic structure;
the control circuit can regulate the light transmittance of the multi-color electrochromic structure, so that when the functional component is in an activated state, an optical signal matched with the functional component can penetrate through the multi-color electrochromic structure, and when the functional component is in a non-activated state, the multi-color electrochromic structure can hide the functional component;
The multi-color electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the electrolyte is distributed between the working electrode and the counter electrode, the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite to each other and are arranged in parallel, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer, the dielectric layer is composed of electrochromic materials, and the bonding interface of the dielectric layer and the first optical structure layer and the second optical structure layer is respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; phase shift of reflected light formed at the first surface and reflected light formed at the second surface when incident light enters the optical cavity from the first optical structure layer or the second optical structure layer D is the thickness of the dielectric layer,/>Lambda is the wavelength of the incident light, lambda is the refractive index of the dielectric layerIs the angle of refraction of the incident light as it passes through the first or second surface.
In some embodiments, the dielectric layer consists essentially of electrochromic materials, such as organic materials or inorganic materials. In some embodiments, the multi-color electrochromic structure includes a first multi-color electrochromic unit and a second multi-color electrochromic unit, the first multi-color electrochromic unit covers the non-display area, the second multi-color electrochromic unit covers the display area, and the first multi-color electrochromic unit and the second multi-color electrochromic unit are electrically coupled to different control ends of the control circuit.
The embodiment of the invention also provides a method for hiding the functional component based on the multi-color electrochromic structure, which is applied to any one of the electronic devices and comprises the following steps:
Connecting the working electrode, the counter electrode and a power supply to form a working circuit;
Detecting states of the functional components in real time, wherein the states comprise an activated state and a non-activated state;
When the functional component is in an activated state, the potential difference between the working electrode and the counter electrode is adjusted so as to at least change the refractive index of the electrochromic material in the dielectric layer, thereby regulating and controlling the light transmittance of the colorful electrochromic structure and enabling the optical signal matched with the functional component to penetrate through the colorful electrochromic structure;
The multi-color electrochromic structure is capable of hiding the functional component when the functional component is in an inactive state. Compared with the prior art, the invention has the advantages that:
according to the electronic equipment based on the multi-color electrochromic structure, the light transmittance of the multi-color electrochromic structure is changed, so that the functional component can acquire external light, and the functional component can be completely hidden when not in use, so that the external light does not need to enter the functional component by digging holes in a display screen, meanwhile, the electrochromic structure replaces black ink, more external light can enter the functional component, and the effect of the functional component is improved.
Drawings
Fig. 1 is a schematic structural view of a multi-color electrochromic structure according to an exemplary embodiment of the present invention.
Fig. 2 is a schematic structural view of an electronic device according to an exemplary embodiment of the present invention.
Fig. 3 is a schematic view of another structure of an electronic device in an exemplary embodiment of the present invention.
Fig. 4 is a schematic structural view of an electronic device disclosed in comparative example 1.
Fig. 5 is another structural schematic diagram of an electronic device disclosed in comparative example 2.
Fig. 6 is a schematic diagram of a novel multi-color electrochromic device according to an exemplary embodiment of the present invention.
Fig. 7 is a schematic diagram of a novel reflective/transmissive dual mode multi-color electrochromic structure in an exemplary embodiment of the invention.
Fig. 8 is a schematic view of the structure of the electrochromic working electrode of fig. 7.
Fig. 9 is a schematic structural view of a novel multi-color electrochromic device according to an exemplary embodiment of the present invention.
Fig. 10 is a photograph of the reflected color of the novel multi-color electrochromic structure as seen from the side of the first optical structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.
Fig. 11 is a photograph of the reflective color of the novel multi-color electrochromic structure looking from the direction of the PET substrate at different tungsten oxide thicknesses in an exemplary embodiment of the present invention.
Fig. 12 is a photograph of the transmission colors of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the present invention.
Fig. 13 is a schematic structural view of a novel multi-color electrochromic device according to an exemplary embodiment of the present invention.
Fig. 14 is a photograph of the reflected color of the novel multi-color electrochromic structure as seen from the side of the first optical structure at different tungsten oxide thicknesses in an exemplary embodiment of the present invention.
Fig. 15 is a photograph of the reflected color of the novel multi-color electrochromic structure looking from the direction of the PET substrate at different tungsten oxide thicknesses in an exemplary embodiment of the present invention.
Fig. 16 is a photograph of the transmitted color of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.
Fig. 17 is a schematic diagram of the structure of a working electrode of a novel reflective/transmissive dual mode multi-color electrochromic device in an exemplary embodiment of the invention.
Fig. 18 is a photograph of working electrodes (taken from the directions of both the first optical structure and the substrate) at different voltages in a multi-color electrochromic device of different tungsten oxide thicknesses in an exemplary embodiment of the invention.
Detailed Description
Aiming at a plurality of defects in the prior art, the inventor of the present invention can put forward the technical proposal of the invention through long-term research and a large number of practices. The technical scheme, the implementation process, the principle and the like are further explained as follows. It should be understood that within the scope of the present invention, the above-described features of the present invention and features specifically described in the following (embodiments) may be combined with each other to constitute new or preferred embodiments. Is limited to a space and will not be described in detail herein.
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the examples or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments, but not all embodiments, described in the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention. The implementation conditions used in the following examples may be further adjusted according to actual needs, and the implementation conditions not specified are generally those in routine experiments.
Also, it should be noted that in this specification, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
An aspect of an embodiment of the present invention provides an electronic device based on a multi-color electrochromic structure, including: the display screen, the functional component, the multi-color electrochromic structure covering the functional component, and the control circuit electrically connected with the multi-color electrochromic structure;
the control circuit can regulate the light transmittance of the multi-color electrochromic structure, so that when the functional component is in an activated state, an optical signal matched with the functional component can penetrate through the multi-color electrochromic structure, and when the functional component is in a non-activated state, the multi-color electrochromic structure can hide the functional component;
The multi-color electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the electrolyte is distributed between the working electrode and the counter electrode, the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite to each other and are arranged in parallel, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer, the dielectric layer is composed of electrochromic materials, and the bonding interface of the dielectric layer and the first optical structure layer and the second optical structure layer is respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; phase shift of reflected light formed at the first surface and reflected light formed at the second surface when incident light enters the optical cavity from the first optical structure layer or the second optical structure layer D is the thickness of the dielectric layer,/>Lambda is the wavelength of the incident light, lambda is the refractive index of the dielectric layerIs the angle of refraction of the incident light as it passes through the first or second surface.
Further, for the working electrode, the reflected light formed on the first surface by the incident light incident from the first optical structure layer is superimposed by the interference of the reflected light formed on the second surface by the incident light transmitted through the dielectric layer. And vice versa, i.e. the reflected light formed at said second surface by the incident light incident from the second optical structure layer is superimposed by interference with the reflected light formed at the first surface by the incident light transmitted through said dielectric layer.
Further, when incident light enters the optical cavity from the first optical structure layer or the second optical structure layer, a phase shift of the reflected light formed on the first surface and the reflected light formed on the second surfaceD is the thickness of the dielectric layer,/>Lambda is the wavelength of the incident light, lambda is the refractive index of the dielectric layerIs the angle of refraction of the incident light as it passes through the first or second surface.
In some embodiments, if the refractive index of the first optical structure layer is defined asThe reflection coefficient of the first surface/>Wherein/>Is the angle of incidence of the incident light on the first surface.
In some embodiments, if the refractive index of the second optical structure layer is defined asThe reflection coefficient of the second surface/>Wherein/>Is the angle of refraction of the incident light as it passes through the second surface.
In some embodiments, the reflectance of the working electrode is expressed as: The reflectivity is expressed as: /(I)
Further, the reflectance and reflectivity of the working electrode are also applicable to the case where incident light enters the optical cavity from the second optical structure layer.
In some embodiments, if the refractive index of the first optical structure layer is defined asThe transmission coefficient of the first optical structure layer/>Wherein/>Is the angle of incidence of the incident light on the first surface.
In some embodiments, if the refractive index of the second optical structure layer is defined asThe transmission coefficient of the second optical structure layer/>Wherein/>Is the angle of refraction of the incident light as it passes through the second surface.
In some embodiments, the transmission coefficient of the working electrode is expressed as: The transmittance is expressed as: /(I)
Further, the transmission coefficient and transmittance of the working electrode are also applicable to the case where the incident light enters the optical cavity from the second optical structure layer.
Further, the working electrode has an optically transmissive mode of operation, an optically reflective mode of operation, or an optically transmissive and reflective mode of operation.
Wherein, in the optical reflection working mode, the working electrode has a double-sided asymmetric structural color.
Wherein in the optically transmissive mode of operation, the working electrode has a transparent structural color.
In some embodiments, the working electrode includes one or more first optical structure layers, one or more dielectric layers, and one or more second optical structure layers.
In some embodiments, the working electrode comprises a plurality of first optical structure layers and/or a plurality of second optical structure layers and a plurality of dielectric layers.
In some embodiments, the material of at least one of the first optical structure layer and the second optical structure layer comprises a metallic material.
In some embodiments, the first optical structure layer or the second optical structure layer is a metal layer.
In some embodiments, the first optical structure layer and the second optical structure layer are both metal layers.
In some embodiments, the first optical structure layer or the second optical structure layer is directly air.
In some embodiments, the first optical structure layer or the second optical structure layer is absent.
Further, the metal material includes tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium, palladium, etc., but is not limited thereto.
Further, the thickness of the first optical structure layer or the second optical structure layer is preferably 0 to 20nm, preferably more than 0 and less than 20nm.
In some embodiments, the dielectric layer consists essentially of electrochromic material, and the material of the dielectric layer is selected from an organic material or an inorganic material.
Further, the inorganic material includes any one or a combination of a plurality of simple metal or non-simple metal, inorganic salt, oxide, etc., but is not limited thereto.
Further, the non-metal simple substance includes any one or a combination of a plurality of single crystal silicon, polycrystalline silicon and diamond, but is not limited to the above.
Further, the inorganic salt includes any one or more combinations of fluoride, sulfide, selenide, chloride, bromide, iodide, arsenide, telluride, and the like, but is not limited thereto.
Further, the oxide includes any one or a combination of plural kinds of WO3、NiO、TiO2、Nb2O5、Fe2O3、V2O5、Co2O3、Y2O3、Cr2O3、MoO3、Al2O3、SiO2、MgO、ZnO、MnO2、CaO、ZrO2、Ta2O5、Y3Al5O12、Er2O3、IrO2 and the like, but is not limited thereto.
Further, the fluoride includes any one or a combination of a plurality of MgF2、CaF2、GeF2、YbF3、YF3、Na3AlF6、AlF3、NdF3、LaF3、LiF、NaF、BaF2、SrF2 or the like, but is not limited thereto.
Further, the sulfide includes any one or a combination of a plurality of ZnS, geS, moS 2、Bi2S3 or the like, but is not limited thereto.
Further, the selenide includes any one or a combination of more of ZnSe, geSe, moSe 2、PbSe、Ag2 Se, etc., but is not limited thereto.
Further, the chloride includes any one or a combination of a plurality of AgCl, naCl, KCl or the like, but is not limited thereto.
Further, the bromide includes any one or a combination of a plurality of AgBr, naBr, KBr, tlBr, csBr or the like, but is not limited thereto.
Further, the iodide includes any one or a combination of a plurality of AgI, naI, KI, rbI, csI or the like, but is not limited thereto.
Further, the arsenide includes GaAs and the like, but is not limited thereto.
Further, the antimonide includes GdTe and the like, but is not limited thereto.
Further, the material of the dielectric layer includes any one or a combination of a plurality of SrTiO3、Ba3Ta4O15、Bi4Ti3O2、CaCO3、CaWO4、CaMnO4、LiNbO4、 Prussian blue, prussian black, prussian white, prussian green, etc., but is not limited thereto.
Further, the material of the dielectric layer includes, but is not limited to, a liquid crystal material or a MOF material.
Further, the organic material includes, but is not limited to, small organic molecule compounds, polymers, and the like.
Further, the organic material includes any one or more of viologen, tetrathiafulvalene, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, terephthalyl ester, dimethyl biphenyl amine, tetrathiafulvalene, alkyl bipyridine, phenothiazole, polyamide, epoxy resin, polydialkyne, and the like, but is not limited thereto.
In some embodiments, the dielectric layer may consist essentially of an electrochromic material. The dielectric layer is a core layer of the working electrode and is also a color change reaction generation layer. The electrochromic material may be selected from inorganic, organic materials or liquid crystal materials, MOF materials, and the like. For example, the inorganic material may include WO3、NiO、TiO2、Nb2O5、Fe2O3、V2O5、Co2O3、Y2O3、MoO3、IrO2、 Prussian blue, prussian black, prussian white, prussian green, and the like, and is not limited thereto. The organic material may include viologen, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, terephthalyl ester, dimethylbiphenyl amine, tetrathiafulvene, alkyl bipyridine, phenothiazole, polydialkyne, etc., but is not limited thereto.
In some embodiments, the dielectric layer has a thickness greater than 0 and less than or equal to 2000nm, preferably 50 to 2000nm, more preferably 100 to 500nm, to provide the optical film structure with higher color saturation.
Further, the material of the dielectric layer is selected from an organic electrochromic material and/or an organic electrochromic material.
Further, an optimizing dielectric layer can be added between the first optical structure layer or the second optical structure layer and the dielectric layer to optimize the color of the electrochromic layer.
Further, an optimized dielectric layer may be added to the first optical structure layer or the second optical structure layer, or the first optical structure layer or the second optical structure layer may be disposed on the optimized dielectric layer, so as to optimize the color of the electrochromic layer.
In some embodiments, the first optical structure layer or the second optical structure layer is bonded to a substrate.
Further, the substrate is transparent or translucent. Accordingly, the substrate may be transparent or translucent, for example, any one or more of glass, plexiglas, PET, PES, PEN, PC, PMMA, PDMS, etc., but not limited thereto.
Further, the optimized dielectric layer may be disposed between the first optical structure layer or the second optical structure layer and the substrate.
Further, the material of the optimized dielectric layer includes, but is not limited to WO3、NiO、TiO2、Nb2O5、Fe2O3、V2O5、Co2O3、Y2O3、Cr2O3、MoO3、Al2O3、SiO2、MgO、ZnO、MnO2、CaO、ZrO2、Ta2O5、Y3Al5O12、Er2O3、ZnS、MgF2、SiNx( silicon nitride), and the like.
Further, the thickness of the optimized dielectric layer is preferably 0 to 2000nm, and preferably 100 to 500nm, so that the color saturation of the electrochromic structure is higher.
In a more typical embodiment, referring to fig. 6, the multi-color electrochromic structure includes a second optical structure layer 2, a dielectric layer 3, and a first optical structure layer 4 disposed on a substrate 1. The first optical structure layer 4 and the second optical structure layer 2 are reflective/transmissive layers, which may be made of metal.
The first optical structure layer 4 may be air.
Wherein the second optical structure layer 2 may also be absent.
In this exemplary embodiment, the materials, thicknesses, etc. of the first optical structure layer, the second optical structure layer, the dielectric layer may be as described above. The reflective/transmissive structural color, reflectance, and transmittance of the working electrode can be changed by adjusting the materials, thicknesses, and the like of the first optical structural layer 4, the second optical structural layer 2, and the dielectric layer 3.
Another aspect of an embodiment of the present invention also provides a method of preparing the working electrode, which may include:
The first optical structure layer or the second optical structure layer, the dielectric layer, etc. are formed by physical or chemical deposition means such as coating, printing, casting film, etc. or magnetron sputtering, electron beam evaporation, thermal evaporation, electrochemical deposition, chemical vapor deposition, atomic force deposition, sol-gel technique, etc., and are not limited thereto.
In some embodiments, the first optical or second optical structure layer, the dielectric layer may be sequentially formed on the substrate.
Further, electrochromic devices made of electrochromic materials have been widely used in smart windows, smart indicators, imaging devices, and the like. Electrochromic is a phenomenon in which the electronic structure and optical properties (reflectivity, transmittance, absorptivity, etc.) of an inorganic or organic electrochromic material change steadily and reversibly under the action of an applied electric field or current, and is represented by reversible changes in color and transparency in appearance. Conventional electrochromic can be divided into two models, transmissive electrochromic devices and reflective electrochromic devices, and the color of the electrochromic device is determined only by the electronic structure and optical properties of the electrochromic device itself. Thus, electrochromic single mode and monotonic color modulation also become bottlenecks limiting their range of application.
In some embodiments, the thickness and/or material of the first optical structure layer or the second optical structure layer, the dielectric layer, etc. may be adjusted during the process of the preparation method, thereby adjusting the reflective/transmissive structural color of the working electrode. Further, in the foregoing embodiment of the present invention, the type of the electrolyte is not particularly limited, and a liquid electrolyte, a gel polymer electrolyte, or an inorganic solid electrolyte may be used. In some embodiments, the electrolyte is in contact with the dielectric layer and provides a material for mobile environments of ions, such as hydrogen ions or lithium ions, for the discoloration or decolorization of the electrochromic material.
In some embodiments, the type of electrolyte is not particularly limited, and the electrolyte may include one or more compounds, such as a compound containing H+、Li+、Al3+、Na+、K+、Rb+、Ca2+,Zn2+、Mg2+ or Cs +. The electrolyte layer is composed of a specific conductive material such as a liquid electrolyte material containing a solution of lithium perchlorate, sodium perchlorate, or the like, or may be a solid electrolyte or a gel electrolyte material. In one embodiment, the electrolyte layer may include a lithium salt compound, such as LiClO 4、LiBF4、LiAsF6 or LiPF 6. Ions contained in the electrolyte may act on the color change or light transmittance change of the multi-color electrochromic structure when inserted into or removed from the dielectric layer according to the polarity of the applied voltage. In some embodiments, the electrolyte employed comprises a mixed plurality of ions that may enrich the color change of the electrochromic structure more than a single ion.
In some embodiments, the electrolyte may be a liquid electrolyte, such as aqueous LiCl, alCl 3、HCl、H2SO4 aqueous solutions, and the like.
In some embodiments, the electrolyte may further comprise a carbonate compound. Since carbonate-based compounds have a high dielectric constant, the ionic conductivity provided by lithium salts can be increased. As carbonate-based compounds, at least one of the following may be used: PC (propylene carbonate), EC (ethylene carbonate), DMC (dimethyl carbonate), DEC (diethyl carbonate) and EMC (ethyl methyl carbonate). For example, an organic LiClO 4、Na(ClO4)3 propylene carbonate electrolyte may be used.
In some embodiments, the electrolyte may be a gel electrolyte, such as PMMA-PEG-LiClO 4,PVDF-PC-LiPF6,LiCl/PVA,H2SO4/PVA, or the like, but is not limited thereto.
In some preferred embodiments, when an inorganic solid electrolyte is used as the electrolyte, the electrolyte may comprise LiPON or Ta 2O5. For example, the electrolyte may be, but is not limited to, a Li-containing metal oxide film, such as a film of LiTaO or LiPO, or the like. Further, the inorganic solid electrolyte may be an electrolyte in which LiPON or Ta 2O5 is added with components such as B, S and W, for example, LiBO2+Li2SO4、LiAlF4、LiNbO3、Li2O-B2O3 or the like.
In some preferred embodiments, the electrolyte is an all-solid electrolyte, which may be combined to form an all-solid electrochromic structure as a combination of dielectric layers, metal reflective layers, counter electrodes, etc. that are in a solid state.
Further, the colorful electrochromic structure further comprises an ion conducting layer, an ion storage layer, a transparent conducting layer and the like.
Further, the ion storage layer is in contact with the electrolyte.
For example, the working electrode may include a substrate.
For example, the counter electrode may include a substrate, a transparent conductive layer, and an ion storage layer.
The material of the substrate may be as described above, and will not be described herein.
Further, the material of the ion storage layer may be selected from, but not limited to, niO, fe 2O3、TiO2, prussian blue, irO 2, and the like. The ion storage layer plays a role in storing charges in the working electrode, namely, corresponding counter ions are stored when the dielectric layer material undergoes oxidation-reduction reaction, so that the charge balance of the whole electrochromic layer is ensured.
In some more specific embodiments, the all-solid electrolyte within the aforementioned all-solid multi-color electrochromic structure may take the form of a solid ion-conducting layer. The color change principle of the all-solid-state multi-color electrochromic structure is as follows: the metal reflecting layer and other layer materials form a metal-dielectric structure, and can also comprise other layers, such as an ion conducting layer, an ion storage layer, a transparent conducting layer and the like, wherein the thickness of each layer of material is adjusted to a proper range, so that an electrochromic device with structural color can be prepared, further, the refractive index of the electrochromic material can be adjusted by applying voltage, and the color of the all-solid-state multi-color electrochromic device can be further adjusted.
In some embodiments, the substrate further has a conductive layer disposed thereon. The conductive layer comprises one or more of FTO, ITO, ag nanowires, ag nano mesh grids, carbon nanotubes and graphene, and can also be a metal layer, cu, W and the like, and is not limited to the above.
In some embodiments, the counter electrode comprises a transparent conductive electrode or a semitransparent conductive electrode.
In some embodiments, the counter electrode comprises a transparent conductive electrode having an ion storage layer, which may be selected from, but not limited to, niO, fe 2O3、TiO2, and the like. The ion storage layer is in contact with the electrolyte.
In the foregoing embodiment of the present invention, the transparent conductive electrode may be formed by including a material having characteristics of high light transmittance, low sheet resistance, and the like, for example, by including any one of the following: transparent conductive oxides selected from ITO (indium tin oxide), FTO (fluorine doped tin oxide), AZO (aluminum doped zinc oxide), GZO (gallium doped zinc oxide), ATO (antimony doped tin oxide), IZO (indium doped zinc oxide), NTO (niobium doped titanium oxide), znO, OMO (oxide/metal/oxide) and CTO; silver (Ag) nanowires; a metal mesh; or OMO (oxide metal oxide).
The method of forming the transparent conductive electrode is not particularly limited, and any known method may be used without limitation. For example, a thin film electrode layer containing transparent conductive oxide particles may be formed on the glass base layer by a method such as sputtering or printing (screen printing, gravure printing, inkjet printing, or the like). In the case of the vacuum method, the thickness of the electrode layer thus prepared may be in the range of 10nm to 500nm, and in the case of the printing method, the thickness may be in the range of 0.1 μm to 20 μm. In one example, the transparent conductive electrode layer may have a visible light transmittance of 70% to 95%.
In some embodiments, a layer of metal material, particularly thin layer metal, may also be added over the dielectric layer to optimize the color of the multi-color electrochromic structure. Specifically, for certain materials or multicolor electrochromic structures with proper thickness, adding a metal material with proper thickness can improve the intensity difference of the reflectivity curve, thereby improving the saturation of the color. Wherein the metal may be selected from Ag, al, cu, ni and the like, but is not limited thereto. The thickness of the metal layer may be preferably 0 to 30nm, particularly preferably 1 to 10nm.
In some embodiments, a semiconductor material may also be added to the dielectric layer to optimize the color of the multi-color electrochromic structure. For some colorful films with specific materials or thicknesses, adding a semiconductor material with proper thickness can improve the intensity difference of the reflectivity curve, thereby improving the saturation of the color. Wherein the semiconductor may be selected from Al 2O3、SiO2、ZnS、MgF2, silicon nitride, and the like, but is not limited thereto. The thickness of the semiconductor may be preferably 0 to 300nm, particularly preferably 1 to 100nm. Referring to fig. 1, a multi-color electrochromic structure according to an exemplary embodiment of the invention includes a substrate, a metal layer, an electrochromic layer, an ion conductive layer, an ion storage layer, and a transparent conductive layer, wherein the multi-color electrochromic structure is electrically coupled to a voltage control circuit. By changing the light transmittance of the multi-color electrochromic structure, the function component can acquire external light, and the voltage can be changed to present the designated color when the function component is not used so as to completely hide the function component.
Wherein, referring to the foregoing, the metal layer and the dielectric layer (i.e. electrochromic layer or referred to as working electrode) form a metal-dielectric structure, which can generate optical interference effect to display multiple colors; the different colors of the electrochromic layer can be realized by selecting one of different metal materials, different dielectric materials or different dielectric layer thicknesses in a combined mode.
The multi-color electrochromic structure provided by the embodiment of the invention is characterized in that the color of a multi-color pattern obtained by the optical interference effect of a metal medium is a physical structure color, and the multi-color electrochromic structure is more stable and durable compared with the existing organic electrochromic material on electronic equipment, and has the characteristics of various colors and wide selectable range compared with the existing inorganic electrochromic technology.
In some preferred embodiments, the display screen includes a display area and a non-display area, the functional component being projected on the display screen within the non-display area.
In some preferred embodiments, the multi-color electrochromic structure includes a first electrochromic element and a second electrochromic element, the first electrochromic element covering the non-display area, the second electrochromic element covering the display area, the first electrochromic element and the second electrochromic element being electrically coupled to different control terminals of the control circuit.
In some preferred embodiments, the number of the functional components is at least two, and the multi-color electrochromic structure includes third electrochromic units corresponding to the at least two functional components one by one, and each of the functional components is connected to one of the third electrochromic units through the control circuit.
The functional component can be a component which needs to acquire external light of the electronic equipment, such as a front camera, a light sensor, a proximity sensor, a 3D structure optical module and the like, and the functional component can acquire external light by changing the light transmittance of the multi-color electrochromic structure, and can be completely hidden when not in use. Thus, no hole is needed to be dug on the display screen to enable external light to enter the functional component. The display screen is not required to be hollowed to enable external light to enter the functional component, and meanwhile, the colorful electrochromic structure replaces black ink, so that more external light can enter the functional component, and the effect of the functional component is improved.
The electronic device may be a mobile phone, a tablet personal computer, a palm computer (PDA, personalDigitalAssistant), VR glasses, etc., but is not limited thereto.
Referring to fig. 2, a schematic structural diagram of an electronic device according to an exemplary embodiment of the present invention is shown. An electronic device may include a display screen, an electrochromic structure covering a display surface of the display screen, a functional component covered by the display screen, and a control circuit controlling the electrochromic structure. Note that the electronic apparatus is not limited to the above. Another aspect of the embodiment of the present invention further provides a method for preparing the multi-color electrochromic structure, which includes the following steps: providing a substrate; adopting a PVD (physical vapor deposition) mode, firstly depositing different metal in different areas on the substrate, and then depositing a dielectric layer material on the different metal; or adopting a PVD deposition mode, firstly sputtering a metal layer material on the substrate, and then depositing and preparing different dielectric materials in different areas of the metal layer; or adopting a PVD deposition mode, firstly sputtering a metal layer material on the substrate, and then depositing and preparing dielectric materials with different thicknesses in different areas of the metal layer; or adopting a PVD deposition mode, firstly depositing and preparing different metals in different areas on the substrate, and then depositing and preparing different dielectric materials in different areas of the metal layer; or adopting a PVD deposition mode, firstly depositing and preparing different metals in different areas on the substrate, and then depositing and preparing dielectric materials with different thicknesses in different areas of the metal layer; the PVD deposition mode comprises evaporation plating, electron beam evaporation, magnetron sputtering or ion plating. The color of the multicolor electrochromic device obtained by the optical interference effect of the metal medium is physical structure color.
Another aspect of the embodiments of the present invention further provides a method for hiding a functional component based on a multi-color electrochromic film, applied to any one of the foregoing electronic devices, including:
Connecting the working electrode, the counter electrode and a power supply to form a working circuit;
Detecting states of the functional components in real time, wherein the states comprise an activated state and a non-activated state;
When the functional component is in an activated state, the potential difference between the working electrode and the counter electrode is adjusted so as to at least change the refractive index of the electrochromic material in the dielectric layer, thereby regulating and controlling the light transmittance of the colorful electrochromic structure and enabling the optical signal matched with the functional component to penetrate through the colorful electrochromic structure;
The multi-color electrochromic structure is capable of hiding the functional component when the functional component is in an inactive state. The working voltage of the multi-color electrochromic structure can be adjusted according to practical situations, for example, the working voltage can be-4V, but the multi-color electrochromic structure is not limited to the working voltage.
Further, the method may comprise the steps of:
Detecting states of the functional components in real time, the states including an active state and an inactive state (also referred to as an "idle state");
when the sensor judges that the equipment is in a user use state, the functional component is in an activated state, and the control circuit board enables the colorful electrochromic structure to change the light transmittance, so that the functional component of the electronic equipment obtains the light signal passing through the colorful electrochromic structure;
when the equipment is judged not to be in the use state of a user, the functional components are in an idle state, and the colorful electrochromic structure is controlled to reduce the light transmittance, so that the appearance of the colorful electrochromic structure is consistent with the color of the front screen, and the functional components of the electronic equipment are hidden.
In the foregoing embodiment of the present invention, the multi-color electrochromic structure fuses the multi-color reflective/transmissive structural colors with electrochromic, enriches the color modulation of electrochromic devices, and achieves dynamic regulation of multi-colors. Specifically, various structural colors can be obtained by adjusting the thicknesses, materials, and the like of the first optical structural layer, the second optical structural layer, the dielectric layer, and the like in the working electrode. Meanwhile, the multi-color electrochromic structure is used as a working electrode, and by applying voltage, the change of the refractive index of the electrochromic material in the dielectric layer (which can be caused by the insertion or extraction of ions in the electrolyte layer) leads to the change of the optical parameters of the dielectric layer, the change of color is brought, and finally, the dual-mode of electrochromic reflection/transmission and gorgeous color modulation can be realized, so that the development of electrochromic technology and the application of the electrochromic technology in a plurality of fields are greatly promoted. Another aspect of an embodiment of the present invention also provides a storage medium having stored thereon a computer program which, when run on a computer, causes the computer to perform the aforementioned method.
Such as: detecting the states of the functional components in real time, wherein the states comprise an activated state and a non-activated state; when the functional component is in an activated state, the electrochromic structure is controlled to change the light transmittance, so that the functional component of the electronic device obtains an optical signal passing through the electrochromic structure; when the functional component is in an inactive state, the electrochromic structure is controlled to reduce light transmittance, thereby hiding the functional component of the electronic device.
Referring to fig. 7, a novel reflective/transmissive dual-mode multi-color electrochromic structure according to an exemplary embodiment of the invention is shown, which includes a working electrode 5, a counter electrode 7 and an electrolyte layer 6, wherein the electrolyte layer 6 is disposed between the working electrode 5 and the counter electrode 7.
Among them, the electrolyte layer 6 may be selected from a suitable aqueous electrolyte, an organic phase electrolyte, a gel electrolyte or a solid electrolyte, preferably LiCl, an aqueous AlCl 3、HCl、H2SO4, a propylene carbonate electrolyte of LiClO 4, liCl/PVA, H 2SO4/PVA gel electrolyte, etc., and is not limited thereto.
Referring again to fig. 8, the working electrode 5 may include an optical thin film structure that may include a conductive substrate 10, a metal reflective/transmissive layer 11 as a second optical structural layer, and a dielectric layer 12, and an air layer over the dielectric layer 12 may be a first optical structural layer, the dielectric layer 12 being composed of an electrochromic material. Preferably, the thickness of the second optical structure layer is greater than 0 and less than 20nm.
In this regard, referring to the foregoing, the reflective/transmissive structure color of the optical film structure may be changed by adjusting the material and thickness of the metal reflective/transmissive layer, the dielectric layer, and the like. Further, the color of the dielectric layer can also be changed by adjusting the voltage, current, etc. applied to the electrochromic material. Therefore, the inherent optical structural color and electrochromic of the electronic equipment can be fused, and the abundant color change can be realized more simply and controllably.
The technical scheme of the invention is further described in detail below through a plurality of embodiments and with reference to the accompanying drawings. However, the examples are chosen to illustrate the invention only and are not intended to limit the scope of the invention.
Embodiment 1 an electronic device disclosed in this embodiment includes a display screen, an electrochromic structure covering a display surface of a functional component on the display screen, a functional component covered by the display screen, and a control circuit for controlling the electrochromic structure, where the control circuit is electrically coupled to the electrochromic structure, and can be shown in fig. 2.
Wherein the functional components are located in the pre-element section of fig. 2.
The structure of the electrochromic structure can be shown as shown in fig. 1, and the electrochromic structure comprises a substrate, a metal layer, an electrochromic layer, an ion conducting layer, an ion storage layer and a transparent conducting layer, and the electrochromic structure is electrically coupled with a voltage control circuit. By changing the light transmittance of the electrochromic structure, the functional component can acquire external light, and the voltage can be changed to present a designated color when the functional component is not used so as to completely hide the functional component.
Embodiment 2 an electronic device disclosed in this embodiment includes a housing, an electrochromic structure covering a display surface of a functional component on the housing, a functional component covered by the display screen, and a control circuit for controlling the electrochromic structure, where the control circuit is electrically coupled to the electrochromic structure, and can be shown in fig. 3.
Comparative example 1 an electronic device is disclosed in this comparative example comprising a display screen with holes left therein, and functional components, which can be seen in fig. 4.
Comparative example 2 an electronic device as disclosed in this comparative example includes a frame, a multi-color electrochromic housing, a permeable electrochromic region, and a camera hidden under the permeable electrochromic layer, as can be seen in fig. 5.
Example 3
The working electrode of the multi-color electrochromic structure provided in this embodiment includes a first optical structure layer, a second optical structure layer, a dielectric layer and a substrate layer, which can be shown in fig. 6.
Wherein the first optical structure layer is air, the second optical structure is a metal tungsten (W) layer, the dielectric layer is formed of tungsten oxide, and the base layer may be a PET film.
The preparation method of the working electrode with the multi-color electrochromic structure comprises the following steps: a layer of tungsten film is sputtered onto a clean PET substrate by a magnetron sputtering method, preferably with a thickness of about 10nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering. Preferably, the tungsten oxide layer is provided at a thickness of 100nm to 400nm.
Of course, the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The tungsten oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel techniques, and the like, as is known in the art. Referring to fig. 8, the thickness of the tungsten oxide layer is controlled to be different, and the optical film structure with rich and gorgeous reflection color can be obtained when the first optical structure layer is seen from one side.
Referring to fig. 9, at different tungsten oxide thicknesses (in fig. 8), the corresponding reflection color also exhibits a rich and gorgeous color as seen from the direction of the base layer, and the color is distinct from the color seen from the direction of the first optical structure layer.
Referring to fig. 10, with different tungsten oxide thicknesses shown in fig. 8, a transmissive structural color can be obtained through the optical film structure of this embodiment, and the transmissive structural color also presents a rich and gorgeous color. Therefore, the transmittance of the transmission color of the optical film structure of this embodiment is determined by the thickness of the tungsten metal layer and the tungsten oxide layer.
Example 4
The working electrode of the multi-color electrochromic structure provided in this embodiment includes a first optical structure layer, a second optical structure layer, a dielectric layer and a substrate layer, which can be shown in fig. 6.
Wherein the first optical structure layer is air, the second optical structure is a metallic silver (Ag) layer, the dielectric layer is formed of titanium dioxide, and the base layer may be a PET film.
The preparation method of the working electrode with the multi-color electrochromic structure comprises the following steps: a layer of silver film is sputtered onto a clean PET substrate by a magnetron sputtering method, preferably with a thickness of about 2nm. And sputtering a titanium dioxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the titanium dioxide layer is preferably set to be 100-400 nm.
Of course, the silver film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The foregoing titanium dioxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel techniques, and the like, as is known in the art. The working electrode structure of this example exhibited similar properties to the electrode structure of example 3, i.e., exhibited different colors as viewed from both sides. And in addition has a transmissive structural color.
Example 5
The working electrode of the multi-color electrochromic structure provided by the embodiment comprises a first dielectric layer, a second optical structure layer, a second dielectric layer and a first optical structure layer which are sequentially formed on a substrate.
The added second dielectric layer can improve the color brightness and saturation.
Referring to fig. 11, the first optical structure layer of the optical film structure is air, the second optical structure layer is tungsten (W), the first and second dielectric layers are formed of tungsten oxide, and the base layer may be a PET film.
The preparation method of the working electrode with the multi-color electrochromic structure comprises the following steps: on a clean PET substrate, a tungsten oxide layer is sputtered by a magnetron sputtering method, and the thickness of the tungsten oxide layer is preferably set to be 1-400 nm. Then a tungsten film is sputtered by a magnetron sputtering method, preferably the tungsten film has a thickness of about 10nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100-400 nm.
Of course, the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The tungsten oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel techniques, and the like, as is known in the art. Referring to fig. 12, the thickness of the tungsten oxide layer between the tungsten layer and the PET substrate is controlled to be different, and the working electrode structure with rich and gorgeous colors can be obtained when the working electrode structure is viewed from one side of the first optical structure layer.
Referring to fig. 13, at the different thicknesses of tungsten oxide shown in fig. 12, the corresponding reflection color also shows a rich and gorgeous color as seen from the substrate layer side direction, and the color is quite different from the color seen from the film direction.
Referring to fig. 14, with different tungsten oxide thicknesses shown in fig. 12, a transmission structure color can be obtained through the working electrode structure, the transmission structure color is rich in color, and the transmittance of the transmission color of the working electrode structure is determined by the thickness of the tungsten metal layer and the tungsten oxide layer.
Example 6:
the working electrode structure of the multi-color electrochromic structure provided by the embodiment comprises a second optical structure layer, a dielectric layer and a first optical structure layer which are sequentially formed on a substrate.
Wherein the first optical structure layer is a metallic tungsten (W) film, the second optical structure layer is a metallic aluminum (Al) film, the dielectric layer is formed of zinc sulfide (ZnS), and the base layer may be a PET film.
The preparation method of the working electrode structure of the multi-color electrochromic structure comprises the following steps: on a clean PET substrate, a layer of metal aluminum film is sputtered by a magnetron sputtering method, and the thickness of the aluminum film is preferably set to 15nm. And then sputtering a zinc sulfide layer by a magnetron sputtering method, wherein the thickness of zinc sulfide is preferably 100-400 nm. Then sputtering a tungsten film layer on the zinc sulfide layer by magnetron sputtering, wherein the thickness of the tungsten film layer is preferably set to be 0-50 nm.
Of course, the tungsten film and the aluminum film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The zinc sulfide layer can be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technology and other methods known in the art.
The working electrode structure of the multi-color electrochromic structure of the embodiment can show different colors when being observed from two side surfaces, and has a transmission structure color.
Example 7:
the working electrode structure of the multi-color electrochromic structure provided by the embodiment comprises a second optical structure layer, a dielectric layer and a first optical structure layer which are sequentially formed on a substrate.
Wherein the first optical structure layer is air, the second optical structure layer is a metal aluminum (Al) film, the dielectric layer is formed by silicon simple substance, and the substrate layer can be a PET film.
The preparation method of the working electrode structure of the multi-color electrochromic structure comprises the following steps: on a clean PET substrate, a layer of metal aluminum film is sputtered by a magnetron sputtering method, and the thickness of the aluminum film is preferably set to be 5nm. And then a silicon film layer is deposited by a magnetron sputtering method, and the thickness of the silicon film layer is preferably selected to be 100 nm-400 nm.
Of course, the aluminum film and the silicon film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The working electrode structure of this embodiment may exhibit different colors when viewed from both sides, and additionally has a transmissive structural color.
Example 8:
the working electrode structure of the multi-color electrochromic structure provided by the embodiment comprises a second optical structure layer, a dielectric layer and a first optical structure layer which are sequentially formed on a substrate.
The first optical structure layer is a metallic silver (Ag) film, the second optical structure layer is a metallic aluminum (Al) film, the dielectric layer is formed by Prussian blue, and the substrate layer can be a PET/ITO film.
The preparation method of the working electrode structure of the multi-color electrochromic structure comprises the following steps: on a clean PET/ITO substrate, a layer of metal aluminum film is sputtered by a magnetron sputtering method, and the thickness of the aluminum film is preferably set to 10nm. And then depositing a Prussian blue layer by an electrodeposition method, wherein the thickness of Prussian blue is preferably selected to be 100-2000 nm. And sputtering a silver film layer on the Prussian blue layer by magnetron sputtering, wherein the thickness of the silver film layer is preferably set to be 0-50 nm. Of course, the silver film and the aluminum film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The Prussian blue layer may be prepared by electrochemical deposition, sol-gel techniques, and the like in a manner known in the art.
The working electrode structure of this embodiment may exhibit different colors when viewed from both sides, and additionally has a transmissive structural color.
Example 9:
The present embodiment provides a device, which may be considered as a reflective/transmissive dual mode multi-color electrochromic device, comprising a working electrode, an electrolyte layer and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.
Referring to fig. 17, the working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structural layers, wherein air is used as the first optical structural layer, the second optical structural layer is formed of tungsten (W), and a dielectric layer is formed of tungsten oxide. And the substrate may be PET/ITO or the like.
The preparation method of the working electrode comprises the following steps: a tungsten film is sputtered onto a clean PET/ITO film by a magnetron sputtering method, preferably with a thickness of about 10nm. Then sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100-400 nm.
Of course, the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The tungsten oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, and the like in a manner known in the art.
The working electrode of this embodiment exhibits different colors when viewed from both sides, and additionally has a transmissive structural color.
And then the working electrode is matched with a pair of electrodes (such as NiO counter electrodes), alCl 3 electrolyte is packaged between the working electrode and the pair of electrodes, and then a lead is led out, so that the multi-color electrochromic device of the embodiment can be prepared. By applying a voltage to the multicolor electrochromic device, the color of the working electrode can be further modulated to shift between more colors, particularly the color changes on both sides of the working electrode are not exactly the same, as shown in fig. 18.
Example 10:
The present embodiment provides an optical device, which may be considered as a reflective/transmissive dual mode multi-color electrochromic device, including a working electrode, an electrolyte layer, and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.
The working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structural layers, wherein the first optical structural layer is formed of metallic tungsten (W), the second optical structural layer is formed of metallic silver (Ag), and the dielectric layer is formed of titanium dioxide (TiO 2). And the substrate may be PET/AgNWs.
The preparation method of the working electrode comprises the following steps: a silver film is first sputtered onto a clean PET/AgNWs film by a magnetron sputtering method, preferably with a thickness of about 10nm. And then sputtering a titanium oxide layer on the silver film by magnetron sputtering, wherein the thickness of the titanium oxide layer is preferably set to be 100-400 nm. Then a tungsten film is sputtered on the titanium dioxide layer by magnetron sputtering, and the thickness of the tungsten film is preferably selected to be about 5nm.
The optical device can be assembled in the manner described in example 9.
Of course, the silver film and the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The titanium oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, and the like in a manner known in the art.
The working electrode of this embodiment exhibits different colors when viewed from both sides, and additionally has a transmissive structural color.
And then the working electrode is matched with a pair of electrodes (such as NiO counter electrodes), liCl/PVA gel electrolyte is arranged between the working electrode and the pair of electrodes, and then a lead is led out, so that the multi-color electrochromic device of the embodiment can be prepared. By applying a voltage to the multicolor electrochromic device, the color of the working electrode can be further modulated by adjusting the voltage range, so that the color can be changed among more colors, and particularly the color change on both sides of the working electrode is not completely the same. The application of voltage to the multi-color electrochromic device of this example resulted in a color change exhibiting similar properties to the color change of example 9.
Example 11:
The present embodiment provides an optical device, which may be considered as a reflective/transmissive dual mode multi-color electrochromic device, including a working electrode, an electrolyte layer, and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.
The working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structure layers, wherein the first optical structure layer is air, the second optical structure is a metallic copper (Cu) layer, the dielectric layer is formed of vanadium oxide (V 2O5), and the substrate layer may be PET/ITO.
The preparation method of the optical film structure comprises the following steps: a copper film is sputtered onto a clean PET substrate by a magnetron sputtering method, preferably with a thickness of about 15nm. And sputtering a vanadium oxide layer on the copper film by magnetron sputtering, wherein the thickness of the vanadium oxide layer is preferably set to be 100-400 nm.
Of course, the copper film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The aforementioned vanadium oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel techniques, and the like, as known in the art. The working electrode of this embodiment exhibits different colors when viewed from both sides, and additionally has a transmissive structural color.
The optical device can be assembled in the manner described in example 9.
The working electrode is then mated with a pair of electrodes (e.g., niO counter electrode) with a LiCl/HCl/AlCl 3/NaCl/PVA mixed ion gel electrolyte disposed therebetween. By applying a voltage to the multicolor electrochromic device, the color of the working electrode can be further modulated by adjusting the voltage range, so that the color can be changed among more colors, and particularly the color change on both sides of the working electrode is not completely the same. The application of voltage to the multi-color electrochromic device of this example resulted in a color change exhibiting similar properties to the color change of example 7.
Example 12:
The present embodiment provides an optical device, which may be considered as a reflective/transmissive dual mode multi-color electrochromic device, including a working electrode, an electrolyte layer, and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.
The working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structural layers, wherein air is used as the first optical structural layer, the second optical structural layer is formed of tungsten (W), and the dielectric layer is formed of tungsten oxide (WO 3). And the substrate may be PET/ITO.
The preparation method of the working electrode comprises the following steps: a silver film is sputtered onto a clean PET/ITO film by a magnetron sputtering method, preferably with a tungsten film thickness of about 10nm. And then sputtering a tungsten oxide layer on the silver film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100-400 nm.
Of course, the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The tungsten oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, and the like in a manner known in the art.
The working electrode of this embodiment exhibits different colors when viewed from both sides, and additionally has a transmissive structural color.
A layer of lithium lanthanum titanate film is sputtered on the aforementioned working electrode by a magnetron sputtering method as a solid electrolyte, and the thickness of the lithium lanthanum titanate film is preferably 500nm.
And then the working electrode and the solid electrolyte are matched with a pair of electrodes (such as IrO 2 pair electrodes), and then a lead is led out, so that the multi-color electrochromic device of the embodiment can be prepared. By applying a voltage to the multicolor electrochromic device, the color of the working electrode can be further modulated to change between more colors, particularly the color changes on both sides of the working electrode are not exactly the same. The application of voltage to the multi-color electrochromic device of this example resulted in a color change exhibiting similar properties to the color change of example 9.
Comparative example 3:
the optical film structure provided in this comparative example includes a first optical structure layer, a second optical structure layer, a dielectric layer, and a base layer.
Wherein the first optical structure layer is air, the second optical structure is absent (no tungsten film), the dielectric layer is formed of tungsten oxide, and the base layer may be a PET film.
The preparation method of the optical film structure comprises the following steps: on a clean PET substrate, a tungsten oxide layer is sputtered by magnetron sputtering, preferably with a thickness of 100nm to 400nm.
The thickness of the tungsten oxide layer is controlled to be different, and a transparent color-free optical film structure is obtained when the tungsten oxide layer is seen from one side of the first optical structure layer.
At different tungsten oxide thicknesses, the corresponding color is transparent and colorless when seen from the direction of the basal layer, and the color is completely the same as the color when seen from the direction of the first optical structure layer.
And under different tungsten oxide thicknesses, the optical film structure of the comparative example is transparent and colorless.
Comparative example 4:
the optical film structure provided in this comparative example includes a first optical structure layer, a second optical structure layer, a dielectric layer, and a base layer.
Wherein the first optical structure layer is air, the second optical structure is a metal tungsten (W) layer, the dielectric layer is formed of tungsten oxide, and the base layer may be a PET film.
The preparation method of the optical film structure comprises the following steps: a layer of tungsten film is sputtered onto a clean PET substrate by a magnetron sputtering method, preferably with a thickness of about 100nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100-400 nm.
Of course, the tungsten film may be prepared by electron beam evaporation, thermal evaporation, or the like, as known in the art. The tungsten oxide layer may be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel techniques, and the like, as is known in the art. The thickness of the tungsten oxide layer is controlled to be different, and the optical film structure with rich and gorgeous reflection colors can be obtained when the optical film structure is seen from one side of the first optical structure layer.
At different tungsten oxide thicknesses, the corresponding reflection color only shows the color of the metallic tungsten film (silvery white) when seen from the direction of the basal layer. The optical film structure of the comparative example was found to be impermeable at different tungsten oxide thicknesses.
In addition, the inventor of the present application also performs experiments with other dielectric materials, metal reflective materials, base materials, etc. listed in the present specification instead of the corresponding materials in the foregoing embodiments, and found that the obtained electrochromic structure and electronic device have similar advantages.
It should be understood that the above embodiments are merely for illustrating the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the present invention and implement the same according to the present invention without limiting the scope of the present invention. All equivalent changes or modifications made in accordance with the spirit of the present invention should be construed to be included in the scope of the present invention.
Claims (34)
1. An electronic device based on a multi-color electrochromic structure, comprising: the display screen, the functional component, the multi-color electrochromic structure covering the functional component, and the control circuit electrically connected with the multi-color electrochromic structure;
the control circuit can regulate the light transmittance of the multi-color electrochromic structure, so that when the functional component is in an activated state, an optical signal matched with the functional component can penetrate through the multi-color electrochromic structure, and when the functional component is in a non-activated state, the multi-color electrochromic structure can hide the functional component;
The multi-color electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the electrolyte is distributed between the working electrode and the counter electrode, and the multi-color electrochromic structure is characterized in that: the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite to each other and are arranged in parallel, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer, the dielectric layer mainly consists of electrochromic materials, and the bonding interfaces of the dielectric layer and the first optical structure layer and the bonding interfaces of the dielectric layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; phase shift of reflected light formed at the first surface and reflected light formed at the second surface when incident light enters the optical cavity from the first optical structure layer or the second optical structure layer D is the thickness of the dielectric layer,/>Lambda is the wavelength of the incident light, lambda is the refractive index of the dielectric layerIs the angle of refraction of the incident light when transmitted through the first or second surface;
if the refractive index of the first optical structure layer is defined as The reflection coefficient of the first surfaceTransmittance of the first optical structure layerWherein/>An incident angle of the incident light on the first surface;
If the refractive index of the second optical structure layer is defined as The reflection coefficient of the second surfaceTransmittance of the second optical structure layerWherein/>Is the angle of refraction of the incident light as it passes through the second surface;
The reflectance of the working electrode is expressed as: the reflectivity is expressed as:
The transmission coefficient of the working electrode is expressed as: The transmittance is expressed as:
The working electrode has an optical transmission working mode, an optical reflection working mode or an optical transmission and reflection working mode; in the optically reflective mode of operation, the working electrode has a double-sided asymmetric structural color, and in the optically transmissive mode of operation, the working electrode has a transparent structural color;
Either one of the first optical structure layer and the second optical structure layer is a metal layer, and the other one is composed of a gas, which includes air; or the first optical structure layer and the second optical structure layer are both metal layers;
The thickness of at least one of the first optical structure layer and the second optical structure layer is more than 0 and less than or equal to 20nm;
An optimized medium layer is also distributed between the medium layer and the first optical structure layer or the second optical structure layer; or an optimized medium layer is arranged on the first optical structure layer or the second optical structure layer; the optimized dielectric layer is made of any one or a combination of a plurality of WO3、NiO、TiO2、Nb2O5、Fe2O3、V2O5、Co2O3、Y2O3、Cr2O3、MoO3、Al2O3、SiO2、MgO、ZnO、MnO2、CaO、ZrO2、Ta2O5、Y3Al5O12、Er2O3、ZnS、MgF2、 silicon nitride.
2. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the working electrode includes one or more first optical structure layers, one or more dielectric layers, and one or more second optical structure layers.
3. The multi-color electrochromic structure-based electronic device of claim 2, wherein: the material of at least one of the first optical structure layer and the second optical structure layer is a metal material, and the metal material is selected from any one or a combination of a plurality of tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium and palladium.
4. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the dielectric layer also includes an organic material or an inorganic material.
5. The multi-color electrochromic structure-based electronic device of claim 4, wherein: the inorganic material is selected from any one or a combination of a plurality of metal simple substance or non-metal simple substance, inorganic salt and oxide.
6. The multi-color electrochromic structure-based electronic device of claim 5, wherein: the non-metal simple substance is selected from any one or a combination of a plurality of single crystal silicon, polycrystalline silicon and diamond.
7. The multi-color electrochromic structure-based electronic device of claim 5, wherein: the inorganic salt is selected from any one or a combination of a plurality of fluoride, sulfide, selenide, chloride, bromide, iodide, arsenide or telluride.
8. The multi-color electrochromic structure-based electronic device of claim 5, wherein: the oxide is selected from any one or a combination of a plurality of WO3、NiO、TiO2、Nb2O5、Fe2O3、V2O5、Co2O3、Y2O3、Cr2O3、MoO3、Al2O3、SiO2、MgO、ZnO、MnO2、CaO、ZrO2、Ta2O5、Y3Al5O12、Er2O3、IrO2.
9. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the fluoride is selected from any one or a combination of a plurality of MgF2、CaF2、GeF2、YbF3、YF3、Na3AlF6、AlF3、NdF3、LaF3、LiF、NaF、BaF2、SrF2.
10. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the sulfide is selected from any one or a combination of a plurality of ZnS, geS, moS 2、Bi2S3.
11. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the selenide comprises any one or a combination of a plurality of ZnSe, geSe, moSe 2、PbSe、Ag2 Se.
12. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the chloride is selected from any one or a combination of a plurality of AgCl, naCl, KCl.
13. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the bromide is selected from any one or a combination of a plurality of AgBr, naBr, KBr, tlBr, csBr.
14. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the iodide is selected from any one or a combination of a plurality of AgI, naI, KI, rbI, csI.
15. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the arsenide is GaAs.
16. The multi-color electrochromic structure-based electronic device of claim 7, wherein: the telluride is GdTe.
17. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the material of the dielectric layer is selected from one or a combination of more of SrTiO3、Ba3Ta4O15、Bi4Ti3O2、CaCO3、CaWO4、CaMnO4、LiNbO4、 Prussian blue, prussian black, prussian white and Prussian green.
18. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the medium layer is made of liquid crystal material or MOF material.
19. The multi-color electrochromic structure-based electronic device of claim 4, wherein: the organic material is selected from organic small molecule compounds and/or polymers.
20. The multi-color electrochromic structure-based electronic device of claim 19, wherein: the organic material is selected from any one or a combination of a plurality of viologen, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, terephthalyl ester, dimethyl biphenyl amine, tetrathiafulvene, alkyl bipyridine, phenothiazole, polyamide, epoxy resin and polydialkyne.
21. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the thickness of the dielectric layer is more than 0 and less than or equal to 2000nm.
22. The multi-color electrochromic structure-based electronic device of claim 21, wherein: the thickness of the dielectric layer is 100-500 nm.
23. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the electrochromic material in the dielectric layer is selected from an organic electrochromic material and/or an organic electrochromic material.
24. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the thickness of the optimized dielectric layer is more than 0 and less than or equal to 2000nm.
25. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the first optical structure layer or the second optical structure layer is also bonded to a substrate that is transparent or translucent.
26. The multi-color electrochromic structure-based electronic device of claim 25, wherein: the substrate is made of any one or a combination of a plurality of PET, PES, PEN, PC, PMMA, PDMS.
27. The multi-color electrochromic structure-based electronic device of claim 25, wherein: the substrate is also provided with a conductive layer, and the conductive layer is selected from one or a combination of more of FTO, ITO, ag nanowires, ag nano-grids, carbon nanotubes and graphene.
28. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the electrolyte is selected from a liquid electrolyte, a gel electrolyte or a solid electrolyte.
29. The multi-color electrochromic structure-based electronic device of claim 28, wherein: the electrolyte adopts solid electrolyte, and the colorful electrochromic structure is of an all-solid structure.
30. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the display screen comprises a display area and a non-display area, and the projection of the functional component on the display screen is in the non-display area.
31. The multi-color electrochromic structure-based electronic device of claim 30, wherein: the multi-color electrochromic structure comprises a first multi-color electrochromic unit and a second multi-color electrochromic unit, wherein the first multi-color electrochromic unit covers the non-display area, the second multi-color electrochromic unit covers the display area, and the first multi-color electrochromic unit and the second multi-color electrochromic unit are electrically coupled with different control ends of the control circuit.
32. The multi-color electrochromic structure-based electronic device of claim 30, wherein: the number of the functional components is at least two, the multi-color electrochromic structure comprises third multi-color electrochromic units corresponding to the at least two functional components one by one, and each functional component is connected with one third multi-color electrochromic unit through the control circuit.
33. The multi-color electrochromic structure-based electronic device of claim 1, wherein: the electronic equipment is selected from a mobile phone, a tablet personal computer, a palm computer or VR glasses.
34. A method of hiding functional components based on a multi-color electrochromic structure, applied to an electronic device as claimed in any one of claims 1-33, characterized by comprising:
Connecting the working electrode, the counter electrode and a power supply to form a working circuit;
Detecting states of the functional components in real time, wherein the states comprise an activated state and a non-activated state;
When the functional component is in an activated state, the potential difference between the working electrode and the counter electrode is adjusted so as to at least change the refractive index of the electrochromic material in the dielectric layer, thereby regulating and controlling the light transmittance of the colorful electrochromic structure and enabling the optical signal matched with the functional component to penetrate through the colorful electrochromic structure;
The multi-color electrochromic structure is capable of hiding the functional component when the functional component is in an inactive state.
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