CN112835240A

CN112835240A - Fingerprint identification area indicating device based on colorful electrochromic structure and application thereof

Info

Publication number: CN112835240A
Application number: CN201911165085.8A
Authority: CN
Inventors: 赵志刚; 张曙; 陈健; 王振; 丛杉
Original assignee: Suzhou Institute of Nano Tech and Nano Bionics of CAS
Current assignee: Suzhou Institute of Nano Tech and Nano Bionics of CAS
Priority date: 2019-11-25
Filing date: 2019-11-25
Publication date: 2021-05-25
Anticipated expiration: 2039-11-25
Also published as: CN112835240B

Abstract

The invention discloses a fingerprint identification area indicating device based on a colorful electrochromic structure and application thereof. The fingerprint identification area indicating device includes: the device comprises a cover plate, a colorful electrochromic structure, a fingerprint identification component and a processor; the colorful electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite and parallel to each other, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer, the dielectric layer is made of an electrochromic material, the bonding interfaces of the dielectric layer and the first optical structure layer as well as the bonding interfaces of the dielectric layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity. According to the invention, by changing the color of the colorful electrochromic structure, the position of the fingerprint identification area can be displayed, the voltage can be changed to present a designated color, the consistency of the appearance color of the shell is maintained, and the integrity of the whole machine and the fingerprint identification efficiency are improved.

Description

Fingerprint identification area indicating device based on colorful electrochromic structure and application thereof

Technical Field

The invention relates to an electrochromic device, in particular to a fingerprint identification area indicating device based on a colorful electrochromic structure and a fingerprint identification area indicating method based on the colorful electrochromic structure, and belongs to the technical field of optics or photoelectricity.

Background

At present, for the rear fingerprint in the electronic device, the fingerprint identification module is generally placed by digging a groove on the rear cover to be used as a single area to indicate the position of the fingerprint identification area. However, the slot on the rear case easily affects the integrity of the electronic device and the sealing performance of the whole device.

Disclosure of Invention

The present invention is directed to a fingerprint identification area indicating device based on a multi-color electrochromic structure and an application thereof, such as a method for indicating a fingerprint identification area based on a multi-color electrochromic structure, to overcome the disadvantages of the prior art. In order to achieve the purpose, the technical scheme adopted by the invention comprises the following steps:

the embodiment of the invention provides a fingerprint identification area indicating device based on a colorful electrochromic structure, which comprises: the device comprises a cover plate, a colorful electrochromic structure, a fingerprint identification component and a processor electrically connected with the colorful electrochromic structure and the fingerprint identification component;

the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that the colorful electrochromic structure is in an activated state when the fingerprint identification assembly detects that a finger of a user approaches, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, and the color of the colorful electrochromic structure is consistent with that of the cover plate when the fingerprint identification assembly is in an inactivated state;

the colorful electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the electrolyte is distributed between the working electrode and the counter electrode, the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite and parallel to each other, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer and consists of electrochromic materials, the bonding interfaces of the dielectric layer, the first optical structure layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; when the incident light enters the optical cavity from the first optical structure layer or the second optical structure layer, the phase shift of the reflected light formed on the first surface and the reflected light formed on the second surface

d is the thickness of the dielectric layer,

is the refractive index of the dielectric layer, lambda is the wavelength of the incident light,

the refraction angle of the incident light when the incident light is transmitted through the first surface or the second surface is used as the refraction angle.

In some embodiments, the dielectric layer consists essentially of an electrochromic material, such as an organic material or an inorganic material. In some embodiments, the fingerprint identification assembly includes a sensor and a fingerprint identification unit, the sensor being located alongside the fingerprint identification unit, the sensor detecting a near-far condition of the fingerprint identification unit; the fingerprint identification unit is used for determining that a user finger approaches when the sensor detects an approaching state; when the sensor detects a distant state, it is determined that no user's finger is approaching.

In some embodiments, the device for indicating a fingerprint identification area based on a colorful electrochromic structure further comprises a control circuit, wherein the control circuit is electrically connected with the processor, the fingerprint identification component and the colorful electrochromic structure respectively, and the fingerprint identification component is fixed on the control circuit; the processor is at least used for controlling the control circuit to provide preset voltage for the colorful electrochromic structure; the control circuit can at least drive the colorful electrochromic structure to display the color corresponding to the preset voltage so as to enable the colorful electrochromic structure to change the color.

The embodiment of the invention also provides electronic equipment which comprises any one of the fingerprint identification area indicating devices based on the colorful electrochromic structure.

The embodiment of the invention also provides a fingerprint identification area indicating method based on the colorful electrochromic structure, which is applied to any one of the fingerprint identification area indicating devices based on the colorful electrochromic structure, and comprises the following steps:

connecting the working electrode, the counter electrode and a power supply to form a working circuit;

detecting the state of the fingerprint identification component in real time, wherein the state comprises an activated state and a non-activated state;

when the fingerprint identification component detects that a user finger is close to the fingerprint identification component and is in an activated state, the processor regulates and controls the light transmittance of the colorful electrochromic structure, and controls the colorful electrochromic structure to change color and the cover plate to be different in color so as to prompt the position of a fingerprint identification area;

when the fingerprint identification component is in an inactive state, the color of the colorful electrochromic structure is consistent with that of the cover plate. Compared with the prior art, the invention has the advantages that:

1) according to the fingerprint identification area indicating device and the electronic equipment based on the colorful electrochromic structure, the color of the colorful electrochromic structure is changed, so that the colorful electrochromic structure can display the position of the fingerprint identification area in the appointed color, the voltage can be changed to show the appointed color when the functional component is not used, the appearance color consistency of the shell is kept, an additional modeling design is not needed to be made at the cover plate, and the integrity and the fingerprint identification efficiency of the whole machine are improved;

2) compared with various pigment drawings in the prior art, the colorful electrochromic structure provided by the invention has the advantages of fastness, environmental protection, iridescence effect and the like, and has wide application prospects in the fields of display, decoration, anti-counterfeiting and the like.

Drawings

Fig. 1 is a schematic diagram of a multi-color electrochromic structure in an exemplary embodiment of the invention.

Fig. 2 is a schematic structural diagram of an electronic device in an exemplary embodiment of the invention.

Fig. 3 is a schematic structural diagram of another electronic device in an exemplary embodiment of the invention.

Fig. 4 is a schematic structural diagram of an electronic device in comparative example 1 of the present invention.

Fig. 5 is a schematic structural diagram of an electronic device in comparative example 2 of the present invention.

Fig. 6 is a schematic diagram of a novel multi-color electrochromic structure in accordance with an exemplary embodiment of the present invention.

Fig. 7 is a schematic diagram of a novel reflective/transmissive dual-mode multi-color electrochromic architecture in accordance with an exemplary embodiment of the present invention.

Fig. 8 is a schematic diagram of the structure of the electrochromic working electrode in fig. 7.

Fig. 9 is a schematic diagram of a novel multi-color electrochromic structure in accordance with an exemplary embodiment of the present invention.

Fig. 10 is a photograph of the reflected color from the first optical structure side of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.

Fig. 11 is a photograph showing the reflection color of the novel multicolor electrochromic structure from the PET substrate direction at different tungsten oxide thicknesses in an exemplary embodiment of the present invention.

Fig. 12 is a photograph of the transmission color of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.

Fig. 13 is a schematic diagram of a novel multi-color electrochromic structure according to an exemplary embodiment of the invention.

Fig. 14 is a photograph of the reflected color from the first optical structure side of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.

Fig. 15 is a photograph of the reflected color from the PET substrate of the novel multicolor electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.

Fig. 16 is a photograph of the transmitted color of the novel multi-color electrochromic structure at different tungsten oxide thicknesses in an exemplary embodiment of the invention.

Fig. 17 is a schematic diagram of the structure of the working electrode of a novel reflective/transmissive dual-mode multi-color electrochromic device in accordance with an exemplary embodiment of the present invention.

Fig. 18 is a photograph of working electrodes (taken from the direction of the first optical structure and the substrate) at different voltages in a multicolor electrochromic device with different tungsten oxide thicknesses according to an exemplary embodiment of the invention.

Detailed Description

Aiming at the defects of the prior art, the inventor of the invention provides the technical scheme of the invention through long-term research and massive practice. The technical solution, its implementation and principles, etc. will be further explained as follows. It is to be understood, however, that within the scope of the present invention, each of the above-described features of the present invention and each of the features described in detail below (examples) may be combined with each other to form new or preferred embodiments. For reasons of space, they will not be described in detail.

In order to more clearly illustrate the embodiments or prior art solutions of the present invention, the drawings used in the description of the embodiments or prior art will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments described in the present invention, but not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention. The conditions used in the following examples may be further adjusted as necessary, and the conditions used in the conventional experiments are not generally indicated.

Moreover, it is noted that, in this specification, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

An aspect of an embodiment of the present invention provides a fingerprint identification area indicating device, including: the device comprises a cover plate, a colorful electrochromic structure, a fingerprint identification component and a processor electrically connected with the colorful electrochromic structure and the fingerprint identification component; the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that the colorful electrochromic structure is in an activated state when the fingerprint identification assembly detects that a finger of a user approaches, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, and the color of the colorful electrochromic structure is consistent with that of the cover plate when the fingerprint identification assembly is in an inactivated state;

the multi-color electrochromic structure comprises a working electrode, an electrolyte and a counter electrode, wherein the electrolyte is distributed on the working electrode and the counter electrodeThe working electrode comprises a first optical structure layer and a second optical structure layer which are opposite and parallel to each other, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer and consists of electrochromic materials, the bonding interfaces of the dielectric layer and the first optical structure layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; when the incident light enters the optical cavity from the first optical structure layer or the second optical structure layer, the phase shift of the reflected light formed on the first surface and the reflected light formed on the second surface

d is the thickness of the dielectric layer,

Further, with respect to the working electrode, reflected light formed at the first surface by incident light incident from the first optical structure layer and reflected light formed at the second surface by incident light transmitted through the dielectric layer are superimposed by interference. The reverse is true, namely, the reflected light formed on the second surface by the incident light from the second optical structure layer and the reflected light formed on the first surface by the incident light transmitted through the dielectric layer are superimposed by interference.

Further, when the incident light enters the optical cavity from the first optical structure layer or the second optical structure layer, the phase shift of the reflected light formed on the first surface and the reflected light formed on the second surface

d is the thickness of the dielectric layer,

In some embodiments, the refractive index of the first optical structure layer is defined as

The reflection coefficient of the first surface

Wherein

Is the incident angle of the incident light on the first surface.

In some embodiments, the refractive index of the second optical structure layer is defined as

The reflection coefficient of the second surface

Wherein

Is the angle of refraction of the incident light as it passes through the second surface.

In some embodiments, the reflection coefficient of the working electrode is expressed as:

the reflectance is expressed as:

further, the reflection coefficient and the reflectivity of the working electrode are also suitable for the condition that the incident light enters the optical cavity from the second optical structure layer.

The transmission coefficient of the first optical structure layer

Wherein

Is the incident angle of the incident light on the first surface.

The transmission coefficient of the second optical structure layer

Wherein

In some embodiments, the transmission coefficient of the working electrode is expressed as:

the transmittance is expressed as:

further, the transmittance and transmittance of the working electrode are also suitable for the case that the incident light enters the optical cavity from the second optical structure layer.

Further, the working electrode has an optically transmissive mode of operation, an optically reflective mode of operation, or an optically transmissive and reflective mode of operation.

Wherein, in the optical reflection working mode, the working electrode has a double-sided asymmetric structural color.

Wherein, in the optically transmissive mode of operation, the working electrode has a transparent structural color.

In some embodiments, the working electrode comprises one or more first optical structure layers, one or more dielectric layers, and one or more second optical structure layers.

In some embodiments, the working electrode comprises a plurality of first optical structure layers and/or a plurality of second optical structure layers and a plurality of dielectric layers.

In some embodiments, the material of at least one of the first and second optical structure layers comprises a metal material.

In some embodiments, the first or second optical structure layer is a metal layer.

In some embodiments, the first and second optical structure layers are both metal layers.

In some embodiments, the first or second optical structure layer is directly air.

In some embodiments, the first or second optical structure layer is absent.

Further, the metal material includes tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium, palladium, and the like, but is not limited thereto.

Further, the thickness of the first optical structure layer or the second optical structure layer is preferably 0-20 nm, and is preferably more than 0 and less than 20 nm.

In some embodiments, the dielectric layer is mainly composed of an electrochromic material, and the material of the dielectric layer is selected from an organic material or an inorganic material.

Furthermore, the metal layer and the dielectric layer form a metal-dielectric structure, which can generate optical interference effect to display multi-color, and the ion conductive layer thickness is required to have no influence on the color. The different colors of the units can be realized by one or a plurality of methods of selecting different metal materials, different dielectric materials or different dielectric layer thicknesses.

Further, the inorganic material includes one or a combination of any one or more of a simple metal or a non-simple metal, an inorganic salt, an oxide, and the like, but is not limited thereto.

Further, the elemental nonmetal includes any one or a combination of monocrystalline silicon, polycrystalline silicon and diamond, but is not limited thereto.

Further, the inorganic salt includes any one or a combination of more of fluoride, sulfide, selenide, chloride, bromide, iodide, arsenide, telluride, or the like, but is not limited thereto.

Further, the oxide includes WO₃、NiO、TiO₂、Nb₂O₅、Fe₂O₃、V₂O₅、Co₂O₃、Y₂O₃、Cr₂O₃、MoO₃、Al₂O₃、SiO₂、MgO、ZnO、MnO₂、CaO、ZrO₂、Ta₂O₅、Y₃Al₅O₁₂、Er₂O₃、IrO₂And the like, but is not limited thereto.

Further, the fluoride comprises MgF₂、CaF₂、GeF₂、YbF₃、YF₃、Na₃AlF₆、AlF₃、NdF₃、LaF₃、LiF、NaF、BaF₂、SrF₂And the like, but is not limited thereto.

Further, the sulfide includes ZnS, GeS, MoS₂、Bi₂S₃And the like, but is not limited thereto.

Further, the selenide includes ZnSe, GeSe, MoSe₂、PbSe、Ag₂Se, and the like, but is not limited thereto.

Further, the chloride includes any one or a combination of more of AgCl, NaCl, KCl, and the like, but is not limited thereto. Further, the bromide includes any one or combination of AgBr, NaBr, KBr, TlBr, CsBr, etc., but is not limited thereto.

Further, the iodide includes any one or a combination of AgI, NaI, KI, RbI, CsI, and the like, but is not limited thereto.

Further, the arsenide includes GaAs and the like, but is not limited thereto.

Further, the antimonide includes GdTe and the like, but is not limited thereto.

Further, the material of the dielectric layer comprises SrTiO₃、Ba₃Ta₄O₁₅、Bi₄Ti₃O₂、CaCO₃、CaWO₄、CaMnO₄、LiNbO₄Any one or more of prussian blue, prussian black, prussian white, prussian green, etc., but not limited thereto.

Further, the material of the dielectric layer includes, but is not limited to, a liquid crystal material or an MOF material.

Further, the organic material includes an organic small molecule compound, a polymer, and the like, but is not limited thereto.

Further, the organic material includes any one or a combination of more of viologen, tetrathiafulvalene, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, terephthalyl ester, dimethyldiphenylamine, tetrathiafulvene, alkyl bipyridine, phenothiazine, polyamide, epoxy resin, polydiacetylene, and the like, but is not limited thereto.

In some embodiments, the dielectric layer may consist essentially of an electrochromic material. The dielectric layer is a core layer of the working electrode and is also a generation layer of the color change reaction. The material of the dielectric layer can be selected from inorganic electrochromic materials and/or organic electrochromic materials according to types.

Further, the electrochromic material may be selected from inorganic, organic or liquid crystal materials and MOF materials, etc. Example (b)For example, the inorganic material may include tungsten trioxide (WO)₃) Nickel oxide (NiO), TiO₂、Nb₂O₅、Fe₂O₃、V₂O₅、Co₂O₃、Y₂O₃、MoO₃、IrO₂Prussian blue, prussian black, prussian white, prussian green, etc., without being limited thereto. The organic material may include, but is not limited to, viologen-based compounds, polypyrroles, polyanilines, polythiophene-based compounds and derivatives thereof, polycarbazoles, metal phthalocyanines, dimethyl terephthalate, dimethyldiphenylamines, tetrathiafulvalene, alkyl bipyridines, phenothiazines, polydialkynes, and the like.

In some embodiments, the dielectric layer has a thickness greater than 0 and less than or equal to 2000nm, preferably 50 to 2000nm, and more preferably 100 to 500nm, to provide higher color saturation of the optical film structure.

Further, an optimization dielectric layer can be added between the first optical structure layer or the second optical structure layer and the dielectric layer to optimize the color of the electrochromic layer.

Further, an optimized dielectric layer may be added on the first optical structure layer or the second optical structure layer, or the first optical structure layer or the second optical structure layer may be disposed on the optimized dielectric layer, so as to optimize the color of the electrochromic layer.

In some embodiments, the first or second optical structure layer is bonded to a substrate.

Further, the substrate is transparent or translucent. Accordingly, the material of the substrate may be transparent or translucent, and may be selected from any one or a combination of glass, organic glass, PET, PES, PEN, PC, PMMA, PDMS, and the like, but is not limited thereto.

Further, the optimized dielectric layer may be disposed between the first optical structure layer or the second optical structure layer and the substrate.

Further, the material of the optimized dielectric layer includes but is not limited to WO₃、NiO、TiO₂、Nb₂O₅、Fe₂O₃、V₂O₅、Co₂O₃、Y₂O₃、Cr₂O₃、MoO₃、Al₂O₃、SiO₂、MgO、ZnO、MnO₂、CaO、ZrO₂、Ta₂O₅、Y₃Al₅O₁₂、Er₂O₃、ZnS、MgF₂、SiN_x(silicon nitride), and the like, but is not limited thereto.

Further, the thickness of the optimized dielectric layer is preferably 0-2000 nm, and preferably 100-500 nm, so that the color saturation of the electrochromic structure is higher.

In a more typical embodiment, as shown in fig. 6, the multi-color electrochromic structure includes a second optical structure layer 2, a dielectric layer 3 and a first optical structure layer 4 disposed on a substrate 1. The first optical structure layer 4 and the second optical structure layer 2 are reflective/transmissive layers, which may be made of metal.

The first optical structure layer 4 may also be air directly.

Here, the second optical structure layer 2 may not be present.

In this exemplary embodiment, the materials, thicknesses, and the like of the first optical structure layer, the second optical structure layer, and the dielectric layer may be as described above. Moreover, the color, reflectivity and transmittance of the reflective/transmissive structure of the working electrode can be changed by adjusting the materials, thicknesses and the like of the first optical structure layer 4, the second optical structure layer 2 and the dielectric layer 3.

Another aspect of an embodiment of the present invention also provides a method of preparing the working electrode, which may include:

the first or second optical structure layer, the dielectric layer, etc. are formed by physical or chemical deposition, such as coating, printing, film casting, etc., or magnetron sputtering, electron beam evaporation, thermal evaporation, electrochemical deposition, chemical vapor deposition, atomic force deposition, sol-gel technology, etc., without being limited thereto.

In some embodiments, the first optical or second optical structure layer and the dielectric layer may be sequentially formed on the substrate.

Further, electrochromic devices made of electrochromic materials have been widely used in smart windows, smart indicators, imaging devices, and the like. The principle of electrochromism is that under the action of an external electric field or current, the electronic structure and optical properties (reflectivity, transmittance, absorptivity and the like) of an inorganic or organic electrochromism material are changed stably and reversibly, and the electrochromism material shows reversible changes of color and transparency in appearance. Conventional electrochromism can be divided into two models, a transmissive electrochromic device and a reflective electrochromic device, and the color of the electrochromic device is determined only by the electronic structure and optical properties of the electrochromism itself. Therefore, the single mode and monotonic color modulation of the electrochromic also become a bottleneck limiting the application range thereof.

In some embodiments, the thickness and/or material of the first or second optical structure layer, the dielectric layer, and/or the like may be adjusted during the preparation method, so as to adjust the reflective/transmissive structural color of the working electrode. Further, in the foregoing embodiments of the present invention, the type of the electrolyte is not particularly limited, and a liquid electrolyte, a gel polymer electrolyte, or an inorganic solid electrolyte may be used. In some embodiments, the electrolyte is in contact with the dielectric layer and provides a mobile environment for ions, such as hydrogen ions or lithium ions, to color or decolorize the electrochromic material.

In some embodiments, the type of electrolyte is not particularly limited, and the electrolyte may comprise one or more compounds, such as H-containing⁺、Li⁺、Al³⁺、Na⁺、K⁺、Rb⁺、Ca²⁺，Zn²⁺、Mg²⁺Or Cs⁺The compound of (1). The electrolyte layer is composed of a special conductive material, such as a liquid electrolyte material containing a solution of lithium perchlorate, sodium perchlorate, or the like, or may be a solid electrolyte or gel electrolyte material. In a fruitIn one embodiment, the electrolyte layer may comprise a lithium salt compound, such as LiClO₄、LiBF₄、LiAsF₆Or LiPF₆. Ions contained in the electrolyte may contribute to the color change or light transmittance change of the multicolor electrochromic structure when inserted into or removed from the dielectric layer according to the polarity of the applied voltage. In some embodiments, the electrolyte employed comprises a mixture of ions that can enrich the color change of the electrochromic structure compared to a single ion.

In some embodiments, the electrolyte may be a liquid electrolyte, such as aqueous LiCl, AlCl₃、HCl、H₂SO₄Aqueous solutions, and the like.

In some embodiments, the electrolyte may further comprise a carbonate compound. Since the carbonate-based compound has a high dielectric constant, the ionic conductivity provided by the lithium salt may be increased. As the carbonate-based compound, at least one of the following may be used: PC (propylene carbonate), EC (ethylene carbonate), DMC (dimethyl carbonate), DEC (diethyl carbonate) and EMC (ethyl methyl carbonate). For example, organic LiClO can be used₄、Na(ClO₄)₃And propylene carbonate electrolyte, and the like.

In some embodiments, the electrolyte can be a gel electrolyte, such as PMMA-PEG-LiClO₄，PVDF-PC-LiPF₆，LiCl/PVA，H₂SO₄PVA, etc., but are not limited thereto.

In some preferred embodiments, when an inorganic solid electrolyte is used as the electrolyte, the electrolyte may comprise LiPON or Ta₂O₅. For example, the electrolyte may be, but is not limited to, a Li-containing metal oxide thin film, such as a LiTaO or LiPO thin film. Further, the inorganic solid electrolyte may be LiPON or Ta therein₂O₅The electrolyte to which components such as B, S and W are added may be LiBO, for example₂+Li₂SO₄、LiAlF₄、LiNbO₃、Li₂O-B₂O₃And the like.

In some preferred embodiments, the electrolyte is an all-solid electrolyte, which may be combined to form an all-solid electrochromic structure with a dielectric layer, a metal reflective layer, a counter electrode, and the like in a solid state.

Further, the multicolor electrochromic structure also comprises an ion conducting layer, an ion storage layer, a transparent conducting layer and the like.

Further, the ion storage layer is in contact with the electrolyte.

For example, the working electrode may include a substrate.

For example, the counter electrode may include a substrate, a transparent conductive layer, and an ion storage layer.

The material of the substrate can be as described above, and is not described herein again.

Further, the material of the ion storage layer may be selected from, but not limited to, NiO and Fe₂O₃、TiO₂Prussian blue and IrO₂And the like. The ion storage layer plays a role in storing charges in the working electrode, namely corresponding counter ions are stored when the dielectric layer material undergoes an oxidation-reduction reaction, so that the charge balance of the whole electrochromic layer is ensured.

In some more specific embodiments, the all-solid-state electrolyte in the all-solid-state multicolor electrochromic structure may be in the form of a solid ion-conducting layer. The color change principle of the all-solid-state multicolor electrochromic structure is as follows: the metal reflecting layer and other layer materials form a metal-medium structure, can generate optical interference effect to display multiple colors, and can also comprise other layers, such as an ion conducting layer, an ion storage layer, a transparent conducting layer and the like, the colors which are not influenced by the thickness of the ion conducting layer are required, the electrochromic device with structural colors can be prepared by adjusting the thickness of each layer material to a proper range, further, the refractive index of the electrochromic material can be adjusted by applying voltage, and the colors of the all-solid-state multicolor electrochromic device can be further adjusted.

In some embodiments, a conductive layer is also disposed on the substrate. The conductive layer includes any one or a combination of more of FTO, ITO, Ag nanowire, Ag nano grid, carbon nanotube, and graphene, and may also be a metal layer, Cu, W, or the like, without being limited thereto.

As shown in fig. 1, when a certain voltage is applied between two transparent conductive layers, the material of the dielectric layer undergoes a redox reaction under the action of the voltage, thereby changing the color. This color change is a structural color change that will remain after the voltage is removed. In some embodiments, the counter electrode comprises a transparent conductive electrode or a semi-transparent conductive electrode.

In some embodiments, the counter electrode comprises a transparent conductive electrode having an ion storage layer of a material selected from, but not limited to NiO, Fe₂O₃、TiO₂And the like. The ion storage layer is in contact with the electrolyte. In the foregoing embodiments of the present invention, the transparent conductive electrode may be formed by containing a material having characteristics of high light transmittance, low sheet resistance, and the like, and may be formed by containing any one of: a transparent conductive oxide selected from ITO (indium tin oxide), FTO (fluorine-doped tin oxide), AZO (aluminum-doped zinc oxide), GZO (gallium-doped zinc oxide), ATO (antimony-doped tin oxide), IZO (indium-doped zinc oxide), NTO (niobium-doped titanium oxide), ZnO, OMO (oxide/metal/oxide), and CTO; silver (Ag) nanowires; a metal mesh; or OMO (oxide metal oxide).

The method of forming the transparent conductive electrode is not particularly limited, and any known method may be used without limitation. For example, a thin film electrode layer containing transparent conductive oxide particles may be formed on the glass base layer by a method such as sputtering or printing (screen printing, gravure printing, inkjet printing, etc.). The thickness of the electrode layer thus prepared may be in the range of 10nm to 500nm in the case of the vacuum method, and may be in the range of 0.1 μm to 20 μm in the case of the printing method. In one example, the visible light transmittance of the transparent conductive electrode layer may be 70% to 95%.

In some embodiments, a layer of metal material, in particular a thin layer of metal, may also be added on the dielectric layer to optimize the color of the multicolored electrochromic structure. Specifically, for some materials or multicolor electrochromic structures with proper thickness, the metal materials with proper thickness are added, so that the intensity difference of the reflectivity curve can be improved, and further, the saturation of the color is improved. Wherein the metal may be selected from Ag, Al, Cu, Ni, etc., but is not limited thereto. The thickness of the metal layer may be preferably 0 to 30nm, and particularly preferably 1 to 10 nm.

In some embodiments, a semiconductor material may be added to the dielectric layer to optimize the color of the multicolored electrochromic structure. For some specific materials or colorful films with proper thickness, the intensity difference of the reflectivity curve can be improved by adding semiconductor materials with proper thickness, and further, the saturation of the color is improved. Wherein the semiconductor may be selected from Al₂O₃、SiO₂、ZnS、MgF₂Silicon nitride, etc., but not limited thereto. The thickness of the semiconductor can be preferably 0 to 300nm, and particularly preferably 1 to 100 nm. Fig. 1 shows a multi-color electrochromic structure according to an exemplary embodiment of the present invention, which includes a substrate, a metal layer, an electrochromic layer, an ion conducting layer, an ion storage layer, and a transparent conducting layer, wherein the multi-color electrochromic structure is electrically coupled to a voltage control circuit. Through changing the luminousness of colorful electrochromic structure to be in the activated state when fingerprint identification subassembly detects that there is the user finger to be close to, make colorful electrochromic structure discolours and the colour of apron is different to indicate the regional position of fingerprint identification, and, when fingerprint identification subassembly is in the inactivated state, the colour of colorful electrochromic structure is unanimous with the apron colour.

With reference to the foregoing, the metal layer and the dielectric layer (i.e., the electrochromic layer, or referred to as a working electrode) form a metal-dielectric structure, which can generate optical interference to display multiple colors; the different colors of the electrochromic layer can be realized by one or a plurality of methods of selecting different metal materials, different medium materials or different medium layer thicknesses.

The multi-color electrochromic structure provided by the embodiment of the invention is a physical structure color of a multi-color pattern obtained by the optical interference of a metal medium, is more stable and durable compared with the existing organic electrochromic material when being used on electronic equipment, and has the characteristic of various colors and wide selectable range compared with the existing inorganic material electrochromic technology.

In some preferred embodiments, the cover plate, the colorful electrochromic structure and the fingerprint identification component are sequentially stacked; the fingerprint identification component detects whether a user finger is close to the fingerprint identification component; and the processor controls the colorful electrochromic structure to change color when the fingerprint identification component detects that a finger of a user is close to the colorful electrochromic structure so as to prompt the position of a fingerprint identification area.

In some preferred embodiments, the fingerprint identification assembly comprises a sensor and a fingerprint identification unit, the sensor is arranged side by side with the fingerprint identification unit, and the sensor detects the approaching and departing state of the fingerprint identification unit; the fingerprint identification unit is used for determining that a user finger approaches when the sensor detects an approaching state; when the sensor detects a distant state, it is determined that no user's finger is approaching.

In some preferred embodiments, the multicolor electrochromic structure-based fingerprint identification area indicating device further comprises a control circuit, the control circuit is electrically coupled with the processor, the fingerprint identification component and the multicolor electrochromic structure respectively, and the fingerprint identification component is fixed on the control circuit; the processor is at least used for controlling the control circuit to provide preset voltage for the colorful electrochromic structure; the control circuit can at least drive the colorful electrochromic structure to display the color corresponding to the preset voltage so as to enable the colorful electrochromic structure to change the color.

In some preferred embodiments, the fingerprint identification component collects fingerprint information input by a user after the colorful electrochromic structure is discolored; the processor verifies the fingerprint information collected by the fingerprint identification component, and controls the control circuit to stop providing preset voltage for the colorful electrochromic structure after the fingerprint information passes the verification, so that the colorful electrochromic structure recovers the initial color.

In some preferred embodiments, the cover plate is provided with an attachment layer on a side close to the fingerprint identification component, so that the internal components of the electronic equipment are hidden from view from the appearance of the cover plate; the adhesion layer is provided with a through hole, and the colorful electrochromic structure is positioned in the through hole; the fingerprint identification component is arranged below the colorful electrochromic structure. Further, the initial color of the multicolor electrochromic structure is the same as the color of the adhesion layer.

Further, the cover plate is a transparent glass cover plate.

Another aspect of the embodiments of the present invention also provides an electronic device, which includes any one of the aforementioned fingerprint identification area indicating devices based on a multi-color electrochromic structure.

In some preferred embodiments, the electronic device further comprises a camera component (e.g., a camera) at least for detecting whether a face image is captured; and when the camera shooting assembly captures the face image, the fingerprint identification assembly determines that a user finger is close to the camera shooting assembly, and when the camera shooting assembly does not capture the face image, the fingerprint identification assembly determines that no user finger is close to the camera shooting assembly.

In some preferred embodiments, the electronic device further includes a middle frame, wherein the cover plate is fixedly connected with the middle frame to form an accommodating space, and the control circuit is fixed in the accommodating space.

The electronic device may be a mobile phone, a tablet computer, a Personal Digital Assistant (PDA), VR glasses, but is not limited thereto.

In some more preferred embodiments, the electronic device comprises a cover sheet, a multi-color electrochromic structure (also referred to as an electrochromic element), an adhesive layer, and a fingerprint identification element, wherein: the cover plate, the attachment layer and the fingerprint identification component are sequentially stacked; a groove extending towards the outer side of the electronic equipment is formed in one side, close to the fingerprint identification component, of the cover plate, and the colorful electrochromic structure is fixed in the groove; the fingerprint identification component is positioned below the colorful electrochromic structure; when the fingerprint identification component is in an idle state, the colorful electrochromic structure displays the same color as the attachment layer; when the fingerprint identification assembly is detected to be started to collect fingerprints, the colorful electrochromic structure displays colors different from those of the attachment layer so as to prompt the position of the fingerprint identification area.

Fig. 2 is a schematic structural diagram of an electronic device according to an exemplary embodiment of the invention. The electronic equipment can comprise a cover plate, a colorful electrochromic structure, a fingerprint identification component and a processor electrically connected with the colorful electrochromic structure and the fingerprint identification component; the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that the colorful electrochromic structure is in an activated state when the fingerprint identification assembly detects that a finger of a user is close to the colorful electrochromic structure, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, and the color of the colorful electrochromic structure is consistent with that of the cover plate when the fingerprint identification assembly is in an inactivated state. It should be noted that the electronic device is not limited to the above.

Another aspect of the embodiments of the present invention further provides a method for preparing the foregoing multicolor electrochromic structure, including the following steps: providing a substrate; depositing different metals in different areas on the substrate by adopting a PVD (physical vapor deposition) deposition mode, and depositing a dielectric layer material on the different metals; or sputtering a metal layer material on the substrate in a PVD (physical vapor deposition) deposition mode, and depositing and preparing different dielectric materials in different areas of the metal layer; or sputtering a metal layer material on the substrate in a PVD (physical vapor deposition) deposition mode, and depositing and preparing dielectric materials with different thicknesses in different areas of the metal layer; or different metals are firstly prepared in different areas on the substrate by PVD deposition, and then different dielectric materials are prepared in different areas of the metal layer by deposition; or adopting a PVD deposition mode to deposit and prepare different metals in different areas on the substrate, and then depositing and preparing dielectric materials with different thicknesses in different areas of the metal layer; the PVD deposition mode comprises evaporation plating, electron beam evaporation, magnetron sputtering or ion plating. According to the embodiment of the invention, the color of the colorful electrochromic film obtained through the optical interference effect of the metal medium is a physical structural color, the initial color is controlled by changing the thicknesses of the metal layer and the electrochromic layer, and the color is correspondingly changed after the power is on. Compared with various pigment drawings in the prior art, the color-changing pigment has the advantages of fastness, environmental protection, iridescence effect and the like, and has wide application prospects in the fields of display, decoration, anti-counterfeiting and the like.

Another aspect of the embodiments of the present invention further provides a method for indicating a fingerprint identification area based on a multi-color electrochromic structure, which is applied to any one of the aforementioned apparatuses for indicating a fingerprint identification area based on a multi-color electrochromic structure, and includes:

when the fingerprint identification component is in an inactive state, the color of the colorful electrochromic structure is consistent with that of the cover plate. Further, the method may comprise the steps of:

detecting in real-time a state of the fingerprint identification component, the state including an active state and an inactive state (which may also be referred to as an "idle state");

when the sensor judges that the equipment is in a user use state, the fingerprint identification assembly is in an activated state, and the colorful electrochromic structure is controlled to change the reflectivity, so that the fingerprint identification area displays a specified color;

when the device is judged not to be in the user use state, the fingerprint identification assembly is in an idle state, and the colorful electrochromic structure is controlled to change the color, so that the color of the colorful electrochromic structure is consistent with that of the back shell.

Fig. 3 is another schematic structural diagram of an electronic device according to an embodiment of the present application, and the operating principle of the electronic device is as follows:

when the sensor judges that the equipment is in a user use state, the fingerprint identification assembly is in an activated state, and the colorful electrochromic structure is controlled to change the reflectivity, so that the fingerprint identification area of the frame displays an appointed color;

when the device is judged not to be in the user use state, the fingerprint identification assembly is in an idle state, and the colorful electrochromic structure is controlled to change the color, so that the color is consistent with the color of the side frame.

Fig. 9 shows a novel reflective/transmissive dual-mode multi-color electrochromic structure according to an exemplary embodiment of the present invention, which includes a working electrode 5, a counter electrode 7, and an electrolyte layer 6, wherein the electrolyte layer 6 is disposed between the working electrode 5 and the counter electrode 7.

Wherein, the electrolyte layer 6 can be selected from suitable aqueous phase electrolyte, organic phase electrolyte, gel electrolyte or solid electrolyte, preferably LiCl, AlCl₃、HCl、H₂SO₄Aqueous solution, LiClO₄Of propylene carbonate electrolyte, LiCl/PVA, H₂SO₄PVA gel electrolyte, and the like, without being limited thereto.

Referring to fig. 10, the working electrode 5 may include an optical thin film structure, the optical thin film structure may include a conductive substrate 10, a metal reflective/transmissive layer 11 as a second optical structure layer, and a dielectric layer 12, and an air layer above the dielectric layer 12 may serve as a first optical structure layer, and the dielectric layer 12 may be made of an electrochromic material. Preferably, the thickness of the second optical structure layer is greater than 0 and less than 20 nm.

In this regard, referring to the above, the reflective/transmissive structural color of the optical film structure can be changed by adjusting the material and thickness of the metal reflective/transmissive layer and the dielectric layer. Furthermore, the color of the dielectric layer can also be changed by adjusting the voltage, current, etc. applied to the electrochromic material. Therefore, the fusion of the inherent optical structure color and the electrochromism of the electronic equipment can be realized, and the abundant color change can be realized more simply and controllably.

The technical scheme of the invention is further explained in detail by a plurality of embodiments and the accompanying drawings. However, the examples are chosen only for the purpose of illustrating the invention and are not to be construed as limiting the scope of the invention.

Embodiment 1 an electronic device of a fingerprint identification area indicating device based on a multi-color electrochromic structure disclosed in this embodiment includes a cover plate, a multi-color electrochromic structure, a fingerprint identification component, and a processor electrically connected to the multi-color electrochromic structure and the fingerprint identification component; the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that when the fingerprint identification assembly detects that a finger of a user is close to the colorful electrochromic structure, the colorful electrochromic structure is in an activated state, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, when the fingerprint identification assembly is in an inactivated state, the color of the colorful electrochromic structure is consistent with that of the cover plate, and the structure of the colorful electrochromic structure can be shown in a reference mode in fig. 2. Wherein the fingerprint identification area is located at the back portion of the cover in fig. 2.

The electrochromic structure can be seen from fig. 1, and includes a substrate, a metal layer, an electrochromic layer, an ion conducting layer, an ion storage layer, and a transparent conducting layer, and the electrochromic structure is electrically coupled to a voltage control circuit. Through changing the colour of colorful electrochromic structure, can realize having both letting colorful electrochromic structure show appointed colour and show fingerprint identification district position, can change voltage again and present appointed colour and keep shell outward appearance color uniformity when functional unit does not use, and need not to do extra molding design in apron department, promoted the wholeness and the fingerprint identification efficiency of complete machine.

Embodiment 2 an electronic device of a fingerprint identification area indicating device based on a multi-color electrochromic structure disclosed in this embodiment includes a cover plate, a multi-color electrochromic structure, a fingerprint identification component, and a processor electrically connected to the multi-color electrochromic structure and the fingerprint identification component; the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that when the fingerprint identification assembly detects that a finger of a user is close to the colorful electrochromic structure, the colorful electrochromic structure is in an activated state, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, when the fingerprint identification assembly is in an inactivated state, the color of the colorful electrochromic structure is consistent with that of the cover plate, and the structure of the colorful electrochromic structure can be shown in the figure 3. Wherein the fingerprint identification area is located on the side frame part in FIG. 3

Comparative example 1 an electronic device of a fingerprint identification area indicating device disclosed in this comparative example includes a cover plate, a recess, and a fingerprint identification component, and the structure thereof can be seen from fig. 4.

Wherein the fingerprint identification area is located at the side frame portion in fig. 4.

Comparative example 2 an electronic device of a fingerprint identification area indicating device disclosed in this comparative example includes a cover plate, a side recess, and a fingerprint identification component, and the structure thereof can be seen from fig. 5.

Wherein the fingerprint identification area is located in the rear recessed portion in fig. 5.

Example 3

The working electrode of the multicolor electrochromic structure provided by this embodiment includes a first optical structure layer, a second optical structure layer, a dielectric layer, and a substrate layer, which can be seen from fig. 6.

The first optical structure layer is air, the second optical structure layer is a metal tungsten (W) layer, the dielectric layer is formed by tungsten oxide, and the base layer can be a PET film.

The preparation method of the working electrode with the colorful electrochromic structure comprises the following steps: firstly, sputtering a tungsten film on a clean PET substrate by a magnetron sputtering method, wherein the thickness of the tungsten film is preferably selected to be about 10 nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering. Preferably, the tungsten oxide layer has a thickness of 100nm to 400 nm.

Of course, the tungsten film can be prepared by electron beam evaporation, thermal evaporation, and the like known in the art. The tungsten oxide layer can be formed by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technique, and the like. Referring to fig. 8, by controlling the thickness of the tungsten oxide layer to be different, an optical thin film structure with rich reflection and gorgeous color can be obtained when viewed from the first optical structure layer side.

Referring to fig. 9, at different thicknesses of tungsten oxide (in fig. 8), the corresponding reflection color also appears rich and gorgeous as seen from the direction of the substrate layer, and the color is quite different from the color seen from the direction of the first optical structure layer.

Referring to fig. 10, under different thicknesses of tungsten oxide shown in fig. 8, a transmission structure color can be obtained through the optical film structure of the present embodiment, and the transmission structure color also presents rich and gorgeous colors. Therefore, the transmittance of the transmitted color of the optical thin film structure of the present embodiment is determined by the thicknesses of the metal tungsten layer and the tungsten oxide layer.

Example 4

This embodiment provides a working electrode of a multicolor electrochromic structure, which includes a first optical structure layer, a second optical structure layer, a dielectric layer, and a substrate layer, as shown in fig. 8.

The first optical structure layer is air, the second optical structure layer is a metal silver (Ag) layer, the dielectric layer is formed by titanium dioxide, and the substrate layer can be a PET film.

The preparation method of the working electrode with the colorful electrochromic structure comprises the following steps: on a clean PET substrate, a silver film is sputtered by a magnetron sputtering method, and the thickness of the silver film is preferably selected to be about 2 nm. And sputtering a titanium dioxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the titanium dioxide layer is preferably set to be 100 nm-400 nm.

Of course, the silver film can be prepared by electron beam evaporation, thermal evaporation, and the like known in the art. The titanium dioxide layer can be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technique, etc. in the manner known in the art. The working electrode structure of this example exhibited similar properties to the working electrode structure of example 3, i.e., exhibited different colors when viewed from both sides. In addition, the light-emitting diode also has a transmission structural color.

Example 5

The working electrode of the multicolor electrochromic structure provided by the embodiment comprises a first dielectric layer, a second optical structure layer, a second dielectric layer and a first optical structure layer which are sequentially formed on a substrate.

The added second dielectric layer can improve the color brightness and saturation.

Referring to fig. 13, the first optical structure layer of the optical film structure is air, the second optical structure layer is metal tungsten (W), the first and second dielectric layers are formed of tungsten oxide, and the substrate layer may be a PET film.

The preparation method of the working electrode with the colorful electrochromic structure comprises the following steps: firstly, sputtering a tungsten oxide layer on a clean PET substrate by a magnetron sputtering method, preferably, the thickness of the tungsten oxide layer is set to be 1 nm-400 nm. Then, a tungsten film is sputtered by a magnetron sputtering method, and the thickness of the tungsten film is preferably about 10 nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100 nm-400 nm.

Of course, the tungsten film can be prepared by electron beam evaporation, thermal evaporation, and the like known in the art. The tungsten oxide layer can be formed by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technique, and the like. Referring to fig. 14, by controlling the thickness of the tungsten oxide layer between the tungsten layer and the PET substrate to be different, the working electrode structure with rich reflection and gorgeous color can be obtained when viewed from the first optical structure layer side.

Referring to fig. 15, at different tungsten oxide thicknesses shown in fig. 12, the corresponding reflection colors also appear rich and gorgeous colors seen from the substrate layer side, and the colors are quite different from the colors seen from the film direction.

Referring to fig. 16, under different thicknesses of tungsten oxide shown in fig. 14, a transmission structure color can be obtained through the working electrode structure, the transmission structure color also presents rich and gorgeous colors, and the transmittance of the transmission color of the working electrode structure is determined by the thicknesses of the metal tungsten layer and the tungsten oxide layer.

Example 6:

the working electrode structure of the multicolor electrochromic structure provided by the embodiment comprises a second optical structure layer, a dielectric layer and a first optical structure layer which are sequentially formed on a substrate.

The first optical structure layer is a metal tungsten (W) film, the second optical structure layer is a metal aluminum (Al) film, the dielectric layer is formed of zinc sulfide (ZnS), and the substrate layer can be a PET film.

The preparation method of the working electrode structure of the colorful electrochromic structure comprises the following steps: on a clean PET substrate, a metal aluminum film is sputtered by a magnetron sputtering method, and the thickness of the aluminum film is preferably set to be 15 nm. And then sputtering a zinc sulfide layer by a magnetron sputtering method, preferably, the thickness of the zinc sulfide is selected to be 100 nm-400 nm. And sputtering a tungsten film layer on the zinc sulfide layer by magnetron sputtering, wherein the thickness of the tungsten film layer is preferably set to be 0-50 nm.

Of course, the tungsten film and the aluminum film can be prepared by electron beam evaporation, thermal evaporation, and the like in a manner known in the art. The zinc sulfide layer can be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technique, etc. in a manner known in the art.

The working electrode structure of the multicolor electrochromic structure of the embodiment can present different colors when observed from two side surfaces, and in addition, the working electrode structure also has a transmission structure color.

Example 7:

The first optical structure layer is air, the second optical structure layer is a metal aluminum (Al) film, the dielectric layer is formed by a silicon simple substance, and the substrate layer can be a PET film.

The preparation method of the working electrode structure of the colorful electrochromic structure comprises the following steps: on a clean PET substrate, a metal aluminum film is sputtered by a magnetron sputtering method, and the thickness of the aluminum film is preferably set to be 5 nm. And then depositing a silicon film layer by a magnetron sputtering method, preferably, the thickness of the silicon film layer is selected to be 100 nm-400 nm.

Of course, the aluminum film and the silicon film can be prepared by electron beam evaporation, thermal evaporation, and the like in a manner known in the art. The working electrode structure of the present embodiment will appear different colors when viewed from both sides, and additionally has a transmissive structure color.

Example 8:

The first optical structure layer is a metal silver (Ag) film, the second optical structure layer is a metal aluminum (Al) film, the dielectric layer is formed by Prussian blue, and the substrate layer can be a PET/ITO film.

The preparation method of the working electrode structure of the colorful electrochromic structure comprises the following steps: firstly, sputtering a layer of metal aluminum film on a clean PET/ITO substrate by a magnetron sputtering method, and preferably, setting the thickness of the aluminum film at 10 nm. And then depositing a Prussian blue layer by an electrodeposition method, wherein the thickness of the Prussian blue is preferably 100-2000 nm. And sputtering a silver film layer on the Prussian blue layer through magnetron sputtering, wherein the thickness of the silver film layer is preferably set to be 0-50 nm. Of course, the silver film and the aluminum film can be prepared by electron beam evaporation, thermal evaporation, and the like in a manner known in the art. The prussian blue layer can be prepared by electrochemical deposition, sol-gel technique, etc. in the manner known in the art.

The working electrode structure of the present embodiment will appear different colors when viewed from both sides, and additionally has a transmissive structure color.

Example 9:

the present embodiment provides a device, which may be considered to be a reflective/transmissive dual-mode multicolor electrochromic device, comprising a working electrode, an electrolyte layer, and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.

Referring to fig. 17, the working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structure layers in which air is used as the first optical structure layer, the second optical structure layer is formed of metal tungsten (W), and a dielectric layer formed of tungsten oxide. And the substrate may be PET/ITO or the like.

The preparation method of the working electrode comprises the following steps: on a clean PET/ITO film, a tungsten film is firstly sputtered by a magnetron sputtering method, and preferably, the thickness of the tungsten film is selected to be about 10 nm. And then, magnetron sputtering a tungsten oxide layer on the tungsten film, wherein the thickness of the tungsten oxide layer is preferably set to be 100 nm-400 nm.

Of course, the tungsten film can be prepared by electron beam evaporation, thermal evaporation, and the like known in the art. The tungsten oxide layer can be formed by electron beam evaporation, thermal evaporation, electrochemical deposition, and the like.

The working electrode of this embodiment appears different colors when viewed from both sides, and additionally has a transmissive structural color.

Then the working electrode is matched with a pair of electrodes (such as NiO pair electrode), and AlCl is packaged between the working electrode and the pair of electrodes₃And (4) leading out a lead after the electrolyte, thus preparing the multicolor electrochromic device of the embodiment. By applying a voltage to the multicolour electrochromic device, the colour of the working electrode can be further modulated to change between more colours, in particular the colour change on both sides of the working electrode is not exactly the same, as shown in particular in fig. 18.

Example 10:

the present embodiment provides an optical device, which may be considered to be a reflective/transmissive dual-mode multicolor electrochromic device, including a working electrode, an electrolyte layer, and a counter electrode, the electrolyte layer being disposed between the working electrode and the counter electrode.

The working electrode comprises an optical thin film structure arranged on a conductive substrate, wherein the optical thin film structure comprises a first optical structure layer, a second optical structure layer and a dielectric layer, the first optical structure layer is formed by metal tungsten (W), the second optical structure layer is formed by metal silver (Ag), and the dielectric layer is formed by dioxideTitanium (TiO)₂) And (4) forming. And the substrate may be PET/AgNWs.

The preparation method of the working electrode comprises the following steps: on a clean PET/AgNWs film, a silver film is firstly sputtered by a magnetron sputtering method, and the thickness of the silver film is preferably selected to be about 10 nm. And then, magnetron sputtering a titanium oxide layer on the silver film, wherein the thickness of the titanium oxide layer is preferably set to be 100 nm-400 nm. And then magnetron sputtering a tungsten film on the titanium dioxide layer, wherein the thickness of the tungsten film is preferably selected to be about 5 nm.

The optical device can be assembled in the manner described in example 11.

Of course, the silver film and the tungsten film can be prepared by electron beam evaporation, thermal evaporation, and the like in a manner known in the art. The titanium oxide layer can be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, and the like.

Then, the working electrode is matched with a pair of electrodes (such as NiO pair electrodes), LiCl/PVA gel electrolyte is arranged between the working electrode and the pair of electrodes, and then a lead is led out, so that the multicolor electrochromic device of the embodiment can be prepared. By applying a voltage to the multicolor electrochromic device and adjusting the voltage range, the color of the working electrode can be further modulated to change among more colors, particularly, the color change on two sides of the working electrode is not completely the same. The multi-color electrochromic device of this example was subjected to a voltage to cause the color change to exhibit similar properties to the color change of example 9.

Example 11:

The working electrode includes an optical thin film structure disposed on a conductive substrate, the optical thin film structure including first and second optical structuresA first optical structure layer made of air, a second optical structure layer made of copper (Cu), and a dielectric layer made of vanadium oxide (V)₂O₅) And the base layer may be PET/ITO.

The preparation method of the optical film structure comprises the following steps: on a clean PET substrate, a layer of copper film is sputtered by a magnetron sputtering method, and the thickness of the copper film is preferably selected to be about 15 nm. And sputtering a vanadium oxide layer on the copper film by magnetron sputtering, wherein the thickness of the vanadium oxide layer is preferably 100 nm-400 nm.

Of course, the foregoing copper film can also be prepared by electron beam evaporation, thermal evaporation, and the like in a manner known in the art. The vanadium oxide layer can be prepared by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technology and other methods known in the art. The working electrode of this embodiment appears different colors when viewed from both sides, and additionally has a transmissive structural color.

The optical device can be assembled in the manner described in example 9.

Then the working electrode is matched with a pair of electrodes (such as NiO counter electrode), and LiCl/HCl/AlCl is arranged between the working electrode and the pair of electrodes₃a/NaCl/PVA mixed ion gel electrolyte. By applying a voltage to the multicolor electrochromic device and adjusting the voltage range, the color of the working electrode can be further modulated to change among more colors, particularly, the color change on two sides of the working electrode is not completely the same. The multi-color electrochromic device of this example was subjected to a voltage to cause the color change to exhibit similar properties to the color change of example 9.

Example 12:

The working electrode comprises an optical thin film structure arranged on a conductive substrate, the optical thin film structure comprises a first optical structure layer, a second optical structure layer and a dielectric layer, wherein air is used as a first optical junctionA layer of tungsten (W) as the second optical structure layer and tungsten oxide (WO) as the dielectric layer₃) And (4) forming. And the substrate may be PET/ITO.

The preparation method of the working electrode comprises the following steps: on a clean PET/ITO film, a silver film is sputtered by a magnetron sputtering method, and preferably, the thickness of the tungsten film is selected to be about 10 nm. And then, magnetron sputtering a tungsten oxide layer on the silver film, wherein the thickness of the tungsten oxide layer is preferably set to be 100 nm-400 nm.

A lithium lanthanum titanate film is sputtered on the working electrode as a solid electrolyte by a magnetron sputtering method, and the thickness of the lithium lanthanum titanate film is preferably 500 nm.

The working electrode, solid electrolyte and a pair of electrodes (e.g., IrO)₂Counter electrode) and then lead out the lead, thus preparing the multicolor electrochromic device of the embodiment. By applying a voltage to the multicolour electrochromic device, the colour of the working electrode can be further modulated so that it can be changed between more colours, in particular the colour change on both sides of the working electrode is not exactly the same. The multi-color electrochromic device of this example was subjected to a voltage to cause the color change to exhibit similar properties to the color change of example 11.

Comparative example 3:

the optical film structure provided by the comparative example comprises a first optical structure layer, a second optical structure layer, a dielectric layer and a substrate layer.

The first optical structure layer is air, the second optical structure layer is not present (no tungsten film), the dielectric layer is formed by tungsten oxide, and the substrate layer can be a PET film.

The preparation method of the optical film structure comprises the following steps: and sputtering a tungsten oxide layer on the clean PET substrate by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100 nm-400 nm.

The thickness of the tungsten oxide layer is controlled to be different, and a transparent colorless optical thin film structure is obtained when viewed from one side of the first optical structure layer.

Under different tungsten oxide thicknesses, the corresponding color is transparent and colorless when viewed from the substrate layer direction, and the color is completely the same as the color when viewed from the first optical structure layer direction.

The optical thin film structure of the comparative example was transparent and colorless even though the thickness of tungsten oxide was different.

Comparative example 4:

The preparation method of the optical film structure comprises the following steps: on a clean PET substrate, a tungsten film is firstly sputtered by a magnetron sputtering method, and the thickness of the tungsten film is preferably selected to be about 100 nm. And sputtering a tungsten oxide layer on the tungsten film by magnetron sputtering, wherein the thickness of the tungsten oxide layer is preferably set to be 100 nm-400 nm.

Of course, the tungsten film can be prepared by electron beam evaporation, thermal evaporation, and the like known in the art. The tungsten oxide layer can be formed by electron beam evaporation, thermal evaporation, electrochemical deposition, sol-gel technique, and the like. The thickness of the tungsten oxide layer is controlled to be different, and an optical thin film structure with rich reflection and gorgeous colors can be obtained when the optical thin film structure is seen from one side of the first optical structure layer.

The reflection color of the tungsten oxide film is only the color (silver white) of the metal tungsten film when viewed from the direction of the base layer under different tungsten oxide thicknesses. The optical thin film structure of the comparative example was found to be non-transmissive at different tungsten oxide thicknesses.

In addition, the inventor of the present application also conducts experiments by replacing the corresponding materials in the foregoing embodiments with other dielectric materials, metal reflective materials, base materials, and the like listed in the present specification, and finds that the obtained electrochromic structure and the electronic device have similar advantages.

It should be understood that the above-mentioned embodiments are merely illustrative of the technical concepts and features of the present invention, which are intended to enable those skilled in the art to understand the contents of the present invention and implement the present invention, and therefore, the protection scope of the present invention is not limited thereby. All equivalent changes and modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.

Claims

1. A fingerprint identification area indicating device based on a multi-color electrochromic structure, comprising: the device comprises a cover plate, a colorful electrochromic structure, a fingerprint identification component and a processor electrically connected with the colorful electrochromic structure and the fingerprint identification component; the processor can regulate and control the light transmittance of the colorful electrochromic structure, so that the colorful electrochromic structure is in an activated state when the fingerprint identification assembly detects that a finger of a user approaches, the color of the colorful electrochromic structure is different from that of the cover plate, the position of a fingerprint identification area is prompted, and the color of the colorful electrochromic structure is consistent with that of the cover plate when the fingerprint identification assembly is in an inactivated state;

the multicolor electrochromic structure comprises a working electrode, electrolyte and a counter electrode, wherein the electrolyte is distributed between the working electrode and the counter electrode, and the multicolor electrochromic structure is characterized in that: the working electrode comprises a first optical structure layer and a second optical structure layer which are opposite to each other and arranged in parallel, the first optical structure layer and the second optical structure layer are optically reflective and/or optically transmissive, a dielectric layer is arranged between the first optical structure layer and the second optical structure layer and consists of electrochromic materials, the bonding interfaces of the dielectric layer, the first optical structure layer and the second optical structure layer are respectively a first surface and a second surface of the dielectric layer, and the first surface, the second surface and the dielectric layer form an optical cavity; at the incident light from the firstWhen the optical structure layer or the second optical structure layer enters the optical cavity, the phase shift of the reflected light formed on the first surface and the reflected light formed on the second surface

d is the thickness of the dielectric layer,

2. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: if the refractive index of the first optical structure layer is defined as

The reflection coefficient of the first surface

Wherein

Is the incident angle of the incident light on the first surface;

and/or, if the refractive index of the second optical structure layer is defined as

The reflection coefficient of the second surface

Wherein

3. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 2, wherein: the reflection coefficient of the working electrode is expressed as:

the reflectance is expressed as:

4. a multicolored electrochromic structure-based fingerprint identification area indicating device as in any one of claims 1-3, wherein: if the refractive index of the first optical structure layer is defined as

The transmission coefficient of the first optical structure layer

Wherein

Is the incident angle of the incident light on the first surface;

The transmission coefficient of the second optical structure layer

Wherein

Is incident light atAngle of refraction through the second surface.

5. A multicolored electrochromic structure-based fingerprint identification area indicating device as in claim 4, wherein: the transmission coefficient of the working electrode is expressed as:

the transmittance is expressed as:

6. a multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the working electrode has an optical transmission working mode, an optical reflection working mode or an optical transmission and reflection working mode; preferably, in the optical reflection operation mode, the working electrode has a two-sided asymmetric structural color, and in the optical transmission operation mode, the working electrode has a transparent structural color.

7. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: one of the first optical structure layer and the second optical structure layer is a metal layer, and the other one of the first optical structure layer and the second optical structure layer is composed of gas, wherein the gas comprises air; or the first optical structure layer and the second optical structure layer are both metal layers.

8. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the working electrode includes one or more first optical structure layers, one or more dielectric layers, and one or more second optical structure layers.

9. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 8, wherein: the working electrode comprises a plurality of first optical structure layers and/or a plurality of second optical structure layers and a plurality of medium layers.

10. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 8, wherein: at least one of the first optical structure layer and the second optical structure layer is made of a metal material; preferably, the metal material comprises any one or combination of more of tungsten, gold, silver, copper, titanium, aluminum, chromium, iron, cobalt, nickel, platinum, germanium and palladium; and/or the thickness of at least one of the first optical structure layer and the second optical structure layer is 0-20 nm.

11. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the material of the dielectric layer is selected from an organic material or an inorganic material;

preferably, the inorganic material comprises a metal or a combination of any one or more of a non-metal simple substance, an inorganic salt and an oxide;

more preferably, the non-metal simple substance comprises any one or more of monocrystalline silicon, polycrystalline silicon and diamond;

more preferably, the inorganic salt comprises any one or more of fluoride, sulfide, selenide, chloride, bromide, iodide, arsenide, or telluride in combination;

more preferably, the oxide comprises WO₃、NiO、TiO₂、Nb₂O₅、Fe₂O₃、V₂O₅、Co₂O₃、Y₂O₃、Cr₂O₃、MoO₃、Al₂O₃、SiO₂、MgO、ZnO、MnO₂、CaO、ZrO₂、Ta₂O₅、Y₃Al₅O₁₂、Er₂O₃、IrO₂Any one or a combination of more of them;

more preferably, the fluoride comprises MgF₂、CaF₂、GeF₂、YbF₃、YF₃、Na₃AlF₆、AlF₃、NdF₃、LaF₃、LiF、NaF、BaF₂、SrF₂Any one or a combination of more of them;

more preferably, the sulfide includes ZnS, GeS, MoS₂、Bi₂S₃Any one or a combination of more of them;

more preferably, the selenide comprises ZnSe, GeSe, MoSe₂、PbSe、Ag₂Se is any one or combination of more;

more preferably, the chloride comprises any one or more of AgCl, NaCl and KCl;

more preferably, the bromide comprises any one or more of AgBr, NaBr, KBr, TlBr and CsBr;

more preferably, the iodide comprises any one or more of AgI, NaI, KI, RbI and CsI;

more preferably, the arsenide comprises GaAs;

more preferably, the antimonide comprises GdTe;

preferably, the material of the dielectric layer comprises SrTiO₃、Ba₃Ta₄O₁₅、Bi₄Ti₃O₂、CaCO₃、CaWO₄、CaMnO₄、LiNbO₄Any one or more of Prussian blue, Prussian black, Prussian white and Prussian green;

preferably, the material of the dielectric layer comprises a liquid crystal material or an MOF material;

preferably, the organic material comprises an organic small molecule compound and/or a polymer;

more preferably, the organic material comprises any one or more of viologen, polypyrrole, polyaniline, polythiophene, polycarbazole, phthalocyanine, dimethyl terephthalate, dimethyl diphenyl amine, tetrathiafulvene, alkyl bipyridine, phenothiazine, polyamide, epoxy resin and polydiacetylene;

and/or the thickness of the dielectric layer is more than 0 and less than or equal to 2000nm, preferably 100-500 nm;

more preferably, the material of the dielectric layer is selected from an inorganic electrochromic material and/or an organic electrochromic material.

12. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein:

an optimized dielectric layer is distributed between the dielectric layer and the first optical structure layer or the second optical structure layer;

or, an optimized dielectric layer is arranged on the first optical structure layer or the second optical structure layer;

preferably, the material of the optimized dielectric layer comprises WO₃、NiO、TiO₂、Nb₂O₅、Fe₂O₃、V₂O₅、Co₂O₃、Y₂O₃、Cr₂O₃、MoO₃、Al₂O₃、SiO₂、MgO、ZnO、MnO₂、CaO、ZrO₂、Ta₂O₅、Y₃Al₅O₁₂、Er₂O₃、ZnS、MgF₂Silicon nitride;

preferably, the thickness of the optimized dielectric layer is 0-2000 nm.

13. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the first optical structure layer or the second optical structure layer is also combined with the substrate; preferably, the substrate is transparent or translucent; more preferably, the substrate comprises a material including any one or a combination of more of glass, organic glass, PET, PES, PEN, PC, PMMA and PDMS; more preferably, a conductive layer is further disposed on the substrate; preferably, the conductive layer comprises any one or a combination of more of FTO, ITO, Ag nanowires, Ag nano grids, carbon nanotubes, and graphene.

14. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the multi-color electrochromic structure further comprises an ion conducting layer, an ion storage layer and a transparent conducting layer.

15. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: the counter electrode comprises a transparent conductive electrode or a semitransparent conductive electrode; preferably, an ion storage layer is further arranged between the transparent conductive electrode and the dielectric layer; and/or, the electrolyte comprises a liquid electrolyte, a gel electrolyte, or a solid state electrolyte; preferably, the electrolyte adopts a solid electrolyte; more preferably, the multicolour electrochromic structure is an all solid state structure.

16. A multicolored electrochromic based fingerprint identification zone indicating device as in claim 1, wherein: the fingerprint identification assembly comprises a sensor and a fingerprint identification unit, the sensor and the fingerprint identification unit are arranged side by side, and the sensor detects the approaching and departing state of the fingerprint identification unit; the fingerprint identification unit is used for determining that a user finger approaches when the sensor detects an approaching state; when the sensor detects a distant state, it is determined that no user's finger is approaching.

17. The colorful electrochromic structure-based fingerprint identification area indicating device according to claim 1, further comprising a control circuit, wherein the control circuit is electrically connected to the processor, the fingerprint identification component and the colorful electrochromic structure, respectively, and the fingerprint identification component is fixed on the control circuit; the processor is at least used for controlling the control circuit to provide preset voltage for the colorful electrochromic structure; the control circuit can at least drive the colorful electrochromic structure to display the color corresponding to the preset voltage so as to enable the colorful electrochromic structure to change the color.

18. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 1, wherein: an attachment layer is arranged on one side, close to the fingerprint identification component, of the cover plate; the adhesion layer is provided with a through hole, and the colorful electrochromic structure is positioned in the through hole; the fingerprint identification component is arranged below the colorful electrochromic structure.

19. A multicolored electrochromic structure-based fingerprint identification zone indicating device as in claim 18, wherein: the initial color of the multicolor electrochromic structure is the same as the color of the adhesion layer.

20. A multicolored electrochromic based fingerprint identification zone indicating device as in claim 1, wherein: the cover plate is a transparent glass cover plate.

21. An electronic device characterized by comprising the multicolored electrochromic structure-based fingerprint identification area indicating device of any one of claims 1-20.

22. The electronic device of claim 21, further comprising a camera component at least for detecting whether a face image is captured; and when the camera shooting assembly captures the face image, the fingerprint identification assembly determines that a user finger is close to the camera shooting assembly, and when the camera shooting assembly does not capture the face image, the fingerprint identification assembly determines that no user finger is close to the camera shooting assembly.

23. The electronic device of claim 21, further comprising a middle frame, wherein the cover plate is fixedly connected with the middle frame to form an accommodating space, and the control circuit is fixed in the accommodating space.

24. The electronic device of claim 21, wherein: the electronic equipment comprises a mobile phone, a tablet computer, a palm computer or VR glasses.

25. A method for indicating a fingerprint identification area based on a colorful electrochromic structure, which is applied to the fingerprint identification area indicating device based on a colorful electrochromic structure as claimed in any one of claims 1 to 20, and is characterized by comprising the following steps:

when the fingerprint identification component is in an inactive state, the color of the colorful electrochromic structure is consistent with that of the cover plate.