CN112833661A - Vertical high-temperature oxidation annealing furnace - Google Patents
Vertical high-temperature oxidation annealing furnace Download PDFInfo
- Publication number
- CN112833661A CN112833661A CN202110191565.2A CN202110191565A CN112833661A CN 112833661 A CN112833661 A CN 112833661A CN 202110191565 A CN202110191565 A CN 202110191565A CN 112833661 A CN112833661 A CN 112833661A
- Authority
- CN
- China
- Prior art keywords
- furnace
- tube
- vacuum
- chamber
- door
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/08—Shaft or like vertical or substantially vertical furnaces heated otherwise than by solid fuel mixed with charge
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/005—Shaft or like vertical or substantially vertical furnaces wherein no smelting of the charge occurs, e.g. calcining or sintering furnaces
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
- F27B1/12—Shells or casings; Supports therefor
- F27B1/14—Arrangements of linings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
- F27B1/28—Arrangements of monitoring devices, of indicators, of alarm devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/18—Door frames; Doors, lids, removable covers
- F27D1/1858—Doors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/08—Heating by electric discharge, e.g. arc discharge
- F27D11/10—Disposition of electrodes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
- F27D2007/063—Special atmospheres, e.g. high pressure atmospheres
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
- F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
- F27D2007/066—Vacuum
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110191565.2A CN112833661A (en) | 2021-02-19 | 2021-02-19 | Vertical high-temperature oxidation annealing furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110191565.2A CN112833661A (en) | 2021-02-19 | 2021-02-19 | Vertical high-temperature oxidation annealing furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112833661A true CN112833661A (en) | 2021-05-25 |
Family
ID=75933849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110191565.2A Pending CN112833661A (en) | 2021-02-19 | 2021-02-19 | Vertical high-temperature oxidation annealing furnace |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112833661A (en) |
-
2021
- 2021-02-19 CN CN202110191565.2A patent/CN112833661A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5620090B2 (en) | Substrate processing apparatus, heat-treated substrate manufacturing method, and semiconductor device manufacturing method | |
RU2326319C2 (en) | Induction furnace for operation at high temperatures | |
CN104040691A (en) | Substrate heat treatment apparatus | |
WO2020015523A1 (en) | Process chamber and heat treatment furnace | |
CN215724980U (en) | Vertical high-temperature oxidation annealing furnace | |
CN205404369U (en) | Gas protection case and high temperature, anaerobic fused salt corrosion test device | |
CN108588684B (en) | PECVD (plasma enhanced chemical vapor deposition) reaction furnace with newly added heat source in furnace and control method thereof | |
JP5877920B1 (en) | Rapid heating / cooling heat treatment furnace | |
CN112833661A (en) | Vertical high-temperature oxidation annealing furnace | |
US9147742B2 (en) | Heat treatment apparatus and semiconductor device manufacturing method | |
KR101511512B1 (en) | Susceptor manufacturing apparatus with cooling fan | |
CN1175471C (en) | Mfg. method of lining processor and semiconductor device | |
CN112857045A (en) | Vertical high temperature furnace vacuum seal reflecting screen furnace structure | |
CN112410732B (en) | In-situ pretreatment method for molecular beam epitaxy source material | |
CN213977814U (en) | Vacuum heat treatment furnace for hydrogen storage material | |
JP2006147782A (en) | Microwave heating ceramic heater for semiconductor substrates | |
CN215864645U (en) | Vertical high temperature furnace vacuum seal reflecting screen furnace structure | |
CN109341343A (en) | A kind of high-temperature heating furnace body suitable for manufacturing silicon carbide semiconductor | |
CN219363874U (en) | Vertical silicon carbide high-temperature annealing furnace device | |
CN113983808A (en) | Vacuum sealing hearth structure of high-temperature furnace | |
CN211814712U (en) | Semiconductor production single crystal furnace | |
CN215113926U (en) | Tubular heat treatment furnace | |
CN205537094U (en) | Fill water cooling formula hydrogen sintering stove | |
CN219457538U (en) | Bushing structure and thin film deposition equipment | |
CN220597694U (en) | Atmosphere furnace body |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20211207 Address after: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Applicant after: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. Address before: 826 Huadong Road, high tech Zone, Qingdao, Shandong Applicant before: QINGDAO SUNRED ELECTRONIC EQUIPMENT Co.,Ltd. |
|
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Applicant after: Sairuida Intelligent Electronic Equipment (Wuxi) Co.,Ltd. Address before: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Applicant before: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. |