CN112820680A - Furnace feeding device with paddles and production process thereof - Google Patents
Furnace feeding device with paddles and production process thereof Download PDFInfo
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- CN112820680A CN112820680A CN202011625067.6A CN202011625067A CN112820680A CN 112820680 A CN112820680 A CN 112820680A CN 202011625067 A CN202011625067 A CN 202011625067A CN 112820680 A CN112820680 A CN 112820680A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000010453 quartz Substances 0.000 claims abstract description 75
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 75
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 47
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 47
- 239000010703 silicon Substances 0.000 claims abstract description 47
- 230000007246 mechanism Effects 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 235000012431 wafers Nutrition 0.000 claims description 43
- 238000007789 sealing Methods 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 230000007723 transport mechanism Effects 0.000 claims description 2
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims 2
- 235000017491 Bambusa tulda Nutrition 0.000 claims 2
- 241001330002 Bambuseae Species 0.000 claims 2
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims 2
- 239000011425 bamboo Substances 0.000 claims 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention discloses a furnace feeding device with paddles and a production process thereof, comprising a conveying mechanism, paddles, a heating furnace, a supporting component, a furnace door and a quartz tube, wherein the furnace door and the paddles move synchronously, the paddles are used for supporting and bearing the supporting component, the silicon wafer is loaded on the supporting component, the conveying mechanism controls the supporting component to input or output the quartz tube by driving the paddle to move back and forth, the paddle only needs to enter or exit the furnace once in the whole process of the invention, the process time is saved, the invention takes the paddle and the product as a whole, after the paddle takes the product into the furnace, the product does not need to be put down, so the space for the paddle to move up and down is not needed to be arranged, the upper and lower spaces of the heating furnace are saved, the invention takes the paddle and the product as a whole, after the paddle brings the product into the furnace, the product does not need to be put down, so that an up-and-down movement mechanism does not need to be added, the whole device is greatly simplified, a large number of electric control and mechanism movement devices are saved, and the cost is reduced.
Description
Technical Field
The invention belongs to the field of photovoltaics or semiconductors, and relates to a furnace feeding device with paddles and a production process thereof.
Background
In the chemical vapor deposition, phosphorus diffusion, boron diffusion and oxidation process of the photovoltaic semiconductor industry, products are fed into a furnace, after the processing is finished, the products need to be taken out, the silicon wafer is high-precision light and thin due to the fact that the thickness of the silicon wafer is only about 0.16mm, the silicon wafer is fed into and taken out of the furnace very slowly, the speed of a general conveying mechanism is set to be 5-10mm/s, the conventional stroke is 3-4 meters, and the single stroke needs 5-10 minutes.
In the prior art, the product is firstly fed into the furnace by the paddle, the paddle is withdrawn after the product is placed, after the product is processed in the furnace, the furnace door is opened, the paddle extends into the furnace to take out the product, at least two inlets and two outlets are required for the paddle, the time consumption is long, the productivity of the equipment is reduced, and the invention effectively solves the problem.
Disclosure of Invention
The invention provides a furnace feeding device with paddles and a production process thereof in order to overcome the defects of the prior art.
In order to achieve the purpose, the invention adopts the following technical scheme: the utility model provides a take oar to advance stove device which characterized in that: the silicon wafer loading device comprises a conveying mechanism, a paddle, a heating furnace, a supporting component, a furnace door and a quartz tube, wherein the furnace door and the paddle move synchronously, the paddle is used for supporting and bearing the supporting component, the supporting component loads a silicon wafer, and the conveying mechanism controls the supporting component to input or output the quartz tube by driving the paddle to move back and forth.
Further, the method comprises the following steps of; the conveying mechanism comprises a sliding plate, a fixing plate and a sliding rail, the sliding plate is fixedly provided with a sliding block which is connected with the sliding rail in a matched mode, the fixing plate is fixedly connected with the sliding plate, and the fixing plate is connected with a fixing assembly for fixing the furnace door.
Further, the method comprises the following steps of; the fixed assembly comprises connecting rods symmetrically and fixedly arranged on the fixed plate, a paddle seat is fixedly arranged between the two groups of connecting rods, two groups of fixing rods arranged in parallel are fixedly arranged on the lower end face of the paddle seat, and the length direction of each fixing rod is consistent with the sliding direction of the conveying mechanism.
Further, the method comprises the following steps of; the oar comprises fixed part and supporting part, and the solid pole sets firmly with the fixed part and is connected, and the fixed part supports the whole of oar and the bearing on the oar, and the length direction of oar is unanimous with transport mechanism's slip direction.
Further, the method comprises the following steps of; the supporting part is used for supporting the supporting part assembly, the supporting part assembly is composed of a quartz boat support and a quartz boat, the quartz boat support bears multiple groups of quartz boats, the end plates on two sides of the quartz boat support are fixedly provided with support cavities, the supporting part extends into the support cavities, the upper end face of the supporting part is abutted to the upper end face of the support cavities, and the supporting part assembly is limited to move in the width direction of the paddle.
Further, the method comprises the following steps of; the thickness of fixed part is greater than the thickness of supporting part, both smooth connection, and the interval of two sets of supporting part opposite flank is greater than the interval of two sets of fixed part opposite flank, holds in the palm a subassembly one end and is located both hookup locations, and the other end of supporting part is provided with the mounting plate, through the poor and mounting plate restriction of width support a subassembly in oar length direction's removal.
Further, the method comprises the following steps of; the conveying mechanism is fixedly connected with the furnace door, the quartz tube is fixedly arranged in the hot furnace, and the sliding direction of the conveying mechanism is consistent with the axial direction of the quartz tube.
A production process of a furnace with a paddle, and further; the production process takes the paddle and the supporting piece assembly as a whole, the conveying mechanism drives the paddle to move the unprocessed silicon slices on the supporting piece assembly into the quartz tube for processing, and the processed silicon slices are removed from the quartz tube.
Further, the method comprises the following steps of; the method comprises the following steps:
(1) taking materials, and placing a silicon wafer on a support component;
(2) placing, namely placing a supporting component for loading the silicon wafer on a paddle;
(3) feeding the silicon wafer into a furnace, and conveying the silicon wafer loaded by the paddle and the support assembly as a whole and the support assembly into a quartz tube by a conveying mechanism;
(4) during operation, the paddle and the supporting component for loading the silicon wafer are positioned in the quartz tube, the quartz tube is closed by the furnace door, a sealed space is formed in the quartz tube, and the silicon wafer is processed according to production requirements;
(5) discharging, after the silicon wafer is processed, restoring the inner part of the quartz tube to normal pressure, opening the furnace door, and moving the paddle and the supporting piece assembly for loading the silicon wafer out of the quartz tube by the conveying mechanism;
(6) and (4) blanking, namely moving the supporting piece assembly loaded with the silicon wafer on the paddle to the next procedure.
In conclusion, the invention has the advantages that:
1) in the whole process, the paddle only needs to enter and exit the furnace once, so that the process time is saved.
2) The invention takes the paddle and the product as a whole, and the paddle does not need to put down the product after the product is taken into the furnace, so that the space for the paddle to move up and down is not needed to be arranged, and the upper and lower spaces of the heating furnace are saved.
3) The invention integrates the paddle and the product, and the paddle does not need to put down the product after the product is taken into the furnace, so that an up-and-down movement mechanism is not needed to be added, the whole device is greatly simplified, a large number of electric control and mechanism movement devices are saved, and the cost is reduced.
Drawings
FIG. 1 is a schematic view of the apparatus of the present invention.
FIG. 2 is a schematic view of the tray assembly of the present invention moved to a paddle.
FIG. 3 is a first view of the paddle and carrier assembly of the present invention moving toward the quartz tube.
FIG. 4 is a sectional view of the inside of a quartz tube according to the present invention.
FIG. 5 is a schematic view of the paddle and holder assembly of the present invention removed from a quartz tube.
FIG. 6 is a second view of the paddle and holder assembly of the present invention removed from the quartz tube.
FIG. 7 is a schematic view of the removal paddle of the tray assembly of the present invention.
The labels in the figure are: the device comprises a conveying mechanism 1, a sliding plate 11, a fixing plate 13, a sliding rail 14, a connecting rod 15, a paddle seat 16, a paddle barrel 17, a paddle 2, a fixing part 21, a supporting part 22, a fastening plate 23, a heating furnace 3, a supporting piece assembly 4, a quartz boat support 41, a supporting cavity 411, a quartz boat 42, a furnace door 5 and a quartz tube 6.
Detailed Description
The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic idea of the present invention, and the components related to the present invention are only shown in the drawings rather than drawn according to the number, shape and size of the components in actual implementation, and the type, quantity and proportion of the components in actual implementation may be changed freely, and the layout of the components may be more complicated.
All directional indicators (such as up, down, left, right, front, rear, lateral, longitudinal … …) in the embodiments of the present invention are only used to explain the relative positional relationship between the components, the movement, etc. in a particular posture, and if the particular posture is changed, the directional indicator is changed accordingly.
The first embodiment is as follows:
as shown in fig. 1-7, a device with paddles for feeding into a furnace comprises a conveying mechanism 1, paddles 2, a hot furnace 3, a supporting component 4, a furnace door 5 and a quartz tube 6, wherein the paddles 2 are connected with the furnace door 5 and move synchronously with the furnace door 5, the paddles 2 are used for supporting and bearing the supporting component 4, the supporting component 4 is used for loading silicon wafers, and the conveying mechanism 1 controls the supporting component 4 to input or output the quartz tube 6 by driving the paddles 2 to move back and forth.
The conveying mechanism 1 is fixedly connected with the furnace door 5, the quartz tube 6 is fixedly arranged in the heating furnace 3, and the sliding direction of the conveying mechanism 1 is consistent with the axial direction of the quartz tube 6.
The conveying mechanism 1 comprises a sliding plate 11, a fixing plate 13 and a sliding rail 14, the sliding plate 11 is fixedly provided with a sliding block 12 which is matched and connected with the sliding rail 14, the fixing plate 13 is fixedly connected with the sliding plate 11, the fixing plate 13 is connected with a fixing component which is used for fixing the furnace door 5, the fixing component comprises connecting rods 15 which are symmetrically and fixedly arranged on the fixing plate 13, a paddle seat 16 is fixedly arranged between the two groups of connecting rods 15, the lower end face of the paddle seat 16 is fixedly provided with two groups of parallel paddles 17, the length direction of the paddles 17 is consistent with the sliding direction of the conveying mechanism 1, the furnace door 5 is fixedly provided with two groups of through holes (not marked in the figure) which are opposite to the two groups of paddles 17, each paddle 2 comprises a fixing part 21 and a supporting part 22, the fixing parts 21 of the paddles 17 and the paddles 2 are positioned at two sides of the through holes on the furnace door 5, the fixing parts 21 penetrate, the sealing device is used for sealing the paddle cylinder 17 and the furnace door 5, so that the sealing performance in the cavity of the quartz tube 6 is guaranteed after the quartz tube 6 is closed by the furnace door 5, the whole body of the paddle 2 and the bearing on the paddle 2 are supported by the fixing part 21, and the length direction of the paddle 2 is consistent with the sliding direction of the conveying mechanism 1.
The supporting part 22 is used for supporting the supporting part assembly 4, the supporting part assembly 4 is composed of a quartz boat support 41 and quartz boats 42, the quartz boat support 41 bears a plurality of groups of quartz boats 42, supporting cavities 411 are fixedly arranged on end plates on two sides of the quartz boat support 41, the depth of the supporting cavities 411 is matched with the thickness of the supporting part 22, in the implementation process, as shown in fig. 2, the supporting part assembly 4 is placed between two groups of supporting parts 22, the supporting part 22 extends into the supporting cavity 411, the upper end face of the supporting part 22 is abutted against the upper side face of the supporting cavity 411, the movement of the supporting part assembly 4 in the width direction of the paddle 2 is effectively limited, in addition, the thickness of the fixing part 21 of the paddle 2 is larger than that of the supporting part 22, the two groups of supporting parts are smoothly connected, the distance between the opposite side faces of the two groups of supporting parts 22 is larger than that between the opposite side faces of the two groups of fixing parts 21, one, the other end of the support portion 22 is provided with a fastening plate 23, which effectively prevents the holder assembly 4 from moving outward, i.e., the above structure restricts the movement of the holder assembly 4 in the length direction of the paddle 2, so that the holder assembly 4 is stably placed on the paddle 2.
The invention also provides a production process with the paddle for entering the furnace, the production process takes the paddle 2 and the component assembly 4 as a whole, the conveying mechanism 1 drives the paddle 2 to move the unprocessed silicon wafer on the support assembly 4 into the quartz tube 6 for processing, and the processed silicon wafer is moved out from the quartz tube 6, so that the paddle 2 and the silicon wafer only need to enter and exit the furnace once, the process time is saved, and the production efficiency is improved.
According to the invention, the specific production process is as follows:
(1) taking materials;
the silicon wafer is placed on the support component 4, in the embodiment, the silicon wafer is loaded in the quartz boat 42, and the quartz boats 42 loaded with the silicon wafer are placed on the quartz boat support 41;
(2) placing;
the silicon wafer-loaded holder assembly 4 is placed on the paddle 2, in this embodiment, the quartz boat holder 41 filled with the quartz boat 42 is moved to the paddle 2 in the direction of the arrow shown in fig. 1, and the schematic diagram of the quartz boat holder 41 and the paddle 2 after placement is shown in fig. 2;
(3) feeding into a furnace;
the paddle 2 and the silicon wafer carrying supporting component 4 are taken as a whole, the conveying mechanism 1 drives the paddle 2 according to the arrow directions shown in the figures 3 and 4, the furnace door 5 and the paddle 2 move synchronously, and the conveying mechanism 1 conveys the paddle 2 and the silicon wafer carrying supporting component 4 on the paddle 2 into the quartz tube 6;
(4) working;
the paddle 2 and the supporting component 4 for loading the silicon wafer are positioned in the quartz tube 6, the furnace door 5 abuts against the quartz tube 6, the quartz tube 6 is closed, a sealed space is formed inside the quartz tube 6, and then the silicon wafer is processed according to production requirements.
(5) Discharging;
after the silicon wafer processing work is finished, the interior of the quartz tube 6 is restored to normal pressure, at the moment, the furnace door 5 is opened, and the conveying mechanism 1 drives the paddle 2 and the silicon wafer-loading supporting component 4 positioned on the paddle 2 to move out of the quartz tube 6 according to the arrow directions shown in fig. 5 and 6;
(6) blanking;
the silicon wafer-loaded carrier assembly 4 on the paddle 2 is removed to the next process in the direction of the arrow shown in fig. 7.
In the process, the paddle 2 and the silicon wafer enter the quartz tube 6 as a whole to be produced, the paddle 2 and the quartz boat support 41 are not required to be separated in the quartz tube 6, the quartz boat support 41 is independently placed in the quartz tube 6, the quartz boat support 4 is put down by an additional up-and-down movement mechanism, the in-out times and the in-out time of the paddle 2 are increased, and therefore, through the production process, the integral device is simplified, a large number of electric control and mechanism movement devices are saved, meanwhile, in the whole process, the processing of the silicon wafer can be realized only once when the paddle 2 enters and exits the furnace, the process time is saved, and the working efficiency is improved.
In other embodiments, there may be no structure of the paddle barrel 17, the fixing portion 21 of the paddle 2 penetrates through the through hole of the oven door 5 and is directly and fixedly connected with the paddle seat 16, a sealing member is disposed between the fixing portion 21 and the oven door 5, and the fixing portion 21 and the oven door 5 are hermetically connected through the sealing member.
It is to be understood that the described embodiments are merely a few embodiments of the invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Claims (10)
1. The utility model provides a take oar to advance stove device which characterized in that: the silicon wafer loading device comprises a conveying mechanism, a paddle, a heating furnace, a supporting component, a furnace door and a quartz tube, wherein the furnace door and the paddle move synchronously, the paddle is used for supporting and bearing the supporting component, the supporting component loads a silicon wafer, and the conveying mechanism controls the supporting component to input or output the quartz tube by driving the paddle to move back and forth.
2. The device with the paddles as recited in claim 1, further comprising: the conveying mechanism comprises a sliding plate, a fixing plate and a sliding rail, the sliding plate is fixedly provided with a sliding block which is connected with the sliding rail in a matched mode, the fixing plate is fixedly connected with the sliding plate, and the fixing plate is connected with a fixing assembly for fixing the furnace door.
3. The device with the paddles as recited in claim 2, further comprising: the fixed component comprises connecting rods symmetrically and fixedly arranged on the fixed plate, a paddle seat is fixedly arranged between the two groups of connecting rods, two groups of parallel paddles are fixedly arranged on the lower end face of the paddle seat, and the length direction of the paddles is consistent with the sliding direction of the conveying mechanism.
4. The device with the paddles as recited in claim 1, further comprising: the oar comprises fixed part and supporting part, and the fixed part runs through the furnace gate and inserts the oar section of thick bamboo, and the oar section of thick bamboo and furnace gate sealing connection, the fixed part supports the whole of oar and the bearing on the oar, and the length direction of oar is unanimous with transport mechanism's slip direction.
5. The device with the paddles as recited in claim 4, wherein: the supporting part is used for supporting the supporting part assembly, the supporting part assembly is composed of a quartz boat support and a quartz boat, the quartz boat support bears multiple groups of quartz boats, the end plates on two sides of the quartz boat support are fixedly provided with support cavities, the supporting part extends into the support cavities, the upper end face of the supporting part is abutted to the upper end face of the support cavities, and the supporting part assembly is limited to move in the width direction of the paddle.
6. The device with the paddles as recited in claim 4, wherein: the thickness of fixed part is greater than the thickness of supporting part, both smooth connection, and the interval of two sets of supporting part opposite flank is greater than the interval of two sets of fixed part opposite flank, holds in the palm a subassembly one end and is located both hookup locations, and the other end of supporting part is provided with the mounting plate, through the poor and mounting plate restriction of width support a subassembly in oar length direction's removal.
7. The device with the paddles as recited in claim 1, further comprising: the conveying mechanism is fixedly connected with the furnace door, the quartz tube is fixedly arranged in the hot furnace, and the sliding direction of the conveying mechanism is consistent with the axial direction of the quartz tube.
8. The device with the paddles as recited in claim 4, wherein: the fixed part of oar runs through the furnace gate and sets firmly with the oar seat and be connected, fixed part and furnace gate sealing connection.
9. The production process of the furnace with the paddles is characterized in that: the production process takes the paddle and the supporting member assembly as a whole, the conveying mechanism drives the paddle to move the unprocessed silicon wafers on the supporting member assembly into the quartz tube for processing, and the processed silicon wafers are removed from the quartz tube.
10. A process according to claim 9 for the production of a paddle-fed furnace comprising the steps of:
(1) taking materials, and placing a silicon wafer on a support component;
(2) placing, namely placing a supporting component for loading the silicon wafer on a paddle;
(3) feeding the silicon wafer into a furnace, and conveying the silicon wafer loaded by the paddle and the support assembly as a whole and the support assembly into a quartz tube by a conveying mechanism;
(4) during operation, the paddle and the supporting component for loading the silicon wafer are positioned in the quartz tube, the quartz tube is closed by the furnace door, a sealed space is formed in the quartz tube, and the silicon wafer is processed according to production requirements;
(5) discharging, after the silicon wafer is processed, restoring the inner part of the quartz tube to normal pressure, opening the furnace door, and moving the paddle and the supporting piece assembly for loading the silicon wafer out of the quartz tube by the conveying mechanism;
(6) and (4) blanking, namely moving the supporting piece assembly loaded with the silicon wafer on the paddle to the next procedure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011625067.6A CN112820680A (en) | 2020-12-31 | 2020-12-31 | Furnace feeding device with paddles and production process thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011625067.6A CN112820680A (en) | 2020-12-31 | 2020-12-31 | Furnace feeding device with paddles and production process thereof |
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| CN112820680A true CN112820680A (en) | 2021-05-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011625067.6A Pending CN112820680A (en) | 2020-12-31 | 2020-12-31 | Furnace feeding device with paddles and production process thereof |
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| CN201408770Y (en) * | 2009-05-07 | 2010-02-17 | 锦州华昌光伏科技有限公司 | Quartz bearing heating device of solar battery diffusion furnace |
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| US20180138063A1 (en) * | 2016-08-25 | 2018-05-17 | S.C New Energy Technology Corporation | Quartz boat transmission mechanism used in diffusion furnace |
| CN211320070U (en) * | 2020-01-03 | 2020-08-21 | 北京北方华创微电子装备有限公司 | Cantilever push-pull boat system for semiconductor processing equipment and semiconductor processing equipment |
| CN112071791A (en) * | 2020-08-31 | 2020-12-11 | 赛姆柯(苏州)智能科技有限公司 | Quartz boat conveying and mounting device and using method |
-
2020
- 2020-12-31 CN CN202011625067.6A patent/CN112820680A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201408770Y (en) * | 2009-05-07 | 2010-02-17 | 锦州华昌光伏科技有限公司 | Quartz bearing heating device of solar battery diffusion furnace |
| US20180138063A1 (en) * | 2016-08-25 | 2018-05-17 | S.C New Energy Technology Corporation | Quartz boat transmission mechanism used in diffusion furnace |
| CN107881488A (en) * | 2017-12-15 | 2018-04-06 | 深圳市捷佳伟创新能源装备股份有限公司 | Carry the delivery device of hermatic door and reacting furnace and encapsulating method with the mechanism |
| CN211320070U (en) * | 2020-01-03 | 2020-08-21 | 北京北方华创微电子装备有限公司 | Cantilever push-pull boat system for semiconductor processing equipment and semiconductor processing equipment |
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Application publication date: 20210518 |