CN112746240A - 电致变色玻璃制备方法 - Google Patents
电致变色玻璃制备方法 Download PDFInfo
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- CN112746240A CN112746240A CN201911043699.9A CN201911043699A CN112746240A CN 112746240 A CN112746240 A CN 112746240A CN 201911043699 A CN201911043699 A CN 201911043699A CN 112746240 A CN112746240 A CN 112746240A
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- 229910052758 niobium Inorganic materials 0.000 claims description 13
- 229910052715 tantalum Inorganic materials 0.000 claims description 13
- 229910052719 titanium Inorganic materials 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910052741 iridium Inorganic materials 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 7
- 229910052748 manganese Inorganic materials 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 229910052720 vanadium Inorganic materials 0.000 claims description 7
- 150000004767 nitrides Chemical class 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 238000004040 coloring Methods 0.000 claims 1
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- 238000002834 transmittance Methods 0.000 description 4
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
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Abstract
本发明实施例公开的一种电致变色玻璃制备方法,包括:提供基材玻璃层;在所述基材玻璃层上镀制第一透明导电层;在所述第一透明导电层上镀制第一变色层;在所述第一变色层上镀制第一离子导体层;在所述第一离子导体层上镀制第一辅助变色功能层;在所述第一辅助变色功能层上镀制第二透明导电层;以及在所述第二透明导电层上镀制外层保护层。该电致变色玻璃制备方法制备的电致变色玻璃可提升其在大面积产品器件的变色均匀性。
Description
技术领域
本发明涉及一种玻璃制备技术领域,尤其是一种电致变色玻璃制备方法。
背景技术
建筑节能玻璃在低碳、节能的产业发展之路上将扮演越来越重要的角色。目前,我国建筑节能玻璃主要是低辐射率玻璃,使通过窗玻璃的太阳光被极大地减少,极大地改善了窗玻璃绝热性能。但其上墙使用后光学和热学性能不能随环境变化而随时调节,难以适应我国冬冷夏热地区的需求。因此,具有光学可变特性的“节能参数可调的节能玻璃”是市场期待的新型建筑节能玻璃产品。其中能顺应环境温度变化实现光热自动调节的智能节能玻璃,更是当前研发的热点。上述节能要求,在汽车玻璃、航空玻璃上也同样适用,同时“节能参数可调的节能玻璃”还可带来的舒适外观。
目前电致变色玻璃产业化过程中,电致变色产品在大面积产品器件的变色均匀性及变色周期循环寿命上还存在很多缺陷,无机变色材料主要以WO3材料。WO3材料是一种众所周知的高效的阴极变色材料,通过化学的氧化与还原反应,控制WO3中W的价态变化,可以实现对光谱的吸收调控作用。但由于其存在大面积变色不均匀,周期循环寿命短等问题,大大影响了其在工程中的应用。
发明内容
针对上述问题,本发明实施例提供了一种电致变色玻璃制备方法,以提升电致变色玻璃在大面积产品器件的变色均匀性。
一方面,本发明实施例提供的一种电致变色玻璃制备方法,包括:提供基材玻璃层,并将所述基材玻璃层升温至280-300℃;以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一透明导电层至所述基材玻璃层上;以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一变色层至所述第一透明导电层上;以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E- 3mbar条件下沉积第一离子导体层至所述第一变色层上;以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一辅助变色层至所述第一离子导体层上;以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第二透明导电层至所述第一辅助变色层上;以及以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积外层保护层至所述第二透明导电层上。
另一方面,本发明实施例提供的一种电致变色玻璃制备方法,包括:提供基材玻璃层;在所述基材玻璃层上镀制第一透明导电层;在所述第一透明导电层上镀制第一变色层;在所述第一变色层上镀制第一离子导体层;在所述第一离子导体层上镀制第一辅助变色功能层;在所述第一辅助变色功能层上镀制第二透明导电层;以及在所述第二透明导电层上镀制外层保护层。
在本发明的一个实施例中,所述在所述基材玻璃层上镀制第一透明导电层包括:将所述基材玻璃层升温至预设温度;以及以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在第一预设真空溅射气压下沉积所述第一透明导电层至所述基材玻璃层上。
在本发明的一个实施例中,所述预设温度的范围为280-300℃;所述第一预设真空溅射气压为1.0E-3~9.0E-3mbar。
在本发明的一个实施例中,所述在所述第一透明导电层上镀制第一变色层具体为:以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料,在第二预设真空溅射气压下沉积所述第一变色层至所述第一透明导电层上。
在本发明的一个实施例中,所述在所述第一变色层上镀制第一离子导体层具体为:以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,在第三预设真空溅射气压条件下沉积所述第一离子导体层至所述第一变色层上。
在本发明的一个实施例中,所述在所述第一离子导体层上镀制第一辅助变色功能层具体为:以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,在第四预设真空溅射气压条件下沉积所述第一辅助变色层至所述第一离子导体层上。
在本发明的一个实施例中,所述在所述第一辅助变色功能层上镀制第二透明导电层具体为:以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在第五预设真空溅射气压下沉积所述第二透明导电层至所述第一辅助变色层上。
在本发明的一个实施例中,所述在所述第二透明导电层上镀制外层保护层具体为:以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,在第六预设真空溅射气压下沉积所述外层保护层至所述第二透明导电层上。
上述技术方案可以具有如下优点:本发明实施例提供的电致变色玻璃制备方法采用特定的制备工艺,使得制备的电致变色玻璃可根据环境变化,可主动调节节能参数性能的节能玻璃,提升电致变色产品在大面积产品器件的变色均匀性,其可用于替代建筑玻璃、汽车玻璃、航空玻璃、装饰玻璃等。
附图说明
为了更清楚地说明本发明实施例的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的一种电致变色玻璃的结构示意图。
图2为本发明实施例提供的一种电致变色玻璃制备方法的流程示意图。
图3a为本发明试验样品5在不同变色档位的可见光透过率光谱图。
图3b为本发明试验样品5在不同变色档位的性能变化示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明护的范围。
如图1所示,本发明一实施例提供了一种全无机真空镀膜的低压电致变色玻璃900。电致变色玻璃900例如包括基材玻璃层10和依次位于基材玻璃层10上的第一透明导电层11、第一变色层12、第一离子导体层13、第一辅助变色功能层14、第二透明导电层20、外层保护层30。
基材玻璃层10可为浮法玻璃、超白玻璃、高铝玻璃、中铝玻璃、各种颜色玻璃(如灰玻、绿玻、湖水蓝玻璃等)、PET(Polyethylene terephthalate,聚对苯二甲酸乙二醇酯)膜材等。基材玻璃层10的厚度可例如为0.02-25mm。
第一透明导电层11的材料为无机变色材料。无机变色材料选自于FTO(氟硅氧化物)、ITO(铟锡氧化物)、IGZO(铟镓锌氧化物)、AZO(铝锌氧化物)、GZO(镓锌氧化物)、Ag中的一种或至少两种的组合。此处的至少两种的组合可例如为两者组合比如AZO和GZO,或其中三个组合比如FTO、ITO、GZO,甚至更多种的组合等。第一透明导电层11的厚度为1-1100nm。优选地,第一透明导电层的厚度大于10nm且小于等于300nm。优选地,第一透明导电层的厚度大于10nm且小于等于300nm。
第一变色层12为太阳能光谱调节功能层。第一变色层12的材料为无机变色材料。无机变色材料可例如选自于W、Mo、Nb、Ti、Ta中至少两种组合的氧化物,例如W、Mo、Nb、Ti、Ta中任意两者组合的氧化物比如WMoOx、WNbOx,或者三者组合的氧化物WMoTiOx、WNbTaOx,甚至更多种的组合。氧化物的化学计量比,可以是足氧也可以是不足氧的化学计量比。第一变色层12的厚度大于30nm且小于等于500nm。
第一离子导体层13的材料选自于:H、Li、Na、K、Mg中的一种或者至少两种的组合。H、Li、Na、K、Mg中元素的组合例如包括其中的两者组合比如Li、Na,三者组合比如Na、K、Mg,甚至更多的组合等。第一离子导体层13的厚度大于10nm且小于等于100nm。
第一辅助变色功能层14的材料选自于Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物。具体地,第一辅助变色功能层14的材料例如可以为Ni、V、Co、Ir、Fe、Mn中两种的组合比如NiVOx、NiCoOx、NiIrOx、NiFeOx,或者三种的组合,甚至更多种的组合。氧化物的化学计量比,可以是足氧也可以是不足氧的化学计量比。第一辅助变色功能层14的厚度大于20nm且小于等于500nm。
第二透明导电层20的材料为无机变色材料。无机变色材料选自于FTO(氟硅氧化物)、ITO(铟锡氧化物)、IGZO(铟镓锌氧化物)、AZO(铝锌氧化物)、GZO(镓锌氧化物)、Ag中的一种或至少两种的任意组合。第二透明导电层20的厚度为10-1000nm。优选地,第二透明导电层20的厚度大于10nm且小于等于300nm。
外层保护层30的材料选自于Si、Ti、Zn、Sn、Nb、Ta中之一的氧化物或氮化物或氮氧化物。外层保护层的厚度为0.2-100nm。优选地,外层保护层30的材料为Si3N4。Si3N4是一种高温陶瓷材料,硬度大、熔点高、化学性质稳定,具有很强的抗腐蚀、抗机械划伤、抗高温氧化性能,作为外层保护层可以很好的起到保护作用。
此外,本发明实施例还提供了一种电致变色玻璃制备方法,例如用于制备前述的电致变色玻璃900。所述电致变色玻璃制备方法例如包括步骤:
S11:提供基材玻璃层。将基材玻璃层清洁、干燥。
S12:在基材玻璃层上镀制第一透明导电层。具体地,将基材玻璃层升温至预设温度,所述预设温度的范围例如280-300℃,以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在第一预设真空溅射气压下沉积得到第一透明导电层。第一预设真空溅射气压例如为1.0E-3~9.0E-3mbar。优选的,第一透明导电层也可以是预先制备好的导电膜层。这样可以达到膜层间更好的折射率匹配。
S13:在第一透明导电层上镀制第一变色层。以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料。氧化物的化学计量比,可以是足氧也可以是不足氧的化学计量比。将靶材材料置于第二预设真空溅射气压下沉积,得到第一变色层。第二预设真空溅射气压例如为1.0E-3~9.0E-3mbar。优选地,第一变色层也可以同时采用多个靶位镀制,如此可以获得膜层间更好的结合力。所述多个靶位采用的工艺气体可以一致也可以不一致。
S14:在第一变色层上镀制第一离子导体层。以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,并将靶材材料置于第三预设真空溅射气压条件下沉积得到第一离子导体层。第三预设真空溅射气压例如为1.0E-3~9.0E-3mbar。同样,优选地,第一离子导体层也可以同时采用多个靶位镀制,以获得膜层间更好的结合力。所述多个靶位采用的工艺气体比例可以不一致。
S15:在第一离子导体层上镀制第一辅助变色功能层。具体地,以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,将靶材材料置于第四预设真空溅射气压条件下沉积得到第一辅助变色层。第四预设真空溅射气压例如为1.0E-3~9.0E-3mbar。靶材材料中的氧化物的化学计量比,可以是足氧也可以是不足氧的化学计量比。同样,优选地,第一离子导体层也可以同时采用多个靶位镀制,以获得膜层间更好的结合力。所述多个靶位采用的工艺气体比例可以不一致。
S16:在第一辅助变色功能层上镀制第二透明导电层。以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,将靶材材料置于第五预设真空溅射气压下沉积得到第二透明导电层。第五预设真空溅射气压例如为1.0E-3~9.0E-3mbar。优选的,第二透明导电层也可以是预先制备好的导电膜层。这样可以达到膜层间更好的折射率匹配。
S17:在第二透明导电层上镀制外层保护层。以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,并将靶材材料置于第六预设真空溅射气压下沉积得到外层保护层。第六预设真空溅射气压例如为1.0E-3~9.0E-3mbar。同样,优选地,第一离子导体层也可以同时采用多个靶位镀制,以获得膜层间更好的结合力。所述多个靶位采用的工艺气体比例可以不一致。
此外,电致变色玻璃制备方法还包括热处理。具体地,进行真空热处理及退火工艺,热处理温度例如为300-600℃,热处理时间例如为5-120min。
进一步地,电致变色玻璃制备方法还包括预真空过渡并接电极。本步骤可采用现有技术中的方法完成预真空过渡并接电极,此处不再赘述。
本发明提供的调色更中性的电致变色玻璃,可应用在建筑玻璃外墙、室内装饰、汽车天窗玻璃、汽车侧窗玻璃、汽车后挡玻璃、汽车前挡玻璃、汽车观后镜、汽车后视镜、高铁车窗、飞机悬窗、阳光房、太阳镜、滑雪镜等需要调光的领域。本发明实施例提供的电致变色玻璃采用特定膜层结构,可根据环境变化主动调节节能参数,提升电致变色玻璃在大面积产品器件的变色均匀性。再者,因为电致变色玻璃生产时采用磁控反应溅射沉积法就能形成各层,因此可避免生产过程中多次进出镀膜设备,简化了生产工艺,从而还可降低生产成本,提高生产效率。
下面通过一个具体实施例详细说明电致变色玻璃的制备过程。
具体实施例
一种电致变色玻璃,其膜层结构由基材玻璃层向外依次是:基材玻璃层/ITO(150nm)/WMoOx(200nm)/Li(40nm)/NiVOx(80nm)/ITO(120nm)/Si3N4(20nm)。
制备这种电致变色玻璃的过程依次是:
(1)基材玻璃层清洗干净并吹干,激光刻线,再清洗吹干,置于真空溅射区;
(2)在基材玻璃层上采用磁控溅射的方式沉积ITO层,所用靶材为ITO旋转靶,电源为直流或中频电源,频率为2000-40000Hz,功率为1~30KW,工艺气体为氩气,在温度为290℃的温度下沉积;
(3)在ITO层上面采用磁控溅射的方式沉积WMoOx层,所用靶材为金属WMo平面靶,电源为直流电源,功率为1~30KW,工艺气体为纯氩气及氧气的混合气体,沉积后升温致550℃进入下一镀膜区域;
(4)在WMoOx层上采用磁控溅射的方式沉积Li层,所用靶材为Li旋转靶,电源为中频或直流电源,功率为1~30KW,工艺气体为氩气,在温度为550℃的温度下沉积;
(5)在Li层上面采用磁控溅射的方式沉积NiVOx层,所用靶材为金属NiV平面靶,电源为直流电源,功率为1~30KW,工艺气体为纯氩气及氧气的混合气体,在相应温度下沉积后升温致550摄氏度进入下一镀膜区域;
(6)在NiVOx层上采用磁控溅射的方式沉积ITO层,所用靶材为ITO旋转靶,电源为直流或中频电源,功率为1~30KW,工艺气体为氩气,在温度为290℃的温度下沉积;
(7)在ITO层上采用磁控溅射的方式沉积Si3N4层,所用靶材为SiAl旋转靶,电源为中频电源,功率为1~10KW,工艺气体为氩气和氮气的混合气体,在室温下沉积。
(8)退火工艺,激光划刻工艺、布电极及接线,测试、合片工艺。
另外,本发明实施例还对6种电致变色玻璃的性能试验。6种电致变色玻璃共12个试验样品的参数见表1。其中,第1种为现有技术的电致变色玻璃的2个试验样品,其它5种为本发明提供的电致变色玻璃的共10个试验样品,其第一变色层和第一辅助变色层的材料各不相同。在同等的试验条件下,各试验样品在不同的状态下的性能对比数据见表2。进一步地,本实施例还对试验样品5在不同变色档位进行了试验,得到的性能参数见表3和图3a、图3b。
表1 6种试验样品的参数表
表2 6种试验样品分别在不同的状态下的性能参数表
表3 试验样品5在不同变色档位的性能参数表
变色档位 | T | a*t | b*t | a*g | b*g | a*f | b*f |
试验样品5变色1档 | 63.18 | -5.44 | -1.37 | -0.28 | -2.86 | 9.71 | 0.45 |
试验样品5透明2档 | 46.25 | -5.87 | -2.46 | -17.33 | -8.11 | 7.00 | -3.80 |
试验样品5透明3档 | 33.24 | -5.50 | -2.11 | -14.38 | -6.48 | 3.69 | -7.33 |
试验样品5透明4档 | 23.42 | -4.76 | -1.17 | -10.27 | -3.97 | 0.71 | -9.59 |
试验样品5透明5档 | 16.20 | -3.89 | -0.16 | -7.01 | -1.54 | -1.62 | -10.82 |
试验样品5透明6档 | 11.04 | -3.04 | 0.65 | -4.60 | 0.51 | -3.32 | -11.41 |
试验样品5透明7档 | 7.44 | -2.29 | 1.22 | -2.86 | 2.08 | -4.51 | -11.65 |
试验样品5透明8档 | 4.97 | -1.66 | 1.56 | -1.67 | 3.19 | -5.30 | -11.72 |
试验样品5透明9档 | 3.31 | -1.17 | 1.73 | -0.90 | 3.91 | -5.82 | -11.70 |
试验样品5透明10档 | 2.19 | -0.78 | 1.78 | -0.44 | 4.34 | -6.14 | -11.66 |
从表2、表3和图3a、图3b可知,本发明实施例的电致变色玻璃的颜色外观比现有技术中的电致变色玻璃的颜色更为优良,现有技术中电致变色玻璃的可见光透过率T的变化范围为51.43%-5.6%,而本发明实施例的可见光透过率的范围为63%-2.0%,也即增大了透过率。另外本发明实施例提供的电致变色玻璃的可见光透颜色a*t,b*t的颜色范围围绕在中性色附近,接近无色,而现有技术中的电致变色玻璃的产品透过色变色前发黄色透过b*t达到7.83,变色后显示蓝色b*t达到-30.54。本发明专利的室外颜色a*g,b*g颜色为建筑流行的蓝灰色调,而现有技术中的电致变色玻璃的颜色相对不足。显然,在制备过程中,及之后变色使用过程中本发明提供的电致变色玻璃的颜色更为稳定,大面积颜色均匀性更好。
此外,可以理解的是,前述各个实施例仅为本发明的示例性说明,在技术特征不冲突、结构不矛盾、不违背本发明的发明目的前提下,各个实施例的技术方案可以任意组合、搭配使用。
最后应说明的是:以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。
Claims (9)
1.一种电致变色玻璃制备方法,其特征在于,包括:
提供基材玻璃层,并将所述基材玻璃层升温至280-300℃;
以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一透明导电层至所述基材玻璃层上;
以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一变色层至所述第一透明导电层上;
以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一离子导体层至所述第一变色层上;
以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第一辅助变色层至所述第一离子导体层上;
以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积第二透明导电层至所述第一辅助变色层上;以及
以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,在真空溅射气压为1.0E-3~9.0E-3mbar条件下沉积外层保护层至所述第二透明导电层上。
2.一种电致变色玻璃制备方法,其特征在于,包括:
提供基材玻璃层;
在所述基材玻璃层上镀制第一透明导电层;
在所述第一透明导电层上镀制第一变色层;
在所述第一变色层上镀制第一离子导体层;
在所述第一离子导体层上镀制第一辅助变色功能层;
在所述第一辅助变色功能层上镀制第二透明导电层;以及
在所述第二透明导电层上镀制外层保护层。
3.根据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述在所述基材玻璃层上镀制第一透明导电层包括:
将所述基材玻璃层升温至预设温度;以及
以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在第一预设真空溅射气压下沉积所述第一透明导电层至所述基材玻璃层上。
4.根据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述预设温度的范围为280-300℃;所述第一预设真空溅射气压为1.0E-3~9.0E-3mbar。
5.根据权利要求1所述的电致变色玻璃,其特征在于,所述在所述第一透明导电层上镀制第一变色层具体为:
以W、Mo、Nb、Ti、Ta中至少两种组合的氧化物为靶材材料,在第二预设真空溅射气压下沉积所述第一变色层至所述第一透明导电层上。
6.根据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述在所述第一变色层上镀制第一离子导体层具体为:
以H、Li、Na、K、Mg元素的一种或者至少两种的组合为靶材材料,在第三预设真空溅射气压条件下沉积所述第一离子导体层至所述第一变色层上。
7.据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述在所述第一离子导体层上镀制第一辅助变色功能层具体为:
以Ni、V、Co、Ir、Fe、Mn中至少两种组合的氧化物为靶材材料,在第四预设真空溅射气压条件下沉积所述第一辅助变色层至所述第一离子导体层上。
8.据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述在所述第一辅助变色功能层上镀制第二透明导电层具体为:
以FTO、ITO、IGZO、AZO、GZO、Ag中的一种或至少两种的组合为靶材材料,在第五预设真空溅射气压下沉积所述第二透明导电层至所述第一辅助变色层上。
9.根据权利要求1所述的电致变色玻璃制备方法,其特征在于,所述在所述第二透明导电层上镀制外层保护层具体为:
以Si、Ti、Zn、Sn、Nb、Ta之一的氧化物或氮化物或氮氧化物为靶材材料,在第六预设真空溅射气压下沉积所述外层保护层至所述第二透明导电层上。
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