CN112713072B - Internal parts of plasma processing chamber and method for manufacturing the same - Google Patents
Internal parts of plasma processing chamber and method for manufacturing the same Download PDFInfo
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- CN112713072B CN112713072B CN201911017548.6A CN201911017548A CN112713072B CN 112713072 B CN112713072 B CN 112713072B CN 201911017548 A CN201911017548 A CN 201911017548A CN 112713072 B CN112713072 B CN 112713072B
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- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 238000000576 coating method Methods 0.000 claims abstract description 205
- 239000011248 coating agent Substances 0.000 claims abstract description 203
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 102
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 71
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 230000007797 corrosion Effects 0.000 claims abstract description 61
- 238000005260 corrosion Methods 0.000 claims abstract description 61
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 46
- 230000003647 oxidation Effects 0.000 claims abstract description 39
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 39
- 238000010438 heat treatment Methods 0.000 claims abstract description 33
- 238000007789 sealing Methods 0.000 claims abstract description 21
- 239000010407 anodic oxide Substances 0.000 claims description 28
- 238000009832 plasma treatment Methods 0.000 claims description 7
- 229920000178 Acrylic resin Polymers 0.000 claims description 5
- 239000004925 Acrylic resin Substances 0.000 claims description 5
- 239000004416 thermosoftening plastic Substances 0.000 claims description 5
- 238000000227 grinding Methods 0.000 claims description 4
- 230000003628 erosive effect Effects 0.000 abstract description 32
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 24
- 229910052801 chlorine Inorganic materials 0.000 abstract description 24
- 239000000460 chlorine Substances 0.000 abstract description 24
- 239000010410 layer Substances 0.000 description 71
- 239000007789 gas Substances 0.000 description 26
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 23
- 239000000463 material Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 11
- 239000011148 porous material Substances 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000008595 infiltration Effects 0.000 description 4
- 238000001764 infiltration Methods 0.000 description 4
- 230000035515 penetration Effects 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
- C25D11/246—Chemical after-treatment for sealing layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
Abstract
The invention discloses a plasma processing chamber internal component and a manufacturing method thereof, wherein the manufacturing method comprises the following steps: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, a first plasma corrosion resistant coating is coated on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide. The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has simple process, easy implementation and low cost. The internal components of the plasma processing chamber not only realize the plasma erosion resistance, but also improve the chlorine erosion resistance.
Description
Technical Field
The invention relates to the field of plasma resistance and chemical corrosion resistance in a plasma processing chamber, in particular to an internal part of the plasma processing chamber and a manufacturing method thereof.
Background
Aluminum materials are widely used as materials for manufacturing related parts in plasma processing apparatuses because of their excellent conductive properties, ease of manufacture, and availability at reasonable prices. However, aluminum itself is liable to react with corrosive gases such as chlorine gas, causing corrosion of the parts themselves and becoming a source of particulate contamination of the reaction chamber.
In order to avoid the corrosion of the aluminum material by the corrosive gas, a protection method for making an anodic oxide layer on the surface of the aluminum material is generally adopted at present so as to try to solve the problem of the corrosion of the aluminum material by the corrosive gas such as chlorine. The anodic oxidation of aluminum is a typical electrolytic oxidation process, i.e., a process in which an aluminum material is used as an anode, and is placed in an electrolyte solution to be electrified, so that a porous anodic aluminum oxide coating is formed on the surface of the aluminum material by electrolysis.
In addition, some of the key parts of the plasma processing apparatus processed by the anodized aluminum material are exposed to the plasma and bombarded by the reactive components in the plasma, which may cause erosion damage to the bombarded key parts, not only reduce the lifetime of the plasma processing apparatus, but also deteriorate the processing quality, stability and controllability of the plasma processing apparatus. In order to protect the key parts inside the plasma processing device, a protective layer for resisting plasma erosion is formed on the surface of the anodic oxide layer of the key parts in the prior art. For example, the mounting substrate of the gas shower is processed from an oxidized aluminum material, and since the surface of the mounting substrate of the gas shower that contacts the back surface of the gas shower is subject to plasma erosion, yttrium oxide (Y 2 O 3 ) Coating was attempted to solve the plasma erosion problem described above.
However, in the practical application process, the problem that the mounting substrate of the treated gas shower head is corroded by corrosive gas such as chlorine is still found. The reason is that: cracks and voids are inevitably formed in the anodized layer during the production process, and particularly in a zone with a certain temperature, crack propagation and new cracks are formed in the anodized layer. Meanwhile, as the yttrium oxide coating contains certain pores and cracks, chlorine gas and the like can permeate into the anodic oxidation layer along the yttrium oxide pores and cracks, and the anodic oxidation layer also contains cracks, so that the chlorine gas can finally corrode the aluminum substrate. Failure of the protective anodic oxide layer can result in excessive particle generation within the reaction chamber, requiring additional downtime to replace the failed aluminum components and to clean the particles within the reaction chamber.
Disclosure of Invention
The invention aims to provide an internal part of a plasma processing chamber and a manufacturing method thereof, which can realize the resistance to plasma erosion and improve the resistance to chemical corrosion caused by corrosive gases such as chlorine and the like.
In order to achieve the above object, the present invention provides a method for manufacturing an internal part of a plasma processing chamber, comprising the steps of: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, a first plasma corrosion resistant coating is coated on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide.
The method for manufacturing the internal part of the plasma processing chamber comprises the steps of removing the thermoplastic polymer coating on the surface of the anodic oxidation layer after heating treatment, and preparing the first plasma corrosion resistant coating on the surface of the anodic oxidation layer.
The method for manufacturing the internal component of the plasma processing chamber comprises the step of removing the thermoplastic polymer coating by physical grinding.
The method for manufacturing the internal part of the plasma processing chamber comprises the steps of firstly preparing a second plasma corrosion resistant coating on the surface of the anodic oxidation layer, and then coating a thermoplastic polymer coating on the surface of the second plasma corrosion resistant coating, wherein the second plasma corrosion resistant coating comprises yttrium oxide.
The method for manufacturing the internal part of the plasma processing chamber comprises the steps of removing the thermoplastic polymer coating on the surface of the second plasma corrosion resistant coating after heating treatment, and preparing the first plasma corrosion resistant coating on the surface of the second plasma corrosion resistant coating.
The method for manufacturing an internal part of a plasma processing chamber as described above, wherein the heating temperature is 50 ℃ to 180 ℃.
The method for manufacturing the internal part of the plasma processing chamber, wherein the thermoplastic polymer coating is a thermoplastic acrylic resin coating.
The present invention also provides a plasma processing chamber internal component comprising: an aluminum-containing substrate; the anodic oxidation layer and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate; and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer.
The plasma processing chamber internal component is characterized in that a thermoplastic polymer coating is further arranged between the anodic oxidation layer and the first plasma corrosion resistant coating.
The present invention also provides a plasma processing chamber internal component comprising: an aluminum-containing substrate; the anodic oxidation layer, the second plasma corrosion resistant coating and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate; and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second plasma corrosion resistant coating.
The plasma processing chamber inner part is characterized in that a thermoplastic polymer coating is further arranged between the second plasma corrosion resistant coating and the first plasma corrosion resistant coating.
Compared with the prior art, the invention has the following beneficial effects:
according to the invention, the thermoplastic polymer coating is coated on the surface of the anodic oxide layer or the plasma corrosion resistant coating, under the action of heating, the characteristic of the thermoplastic polymer coating is utilized, and the polymer is converted from a glass state to a high-elastic state, so that the dynamic filling and self-repairing of cracks and gaps of the anodic oxide layer or the plasma corrosion resistant coating are realized. The invention meets the requirement of the plasma erosion resistance by means of the plasma erosion resistance coating, and seals the pores and cracks of the anodic oxide layer or the plasma erosion resistance coating by means of a macromolecule hole sealing method, thereby avoiding chlorine from penetrating into the anodic oxide layer or the plasma erosion resistance coating and improving the erosion resistance of the components in the plasma treatment chamber to corrosive gases such as chlorine.
The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has simple process, easy implementation and low cost. The thermoplastic polymer coating provided by the invention can realize dynamic hole sealing of cracks of the plasma corrosion resistant coating or the anodic oxidation layer in a high-temperature working condition of 50-160 ℃, and can realize self-repairing of the thermoplastic polymer coating in a crack area, and thoroughly prevent penetration of corrosive gases such as chlorine and the like in the use process. The internal components of the plasma processing chamber not only realize the plasma erosion resistance, but also improve the chlorine erosion resistance.
Drawings
FIG. 1 is a schematic flow chart of a first embodiment of a method for manufacturing an internal component of a plasma processing chamber according to the present invention;
FIG. 2 is a flow chart of a second embodiment of a method of manufacturing an internal component of a plasma processing chamber according to the present invention;
FIG. 3 is a schematic illustration of the thermoplastic polymer coating of the present invention for achieving dynamic filling of anodic oxide cracks and crevices;
FIG. 4 is a flow chart of a third embodiment of a method of manufacturing an interior component of a plasma processing chamber according to the present invention;
fig. 5 is a flow chart of a fourth embodiment of a method for manufacturing an internal component of a plasma processing chamber according to the present invention.
Detailed Description
The invention is further described by the following examples, which are given by way of illustration only and are not limiting of the scope of the invention.
In order to solve the problem that the components exposed to halogen-based etching gas or plasma thereof in the conventional plasma processing chamber cannot simultaneously satisfy the chemical etching resistance of the etching gas and the plasma etching resistance, as shown in fig. 1, a preferred embodiment of the method for manufacturing the components inside the plasma processing chamber according to the present invention comprises the following steps:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is prepared on the surface of the aluminum-containing substrate 1.
The aluminum-containing substrate 1 is typically an aluminum or aluminum alloy material in the manufacture of components in a plasma processing apparatus. In order to reduce the corrosion of the aluminum-containing substrate 1 by the corrosive gas, the present embodiment selects to first prepare an anodized layer 2 on the surface of the aluminum-containing substrate 1. A suitable pretreatment step is also required before preparing the anodized layer 2, depending on the surface conditions of the aluminum-containing substrate 1, to obtain an aluminum-containing substrate 1 that is sufficiently clean, free of scratches and other defects. In some preferred embodiments, the processing steps may include mainly two steps: (1) Alkali etching is carried out on the surface of the aluminum-containing substrate 1 to clean impurities on the surface; (2) The surface of the aluminum-containing substrate 1 after alkali etching is chemically polished to eliminate scratches and other defects on the surface.
The aluminum-containing substrate 1 having a sufficiently smooth surface, free from scratches and other defects obtained by the above pretreatment can be subjected to the next anodizing treatment to form a uniform anodized layer 2 on the surface of the aluminum-containing substrate 1. The aluminum-containing substrate 1 is generally used as an anode, and is immersed in an electrolytic solution to be anodized. The electrolyte is generally prepared by adopting a low-temperature sulfuric acid or mixed acid method of adding oxalic acid, and direct current or pulse current is introduced.
Step 2: and (3) coating a thermoplastic polymer coating 3 on the surface of the anodic oxidation layer 2, and then carrying out heating treatment.
The temperature of the heating treatment is set or designed according to the actual working environment of the structure of the anodized layer 2. In general, the temperature of the heat treatment may be equal to or slightly greater than the actual operating environment temperature of the anodized layer 2 structure. In the embodiment of the present invention, 50 to 180℃is selected as the temperature selection range for the heat treatment.
The invention requires the high polymer coating to have thermoplasticity, because the anodic oxide layer 2 can fully generate new cracks in a high-temperature working environment of 50-180 ℃, the high polymer coating has thermoplasticity and can enter the cracks of the anodic oxide layer 2 in the high-temperature environment, thereby realizing the purpose of sealing the cracks to avoid the penetration of corrosive gases such as chlorine and the like, and realizing the dynamic filling of the cracks and the gaps of the anodic oxide layer 2; in addition, if the polymer coating is damaged locally, such as scraping, the polymer coating is changed from a glass state to a high-elastic state in the high-temperature environment, so that the purpose of automatically repairing the polymer coating can be realized.
When the thermoplastic polymer coating 3 is coated, the raw material is in a solution state and is not limited by the shape and structure of the part, especially the inner wall of a pore (> phi 2 mm). For example, when manufacturing the mounting substrate of the gas spray head, the gas spray head can be directly poured into the air holes of the mounting substrate, then the solution is poured out, and finally the solution adhered to the inner wall of the air holes is solidified and molded at the high temperature of 50-180 ℃. As a more preferable example, the raw material of the thermoplastic polymer coating layer 3 may be selected to be a thermoplastic acrylic resin. Thermoplastic acrylic resins are a class of thermoplastic resins made by polymerizing acrylic acid, methacrylic acid, and derivatives thereof (e.g., esters, nitriles, amides).
Step 3: a first yttria coating 4 is prepared on the surface of the thermoplastic polymer coating 3.
In order to further realize plasma corrosion resistance for the part which has obtained the corrosion resistance function against the corrosive gas such as chlorine after the treatment of step 2, the present embodiment further prepares the first yttrium oxide coating 4 on the surface of the thermoplastic polymer coating 3. In this embodiment, by continuously coating the first yttria coating 4 on the thermoplastic polymer coating 3, the plasma corrosion resistance of the metal component can be improved, thereby improving the service life of the metal component and further improving the processing efficiency of the plasma processing apparatus.
The yttria coating can be formed by one or more of the following process methods including Plasma Enhanced Physical Vapor Deposition (PEPVD), plasma Enhanced Chemical Vapor Deposition (PECVD), physical Vapor Deposition (PVD), chemical Vapor Deposition (CVD), plasma Spray (PS), sol-gel method (sol-gel), or the like. Among them, in order to reduce the porosity of the freshly prepared coating, a plasma spraying method is preferably employed. In practical application, the spraying process can select proper spraying equipment according to specific conditions, and set technological parameters such as air flow, spraying distance, current and the like according to the adopted spraying equipment. Wherein the first yttria coating 4 can also be other plasma erosion resistant coatings such as yttria and Yttria Fluoride (YF) 3 ) Any ceramic material that can withstand plasma etching can be used in the present invention.
The specific structure of the internal components of the plasma processing chamber manufactured through the steps 1-3 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 which covers the surface of the aluminum-containing substrate 1; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer 2; a thermoplastic polymer coating 3 covering the surface of the anodic oxidation layer 2; and a first yttrium oxide coating layer 4 which covers the surface of the thermoplastic polymer coating layer 3. The internal components of the plasma processing chamber manufactured by the embodiment can be a gas shower head, a mounting substrate of the gas shower head, a gas distribution plate, a plasma confinement ring, a focusing ring, an electrostatic chuck or an inner wall of a reaction chamber of a plasma processing device. The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the anodic oxide layer 2 by means of a high polymer hole sealing method, so that chemical corrosion caused by chlorine infiltration to the aluminum-containing substrate 1 is avoided. The plasma processing chamber internal component provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine erosion resistance.
In another preferred embodiment, as shown in fig. 2, a method for manufacturing an internal part of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is prepared on the surface of the aluminum-containing substrate 1.
Step 2: and (3) coating a thermoplastic polymer coating 3 on the surface of the anodic oxidation layer 2, and then carrying out heating treatment.
Step 3: after the heat treatment, the thermoplastic polymer coating 3 on the surface of the anodized layer 2 is removed.
Step 4: a first yttria coating 4 is prepared on the surface of the anodized layer 2.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-4 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 which covers the surface of the aluminum-containing substrate 1; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer 2; and a first yttrium oxide coating 4 which covers the surface of the anodic oxidation layer 2.
The difference between this embodiment and the first embodiment is that: the heat-treated thermoplastic polymer coating 3 is removed before the first yttria coating 4 is prepared. For some metal parts having strict requirements on the coating thickness of the surface of the metal part, the coating thickness of the surface of the metal part can be controlled by removing the thermoplastic polymer coating 3. The method of removing the coating is preferably a physical grinding method so as to realize no scratch and other defects on the surface of the anodized layer 2 after the thermoplastic polymer coating 3 is removed, thereby being beneficial to the coating effect of the first yttrium oxide coating 4.
Since the metal member after the formation of the thermoplastic polymer coating layer 3 is further subjected to the heat treatment in step 2 of this example, microcracks of the anodized layer 2 are sufficiently formed in advance. The thermoplastic polymer coating 3 is changed from a glass state to a high-elasticity state, so that the cracks and gaps of the anodic oxide layer 2 are dynamically filled. In this way, the thermoplastic polymer coating 3 on the surface of the anodized layer is removed, but the thermoplastic polymer material layer filled with microcracks remains inside the anodized layer. In the subsequent practical high-temperature working environment, almost no or only few new microcracks are formed in the anodic oxide layer 2, only very slight and almost negligible corrosion is caused, and even if new cracks are generated, thermoplastic polymers filled in the original cracks can still flow at high temperature to cover the new cracks, so that the whole part cannot generate cracks in a long life cycle, and corrosive gas is prevented from reaching the aluminum material layer along the cracks to corrode the part. Because the thermoplastic polymer layer on the surface of the anodic oxide layer is removed, the plasma corrosion resistant coating (such as the first yttrium oxide coating) directly exposed to the plasma is directly coated on the lower anodic oxide layer (Al 2 O 3 ) And the thermal expansion coefficients of the two materials are close, so that the bonding strength of the two materials is improved, and further cracking and falling are prevented.
As shown in fig. 3, the first line of the figures is a scanning electron microscope photograph after the anodic oxide layer 2 is coated, the second line of the figures is a scanning electron microscope photograph after the thermoplastic polymer coating 3 is coated, the third line of the figures is a scanning electron microscope photograph after the thermoplastic polymer coating 3 is removed, and the upper and lower two lines of each line of the figures are respectively a low-magnification scanning electron microscope photograph and a high-magnification scanning electron microscope photograph. As can be seen from fig. 3, the thermoplastic polymer coating 3 realizes dynamic filling of cracks and gaps of the anodic oxide layer 2, thereby avoiding penetration of corrosive gases such as chlorine.
The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the anodic oxide layer 2 by means of a high polymer hole sealing method, so that chemical corrosion caused by chlorine infiltration to the aluminum-containing substrate 1 is avoided. The plasma processing chamber internal component provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine erosion resistance.
In another preferred embodiment, as shown in fig. 4, a method for manufacturing an internal part of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is prepared on the surface of the aluminum-containing substrate 1.
Step 2: and preparing a second yttrium oxide coating 5 on the surface of the anodic oxidation layer 2.
Step 3: and (3) coating a thermoplastic polymer coating 3 on the surface of the second yttrium oxide coating 5, and then carrying out heating treatment.
Step 4: a first yttria coating 4 is prepared on the surface of the thermoplastic polymer coating 3.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-4 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 which covers the surface of the aluminum-containing substrate 1; a second yttrium oxide coating 5 covering the surface of the anodic oxidation layer 2; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second yttrium oxide coating 5; a thermoplastic polymer coating 3 covering the surface of the second yttrium oxide coating 5; and a first yttrium oxide coating layer 4 which covers the surface of the thermoplastic polymer coating layer 3.
The difference between this embodiment and the first embodiment is that: before the thermoplastic polymer coating 3 is coated, a second yttrium oxide coating 5 is prepared on the surface of the anodic oxidation layer 2. Wherein the second yttria coating 5 can also be other plasma erosion resistant coatings such as yttria and Yttria Fluoride (YF) 3 ) As long as the mixture of (a) is capable ofCeramic materials that are resistant to plasma erosion can be used in the present invention. This embodiment can be applied to the corrosion-resistant treatment of an aluminum material which has been coated with a yttria coating on the surface of the anodized layer 2 at present. The microcracks of the second yttrium oxide coating 5 are fully and pre-formed by heat treatment, and then the glass state of the second yttrium oxide coating 5 is converted into a high-elasticity state by the thermoplastic polymer coating 3, so that the dynamic filling of the cracks and gaps of the second yttrium oxide coating 5 is realized, the penetration of corrosive gases such as chlorine and the like into the second yttrium oxide coating 5 is avoided, and the chemical corrosion resistance of the metal part is realized. On the basis, a first yttrium oxide coating 4 is formed on the surface of the thermoplastic polymer coating 3 by plasma spraying and the like, so that the plasma corrosion resistance of the metal part is realized. The embodiment shows that the thermoplastic polymer coating 3 not only can dynamically fill cracks and gaps of the anodic oxide layer 2, but also can dynamically fill the cracks and the gaps of the yttrium oxide coating in the high-temperature treatment process, and provides different treatment modes for manufacturing and modifying internal components of various plasma treatment chambers so as to achieve wider application range.
The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the second yttrium oxide coating 5 by means of a high polymer hole sealing method, so that chemical corrosion caused by chlorine infiltration to the aluminum-containing substrate 1 is avoided. The plasma processing chamber internal component provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine erosion resistance.
In another preferred embodiment, as shown in fig. 5, a method for manufacturing an internal part of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is prepared on the surface of the aluminum-containing substrate 1.
Step 2: and preparing a second yttrium oxide coating 5 on the surface of the anodic oxidation layer 2.
Step 3: and (3) coating a thermoplastic polymer coating 3 on the surface of the second yttrium oxide coating 5, and then carrying out heating treatment.
Step 4: after the heat treatment, the thermoplastic polymer coating 3 on the surface of the second yttria coating 5 is removed.
Step 5: a first yttria coating 4 is prepared on the surface of the second yttria coating 5.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-5 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 which covers the surface of the aluminum-containing substrate 1; a second yttrium oxide coating 5 covering the surface of the anodic oxidation layer 2; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second yttrium oxide coating 5; a first yttria coating 4 covering the surface of the second yttria coating 5.
The difference between this embodiment and the third embodiment is that: the heat-treated thermoplastic polymer coating 3 is removed before the first yttria coating 4 is prepared.
For some metal parts having strict requirements on the coating thickness of the surface of the metal part, the coating thickness of the surface of the metal part can be controlled by removing the thermoplastic polymer coating 3. The method of coating removal is preferably a physical grinding method, so as to realize that the surface of the second yttrium oxide coating 5 after the thermoplastic polymer coating 3 is removed has no scratches and other defects, and further facilitate the coating effect of the first yttrium oxide coating 4.
Since the metal member after the formation of the thermoplastic polymer coating layer 3 was further subjected to the heat treatment in step 2 of this example, microcracks of the second yttria coating 5 were sufficiently and preliminarily formed. The thermoplastic polymer coating 3 is changed from a glass state to a high-elastic state, so that the dynamic filling of cracks and gaps of the second yttrium oxide coating 5 is realized. Thus, although the thermoplastic polymer coating 3 is removed, little or no new microcracks form within the second yttria coating 5, causing only very slight, almost negligible corrosion, in subsequent actual high temperature operating environments.
The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the second yttrium oxide coating 5 by means of a high polymer hole sealing method, so that chemical corrosion caused by chlorine infiltration to the aluminum-containing substrate 1 is avoided. The plasma processing chamber internal component provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine erosion resistance.
In summary, the thermoplastic polymer coating is coated on the surface of the anodic oxide layer or the yttria coating, and under the action of heating, the polymer is converted from the glass state to the high-elastic state by utilizing the characteristics of the thermoplastic polymer coating, so that the dynamic filling and self-repairing of cracks and gaps of the anodic oxide layer or the yttria coating are realized. The invention meets the plasma erosion resistance by means of the yttrium oxide coating, and seals the pores and cracks of the yttrium oxide coating or the anodic oxide layer by a high molecular hole sealing method, thereby avoiding chlorine from penetrating into the yttrium oxide coating and improving the corrosion resistance of the inner part of the plasma treatment chamber to corrosive gases such as chlorine.
The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has simple process, easy implementation and low cost. The thermoplastic polymer coating provided by the invention can realize dynamic hole sealing of cracks of the yttrium oxide coating or the anodic oxide layer in a high-temperature working condition of 50-160 ℃, and can realize self-repairing of the thermoplastic polymer coating in a crack area, and can thoroughly prevent corrosive gases such as chlorine and the like from penetrating in the use process. The internal components of the plasma processing chamber not only realize the plasma erosion resistance, but also improve the chlorine erosion resistance.
While the present invention has been described in detail through the foregoing description of the preferred embodiment, it should be understood that the foregoing description is not to be considered as limiting the invention. Many modifications and substitutions of the present invention will become apparent to those of ordinary skill in the art upon reading the foregoing. Accordingly, the scope of the invention should be limited only by the attached claims. Furthermore, any reference signs in the claims shall not be construed as limiting the claim concerned; the word "comprising" does not exclude the presence of other elements or steps than those listed in any claim or the specification; the terms "first," "second," and the like are used merely to denote a name, and do not denote any particular order.
Claims (9)
1. A method of manufacturing an interior component of a plasma processing chamber, the method comprising: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, a first plasma corrosion resistant coating is coated on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide, the heating treatment temperature is 50-180 ℃, and the working temperature of the internal part of the plasma treatment chamber is 50-160 ℃, so that the thermoplastic polymer coating is converted into a high-elasticity state at the working temperature.
2. A method of manufacturing an interior component of a plasma processing chamber, the method comprising: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer, a second plasma corrosion resistant coating and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the second plasma corrosion resistant coating; and after the heating treatment is finished, a first plasma corrosion resistant coating is coated on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide, the heating treatment temperature is 50-180 ℃, the working temperature of the internal part of the plasma treatment chamber is 50-160 ℃, the thermoplastic polymer coating is converted into a high-elastic state at the working temperature, and the second plasma corrosion resistant coating comprises yttrium oxide.
3. The method of manufacturing an interior component of a plasma processing chamber according to claim 1 or 2, wherein the thermoplastic polymer coating applied is a thermoplastic acrylic resin coating.
4. A method of manufacturing an interior component of a plasma processing chamber, the method comprising: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; after heating treatment, firstly removing the thermoplastic polymer coating on the surface of the anodic oxidation layer, and then preparing a first plasma corrosion resistant coating on the surface of the anodic oxidation layer, wherein the first plasma corrosion resistant coating comprises yttrium oxide, the heating treatment temperature is 50-180 ℃, and the working temperature of the internal part of the plasma treatment chamber is 50-160 ℃, so that the thermoplastic polymer coating filling cracks in the anodic oxidation layer is converted into a high-elastic state at the working temperature.
5. A method of manufacturing an interior component of a plasma processing chamber, the method comprising: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer, a second plasma corrosion resistant coating and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the component after the thermoplastic polymer coating is coated, so that the thermoplastic polymer coating fills cracks in the second plasma corrosion resistant coating; after the heating treatment, removing the thermoplastic polymer coating on the surface of the second plasma corrosion resistant coating, and preparing a first plasma corrosion resistant coating on the surface of the second plasma corrosion resistant coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide, the heating treatment temperature is 50-180 ℃, and the working temperature of the internal part of the plasma treatment chamber is 50-160 ℃, so that the thermoplastic polymer coating filled with cracks in the second plasma corrosion resistant coating is converted into a high-elastic state at the working temperature.
6. The method of claim 4 or 5, wherein the thermoplastic polymer coating is removed by physical grinding.
7. The method of manufacturing an interior component of a plasma processing chamber according to claim 4 or 5, wherein the thermoplastic polymer coating applied is a thermoplastic acrylic resin coating.
8. A plasma processing chamber interior component manufactured by the manufacturing method of claim 4, comprising:
an aluminum-containing substrate;
the anodic oxidation layer and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate;
and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer.
9. A plasma processing chamber interior component manufactured by the manufacturing method of claim 5, comprising:
an aluminum-containing substrate;
the anodic oxidation layer, the second plasma corrosion resistant coating and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate;
the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second plasma corrosion resistant coating, the working temperature of the internal parts of the plasma processing chamber is 50-160 ℃, and the thermoplastic polymer hole sealing structure is converted into a high-elastic state at the working temperature.
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| EP0079007A1 (en) * | 1981-11-05 | 1983-05-18 | PTG PLASMA-OBERFLÄCHENTECHNIK GmbH | Method of sealing a porous coating |
| JPH11104560A (en) * | 1997-10-03 | 1999-04-20 | Sky Alum Co Ltd | Resin coated aluminum alloy member and its production |
| CN1516535A (en) * | 2002-11-28 | 2004-07-28 | ���������ƴ���ʽ���� | Plasma processing container internal parts |
| CN1663017A (en) * | 2002-06-27 | 2005-08-31 | 蓝姆研究公司 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
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| JP3504872B2 (en) * | 1998-11-20 | 2004-03-08 | 東西化学株式会社 | Coating film and method of forming coating film |
| JP5146865B2 (en) * | 2004-11-10 | 2013-02-20 | 株式会社フクダコーポレーション | Decorating aluminum molded products |
| TW201100578A (en) * | 2009-06-19 | 2011-01-01 | Saint Gobain Ceramics & Plastics Inc | Sealed plasma coatings |
| US20160076134A1 (en) * | 2013-04-04 | 2016-03-17 | Toray Industries, Inc. | Gas barrier film and method for producing same |
| US20180240649A1 (en) * | 2017-02-17 | 2018-08-23 | Lam Research Corporation | Surface coating for plasma processing chamber components |
| JP6788549B2 (en) * | 2017-06-05 | 2020-11-25 | 信越化学工業株式会社 | Temporary adhesive film roll for substrate processing, manufacturing method of thin substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0079007A1 (en) * | 1981-11-05 | 1983-05-18 | PTG PLASMA-OBERFLÄCHENTECHNIK GmbH | Method of sealing a porous coating |
| JPH11104560A (en) * | 1997-10-03 | 1999-04-20 | Sky Alum Co Ltd | Resin coated aluminum alloy member and its production |
| CN1663017A (en) * | 2002-06-27 | 2005-08-31 | 蓝姆研究公司 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| CN1516535A (en) * | 2002-11-28 | 2004-07-28 | ���������ƴ���ʽ���� | Plasma processing container internal parts |
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