CN112713072A - Plasma processing chamber internal components and methods of making the same - Google Patents
Plasma processing chamber internal components and methods of making the same Download PDFInfo
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- CN112713072A CN112713072A CN201911017548.6A CN201911017548A CN112713072A CN 112713072 A CN112713072 A CN 112713072A CN 201911017548 A CN201911017548 A CN 201911017548A CN 112713072 A CN112713072 A CN 112713072A
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- 238000000034 method Methods 0.000 title claims abstract description 49
- 238000000576 coating method Methods 0.000 claims abstract description 185
- 239000011248 coating agent Substances 0.000 claims abstract description 182
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 88
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 63
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 63
- 230000007797 corrosion Effects 0.000 claims abstract description 60
- 238000005260 corrosion Methods 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 56
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 44
- 230000003647 oxidation Effects 0.000 claims abstract description 42
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 42
- 238000010438 heat treatment Methods 0.000 claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 claims abstract description 25
- 238000007789 sealing Methods 0.000 claims abstract description 20
- 239000010407 anodic oxide Substances 0.000 claims description 18
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 18
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 claims 1
- 230000003628 erosive effect Effects 0.000 abstract description 20
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 19
- 229910052801 chlorine Inorganic materials 0.000 abstract description 19
- 239000000460 chlorine Substances 0.000 abstract description 19
- 230000008569 process Effects 0.000 abstract description 10
- 239000010410 layer Substances 0.000 description 72
- 239000007789 gas Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 15
- 239000011148 porous material Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 8
- 239000011247 coating layer Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
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- 230000007547 defect Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000002103 nanocoating Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229940105963 yttrium fluoride Drugs 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
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- 230000015572 biosynthetic process Effects 0.000 description 1
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- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
- C25D11/246—Chemical after-treatment for sealing layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
Abstract
The invention discloses an internal part of a plasma processing chamber and a manufacturing method thereof, wherein the manufacturing method comprises the following steps: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the part after coating the thermoplastic polymer coating so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, coating a first plasma corrosion resistant coating on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide. The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has the advantages of simple process, easy implementation and low cost. The internal part of the plasma processing chamber not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
Description
Technical Field
The invention relates to the field of plasma and chemical corrosion resistance in a plasma processing chamber, in particular to an internal part of the plasma processing chamber and a manufacturing method thereof.
Background
Aluminum materials are widely used as materials for manufacturing related parts in plasma processing apparatuses because of their characteristics of good conductive properties, ease of manufacture, and availability at a reasonable price. However, aluminum itself is liable to react with corrosive gases such as chlorine, causing corrosion of parts themselves and becoming a source of particulate contaminants in the reaction chamber.
In order to avoid corrosion of aluminum material by corrosive gas, a protection method of forming an anodic oxidation layer on the surface of aluminum material is generally adopted at present to try to solve the problem of corrosion of aluminum material by corrosive gas such as chlorine gas. Aluminum anodization is a typical electrolytic oxidation process, i.e., a process of using an aluminum material as an anode, placing the aluminum material in an electrolyte solution for electrification, and forming a porous anodized aluminum coating on the surface of the aluminum material by electrolysis.
In addition, some critical parts processed from the anodized aluminum material in the plasma processing apparatus are exposed to the plasma and bombarded by the reactive components in the plasma, which may cause erosion damage to the bombarded critical parts, not only reducing the lifetime of the plasma processing apparatus, but also deteriorating the processing quality, stability and controllability of the plasma processing apparatus. In order to protect the key parts inside the plasma processing apparatus, a protective layer against plasma erosion is formed on the surface of the anodized layer of the key parts. For example, since a mounting substrate of a gas shower head is formed by processing an aluminum material through oxidation treatment, and a surface of the mounting substrate of the gas shower head, which is in contact with a back surface of the gas shower head, is subjected to plasma erosion, yttrium oxide (Y) is generally formed on the surface of the mounting substrate of the gas shower head at present2O3) Coatings have attempted to solve the plasma erosion problem described above.
However, in practical use, it was found that the mounting substrate of the gas shower head after the above treatment still had a problem of being corroded by an etching gas such as chlorine gas. The reason is that: the anodic oxidation layer inevitably has cracks and pores in the production process, and particularly when the anodic oxidation layer is used in a region with a certain temperature, the anodic oxidation layer has cracks to spread and generates new cracks. Meanwhile, as the yttria coating contains certain pores and cracks, chlorine and the like can permeate into the anodic oxidation layer along the pores and the cracks of the yttria, and the anodic oxidation layer also contains cracks, so that the chlorine can finally corrode the aluminum substrate. Failure of the protective anodized layer can result in excessive particulate generation within the reaction chamber, requiring additional downtime to replace failed aluminum parts and to clean the particles within the reaction chamber.
Disclosure of Invention
The invention aims to provide an internal part of a plasma processing chamber and a manufacturing method thereof, which can realize plasma erosion resistance and improve the performance of resisting chemical corrosion caused by corrosive gases such as chlorine and the like.
In order to achieve the above object, the present invention provides a method for manufacturing an internal part of a plasma processing chamber, comprising the steps of: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the part after coating the thermoplastic polymer coating so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, coating a first plasma corrosion resistant coating on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide.
In the manufacturing method of the internal component of the plasma processing chamber, after the heating treatment, the thermoplastic polymer coating on the surface of the anodic oxidation layer is removed, and then the first plasma corrosion resistant coating is prepared on the surface of the anodic oxidation layer.
In the method for manufacturing the internal component of the plasma processing chamber, the method for removing the thermoplastic polymer coating is physical grinding.
In the manufacturing method of the internal component of the plasma processing chamber, after the second plasma corrosion-resistant coating is prepared on the surface of the anodic oxidation layer, the thermoplastic polymer coating is coated on the surface of the second plasma corrosion-resistant coating, and the second plasma corrosion-resistant coating comprises yttrium oxide.
After the heating treatment, the thermoplastic polymer coating on the surface of the second plasma corrosion resistant coating is removed, and then the first plasma corrosion resistant coating is prepared on the surface of the second plasma corrosion resistant coating.
In the method for manufacturing the internal part of the plasma processing chamber, the heating temperature is 50 ℃ to 180 ℃.
In the method for manufacturing the internal component of the plasma processing chamber, the thermoplastic polymer coating is a thermoplastic acrylic resin coating.
The present invention also provides a plasma processing chamber interior component comprising: an aluminum-containing substrate; the anodic oxidation layer and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate; and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer.
In the internal component of the plasma processing chamber, a thermoplastic polymer coating is further disposed between the anodic oxidation layer and the first plasma corrosion resistant coating.
The present invention also provides a plasma processing chamber interior component comprising: an aluminum-containing substrate; the anodic oxidation layer, the second plasma corrosion resistant coating and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate; and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second plasma corrosion resistant coating.
In the internal component of the plasma processing chamber, a thermoplastic polymer coating is further disposed between the second plasma corrosion-resistant coating and the first plasma corrosion-resistant coating.
Compared with the prior art, the invention has the following beneficial effects:
according to the invention, the thermoplastic polymer coating is coated on the surface of the anodic oxide layer or the plasma corrosion resistant coating, and under the action of heating, by utilizing the characteristics of the thermoplastic polymer coating, the polymer is converted from a glass state to a high-elasticity state, so that the dynamic filling and self-repairing of cracks and gaps of the anodic oxide layer or the plasma corrosion resistant coating are realized. The invention meets the requirement of plasma erosion resistance by means of the plasma corrosion resistant coating, and seals the pores and cracks of the anodic oxide layer or the plasma corrosion resistant coating by means of a macromolecule hole sealing method, thereby preventing chlorine from permeating into the pores and improving the corrosion resistance of parts in the plasma processing chamber to corrosive gases such as chlorine and the like.
The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has the advantages of simple process, easy implementation and low cost. The thermoplastic polymer coating can realize dynamic hole sealing of the plasma corrosion resistant coating or the anodic oxide layer cracks and self-repair of the thermoplastic polymer coating in the crack area under the working condition of high temperature of 50-160 ℃, and thoroughly prevents corrosive gases such as chlorine and the like from permeating in the using process. The internal part of the plasma processing chamber not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
Drawings
FIG. 1 is a schematic flow chart of a first embodiment of a method for fabricating internal components of a plasma processing chamber according to the present invention;
FIG. 2 is a schematic flow chart illustrating a method for manufacturing internal components of a plasma processing chamber according to a second embodiment of the present invention;
FIG. 3 is a schematic diagram of the thermoplastic polymer coating of the present invention for achieving anodic oxide layer cracking and gap dynamic filling;
FIG. 4 is a schematic flow chart illustrating a third embodiment of a method for fabricating internal components of a plasma processing chamber according to the present invention;
FIG. 5 is a flow chart illustrating a fourth embodiment of a method for manufacturing internal components of a plasma processing chamber according to the present invention.
Detailed Description
The invention will be further described by the following specific examples in conjunction with the drawings, which are provided for illustration only and are not intended to limit the scope of the invention.
In order to solve the problem that the conventional plasma processing chamber is not capable of simultaneously satisfying the chemical corrosion resistance of the halogen-based etching gas or the plasma thereof, as shown in fig. 1, a preferred embodiment of the method for manufacturing the internal component of the plasma processing chamber according to the present invention comprises the following steps:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is formed on the surface of the aluminum-containing substrate 1.
The aluminum-containing substrate 1 is typically an aluminum or aluminum alloy material in the manufacture of components in a plasma processing apparatus. In order to reduce the corrosion of the aluminum-containing substrate 1 caused by the corrosive gas, in this embodiment, an anodized layer 2 is first formed on the surface of the aluminum-containing substrate 1. Before the anodized layer 2 is prepared, an appropriate pretreatment step is selected according to the surface condition of the aluminum-containing substrate 1, so as to obtain the aluminum-containing substrate 1 with sufficient smoothness and no scratch or other defects. In some preferred embodiments, the processing step may include two main steps: (1) performing alkaline etching on the surface of the aluminum-containing substrate 1 to clean impurities on the surface; (2) the surface of the aluminum-containing substrate 1 after the alkali etching is chemically polished to remove scratches and other defects of the surface.
The aluminum-containing substrate 1 obtained by the pretreatment is sufficiently smooth and free of scratches and other defects, and then is subjected to a subsequent anodization process to form a uniform anodized layer 2 on the surface of the aluminum-containing substrate 1. The aluminum-containing substrate 1 is generally used as an anode and immersed in an electrolytic solution to carry out an anodic oxidation treatment. The electrolyte is generally prepared by introducing direct current or pulse current by using low-temperature sulfuric acid or mixed acid method with oxalic acid.
Step 2: and coating a thermoplastic polymer coating 3 on the surface of the anodic oxidation layer 2, and then carrying out heating treatment.
The temperature of the heat treatment is set or designed depending on the actual working environment of the anodized layer 2 structure. Generally, the temperature of the heat treatment may be equal to or slightly greater than the actual operating ambient temperature of the anodized layer 2 structure. In the examples of the present invention, 50 to 180 ℃ was selected as the temperature selection range for the heat treatment.
The invention requires the polymer coating to have thermoplasticity, because the anodic oxidation layer 2 can fully generate new cracks in a high-temperature working environment of 50-180 ℃, the polymer coating has thermoplasticity and can enter the cracks of the anodic oxidation layer 2 in the high-temperature environment, thereby realizing the purpose of sealing the cracks to avoid the infiltration of corrosive gases such as chlorine and the like and realizing the dynamic filling of the cracks and the gaps of the anodic oxidation layer 2; in addition, if the high molecular coating is locally damaged, such as scraping, the high molecular coating is converted from a glass state to a high elastic state in the high-temperature environment, so that the aim of automatically repairing the high molecular coating can be fulfilled.
When the thermoplastic polymer coating 3 is coated, the raw materials are in a solution state and are not limited by the shape and the structure of the part, particularly the inner wall of the air hole (phi 2 mm). For example, when the mounting substrate of the gas shower head is manufactured, the mounting substrate can be directly poured into the gas hole of the mounting substrate, then the solution is poured out, and finally the solution adhered to the inner wall of the gas hole is cured and molded at a high temperature of 50-180 ℃. As a more preferable example, the material of the thermoplastic polymer coating layer 3 may be selected from thermoplastic acrylic resins. The thermoplastic acrylic resin is a thermoplastic resin prepared by polymerizing acrylic acid, methacrylic acid and derivatives thereof (such as esters, nitriles and amides).
And step 3: and preparing a first yttrium oxide coating 4 on the surface of the thermoplastic polymer coating 3.
In order to further realize the plasma corrosion resistance of the component which is treated in the step 2 and has the function of resisting the corrosion of the corrosive gas such as chlorine, the first yttrium oxide coating 4 is further prepared on the surface of the thermoplastic polymer coating 3. According to the embodiment, the first yttrium oxide coating 4 is continuously coated on the thermoplastic polymer coating 3, so that the plasma corrosion resistance of the metal part can be improved, the service life of the metal part is prolonged, and the processing efficiency of plasma processing equipment is improved.
The yttria coating can be formed by one or more of the following processesThe method includes Plasma Enhanced Physical Vapor Deposition (PEPVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Plasma Spray (PS), or sol-gel method (sol-gel), etc. Among them, in order to reduce the porosity of the newly prepared coating layer, it is preferable to use a plasma spraying method. In practical application, the spraying process can select proper spraying equipment according to specific conditions, and set technological parameters such as air flow, spraying distance, current and the like according to the adopted spraying equipment. Wherein the first yttria coating 4 can also be other plasma corrosion resistant coatings, such as yttria and Yttrium Fluoride (YF)3) The mixture of (1) can be applied to the present invention as long as it is a ceramic material that can withstand plasma erosion.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-3 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 covering the surface of the aluminum-containing substrate 1; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer 2; the thermoplastic polymer coating 3 covers the surface of the anodic oxidation layer 2; and the first yttrium oxide coating 4 covers the surface of the thermoplastic polymer coating 3. The internal component of the plasma processing chamber manufactured in the embodiment may be a gas shower head, a mounting substrate of the gas shower head, a gas distribution plate, a plasma confinement ring, a focus ring, an electrostatic chuck, or an inner wall of a reaction chamber of a plasma processing apparatus. The embodiment meets the plasma erosion resistance by means of the yttria coating, and simultaneously seals the pores and cracks of the anodic oxide layer 2 by means of a macromolecule hole sealing method, thereby avoiding chemical corrosion of chlorine gas to the aluminum-containing substrate 1. The internal part of the plasma processing chamber provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
In another preferred embodiment, as shown in FIG. 2, a method for manufacturing internal components of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is formed on the surface of the aluminum-containing substrate 1.
Step 2: and coating a thermoplastic polymer coating 3 on the surface of the anodic oxidation layer 2, and then carrying out heating treatment.
And step 3: and after the heating treatment, removing the thermoplastic polymer coating 3 on the surface of the anodic oxidation layer 2.
And 4, step 4: and preparing a first yttrium oxide coating 4 on the surface of the anodic oxidation layer 2.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-4 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 covering the surface of the aluminum-containing substrate 1; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer 2; and the first yttrium oxide coating 4 covers the surface of the anodic oxidation layer 2.
The present embodiment differs from the first embodiment in that: before the first yttrium oxide coating 4 is prepared, the thermoplastic polymer coating 3 after the heating treatment is removed. For some metal parts with strict requirements on the surface coating thickness, the coating thickness of the surface of the metal part can be controlled by removing the thermoplastic polymer coating 3. The method for removing the coating is preferably a physical grinding method, so that the surface of the anodized layer 2 after the thermoplastic polymer coating 3 is removed has no scratch or other defects, and the coating effect of the first yttrium oxide coating 4 is further facilitated.
In step 2 of this embodiment, the metal member having the thermoplastic polymer coating layer 3 formed thereon is further subjected to a heating treatment, so that microcracks in the anodized layer 2 are sufficiently and preliminarily formed. And the thermoplastic polymer coating 3 is changed from a glass state to a high elastic state, so that the cracks and gaps of the anodic oxide layer 2 are dynamically filled. Thus, although the thermoplastic polymer coating layer 3 on the surface of the anodized layer is removed, the thermoplastic polymer material layer filled with the microcracks remains inside the anodized layer. In the subsequent actual high-temperature working environment, few or no new micro-cracks are formed in the anodized layer 2, and only very slight and almost negligible corrosion is caused, even if new cracks are generated, the thermoplastic polymer filled in the original cracks can still flow at high temperature to cover the new cracksAnd the cracks ensure that the whole part does not crack in a long life cycle, and prevent corrosive gas from reaching the aluminum material layer along the cracks to corrode the part. The thermoplastic polymer layer on the surface of the anodic oxide layer is removed, and a plasma corrosion resistant coating (such as a first yttrium oxide coating) directly exposed to plasma is directly coated on the underlying anodic oxide layer (Al)2O3) And the thermal expansion coefficients of the two materials are close to each other, so that the strength of mutual combination of the two materials is improved, and further cracking and falling off are prevented.
As shown in fig. 3, the first diagram is a scanning electron microscope photograph after the anodized layer 2 is coated, the second diagram is a scanning electron microscope photograph after the thermoplastic polymer coating layer 3 is coated, the third diagram is a scanning electron microscope photograph after the thermoplastic polymer coating layer 3 is removed, and the upper and lower diagrams in each diagram are a low-magnification scanning electron microscope photograph and a high-magnification scanning electron microscope photograph, respectively. As can be seen from fig. 3, the thermoplastic polymer coating 3 realizes dynamic filling of cracks and gaps in the anodized layer 2, thereby preventing permeation of corrosive gases such as chlorine.
The embodiment meets the plasma erosion resistance by means of the yttria coating, and simultaneously seals the pores and cracks of the anodic oxide layer 2 by means of a macromolecule hole sealing method, thereby avoiding chemical corrosion of chlorine gas to the aluminum-containing substrate 1. The internal part of the plasma processing chamber provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
In another preferred embodiment, as shown in FIG. 4, a method for manufacturing internal components of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is formed on the surface of the aluminum-containing substrate 1.
Step 2: and preparing a second yttrium oxide coating 5 on the surface of the anodic oxidation layer 2.
And step 3: and coating a thermoplastic polymer coating 3 on the surface of the second yttrium oxide coating 5, and then carrying out heating treatment.
And 4, step 4: and preparing a first yttrium oxide coating 4 on the surface of the thermoplastic polymer coating 3.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-4 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 covering the surface of the aluminum-containing substrate 1; the second yttrium oxide coating 5 covers the surface of the anodic oxidation layer 2; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second yttrium oxide coating 5; the thermoplastic polymer coating 3 covers the surface of the second yttrium oxide coating 5; and the first yttrium oxide coating 4 covers the surface of the thermoplastic polymer coating 3.
The present embodiment differs from the first embodiment in that: before the thermoplastic polymer coating 3 is coated, a second yttrium oxide coating 5 is prepared on the surface of the anodic oxidation layer 2. Wherein the second yttria coating 5 can also be other plasma corrosion resistant coatings, such as yttria and Yttrium Fluoride (YF)3) The mixture of (1) can be applied to the present invention as long as it is a ceramic material that can withstand plasma erosion. The present embodiment can be applied to the corrosion resistance treatment of the aluminum material which is coated with the yttrium oxide coating on the surface of the anodic oxidation layer 2 at present. The microcracks of the second yttrium oxide coating 5 are fully and preliminarily formed through heating treatment, and the second thermoplastic polymer coating 3 is converted from a glass state to a high elastic state to dynamically fill the cracks and gaps of the second yttrium oxide coating 5, so that the second yttrium oxide coating 5 is prevented from being permeated by corrosive gases such as chlorine and the like, and the chemical corrosion resistance of the metal part is realized. On the basis, a first yttrium oxide coating 4 is formed on the surface of the thermoplastic polymer coating 3 by means of plasma spraying and the like, so that plasma corrosion resistance of the metal part is realized. The embodiment shows that the thermoplastic polymer coating 3 can dynamically fill not only cracks and gaps of the anodized layer 2 but also cracks and gaps of the yttria coating in the high-temperature treatment process, and provides different treatment modes for manufacturing and modifying various internal components of a plasma treatment chamber so as to achieve a wider application range.
The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the second yttrium oxide coating 5 by means of a macromolecule hole sealing method, thereby avoiding chemical corrosion of chlorine gas to the aluminum-containing substrate 1. The internal part of the plasma processing chamber provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
In another preferred embodiment, as shown in FIG. 5, a method for manufacturing internal components of a plasma processing chamber is provided, comprising the steps of:
step 1: an aluminum-containing substrate 1 is provided and an anodized layer 2 is formed on the surface of the aluminum-containing substrate 1.
Step 2: and preparing a second yttrium oxide coating 5 on the surface of the anodic oxidation layer 2.
And step 3: and coating a thermoplastic polymer coating 3 on the surface of the second yttrium oxide coating 5, and then carrying out heating treatment.
And 4, step 4: and after the heating treatment, removing the thermoplastic polymer coating 3 on the surface of the second yttrium oxide coating 5.
And 5: and preparing a first yttrium oxide coating 4 on the surface of the second yttrium oxide coating 5.
The specific structure of the internal components of the plasma processing chamber manufactured through steps 1-5 of this embodiment includes: an aluminum-containing substrate 1; an anodic oxidation layer 2 covering the surface of the aluminum-containing substrate 1; the second yttrium oxide coating 5 covers the surface of the anodic oxidation layer 2; the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second yttrium oxide coating 5; and the first yttrium oxide coating 4 covers the surface of the second yttrium oxide coating 5.
The present embodiment differs from the third embodiment in that: before the first yttrium oxide coating 4 is prepared, the thermoplastic polymer coating 3 after the heating treatment is removed.
For some metal parts with strict requirements on the surface coating thickness, the coating thickness of the surface of the metal part can be controlled by removing the thermoplastic polymer coating 3. The method for removing the coating is preferably a physical grinding method, so that the surface of the second yttrium oxide coating 5 after the thermoplastic polymer coating 3 is removed has no scratch or other defects, and the coating effect of the first yttrium oxide coating 4 is further facilitated.
In step 2 of this embodiment, the metal member on which the thermoplastic polymer coating layer 3 is formed is further subjected to a heating treatment, so that the microcracks of the second yttria coating layer 5 are sufficiently and previously formed. And the thermoplastic polymer coating 3 is changed from a glass state to a high elastic state, so that the dynamic filling of cracks and gaps of the second yttrium oxide coating 5 is realized. Thus, although the thermoplastic polymer coating 3 is removed, in the subsequent actual high temperature operating environment, there is little or no new microcrack formation in the second yttria coating 5, resulting in very little, if any, corrosion.
The embodiment meets the plasma erosion resistance by means of the yttrium oxide coating, and simultaneously seals the pores and cracks of the second yttrium oxide coating 5 by means of a macromolecule hole sealing method, thereby avoiding chemical corrosion of chlorine gas to the aluminum-containing substrate 1. The internal part of the plasma processing chamber provided by the embodiment not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
In summary, the thermoplastic polymer coating is coated on the surface of the anodic oxide layer or the yttria coating, and the polymer is converted from a glass state to a high-elasticity state by utilizing the characteristics of the thermoplastic polymer coating under the action of heating, so that the cracks and gaps of the anodic oxide layer or the yttria coating are dynamically filled and self-repaired. The invention meets the plasma erosion resistance by the yttria coating, seals the pores and cracks of the yttria coating or the anodic oxide layer by a macromolecule hole sealing method, avoids chlorine gas from permeating into the pores, and improves the corrosion resistance of parts in the plasma processing chamber to corrosive gases such as chlorine gas and the like.
The hole sealing method of the thermoplastic polymer coating adopted in the manufacturing process of the internal part of the plasma processing chamber is not limited by the shape and the structure of the part, and has the advantages of simple process, easy implementation and low cost. The thermoplastic polymer coating can realize dynamic hole sealing of cracks of the yttria coating or the anodic oxide layer and self-repair of the thermoplastic polymer coating in a crack area under the working condition of high temperature of 50-160 ℃, and thoroughly prevents corrosive gases such as chlorine and the like from permeating in the using process. The internal part of the plasma processing chamber not only realizes the plasma erosion resistance, but also improves the chlorine corrosion resistance.
While the present invention has been described in detail with reference to the preferred embodiments, it should be understood that the above description should not be taken as limiting the invention. Various modifications and alterations to this invention will become apparent to those skilled in the art upon reading the foregoing description. Accordingly, the scope of the invention should be determined from the following claims. Furthermore, any reference signs in the claims shall not be construed as limiting the claim concerned; the word "comprising" does not exclude the presence of other devices or steps than those listed in a claim or the specification; the terms "first," "second," and the like are used merely to denote names, and do not denote any particular order.
Claims (11)
1. A method of manufacturing an internal component of a plasma processing chamber, the method comprising: providing an aluminum-containing substrate, sequentially forming an anodic oxidation layer and a thermoplastic polymer coating on the surface of the aluminum-containing substrate along the thickness direction of the aluminum-containing substrate, and heating the part after coating the thermoplastic polymer coating so that the thermoplastic polymer coating fills cracks in the anodic oxidation layer; and after the heating treatment is finished, coating a first plasma corrosion resistant coating on the thermoplastic polymer coating, wherein the first plasma corrosion resistant coating comprises yttrium oxide.
2. The method of claim 1, wherein after the heating step, the thermoplastic polymer coating is removed from the surface of the anodized layer, and a first plasma-resistant coating is formed on the surface of the anodized layer.
3. The method of claim 2, wherein the thermoplastic polymer coating is removed by physical abrasion.
4. The method of claim 1, wherein a second plasma-resistant coating is formed on a surface of the anodized layer, and a thermoplastic polymer coating is applied to a surface of the second plasma-resistant coating, wherein the second plasma-resistant coating comprises yttria.
5. The method of claim 4, wherein the heating step removes the thermoplastic polymer coating from the surface of the second plasma-resistant coating prior to forming the first plasma-resistant coating on the surface of the second plasma-resistant coating.
6. The method of any of claims 1-5, wherein the heating temperature is from 50 ℃ to 180 ℃.
7. The method of any of claims 1-5, wherein the thermoplastic polymer coating is a thermoplastic acrylic coating.
8. A plasma processing chamber interior component, comprising:
an aluminum-containing substrate;
the anodic oxidation layer and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate;
and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the anodic oxide layer.
9. The plasma processing chamber interior component of claim 8, further comprising a thermoplastic polymer coating disposed between the anodized layer and the first plasma resistant coating.
10. A plasma processing chamber interior component, comprising:
an aluminum-containing substrate;
the anodic oxidation layer, the second plasma corrosion resistant coating and the first plasma corrosion resistant coating are sequentially arranged along the thickness direction of the aluminum-containing substrate;
and the thermoplastic polymer hole sealing structure is filled in the microcracks formed by the second plasma corrosion resistant coating.
11. The plasma processing chamber interior component of claim 10, further comprising a thermoplastic polymer coating disposed between the second plasma-resistant coating and the first plasma-resistant coating.
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| CN201911017548.6A CN112713072B (en) | 2019-10-24 | 2019-10-24 | Internal parts of plasma processing chamber and method for manufacturing the same |
| TW109135588A TWI797487B (en) | 2019-10-24 | 2020-10-14 | Plasma processing chamber internal components and manufacturing method thereof |
| KR1020200137460A KR102435161B1 (en) | 2019-10-24 | 2020-10-22 | Plasma processing chamber internal components and method of mantufacturing the same |
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| EP0079007A1 (en) * | 1981-11-05 | 1983-05-18 | PTG PLASMA-OBERFLÄCHENTECHNIK GmbH | Method of sealing a porous coating |
| JPH11104560A (en) * | 1997-10-03 | 1999-04-20 | Sky Alum Co Ltd | Resin coated aluminum alloy member and its production |
| CN1516535A (en) * | 2002-11-28 | 2004-07-28 | ���������ƴ���ʽ���� | Plasma processing container internal parts |
| CN1663017A (en) * | 2002-06-27 | 2005-08-31 | 蓝姆研究公司 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| US20100323124A1 (en) * | 2009-06-19 | 2010-12-23 | Saint-Gobain Ceramics & Plastics, Inc. | Sealed plasma coatings |
| US20180240649A1 (en) * | 2017-02-17 | 2018-08-23 | Lam Research Corporation | Surface coating for plasma processing chamber components |
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| JP3504872B2 (en) * | 1998-11-20 | 2004-03-08 | 東西化学株式会社 | Coating film and method of forming coating film |
| JP5146865B2 (en) * | 2004-11-10 | 2013-02-20 | 株式会社フクダコーポレーション | Decorating aluminum molded products |
| EP2982774A4 (en) * | 2013-04-04 | 2017-03-22 | Toray Advanced Film Co., Ltd. | Gas barrier film and method for producing same |
| JP6788549B2 (en) * | 2017-06-05 | 2020-11-25 | 信越化学工業株式会社 | Temporary adhesive film roll for substrate processing, manufacturing method of thin substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0079007A1 (en) * | 1981-11-05 | 1983-05-18 | PTG PLASMA-OBERFLÄCHENTECHNIK GmbH | Method of sealing a porous coating |
| JPH11104560A (en) * | 1997-10-03 | 1999-04-20 | Sky Alum Co Ltd | Resin coated aluminum alloy member and its production |
| CN1663017A (en) * | 2002-06-27 | 2005-08-31 | 蓝姆研究公司 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| CN1516535A (en) * | 2002-11-28 | 2004-07-28 | ���������ƴ���ʽ���� | Plasma processing container internal parts |
| US20100323124A1 (en) * | 2009-06-19 | 2010-12-23 | Saint-Gobain Ceramics & Plastics, Inc. | Sealed plasma coatings |
| US20180240649A1 (en) * | 2017-02-17 | 2018-08-23 | Lam Research Corporation | Surface coating for plasma processing chamber components |
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| KR20210049686A (en) | 2021-05-06 |
| TWI797487B (en) | 2023-04-01 |
| TW202116426A (en) | 2021-05-01 |
| CN112713072B (en) | 2024-03-12 |
| KR102435161B1 (en) | 2022-08-24 |
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