CN112663013B - 一种真空蒸镀用基片辅助降温系统及工作方法 - Google Patents

一种真空蒸镀用基片辅助降温系统及工作方法 Download PDF

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CN112663013B
CN112663013B CN202011474873.8A CN202011474873A CN112663013B CN 112663013 B CN112663013 B CN 112663013B CN 202011474873 A CN202011474873 A CN 202011474873A CN 112663013 B CN112663013 B CN 112663013B
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熊继光
赵志国
秦校军
肖平
赵东明
邬俊波
董超
刘家梁
王百月
冯笑丹
梁思超
王森
张�杰
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Huaneng Renewables Corp Ltd
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Abstract

本发明公开了一种真空蒸镀用基片辅助降温系统及工作方法,包括设置在蒸镀舱室内的水冷基板,以及开设在水冷基板上的进水口和出水口,所述水冷基板上开设通孔,安装有第一阀门的连接管一端与通孔连接,连接管的另一端与舱室外液氮存储装置连通;所述蒸镀舱还连接有分子泵,所述分子泵与蒸镀仓之间通过管道连通,管道上安装有第二阀门。在传统水冷降温方法的基础上,添加辅助降温装置,在传统水冷无法满足降温需求的时候,对基片进行强制降温,提高降温效率,避免电池膜层过热受损。

Description

一种真空蒸镀用基片辅助降温系统及工作方法
技术领域
本发明属于真空蒸镀领域,具体涉及一种真空蒸镀用基片辅助降温系统及工作方法。
背景技术
近年来发现的钙钛矿型太阳能电池由于高转换效率、低成本、环境友善、产品可挠化等优点正在受到越来越广泛的关注。其中,新型钙钛矿性太阳能电池的光电转换效率在短短几年内提升了数倍,表现出非常优异的光电性能,而钙钛矿太阳能电池的制备过程中经常用到PVD(物理气相沉积)技术,其中尤其以真空蒸镀最为常用,蒸镀过程中往往伴随着长时间的高温,钙钛矿电池基板在蒸镀时会由于温度过高而损坏电池功能层,因此,基片的温度控制问题亟待解决。而传统的基片降温通常采用刚性的水冷基板降温方法,由于大组件基片置于蒸镀位置时会发生一定程度的弯曲,而刚性的降温装置不能保证水冷基板和电池基片的紧密接触,而且最重要的是,高真空环境缺乏传热介质,在无法形成紧密接触的情况下,基片降温效果差。
发明内容
为了解决现有技术中存在的问题,本发明的主要目的在于提供一种真空蒸镀用基片辅助降温系统及工作方法,在传统水冷降温方法的基础上,添加辅助降温装置,在传统水冷无法满足降温需求的时候,对基片进行强制降温,提高降温效率,避免电池膜层过热受损。
为达上述目的,本发明采用技术方案是:一种真空蒸镀用基片辅助降温系统,包括设置在蒸镀舱室内的水冷基板,以及开设在水冷基板上的进水口和出水口,所述水冷基板上开设通孔,安装有第一阀门的连接管一端与通孔连接,连接管的另一端与舱室外液氮存储装置连通;所述蒸镀舱还连接有分子泵,所述分子泵与蒸镀舱之间通过管道连通,管道上安装有第二阀门。
进一步的,所述第一阀门和第二阀门均为电磁阀门。
进一步的,所述第二阀门和第一阀门同时控制。
进一步的,所述通孔为螺纹通孔,所述水冷基板上开设有至少两个通孔。
进一步的,所述水冷基板和电池基片之间还设置有传热介质。
进一步的,还包括自动控制系统,所述自动控制系统包括用于监测电池基片的温度传感器,所述自动控制系统里设置有温度阈值,当温度传感器监测到电池基片的温度超出温度阈值后,控制第一阀门和第二阀门打开,连通已启动的分子泵。
进一步的,所述水冷基板下安装有卡槽,卡槽通过紧固装置与水冷基板进行连接,所述电池基片置于水冷基板下方边缘的卡槽中。
进一步的,所述紧固装置为调节螺栓,通过调节螺栓的旋转调节可控制卡槽上升或者下降,进而实现卡槽与水冷基板之间间距的调节,在电池基片发生弯曲时,调节紧固装置缩小卡槽与水冷基板之间的间距,使水冷基板与电池基片靠近。
本发明的另外一个目的是提供一种真空蒸镀用基片辅助降温系统的工作方法,当水冷基板不能满足电池基片的降温需求时,启动第一电磁阀门释放液氮存储装置内的液氮对电池基片进行降温,并且,在启动第一电磁阀门的同时启动第二电磁阀门,抽出舱室内的氮气,维持蒸镀舱室的本底真空度。
与现有技术相比,本发明至少具有以下有益效果,现有的水冷降温装置只能使刚性的冷却基板和待降温组件形成点接触,在缺乏传热介质的高真空环境中,降温效果不理想。本发明在冷却基板上开设螺纹通孔,连接有可控制液氮释放的液氮存储装置,并配备备用分子泵与液氮配合形成一进一出,在水冷降温无法满足降温需求时,控制释放液氮,并开启备用分子泵与蒸镀舱之间的阀门,在维持蒸镀舱本底真空度的同时,释放的液氮对电池基片进行强制降温,使电池基片处在理想的温度环境,避免基片受损。
进一步的,第一阀门和第二阀门均为电磁阀门,并且所述第二阀门和第一阀门同时控制,操作更加简单,所述紧固装置为调节螺栓,通过调节螺栓的旋转调节可控制卡槽上升或者下降,进而实现卡槽与水冷基板之间间距的调节,通过对间距进行调节,进一步提升降温效果。
附图说明
图1为基片辅助降温系统的一种范例示意图。
附图中:水冷基板101,进水口102和出水口103,螺纹通孔104,电磁阀门105,连接管106,液氮存储装置107,备用分子泵108,阀门109,电池基片110,卡槽111,紧固装置112。
具体实施方式
下面结合附图和具体实施方式对本发明做进一步说明。
如图1所示,一种真空蒸镀用基片辅助降温系统,包括设置在蒸镀舱室内的水冷基板101,以及开设在水冷基板101上的进水口102和出水口103,所述水冷基板101上开设通孔104,安装有第一阀门105的连接管106一端与通孔104连接,连接管106的另一端与舱室外液氮存储装置107连通;所述蒸镀舱还连接有分子泵108,所述分子泵108与蒸镀舱之间通过管道连通,管道上安装有第二阀门109;所述第一阀门105和第二阀门109均为电磁阀门,在本发明的某一优选实施例中,所述第二阀门109和第一阀门105同时控制。
在本发明的某一优选实施例中,所述通孔104为螺纹通孔,通过螺纹结构的设计,能够有效的控制连接管106的一端,连接关系更加稳定,保证了使用效果,并且所述水冷基板101上开设有至少两个通孔104,能够根据具体的需求连接足够的连接管106进行液氮供给,保证降温效果和降温效率。
还包括自动控制系统,所述自动控制系统包括用于监测电池基片110的温度传感器,所述自动控制系统里设置有温度阈值,当温度传感器监测到电池基片110的温度超出温度阈值后,控制第一阀门105和第二阀门109打开,连通已启动的分子泵108。
所述水冷基板101和电池基片110之间还设置有传热介质,在本发明的某一优选实施例中,传热介质采用为多孔结构,比如在某一具体实施例中,采用的传热结构类似于海绵,氮气可以通过传热结构中的丰富孔洞抵达电池基片110进行直接降温,并且能够快速高效的对传热介质进行降温,具有意想不到的降温效果;并且液氮在真空环境会急速膨胀,即便第一阀门105有缓冲作用也会有一定的冲击性,传热介质在充当传热介质的基础上,还能够对液氮汽化的冲击起到缓冲作用,维持降温系统的稳定,提升了作业质量。
在本发明的另一实施例中,所述水冷基板101下安装有卡槽111,卡槽111通过紧固装置112与水冷基板101进行连接,所述电池基片110置于水冷基板101下方边缘的卡槽111中,所述紧固装置112为调节螺栓,通过调节螺栓的旋转调节可控制卡槽111上升或者下降,进而实现卡槽111与水冷基板101之间间距的调节,在电池基片110发生弯曲时,调节紧固装置112缩小卡槽111与水冷基板101之间的间距,使水冷基板101与电池基片110靠近。
本发明的一种真空蒸镀用基片辅助降温系统的工作方法,当水冷基板101不能满足电池基片110的降温需求时,启动第一电磁阀门105释放液氮存储装置107内的液氮对电池基片110进行降温,并且,在启动第一电磁阀门105的同时启动第二电磁阀门109,抽出舱室内的氮气,维持蒸镀舱室的本底真空度。
本发明的优势在于:现有的水冷降温装置只能使刚性的冷却基板和待降温组件形成点接触,在缺乏传热介质的高真空环境中,降温效果不理想。本发明在冷却基板上开设螺纹通孔,连接有可控制液氮释放的液氮存储装置,并配备备用分子泵,在水冷降温无法满足降温需求时,控制释放液氮,并开启备用分子泵与蒸镀舱之间的阀门,在维持蒸镀舱本底真空度的同时,释放的液氮对电池基片进行强制降温,使电池基片处在理想的温度环境,避免基片受损。

Claims (5)

1.一种真空蒸镀用基片辅助降温系统,其特征在于,包括设置在蒸镀舱室内的水冷基板(101),以及开设在水冷基板(101)上的进水口(102)和出水口(103),所述水冷基板(101)上开设通孔(104),安装有第一阀门(105)的连接管(106)一端与通孔(104)连接,连接管(106)的另一端与舱室外液氮存储装置(107)连通;
所述蒸镀舱还连接有分子泵(108),所述分子泵(108)与蒸镀舱之间通过管道连通,管道上安装有第二阀门(109);
所述水冷基板(101)下安装有卡槽(111),卡槽(111)通过紧固装置(112)与水冷基板(101)进行连接,电池基片(110)置于水冷基板(101)下方边缘的卡槽(111)中;
所述紧固装置(112)为调节螺栓,通过调节螺栓的旋转调节可控制卡槽(111)上升或者下降,进而实现卡槽(111)与水冷基板(101)之间间距的调节,在电池基片(110)发生弯曲时,调节紧固装置(112)缩小卡槽(111)与水冷基板(101)之间的间距,使水冷基板(101)与电池基片(110)靠近;
所述第一阀门(105)和第二阀门(109)均为电磁阀门;
所述第二阀门(109)和第一阀门(105)同时控制。
2.根据权利要求1所述的真空蒸镀用基片辅助降温系统,其特征在于,所述通孔(104)为螺纹通孔,所述水冷基板(101)上开设有至少两个通孔(104)。
3.根据权利要求1所述的真空蒸镀用基片辅助降温系统,其特征在于,所述水冷基板(101)和电池基片(110)之间还设置有传热介质。
4.根据权利要求1所述的真空蒸镀用基片辅助降温系统,其特征在于,还包括自动控制系统,所述自动控制系统包括用于监测电池基片(110)的温度传感器,所述自动控制系统里设置有温度阈值,当温度传感器监测到电池基片(110)的温度超出温度阈值后,控制第一阀门(105)和第二阀门(109)打开,连通已启动的分子泵(108)。
5.根据权利要求1所述的一种真空蒸镀用基片辅助降温系统的工作方法,其特征在于,当水冷基板(101)不能满足电池基片(110)的降温需求时,启动第一电磁阀门(105)释放液氮存储装置(107)内的液氮对电池基片(110)进行降温,并且,在启动第一电磁阀门(105)的同时启动第二电磁阀门(109),抽出舱室内的氮气,维持蒸镀舱室的本底真空度。
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