CN112613591B - Anti-counterfeiting label and preparation method thereof - Google Patents

Anti-counterfeiting label and preparation method thereof Download PDF

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Publication number
CN112613591B
CN112613591B CN202011593887.1A CN202011593887A CN112613591B CN 112613591 B CN112613591 B CN 112613591B CN 202011593887 A CN202011593887 A CN 202011593887A CN 112613591 B CN112613591 B CN 112613591B
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layer
image
laser
photosensitive polymer
optical micro
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CN112613591A (en
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胡立伟
胡祖元
陈聪
苗春龙
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Suzhou Image Laser Technology Co ltd
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Suzhou Image Laser Technology Co ltd
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/0772Physical layout of the record carrier
    • G06K19/07722Physical layout of the record carrier the record carrier being multilayered, e.g. laminated sheets

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Credit Cards Or The Like (AREA)

Abstract

The invention relates to the technical field of anti-counterfeiting, and discloses an anti-counterfeiting label and a preparation method thereof. The anti-counterfeit label comprises: the optical micro-nano structure comprises a substrate layer, a photosensitive polymer layer, a resin layer, an information layer, a metal layer and an adhesive layer which are sequentially laminated, wherein the photosensitive polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure. In the invention, multiple anti-counterfeiting functions are formed by combining the optical micro-nano structure with the positioning laser lithography, so that the anti-counterfeiting label has better anti-counterfeiting capability.

Description

Anti-counterfeiting label and preparation method thereof
Technical Field
The invention relates to the technical field of anti-counterfeiting, in particular to an anti-counterfeiting label and a preparation method thereof.
Background
Currently, with the rapid development of electronic commerce, a wide variety of commodities continuously enter the market. Many lawless persons can simulate fake products in a large quantity for a good deal. The fake and inferior commodity brings serious economic loss to regular commodity producers, seriously damages the life and property safety of vast consumers, and causes extremely bad social influence. Along with the progress of technology, anti-counterfeiting means are more advanced and more diversified. In order to prevent the products from being counterfeited, most of commodity manufacturers adopt anti-counterfeiting labels to prevent the produced commodities from being counterfeited.
As the threshold of the traditional anti-counterfeiting technology being copied and cracked is lower, new anti-counterfeiting labels are needed to be designed so as to have better anti-counterfeiting capability.
Disclosure of Invention
In order to solve the technical problems, the invention provides an anti-counterfeiting label and a preparation method thereof, wherein multiple anti-counterfeiting functions are formed by combining an optical micro-nano structure with positioning laser lithography, so that the anti-counterfeiting label has better anti-counterfeiting capability.
The technical scheme provided by the invention is as follows:
the utility model provides an anti-fake label, includes substrate layer, photosensitive polymer layer, resin layer, information layer, metal layer and glue film that stacks gradually, photosensitive polymer layer is provided with laser lithography image, the information layer is provided with optics micro-nano structure.
Further preferably, the thickness of the substrate layer is 20-30um, the resolution of the photosensitive polymer layer is less than 5um, the thickness of the resin layer is 1-1.2um, the grating texture fringe period of the optical micro-nano structure is 200-300nm, and the thickness of the metal layer is 30-40nm.
Further preferably, the substrate layer is polyethylene terephthalate, and the adhesive layer is pressure sensitive adhesive or hot melt adhesive;
and a release paper layer is arranged above the adhesive layer.
Further preferred, the optical micro-nano structure has an optical effect comprising a combination of at least one or more of laser reproduction, metamerism, orthonormal grating, diffractive relief, fresnel lens, true color, three-dimensional stereo, micro-image.
The other technical scheme provided by the invention is as follows:
a method of manufacturing an anti-counterfeit label as claimed in any one of the preceding claims, comprising the steps of:
uniformly coating the photosensitive polymer coating on a substrate, and baking to form a photosensitive polymer layer;
coating diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
tightly attaching a metal material on the resin layer to form a metal layer;
copying the predesigned micro-nano texture structure on the metal layer to form an optical micro-nano structure;
coating colloid on the metal layer, and baking to form a glue layer;
positioning according to the arrangement period length of the optical micro-nano structure texture image, capturing an optical micro-structure texture image target by a CCD of the laser lithography device at high speed, and performing position matching alignment on the optical micro-nano structure texture image and the laser lithography image;
and outputting laser by the laser lithography equipment to carry out image lithography on the photosensitive polymer layer to obtain a laser lithography image.
Further preferably, the photosensitive polymer coating is uniformly coated on the substrate, and a photosensitive polymer layer is formed after baking, specifically comprising the steps of:
uniformly coating the photosensitive polymer coating with the diluted solid content of 10% on a polyethylene terephthalate substrate in a micro-concave coating mode of an anilox roller, and baking and volatilizing in a baking channel of a coating machine to obtain the photosensitive polymer layer with the coating weight of 0.6-0.7 g/square meter.
Further preferably, the diluted resin is coated on the photosensitive polymer layer, and the resin layer is formed after baking, specifically comprising the steps of:
coating resin with the solid content of 20% on the photosensitive polymer layer through an anilox roller coating device, and baking and volatilizing through a baking channel of a coater to obtain a resin layer with the coating weight of 0.8-1 g/square meter;
and copying the micro-nano texture structure which is designed in advance on the coated metal layer in an imprinting mode through micro-nano structure mould pressing copying equipment to obtain the micro-nano texture structure.
Further preferably, the positioning according to the arrangement cycle length of the optical micro-nano structure texture image, the CCD of the laser lithography device captures the optical micro-structure texture image target at high speed, and performs position matching alignment on the optical micro-nano structure texture image and the laser lithography image, specifically comprising the steps of:
the intermittent positioning and dragging system is used for positioning and moving to the position below the laser vibrating mirror according to the arrangement period length of the optical micro-nano structure texture image, the CCD of the laser lithography equipment is used for capturing the optical micro-structure texture image target at a high speed, and the system is used for carrying out position matching alignment on the optical micro-nano structure texture image and the laser lithography image, so that the alignment accuracy dimension is within 0.1mm.
Further preferably, the laser lithography device outputs laser to perform image lithography on the photosensitive polymer layer to obtain a laser lithography image, and specifically includes the steps of:
the laser lithography equipment outputs laser with the pulse frequency of 1000KHZ, and simultaneously a vibrating mirror of the laser lithography equipment swings in two-dimensional directions according to a preset image, and image lithography is performed on a photosensitive polymer layer of a label material in a laser spot mode at a 30% overlapping period of a laser spot, so that an optical micro-nano structure texture image and a laser lithography image with alignment precision within 0.1mm are obtained.
Further preferably, the method further comprises the steps of:
the laser lithography image is subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of the anti-counterfeiting mark of the laser lithography is inconsistent by combining different optical micro-nano structures and positioning.
Compared with the prior art, the anti-counterfeiting label and the preparation method thereof have the beneficial effects that:
the anti-counterfeiting label comprises a substrate layer, a photosensitive polymer layer, a resin layer, an information layer, a metal layer and an adhesive layer which are sequentially laminated, wherein the photosensitive polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure; multiple anti-counterfeiting functions are formed through combining an optical micro-nano structure with positioning laser lithography, so that the anti-counterfeiting label has better anti-counterfeiting capacity; the laser lithography image can be converted in a variable data form through a software algorithm, so that the image-text information of each optical micro-nano structure combined with the anti-counterfeiting mark for positioning laser lithography is different, one mark-to-one code or one mark-to-one graph is realized, and the carrier has better anti-counterfeiting and traceability.
Drawings
The above features, technical features, advantages and implementation thereof will be further described in the following detailed description of preferred embodiments with reference to the accompanying drawings in a clearly understandable manner.
FIG. 1 is a schematic structural diagram of an anti-counterfeit label according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of another view angle of an anti-counterfeit label according to another embodiment of the present invention;
FIG. 3 is a schematic illustration of an optical micro-nano structured texture image and a laser lithography registration image according to another embodiment of the present invention;
fig. 4 is a flowchart of a method for manufacturing an anti-counterfeit label according to another embodiment of the present invention.
Reference numerals illustrate:
1. the optical micro-nano structure comprises a substrate layer, a photosensitive polymer layer, a resin layer, an optical micro-nano structure, a metal layer, a glue layer, a release paper layer, a carrier, an optical micro-nano structure texture image target, an optical micro-nano structure texture image and a laser lithography image, wherein the substrate layer, the photosensitive polymer layer, the resin layer, the optical micro-nano structure, the metal layer, the glue layer, the release paper layer, the carrier and the optical micro-nano structure texture image target are respectively arranged in sequence, the optical micro-nano structure texture image target is arranged in sequence, the optical micro-nano structure texture image is arranged in sequence, and the optical micro-nano structure texture image is formed in sequence.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system configurations, techniques, etc. in order to provide a thorough understanding of the embodiments of the present application. However, it will be apparent to one skilled in the art that the present application may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.
It should be understood that the terms "comprises" and/or "comprising," when used in this specification and the appended claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
For the sake of simplicity of the drawing, the parts relevant to the present invention are shown only schematically in the figures, which do not represent the actual structure thereof as a product. Additionally, in order to simplify the drawing for ease of understanding, components having the same structure or function in some of the drawings are shown schematically with only one of them, or only one of them is labeled. Herein, "a" means not only "only this one" but also "more than one" case.
It should be further understood that the term "and/or" as used in this specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes such combinations.
In the embodiment shown in the drawings, indications of orientation (such as up, down, left, right, front and rear) are used to explain the structure and movement of the various components of the invention are not absolute but relative. These descriptions are appropriate when the components are in the positions shown in the drawings. If the description of the location of these components changes, then the indication of these directions changes accordingly.
In addition, in the description of the present application, the terms "first," "second," and the like are used merely to distinguish between descriptions and are not to be construed as indicating or implying relative importance.
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following description will explain the specific embodiments of the present invention with reference to the accompanying drawings. It is evident that the drawings in the following description are only examples of the invention, from which other drawings and other embodiments can be obtained by a person skilled in the art without inventive effort.
As a specific embodiment, as shown in fig. 1, the embodiment provides an anti-counterfeit label, which comprises a substrate layer 1, a photosensitive polymer layer 2, a resin layer 3, an information layer, a metal layer 5 and an adhesive layer 6 which are sequentially laminated, wherein the photosensitive polymer layer 2 is provided with a laser lithography image, and the information layer is provided with an optical micro-nano structure 4. The anti-counterfeiting label can be a self-adhesive label or a positioning thermoprint label, and the anti-counterfeiting label combines with positioning laser lithography to form multiple anti-counterfeiting functions through an optical micro-nano structure, so that the anti-counterfeiting label has better anti-counterfeiting capability.
Specifically, the substrate layer 1 is polyethylene terephthalate, and the thickness of the substrate layer 1 is 20-30um. The photosensitive polymer layer 2 is formed on the upper surface of the substrate layer 1, and the resolution of the photosensitive polymer layer 2 is less than 5um. The resin layer 3 is formed on the upper surface of the photosensitive polymer layer 2, and the thickness of the resin layer 3 is 1-1.2um. The optical micro-nano structure 4 is attached on the resin layer 3, and the grating grain fringe period of the optical micro-nano structure 4 is 200-300nm. The resin layer 3 is provided with a metal layer 5, and the thickness of the metal layer 5 is 30-40nm. The metal layer 5 is provided with an adhesive layer 6, the adhesive layer 6 is pressure-sensitive adhesive or hot melt adhesive, the pressure-sensitive adhesive has self-adhesion, and the hot melt adhesive has hot adhesion performance. A release paper layer 7 is also arranged above the adhesive layer 6, and the release paper layer 7 is glassine release paper. The security tag can be adhered to the carrier 8 by removing the release paper layer 7.
Further, as shown in fig. 2 and 3, the intermittent positioning and dragging system positions and moves to the lower part of the laser vibrating mirror according to the arrangement period length of the optical micro-nano structure texture image 10, at this time, the CCD of the laser lithography device captures the optical micro-structure texture image target 9 at high speed, and the device system automatically performs position matching alignment on the optical micro-nano structure texture image 10 and the laser lithography image 11 in the interior, and the alignment accuracy is within 0.1mm. And carrying out image lithography on the photosensitive polymer layer 2 of the label material by laser, thereby obtaining an optical micro-nano structure texture image 10 and a laser lithography image 11 with alignment accuracy within 0.1mm. The optical micro-nano structure 4 has an optical effect, wherein the optical effect comprises at least one or a combination of a plurality of laser reproduction, homomorphic image, orthogonal grating, diffraction relief, fresnel lens, true color, three-dimensional solid and micro-image. The anti-counterfeiting label can be composed of various optical micro-nano structure images and laser lithography images. The optical micro-nano structure 4 can be made by electron beam, projection direct write exposure or double beam interference exposure, but is not limited to the electron beam, projection direct write exposure or double beam interference exposure. The optical micro-nano structure is provided with a predesigned specific image graph, the laser lithography image is made by single beam pulse dotting, the single beam pulse dot resolution is less than 5um, the laser pulse repetition frequency is higher than 1000KHZ, the laser single beam is controlled by a two-dimensional galvanometer, the overlapping period of the laser pulse dots is 30% of the dot diameter, and the positioning precision of the optical micro-nano structure image and the laser lithography image is 0.1mm.
In another embodiment, as shown in fig. 4, on the basis of the foregoing embodiment, the present embodiment provides a method for preparing an anti-counterfeit label, including the steps of:
s100, uniformly coating the photosensitive polymer coating on a substrate, and baking to form a photosensitive polymer layer;
specifically, a photosensitive polymer coating with the diluted solid content of 10% is uniformly coated on a polyethylene terephthalate substrate in a micro-concave coating mode of an anilox roller, and the photosensitive polymer layer with the coating weight of 0.6-0.7 g/square meter is obtained after baking and volatilizing in a baking channel of a coater.
S200, coating diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
specifically, resin with the solid content of 20% is coated on a photosensitive polymer layer through an anilox roller coating device, and the resin layer with the coating weight of 0.8-1 g/square meter is obtained after baking and volatilizing through a baking channel of a coater.
S300, tightly attaching a metal material on the resin layer to form a metal layer;
specifically, a vacuum coating metal layer is obtained by closely adhering a metal material to a resin layer by evaporation means by a roll-to-roll vacuum coating apparatus.
S400, copying a predesigned micro-nano texture structure on the metal layer to form an optical micro-nano structure;
specifically, the micro-nano texture structure which is designed in advance is copied on the coated metal layer in an imprinting mode through micro-nano structure mould pressing copying equipment, and the micro-nano texture structure is obtained.
S500, coating colloid on the metal layer, and baking to form a glue layer;
specifically, the colloid is coated on the metal layer by comma knife coating equipment or other coating equipment, the adhesive layer is obtained after baking in a drying tunnel of comma knife coating equipment or other coating equipment, and the pressure-sensitive self-adhesive colloid is only required to cover release paper on the surface of the colloid in a roll-to-roll manner.
S600, positioning according to the arrangement period length of the optical micro-nano structure texture image, capturing an optical micro-structure texture image target by a CCD of the laser lithography device at high speed, and performing position matching alignment on the optical micro-nano structure texture image and the laser lithography image;
specifically, the intermittent positioning and dragging system is used for positioning and moving to the position below the laser vibrating mirror according to the arrangement period length of the optical micro-nano structure texture image, the CCD of the laser lithography equipment is used for capturing the optical micro-structure texture image target at a high speed, and the system is used for carrying out position matching alignment on the optical micro-nano structure texture image and the laser lithography image, so that the alignment accuracy dimension is within 0.1mm.
And S700, outputting laser by the laser lithography equipment to carry out image lithography on the photosensitive polymer layer, so as to obtain a laser lithography image.
Specifically, the laser lithography device outputs laser with the pulse frequency of 1000KHZ, and simultaneously a vibrating mirror of the laser lithography device swings in two-dimensional directions according to a preset image, and image lithography is performed on a photosensitive polymer layer of a label material in a laser spot mode at a 30% overlapping period of a laser spot, so that an optical micro-nano structure texture image and a laser lithography image with alignment accuracy within 0.1mm are obtained.
Further, the laser lithography image is subjected to image conversion in a variable data form through a software algorithm, so that each optical micro-nano structure is combined with the image-text information of the anti-counterfeiting mark of the positioning laser lithography to realize one mark-by-one code or one mark-by-one graph.
The anti-counterfeiting label with the optical micro-nano structure combined with positioning laser lithography, which can be used for pasting, is obtained through the steps, because the anti-counterfeiting label is provided with the pressure sensitive adhesive, the anti-counterfeiting label with the optical micro-nano structure combined with positioning laser lithography can be manually taken off from the glassine release paper and then pasted on the surface of a target object, the package of the target object or the attachment of the target object, for example: commodity hang-ups, business cards, anti-counterfeiting cards, etc.
In the foregoing embodiments, the descriptions of the embodiments are focused on, and the parts of a certain embodiment that are not described or depicted in detail may be referred to in the related descriptions of other embodiments.
It should be noted that the above embodiments can be freely combined as needed. The foregoing is merely a preferred embodiment of the present invention and it should be noted that modifications and adaptations to those skilled in the art may be made without departing from the principles of the present invention, which are intended to be comprehended within the scope of the present invention.

Claims (9)

1. The preparation method of the anti-counterfeiting label is characterized in that the anti-counterfeiting label comprises a substrate layer, a photosensitive polymer layer, a resin layer, an information layer, a metal layer and a glue layer which are sequentially laminated, wherein the photosensitive polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure;
the preparation method comprises the following steps:
uniformly coating the photosensitive polymer coating on a substrate, and baking to form a photosensitive polymer layer;
coating diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
tightly attaching a metal material on the resin layer to form a metal layer;
copying the predesigned micro-nano texture structure on the metal layer to form an optical micro-nano structure;
coating colloid on the metal layer, and baking to form a glue layer;
positioning according to the arrangement period length of the optical micro-nano structure texture image, capturing an optical micro-structure texture image target by a CCD of the laser lithography device at high speed, and performing position matching alignment on the optical micro-nano structure texture image and the laser lithography image;
and outputting laser by the laser lithography equipment to carry out image lithography on the photosensitive polymer layer to obtain a laser lithography image.
2. The method for manufacturing an anti-counterfeit label according to claim 1, wherein:
the thickness of the substrate layer is 20-30um, the resolution ratio of the photosensitive polymer layer is less than 5um, the thickness of the resin layer is 1-1.2um, the grating texture fringe period of the optical micro-nano structure is 200-300nm, and the thickness of the metal layer is 30-40nm.
3. The method for manufacturing an anti-counterfeit label according to claim 1, wherein:
the substrate layer is polyethylene glycol terephthalate, and the adhesive layer is pressure-sensitive adhesive or hot melt adhesive;
and a release paper layer is arranged above the adhesive layer.
4. The method for manufacturing an anti-counterfeit label according to claim 1, wherein:
the optical micro-nano structure has an optical effect, wherein the optical effect comprises at least one or a combination of a plurality of laser reproduction, orthotopic heterology, orthorhombic grating, diffraction relief, fresnel lens, true color, three-dimensional stereo and miniature image.
5. The method for preparing an anti-counterfeit label according to claim 1, wherein the photosensitive polymer coating is uniformly coated on a substrate, and a photosensitive polymer layer is formed after baking, comprising the steps of:
uniformly coating the photosensitive polymer coating with the diluted solid content of 10% on a polyethylene terephthalate substrate in a micro-concave coating mode of an anilox roller, and baking and volatilizing in a baking channel of a coating machine to obtain the photosensitive polymer layer with the coating weight of 0.6-0.7 g/square meter.
6. The method for manufacturing an anti-counterfeit label according to claim 1, wherein the diluted resin is coated on the photosensitive polymer layer, and the resin layer is formed by baking, comprising the steps of:
coating resin with the solid content of 20% on the photosensitive polymer layer through an anilox roller coating device, and baking and volatilizing through a baking channel of a coater to obtain a resin layer with the coating weight of 0.8-1 g/square meter;
and copying the micro-nano texture structure which is designed in advance on the coated metal layer in an imprinting mode through micro-nano structure mould pressing copying equipment to obtain the micro-nano texture structure.
7. The method for preparing an anti-counterfeit label according to claim 1, wherein the positioning according to the arrangement cycle length of the optical micro-nano texture image comprises the steps of capturing the optical micro-nano texture image target by a CCD of a laser lithography device at high speed, and performing position matching alignment on the optical micro-nano texture image and the laser lithography image:
the intermittent positioning and dragging system is used for positioning and moving to the position below the laser vibrating mirror according to the arrangement period length of the optical micro-nano structure texture image, the CCD of the laser lithography equipment is used for capturing the optical micro-structure texture image target at a high speed, and the system is used for carrying out position matching alignment on the optical micro-nano structure texture image and the laser lithography image, so that the alignment accuracy dimension is within 0.1mm.
8. The method for preparing an anti-counterfeit label according to claim 1, wherein the laser lithography device outputs laser to perform image lithography on the photosensitive polymer layer to obtain a laser lithography image, comprising the steps of:
the laser lithography equipment outputs laser with the pulse frequency of 1000KHZ, and simultaneously a vibrating mirror of the laser lithography equipment swings in two-dimensional directions according to a preset image, and image lithography is performed on a photosensitive polymer layer of a label material in a laser spot mode at a 30% overlapping period of a laser spot, so that an optical micro-nano structure texture image and a laser lithography image with alignment precision within 0.1mm are obtained.
9. The method of manufacturing an anti-counterfeit label according to claim 1, further comprising the steps of:
the laser lithography image is subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of the anti-counterfeiting mark of the laser lithography is inconsistent by combining different optical micro-nano structures and positioning.
CN202011593887.1A 2020-12-29 2020-12-29 Anti-counterfeiting label and preparation method thereof Active CN112613591B (en)

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CN208298458U (en) * 2018-06-14 2018-12-28 武汉华工图像技术开发有限公司 A kind of light change holographic anti-counterfeiting label
CN109291673A (en) * 2018-09-25 2019-02-01 武汉华工图像技术开发有限公司 A kind of patterning holographic false proof device and preparation method thereof accurately aluminized
CN209159204U (en) * 2018-11-07 2019-07-26 武汉华工图像技术开发有限公司 A kind of anti-fake blocking film of color hologram and colored anti-counterfeit package box
CN111477094A (en) * 2020-04-07 2020-07-31 苏州印象镭射科技有限公司 3D touch anti-counterfeiting mark with micro-nano texture and manufacturing method thereof
CN112133185A (en) * 2020-09-22 2020-12-25 丝艾产品标识(苏州)有限公司 Label capable of being engraved by laser

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