CN112613591A - Anti-counterfeit label and preparation method thereof - Google Patents
Anti-counterfeit label and preparation method thereof Download PDFInfo
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- CN112613591A CN112613591A CN202011593887.1A CN202011593887A CN112613591A CN 112613591 A CN112613591 A CN 112613591A CN 202011593887 A CN202011593887 A CN 202011593887A CN 112613591 A CN112613591 A CN 112613591A
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- 238000002360 preparation method Methods 0.000 title abstract description 6
- 230000003287 optical effect Effects 0.000 claims abstract description 69
- 239000002086 nanomaterial Substances 0.000 claims abstract description 59
- 229920000642 polymer Polymers 0.000 claims abstract description 47
- 238000001259 photo etching Methods 0.000 claims abstract description 44
- 239000011347 resin Substances 0.000 claims abstract description 34
- 229920005989 resin Polymers 0.000 claims abstract description 34
- 239000002184 metal Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 11
- 239000003292 glue Substances 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 113
- 239000011248 coating agent Substances 0.000 claims description 41
- 238000000576 coating method Methods 0.000 claims description 41
- 238000001459 lithography Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 18
- 239000012790 adhesive layer Substances 0.000 claims description 11
- 238000007774 anilox coating Methods 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 239000000084 colloidal system Substances 0.000 claims description 5
- 239000004831 Hot glue Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- -1 polyethylene terephthalate Polymers 0.000 claims description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 3
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 238000007761 roller coating Methods 0.000 claims description 3
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 claims description 3
- 230000002159 abnormal effect Effects 0.000 claims description 2
- 239000003086 colorant Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000000123 paper Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 3
- 238000005034 decoration Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011086 glassine Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002052 molecular layer Substances 0.000 description 2
- 238000010345 tape casting Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000029052 metamorphosis Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
- G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
- G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
- G06K19/07—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
- G06K19/077—Constructional details, e.g. mounting of circuits in the carrier
- G06K19/0772—Physical layout of the record carrier
- G06K19/07722—Physical layout of the record carrier the record carrier being multilayered, e.g. laminated sheets
Abstract
The invention relates to the technical field of anti-counterfeiting, and discloses an anti-counterfeiting label and a preparation method thereof. This antifalsification label includes: the optical micro-nano structure comprises a base material layer, a photosensitive high polymer layer, a resin layer, an information layer, a metal layer and a glue layer which are sequentially stacked, wherein the photosensitive high polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure. In the invention, multiple anti-counterfeiting functions are formed by combining the optical micro-nano structure with positioning laser photoetching, so that the anti-counterfeiting label has better anti-counterfeiting capability.
Description
Technical Field
The invention relates to the technical field of anti-counterfeiting, in particular to an anti-counterfeiting label and a preparation method thereof.
Background
At present, with the rapid development of electronic commerce, a wide variety of commodities continuously enter the market. Many lawless persons can imitate counterfeit products in large quantities. The counterfeit and shoddy commodities not only bring serious economic loss to regular commodity producers, but also seriously harm the life and property safety of consumers, and cause extremely severe social influence. Along with the progress of science and technology, the anti-counterfeiting means is more advanced and more diversified. In order to prevent the products of each commodity manufacturer from being counterfeited, the commodity manufacturers mostly adopt anti-counterfeiting labels to prevent the commodities produced by the manufacturers from being counterfeited.
With the fact that the copying and cracking threshold of the traditional anti-counterfeiting technology is lower and lower, a new anti-counterfeiting label needs to be designed urgently, and the anti-counterfeiting label has better anti-counterfeiting capacity.
Disclosure of Invention
In order to solve the technical problems, the invention provides an anti-counterfeiting label and a preparation method thereof.
The technical scheme provided by the invention is as follows:
the utility model provides an anti-counterfeit label, includes substrate layer, photosensitive polymer layer, resin layer, information layer, metal level and the glue film that stacks gradually, photosensitive polymer layer is provided with the laser photoetching image, the information layer is provided with optics and receives the structure a little.
Further preferably, the thickness of the substrate layer is 20-30um, the resolution of the photosensitive polymer layer is less than 5um, the thickness of the resin layer is 1-1.2um, the grating texture fringe period of the optical micro-nano structure is 200-300nm, and the thickness of the metal layer is 30-40 nm.
Further preferably, the substrate layer is polyethylene terephthalate, and the adhesive layer is a pressure-sensitive adhesive or a hot melt adhesive;
and a release paper layer is also arranged above the adhesive layer.
Further preferably, the optical micro-nano structure has an optical effect, and the optical effect includes at least one or a combination of laser reproduction, homothetic metamorphosis, orthogonal grating, diffraction relief, fresnel lens, true color, three-dimensional stereo and micro-image.
The other technical scheme provided by the invention is as follows:
a method of making a security label as claimed in any one of the preceding claims, comprising the steps of:
uniformly coating the photosensitive high polymer coating on a substrate, and baking to form a photosensitive high polymer layer;
coating the diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
tightly adhering a metal material on the resin layer to form a metal layer;
copying a pre-designed micro-nano texture structure on a metal layer to form an optical micro-nano structure;
coating the colloid on the metal layer, and baking to form an adhesive layer;
positioning according to the arrangement cycle length of the texture image of the optical micro-nano structure, capturing an optical microstructure texture image target by a CCD (charge coupled device) of laser lithography equipment at a high speed, and performing position matching alignment on the texture image of the optical micro-nano structure and the laser lithography image;
and outputting laser by the laser photoetching equipment to carry out image photoetching on the photosensitive high polymer layer to obtain a laser photoetching image.
Further preferably, the step of uniformly coating the photosensitive polymer coating on the substrate and baking to form the photosensitive polymer layer specifically comprises the steps of:
the photosensitive high polymer coating with the diluted solid content of 10 percent is uniformly coated on a polyethylene glycol terephthalate substrate in a reticulate pattern roll micro-concave coating mode, and the photosensitive high polymer layer with the coating amount of 0.6-0.7 g/square meter is obtained after baking and volatilization in a drying tunnel of a coating machine.
Further preferably, the step of coating the diluted resin on the photosensitive polymer layer and baking to form the resin layer specifically comprises the steps of:
coating resin with the diluted solid content of 20% on the photosensitive polymer layer by an anilox roller coating device through an anilox roller, and baking and volatilizing the resin in a drying tunnel of a coating machine to obtain a resin layer with the coating weight of 0.8-1 g/square meter;
and copying the pre-designed micro-nano texture structure on the coating metal layer in an embossing mode through micro-nano structure mould pressing copying equipment to obtain the micro-nano texture structure.
Further preferably, the positioning is performed according to the arrangement period length of the texture image of the optical micro-nano structure, the CCD of the laser lithography device captures the texture image target of the optical micro-structure at a high speed, and the position matching alignment is performed on the texture image of the optical micro-nano structure and the laser lithography image, specifically comprising the steps of:
the system carries out positioning and moving to the lower part of a laser vibrating mirror through an intermittent positioning material dragging system according to the arrangement period length of the texture image of the optical micro-nano structure, a CCD of laser photoetching equipment carries out high-speed snapshot on an image target of the texture image of the optical micro-nano structure, and the system carries out position matching and alignment on the texture image of the optical micro-nano structure and the laser photoetching image, so that the alignment precision is within 0.1 mm.
Further preferably, the laser lithography apparatus outputs laser light to perform image lithography on the photosensitive polymer layer to obtain a laser lithography image, specifically comprising the steps of:
the laser photoetching equipment outputs laser with the pulse frequency of 1000KHZ, simultaneously, a vibrating mirror of the laser photoetching equipment swings in two-dimensional directions according to a preset image, and image photoetching is carried out on a photosensitive polymer layer of a label material in a laser dotting mode in a 30% overlapping period of laser spots, so that an optical micro-nano structure texture image and a laser photoetching image with the alignment precision within 0.1mm are obtained.
Further preferably, the method further comprises the following steps:
the laser photoetching image is subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of the anti-counterfeiting mark of different optical micro-nano structures combined with positioning laser photoetching is inconsistent.
Compared with the prior art, the anti-counterfeit label and the preparation method thereof have the beneficial effects that:
the anti-counterfeiting label comprises a base material layer, a photosensitive polymer layer, a resin layer, an information layer, a metal layer and a glue layer which are sequentially stacked, wherein the photosensitive polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure; multiple anti-counterfeiting functions are formed by combining an optical micro-nano structure with positioning laser photoetching, so that the anti-counterfeiting label has better anti-counterfeiting capacity; the laser photoetching image can be subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of each optical micro-nano structure combined with the anti-counterfeiting mark of positioning laser photoetching is different, one marking code or one marking pattern is realized, and the carrier has better anti-counterfeiting and traceability capabilities.
Drawings
The foregoing features, technical features, advantages and embodiments are further described in the following detailed description of the preferred embodiments, which is to be read in connection with the accompanying drawings.
FIG. 1 is a schematic structural diagram of an anti-counterfeit label according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of another perspective of a security tag in accordance with another embodiment of the present invention;
FIG. 3 is a schematic diagram of an optical micro-nano structure texture image and a laser lithography positioning image according to another embodiment of the present invention;
fig. 4 is a flow chart of a method for preparing an anti-counterfeit label according to another embodiment of the invention.
The reference numbers illustrate:
1. the device comprises a substrate layer, 2 a photosensitive polymer layer, 3 a resin layer, 4 an optical micro-nano structure, 5 a metal layer, 6 an adhesive layer, 7 a release paper layer, 8 a carrier, 9 an optical micro-nano structure texture image target, 10 an optical micro-nano structure texture image and 11 a laser photoetching image.
Detailed Description
In the following description, for purposes of explanation and not limitation, specific details are set forth, such as particular system structures, techniques, etc. in order to provide a thorough understanding of the embodiments of the present application. However, it will be apparent to one skilled in the art that the present application may be practiced in other embodiments that depart from these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.
It will be understood that the terms "comprises" and/or "comprising," when used in this specification and the appended claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
For the sake of simplicity, the drawings only schematically show the parts relevant to the present invention, and they do not represent the actual structure as a product. In addition, in order to make the drawings concise and understandable, components having the same structure or function in some of the drawings are only schematically illustrated or only labeled. In this document, "one" means not only "only one" but also a case of "more than one".
It should be further understood that the term "and/or" as used in this specification and the appended claims refers to and includes any and all possible combinations of one or more of the associated listed items.
In the embodiments shown in the drawings, the directions such as up, down, left, right, front, and rear are used to explain the structure and movement of various components of the present invention not absolutely but relatively. These illustrations are appropriate when these components are in the positions shown in the figures. If the description of the positions of these components changes, the indication of these directions changes accordingly.
In addition, in the description of the present application, the terms "first", "second", and the like are used only for distinguishing the description, and are not intended to indicate or imply relative importance.
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following description will be made with reference to the accompanying drawings. It is obvious that the drawings in the following description are only some examples of the invention, and that for a person skilled in the art, other drawings and embodiments can be derived from them without inventive effort.
As a specific embodiment, as shown in fig. 1, the embodiment provides an anti-counterfeit label, which includes a substrate layer 1, a photosensitive polymer layer 2, a resin layer 3, an information layer, a metal layer 5, and an adhesive layer 6, which are sequentially stacked, wherein the photosensitive polymer layer 2 is provided with a laser lithography image, and the information layer is provided with an optical micro-nano structure 4. The anti-counterfeiting label can be an adhesive label or a positioning hot stamping label, and the anti-counterfeiting label combines a positioning laser photoetching through an optical micro-nano structure to form a multiple anti-counterfeiting function, so that the anti-counterfeiting label has better anti-counterfeiting capability.
Specifically, the substrate layer 1 is polyethylene terephthalate, and the thickness of the substrate layer 1 is 20-30 um. Photosensitive high molecular layer 2 is formed at the upper surface of substrate layer 1, and photosensitive high molecular layer 2's resolution ratio is less than 5 um. The resin layer 3 is formed on the upper surface of the photosensitive polymer layer 2, and the thickness of the resin layer 3 is 1-1.2 um. An optical micro-nano structure 4 is attached to the resin layer 3, and the grating texture fringe period of the optical micro-nano structure 4 is 200-300 nm. The resin layer 3 is provided with a metal layer 5, and the thickness of the metal layer 5 is 30-40 nm. The metal layer 5 is attached with a glue layer 6, the glue layer 6 is a pressure-sensitive adhesive or a hot melt adhesive, the pressure-sensitive adhesive has self-adhesion, and the hot melt adhesive has hot adhesion performance. A release paper layer 7 is also arranged above the adhesive layer 6, and the release paper layer 7 is glassine release paper. The anti-counterfeit label can be adhered to the carrier 8 by taking off the release paper layer 7.
Further, as shown in fig. 2 and 3, the intermittent positioning material dragging system moves to the lower side of the laser galvanometer in a positioning mode according to the arrangement period length of the optical micro-nano structure texture image 10, at the moment, a CCD of the laser lithography equipment captures an optical microstructure texture image target 9 at a high speed, the equipment system automatically carries out position matching alignment on the optical micro-nano structure texture image 10 and the laser lithography image 11 in the equipment system, and the alignment precision dimension is within 0.1 mm. And performing image photoetching on the photosensitive polymer layer 2 of the label material by using laser, thereby obtaining an optical micro-nano structure texture image 10 and a laser photoetching image 11 with the alignment precision within 0.1 mm. The optical micro-nano structure 4 has an optical effect, and the optical effect comprises at least one or combination of laser reproduction, homotopic abnormal images, orthogonal gratings, diffraction relief, Fresnel lenses, true colors, three-dimensional stereo and miniature images. The anti-counterfeiting label can be composed of various optical micro-nano structure images and laser photoetching images. The optical micro-nano structure 4 can be made by electron beam, projection direct-writing exposure or two-beam interference exposure, but is not limited to electron beam, projection direct-writing exposure or two-beam interference exposure. The optical micro-nano structure is provided with pre-designed specific image pictures and texts, the laser photoetching image is made by dotting with single beam pulses, the resolution of the single beam pulse point is less than 5um, the repetition frequency of the laser pulses is higher than 1000KHZ, the single laser beam is controlled by a two-dimensional galvanometer, the overlapping period of the laser pulse points is 30% of the diameter of the point, and the positioning precision of the optical micro-nano structure image and the laser photoetching image is 0.1 mm.
In another embodiment, as shown in fig. 4, on the basis of the above embodiment, this embodiment provides a method for preparing an anti-counterfeit label, including the steps of:
s100, uniformly coating the photosensitive high polymer coating on a substrate, and baking to form a photosensitive high polymer layer;
specifically, a photosensitive high polymer coating with the diluted solid content of 10% is uniformly coated on a polyethylene glycol terephthalate substrate in an anilox roller micro-concave coating mode, and a photosensitive high polymer layer with the coating weight of 0.6-0.7 g/square meter is obtained after baking and volatilization in a drying tunnel of a coating machine.
S200, coating the diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
specifically, a resin layer with the coating amount of 0.8-1 g/square meter is obtained after the resin with the diluted solid content of 20% is coated on the photosensitive high polymer layer through a anilox roller by using anilox roller coating equipment and is baked and volatilized through a drying tunnel of a coating machine.
S300, tightly adhering a metal material to the resin layer to form a metal layer;
specifically, a metal material is closely adhered to a resin layer by evaporation by a roll-to-roll vacuum plating apparatus to obtain a vacuum plated metal layer.
S400, copying a pre-designed micro-nano texture structure on a metal layer to form an optical micro-nano structure;
specifically, a micro-nano texture structure which is designed in advance is copied on a coating metal layer in an embossing mode through micro-nano structure mould pressing copying equipment, and the micro-nano texture structure is obtained.
S500, coating the colloid on the metal layer, and forming an adhesive layer after baking;
specifically, the colloid is coated on the metal layer through comma knife coating equipment or other coating equipment, and the adhesive layer is obtained after baking through comma knife coating equipment or other coating equipment drying tunnels, and the pressure-sensitive adhesive glue is adopted and only needs to cover the release paper on the surface of the colloid in a roll-to-roll manner.
S600, positioning according to the arrangement period length of the texture image of the optical micro-nano structure, capturing an optical microstructure texture image target at a high speed by a CCD of laser lithography equipment, and performing position matching alignment on the texture image of the optical micro-nano structure and the laser lithography image;
specifically, the intermittent positioning material dragging system moves to the position below a laser vibrating mirror according to the arrangement period length of the optical micro-nano structure texture image, a CCD of laser lithography equipment captures an optical micro-structure texture image target at a high speed, and the system performs position matching alignment on the optical micro-nano structure texture image and the laser lithography image, so that the alignment precision is within 0.1 mm.
S700, laser is output by the laser photoetching equipment to carry out image photoetching on the photosensitive high polymer layer, and a laser photoetching image is obtained.
Specifically, the laser lithography equipment outputs laser with the pulse frequency of 1000KHZ, meanwhile, a galvanometer of the laser lithography equipment swings in two-dimensional directions according to a preset image, and image lithography is performed on a photosensitive polymer layer of a label material in a laser dotting mode in a 30% overlapping period of laser spots, so that an optical micro-nano structure texture image and a laser lithography image with the alignment accuracy within 0.1mm are obtained.
Further, the laser photoetching image is subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of each optical micro-nano structure combined with the anti-counterfeiting mark for positioning laser photoetching is different, and one marking code or one marking graph is realized.
The anti-counterfeiting label which is used for being pasted and is provided with the optical micro-nano structure combined positioning laser photoetching is obtained through the steps, because the anti-counterfeiting label is provided with the pressure-sensitive adhesive, the anti-counterfeiting label which is provided with the optical micro-nano structure combined positioning laser photoetching can be taken down from the glassine release paper through manual work and then is pasted on the surface of a target object, the package of the target object or the attachment of the target object, for example: commodity hanging plate, name card and anti-fake certificate card.
In the above embodiments, the descriptions of the respective embodiments have respective emphasis, and reference may be made to the related descriptions of other embodiments for parts that are not described or recited in detail in a certain embodiment.
It should be noted that the above embodiments can be freely combined as necessary. The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The anti-counterfeiting label is characterized by comprising a base material layer, a photosensitive high polymer layer, a resin layer, an information layer, a metal layer and a glue layer which are sequentially stacked, wherein the photosensitive high polymer layer is provided with a laser photoetching image, and the information layer is provided with an optical micro-nano structure.
2. The security label of claim 1, wherein:
the thickness of the substrate layer is 20-30um, the resolution ratio of the photosensitive polymer layer is less than 5um, the thickness of the resin layer is 1-1.2um, the grating texture fringe period of the optical micro-nano structure is 200-300nm, and the thickness of the metal layer is 30-40 nm.
3. The security label of claim 1, wherein:
the substrate layer is polyethylene terephthalate, and the adhesive layer is pressure-sensitive adhesive or hot melt adhesive;
and a release paper layer is also arranged above the adhesive layer.
4. The security label of claim 1, wherein:
the optical micro-nano structure has an optical effect, and the optical effect comprises at least one or combination of laser reproduction, homotopic abnormal images, orthogonal gratings, diffraction relief, Fresnel lenses, true colors, three-dimensional stereo and miniature images.
5. A method of making a security label according to any of claims 1 to 4, comprising the steps of:
uniformly coating the photosensitive high polymer coating on a substrate, and baking to form a photosensitive high polymer layer;
coating the diluted resin on the photosensitive polymer layer, and baking to form a resin layer;
tightly adhering a metal material on the resin layer to form a metal layer;
copying a pre-designed micro-nano texture structure on a metal layer to form an optical micro-nano structure;
coating the colloid on the metal layer, and baking to form an adhesive layer;
positioning according to the arrangement cycle length of the texture image of the optical micro-nano structure, capturing an optical microstructure texture image target by a CCD (charge coupled device) of laser lithography equipment at a high speed, and performing position matching alignment on the texture image of the optical micro-nano structure and the laser lithography image;
and outputting laser by the laser photoetching equipment to carry out image photoetching on the photosensitive high polymer layer to obtain a laser photoetching image.
6. The anti-counterfeit label according to claim 5, wherein the photosensitive polymer coating is uniformly coated on the substrate and baked to form the photosensitive polymer layer, and the method specifically comprises the following steps:
the photosensitive high polymer coating with the diluted solid content of 10 percent is uniformly coated on a polyethylene glycol terephthalate substrate in a reticulate pattern roll micro-concave coating mode, and the photosensitive high polymer layer with the coating amount of 0.6-0.7 g/square meter is obtained after baking and volatilization in a drying tunnel of a coating machine.
7. The anti-counterfeit label according to claim 5, wherein the diluted resin is coated on the photosensitive polymer layer and baked to form a resin layer, and the method comprises the following steps:
coating resin with the diluted solid content of 20% on the photosensitive polymer layer by an anilox roller coating device through an anilox roller, and baking and volatilizing the resin in a drying tunnel of a coating machine to obtain a resin layer with the coating weight of 0.8-1 g/square meter;
and copying the pre-designed micro-nano texture structure on the coating metal layer in an embossing mode through micro-nano structure mould pressing copying equipment to obtain the micro-nano texture structure.
8. The anti-counterfeit label according to claim 5, wherein the positioning is performed according to the arrangement period length of the optical micro-nano structure texture image, the CCD of the laser lithography device captures the optical micro-structure texture image target at a high speed, and the position matching alignment is performed on the optical micro-nano structure texture image and the laser lithography image, specifically comprising the following steps:
the system carries out positioning and moving to the lower part of a laser vibrating mirror through an intermittent positioning material dragging system according to the arrangement period length of the texture image of the optical micro-nano structure, a CCD of laser photoetching equipment carries out high-speed snapshot on an image target of the texture image of the optical micro-nano structure, and the system carries out position matching and alignment on the texture image of the optical micro-nano structure and the laser photoetching image, so that the alignment precision is within 0.1 mm.
9. The anti-counterfeit label according to claim 5, wherein the laser lithography device outputs laser to perform image lithography on the photosensitive polymer layer to obtain a laser lithography image, specifically comprising the steps of:
the laser photoetching equipment outputs laser with the pulse frequency of 1000KHZ, simultaneously, a vibrating mirror of the laser photoetching equipment swings in two-dimensional directions according to a preset image, and image photoetching is carried out on a photosensitive polymer layer of a label material in a laser dotting mode in a 30% overlapping period of laser spots, so that an optical micro-nano structure texture image and a laser photoetching image with the alignment precision within 0.1mm are obtained.
10. The security tag of claim 5, further comprising the steps of:
the laser photoetching image is subjected to image conversion in a variable data form through a software algorithm, so that the image-text information of the anti-counterfeiting mark of different optical micro-nano structures combined with positioning laser photoetching is inconsistent.
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