CN112558419A - Processing method of large-caliber flexible optical super-structure surface structure - Google Patents
Processing method of large-caliber flexible optical super-structure surface structure Download PDFInfo
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- CN112558419A CN112558419A CN202011507346.2A CN202011507346A CN112558419A CN 112558419 A CN112558419 A CN 112558419A CN 202011507346 A CN202011507346 A CN 202011507346A CN 112558419 A CN112558419 A CN 112558419A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 29
- 238000003672 processing method Methods 0.000 title claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 19
- 239000000853 adhesive Substances 0.000 claims abstract description 12
- 230000001070 adhesive effect Effects 0.000 claims abstract description 12
- 239000002105 nanoparticle Substances 0.000 claims abstract description 12
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000001259 photo etching Methods 0.000 claims abstract description 7
- 238000005530 etching Methods 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 238000010884 ion-beam technique Methods 0.000 claims description 5
- 238000001020 plasma etching Methods 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 4
- -1 haar oxide Chemical compound 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 11
- 238000001723 curing Methods 0.000 description 21
- 239000003292 glue Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- 238000000609 electron-beam lithography Methods 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000001459 lithography Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
The invention discloses a processing method of a large-caliber flexible optical super-structure surface structure, which comprises the steps of exposing photoresist through a photoetching system and developing to prepare a designed large-caliber super-structure surface pattern; transferring the photoresist pattern onto a substrate material using the photoresist pattern as a mask and as a template; coating the ultraviolet curing adhesive mixed with the high-refractive-index nano particles on a template, covering a layer of flexible substrate, curing the ultraviolet curing adhesive by using an ultraviolet lamp exposure mode while applying mechanical pressure by using a roll shaft, and then demoulding and separating to obtain the large-caliber flexible optical super-structure surface structure. The method has the characteristics of simple process flow, high resolution, low cost, high preparation efficiency and the like, and is suitable for the field of processing of large-area flexible super-structure surface devices.
Description
Technical Field
The invention belongs to the technical field of processing of a super-structured surface device, and particularly relates to a processing method of a large-caliber flexible optical super-structured surface structure.
Background
The optical super-surface is an artificial two-dimensional structure composed of micro-nano units with the size of tens to hundreds of nanometers. Typical photolithography processes, which are commonly used for preparing a super surface, cannot provide sufficient pattern resolution due to diffraction limit, although they can rapidly reproduce a mask pattern. Electron Beam Lithography (EBL) and Focused Ion Beam (FIB) milling, while having high resolution, have low fabrication efficiency. Compared with the method, the nano-imprinting improves the preparation efficiency of the super surface, and the resolution ratio has no physical limit. The hot stamping is widely applied, but high requirements are provided for the low thermal expansion coefficient and the pressure contraction coefficient of the material, and high pressure and heating temperature are required in the stamping process, so that the pattern structures of the template and the adhesive layer are easily damaged. The ultraviolet nano-imprinting technology solves the problems existing in hot imprinting, but bubbles in ultraviolet curing glue are difficult to discharge, and defects can be caused to the micro-nano structure. According to the reel-to-reel nano-imprinting provided by the ultraviolet imprinting technology, the high-throughput preparation of the micro-nano structure is realized. However, the roll-to-roll imprinting template is fixed on the roll shaft in a bending way, so that the position accuracy of the nano structure on the template is reduced, and the optical performance of the surface of the imprinted optical super structure is affected. On the other hand, the template pattern can only be copied to the imprinting glue by the imprinting method, and the pattern structure of the imprinting glue does not generally have functions directly, so that the imprinting glue pattern needs to be transferred to other functional materials, thereby increasing the process steps and difficulty. In summary, the main difficulty of the existing super-surface preparation technology is to reduce the process complexity and improve the device preparation efficiency and the micro-nano structure pattern quality on the premise of meeting the performance requirements.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the defects of the prior art are overcome, the processing method of the large-caliber flexible optical super-structure surface structure is provided, and the high-efficiency and low-cost manufacturing of the large-area flexible optical super-structure surface is realized through a simple micro-nano structure copying technology of ultraviolet curing glue embedded with patterns through ultraviolet curing.
The technical scheme adopted by the invention for solving the technical problems is as follows: a processing method of a large-caliber optical flexible super-structure surface device comprises the following steps:
and (1) coating photoresist on the substrate template.
And (2) exposing through a photoetching system, and then developing.
And (3) transferring the pattern onto the substrate material and serving as a template.
And (4) coating the ultraviolet curing adhesive mixed with the high-refractive-index nano particles on the template, covering a layer of flexible substrate, and curing the ultraviolet curing adhesive by using an ultraviolet lamp exposure mode while applying mechanical pressure by using a roller shaft.
And (5) separating the flexible substrate from the template to prepare the large-caliber flexible optical super-structure surface structure.
Further, the photoresist in the step (1) is an electron beam photoresist and an ultraviolet photoresist.
Further, the lithography system in the step (2) is an electron beam lithography system, an ultraviolet super-resolution lithography system and an ultraviolet super-resolution direct writing system.
Further, the pattern transfer in the step (3) is stripping, metal-assisted chemical etching, gas-assisted ion beam etching and high-density plasma etching.
Further, in the step (4), the high-refractive-index nano-particles are titanium oxide, haar oxide, zirconium oxide, zinc oxide, cerium oxide and silicon, and the diameter of the high-refractive-index nano-particles is less than or equal to 50 nm.
Further, the flexible substrate material in the step (4) is optical transparent polymer and metal glass, and the thickness of the flexible substrate is less than or equal to 500 μm; the ultraviolet light source is a surface light source and a linear light source.
The principle of the invention is as follows:
the invention discloses a processing method of a large-caliber flexible optical super-structure surface structure, which comprises the steps of exposing photoresist through a photoetching system and developing to prepare a designed large-caliber super-structure surface pattern; transferring the photoresist pattern onto a substrate material using the photoresist pattern as a mask and as a template; coating the ultraviolet curing adhesive mixed with the high-refractive-index nano particles on a template, covering a layer of flexible substrate, curing the ultraviolet curing adhesive by using an ultraviolet lamp exposure mode while applying mechanical pressure by using a roll shaft, and then demoulding and separating to obtain the large-caliber flexible optical super-structure surface structure. The method has the characteristics of simple process flow, high resolution, low cost, high preparation efficiency and the like, and is suitable for the technical field of processing of large-area flexible super-structure surface devices.
Compared with the prior art, the invention has the following advantages:
(1) the defects of long preparation period and low efficiency of the traditional super-surface manufacturing method (such as electron beam lithography and focused ion beam milling) are overcome. The method adopts ultraviolet irradiation to cure the ultraviolet curing adhesive for filling the micro-nano structure to realize the preparation of the super-structure surface, and has short preparation period and high efficiency.
(2) The invention overcomes the defect that the warping of a template in a roll-to-roll nano-imprinting technology affects the position and the dimensional accuracy of a graph.
(3) The method overcomes the defect that the optical performance of the processed super-structure surface is low due to low refractive index of the ultraviolet curing adhesive, improves the equivalent refractive index of the super-structure surface structure by mixing the high-refractive-index nano particles with the ultraviolet curing adhesive, and reduces the processing difficulty of the original pattern depth of the template and the pattern damage during demoulding.
Drawings
FIG. 1 is a process diagram for preparing a flexible optical superstructure surface structure;
FIG. 2 is a schematic view of an underlying template spin-on resist;
FIG. 3 is a schematic view of a photoresist pattern after exposure by a lithography system;
FIG. 4 is a schematic view of a super-surface structure transferred to a template by etching;
FIG. 5 is a schematic view of applying a UV curable glue to a stencil and covering a layer of flexible substrate;
FIG. 6 is a schematic view of UV curing while flattening the UV curing adhesive using a roller;
FIG. 7 is a schematic view of the structure after completion of the UV cure;
FIG. 8 is a schematic diagram of the flexible substrate being separated from the template;
FIG. 9 is a schematic view of a finished flexible microstructured surface;
in the figure: 1. a flexible substrate; 2. ultraviolet curing glue; 3. high refractive index nanoparticles; 4. pressing the roll shaft; 5. photoresist; 6. and (5) template.
Detailed Description
The invention is described in detail below with reference to the figures and the detailed description. The scope of the invention is not limited to the following examples, but is intended to include the full scope of the claims.
Example 1, the invention was utilized to achieve the preparation of a flexible optical superstructure surface structure with a 200mm aperture.
(1) Spin-coating a layer of electron beam photoresist with the thickness of 200nm on a silicon substrate with the diameter of 200 mm;
(2) exposing a large-area super-structure surface pattern structure by adopting an electron beam lithography system, wherein the pattern caliber is 180mm, the pattern period is 420nm, the pattern line width is 130nm, and developing is carried out after exposure is finished;
(3) transferring the developed graph to a silicon substrate through reactive ion etching equipment to obtain a stamping mother board, wherein the etching power is 50W, the etching cavity pressure is 0.5Pa, the SF6 flow rate is 25SCCM, the CHF3 flow rate is 5SCCM, and the etching depth is 150 nm;
(4) coating ultraviolet curing glue 2 mixed with titanium dioxide nanoparticles 3 (with the particle size of 21nm) in a mass ratio of 1% on an imprinting mother board, covering a polyethylene terephthalate (PET) flexible substrate 1 (with the thickness of 100 mu m) on the surface of the imprinting mother board, flattening the ultraviolet curing glue 2 through a roller shaft 4 at one side, irradiating and curing ultraviolet light at the other side to complete imprinting and curing of the whole caliber, and demolding to obtain a required large-caliber flexible optical super-structure surface structure; the ultraviolet light power is 124W, the moving speed of the roller shaft is 3.4mm/s, and the pressing pressure of the roller shaft is 0.2 MPa.
(1) Plating a chromium layer with the thickness of 40nm on a silicon substrate with the diameter of 8 inches by magnetron sputtering equipment, wherein the power is 400W, and the cavity pressure is 1 mTorr;
(2) spin-coating an electron beam photoresist layer with the thickness of 80nm on a silicon substrate which is plated with a chromium layer with the thickness of 40nm and has the diameter of 8 inches;
(3) exposing a large-area super-structure surface pattern structure by adopting an electron beam lithography system, wherein the pattern aperture is 180mm, the pattern period is 450nm, the unit pattern width is 100nm, the unit pattern length is 330nm, and developing is carried out after exposure is finished;
(4) removing the exposed chromium layer by ion beam etching equipment, wherein the beam current is 150mA, and the inclination angle is 10 degrees;
(5) removing residual electron beam photoresist by reactive ion etching equipment, wherein the etching power is 5W, the etching cavity pressure is 1Pa, the O2 flow is 10SCCM, and the etching time is 5 min;
(6) transferring the graph to a silicon substrate through reactive ion etching equipment to obtain a stamping mother board, wherein the etching power is 100W, the etching cavity pressure is 0.5Pa, the SF6 flow rate is 25SCCM, the CHF3 flow rate is 5SCCM, and the etching depth is 720 nm;
(7) removing the chromium layer on the surface by wet etching of chromium removing liquid to obtain a stamping mother board;
(8) coating ultraviolet curing glue 2 mixed with titanium dioxide nanoparticles 3 (with the particle size of 21nm) accounting for 20 mass percent on an imprinting mother board, covering a polyethylene terephthalate (PET) flexible substrate 1 (with the thickness of 100 mu m) on the surface of the imprinting mother board, flattening the ultraviolet curing glue through a roller shaft 4 at one side, irradiating and curing ultraviolet light at the other side to complete imprinting and curing of the whole caliber, and obtaining a required large-caliber flexible optical super-structure surface structure after demoulding; the ultraviolet light power is 184W, the moving speed of the roller shaft is 3.4mm/s, and the pressing pressure of the roller shaft is 0.2 MPa.
Claims (6)
1. A processing method of a large-caliber flexible optical super-structure surface structure is characterized by comprising the following steps: the method comprises the following steps:
step (1), coating photoresist on a substrate template;
step (2), exposing through a photoetching system, and then developing;
transferring the pattern to a substrate material and using the pattern as a template;
step (4), coating the ultraviolet curing adhesive mixed with the high-refractive-index nano particles on a template, covering a layer of flexible substrate, and curing the ultraviolet curing adhesive by using an ultraviolet lamp exposure mode while applying mechanical pressure by using a roller;
and (5) separating the flexible substrate from the template to prepare the large-caliber flexible optical super-structure surface structure.
2. The method for processing the large-caliber flexible optical super-structure surface structure according to claim 1, wherein the method comprises the following steps: the photoresist in the step (1) is electron beam photoresist and ultraviolet photoresist.
3. The method for processing the large-caliber flexible optical super-structure surface structure according to claim 1, wherein the method comprises the following steps: the photoetching system in the step (2) is an electron beam photoetching system, an ultraviolet super-resolution photoetching system and an ultraviolet super-resolution direct writing system.
4. The method for processing the large-caliber flexible optical super-structure surface structure according to claim 1, wherein the method comprises the following steps: and (4) the pattern transfer in the step (3) comprises stripping, metal-assisted chemical corrosion, gas-assisted ion beam etching and high-density plasma etching.
5. The method for processing the large-aperture flexible optical super-structure surface device according to claim 1, wherein the method comprises the following steps: the high-refractive-index nano particles in the step (4) are titanium oxide, haar oxide, zirconium oxide, zinc oxide, cerium oxide and silicon, and the diameter of the high-refractive-index nano particles is less than or equal to 50 nm.
6. The method for processing the large-aperture flexible optical super-structure surface device according to claim 1, wherein the method comprises the following steps: the flexible substrate material in the step (4) is optical transparent polymer and metal glass, and the thickness of the flexible substrate is less than or equal to 500 mu m; the ultraviolet light source is a surface light source and a linear light source.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011507346.2A CN112558419A (en) | 2020-12-18 | 2020-12-18 | Processing method of large-caliber flexible optical super-structure surface structure |
| PCT/CN2021/113819 WO2022127170A1 (en) | 2020-12-18 | 2021-08-20 | Large-caliber flexible optical metasurface structure and processing method therefor |
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| CN202011507346.2A CN112558419A (en) | 2020-12-18 | 2020-12-18 | Processing method of large-caliber flexible optical super-structure surface structure |
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| WO (1) | WO2022127170A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112965254A (en) * | 2021-03-31 | 2021-06-15 | 歌尔股份有限公司 | Optical waveguide lens overlapping structure and manufacturing method thereof |
| CN114047566A (en) * | 2021-12-03 | 2022-02-15 | 上海理工大学 | Super-structure surface based on photoresist material |
| WO2022127170A1 (en) * | 2020-12-18 | 2022-06-23 | 中国科学院光电技术研究所 | Large-caliber flexible optical metasurface structure and processing method therefor |
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| CN115360496B (en) * | 2022-08-30 | 2023-09-29 | 合肥工业大学 | Preparation method of terahertz height difference cavity device based on metal-assisted chemical etching |
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- 2020-12-18 CN CN202011507346.2A patent/CN112558419A/en active Pending
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- 2021-08-20 WO PCT/CN2021/113819 patent/WO2022127170A1/en active Application Filing
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| TW201213240A (en) * | 2010-09-27 | 2012-04-01 | Chung Shan Inst Of Science | High refractive index TiO2 nano-composite optical film and production process thereof |
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| CN114047566A (en) * | 2021-12-03 | 2022-02-15 | 上海理工大学 | Super-structure surface based on photoresist material |
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| WO2022127170A1 (en) | 2022-06-23 |
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