CN112469508B - Method and apparatus for manufacturing laminate - Google Patents
Method and apparatus for manufacturing laminate Download PDFInfo
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- CN112469508B CN112469508B CN201980048779.5A CN201980048779A CN112469508B CN 112469508 B CN112469508 B CN 112469508B CN 201980048779 A CN201980048779 A CN 201980048779A CN 112469508 B CN112469508 B CN 112469508B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
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Abstract
The present invention provides a method for manufacturing a laminate and an apparatus for manufacturing a laminate for implementing the method, the method for manufacturing the laminate at least comprises: a step a of winding the continuously conveyed base material around a backup roller and applying a coating liquid containing an organic solvent to the base material on the backup roller to form a coating film; and a step b of reducing the organic solvent from the coating film on the backup roll by sucking the gas on the coating film, wherein the atmospheric pressure on the substrate when the substrate is brought into contact with the coating liquid in the step a is P A And the atmospheric pressure on the substrate when the gas is sucked in the step b is set as P B When is, P A And P B The condition 1 is satisfied: p A ＞P B And condition 2: p B The atmospheric pressure is less than or equal to-100 Pa.
Description
Technical Field
The present disclosure relates to a method and an apparatus for manufacturing a laminate.
Background
A method of producing a laminate by forming a target coating layer on a substrate in a continuous process in a roll-to-roll system is known.
As an example of a method for producing a laminate, japanese patent application laid-open No. 2014-188450 discloses a method for producing a laminated film using a coating film control device provided with 2 or more cover members covering the coating film and the thickness portions at both ends in the width direction of the film at least until the drying device is filled with a solvent evaporated from the coating film after a coating liquid including a resin material and a solvent is applied to one surface of a long film conveyed in the longitudinal direction to form the coating film, wherein the 2 or more cover members are cover members connected in the conveying direction of the film, and are provided with 1 or more porous cover members provided with holes and 1 or more non-porous cover members not provided with holes, and the coating film control device is provided with an exhaust mechanism for exhausting the solvent evaporated from the porous cover members to the outside, and can change the installation position of the cover members.
Jp 2011-036803 a discloses a method for manufacturing a barrier film having at least 1 polymer layer by coating a coating liquid for forming a polymer layer on a film substrate having at least 1 inorganic barrier layer, using a manufacturing process having a substrate supplying step, a coating step, a drying step, and a winding step, wherein at least the coating step uses a coating chamber having a reduced pressure atmosphere of-0.1 kPa to-1.0 kPa and a coater having a reduced pressure chamber on an upstream side, the reduced pressure chamber has a reduced pressure of-0.2 kPa to-3.0 kPa, the reduced pressure chamber and the coating chamber have a relationship of the reduced pressure chamber > the reduced pressure of the coating chamber, and a difference between the reduced pressure chamber and the coating chamber is 0.1kPa to 2kPa.
Disclosure of Invention
Technical problem to be solved by the invention
There is known a method of producing a laminate by winding a continuously conveyed base material around a backup roll by a continuous process in a roll-to-roll system, and applying a coating liquid containing an organic solvent on the wound base material by a die coater to form a target coating layer.
In the method for producing such a laminate, the coating film immediately after application and having the lowest solid content concentration is usually dried slowly so as not to be affected by disturbance (that is, the increase in the thickening rate of the coating film is slow).
However, even if the coating film immediately after coating is dried slowly, it is not sufficient to suppress the occurrence of wind spots.
Here, the term "wind unevenness" refers to a pattern such as a stripe or a spot formed on the surface of the coating layer in a direction substantially parallel to the conveyance direction of the substrate. The maximum width is, for example, 1mm to 20mm and the length is 30cm or more in the case of a striped pattern, and the maximum diameter is, for example, 1mm to 10mm in the case of a spotted pattern.
Accordingly, an object to be solved by one embodiment of the present invention is to provide a method and an apparatus for producing a laminate capable of forming a coating layer in which the occurrence of wind unevenness is suppressed on a base material.
Means for solving the technical problems
Specific means for solving the class include the following means.
<1> a method for producing a laminate, comprising at least: a step a of winding the continuously conveyed base material around a backup roller and applying a coating liquid containing an organic solvent to the base material on the backup roller to form a coating film; and
a step b of reducing the organic solvent from the coating film on the backup roll by sucking the gas on the coating film,
the atmospheric pressure on the substrate when the substrate is brought into contact with the coating liquid in the step a is P A And the atmospheric pressure on the substrate when the gas is sucked in the step b is set as P B When P is present A And P B The following conditions 1 and 2 are satisfied.
Condition 1: p A ＞P B
Condition 2: PB is less than or equal to atmospheric pressure-100 Pa
<2> the method of <1>, wherein the air velocity of the gas on the coating film in the step b is 1 to 100m/s. .
<3> the method for producing a laminate according to <1> or <2>, wherein a distance from a point of contact between the substrate and the coating liquid in the step a to a point of starting to getter gas on the coating film in the step b is 100mm or less.
<4> the method for producing a laminate according to any one of <1> to <3>, wherein in the step b, the gas on the coating film is gettered until the solid content concentration of the coating film reaches 70 mass%.
<5> an apparatus for manufacturing a laminate, comprising at least: a support roller around which the base material continuously conveyed is wound;
a die coater for forming a coating film by applying a coating liquid containing an organic solvent onto a base material wound around a backup roll; and
a decompression chamber which is arranged adjacent to the die coater and sucks the gas on the coating film to reduce the organic solvent from the coating film on the supporting roller,
the atmospheric pressure on the substrate when the substrate on the backup roll was brought into contact with the coating liquid applied by the die coater was set to P A And the atmospheric pressure on the substrate when the gas is sucked in the decompression chamber is set to be P B When is, P A And P B The following conditions 1 and 2 are satisfied.
Condition 1: p A ＞P B
Condition 2: p B Less than or equal to atmospheric pressure of-100 Pa
<6> the apparatus for producing a laminate according to <5>, wherein the air velocity of the gas on the coating film in the decompression chamber is 1m/s to 100m/s.
<7> the apparatus for producing a laminate according to <5> or <6>, further comprising a mechanism for supplying a gas to the decompression chamber.
<8> the apparatus for producing a laminate according to any one of <5> to <7>, wherein a distance from a point of contact between the base material on the backup roll and the coating liquid applied by the die coater to a point of starting to suck the gas on the coating film by the decompression chamber is 100mm or less.
<9> the apparatus for manufacturing a laminate according to any one of <5> to <8>, wherein a distance between a front end surface of a side surface of the decompression chamber and the support roller is 0.5mm or less.
<10> the apparatus for manufacturing a laminated body according to <9>, wherein a distance between the front end surface of the front surface of the decompression chamber and the support roller is larger than a distance between the front end surface of the side surface of the decompression chamber and the support roller.
<11> the apparatus for manufacturing a laminated body according to any one of <5> to <10>, wherein the decompression chamber includes a main body portion having an intake slit and an exhaust slit, and a side plate.
<12> the apparatus for manufacturing a laminate according to any one of <5> to <11>, wherein the surface temperature of the support roll is 40 ℃ to 120 ℃.
Effects of the invention
According to an embodiment of the present invention, a method and an apparatus for manufacturing a laminate capable of forming a coating layer in which occurrence of wind unevenness is suppressed on a base material can be provided.
Drawings
Fig. 1 is a schematic side view showing an example of a manufacturing apparatus for a laminate, which performs the steps a and b in the present disclosure.
Fig. 2 is a schematic side view for explaining the structure of the decompression chamber according to embodiment 1.
Fig. 3 is a schematic side view for explaining the structure of the decompression chamber according to embodiment 2.
Detailed Description
Hereinafter, a method for producing the laminate of the present disclosure will be described in detail.
In the present disclosure, the term "step" includes not only an independent step, but also a step that can achieve a desired purpose of the step even when the step is not clearly distinguished from other steps.
In the present disclosure, the numerical range represented by "to" means a range including the numerical values before and after "to" as the minimum value and the maximum value, respectively.
In the numerical ranges recited in the present disclosure in stages, the upper limit value or the lower limit value recited in a certain numerical range may be replaced with the upper limit value or the lower limit value recited in other numerical ranges recited in stages. In the numerical ranges described in the present disclosure, the upper limit value or the lower limit value described in a certain numerical range may be replaced with the values shown in the examples.
In addition, when reference numerals are the same in a plurality of drawings, the same objects are designated by the reference numerals. In addition, the overlapping structures and symbols in the drawings may not be described.
In the present disclosure, a combination of 2 or more preferred embodiments is a more preferred embodiment.
As described above, there is known a method of producing a laminate by winding a continuously conveyed base material around a backup roll by a continuous process in a roll-to-roll system, and applying a coating liquid containing an organic solvent on the wound base material by a die coater to form a target coating layer.
In the method for producing such a laminate, the coating film immediately after application having the lowest solid content concentration is usually dried slowly, but it is not sufficient to suppress the occurrence of wind unevenness.
Therefore, as a result of intensive studies on a technique for suppressing the occurrence of wind spots, it has been found that, as is apparent from the conventional method, the drying can be accelerated (that is, the coating film is thickened) by removing the organic solvent by sucking air from the coating film immediately after the coating film having the lowest solid content concentration, thereby suppressing the occurrence of wind spots.
The method for producing the laminate of the present disclosure based on the above findings is as follows.
That is, the method for producing a laminate according to the present disclosure is a method for producing a laminate, including at least: a step a of winding the continuously conveyed base material around a backup roller and applying a coating liquid containing an organic solvent to the base material on the backup roller to form a coating film; and a step b of reducing the organic solvent from the coating film on the backup roller by sucking the gas on the coating film, wherein the atmospheric pressure on the substrate when the substrate is brought into contact with the coating liquid in the step a is P A And the atmospheric pressure on the substrate when the gas is sucked in the step b is set as P B When is, P A And P B The following conditions 1 and 2 are satisfied.
Condition 1: p A ＞P B
Condition 2: p B Less than or equal to atmospheric pressure of-100 Pa
Condition 1 in the method for producing a laminate of the present disclosure represents an atmospheric pressure P on the substrate when the gas is suctioned in step b B Less than the atmospheric pressure P on the substrate when the substrate is in contact with the coating solution in step a (i.e., during coating) A 。
The condition 2 represents the atmospheric pressure P on the substrate when the gas is sucked in the step b B Is under atmospheric pressure of-100 pa and is in a reduced pressure state.
Here, "atmospheric pressure P on the substrate A "refers to the atmospheric pressure (i.e., static pressure) when the substrate comes into contact with the coating liquid (for example, the atmospheric pressure at point a in fig. 1 surrounded by the backup roller 110, the die coater 120, and the decompression chamber 130).
And "atmospheric pressure P on the substrate B "refers to the atmospheric pressure (i.e., static pressure) above the substrate (above a distance of 1mm to 10mm from the substrate, for example, above a distance of 5 mm) during the period of time when the gas on the coating film is sucked (for example, refers to the pressure at point b in fig. 1).
The "atmospheric pressure" in the present disclosure means an atmospheric pressure in an indoor environment where a manufacturing apparatus for performing the method of manufacturing a laminate of the present disclosure is placed.
Atmospheric pressure, atmospheric pressure P on the substrate A And P B The measurement is performed by a pressure gauge, specifically, for example, a general vacuum gauge type a (manufactured by TOYO KEIKI co., ltd.).
By satisfying the above conditions 1 and 2, the coating film can be thickened by quickly removing the organic solvent from the coating film immediately after the coating while the coating of the coating liquid in the step a is normally performed.
As a result, the method for producing a laminate according to the present disclosure can form a coating layer in which the occurrence of wind spots is suppressed on a substrate.
In addition, the methods described in the above-mentioned Japanese patent application laid-open Nos. 2014-188450 and 2011-036803, P in the present disclosure is not described A ＞P B The relationship (c) in (c).
Further, japanese patent laid-open nos. 2014-188450 and 2011-036803 do not describe the removal of the organic solvent from the coating film immediately after coating by sucking the gas on the coating film, and it goes without saying that the suppression of the occurrence of wind spots by this method is not studied.
The method for producing a laminate of the present disclosure is preferably performed by the following apparatus for producing a laminate of the present disclosure.
That is, the apparatus for producing a laminate according to the present disclosure is an apparatus for producing a laminate, including at least: a support roller around which the base material continuously conveyed is wound; a die coater for coating a coating liquid containing an organic solvent on a base material wound around a backup roll to form a coating film; and a decompression chamber arranged adjacent to the die coater for sucking the gas on the coating film to reduce the organic solvent from the coating film on the support roller
The atmospheric pressure on the substrate when the substrate on the backup roll was brought into contact with the coating liquid applied by the die coater was set to P A And the atmospheric pressure on the substrate when the gas is sucked in the decompression chamber is set to be P B When is, P A And P B The following conditions 1 and 2 are satisfied.
Condition 1: p is A ＞P B
Condition 2: p is B Less than or equal to atmospheric pressure of-100 Pa
The apparatus for manufacturing a laminate according to the present disclosure includes a decompression chamber, and the above-described conditions 1 and 2 can be satisfied by using the decompression chamber.
Hereinafter, a method and an apparatus for manufacturing a laminate according to the present disclosure will be described in detail with reference to the drawings.
[ Process a ]
In step a, the continuously conveyed base material is wound around a backup roll, and a coating liquid containing an organic solvent is applied to the base material on the backup roll to form a coating film.
An example of the step a will be described with reference to fig. 1 and 2.
Here, fig. 1 is a schematic side view showing an example of a manufacturing apparatus for a laminate which performs the step a and the step b.
In the step a, a coating liquid 150 containing an organic solvent is applied to the base material 140 wound around the backup roller 110 by the die coater 120, thereby forming a coating film 152 on the base material 140.
Here, the atmospheric pressure P on the substrate in the step a A Preferably, the pressure is in the range of-100 Pa to atmospheric pressure, and more preferably atmospheric pressure.
By the atmospheric pressure P on the substrate A Within the above range, good coatability can be obtained, and a coating film having high uniformity of film thickness can be easily formed.
The backup roll, die coater, base material and coating liquid used in step a will be described below.
(backup roll)
The support roller 110 is a member that is configured to be rotatable and can wind the base material and continuously convey the base material, and is rotationally driven at the same speed as the conveyance speed of the base material 140.
The support roller 110 is not particularly limited, and a known support roller can be used.
As the backup roller 110, for example, a backup roller whose surface is hard chrome-plated can be preferably used.
The thickness of the plating layer is preferably 40 to 60 μm from the viewpoint of securing conductivity and strength.
The surface roughness of the backup roll is preferably 0.1 μm or less in terms of surface roughness Ra from the viewpoint of reducing the variation in the frictional force between the base material 140 and the backup roll 110.
The support roller 110 may be heated from the viewpoint of enhancing the drying acceleration of the coating film, and from the viewpoint of suppressing the whitening (i.e., the whitening of the coating film due to the occurrence of fine condensation) of the coating film caused by the temperature decrease of the film surface.
The surface temperature of the backup roll 110 may be determined depending on the composition of the coating film, the curing property of the coating film, the heat resistance of the base material 140, and the like, and is, for example, preferably 40 to 120 ℃, and more preferably 40 to 100 ℃.
The support roller 110 preferably detects the surface temperature, and the surface temperature of the support roller 110 is maintained by a temperature control mechanism based on the temperature.
The temperature control mechanism of the support roller 110 includes a heating mechanism and a cooling mechanism. As the heating means, induction heating, water heating, oil heating, or the like can be used, and as the cooling means, cooling by cooling water can be used.
The diameter of the backup roll 110 is preferably 100mm to 1000mm, more preferably 100mm to 800mm, and further preferably 200mm to 700mm, from the viewpoint of facilitating winding of the substrate 140, facilitating coating by the die coater 120, securing the installation position of the decompression chamber 130, and from the viewpoint of manufacturing cost of the backup roll 110.
The conveying speed of the base material 140 on the backup roller 110 is preferably 10m/min to 100m/min from the viewpoint of ensuring productivity and coatability.
The winding angle of the base material 140 with respect to the backup roller 110 is preferably 60 ° or more, and more preferably 90 ° or more, from the viewpoint of stabilizing the conveyance of the base material 140 during coating and suppressing the occurrence of uneven thickness of the coating film. The upper limit of the winding angle may be less than 360 °, and may be set to 180 °, for example.
The wrap angle is an angle formed between the conveyance direction of the base material 140 when the base material 140 is in contact with the backup roller 110 and the conveyance direction of the base material 140 when the base material 140 is separated from the backup roller 110.
(die type coating machine)
The die coater 120 is a coating device for coating a coating liquid 150 on a substrate 140 through a branch pipe 124 formed in a module body 122 and a slit 126 communicating with the branch pipe 124.
The die coater 120 is disposed so that the tip and the discharge port thereof face the surface of the backup roll 110.
The die coater 120 has a module body 122 made up of 1 block or a plurality of blocks, and a branch pipe 124 and a slit 126 are formed by the module body 122.
The branch pipe 124 is a space extending along the width direction of the die coater 120, causes the coating liquid 150 supplied to the die coater 120 to diffuse and flow in the coating width direction (i.e., the width direction of the die coater 120), and temporarily stores the coating liquid 150.
The slit 126 is a space that communicates with the branch pipe 124 and extends from the branch pipe 124 in the direction of the front end of the die coater 120 along the width direction of the die coater 120. The slit 126 opens to the outside at the tip of the die coater 120, and serves as an ejection port for ejecting the coating liquid 150.
The distance between the tip of the die coater 120 and the backup roll 110 (i.e., the distance D1 shown in fig. 2) may be determined by the thickness of the substrate, the viscosity of the coating liquid, the thickness of the formed coating film, and the like, and may be set to be, for example, in the range of 0.05mm to 0.50 mm.
The distance D1 is the shortest distance between the front end of the die coater 120 and the backup roll 110.
The distance D1 can be determined using a taper gauge.
(substrate)
The substrate 140 is not particularly limited as long as it is a long substrate that can be continuously transported, and may be appropriately determined according to the application of the laminate.
In view of ease of winding onto a backup roll, a polymer film is preferably used as the base material 140.
Specific examples of the substrate 140 include various polymer films described below.
(coating liquid)
The coating liquid 150 is a coating liquid containing an organic solvent, and may be used without limitation as long as it can form the target coating layer.
For example, the coating liquid 150 may be a curable coating liquid containing a polymerizable or crosslinkable compound, or may be a non-curable coating liquid.
By the method and the apparatus for producing a laminate according to the present disclosure, a coating layer in which the occurrence of wind unevenness is suppressed can be formed. Therefore, as the coating liquid 150, for example, a coating liquid for forming a hard coat layer, a liquid crystal layer, a refractive index adjusting layer, and the like in an optical film as a thin layer of 5 μm or less can also be applied.
The content of the organic solvent in the coating liquid is not particularly limited, but is preferably 20% by mass or more, more preferably 30% by mass or more, further preferably 40% by mass or more, and particularly preferably 50% by mass or more, based on the total mass of the coating liquid, from the viewpoint of easily forming a coating film in which the occurrence of wind unevenness is suppressed. The upper limit of the content of the organic solvent in the coating liquid may be determined depending on the kind of the coating liquid capable of forming the target coating layer, and may be less than 100 mass%, and more preferably 80 mass% or less.
Here, as an example of the coating liquid, a coating liquid for forming a hard coat layer (hereinafter, also referred to as a coating liquid for forming a hard coat layer) will be described, but the present disclosure is not limited to this embodiment.
The hard coat layer is preferably formed by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound. That is, the coating liquid for forming a hard coat layer preferably contains, for example, a polymerizable compound such as a monomer or an oligomer, a polymerization initiator, and a solvent.
The polymerizable compound is preferably a compound showing polymerizability by active energy rays such as light, electron beams, and radiation, and particularly preferably a compound showing photopolymerization.
Examples of the photopolymerizable compound include compounds having an unsaturated double bond such as a (meth) acryloyl group, a vinyl group, a styryl group, and an allyl group, and among them, compounds having a (meth) acryloyl group are preferable.
Compounds having unsaturated double bonds
Examples of the compound having an unsaturated double bond include a monomer, an oligomer, and a polymer, and among them, a polyfunctional monomer having 2 or more (preferably 3 or more) unsaturated double bonds is preferable.
Examples of the polyfunctional monomer having 2 or more unsaturated double bonds include alkylene glycol (meth) acrylates, polyoxyalkylene glycol (meth) acrylates, polyol (meth) acrylates, (meth) acrylates of ethylene oxide or propylene oxide adducts, epoxy (meth) acrylates, urethane (meth) acrylates, polyester (meth) acrylates, and the like, and among them, polyol (meth) acrylates are preferable.
Specific examples of the polyfunctional monomer having 2 or more unsaturated double bonds include 1, 4-butanediol di (meth) acrylate, 1, 6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, ethylene Oxide (EO) modified trimethylolpropane tri (meth) acrylate, propylene Oxide (PO) modified trimethylolpropane tri (meth) acrylate, EO modified phosphoric acid tri (meth) acrylate, trimethylolethane tri (meth) acrylate, bis-trimethylolpropane tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol hexa (meth) acrylate, polyurethane urethane acrylate, polyester polyacrylate, caprolactone modified tris (acryloyloxyethyl) isocyanurate, and the like.
The unsaturated double bond-containing compound can be used alone in 1 or in combination of 2 or more.
The content of the compound having an unsaturated double bond in the coating liquid for forming a hard coat layer is preferably 40 to 98% by mass, more preferably 60 to 95% by mass, based on the total solid content in the coating liquid for forming a hard coat layer, from the viewpoint of providing a sufficient polymerization rate to provide hardness and the like.
Polymerization initiators
The coating liquid for forming a hard coat layer preferably contains a polymerization initiator.
The polymerization initiator is preferably a photopolymerization initiator, and examples thereof include acetophenones, benzoins, benzophenones, phosphine oxides, ketals, anthraquinones, thioxanthones, azo compounds, peroxides, 2, 3-dialkyldiketone compounds, disulfide compounds, fluoroamine compounds, aromatic sulfonium compounds, powderine dimers, onium salts, borate salts, active esters, active halogens, inorganic complexes, and coumarins.
Specific examples and preferred embodiments of photopolymerization initiators, and commercially available products and the like are described in paragraphs [0133] to [0151] of jp 2009-098658 a, and can be similarly used suitably in the present disclosure.
Various examples are described as polymerization initiators, "latest UV curing technology" { TECHNICAL INFORMATION INSTITUTE CO., LTD } (1991), P.159, and "ultraviolet curing System". Canton, published by the general TECHNICAL center (1989), and P.65 to 148, and these can also be used.
The polymerization initiator can be used alone in 1 kind or in combination of 2 or more kinds.
The content of the polymerization initiator in the composition for a hard coat layer is preferably 0.5 to 8% by mass, and more preferably 1 to 5% by mass, based on the total solid content in the composition for a hard coat layer, from the viewpoint of setting the content to a sufficiently small amount that is sufficient for polymerizing the polymerizable compound contained in the composition for a hard coat layer and avoids an excessive increase in the initiation point.
Organic solvents-
The coating liquid for forming a hard coat layer may contain various organic solvents as a solvent.
As the organic solvent, an ether solvent, a ketone solvent, an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent, or the like can be used.
Specific examples thereof include dibutyl ether, dimethoxyethane, diethoxyethane, propylene oxide, 1, 4-dioxane, 1, 3-dioxolane, 1,3, 5-trioxane, tetrahydrofuran, anisole, phenetole, methyl ethyl ketone (also referred to as MEK), diethyl ketone, dipropyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone (also referred to as cyclohexanol), methylcyclohexanone, methyl isobutyl ketone, 2-octanone, 2-pentanone, 2-hexanone, ethylene glycol ethyl ether, ethylene glycol isopropyl ether, ethylene glycol butyl ether, propylene glycol methyl ether, ethyl carbitol, butyl carbitol, hexane, heptane, octane, cyclohexane, methylcyclohexane, ethylcyclohexane, benzene, toluene, xylene, and the like.
Further, as the organic solvent, for example, a hydrophilic solvent other than the above is preferably contained. As the hydrophilic solvent, an alcohol solvent, a carbonate solvent, or an ester solvent can be used.
Specific examples thereof include methanol, ethanol, isopropanol, n-butanol, cyclohexanol, 2-ethyl-1-hexanol, 2-methyl-1-hexanol, 2-methoxyethanol, 2-propoxyethanol, 2-butoxyethanol, diacetone alcohol, dimethyl carbonate, diethyl carbonate, diisopropyl carbonate, methyl ethyl carbonate, methyl n-propyl carbonate, ethyl formate, propyl formate, pentyl formate, methyl acetate, ethyl acetate, propyl acetate, methyl propionate, ethyl 2-ethoxypropionate, methyl acetoacetate, ethyl acetoacetate, methyl 2-methoxyacetate, methyl 2-ethoxyacetate, ethyl 2-ethoxyacetate, acetone, 1, 2-diethoxyacetone, acetylacetone, ethylene glycol monobutyl acetate, propylene glycol monomethyl ether acetate, diethylene glycol acetate, and the like.
The organic solvent may be used alone in 1 kind or in combination of 2 or more kinds.
The solvent in the coating liquid for forming a hard coat layer is preferably used so that the solid content of the coating liquid for forming a hard coat layer is in the range of 20 to 80% by mass. That is, the content of the solvent in the coating liquid for forming a hard coat layer is preferably 20 to 80% by mass, more preferably 25 to 70% by mass, and still more preferably 30 to 60% by mass, based on the total mass of the coating liquid for forming a hard coat layer.
Surfactants-
The coating liquid for forming a hard coat layer may contain a surfactant.
The surfactant is not particularly limited, but is preferably a fluorine-based surfactant or a silicone-based surfactant. The surfactant is preferably a polymer compound rather than a low-molecular compound.
As the surfactant, 1 kind can be used alone or 2 or more kinds can be used in combination.
The content of the surfactant is preferably 0.01 to 0.5% by mass, and more preferably 0.01 to 0.3% by mass, based on the total solid content of the coating liquid for forming a hard coat layer.
Other ingredients-
The coating liquid for forming a hard coat layer may contain other components such as inorganic particles, resin particles, a monomer for adjusting refractive index, and a conductive compound.
The coating liquid for forming a hard coat layer is not limited to the above composition, and for example, coating liquids described in japanese patent No. 5933353, japanese patent No. 5331919, and the like can be applied.
[ Process b ]
In the step b, the gas on the coating film is sucked to reduce the organic solvent from the coating film on the backup roll.
An example of the step b will be described with reference to fig. 1 to 3.
In step b, the gas on the coating film 152 positioned on the backup roll 110 is sucked into the decompression chamber 130. The gas on the coating film 152 is sucked into the decompression chamber 130, and the organic solvent in the coating film is reduced.
Here, regarding the atmospheric pressure P on the substrate in the step b B As shown in condition 1, is less than the atmospheric pressure P on the substrate A And as shown in condition 2, is at atmospheric pressure of-100 Pa or lower.
By satisfying these conditions, a coating film in which the occurrence of wind unevenness is suppressed can be formed, and as a result, a coating layer in which the occurrence of wind unevenness is suppressed can be formed.
As the atmospheric pressure P on the substrate in the step b B From the viewpoint of being less susceptible to the influence of disturbance, the degree of decompression is preferably high, and is preferably from atmospheric pressure to 1000Pa or less, and more preferably from atmospheric pressure to 10000Pa or less.
As atmospheric pressure P on the substrate B The lower limit of (b) may be determined by the limit of the vacuum chamber 130, the suppression of the floating of the base material 140 from the backup roller 110, and the like, and may be set to, for example, an atmospheric pressure of-50000 Pa.
The decompression chamber used in step b will be described below.
(decompression chamber)
As shown in fig. 1, the decompression chamber 130 is disposed adjacent to the downstream side of the die coater 120 in the conveyance direction of the substrate.
By separately disposing the decompression chamber 130 and the die coater 120, the atmospheric pressure P on the substrate can be adjusted A The preferred range is adjusted to the above range.
For example, as shown in fig. 2, the separation distance D2 between the die coater 120 and the decompression chamber 130A can be set to a range of 1mm to 5 mm.
In addition, the distance D2 refers to the shortest distance between the side surface of the die coater 120 and the side surface of the decompression chamber 130A.
By adjusting the separation distance D2, the distance from the point of contact between the substrate and the coating liquid in step a (i.e., the point of contact between the substrate on the backup roll and the coating liquid applied by the die coater) to the point of start of suctioning the gas on the coating film in step b (i.e., the point of start of suctioning the gas on the coating film by the decompression chamber) can be changed.
Here, the point of contact between the substrate and the coating liquid in step a is point c on the substrate 140 in fig. 1, and the point of starting to suck the gas on the coating film in step b is point d on the substrate 140 at the shortest distance from the upstream end of the vacuum chamber 130 in the substrate conveyance direction in fig. 1.
The distance between the point c and the point d is preferably 50mm or less, and more preferably 30mm or less.
The lower limit of the distance between the point c and the point d is considered to be about 1mm in the design of the apparatus.
The range in which the gas on the coating film is sucked by the decompression chamber 130 is not particularly limited, and may be performed until the substrate 140 is separated from the backup roll 110, and may be continued until the substrate 140 is separated from the backup roll 110 as long as the size of the decompression chamber 130 is within a range that allows the substrate 140 to be stably conveyed.
That is, the air suction in the step b is performed on the coating film on the backup roll, but the air suction may be performed also on the coating film on the base material separated from the backup roll.
However, from the viewpoint of increasing the size of the decompression chamber 130, it is preferable that the distance from point d in fig. 1 (the point at which the suction of the gas on the coating film by the decompression chamber starts) to point e in fig. 1 (the point at which the suction of the gas on the coating film by the decompression chamber ends) be in the range of 100mm to 500mm (more preferably 100mm to 200 mm).
Here, the point e is a point on the substrate located at the shortest distance from the downstream end of the decompression chamber 130 in the conveyance direction of the substrate.
In order to set the distance between the points d and e within the above range, the length of the decompression chamber 130 in the conveyance direction of the substrate 140 may be adjusted. That is, the length of the decompression chamber 130 in the conveyance direction of the substrate 140 may be set to 100mm to 500 mm.
In addition, the range in which the gas on the coating film is sucked in by the decompression chamber 130 is preferably performed until the solid content concentration of the coating film reaches 60 mass% (preferably 70 mass%) from the viewpoint of easily suppressing the occurrence of wind unevenness.
That is, in the step b, the gas on the coating film is preferably gettered until the solid content concentration of the coating film reaches 60 mass% (preferably 70 mass%).
Therefore, for example, the length of the decompression chamber 130 in the conveyance direction of the substrate 140 may be set so that the solid content concentration of the coating film becomes 60 mass% (preferably 70 mass%) or more at the point e. Specifically, the relationship between the time for which the gas on the coating film is sucked in by the vacuum chamber 130 and the change in the solid content concentration of the coating film is obtained in advance, and the length of the vacuum chamber 130 in the transport direction of the substrate 140 may be set so that the point e reaches a position where the solid content concentration of the coating film becomes 60 mass% (preferably 70 mass%).
Here, the solid content concentration of the coating film can be measured, for example, by an optical interference film thickness meter. Specifically, the solid content concentration of the coating film can be measured on line by measuring the optical thickness of the film from the time of application to the time of being a dry film, for example, by an infrared spectroscopic interference film thickness meter SI-T80 manufactured by KEYENCE CORPORATION.
Specifically, the optical thickness of the film from the time of coating to the time of dry film formation was measured. Next, the thickness of the dried film (i.e., the dry film) was measured using a contact type thickness gauge. The thickness of the dry film measured with a contact thickness meter was divided by the optical thickness for correction. From the corrected value, the thickness of the wet film (coating film) was calculated from the optical thickness. Then, the solvent amount was obtained from the thickness of the wet film (coating film) on the measurement point. Then, the solvent mass was determined from the obtained solvent amount, and the value of the solid content concentration at the measurement point was obtained.
The decompression chamber 130 has a function of sucking the gas on the coating film as long as the atmospheric pressure P on the substrate can be set B The structure is not limited if the atmospheric pressure is-100 Pa or lower.
In the present disclosure, the decompression chamber 130 is described in more detail with reference to fig. 2 and 3, but the present disclosure is not limited to this configuration.
Here, fig. 2 is a schematic side view for explaining the structure of the decompression chamber according to embodiment 1, and fig. 3 is a schematic side view for explaining the structure of the decompression chamber according to embodiment 2.
The decompression chamber 130A of embodiment 1 shown in fig. 2 is constituted by a decompression chamber main body 131 and an exhaust port 132. The decompression chamber 130A (decompression chamber main body 131) has a substantially rectangular parallelepiped shape in which a surface facing the surface of the backup roller 110 is open, in order to suck the gas on the coating film 152.
As shown in fig. 2, the side surface of the decompression chamber main body 131 (i.e., the surface parallel to the substrate conveyance direction) has an arcuate front end surface 131A that matches the curvature of the backup roller 110 in a side view.
Here, the arc shape does not need to be strictly a partial shape of the circumference, and may be a shape similar to the partial shape of the circumference.
The distance D3 between the arc-shaped front end face (an example of the front end face of the side face of the decompression chamber) 131A and the backup roller 110 is set so that the atmospheric pressure P is applied to the substrate B From the viewpoint of atmospheric pressure-100 Pa or less, it is preferably 0.5mm or less in order to further reduce the atmospheric pressure P on the substrate B The distance D3 is preferably reduced, and more preferably 0.4mm or less.
From the viewpoint of suppressing contact with the substrate 140, contact with the coating film 152, and the like, the lower limit of the distance D3 is preferably set to 0.1mm.
Here, the distance D3 is the shortest distance between the arc-shaped distal end surface 131A and the support roller 110.
The distance between the arc-shaped distal end surface 131A and the support roller 110 can be measured by the same method as the distance D1.
The decompression chamber main body 131 is connected to a blower, not shown, via an exhaust port 132. By operating the blower, the inside of the decompression chamber 130A (decompression chamber main body 131) is decompressed to atmospheric pressure or less by sucking gas from the exhaust port 132.
Then, the degree of decompression in the decompression chamber 130A (decompression chamber main body 131) is adjusted, so that the atmospheric pressure P on the substrate when the gas is sucked in the decompression chamber 130A B The pressure is set to-100 Pa or less.
Here, a mechanism for controlling inflow and outflow of gas into and out of the decompression chamber 130A may be provided on the outer periphery of the surface of the decompression chamber main body 131 facing the surface of the support roller 110 (the front end surface of the back surface and the front end surface of the decompression chamber other than the arc-shaped front end surface 131A). Specifically, for example, a mechanism for adjusting the pressure loss by providing a clearance such as a labyrinth is given. The labyrinth may be multi-stage, or the size of the gap may be changed for each stage.
By providing the gas inflow suppressing mechanism, the degree of pressure reduction in the decompression chamber 130A (decompression chamber main body 131) can be easily increased.
The decompression chamber main body 133 has an intake slit 134 as a means for supplying gas to the decompression chamber 130B and an exhaust slit 135 as a means for discharging gas from the decompression chamber 130B.
The air velocity of the gas on the coating film in the decompression chamber 130B is preferably in the range of 0.5m/s to 100m/s, and by applying the convection of the gas, the air velocity can be in the range of 1m/s to 100m/s, and more preferably in the range of 10m/s to 100m/s.
The air velocity of the gas on the coating film is a value measured by an omnidirectional anemometer at an upper portion of a distance of 1mm from the surface of the coating film, and specifically, is a value measured by, for example, anemomaster (Anemomaster anemometer MODEL-611 series, KANOMAX JAPAN INCORPORATED).
Further, by adjusting the balance between the amount of gas that is introduced from the inlet slit 134 of the decompression chamber main body 133 and the amount of gas that is discharged from the outlet slit 135, the space in the decompression chamber 130B can be decompressed to atmospheric pressure or less.
Then, the degree of pressure reduction in the space of the decompression chamber 130B is adjusted to adjust the atmospheric pressure P on the substrate when the gas is sucked in the decompression chamber 130B B The pressure is set to-100 Pa or less.
The intake slit 134 and the exhaust slit 135 have a gap of, for example, 0.1mm to 5mm, respectively, and intake and exhaust of gas are performed through the gap.
The side plate 136 is a plate-like member disposed in contact with a side surface of the decompression chamber main body 133 (i.e., a surface parallel to the conveyance direction of the substrate).
As shown in fig. 3, the side plate 136 has an arc-shaped front end surface (an example of a front end surface of the decompression chamber side surface) 136A that matches the curvature of the support roller 110 in a side view.
The distance D3 between the arc-shaped distal end surface 136A and the support roller 110 is the same as the distance D3 between the arc-shaped distal end surface 136A and the support roller 110 in the decompression chamber 130A, and preferred embodiments and measurement methods are the same.
The front plate 138 is a plate-like member disposed in contact with the front surface of the decompression chamber main body 133 (i.e., a surface perpendicular to the conveyance direction of the substrate and on the upstream side in the conveyance direction of the substrate).
The distance D4 between the front end surface (an example of the front end surface of the back surface of the decompression chamber) 137A of the back plate 137 and the backup roller 110 is set so that the atmospheric pressure P is applied to the substrate B From the viewpoint of atmospheric pressure-100 Pa or lower, it is preferably 0.5mm or lower in order to further reduce the atmospheric pressure P on the substrate B The distance D4 is preferably reduced, and more preferably 0.4mm or less.
From the viewpoint of suppressing contact with the substrate 140, contact with the coating film 152, and the like, the lower limit of the distance D4 is preferably set to 0.1mm.
Here, the distance D4 is the shortest distance between the front end surface 137A of the back panel 137 and the support roller 110.
The distance between the front end surface 137A of the back plate 137 and the support roller 110 can be measured by the same method as the distance D1.
The distance D5 between the front end face 138A of the front plate 138 (an example of the front end face of the decompression chamber) and the backup roller 110 is set so that the atmospheric pressure P is applied to the substrate B From the viewpoint of atmospheric pressure-100 Pa or less, it is preferably 0.5mm or less in order to further reduce the atmospheric pressure P on the substrate B The distance D5 is preferably reduced, and more preferably 0.4mm or less.
From the viewpoint of suppressing contact with the substrate 140, contact with the coating film 152, and the like, the lower limit of the distance D5 is preferably set to 0.1mm.
Here, the distance D5 is the shortest distance between the front end surface 138A of the front panel 138 and the support roller 110.
The distance between the front end surface 138A of the front plate 138 and the support roller 110 can be measured by the same method as the distance D1.
In addition, from the viewpoint of reducing the disturbance of the coating film due to the dynamic pressure of the wind at the inlet of the decompression chamber, the distance D5 is preferably larger than the distance D3 between the arc-shaped distal end surface 136A and the backup roller 110.
Here, the 2 side plates 136, the back plate 137, and the front plate 138 may be provided with a mechanism for suppressing inflow of gas, which is similar to the mechanism described in embodiment 1, on the outer periphery of the surface facing the surface of the support roller 110.
By providing the gas inflow suppressing mechanism, the degree of pressure reduction in the decompression chamber 130B can be easily increased.
As a result of performing step b in the decompression chamber as described above, a coating film in which the occurrence of wind unevenness is suppressed can be formed.
The method for producing a laminate of the present disclosure may further include, in addition to the steps a and b, a drying step of drying the coating film thickened in the step b, a curing step of irradiating the coating film after the drying step with an active energy ray to cure the coating film, and the like.
[ drying Process ]
In the drying step, the solvent is reduced from the coating film formed in the multilayer coating step.
The drying mechanism used in the drying step is not particularly limited, and examples thereof include a method using an oven, a fan heater, an Infrared (IR) heater, and the like.
In the drying by the warm air blower, the warm air may be blown from the side opposite to the coating film forming side of the base material, or a diffusion plate may be provided to prevent the coating film from flowing with the warm air.
The drying conditions may be determined depending on the type of the coating film to be formed, the amount of coating, the transfer speed, and the like, and are preferably in the range of 30 to 140 ℃ for 10 seconds to 10 minutes, for example.
[ curing step ]
In the curing step, the coating film after the drying step is irradiated with active energy rays to cure the coating film.
The irradiation mechanism of the active energy ray used in the curing step is not particularly limited as long as it is a mechanism that imparts energy capable of generating active species to the irradiated coating film.
Specific examples of the active energy ray include an α ray, a γ ray, an X ray, an ultraviolet ray, an infrared ray, a visible ray, and an electron beam. Among these, from the viewpoint of curing sensitivity and easy availability of the apparatus, it is preferable to use ultraviolet rays as the active energy rays.
Examples of the light source of ultraviolet rays include lamps such as a tungsten lamp, a halogen lamp, a xenon flash lamp, a mercury xenon lamp, and a carbon arc lamp, various lasers (e.g., a semiconductor laser, a helium-neon laser, an argon ion laser, a helium-cadmium laser, a YAG (Yttrium Aluminum Garnet) laser), a light emitting diode, and a cathode ray tube.
The peak wavelength of the ultraviolet light emitted from the ultraviolet light source is preferably 200nm to 400nm.
Further, the amount of exposure energy of ultraviolet rays is preferably 100mJ/cm, for example 2 ～500mJ/cm 2 。
As a result, a laminate having a coating layer formed from the coating liquid provided on the substrate can be produced.
[ laminate ]
The laminate obtained by the method for producing a laminate of the present disclosure has a substrate and an object coating layer formed from a coating liquid.
(substrate)
The substrate can be appropriately selected according to the use of the laminate, and examples thereof include a polymer film.
For optical film applications, the substrate preferably has a light transmittance of 80% or more.
When the polymer film is used as a substrate for optical film applications, it is preferable to use an optically isotropic polymer film.
Examples of the substrate include polyester substrates (films or sheets of polyethylene terephthalate, polyethylene naphthalate, and the like), cellulose substrates (films or sheets of cellulose acetate butyrate, triacetyl cellulose (TAC), and the like), polycarbonate substrates, poly (meth) acrylic substrates (films or sheets of polymethyl methacrylate, and the like), polystyrene substrates (films or sheets of polystyrene, acrylonitrile styrene copolymer, and the like), olefin substrates (films or sheets of polyethylene, polypropylene, polyolefin having a cyclic or norbornene structure, ethylene propylene copolymer, and the like), polyamide substrates (films or sheets of polyvinyl chloride, nylon, aromatic polyamide, and the like), polyimide substrates, polysulfone substrates, polyether sulfone substrates, polyether ether ketone substrates, polyphenylene sulfide substrates, vinyl alcohol substrates, polyvinylidene chloride substrates, polyvinyl butyral substrates, poly (meth) acrylate substrates, polymethylaldehydes, epoxy resin substrates, and the like, or substrates made of a blend of the above-mentioned polymer materials.
The substrate may be a substrate having a layer formed on the polymer film in advance.
Examples of the layer formed in advance include an adhesive layer, a barrier layer against water, oxygen, and the like, a refractive index adjusting layer, and the like.
(target coating layer)
The target coating layer formed from the coating liquid is not particularly limited, and examples thereof include a hard coat layer, a liquid crystal layer, a refractive index adjusting layer, and the like in the case of optical film applications.
The thickness of the layer formed from the coating liquid varies depending on the application, but can be set to, for example, 5 μm or less, and more preferably, in the range of 0.1 to 100 μm by using the method for producing a laminate according to the present disclosure.
(other layer)
The layer formed from the coating liquid may further have another layer depending on the use.
Examples
The present invention will be described more specifically with reference to the following examples, but the present invention is not limited to the following examples as long as the invention does not depart from the gist thereof.
(preparation of substrate)
As a base material, a long triacetyl cellulose (TAC) film (TD 40UL, FUJIFILM co., ltd., refractive index 1.48) having a thickness of 60 μm and a width of 1340mm was prepared.
(preparation of coating liquid for hard coat layer formation 1)
The mixture of the components described below was put into a mixing tank and stirred, and filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating liquid for forming a hard coat layer (solid content: 50 mass%, viscosity: 2.9 mPas).
Coating liquid for hard coat layer formation 1-
Polymerizable compound (a): pentaerythritol tetraacrylate (Shin-Nakamura Chemical co., ltd. Nk esters): 48.4% by mass
Photopolymerization initiator: omnirad 184 (IGM Resins b.v.): 1.5% by mass
Surfactants: the following fluorine-based surfactants: 0.1% by mass
Organic solvent: methyl ethyl ketone: 50% by mass
[ chemical formula 1]
(preparation of coating liquid for hard coat layer formation 2)
The mixture of the components described below was put into a mixing tank and stirred, and filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating liquid for forming a hard coat layer (solid content: 50 mass%, viscosity: 3.6 mPas).
Coating liquid for hard coat layer formation 2-
Polymerizable compound: mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA, nippon kayaku co., ltd.): 48.5% by mass
Photopolymerization initiator: omnirad 907 (IGM Resins b.v.): 1.5% by mass
Organic solvent: methyl ethyl ketone: 35% by mass
Organic solvent: cyclohexanone: 15% by mass
(examples 1 to 8 and comparative examples 1 and 2)
(Process a)
The coating liquid for forming a hard coat layer was applied on the TAC film by a die coater.
Specifically, the substrate was conveyed on a backup roll having a surface temperature of 60 ℃ and an outer diameter of 300mm, and the substrate on the backup roll was coated with a coating liquid for forming a hard coat layer by a die coater. At this time, the winding angle of the base material was 150 °.
At this time, the atmospheric pressure P on the substrate A As described in table 1. The distance D1 and the distance between the point c and the point D are also shown in table 1.
In step a, the temperature at the time of discharging the coating liquid was 23 ℃, the coating width was 1300mm, and the coating speed (i.e., the substrate conveyance speed) was 10m/min.
(Process b)
Next, the gas on the coating film was sucked in by the decompression chamber described in fig. 2 or 3. In addition, the separation distance D2 between the die coater 120 and the decompression chamber 130A or 130B is 20mm.
In comparative example 1, although the decompression chamber shown in fig. 2 was provided, the gas was not sucked from the exhaust port 132, and the inside of the decompression chamber 130A (decompression chamber main body 131) was not decompressed.
At this time, the atmospheric pressure P on the substrate B As shown in table 1.
Table 1 shows the distance D3, the distance D4, the distance D5, the distance between the points D and e, the solid content concentration of the coating film at the point e, and the wind velocity of the gas on the coating film.
(drying step and curing step)
Then, the coating film was dried at 60 ℃ for 1 minute and then dried at 200mJ/cm 2 The coating film is cured by irradiating ultraviolet rays with the exposure energy of (3).
As a result, a hard coat layer having a thickness of 5 μm was formed.
The TAC film with the hard coat layer formed was wound up in a roll shape.
The laminates of the examples were produced as described above.
The physical properties (atmospheric pressure, distance, and wind speed) in step a and step b are values measured by the above-described method.
(evaluation: evaluation of wind Spot)
The hard coat layer of the laminate produced above was observed visually on the surface thereof at a distance of 1 to 10m from the end (end on the winding end side) to evaluate the wind spots.
The evaluation indexes are as follows.
Evaluation index of wind spots-
1: no wind spots were observed.
2: 1 to 2 weak streaky wind spots were observed.
3: strong streaky wind spots were observed.
4: streaky and spotted wind spots were observed over the entire surface.
As shown in table 1, it was found that a laminate having a coating layer in which the occurrence of wind spots was suppressed was obtained by the production method of the example.
In particular, it is found that wind spots can be further suppressed by increasing the wind speed of the gas on the coating film by performing air intake and exhaust as in the vacuum chamber shown in fig. 3.
Description of the symbols
110-backing roll, 120-die coater, 122-die body, 124-branch, 126-slit, 130A, 130B-decompression chamber, 131-decompression chamber body, 131A-circular arc front end face, 132-exhaust port, 133-decompression chamber body, 136-side plate, front end face of 136A-side plate, 137-back plate, 138-front plate, 140-substrate, 150-coating liquid, 152-coating film, a-measurement of atmospheric pressure P on substrate A B-measuring the atmospheric pressure P on the substrate B D-the point at which the gettering of the gas on the coating film starts, e-the point at which the gettering of the gas on the coating film ends, D1-the distance between the front end of the die coater and the backup roller, D2-the separation distance between the die coater and the decompression chamber, D3-the distance between the front end face of the side face of the decompression chamber and the backup roller, D4-the distance between the front end face of the back face of the decompression chamber and the backup roller, D5-the distance between the front end face of the front face of the decompression chamber and the backup roller.
The disclosure of japanese patent application 2018-152978, filed on 2018, 8, 15, is incorporated in its entirety by reference into this specification.
All documents, patent applications, and technical specifications described in the present specification are incorporated by reference into the present specification as if each document, patent application, and technical specification were specifically and individually described to be incorporated by reference.
Claims (10)
1. A method for manufacturing a laminate, comprising at least:
a step a of winding the continuously conveyed base material around a backup roll, and applying a coating liquid containing an organic solvent to the base material on the backup roll by a die coater to form a coating film; and
a step b of reducing the organic solvent from the coating film on the backup roll by sucking the gas on the coating film in a decompression chamber,
the method further comprises a step of supplying a gas to the decompression chamber,
the decompression chamber is composed of a side plate and a main body part with an air inlet slit and an air outlet slit, and is arranged adjacent to the die coater,
the atmospheric pressure on the substrate when the substrate is brought into contact with the coating liquid in the step a is P A The atmospheric pressure on the substrate when the gas is sucked in the step b is P B At this time, P A And P B The following conditions 1 and 2 are satisfied,
condition 1: p A ＞P B
Condition 2: p B The atmospheric pressure is less than or equal to-100 Pa.
2. The method for producing a laminate according to claim 1,
the air velocity of the gas on the coating film in the step b is 1m/s to 100m/s,
the wind speed of the gas on the coating film was measured by a nondirectional anemometer at a wind speed of 1mm from the surface of the coating film.
3. The method for producing a laminate according to claim 1 or 2, wherein,
the distance from the point of contact between the substrate and the coating liquid in step a to the point of starting to getter the gas on the coating film in step b is 100mm or less.
4. The method for producing a laminate according to claim 1 or 2, wherein,
in the step b, the gas on the coating film is aspirated until the solid content concentration of the coating film reaches 70 mass%.
5. An apparatus for manufacturing a laminate, comprising at least:
a support roller around which the base material continuously conveyed is wound;
a die coater that applies a coating liquid containing an organic solvent onto a base material wound around a backup roll to form a coating film; and
a decompression chamber which is provided adjacent to the die coater and includes a side plate and a main body having an air inlet slit and an air outlet slit, and which reduces the organic solvent from the coating film on the backup roller by sucking the gas on the coating film,
the manufacturing apparatus further has a mechanism for supplying a gas to the decompression chamber,
the atmospheric pressure on the substrate when the substrate on the backup roll was brought into contact with the coating liquid applied by the die coater was set to P A The atmospheric pressure on the substrate when the gas is sucked in the decompression chamber is P B At this time, P A And P B The following conditions 1 and 2 are satisfied,
condition 1: p A ＞P B
Condition 2: p is B The atmospheric pressure is less than or equal to-100 Pa.
6. The apparatus for manufacturing a laminate according to claim 5,
the air speed of the air on the coating film in the decompression chamber is 1 m/s-100 m/s,
the wind speed of the gas on the coating film was measured by a nondirectional anemometer at a wind speed of 1mm from the surface of the coating film.
7. The apparatus for manufacturing a laminate according to claim 5 or 6,
the distance from the point of contact between the base material on the backup roll and the coating liquid applied by the die coater to the point of starting the suction of the gas on the coating film by the decompression chamber is 100mm or less.
8. The apparatus for manufacturing a laminate according to claim 5 or 6,
the distance between the front end surface of the side surface of the decompression chamber and the support roller is less than 0.5 mm.
9. The apparatus for manufacturing a laminate according to claim 8,
the distance between the front end face of the front face of the decompression chamber and the supporting roller is larger than the distance between the front end face of the side face of the decompression chamber and the supporting roller.
10. The apparatus for manufacturing a laminate according to claim 5 or 6, wherein,
the surface temperature of the supporting roller is 40-120 ℃.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018152978 | 2018-08-15 | ||
| JP2018-152978 | 2018-08-15 | ||
| PCT/JP2019/031749 WO2020036153A1 (en) | 2018-08-15 | 2019-08-09 | Laminated body manufacturing method and manufacturing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112469508A CN112469508A (en) | 2021-03-09 |
| CN112469508B true CN112469508B (en) | 2022-12-16 |
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| CN201980048779.5A Active CN112469508B (en) | 2018-08-15 | 2019-08-09 | Method and apparatus for manufacturing laminate |
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| Country | Link |
|---|---|
| JP (1) | JP7019049B2 (en) |
| KR (1) | KR102480805B1 (en) |
| CN (1) | CN112469508B (en) |
| WO (1) | WO2020036153A1 (en) |
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| JP6475842B2 (en) * | 2015-08-11 | 2019-02-27 | 富士フイルム株式会社 | Functional film manufacturing method and manufacturing apparatus |
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2019
- 2019-08-09 CN CN201980048779.5A patent/CN112469508B/en active Active
- 2019-08-09 KR KR1020217002101A patent/KR102480805B1/en active IP Right Grant
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| JPS62186966A (en) * | 1986-02-12 | 1987-08-15 | Fuji Photo Film Co Ltd | Method and apparatus for coating |
| JP2003200097A (en) * | 2002-01-09 | 2003-07-15 | Fuji Photo Film Co Ltd | Application method and slot die |
| JP2011036803A (en) * | 2009-08-11 | 2011-02-24 | Konica Minolta Holdings Inc | Method for producing barrier film |
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| JPWO2020036153A1 (en) | 2021-05-13 |
| KR20210022714A (en) | 2021-03-03 |
| JP7019049B2 (en) | 2022-02-14 |
| CN112469508A (en) | 2021-03-09 |
| WO2020036153A1 (en) | 2020-02-20 |
| KR102480805B1 (en) | 2022-12-22 |
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