CN112462824A - Heating control system and method for thin film deposition equipment - Google Patents
Heating control system and method for thin film deposition equipment Download PDFInfo
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- CN112462824A CN112462824A CN202011262339.0A CN202011262339A CN112462824A CN 112462824 A CN112462824 A CN 112462824A CN 202011262339 A CN202011262339 A CN 202011262339A CN 112462824 A CN112462824 A CN 112462824A
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 105
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000000427 thin-film deposition Methods 0.000 title claims abstract description 21
- 230000001012 protector Effects 0.000 claims description 17
- 230000002159 abnormal effect Effects 0.000 claims description 14
- 238000012937 correction Methods 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 7
- 230000002457 bidirectional effect Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000010408 film Substances 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract description 3
- 230000008021 deposition Effects 0.000 abstract description 3
- 230000006378 damage Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
- G05D23/22—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature the sensing element being a thermocouple
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- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Control Of Resistance Heating (AREA)
Abstract
The invention provides a heating control system and a method for thin film deposition equipment, wherein the system comprises a thermocouple and a tubular heater which are arranged in a heating plate, and further comprises a temperature controller, a power regulator and a leakage current sensor, wherein the input end of the temperature controller is connected with the thermocouple, the output end of the temperature controller is connected with the input end of the power regulator, the output end of the power regulator is connected with the tubular heater, the leakage current sensor is connected in a control circuit between the power regulator and the tubular heater, and the output end of the leakage current sensor is connected with the input end of the temperature controller. The invention can control the leakage current generated by the heating system of the film deposition equipment within a reasonable range, thereby ensuring the safety and normal production operation of the equipment.
Description
Technical Field
The invention relates to the technical field of thin film deposition equipment, in particular to a heating control system and method of thin film deposition equipment.
Background
The working principle of PECVD (plasma Enhanced Chemical Vapor deposition) is to deposit a film by using a plasma Enhanced gas phase Chemical deposition method under certain temperature and pressure conditions. In a heating apparatus (e.g., an electric heating furnace) of the conventional thin film deposition apparatus, a thermocouple and a tubular heater are embedded in a heating plate, wherein the tubular heater, the thermocouple, a temperature controller and a heating power regulator form a closed-loop heating system, as shown in fig. 2.
In the prior art, the tubular heater is placed in the open slot of the heating plate, and if the size of the slot is not matched with that of the tubular heater, the heat provided by the tubular heater cannot be efficiently transferred to the heating plate, or the tubular heater is deformed too much or even broken and damaged. When the heat generated by the tubular heater cannot be completely transferred to the heating plate, the temperature of the tubular heater is overhigh and the temperature of the heating plate is not high. The middle part of the tubular heater is an electrified heating wire, and other insulating materials such as magnesium oxide and the like are filled between the heating wire and the protected metal shell. When the temperature of the tubular heater itself is too high, the insulation of the insulating material such as magnesium oxide is deteriorated, and a leakage current is generated between the case of the tubular heater and the heater wire. The excessive leakage current can cause harm such as personal injury and equipment damage.
The prior art mainly has two solutions:
1. the output power of the heating power controller is directly limited. The power of the heating output is limited within a range, so that the tubular heater is prevented from being overheated, and the mode can cause that the power controller cannot reach the full power state and can only work in the low power state, thereby causing the waste of resources; secondly, the heating time is prolonged because the heating power is limited, so that the maintenance and the service cycle of the equipment are correspondingly prolonged, and the thermal power of the equipment is reduced.
2. A leakage protector is adopted. When the leakage current reaches the action value of the leakage protector, the leakage protector cuts off the heating loop to achieve the purpose of protection. Although the mode can protect the safety of the heating system and the equipment, the heating system is off-line, so that the automatic process of the production line is interrupted, and the normal production of the equipment is influenced, even the whole production line is influenced.
Disclosure of Invention
In view of this, the embodiments of the present disclosure provide a heating control system and method for a thin film deposition apparatus, so as to solve the problem that when a tubular heater is used in a heating system of an existing thin film deposition apparatus, leakage current is too large due to too high temperature of the tubular heater, which is caused by the fact that heat of the tubular heater cannot be completely transferred to a heating plate, thereby affecting production and operation of the apparatus and safety of personal devices.
In order to solve the above problems, the present invention provides the following technical solutions:
a heating control system of a thin film deposition device comprises at least one group of thermocouples and a tubular heater arranged in a heating plate, and further comprises a temperature controller, a power regulator and a leakage current sensor, wherein the input end of the temperature controller is connected with the thermocouples and used for receiving actual temperature values of the tubular heater collected by the thermocouples, and the output end of the temperature controller is connected with the input end of the power regulator and used for sending control signals to the power regulator; the output end of the power regulator is connected with the tubular heater and is used for controlling the heating temperature of the tubular heater; the leakage current sensor is connected between the power regulator and the tubular heater and is used for collecting a leakage current value generated by the tubular heater; the input end of the temperature controller is further connected with the output end of the leakage current sensor and used for receiving the leakage current information collected by the leakage current sensor.
Further, the heating device also comprises a heating main loop as a power supply, and the heating main loop is connected with the power regulator.
Furthermore, the heating device also comprises a leakage protector, wherein the input end of the leakage protector is connected with the temperature controller, and the output end of the leakage protector is connected with the heating main loop.
Further, the model of the leakage current sensor is LF-AI12-33A2-1.0/0-10 mA.
The invention also provides a control method of the heating control system of the film deposition equipment, which comprises the steps of collecting a leakage current measured value of the tubular heater, and transmitting the collected leakage current measured value to the temperature controller;
collecting an actual temperature value of the tubular heater, and transmitting the collected actual temperature value to the temperature controller;
and when the received leakage current measured value exceeds the leakage current safety threshold value, the temperature controller controls the power regulator to regulate the output power according to the leakage current measured value and the actual temperature value of the tubular heater so as to enable the leakage current measured value to be within a safety range.
Further, the method for adjusting the heating power by the power adjuster comprises the following steps: p1＝P0K; wherein, P0For heating power before regulation, P1K is a leakage current power correction coefficient for the adjusted heating power.
Further, the larger the leakage current measurement value is, the smaller the leakage current power correction coefficient k value is.
Furthermore, a leakage current sensor is adopted to collect a leakage current measured value of the tubular heater, the temperature controller is in two-way connection with the leakage current sensor, and the temperature controller controls the leakage current sensor to collect leakage current once every interval time t, so that the leakage current sensor collects leakage current of the tubular heater at regular time and feeds the leakage current measured value back to the temperature controller at regular time.
Further, a leakage current abnormal threshold value is preset in the temperature controller, and when a leakage current measured value received by the temperature controller exceeds the leakage current abnormal threshold value, power supply of the heating main loop is cut off.
Further, the leakage current abnormal threshold is greater than the leakage current safety threshold.
The invention discloses a heating control system and a method of film deposition equipment, which have the beneficial effects that: according to the invention, the leakage current sensor is added on the whole set of heating system, and the heating output power can be adjusted in real time according to the magnitude of the leakage current. Therefore, the possibility that the leakage current becomes large due to overhigh temperature of the tubular heater is avoided, the leakage current is controlled within a reasonable range, the working efficiency of a heating system is ensured, and the normal production operation and the personal safety of the thin film deposition equipment are ensured. The scheme has the advantages of easy realization, low cost, obvious effect and the like.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings needed to be used in the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present disclosure, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic diagram of a heating plate according to an embodiment of the present invention;
FIG. 2 is a schematic view of a heating control system of a conventional thin film deposition apparatus;
FIG. 3 is a schematic view of a heating control system of the thin film deposition apparatus according to an embodiment of the present invention;
FIG. 4 is a schematic view of a heating control system of a thin film deposition apparatus according to another embodiment of the present invention;
in the drawings, wherein:
1-heating a plate; 2-a tubular heater; 3-thermocouple.
Detailed Description
The embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.
The embodiments of the present disclosure are described below with specific examples, and other advantages and effects of the present disclosure will be readily apparent to those skilled in the art from the disclosure in the specification. It is to be understood that the described embodiments are merely illustrative of some, and not restrictive, of the embodiments of the disclosure. The disclosure may be embodied or carried out in various other specific embodiments, and various modifications and changes may be made in the details within the description without departing from the spirit of the disclosure. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any creative effort, shall fall within the protection scope of the present disclosure.
It is noted that various aspects of the embodiments are described below within the scope of the appended claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the disclosure, one skilled in the art should appreciate that one aspect described herein may be implemented independently of any other aspects and that two or more of these aspects may be combined in various ways. For example, an apparatus may be implemented and/or a method practiced using any number of the aspects set forth herein. Additionally, such an apparatus may be implemented and/or such a method may be practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic idea of the present disclosure, and the drawings only show the components related to the present disclosure rather than the number, shape and size of the components in actual implementation, and the type, amount and ratio of the components in actual implementation may be changed arbitrarily, and the layout of the components may be more complicated.
In addition, in the following description, specific details are provided to facilitate a thorough understanding of the examples. However, it will be understood by those skilled in the art that the aspects may be practiced without these specific details.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a heating plate 1 in a heating device of a thin film deposition apparatus, a caulking groove is formed in the heating plate 1, a tubular heater 2 is embedded in the caulking groove of the heating plate 1, and a thermocouple 3 is used to collect an actual temperature value of the tubular heater 2.
Referring to fig. 3, an embodiment of the present disclosure provides a heating control system of a thin film deposition apparatus, including at least one set of thermocouples and tubular heaters disposed in a heating plate, further including a temperature controller, a power conditioner, and a leakage current sensor; the input end of the temperature controller is connected with the thermocouple and used for receiving the actual temperature value of the tubular heater collected by the thermocouple, and the output end of the temperature controller is connected with the input end of the power regulator and used for sending a control signal to the power regulator; the output end of the power regulator is connected with the tubular heater and is used for controlling the heating temperature of the tubular heater; the leakage current sensor is connected in a control circuit between the power regulator and the tubular heater and is used for collecting a leakage current value generated by the tubular heater; the input end of the temperature controller is further connected with the output end of the leakage current sensor and used for receiving the leakage current information collected by the leakage current sensor.
When the temperature of the tubular heater itself is too high, the insulation of an insulating material such as magnesium oxide is deteriorated, and a leakage current is generated between the case of the tubular heater and the heater wire. Therefore, in the above embodiment of the present invention, the heating control system adds a corresponding number of leakage current sensors according to the number of groups of the tubular heaters, the leakage current sensors feed their measurement values back to the temperature controller of the heating system, and the temperature controller adjusts the heating power according to the measurement value of the leakage current on the basis of the heating power output value calculated by the original closed-loop control system of the thermocouple, the temperature controller, the power regulator and the tubular heaters, so as to make the leakage current within the safe range.
Further, the heating device also comprises a heating main loop as a power supply, and the heating main loop is connected with the power regulator. In a preferred embodiment, as shown in fig. 4, the heating device further includes a leakage protector, an input end of the leakage protector is connected to the temperature controller, and an output end of the leakage protector is connected to the heating main loop. When an abnormal condition occurs, the leakage protector can cut off the power supply of the heating main loop, so that the safety of a heating system and equipment is protected.
Preferably, the model of the leakage current sensor is LF-AI12-33A2-1.0/0-10 mA.
The invention also provides a control method of the heating control system of the thin film deposition equipment, wherein the leakage current sensor is used for collecting the leakage current measured value of the tubular heater and transmitting the collected leakage current measured value to the temperature controller; the thermocouple collects the actual temperature value of the tubular heater and transmits the collected actual temperature value to the temperature controller; and when the received leakage current measured value exceeds the leakage current safety threshold value, the temperature controller controls the power regulator to regulate the output power according to the leakage current measured value and the actual temperature value of the tubular heater so as to enable the leakage current measured value to be within a safety range.
The leakage current sensor can collect the leakage current of the tubular heater in real time and feed the leakage current back to the temperature controller in real time, so that the temperature controller controls the power regulator, the heating power is controlled within a reasonable range, and the leakage current is controlled within a reasonable range.
In a preferred embodiment, the method for adjusting the heating power by the power adjuster is as follows: p1＝P0K; wherein, P0For heating power before regulation, P1K is a leakage current power correction coefficient for the adjusted heating power. The adjusting method is to multiply the leakage current power correction coefficient on the basis of the original heating power output calculation value. In principle, the larger the heating leakage current is, the smaller the leakage current power correction coefficient k value is, and the smaller the heating leakage current is, the larger the leakage current power correction coefficient k value is. The specific coefficient belongs to an empirical coefficient and is determined according to the actual characteristics of an actual heating closed-loop control system.
The adjusted heating power output value is used for controlling the power regulator so as to change the actual heating output power, and the corrected actual heating output power enables the heating system to achieve the purpose of controlling the leakage current within a reasonable range under the condition of meeting the basic requirement of temperature control. The control mode can not cause the power regulator to be always in a low-power state to cause resource waste, can also protect the safety of a heating system and equipment, and can not influence the normal production of the equipment.
In another preferred embodiment of the present invention, the temperature controller and the leakage current sensor are connected in a bidirectional manner, and the temperature controller controls the leakage current sensor to perform leakage current collection once after each interval of time t, so that the leakage current sensor performs timing collection on the leakage current of the tubular heater, and feeds back a leakage current measurement value to the temperature controller at a timing.
In the embodiment, the collection process of the leakage current sensor is controlled by the temperature controller, the temperature controller sends a collection control signal to the leakage current sensor once at intervals of t, the leakage current sensor feeds back a measurement signal to the temperature controller, and the power regulator regulates the heating power once. By adopting the control mode, the power regulator can not be in a full power state and can not be in a low power state all the time, thereby causing the waste of resources and better maintaining equipment.
Further, referring to fig. 4, in this embodiment, a leakage protector is further included, and a leakage current abnormal threshold is preset in the temperature controller, and when a leakage current measured value received by the temperature controller exceeds the leakage current abnormal threshold, the temperature controller controls the leakage protector to cut off power supply to the heating main loop.
In a normal heating control system, the leakage current is collected by the leakage current sensor, so that the leakage current is controlled, the leakage current is always in a safe range, and normal operation of equipment is guaranteed. When a sudden accident occurs or an equipment circuit is abnormal, the leakage current measured value fed back to the temperature controller by the leakage current sensor is abnormal and exceeds a leakage current abnormal threshold value in the temperature controller, at the moment, the temperature controller controls the leakage protector to work, so that the leakage protector cuts off the power supply of the heating main loop, and the heating system, the equipment safety and the personal safety are effectively protected. The leakage current abnormal threshold and the leakage current safety threshold are preset in the temperature controller according to actual heating output power conditions, equipment conditions and the like, and the leakage current abnormal threshold is larger than the leakage current safety threshold.
The above description is only for the specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present disclosure should be covered within the scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.
Claims (10)
1. A thin film deposition apparatus heating control system comprising at least one set of thermocouples and tubular heaters disposed in a heating plate, characterized by further comprising a temperature controller, a power conditioner, and a leakage current sensor, wherein:
the input end of the temperature controller is connected with the thermocouple and used for receiving the actual temperature value of the tubular heater collected by the thermocouple, and the output end of the temperature controller is connected with the input end of the power regulator and used for sending a control signal to the power regulator;
the output end of the power regulator is connected with the tubular heater and is used for controlling the heating temperature of the tubular heater;
the leakage current sensor is connected between the power regulator and the tubular heater and is used for collecting a leakage current value generated by the tubular heater;
the input end of the temperature controller is further connected with the output end of the leakage current sensor and used for receiving the leakage current information collected by the leakage current sensor.
2. The heating control system of claim 1, further comprising a heating main loop as a power supply, wherein the heating main loop is connected to the power regulator.
3. The heating control system of claim 2, further comprising a leakage protector, wherein an input end of the leakage protector is connected to the temperature controller, and an output end of the leakage protector is connected to the heating main loop.
4. The heating control system of the thin film deposition apparatus as claimed in any one of claims 1 to 3, wherein the leakage current sensor has a model number of LF-AI12-33A2-1.0/0-10 mA.
5. A heating control method of thin film deposition equipment is characterized in that a leakage current measured value of a tubular heater is collected, and the collected leakage current measured value is transmitted to a temperature controller;
collecting an actual temperature value of the tubular heater, and transmitting the collected actual temperature value to the temperature controller;
and when the received leakage current measured value exceeds the leakage current safety threshold value, the temperature controller controls the power regulator to regulate the output power according to the leakage current measured value and the actual temperature value of the tubular heater so as to enable the leakage current measured value to be within a safety range.
6. The heating control method of the thin film deposition apparatus according to claim 5, wherein the power regulator adjusts the heating power by: p1＝P0K; wherein, P0For the actual heating power before regulation, P1K is a leakage current power correction coefficient for the adjusted heating power.
7. The heating control method for the thin film deposition apparatus as claimed in claim 6, wherein the larger the measured value of the leakage current is, the smaller the value of the leakage current power correction coefficient k is.
8. The heating control method of claim 5, wherein a leakage current sensor is used for collecting a leakage current measurement value of the tubular heater, the temperature controller is connected with the leakage current sensor in a bidirectional manner, and the temperature controller controls the leakage current sensor to collect leakage current once after a time interval t, so that the leakage current sensor collects leakage current of the tubular heater at regular time and feeds the leakage current measurement value back to the temperature controller at regular time.
9. The heating control method of claim 5, wherein a leakage current abnormal threshold is preset in the temperature controller, and when the received leakage current measured value exceeds the leakage current abnormal threshold, the power supply of the heating main loop is cut off.
10. The heating control method of claim 9, wherein the leakage current abnormal threshold is greater than the leakage current safety threshold.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202011262339.0A CN112462824A (en) | 2020-11-12 | 2020-11-12 | Heating control system and method for thin film deposition equipment |
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| CN202011262339.0A CN112462824A (en) | 2020-11-12 | 2020-11-12 | Heating control system and method for thin film deposition equipment |
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| KR101036542B1 (en) * | 2010-01-12 | 2011-05-24 | 세메스 주식회사 | Heater system for semiconductor production apparatus |
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2020
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Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101036542B1 (en) * | 2010-01-12 | 2011-05-24 | 세메스 주식회사 | Heater system for semiconductor production apparatus |
| CN202711096U (en) * | 2012-08-16 | 2013-01-30 | 南京科达新控仪表有限公司 | Tubular PECVD temperature control system |
| CN105229883A (en) * | 2013-04-19 | 2016-01-06 | 科模热思股份有限公司 | Middle voltage heating element moisture detection circuit |
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