CN112442671A - 一种大功率磁控溅射靶pvd炫绿色涂层及其制备方法和应用 - Google Patents

一种大功率磁控溅射靶pvd炫绿色涂层及其制备方法和应用 Download PDF

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CN112442671A
CN112442671A CN202011329152.8A CN202011329152A CN112442671A CN 112442671 A CN112442671 A CN 112442671A CN 202011329152 A CN202011329152 A CN 202011329152A CN 112442671 A CN112442671 A CN 112442671A
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彭长明
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Creasian Industrial Shenzhen Co ltd
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Abstract

本发明属于PVD溅射技术领域，公开了一种大功率磁控溅射靶PVD炫绿色涂层及其制备方法和应用。本发明的大功率磁控溅射靶PVD炫绿色涂层是由钛硅底层和氧化钛+氧化硅的复合涂层构成，所述复合涂层是由n个氧化钛+氧化硅涂层组成，n为大于或等于1的整数，所述大功率是指的80A大功率，该炫绿色涂层是通过大功率磁控溅射靶获得，可以叠加复合，涂层颜色稳定，更亮更鲜艳，颜色层更厚更致密，耐磨性能良好，便于大批量生产。

Description

一种大功率磁控溅射靶PVD炫绿色涂层及其制备方法和应用
技术领域
本发明涉及PVD溅射技术领域，具体是涉及一种大功率磁控溅射靶PVD炫绿色涂层及其制备方法和应用。
背景技术
物理气相沉积(Physical Vapor Deposition，PVD)涂层技术应用在很多表面处理和薄膜材料制备方面，如模具表面硬质涂层、各种零部件表面的防护涂层、表面改性涂层、导电和透光涂层等。磁控溅射是PVD的一种，一般的溅射法可被用于制备金属、半导体、绝缘体等多材料，且具有设备简单、易于控制、镀膜面积大和附着力强等优点。
传统PVD技术是金属产品表面及无机材料(玻璃，陶瓷，蓝宝石等)表面的常规表面处理技术。目前的PVD涂层过程中，涂层材料的最大问题就是致密性的问题，这导致涂层薄膜材料的性能与实体块材差别很大，使涂层材料的特性不能充分的表现出来。此外，目前市场采用磁控溅射PVD方法沉积的炫绿色涂层，颜色偏暗，不稳定，在产品上由于沉积膜厚不均匀，膜层的光学效果不同，只能做到一面的颜色要求，耐磨等功能性测试性能很差，达不到客户需求。
发明内容
本发明的目的是为了克服上述背景技术的不足，提供一种大功率磁控溅射靶PVD炫绿色涂层及其制备方法和应用，所述大功率是指的80A大功率，本发明的炫绿色涂层是通过大功率磁控溅射靶获得，在保证均一性的基础上，更厚、更致密，耐磨性能更好。
为达到本发明的目的，本发明的大功率磁控溅射靶PVD炫绿色涂层是由钛硅底层和氧化钛+氧化硅的复合涂层构成，所述复合涂层是由n个氧化钛+氧化硅涂层组成，n为大于或等于1的整数。
进一步地，在本发明的一些实施例中，所述n等于1。
优选地，在本发明的一些实施例中，所述n为大于1的整数。
另一方面，为达到本发明的目的，本发明还提供了一种前述大功率磁控溅射靶PVD炫绿色涂层的制备方法，所述方法包含以下步骤：
(1)采用80A电流磁控溅射钛靶和硅靶沉积钛硅底层，通入300sccm氩气，偏压80V，占空比50％，时长5分钟；
(2)采用80A电流磁控溅射钛靶沉积氧化钛涂层，通入300sccm氧气，偏压80V，占空比30％，时长35分钟；
(3)采用80A电流磁控溅射硅靶沉积氧化硅涂层，通入200sccm氧气，偏压80V，占空比30％，时长46分钟；
其中，所述步骤(3)之后重复步骤(2)-(3)，重复次数为n-1。
进一步地，在本发明的一些实施例中，所述重复次数为0。
优选地，在本发明的一些实施例中，所述重复次数为n-1，且n为大于1的整数。
进一步地，本发明还提供了一种大功率磁控溅射靶PVD炫绿色涂层的应用，所述应用为将所述PVD炫绿色涂层用于金属、金属化合物或无机材料中的一种基材或多种基材上。
优选地，在本发明的一些实施例中，所述应用为将所述PVD炫绿色涂层用于金属或金属化合物上。
进一步优选地，在本发明的一些实施例中，所述应用为将所述PVD炫绿色涂层用于不锈钢上。
与现有技术相比，本发明的优点如下：
(1)本发明使用80A大功率磁控溅射靶沉积涂层颜色更亮，更鲜艳；
(2)本发明采用新型大功率磁控溅射方法，可以减缓钛靶、硅靶、氧气、氮气之间的反应时间，从而使膜层颜色更加稳定，涂层炫绿色颜色值(高光面Lab值)为71.12、-39.35、-19.73；
(3)本发明所得炫绿色涂层可以叠加复合，涂层颜色层更厚更致密，耐磨性能好，便于大批量生产。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合实施例，对本发明进行进一步详细说明。本发明的附加方面和优点将在下面的描述中部分给出，部分将从下面的描述中变得明显，或通过本发明的实践了解到。应当理解，以下描述仅仅用以解释本发明，并不用于限定本发明。
此外，下面所描述的术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述不是必须针对相同的实施例或示例。而且，本发明各个实施方式中所涉及到的技术特征只要彼此之间未构成冲突就可以相互组合。
实施例1
一种大功率磁控溅射靶PVD炫绿色涂层，其制备方法包含以下步骤：
(1)将不锈钢基材放置于三维转架上，采用80A电流磁控溅射钛靶和硅靶沉积钛硅底层，通入300sccm氩气，偏压80V，占空比50％，时长5分钟；
(2)采用80A电流磁控溅射钛靶沉积氧化钛涂层，通入300sccm氧气，偏压80V，占空比30％，时长35分钟；
(3)采用80A电流磁控溅射硅靶沉积氧化硅涂层，通入200sccm氧气，偏压80V，占空比30％，时长46分钟；
对上述所得涂层进行性能测试，结果如下：
1、能够通过ISO3160-2的震动耐磨测试，测试时间48h；
2、能够通过盐雾测试，测试时间48h；盐雾测试方法：在35℃±2℃的密闭环境中，湿度>85％，PH值在6.5～7.2范围内，用5％±1％的NaCl溶液中直接喷射测试48h，其中24h检查一次结果；盐雾测试后对测试品进行粘胶纸测试；
3、经120h人工汗测试后，膜层无脱落或腐蚀孔，也无锈迹或变色；
4、新膜层颜色稳定，△E可以控制在小于2的范围；(色差公式：△E*ab(CIE1976)\Hunter△E\△E*94(CIE1994)/△E00(CIE2000)\CMC(I:c))，重复性强，炫绿色颜色值(高光面Lab值)为71.12、-39.35、-19.73，可大批量重复生产。
实施例2
一种大功率磁控溅射靶PVD炫绿色涂层，其制备方法包含以下步骤：
(1)将不锈钢基材放置于三维转架上，采用80A电流磁控溅射钛靶和硅靶沉积钛硅底层，通入300sccm氩气，偏压80V，占空比50％，时长5分钟；
(2)采用80A电流磁控溅射钛靶沉积氧化钛涂层，通入300sccm氧气，偏压80V，占空比30％，时长35分钟；
(3)采用80A电流磁控溅射硅靶沉积氧化硅涂层，通入200sccm氧气，偏压80V，占空比30％，时长46分钟；
(4)重复步骤(2)-(3)一次。
对上述所得涂层进行性能测试，结果如下：
1、能够通过ISO3160-2的震动耐磨测试，测试时间48h；
2、能够通过盐雾测试，测试时间48h；盐雾测试方法：在35℃±2℃的密闭环境中，湿度>85％，PH值在6.5～7.2范围内，用5％±1％的NaCl溶液中直接喷射测试48h，其中24h检查一次结果；盐雾测试后对测试品进行粘胶纸测试；
3、经120h人工汗测试后，膜层无脱落或腐蚀孔，也无锈迹或变色；
4、新膜层颜色稳定，△E可以控制在小于2的范围；(色差公式：△E*ab(CIE1976)\Hunter△E\△E*94(CIE1994)/△E00(CIE2000)\CMC(I:c))，重复性强，炫绿色颜色值(高光面Lab值)为71.12、-39.35、-19.73，可大批量重复生产。
实施例3
一种大功率磁控溅射靶PVD炫绿色涂层，其制备方法包含以下步骤：
(1)将不锈钢基材放置于三维转架上，采用80A电流磁控溅射钛靶和硅靶沉积钛硅底层，通入300sccm氩气，偏压80V，占空比50％，时长5分钟；
(2)采用80A电流磁控溅射钛靶沉积氧化钛涂层，通入300sccm氧气，偏压80V，占空比30％，时长35分钟；
(3)采用80A电流磁控溅射硅靶沉积氧化硅涂层，通入200sccm氧气，偏压80V，占空比30％，时长46分钟；
(4)重复步骤(2)-(3)一次。
对上述所得涂层进行性能测试，结果如下：
1、能够通过ISO3160-2的震动耐磨测试，测试时间48h；
2、能够通过盐雾测试，测试时间48h；盐雾测试方法：在35℃±2℃的密闭环境中，湿度>85％，PH值在6.5～7.2范围内，用5％±1％的NaCl溶液中直接喷射测试48h，其中24h检查一次结果；盐雾测试后对测试品进行粘胶纸测试；
3、经120h人工汗测试后，膜层无脱落或腐蚀孔，也无锈迹或变色；
4、新膜层颜色稳定，△E可以控制在小于2的范围；(色差公式：△E*ab(CIE1976)\Hunter△E\△E*94(CIE1994)/△E00(CIE2000)\CMC(I:c))，重复性强，炫绿色颜色值(高光面Lab值)为71.12、-39.35、-19.73，可大批量重复生产。
本领域的技术人员容易理解，以上所述仅为本发明的实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。

Claims (9)

1.一种大功率磁控溅射靶PVD炫绿色涂层，其特征在于，所述大功率磁控溅射靶PVD炫绿色涂层是由钛硅底层和氧化钛+氧化硅的复合涂层构成，所述复合涂层是由n个氧化钛+氧化硅涂层组成，n为大于或等于1的整数。
2.根据权利要求1所述的大功率磁控溅射靶PVD炫绿色涂层，其特征在于，所述n等于1。
3.根据权利要求1所述的大功率磁控溅射靶PVD炫绿色涂层，其特征在于，所述n为大于1的整数。
4.权利要求1-3任一项所述大功率磁控溅射靶PVD炫绿色涂层的制备方法，其特征在于，所述方法包含以下步骤：
(1)采用80A电流磁控溅射钛靶和硅靶沉积钛硅底层，通入300sccm氩气，偏压80V，占空比50％，时长5分钟；
(2)采用80A电流磁控溅射钛靶沉积氧化钛涂层，通入300sccm氧气，偏压80V，占空比30％，时长35分钟；
(3)采用80A电流磁控溅射硅靶沉积氧化硅涂层，通入200sccm氧气，偏压80V，占空比30％，时长46分钟；
其中，所述步骤(3)之后重复步骤(2)-(3)，重复次数为n-1。
5.根据权利要求4所述大功率磁控溅射靶PVD炫绿色涂层的制备方法，其特征在于，所述重复次数为0。
6.根据权利要求4所述大功率磁控溅射靶PVD炫绿色涂层的制备方法，其特征在于，所述重复次数为n-1，且n为大于1的整数。
7.权利要求1-3任一项所述大功率磁控溅射靶PVD炫绿色涂层的应用，其特征在于，所述应用为将所述PVD炫绿色涂层用于金属、金属化合物或无机材料中的一种基材或多种基材上。
8.根据权利要求7所述大功率磁控溅射靶PVD炫绿色涂层的应用，其特征在于，所述应用为将所述PVD炫绿色涂层用于金属或金属化合物上。
9.根据权利要求7所述大功率磁控溅射靶PVD炫绿色涂层的应用，其特征在于，所述应用为将所述PVD炫绿色涂层用于不锈钢上。
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108531859A (zh) * 2018-03-15 2018-09-14 东莞港星金属制品有限公司 在铝合金件表面实现炫彩效果的处理工艺
CN110373644A (zh) * 2019-07-31 2019-10-25 深圳森丰真空镀膜有限公司 一种光学炫彩薄膜及其制作方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108531859A (zh) * 2018-03-15 2018-09-14 东莞港星金属制品有限公司 在铝合金件表面实现炫彩效果的处理工艺
CN110373644A (zh) * 2019-07-31 2019-10-25 深圳森丰真空镀膜有限公司 一种光学炫彩薄膜及其制作方法

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