CN112442267A - Polyphenylene ether resin composition and mixture - Google Patents
Polyphenylene ether resin composition and mixture Download PDFInfo
- Publication number
- CN112442267A CN112442267A CN202010871018.4A CN202010871018A CN112442267A CN 112442267 A CN112442267 A CN 112442267A CN 202010871018 A CN202010871018 A CN 202010871018A CN 112442267 A CN112442267 A CN 112442267A
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- CN
- China
- Prior art keywords
- polyphenylene ether
- compound represented
- carbon atoms
- ether resin
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229920001955 polyphenylene ether Polymers 0.000 title claims abstract description 51
- 239000000203 mixture Substances 0.000 title claims abstract description 32
- 239000011342 resin composition Substances 0.000 title claims abstract description 32
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 26
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 48
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000004817 gas chromatography Methods 0.000 claims description 10
- 150000002894 organic compounds Chemical class 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 20
- 239000011889 copper foil Substances 0.000 abstract description 20
- 150000003377 silicon compounds Chemical class 0.000 abstract description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 39
- -1 n-octyl group Chemical group 0.000 description 16
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 14
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 6
- 239000004727 Noryl Substances 0.000 description 5
- 229920001207 Noryl Polymers 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000001099 ammonium carbonate Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000006459 hydrosilylation reaction Methods 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000003058 platinum compounds Chemical class 0.000 description 4
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 2
- 235000012501 ammonium carbonate Nutrition 0.000 description 2
- 239000003849 aromatic solvent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 239000003426 co-catalyst Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- HSEMFIZWXHQJAE-UHFFFAOYSA-N hexadecanamide Chemical compound CCCCCCCCCCCCCCCC(N)=O HSEMFIZWXHQJAE-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- BSSNZUFKXJJCBG-OWOJBTEDSA-N (e)-but-2-enediamide Chemical compound NC(=O)\C=C\C(N)=O BSSNZUFKXJJCBG-OWOJBTEDSA-N 0.000 description 1
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 1
- MPJPKEMZYOAIRN-UHFFFAOYSA-N 1,3,5-tris(2-methylprop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound CC(=C)CN1C(=O)N(CC(C)=C)C(=O)N(CC(C)=C)C1=O MPJPKEMZYOAIRN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- FCHGUOSEXNGSMK-UHFFFAOYSA-N 1-tert-butylperoxy-2,3-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=CC(OOC(C)(C)C)=C1C(C)C FCHGUOSEXNGSMK-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- GEHMBYLTCISYNY-UHFFFAOYSA-N Ammonium sulfamate Chemical compound [NH4+].NS([O-])(=O)=O GEHMBYLTCISYNY-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- GFJMQNWALPAMKI-UHFFFAOYSA-N OP(O)OP(O)O.N.N.N.N Chemical compound OP(O)OP(O)O.N.N.N.N GFJMQNWALPAMKI-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- NCDNCNXCDXHOMX-UHFFFAOYSA-N Ritonavir Natural products C=1C=CC=CC=1CC(NC(=O)OCC=1SC=NC=1)C(O)CC(CC=1C=CC=CC=1)NC(=O)C(C(C)C)NC(=O)N(C)CC1=CSC(C(C)C)=N1 NCDNCNXCDXHOMX-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- DSVGQVZAZSZEEX-UHFFFAOYSA-N [C].[Pt] Chemical compound [C].[Pt] DSVGQVZAZSZEEX-UHFFFAOYSA-N 0.000 description 1
- FNIUGHSZXXYXER-UHFFFAOYSA-N [Pt].ClC1=C(Cl)C=CCCCC1 Chemical compound [Pt].ClC1=C(Cl)C=CCCCC1 FNIUGHSZXXYXER-UHFFFAOYSA-N 0.000 description 1
- RGCDNCWAAGEBOU-UHFFFAOYSA-N acetonitrile;platinum Chemical compound [Pt].CC#N RGCDNCWAAGEBOU-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical compound [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- TUOJAZRQYMQJER-UHFFFAOYSA-N benzonitrile;platinum Chemical compound [Pt].N#CC1=CC=CC=C1 TUOJAZRQYMQJER-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- SNCZNSNPXMPCGN-UHFFFAOYSA-N butanediamide Chemical compound NC(=O)CCC(N)=O SNCZNSNPXMPCGN-UHFFFAOYSA-N 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
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- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- WRIRWRKPLXCTFD-UHFFFAOYSA-N malonamide Chemical compound NC(=O)CC(N)=O WRIRWRKPLXCTFD-UHFFFAOYSA-N 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- RMIODHQZRUFFFF-UHFFFAOYSA-N methoxyacetic acid Chemical compound COCC(O)=O RMIODHQZRUFFFF-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NAYYNDKKHOIIOD-UHFFFAOYSA-N phthalamide Chemical compound NC(=O)C1=CC=CC=C1C(N)=O NAYYNDKKHOIIOD-UHFFFAOYSA-N 0.000 description 1
- SYKXNRFLNZUGAJ-UHFFFAOYSA-N platinum;triphenylphosphane Chemical compound [Pt].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 SYKXNRFLNZUGAJ-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- NCDNCNXCDXHOMX-XGKFQTDJSA-N ritonavir Chemical compound N([C@@H](C(C)C)C(=O)N[C@H](C[C@H](O)[C@H](CC=1C=CC=CC=1)NC(=O)OCC=1SC=NC=1)CC=1C=CC=CC=1)C(=O)N(C)CC1=CSC(C(C)C)=N1 NCDNCNXCDXHOMX-XGKFQTDJSA-N 0.000 description 1
- 229960000311 ritonavir Drugs 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229940037312 stearamide Drugs 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08L71/12—Polyphenylene oxides
- C08L71/126—Polyphenylene oxides modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08L71/12—Polyphenylene oxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2371/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
- C08J2371/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08J2371/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08J2371/12—Polyphenylene oxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
Abstract
The invention provides a polyphenylene ether resin composition and a mixture thereof, which can form a cured product with excellent dielectric characteristics and good adhesion with a copper foil. A polyphenylene ether resin composition characterized by comprising a polyphenylene ether resin and at least one of organic silicon compounds represented by the following structural formulae (1) and (2).(in the formula, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and each m independently represents an integer of 1 to 3).
Description
Technical Field
The present invention relates to a polyphenylene ether resin composition and a mixture thereof, and more particularly to a polyphenylene ether resin composition containing a specific organic silicon compound having a reactive group containing a carbon-carbon unsaturated double bond, an isocyanurate skeleton and a hydrolyzable silyl group, and a mixture of the organic silicon compound.
Background
In recent years, with the improvement of bonding technology and mounting technology, electronic devices have been developed in association with the high integration of semiconductor devices mounted on the electronic devices, the refinement of packaging, the high-density wiring of printed wiring boards, and the like.
In particular, electronic devices utilizing high frequency bands such as mobile communications have been developed remarkably, and multilayer formation and fine wiring have been performed simultaneously on printed wiring boards constituting such electronic devices. In order to increase the signal transmission speed required for high-speed information processing, it is known that it is effective to reduce the dielectric constant of the material used, and it is effective to use a material having an extremely low dielectric loss tangent (dielectric loss) in order to reduce the loss during transmission.
In this respect, polyphenylene ether (PPE) based resins are particularly excellent in dielectric properties such as dielectric constant and dielectric loss tangent, and therefore, they have been studied in this field as substrate materials that can cope with high frequencies. Resin compositions using modified polyphenylene ether have also been proposed (see patent documents 1 and 2).
However, a substrate molded by curing a resin composition using polyphenylene ether has a problem that adhesion to a copper foil is insufficient, although the substrate has excellent dielectric characteristics.
Resin compositions using a polyphenylene ether compound having an alkoxysilyl group have been proposed in order to improve adhesion between a polyphenylene ether-based cured product and a copper foil (patent documents 3 and 4).
However, the effect of improving adhesion to copper foil using a polyphenylene ether compound having an alkoxysilyl group is effective when the content of the polyphenylene ether resin in the entire resin composition is low, but is not sufficient for a composition having a high content of the polyphenylene ether resin aimed at a low dielectric constant and a low dielectric loss tangent, which are required in recent years.
Documents of the prior art
Patent document
Patent document 1: japanese laid-open patent publication No. 2004-339328
Patent document 2: international publication No. 2014/034103
Patent document 3: japanese patent laid-open publication No. 2018-16709
Patent document 4: japanese patent laid-open publication No. 2019-77761
Disclosure of Invention
Problems to be solved by the invention
The present invention has been made in view of the above circumstances, and an object thereof is to provide a polyphenylene ether resin composition which can form a cured product having excellent dielectric characteristics and good adhesion to a copper foil.
Means for solving the problems
The present inventors have intensively studied to solve the above problems, and as a result, have found that: the specific organosilicon compound having a reactive group containing a carbon-carbon unsaturated double bond, an isocyanurate skeleton and a hydrolyzable silyl group improves the adhesion between a cured product of the polyphenylene ether resin composition and the copper foil, and the present invention has been completed.
Namely, the present invention provides:
1. a polyphenylene ether resin composition characterized by comprising: at least one of a polyphenylene ether resin and an organosilicon compound represented by the following structural formulae (1) and (2),
[ CHEM 1]
(in the formula, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and each m independently represents an integer of 1 to 3. )
2.1A polyphenylene ether resin composition comprising at least an organosilicon compound represented by the structural formula (1),
3. a mixture of compounds in which the ratio determined by the area percentage method of gas chromatography is
An organosilicon compound represented by the following structural formula (1): 35 to 75 percent,
An organosilicon compound represented by the following structural formula (2): 10 to 50 percent,
An organosilicon compound represented by the following structural formula (3): less than 15 percent,
An organic compound represented by the following structural formula (4): 15 to 50%, and
the total of compounds represented by the following structural formulae (1) to (4): more than 96 percent of the total weight of the composition,
[ CHEM 2]
(in the formula, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and m independently represents an integer of 1 to 3. ).
ADVANTAGEOUS EFFECTS OF INVENTION
The polyphenylene ether resin composition of the present invention contains a specific organic silicon compound having a reactive group containing a carbon-carbon unsaturated double bond, an isocyanurate skeleton and a hydrolyzable silyl group, and therefore, the adhesion of a cured product of the polyphenylene ether resin composition to a copper foil can be improved.
Detailed Description
The present invention will be specifically described below.
The polyphenylene ether resin composition according to the present invention is characterized by comprising a polyphenylene ether resin and at least one of the organosilicon compounds represented by the following structural formulae (1) and (2).
[ CHEM 3]
[ polyphenylene ether resin ]
The polyphenylene ether resin used in the composition of the present invention is not particularly limited, but is preferably a modified polyphenylene ether resin, and is preferably a polyphenylene ether resin end-modified with a substituent having a carbon-carbon unsaturated double bond.
As such a polyphenylene ether resin, a commercially available product can be used, and specific examples thereof include Noryl SA9000 (manufactured by SABIC Innovative Plastics co., ltd.).
Further, even if it is not a commercially available product, a modified polyphenylene ether resin in which a carbon-carbon unsaturated double bond group having a polymerization reactivity such as a vinyl group, an allyl group, a styryl group, a methacryl group, and an acryloyl group is introduced through a polyphenylene ether whose terminal is modified with a phenolic hydroxyl group can be used. A commercially available polyphenylene ether having a phenolic hydroxyl group at the end thereof can be used, and specific examples thereof include Noryl SA90 and Noryl SA120 (manufactured by SABIC Innovative Plastics co.
[ organosilicon Compound ]
The organic silicon compound contained in the polyphenylene ether resin composition of the present invention is represented by formula (1) and/or formula (2) as described above.
In the above formulae, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and each m independently represents an integer of 1 to 3.
As R1And R2The alkyl group having 1 to 10 carbon atoms may be any of linear, cyclic and branched ones, and specific examples thereof include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group.
Specific examples of the aryl group having 6 to 10 carbon atoms include phenyl group, α -naphthyl group, β -naphthyl group and the like.
Among these, as R1The alkyl group is preferably a linear alkyl group, and more preferably a methyl group or an ethyl group.
In addition, as R2The alkyl group is preferably a linear alkyl group, and more preferably a methyl group or an ethyl group.
The organosilicon compounds represented by the above formulae (1) and (2) can be obtained by hydrosilylation of a compound represented by the formula (4) with an organosilicon compound represented by the formula (5) in the presence of a catalyst containing a platinum compound, preferably in the presence of a catalyst containing a platinum compound and a co-catalyst, as shown in the following schemes.
[ CHEM 4 ]
(in the formula, R1、R2And m represents the same meaning as described above. )
The compound represented by formula (4) is triallyl isocyanurate, and is also available as a commercially available product, and is commercially available, for example, TAIC (manufactured by mitsubishi chemical corporation).
On the other hand, examples of the organosilicon compound represented by the formula (5) include trimethoxysilane, methyldimethoxysilane, dimethylmethoxysilane, triethoxysilane, methyldiethoxysilane, dimethylethoxysilane and the like.
The reaction ratio of the compound represented by formula (4) and the organosilicon compound represented by formula (5) is preferably 0.01 mol or more and less than 3.0 mol, more preferably 0.1 mol or more and less than 1.5 mol, and still more preferably 0.6 mol or more and less than 1.2 mol of the organosilicon compound represented by formula (5) relative to 1 mol of the compound represented by formula (4), from the viewpoint of adhesion between a cured product of the polyphenylene ether resin composition of the present invention and a copper foil.
The catalyst containing a platinum compound used in the hydrosilylation reaction is not particularly limited, and specific examples thereof include chloroplatinic acid, an alcohol solution of chloroplatinic acid, a toluene or xylene solution of a platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex, tetrakis (triphenylphosphine) platinum, dichlorobis acetonitrile platinum, dichlorobis benzonitrile platinum, dichlorocyclooctadiene platinum, and supported catalysts such as platinum-carbon, platinum-alumina, and platinum-silica.
In particular, from the viewpoint of selectivity in hydrosilylation, a 0-valent platinum complex is preferable, and a toluene or xylene solution of a platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex is more preferable.
The amount of the catalyst containing a platinum compound used is not particularly limited, and it is preferable that the platinum atom contained is 1 × 10 to 1 mol of the organosilicon compound represented by the formula (5) from the viewpoints of reactivity, productivity, and the like-7~1×10-2The molar amount is more preferably 1X 10-7~1×10-3Molar amount.
As the cocatalyst in the above reaction, 1 or more selected from an ammonium salt of an inorganic acid, an acid amide compound and a carboxylic acid is preferably used.
Specific examples of the ammonium salt of the inorganic acid include ammonium chloride, ammonium sulfate, ammonium sulfamate, ammonium nitrate, ammonium dihydrogen phosphate, diammonium hydrogen phosphate, triammonium phosphate, ammonium diphosphite, ammonium carbonate, ammonium hydrogen carbonate, ammonium sulfide, ammonium borate, ammonium borofluoride and the like, among which ammonium salts of inorganic acids having a pKa of 2 or more are preferable, and ammonium carbonate and ammonium hydrogen carbonate are more preferable.
Specific examples of the acid amide compound include formamide, acetamide, N-methylacetamide, N-dimethylacetamide, propionamide, acrylamide, malonamide, succinamide, maleamide, fumaramide, benzamide, phthalic diamide, palmitamide, and stearamide, and of these, formamide is more preferable.
Specific examples of the carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, methoxyacetic acid, valeric acid, caproic acid, enanthic acid, caprylic acid, lactic acid, and glycolic acid, and among these, formic acid, acetic acid, and lactic acid are preferable, and acetic acid is more preferable.
The amount of the co-catalyst to be used is not particularly limited, but is preferably 1 × 10 with respect to 1 mol of the organosilicon compound represented by the formula (5) from the viewpoints of reactivity, selectivity, cost, and the like-5~5×10-1Molal, more preferably 1X 10-4~1×10-1And (3) mol.
The reaction is carried out without a solvent, but a solvent may be used.
Specific examples of the solvent that can be used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene, and xylene; ether solvents such as diethyl ether, tetrahydrofuran, and dioxane; ester solvents such as ethyl acetate and butyl acetate; aprotic polar solvents such as N, N-dimethylformamide; and chlorinated hydrocarbon solvents such as dichloromethane and chloroform, and these solvents may be used alone in 1 kind or in a mixture of 2 or more kinds.
The reaction temperature in the hydrosilylation reaction is not particularly limited, and may be from 0 ℃ to 0 ℃ under heating, and is preferably 0 to 200 ℃.
In order to obtain an appropriate reaction rate, it is preferable to react the reaction mixture under heating, and from such a viewpoint, the reaction temperature is more preferably 40 to 110 ℃, and still more preferably 40 to 90 ℃.
The reaction time is not particularly limited, and is usually about 1 to 60 hours, preferably 1 to 30 hours, and more preferably 1 to 20 hours.
The amount of the organic silicon compound represented by the formula (1) and/or the formula (2) to be blended in the polyphenylene ether resin composition of the present invention is preferably 0.001 to 100 parts by mass, more preferably 0.01 to 20 parts by mass, and still more preferably 0.1 to 5 parts by mass, relative to 100 parts by mass of the resin component (polyphenylene ether resin) in the composition, from the viewpoint of adhesiveness to a copper foil.
Furthermore, in the case of producing the organosilicon compound represented by formula (1) and/or formula (2) by the above-mentioned production method, the target product is obtained as a mixture of at least compounds represented by the above-mentioned formulae (1), (2) and (4), and the mixture can be used as it is as one component of the polyphenylene ether resin composition of the present invention.
In this case, the ratio of the compounds represented by formulae (1) to (4) in the mixture, which is determined by the area percentage method using gas chromatography, is not particularly limited as long as the total amount of the organosilicon compounds represented by formulae (1) and (2) is 50% or more, and if the adhesion between the copper foil and the cured product of the polyphenylene ether resin composition to which the mixture is added is improved, the organosilicon compound represented by formula (1) is preferred: 35 to 75%, an organosilicon compound represented by the formula (2): 10 to 50% of an organosilicon compound represented by the formula (3): less than 15% of an organic compound represented by the formula (4): 15 to 50%, and the total of compounds represented by formulas (1) to (4): 96% or more, particularly preferably 98% or more, and more preferably 100%.
[ other Components ]
The polyphenylene ether resin composition of the present invention may further contain other components than the above-mentioned components. Examples of the other components include high molecular weight materials, inorganic fillers, flame retardants, additives, curing agents, and reaction initiators.
Specific examples of the high molecular weight material include polybutadiene, butadiene-styrene copolymer, and (meth) acrylic copolymer.
Specific examples of the inorganic filler include spherical silica, barium sulfate, silica powder, ground silica, calcined talc, barium titanate, titanium oxide, clay, alumina, mica, boehmite, and the like.
Specific examples of the curing agent include triallyl isocyanurate (TAIC), triallyl isocyanurate (TMAIC), and other triallyl isocyanurate compounds; a polyfunctional methacrylate compound having 2 or more methacryloyl groups in a molecule; a multifunctional acrylate compound having 2 or more acryloyl groups in a molecule; and vinylbenzyl compounds such as styrene and divinylbenzene having a vinylbenzyl group in the molecule.
[ method for producing composition ]
The polyphenylene ether resin composition of the present invention can be produced by dissolving a polyphenylene ether resin in a solvent and then mixing the organic silicon compound represented by the formula (1) and/or the formula (2) and other components according to a conventional method.
As the solvent, aromatic solvents such as toluene and xylene are preferable; ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone; ether solvents such as tetrahydrofuran, etc., among these, aromatic solvents are more preferable, and toluene and xylene are further preferable.
Examples
The present invention will be described more specifically below with reference to synthetic examples, examples and comparative examples, but the present invention is not limited to these examples.
The viscosity is a measured value at 25 ℃ obtained by an austenitic viscometer, and the area percentage in a gas chromatograph is measured under the following conditions and calculated based on the peak area of each component obtained.
(gas chromatography measurement conditions)
A gas chromatography apparatus: 6890N (Agilent Technologies, Inc.)
Column: HP-5 (5% -phenyl-95% -methylpolysiloxane, manufactured by Agilent Technologies, Inc.)
Column size: a length of 30m, an inner diameter of 0.53mm, and a film thickness of 1.5 μm
Carrier gas: helium
Carrier gas flow: 1 ml/min
Oven temperature: 50-300 DEG C
Temperature rising conditions are as follows: 10 ℃/min
The split ratio is as follows: 100: 1
Detection mode and temperature: flame Ionization Detector (FID) 300 deg.C
Sample injection amount: 1 μ l
[1] Production of (mixture of) organosilicon Compound
[ example 1-1]
Into a 3L separable flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 250g (1.0 mol) of triallyl isocyanurate and a toluene solution of platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex (5.0X 10 in terms of platinum atom)-5Mole) and formamide 0.2g (5.0X 10)-3Moles). 122g (1.0 mol) of trimethoxysilane was added dropwise thereto at an internal temperature of 80 to 90 ℃ over 1 hour, followed by stirring at 80 ℃ for 3 hours.
After the stirring was completed, the mixture was concentrated under reduced pressure and filtered to obtain a viscosity of 175mm2A light yellow transparent liquid per second. The area percentage of the product in the gas chromatography was 46% for the organosilicon compound represented by the above formula (1), 24% for the organosilicon compound represented by the above formula (2), 4% for the organosilicon compound represented by the above formula (3), and 26% for the organic compound represented by the above formula (4). This was set as mixture a.
[ examples 1-2]
Into a 3L separable flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 250g (1.0 mol) of triallyl isocyanurate and a toluene solution of platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex (5.0X 10 in terms of platinum atom)-5Mole) and formamide 0.2g (5.0X 10)-3Moles). 61g (0.5 mol) of trimethoxysilane was added dropwise thereto at an internal temperature of 80 to 90 ℃ over 0.5 hour, followed by stirring at 80 ℃ for 3 hours.
After the stirring, the mixture was concentrated under reduced pressure and filtered to obtain a viscosity of 135mm2A light yellow transparent liquid per second. The area percentage of the product in the gas chromatography was 43% for the organosilicon compound represented by the above formula (1), 10% for the organosilicon compound represented by the above formula (2), 0% for the organosilicon compound represented by the above formula (3), and 47% for the organic compound represented by the above formula (4). This was designated as mixture B.
[ examples 1 to 3]
Into a 3L separable flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 250g (1.0 mol) of triallyl isocyanurate and a toluene solution of platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex (5.0X 10 in terms of platinum atom)-5Mole) and formamide 0.2g (5.0X 10)-3Moles). 183g (1.5 mol) of trimethoxysilane was added dropwise thereto at an internal temperature of 80 to 90 ℃ over 1.5 hours, followed by stirring at 80 ℃ for 3 hours.
After the stirring, the mixture was concentrated under reduced pressure and filtered to obtain a viscosity of 285mm2A light yellow transparent liquid per second. The area percentage of the product in the gas chromatography was 38% for the organosilicon compound represented by the above formula (1), 34% for the organosilicon compound represented by the above formula (2), 12% for the organosilicon compound represented by the above formula (3), and 16% for the organic compound represented by the above formula (4). This was set as mixture C.
Synthesis examples 1 to 1
Comprising a stirrer, a reflux condenser, a dropping funnel and a thermometerInto a 3L separable flask was placed 250g (1.0 mol) of triallyl isocyanurate and a toluene solution of platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex (5.0X 10 in terms of platinum atom)-5Mole) and formamide 0.2g (5.0X 10)-3Moles). 244g (2.0 mol) of trimethoxysilane was added dropwise thereto at an internal temperature of 80 to 90 ℃ over 2 hours, followed by stirring at 80 ℃ for 3 hours.
After completion of the stirring, the mixture was concentrated under reduced pressure and filtered to obtain a viscosity of 391mm2A light yellow transparent liquid per second. The area percentage of the product in the gas chromatography was 28% for the organosilicon compound represented by the above formula (1), 41% for the organosilicon compound represented by the above formula (2), 19% for the organosilicon compound represented by the above formula (3), and 6% for the organic compound represented by the above formula (4). This was set as mixture D.
Comparative examples 1 to 1
Into a 3L separable flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 250g (1.0 mol) of triallyl isocyanurate and a toluene solution of platinum-1, 3-divinyl-1, 1, 3, 3-tetramethyldisiloxane complex (5.0X 10 in terms of platinum atom)-5Mole) and formamide 0.2g (5.0X 10)-3Moles). 366g (3.0 mol) of trimethoxysilane was added dropwise thereto at an internal temperature of 80 to 90 ℃ over 3 hours, followed by stirring at 80 ℃ for 3 hours.
After the stirring was completed, the mixture was concentrated under reduced pressure and filtered to obtain a viscosity of 305mm2A light yellow transparent liquid per second. The area percentage of the product in the gas chromatography was 0% for the organosilicon compound represented by the above formula (1), 0% for the organosilicon compound represented by the above formula (2), 100% for the organosilicon compound represented by the above formula (3), and 0% for the organic compound represented by the above formula (4). This was set as organosilicon compound E.
Examples 2-1 to 2-4 and comparative examples 2-1 to 2-6
[2] Polyphenylene ether resin composition and production of cured product thereof
(polyphenylene ether)
Modified polyphenylene ether having terminal modified with methacryloyl group (Noryl SA 9000: SABIC Innovative Plastics Co., Ltd., manufactured by Ltd.)
(high molecular weight Material)
High molecular weight material having methacrylic skeleton (ARUFON UP-1080; weight average molecular weight 6000; manufactured by Toyo Seiya Kabushiki Kaisha)
(crosslinking type curing agent)
Triallyl isocyanurate (manufactured by TAIC, Mitsubishi chemical corporation)
(inorganic Filler)
Silica surface-treated with vinylsilane (SC 2300-SVJ: Admatechs Co., Ltd.)
(reaction initiator)
1, 3-bis (tert-butylperoxydiisopropyl) benzene (Perbutyl P manufactured by Nichii oil Co., Ltd.)
[ preparation of resin composition ]
Modified polyphenylene ether (Noryl SA9000) was mixed with toluene, and the mixture was heated to 80 ℃ to dissolve it, thereby obtaining a 50 mass% toluene solution. Then, after adding any one of the high molecular weight material (ARUFON UP-1080), the crosslinking agent (TAIC), the mixtures a to D, and the organic silicon compounds E to I to the obtained toluene solution so as to be in the proportions (parts by mass) described in tables 1 and 2 (comparative example 2-1 did not add an organic silicon compound), the mixture was stirred for 30 minutes to completely dissolve the compound. Further, an inorganic filler (SC2300-SVJ) and a reaction initiator (Perbutyl P) were added thereto, and the mixture was dispersed by a bead mill to obtain a varnish-like resin composition.
[ production of prepreg ]
Using the above varnishes, prepregs were produced for the subsequent evaluation.
In the production of the prepreg, a #1078 type, WEA1078 glass cloth manufactured by ritonavir textile corporation was used as a woven fabric base material.
Each of the resin compositions obtained above was impregnated into a woven fabric base material so that the thickness after curing became 60 μm, and was dried by heating at 120 ℃ for 3 minutes until the material became a semi-cured state, to obtain a prepreg.
[ production of laminated sheet ]
Each of the prepregs 1 prepared as described above was pressed with copper foils (GT-MP manufactured by Kogaku electric industries Co., Ltd.) having a thickness of 12 μm disposed on both surfaces thereof, and the pressed product was subjected to vacuum processing at a temperature of 220 ℃ and a pressure of 40kgf/cm2The test piece was heated and pressed for 90 minutes under the conditions described above, to obtain an evaluation laminate sheet 1 having a thickness of 84 μm, in which copper foils were bonded to both sides.
Further, 12 sheets of the above prepreg were stacked, copper foils were disposed on the uppermost and lowermost surfaces, and heat-molded by the same method as described above to obtain a copper-clad laminate, and then the copper foils were peeled off and removed to obtain an evaluation laminate 2 having a thickness of 720 μm.
Using the evaluation laminates 1 and 2 produced as described above, the adhesion of the copper foil and the dielectric characteristics were evaluated by the following methods. The results are shown in tables 1 and 2.
(1) Copper foil adhesion
In the evaluation of the laminated sheet 1, the thickness was measured in accordance with JIS C6481: 1996, measured the peel strength of the copper foil from the insulation layer. A pattern having a width of 10mm and a length of 100mm was formed, and the pattern was peeled off at a speed of 50 mm/min using a tensile tester, and the peel strength (peel strength) at this time was measured, and the obtained peel strength was defined as a copper foil adhesive force (adhesion force). The measurement unit is kN/m.
(2) Dielectric Properties (relative permittivity and dielectric loss tangent)
The relative dielectric constant and the dielectric loss tangent of the evaluation substrate at 10GHz were measured by the cavity resonator perturbation method. As the evaluation substrate, the above-described evaluation laminated plate 2 was used.
Specifically, the relative dielectric constant (DK) and the dielectric loss tangent (Df) of the evaluation substrate at 10GHz were measured using a Network Analyzer (N5230A: Agilent Technologies, Inc.).
[ TABLE 1]
[ TABLE 2]
Onium 1 organosilicon compound F: vinyltrimethoxysilane (KBM-1003, manufactured by shin-Etsu chemical Co., Ltd.)
Onium 2 organosilicon compound G: 3-methacryloxypropyltrimethoxysilane (KBM-503, manufactured by shin-Etsu chemical Co., Ltd.)
Onium 3 organosilicon compound H: japanese patent laid-open publication No. 2018-16709, organosilicon Compound 1 of example 1-1
Onium 4 organosilicon compounds I: japanese patent laid-open publication No. 2019-77761, organosilicon Compound 1 of example 1-1
As shown in table 1, the cured product of the polyphenylene ether resin composition containing the organic silicon compound of the present invention showed excellent dielectric characteristics and adhesion to a copper foil. On the other hand, as shown in table 2, the polyphenylene ether resin composition containing no organic silicon compound of the present invention had poor adhesion to the copper foil.
Claims (3)
1. A polyphenylene ether resin composition characterized by comprising: at least one of a polyphenylene ether resin and an organosilicon compound represented by the following structural formulae (1) and (2),
[ CHEM 1]
In the formula, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and each m independently represents an integer of 1 to 3.
2. The polyphenylene ether resin composition according to claim 1, comprising at least an organosilicon compound represented by the structural formula (1).
3. A mixture of compounds in which the ratio determined by the area percentage method of gas chromatography is
An organosilicon compound represented by the following structural formula (1): 35 to 75 percent,
An organosilicon compound represented by the following structural formula (2): 10 to 50 percent,
An organosilicon compound represented by the following structural formula (3): less than 15 percent,
An organic compound represented by the following structural formula (4): 15 to 50%, and
the total of compounds represented by the following structural formulae (1) to (4): more than 96 percent of the total weight of the composition,
[ CHEM 2]
In the formula, R1Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R2Each independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, and m independently represents an integer of 1 to 3.
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JP2003138127A (en) * | 2001-10-30 | 2003-05-14 | Asahi Kasei Corp | Filler for thermosetting polyphenylene ether resin and resin composition using the same |
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JP2011208120A (en) * | 2010-03-09 | 2011-10-20 | Momentive Performance Materials Inc | Self-adhesive polyorganosiloxane composition |
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JP2004339328A (en) | 2003-05-14 | 2004-12-02 | Matsushita Electric Works Ltd | Modified polyphenylene ether compound and method for producing the same |
CN104508005B (en) | 2012-08-29 | 2017-03-08 | 松下知识产权经营株式会社 | Noryl, its manufacture method, polyphenyl ether resin composition, resin varnish, prepreg, metal-clad laminate and printed wiring board |
JP6642325B2 (en) | 2016-07-27 | 2020-02-05 | 信越化学工業株式会社 | Resin modifier for high frequency substrate materials composed of organosilicon compounds |
US10377776B2 (en) * | 2017-03-08 | 2019-08-13 | Evonik Degussa Gmbh | Process for preparing tris[3-(alkoxysilyl)propyl]isocyanurates |
JP6958031B2 (en) * | 2017-07-04 | 2021-11-02 | 信越化学工業株式会社 | Silicone gel composition and its cured product and power module |
JP6907877B2 (en) | 2017-10-24 | 2021-07-21 | 信越化学工業株式会社 | Organosilicon compound, its production method and curable composition |
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JP2003138127A (en) * | 2001-10-30 | 2003-05-14 | Asahi Kasei Corp | Filler for thermosetting polyphenylene ether resin and resin composition using the same |
JP2004259899A (en) * | 2003-02-25 | 2004-09-16 | Matsushita Electric Works Ltd | Printed circuit board, resin composition therefor, and multilayer printed circuit board |
JP2009019139A (en) * | 2007-07-12 | 2009-01-29 | Kaneka Corp | Curable composition |
WO2010097261A1 (en) * | 2009-02-24 | 2010-09-02 | International Business Machines Corporation | Silane coupling agents for printed circuit boards |
JP2011208120A (en) * | 2010-03-09 | 2011-10-20 | Momentive Performance Materials Inc | Self-adhesive polyorganosiloxane composition |
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