CN112429953B - Glass substrate edge polishing system and method - Google Patents
Glass substrate edge polishing system and method Download PDFInfo
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- CN112429953B CN112429953B CN202011346664.5A CN202011346664A CN112429953B CN 112429953 B CN112429953 B CN 112429953B CN 202011346664 A CN202011346664 A CN 202011346664A CN 112429953 B CN112429953 B CN 112429953B
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/04—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way
- C03B29/06—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way with horizontal displacement of the products
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Abstract
The invention relates to the field of glass manufacturing, and discloses a glass substrate edge polishing system and a method, wherein the glass substrate edge polishing system comprises a preheating unit (10), a high-temperature heating polishing unit (20), an annealing unit (30) and a conveying unit (40), the conveying unit is used for conveying a glass substrate G in the direction from the preheating unit to the annealing unit, and the high-temperature heating polishing unit is arranged between the preheating unit and the annealing unit and positioned on two sides of the conveying unit so as to perform high-temperature heating polishing on the edge of the glass substrate G. The glass substrate can be preheated through the preheating unit, the annealing unit can enable the glass after high-temperature heating and polishing to be stably cooled, and the glass is prevented from being cracked due to overlarge temperature difference in the heating and cooling processes. Through setting up high temperature heating polishing unit in conveying unit both sides, can concentrate and polish the limit portion of glass substrate, avoid arousing being heated of whole glass substrate too fast and exploding.
Description
Technical Field
The invention relates to the field of glass substrate manufacturing, in particular to a glass substrate edge polishing system and a glass substrate edge polishing method.
Background
In the manufacturing process of the glass substrate, in order to remove flaws such as cracks and sand edges at the edge of the glass substrate, eliminate concentrated stress at the edge, and improve the use or subsequent processing yield of the glass substrate, the edge of the glass substrate needs to be polished, i.e. edge polishing is performed. The traditional chemical polishing has poor effect, easily causes the edge of the glass substrate to be corroded and damaged, and the polished surface is easy to have micro-ripple fluctuation, so that the integrity of the edge and other parts can not be ensured. The grinding and polishing are only suitable for glass substrates with larger thickness, and the grinding difficulty is larger for thin plate glass. Although the high-temperature heating polishing can be used to heat the edge of the glass to a temperature above the softening point of the glass, and the area is healed to a new surface under the traction of the surface tension and the flowing ability of the glass, the polishing effect is achieved, but the polishing pad is only suitable for the glass with larger thickness, and for the glass substrate with thinner thickness, the glass substrate is easy to be cracked due to too fast heating during high-temperature heating, and the edge is also warped and increased due to uneven heating.
Therefore, in the prior art, it is highly desirable to improve the edge polishing effect for a glass substrate with a small thickness.
Disclosure of Invention
The invention aims to solve the problem that the glass substrate is difficult to edge polish in the prior art, and provides a glass substrate edge polishing system which can be suitable for edge polishing of a glass substrate with a small thickness.
In order to achieve the above object, an aspect of the present invention provides a glass substrate edge polishing system, wherein the glass substrate edge polishing system includes a preheating unit, a high temperature heat polishing unit, an annealing unit, and a conveying unit, the conveying unit is configured to convey a glass substrate G in a direction from the preheating unit to the annealing unit, and the high temperature heat polishing unit is disposed between the preheating unit and the annealing unit and on both sides of the conveying unit to perform high temperature heat polishing on an edge portion of the glass substrate G.
Alternatively, the high-temperature heating polishing unit includes heating members disposed opposite to each other, the heating members being disposed to be capable of approaching or separating from each other to adjust a distance of the heating members with respect to the edge portion of the glass substrate G.
Optionally, the high-temperature heating polishing unit includes a first guide rail disposed perpendicular to a conveying path of the conveying unit, and the heating member is disposed to be movable along the first guide rail.
Optionally, the conveying unit includes a straight second guide rail and a conveying member movable by the second guide rail, the high-temperature heating polishing unit includes two sets of heating members disposed along an extending direction of the second guide rail, and the conveying member is rotatably disposed to polish two sets of opposite sides of the glass substrate G by the two sets of heating members, respectively.
Optionally, the heating member is U type electric heating member, U type electric heating member is including the arc portion that is used for the heating and follow the heat preservation portion of the parallel extension in both sides of arc portion, arc portion corresponds glass substrate G limit portion, heat preservation portion is on a parallel with glass substrate G sets up.
Optionally, the glass substrate edge polishing system comprises a tunnel kiln, the preheating unit and the annealing unit are respectively arranged at two ends of the tunnel kiln, the high-temperature heating polishing unit is arranged in the middle of the tunnel kiln, and a fan for supplying air towards two ends is arranged in the tunnel kiln.
The application also provides a glass substrate edge polishing method, wherein the method comprises the following steps:
s1, preheating the glass substrate G to Tg +/-50 ℃;
s2, performing high-temperature heating and polishing on the edge of the preheated glass substrate G;
and S3, annealing the polished glass substrate G.
Optionally, the initial thickness of the glass substrate G is not greater than 0.55 mm; and/or the moving speed of the glass substrate G in the step S2 is 5-100 mm/S.
Optionally, step S2 includes: heating an edge portion of the glass substrate G using a heating member, wherein the heating member is spaced from the edge portion by a distance of 0 to 2 cm; and/or, heating the edge to 50-150 ℃ above Ts.
Alternatively, the method includes laminating a plurality of the glass substrates G on each other and spaced apart from each other by spacers S before step S1.
Through above-mentioned technical scheme, can preheat the glass substrate through preheating the unit, annealing unit can be so that the glass steady cooling after the high temperature heating polishing, prevents to heat up, the too big glass that leads to of temperature difference bursts in the cooling process. Through setting up high temperature heating polishing unit in conveying unit both sides, can concentrate and polish the limit portion of glass substrate, avoid arousing being heated of whole glass substrate too fast and exploding.
Drawings
FIG. 1 is a schematic diagram illustrating one embodiment of a glass substrate edge polishing system of the present application;
FIG. 2 is a top view of the embodiment of FIG. 1;
FIG. 3 is a schematic view of a glass substrate passing through one embodiment of a heating element of the glass substrate edge polishing system of the present application; .
Figure 4 is a schematic view of a glass stack disposed on a conveyance member of the glass substrate edge polishing system of the present application.
Description of the reference numerals
10-preheating unit, 20-high temperature heating polishing unit, 21-heating element, 211-arc part, 212-heat preservation part, 22-first guide rail, 23-guide rod, 30-annealing unit, 40-conveying unit, 41-second guide rail, 42-conveying element, 421-clamp, G-glass substrate and S-gasket.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
In the present invention, the use of directional terms such as "upper, lower, left, right" generally means upper, lower, left, right as viewed with reference to the accompanying drawings, unless otherwise specified; "inner and outer" refer to the inner and outer relative to the profile of the components themselves. The present application will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
According to an aspect of the present application, there is provided a glass substrate edge polishing system, wherein the glass substrate edge polishing system includes a preheating unit 10, a high temperature heat polishing unit 20, an annealing unit 30, and a conveying unit 40, the conveying unit 40 is configured to convey a glass substrate G in a direction from the preheating unit 10 to the annealing unit 30, and the high temperature heat polishing unit 20 is disposed between the preheating unit 10 and the annealing unit 30 and on both sides of the conveying unit 40 to perform high temperature heat polishing on an edge portion of the glass substrate G.
The glass substrate G can be preheated through the preheating unit 10, and the annealing unit 30 can stably cool the glass after high-temperature heating and polishing, so that the glass is prevented from being cracked due to overlarge temperature difference in the processes of temperature rise and temperature reduction. By arranging the high-temperature heating polishing units 20 on both sides of the conveying unit 40, the edges of the glass substrates G can be polished in a concentrated manner, and the glass substrates G are prevented from being heated too quickly and being cracked.
Preferably, the high-temperature heating polishing unit 20 includes heating members 21 disposed opposite to each other, and the heating members 21 are disposed to be capable of approaching or departing from each other to adjust a distance of the heating members 21 with respect to the edge portion of the glass substrate G. Therefore, the distance between the heating element 21 and the edge of the glass substrate G can be adjusted, so that the high-temperature heating polishing unit 20 can only provide polishing action for the edge, and the whole glass substrate is prevented from being heated and burst due to the heating of the high-temperature heating polishing unit 20.
Wherein the heating members 21 can be moved close to or away from each other in an appropriate manner. Specifically, as shown in fig. 1, the high-temperature heating polishing unit 20 may include a first guide 22 disposed perpendicular to a conveying path of the conveying unit 40, and the heating member 21 is disposed to be movable along the first guide 22. For example, the heating member 21 may be mounted to a guide rod 23 that is slidably engaged with the first guide rail 22. By moving the heating member 21 to different positions of the first guide 22, the distance of the heating member 21 from the conveying unit 40, that is, the distance of the heating member 21 with respect to the edge portion of the glass substrate G can be adjusted.
Preferably, in order to polish each edge of the glass substrate G, the glass substrate G may be provided to be rotatable during conveyance. Specifically, as shown in fig. 2, the conveying unit 40 includes a straight second guide rail 41 and a conveying member 42 movable by the second guide rail 41, the high-temperature heating and polishing unit 20 includes two sets of the heating members 21 arranged along the extending direction of the second guide rail 41, and the conveying member 42 is arranged to be rotatable so as to polish two sets of opposite sides of the glass substrate G by the two sets of the heating members 21, respectively. In use, after passing through the first group of heating elements 21 to polish one pair of opposite sides of the glass substrate G, the conveying member 42 may be rotated so that the glass substrate G is rotated 90 degrees in its plane, followed by polishing the other pair of opposite sides by the second group of heating elements 21. Wherein the transport member 42 may be in the form of a turntable for ease of rotation. Further, a moving block that can move relative to the second rail 41 may be provided on the second rail 41, and the conveying member 42 may be attached to the moving block. Alternatively, the second guide rail 41 may be a belt-type circulating or reciprocating guide rail, so that the conveying member 42 may be fixed on the second guide rail 41 to move the conveying member 42 by the movement of the second guide rail 41.
In addition, in order to improve the processing efficiency, as shown in fig. 4, a clamp 421 may be provided on the conveying member 42 to clamp the plurality of stacked glass substrates G, and adjacent glass substrates G may be separated from each other by a spacer S. The side length of the spacer S is smaller than that of the glass substrate G, for example, the corresponding side of the spacer S is 5-10mm smaller than that of the glass substrate G, and the thickness of the spacer S may be greater than that of the glass substrate G, so as to achieve a good isolation and anti-adhesion effect, for example, the thickness of the spacer S may be more than 5 times the thickness of the glass substrate G. In which the conveying member 42 may be used as a lower jig and the clamp 421 as an upper jig to cooperatively clamp the laminated glass substrates G for simplification of the structure.
In addition, the system of the present application may perform continuous processing, and the plurality of conveyance members 42 may sequentially move from the preheating unit 10 toward the annealing unit 30, thereby increasing the throughput and speed.
In the present application, the heating member 21 of the high-temperature heating and polishing unit 20 may be in any suitable form, and may be, for example, a flame spray gun, and in particular, may be any one of a single nozzle flame gun, a water-cooled nozzle flame gun, a radiation flame gun, a fish-tail type flame gun, a narrow-slit type flame gun, and the like, preferably a fish-tail type flame gun and a narrow-slit type flame gun, and more preferably a narrow-slit type flame gun. Alternatively, the heating member 21 may be an electric heating member, and preferably, as shown in fig. 3, the heating member 21 may be a U-shaped electric heating member including an arc portion 211 for heating and a keeping warm portion 212 extending in parallel from both sides of the arc portion 211, the arc portion 211 corresponding to the side portion of the glass substrate G, the keeping warm portion 212 being disposed in parallel to the glass substrate G. Thus, the arc-shaped portion 211 circumferentially corresponds to the edge of the glass substrate G to heat the edge in a targeted manner, and the heat-retaining portion 212 may provide only heat retention to smoothly transition the temperature of the glass substrate G from the edge to the center. Specifically, the arc portion 211 may be a silicon carbide rod, a silicon molybdenum rod, or the like, and the thermal insulation portion 212 may be a graphite plate.
In order to fully utilize energy, the glass substrate edge polishing system comprises a tunnel kiln, the preheating unit 10 and the annealing unit 30 are respectively arranged at two ends of the tunnel kiln, the high-temperature heating polishing unit 20 is arranged in the middle of the tunnel kiln, and a fan for supplying air towards two ends is arranged in the tunnel kiln. Specifically, the whole glass substrate edge polishing system is arranged in the tunnel kiln, so that a sealing system is formed, and the heat in the sealing system is fully utilized for preheating and annealing. Wherein, the heating portion (i.e., the high temperature heating polishing unit 20) of the tunnel kiln may be located at the middle portion of the tunnel kiln, and the generated heat may flow toward the preheating unit 10 and the annealing unit 30 along the tunnel for preheating and annealing by providing a fan in the tunnel kiln. In addition, the glass substrate edge polishing system may include an air blowing device for blowing cold air into the tunnel kiln at the end where the annealing unit 30 is located. By blowing cold air into the tunnel kiln at the end where the annealing unit 30 is located, the cold air can travel in reverse to the glass substrate G, cooling the glass substrate G on the one hand, and heating the cold air on the other hand, and the heated cold air can be drawn out for use in other processes.
According to another aspect of the present application, there is provided a glass substrate edge polishing method, wherein the method includes:
s1, preheating the glass substrate G to Tg +/-50 ℃;
s2, performing high-temperature heating and polishing on the edge of the preheated glass substrate G;
and S3, annealing the polished glass substrate G.
By preheating the glass substrate G to Tg +/-50 ℃, the stress of explosion caused by overlarge temperature difference between the radial direction and the axial direction of the glass is avoided in the subsequent high-temperature heating and polishing thermal processing process. By annealing the glass after high-temperature heating and polishing, the glass can be prevented from being cracked due to overlarge temperature difference in the processes of temperature rise and temperature reduction. By heating and polishing the edge of the glass substrate G at high temperature, the glass substrate G is prevented from being heated too fast and cracked.
The method of the present application, in particular, starts with a glass substrate G having a small thickness, for example, an initial thickness of not more than 0.55 mm.
In addition, during high-temperature heating polishing, the temperature of the surface to be polished (namely the edge part) of the glass needs to be higher than the melting temperature, and the temperature of the body (namely the rest part of the glass substrate G) cannot exceed the softening temperature, so that the high requirements on the heating temperature and the glass moving speed are met, and the influence of high-temperature heating on the part except the edge part can be avoided by matching with the moving speed of the glass substrate G in the high-temperature heating polishing process. Preferably, the moving speed of the glass substrate G in step S2 is 5-100 mm/S. Preferably, the edge is heated to 50-150 ℃ above Ts during high temperature heat polishing.
In the present application, the high-temperature heating polishing may be performed by a fuel heating method, an electric heating method, a high-frequency heating method, a hybrid heating method, or the like. The fuel heating method includes a flame polishing method, and the electric heating method may use the U-shaped electric heating member of fig. 3 for heating.
Among them, in the case of glass, when the flame polishing method is used, selection of an inappropriate kind of gas and an inappropriate distance tends to cause a phenomenon in which the interior of a product is overheated when the surface of the glass is heated, thereby causing deformation. In the application, the type of the fuel gas can be selected to mix any one of gases such as hydrogen, acetylene, methane, coal gas, liquefied gas and the like with air or oxygen, and as the high-temperature heating of the oxygen has higher high-temperature heating temperature, the combustion rate is high, the high-temperature heating is stable, the high-temperature heating irradiation time is shortened, and the glass can be prevented from deforming, the methane-oxygen mixed gas and the hydrogen-oxygen mixed gas are preferably selected, and the hydrogen-oxygen mixed gas is more preferably selected; meanwhile, the hydrogen-oxygen mixed gas has the advantages of zero pollution, high production efficiency, energy conservation, convenience and the like.
To perform the high-temperature heat polishing on the edge portion, step S2 includes heating the edge portion of the glass substrate G using a heating member (which may be a flame spray gun or an electric heating member) at a distance of 0-2cm from the edge portion.
To improve the process efficiency, the method may include, before the step S1, stacking a plurality of the glass substrates G on top of each other and spaced apart from each other by spacers S, so that the plurality of glass substrates G may be edge-polished at one time.
In addition, in the preheating and annealing processes, it is preferable to gradually change the temperature of the glass substrate G to moderate the temperature rise or fall. For example, gradient heating or temperature reduction may be performed during preheating and annealing, and the preheating and annealing treatment times may be set according to the thickness of the glass substrate G, for example, the preheating and annealing may be performed for 1 to 30min, respectively, the thinner the thickness of the glass substrate G, the shorter the treatment time. The annealing is used for preventing the glass substrate G after being heated and polished at high temperature from generating stress and residual stress which cause explosion due to excessive temperature difference, and the annealing in the application can adopt an annealing furnace or an annealing kiln to anneal the glass, for example, the annealing temperature can be 400 ℃ to room temperature.
The methods of the present application may be embodied in various suitable forms, preferably using the systems of the present application, but are not limited thereto.
The system and method of the present application are illustrated with reference to the accompanying figures.
Example 1:
after 10 glass substrates G of 140 × 70 × 0.2mm are positioned at intervals by spacers S, the glass substrates G are placed on the transfer member 42 by a robot or a worker, and are pressed by a jig 421 to be fixed. The heating member 21 is a flame gun, oxyhydrogen gas is selected as combustion gas, the heating temperature is set to be the glass softening point Ts +150 ℃, the distance between the glass substrate G and a torch of the flame gun is 0.5cm, and the moving speed of the glass substrate G between the flame guns is 15 mm/s. The glass substrate G is conveyed by the conveyance member 42 into a preheating process, and is preheated from room temperature to a preheating temperature (transition point (Tg) +30 ℃) for 5 min. After preheating, the glass substrate G is conveyed by the conveying member 42 into the first group of flame guns in the polishing process, and after leaving the first group of flame guns, the conveying member 42 is rotated by 90 degrees and then enters the second group of flame guns in the polishing process, and the other two sides are polished. And after finishing polishing, entering an annealing process to reduce the temperature of the glass substrate G to be below 100 ℃, and then entering air to reduce the temperature to normal temperature.
The polished product has no crack, smooth edge, no deformation and no bubble, the thickness difference delta t of the finished glass is 0.1t, and the expansion and contraction ratio expressed by the ratio of the dimension specification of the finished glass to the dimension specification of the plain glass is 0.990.
Example 2:
the edge polishing was performed by the method of example 1, in which the specification of the glass substrate G was 140 × 70 × 0.08mm, the preheating temperature was Tg +30 ℃, the high-temperature heating polishing temperature was Ts +100 ℃, the distance from the glass substrate G to the torch of the flame gun was 1cm, and the moving speed of the glass substrate G between the flame guns was 40 mm/s.
The polished product has no crack, smooth edge, no deformation and no bubble, the thickness difference delta t of the finished glass is 0.1t, and the expansion and contraction ratio expressed by the ratio of the dimension specification of the finished glass to the dimension specification of the plain glass is 0.990.
Example 3:
the edge polishing was performed by the method of example 1, in which the specification of the glass substrate G was 140 × 70 × 0.07mm, the preheating temperature was Tg-50 ℃, the high-temperature heating polishing temperature was Ts +70 ℃ and the glass substrate G was heated by a U-shaped electric heating member, the distance from the glass substrate G to the arc portion 211 was 1cm, and the moving speed of the glass substrate G between the U-shaped electric heating members was 60 mm/s.
The polished product has no crack, smooth edge, no deformation and no bubble, the thickness difference delta t of the finished glass is 0.15t, and the expansion and contraction ratio expressed by the ratio of the dimension specification of the finished glass to the dimension specification of the plain glass is 0.990.
Example 4
The edge polishing was performed by the method of example 1, in which the specification of the glass substrate G was 140 × 70 × 0.55mm, the preheating temperature was Tg +50 ℃, the high-temperature heating polishing temperature was Ts +150 ℃, the distance from the glass substrate G to the torch of the flame gun was 0.5cm, and the moving speed of the glass substrate G between the flame guns was 5 mm/s.
The polished product has no crack, smooth edge, no deformation and no bubble, the thickness difference Delta t of the finished glass is 0.11t, and the expansion and contraction ratio expressed by the ratio of the dimension specification of the finished glass to the dimension specification of the plain glass is 0.990.
Example 5
The edge polishing was performed by the method of example 1, in which the specification of the glass substrate G was 140 × 70 × 0.4mm, the preheating temperature was Tg +30 ℃, the high-temperature heating polishing temperature was Ts +50 ℃, the distance from the glass substrate G to the torch of the flame gun was 1cm, and the moving speed of the glass substrate G between the flame guns was 40 mm/s.
The polished product has no crack, smooth edge, no deformation and no bubble, the thickness difference Delta t of the finished glass is 0.12t, and the expansion and contraction ratio expressed by the ratio of the dimension specification of the finished glass to the dimension specification of the plain glass is 0.990.
The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, many simple modifications can be made to the technical solution of the invention. The present application includes the combination of individual features in any suitable manner. The invention is not described in detail in order to avoid unnecessary repetition. Such simple modifications and combinations should be considered within the scope of the present disclosure as well.
Claims (8)
1. The glass substrate edge polishing system is characterized by comprising a preheating unit (10), a high-temperature heating polishing unit (20), an annealing unit (30) and a conveying unit (40), wherein the conveying unit (40) is used for conveying a glass substrate G in the direction from the preheating unit (10) to the annealing unit (30), and the high-temperature heating polishing unit (20) is arranged between the preheating unit (10) and the annealing unit (30) and positioned on two sides of the conveying unit (40) so as to carry out high-temperature heating polishing on the edge part of the glass substrate G;
the high-temperature heating polishing unit (20) includes heating members (21) disposed opposite to each other, the heating members (21) being disposed so as to be capable of approaching or receding from each other to adjust a distance of the heating members (21) with respect to the edge portion of the glass substrate G;
heating member (21) are U type electric heating member, U type electric heating member is including arc portion (211) that are used for the heating and follow heat preservation portion (212) of the parallel extension in both sides of arc portion (211), arc portion (211) correspond glass substrate G limit portion, heat preservation portion (212) are on a parallel with glass substrate G sets up.
2. The glass substrate edge polishing system according to claim 1, wherein the high-temperature heat polishing unit (20) comprises a first guide rail (22) disposed perpendicularly to a conveying path of the conveying unit (40), and the heating member (21) is disposed to be movable along the first guide rail (22).
3. The glass substrate edge polishing system according to claim 1, wherein the conveying unit (40) comprises a straight second guide rail (41) and a conveying member (42) movable by the second guide rail (41), the high-temperature heating polishing unit (20) comprises two sets of the heating members (21) arranged along the extending direction of the second guide rail (41), and the conveying member (42) is provided to be rotatable so as to polish two sets of opposite sides of the glass substrate G by the two sets of the heating members (21), respectively.
4. The glass substrate edge polishing system according to any one of claims 1 to 3, wherein the glass substrate edge polishing system comprises a tunnel kiln, the preheating unit (10) and the annealing unit (30) are respectively arranged at two ends of the tunnel kiln, the high-temperature heating polishing unit (20) is arranged in the middle of the tunnel kiln, and a fan for blowing air towards two ends is arranged in the tunnel kiln.
5. A method of edge polishing a glass substrate, the method being performed using the glass substrate edge polishing system of any one of claims 1-4, the method comprising:
s1, preheating the glass substrate G to Tg +/-50 ℃;
s2, performing high-temperature heating and polishing on the edge of the preheated glass substrate G;
and S3, annealing the polished glass substrate G.
6. The glass substrate edge-polishing method according to claim 5, wherein the glass substrate G has an initial thickness of not more than 0.55 mm; and/or the moving speed of the glass substrate G in the step S2 is 5-100 mm/S.
7. The edge polishing method of a glass substrate according to claim 5, wherein the step S2 comprises:
heating an edge portion of the glass substrate G using a heating member, wherein the heating member is spaced from the edge portion by a distance of 0 to 2 cm; and/or the presence of a gas in the gas,
the sides are heated to 50-150 ℃ above Ts.
8. The method according to any one of claims 5 to 7, wherein the method comprises, before step S1, laminating a plurality of the glass substrates G on each other and spaced apart from each other by spacers S.
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| CN114409236B (en) * | 2022-02-10 | 2024-03-08 | 国玻新创(北京)科技发展有限公司 | Trimming and polishing process for hot glass on float glass manufacturing line |
| CN114473643B (en) * | 2022-02-10 | 2023-04-14 | 国玻新创(北京)科技发展有限公司 | Trimming and polishing process of hot glass on production line for manufacturing rolled glass |
| CN115711857B (en) * | 2023-01-06 | 2023-04-28 | 坛墨质检科技股份有限公司 | Residual detection experimental device and detection method for lead ion standard solution |
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| CN110510858A (en) * | 2018-08-21 | 2019-11-29 | 浙江长兴杭华玻璃有限公司 | A kind of 360 degree of glassware straight fiery burr removers |
| US11479504B2 (en) * | 2018-09-06 | 2022-10-25 | O'keeffe's, Inc. | Fire-rated glass unit |
| CN209442852U (en) * | 2018-11-09 | 2019-09-27 | 山东红宝自动化有限公司 | A kind of glassware automatic production line |
| CN210287128U (en) * | 2019-06-24 | 2020-04-10 | 东旭(锦州)精密光电科技有限公司 | Glass polishing device |
| CN211546325U (en) * | 2020-01-18 | 2020-09-22 | 杭州祥捷玻璃有限公司 | Exempt from high-efficient glass tempering equipment of edging |
| CN111892285A (en) * | 2020-09-08 | 2020-11-06 | 泰兴美视智能光电有限公司 | Flame polishing device and flame polishing method for electronic glass |
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