CN112374891A - Graphite base plate surface gradient TaC coating and preparation method thereof - Google Patents

Graphite base plate surface gradient TaC coating and preparation method thereof Download PDF

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CN112374891A
CN112374891A CN202011278669.9A CN202011278669A CN112374891A CN 112374891 A CN112374891 A CN 112374891A CN 202011278669 A CN202011278669 A CN 202011278669A CN 112374891 A CN112374891 A CN 112374891A
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coating
tac
gradient
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gas
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CN112374891B (en
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汪洋
杨建�
苏凯
李�权
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Changshu Tongle Electronic Materials Co ltd
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南京工业大学
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Abstract

The invention discloses a gradient TaC coating on the surface of a graphite base plate and a preparation method thereof, wherein the gradient TaC coating comprises a graphite base plate matrix, and the surface of the graphite base plate matrix is provided with the gradient TaC coating; the gradient TaC coating comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of a linear equation of y = ax or conforms to y = ax2A parabolic regular distribution. The invention utilizes CVD dynamic codeposition technology to realize the gradient spanning of the content of TaC components in the coating from 0 to 100 percent, and because the inner layer of the coating is a pyrolytic carbon layer which has a similar thermal expansion coefficient with a graphite matrix and is gradually transited, the thermal matching difference between the coating and the matrix can be effectively improved; meanwhile, the soft C component structure and the nanometer pores in the coating can effectively relieve the thermal expansion of the TaC crystal so as to reduce the stress peak value in the coating.

Description

Graphite base plate surface gradient TaC coating and preparation method thereof
Technical Field
The invention relates to the technical field of semiconductor epitaxial growth equipment, in particular to a graphite base plate surface gradient TaC coating and a preparation method thereof.
Background
The graphite base plate for the semiconductor is a key consumable material for epitaxially growing single crystal SiC, InP, GaN and AlN semiconductors for MOCVD equipment, and plays an irreplaceable role in the semiconductor chip industry chain. Graphite has excellent characteristics of high temperature resistance, high heat conduction, high temperature strength and the like, is a preferred material of an epitaxial single crystal substrate base plate substrate, but the graphite material is easy to oxidize, corrode and wear resistant, is easy to generate graphite powder, is easy to release adsorbed gas under vacuum, pollutes the process growth environment, greatly reduces the quality of a semiconductor film, cannot be directly used for growing semiconductors, and needs to be coated with a layer of uniform and compact SiC ceramic coating on the surface of the graphite base plate.
However, the main problems faced by conventional SiC coatings are: the stability under the high-temperature vacuum environment is poor, the coating starts to be slowly decomposed at 1200-1400 ℃, the service life of the coating is short, and the preparation requirement of a new generation of semiconductor material cannot be met.
Tantalum carbide (TaC) is an important high-temperature structural material with high strength, corrosion resistance and good chemical stability, has a melting point as high as 3985 ℃, and is one of the compounds with highest temperature resistance. The TaC coating has excellent thermal shock resistance, oxidation resistance, airflow scouring resistance and low gas permeability, has good chemical compatibility and mechanical compatibility with graphite materials, can still stably exist at the temperature of more than 2000 ℃, and has excellent acid and alkali resistance on H2, HCl and NH 3. However, because the thermal expansion coefficient of the TaC ceramic material is larger (about 8.29X 10-6/K) and has larger thermal expansion difference with the graphite substrate, the TaC coating has overlarge residual stress in the preparation and use processes, and when the shear stress peak value at the coating interface is larger than the bonding strength of the coating, the coating can fall off.
Therefore, those skilled in the art need to provide a gradient TaC coating on the surface of a graphite base plate and a preparation method thereof, which solves the thermal matching difference between the coating and the substrate, so as to relieve the thermal stress between the coating and the substrate, effectively avoid the generation of coating cracks, and improve the service life of the coating.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides the gradient TaC coating on the surface of the graphite base plate and the preparation method thereof, which solve the problem of thermal matching difference between the coating and the matrix, thereby relieving the thermal stress between the coating and the matrix, effectively avoiding the generation of coating cracks and prolonging the service life of the coating.
In order to achieve the aim, the invention provides a gradient TaC coating on the surface of a graphite base plate, which comprises a graphite base plate matrix, wherein the surface of the graphite base plate matrix is provided with the gradient TaC coating; the gradient TaC coating comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of y-a-x linear equation or y-a-x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
Preferably, the thickness of the gradient TaC coating is 50 to 120 μm.
Preferably, the roughness of the graded TaC coating is less than 2 μm.
The invention also provides a preparation method of the gradient TaC coating on the surface of the graphite base plate, which comprises the following steps:
s01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of a gradient TaC coating;
step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas;
step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 1-2h to ensure that the outer surface of the coating is a pure single-phase TaC coating;
step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 900-1200 ℃ to 1400-1600 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react;
s05, preserving heat for 1-2 hours after deposition is finished so as to slowly release the thermal stress in the gradient coating;
and S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
Preferably, in the step S01, methane gas is used as a C source, tantalum pentachloride gas is used as a Ta source, hydrogen is used as a reactant, argon is used as a diluent, the deposition time is 1-20 h, and the deposition pressure is 500-.
Preferably, in the step S02, the step of adjusting the molar ratio of the introduced methane and tantalum pentachloride gas includes the following steps:
s021, only introducing three gases of methane, hydrogen and argon when the deposition is started, and maintaining the temperature at 900-1200 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 1-2 mu m/h;
s022, gradually adding gasified tantalum pentachloride gas after deposition is carried out for 1-2h, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating.
Preferably, in step S022, the tantalum pentachloride gas is determined in accordance with z ═ b · t or z ═ b · t2The function rule of (a) is gradually increased until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, b is a positive number greater than 0, and t represents time.
The invention has the technical effects and advantages that:
1. the CVD dynamic codeposition technology is utilized to realize the high purity of the coating, the content of the TaC component in the gradient TaC coating is spanned from the gradient of 0-100%, and the thermal matching difference between the coating and the matrix can be effectively improved as the inner layer of the coating is a pyrolytic carbon layer which has a similar thermal expansion coefficient with the graphite matrix and is gradually transited;
2. the soft C component structure in the coating can effectively relieve the thermal expansion of TaC crystals so as to reduce the stress peak value in the coating.
3. The gradient structure in the invention can be designed according to the thermal stress gradient in the coating and prepared by dynamic process regulation, thereby obtaining a scientific and reasonable gradient coating structure.
Drawings
Fig. 1 is a schematic structural view of a semiconductor graphite susceptor having a transition layer structure according to the present invention.
The reference signs are:
100. a graphite susceptor base body; 200. gradient TaC coating.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example one
As shown in fig. 1, the present invention provides a gradient TaC coating on a surface of a graphite-based plate, including a graphite-based plate substrate 100, wherein a gradient TaC coating 200 is disposed on a surface of the graphite-based plate substrate 100; the gradient TaC coating 200 comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of y ═ a · x linear equation or conforms to y ═ a · x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
Specifically, the thickness of the gradient TaC coating 200 is 50 μm; the roughness of the gradient TaC coating 200 is less than 2 μm.
The invention also provides a preparation method of the gradient TaC coating on the surface of the graphite base plate, which comprises the following steps:
and step S01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of the gradient TaC coating.
The method comprises the following steps of preparing a tantalum pentachloride coating, a methane gas, a hydrogen gas, an argon gas and a diluent gas, wherein the methane gas is used as a C source, the tantalum pentachloride gas is used as a Ta source, the hydrogen gas is used as a reactant, the argon gas is used as a diluent gas, the deposition time is 1h, and the deposition pressure is 500Pa, so that the gradient TaC coating is formed.
And step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas.
Specifically, the adjustment of the mole ratio of the introduced methane gas to the tantalum pentachloride gas comprises the following steps:
s021, when deposition is started, only introducing three gases of methane, hydrogen and argon, and maintaining the temperature at 900 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 1 mu m/h;
s022, after deposition is carried out for 1.5h, gradually adding gasified tantalum pentachloride gas, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating; wherein, tantalum pentachloride gas is 2t according to z2The function rule of (a) is gradually increased until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, and t represents time.
And step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 1.5h to ensure that the outer surface of the coating is a pure single-phase TaC coating.
Step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 900 ℃ to 1400 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react.
And step S05, keeping the temperature for 1h after the deposition is finished so as to slowly release the thermal stress in the gradient coating.
And S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
Example two
The embodiment provides a gradient TaC coating on the surface of a graphite base plate, which comprises a graphite base plate base body 100, wherein the surface of the graphite base plate base body 100 is provided with a gradient TaC coating 200; the gradient TaC coating 200 comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of y ═ a · x linear equation or conforms to y ═ a · x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
Specifically, the thickness of the gradient TaC coating 200 is 100 μm; the roughness of the gradient TaC coating 200 is 1.2 μm.
The invention also provides a preparation method of the gradient TaC coating on the surface of the graphite base plate, which comprises the following steps:
and step S01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of the gradient TaC coating.
The method comprises the following steps of preparing a tantalum pentachloride coating, a tantalum pentachloride coating and a TaC coating, wherein methane is used as a C source, hydrogen is used as a reactant, argon is used as a diluent gas, the deposition time is 10 hours, and the deposition pressure is 1000Pa to form the gradient TaC coating.
And step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas.
Specifically, the adjustment of the mole ratio of the introduced methane gas to the tantalum pentachloride gas comprises the following steps:
s021, when deposition is started, only introducing three gases of methane, hydrogen and argon, and maintaining the temperature at 1000 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 2 mu m/h;
s022, after deposition is carried out for 1 hour, gradually adding gasified tantalum pentachloride gas, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating; the method comprises the following steps of (1) gradually increasing the tantalum pentachloride gas according to a function rule of z-2 t until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, and t represents time.
And step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 1h to ensure that the outer surface of the coating is a pure single-phase TaC coating.
Step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 1000 ℃ to 1600 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react.
And step S05, preserving heat for 2h after the deposition is finished, so as to slowly release the thermal stress in the gradient coating.
And S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
EXAMPLE III
The embodiment provides a gradient TaC coating on the surface of a graphite base plate, which comprises a graphite base plate base body 100, wherein the surface of the graphite base plate base body 100 is provided with a gradient TaC coating 200; the gradient TaC coating 200 comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of y ═ a · x linear equation or conforms to y ═ a · x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
Specifically, the thickness of the gradient TaC coating 200 is 120 μm; the roughness of the gradient TaC coating 200 is 1.5 μm.
The invention also provides a preparation method of the gradient TaC coating on the surface of the graphite base plate, which comprises the following steps:
and step S01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of the gradient TaC coating.
The method comprises the following steps of preparing a tantalum pentachloride coating, a tantalum pentachloride coating and a TaC coating, wherein methane is used as a C source, tantalum pentachloride is used as a Ta source, hydrogen is used as a reactant, argon is used as a diluent gas, the deposition time is 15 hours, and the deposition pressure is 800Pa to form the gradient TaC coating.
And step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas.
Specifically, the adjustment of the mole ratio of the introduced methane gas to the tantalum pentachloride gas comprises the following steps:
s021, when the deposition is started, only introducing three gases of methane, hydrogen and argon, and maintaining the temperature at 1100 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 1.5 mu m/h;
s022, after deposition is carried out for 1.5h, gradually adding gasified tantalum pentachloride gas, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating; wherein the tantalum pentachloride gas is expressed by z ═ t2The function rule of (a) is gradually increased until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, and t represents time.
And step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 2h to ensure that the outer surface of the coating is a pure single-phase TaC coating.
Step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 900 ℃ to 1500 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react.
And step S05, preserving heat for 2h after the deposition is finished, so as to slowly release the thermal stress in the gradient coating.
And S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
Example four
The embodiment provides a gradient TaC coating on the surface of a graphite base plate, which comprises a graphite base plate base body 100, wherein the surface of the graphite base plate base body 100 is provided with a gradient TaC coating 200; the gradient TaC coating 200 comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the rule of y ═ a · x linear equation or conforms to y ═ a · x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
Specifically, the thickness of the gradient TaC coating 200 is 80 μm; the roughness of the gradient TaC coating 200 is 1.8 μm.
The invention also provides a preparation method of the gradient TaC coating on the surface of the graphite base plate, which comprises the following steps:
and step S01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of the gradient TaC coating.
The method comprises the following steps of preparing a tantalum pentachloride coating, a tantalum pentachloride coating and a gradient TaC coating, wherein methane is used as a C source, tantalum pentachloride is used as a Ta source, hydrogen is used as a reactant, argon is used as a diluent gas, the deposition time is 20 hours, and the deposition pressure is 5000 Pa.
And step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas.
Specifically, the adjustment of the mole ratio of the introduced methane gas to the tantalum pentachloride gas comprises the following steps:
s021, when the deposition is started, only introducing three gases of methane, hydrogen and argon, and maintaining the temperature at 1200 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 1.2 mu m/h;
s022, after deposition is carried out for 1.5h, gradually adding gasified tantalum pentachloride gas, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating; the method comprises the following steps of (1) gradually increasing the tantalum pentachloride gas according to a function rule that z is 3t until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, and t represents time.
And step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 1.8h to ensure that the outer surface of the coating is a pure single-phase TaC coating.
Step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 1000 ℃ to 1600 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react.
And step S05, preserving heat for 2h after the deposition is finished, so as to slowly release the thermal stress in the gradient coating.
And S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
In conclusion, the invention realizes the gradient crossing of the content of the TaC component in the coating from 0 to 100 percent by utilizing the CVD dynamic codeposition technology, and the thermal matching difference between the coating and the matrix can be effectively improved as the inner layer of the coating is a pyrolytic carbon layer which has a similar thermal expansion coefficient with the graphite matrix and is gradually transited; meanwhile, the soft C component structure and the nanometer pores in the coating can effectively relieve the thermal expansion of the TaC crystal so as to reduce the stress peak value in the coating.
Finally, the above description is only for the preferred embodiment of the present invention and should not be taken as limiting the invention, and any modifications, equivalents, improvements and the like which are within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (7)

1. A gradient TaC coating on the surface of a graphite base plate comprises a graphite base plate matrix and is characterized in that the surface of the graphite base plate matrix is provided with the gradient TaC coating; the gradient TaC coating comprises a TaC component and a C component, the content of the TaC component is gradually increased from 0% to 100% from inside to outside, and the gradient distribution conforms to the linear y = a · xThe equation law is either satisfied with y = a · x2And the distribution is in a parabolic regular distribution, wherein y is the content percentage of the TaC component, a is a positive number greater than 0, x is the thickness from the interface of the gradient TaC coating and the graphite matrix, and x is less than 120 mu m, and the content of impurities except the TaC and the C component in the gradient TaC coating is less than 5 ppm.
2. The graphite susceptor surface gradient TaC coating of claim 1, wherein the gradient TaC coating has a thickness of 50-120 μ ι η.
3. The graphite susceptor surface gradient TaC coating of claim 1, wherein the roughness of the gradient TaC coating is less than 2 μ ι η.
4. A method for preparing a surface gradient TaC coating on a graphite-based susceptor according to any one of claims 1 to 3, comprising the following steps:
s01, purifying the graphite base plate matrix, wherein the impurity content in the graphite base material is less than 5ppm, and depositing pyrolytic carbon and a TaC coating on the surface of the graphite base plate matrix by adopting a chemical vapor dynamic codeposition process to form a gradient structure of a gradient TaC coating;
step S02, in the deposition process, adjusting the content ratio of the C component and the TaC component in the coating by adjusting the molar ratio of the introduced methane and the tantalum pentachloride gas;
step S03, when the mole of the methane and the tantalum pentachloride gas in the step S02 reaches 1:1, continuing to deposit for 1-2h to ensure that the outer surface of the coating is a pure single-phase TaC coating;
step S04, the pressure is kept stable in the whole deposition process, and the temperature of the deposition chamber is gradually increased from 900-1200 ℃ to 1400-1600 ℃ along with the gradual addition of the tantalum pentachloride gas, so as to ensure that the methane and the tantalum pentachloride gas can fully react;
s05, preserving heat for 1-2 hours after deposition is finished so as to slowly release the thermal stress in the gradient coating;
and S06, cooling the reaction chamber to room temperature to obtain the gradient TaC coating on the surface of the graphite base plate.
5. The method for preparing the gradient TaC coating on the surface of the graphite susceptor as claimed in claim 4, wherein in the step S01, methane gas is used as a C source, tantalum pentachloride gas is used as a Ta source, hydrogen gas is used as a reactant, argon gas is used as a diluent gas, the deposition time is 1-20 h, and the deposition pressure is 500-5000Pa to form the gradient TaC coating.
6. The method for preparing the gradient TaC coating on the surface of the graphite-based disk as claimed in claim 4, wherein the step S02, adjusting the mole ratio of the introduced methane and tantalum pentachloride gases comprises the following steps:
s021, only introducing three gases of methane, hydrogen and argon when the deposition is started, and maintaining the temperature at 900-1200 ℃ so as to maintain the deposition rate of the initial pyrolytic carbon at 1-2 mu m/h;
s022, gradually adding gasified tantalum pentachloride gas after deposition is carried out for 1-2h, and gradually increasing the content of the tantalum pentachloride gas according to a preset function rule until the molar ratio of methane to the tantalum pentachloride gas is 1:1 so as to adjust the content ratio of the C component and the TaC component in the coating.
7. The method for preparing the gradient TaC coating on the surface of the graphite-based disk as claimed in claim 6, wherein in step S022, the tantalum pentachloride gas is mixed according to z = b-t or z = b-t2The function rule of (a) is gradually increased until the molar ratio of methane to the tantalum pentachloride gas is 1:1, wherein z represents the introduction amount of the tantalum pentachloride gas, b is a positive number greater than 0, and t represents time.
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