CN112363313B - 一种微小型空间反射结构的制备装置、制备方法及产品 - Google Patents
一种微小型空间反射结构的制备装置、制备方法及产品 Download PDFInfo
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- CN112363313B CN112363313B CN202011281818.7A CN202011281818A CN112363313B CN 112363313 B CN112363313 B CN 112363313B CN 202011281818 A CN202011281818 A CN 202011281818A CN 112363313 B CN112363313 B CN 112363313B
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- photosensitive material
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
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CN202011281818.7A CN112363313B (zh) | 2020-11-16 | 2020-11-16 | 一种微小型空间反射结构的制备装置、制备方法及产品 |
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CN202011281818.7A CN112363313B (zh) | 2020-11-16 | 2020-11-16 | 一种微小型空间反射结构的制备装置、制备方法及产品 |
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CN112363313A CN112363313A (zh) | 2021-02-12 |
CN112363313B true CN112363313B (zh) | 2022-06-21 |
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Family Cites Families (2)
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US10852528B2 (en) * | 2016-12-20 | 2020-12-01 | Ev Group E. Thallner Gmbh | Method and device for exposure of photosensitive layer |
CN111717886B (zh) * | 2020-06-30 | 2023-08-25 | 香港中文大学(深圳) | 微结构制备装置及方法 |
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Inventor after: Gui Zhenzhen Inventor after: Gong Xiaojing Inventor after: Chen Zhenlin Inventor after: Shu Chengyou Inventor after: Zhang Jianhui Inventor after: Wang Xiatian Inventor after: Shen Teng Inventor after: Xie Zhihua Inventor before: Gui Zhenzhen Inventor before: Gong Xiaojing Inventor before: Chen Zhenlin Inventor before: Shu Chengyou Inventor before: Zhang Jianhui Inventor before: Wang Xiatian Inventor before: Shen Teng Inventor before: Xie Zhihua |
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