CN112323037A - Workpiece rotating device for film coating vacuum chamber - Google Patents
Workpiece rotating device for film coating vacuum chamber Download PDFInfo
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- CN112323037A CN112323037A CN202011240822.9A CN202011240822A CN112323037A CN 112323037 A CN112323037 A CN 112323037A CN 202011240822 A CN202011240822 A CN 202011240822A CN 112323037 A CN112323037 A CN 112323037A
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- 239000007888 film coating Substances 0.000 title claims abstract description 9
- 238000009501 film coating Methods 0.000 title claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 abstract description 11
- 230000009286 beneficial effect Effects 0.000 abstract description 4
- 239000000428 dust Substances 0.000 abstract description 4
- 238000005299 abrasion Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011553 magnetic fluid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a film coating vacuum chamber workpiece rotating device, which comprises: a fixed part provided with a first magnetic body; a rotating part which is rotatably provided with a central axis as a rotation center; a loading mechanism provided on the rotating portion, the loading mechanism being rotatably provided with a second magnetic body around a central axis thereof as a rotation center; the first magnetic body and the second magnetic body are arranged at an interval and oppositely. The invention realizes the required rotation function through the action of magnetic force and can be suitable for a very small vacuum chamber system. And the magnetic force transmission has no abrasion and less dust, and is beneficial to obtaining good finish on the surface of the workpiece. And the magnetic force transmission is non-contact power transmission and is noiseless. The mounting structure of the invention is simple.
Description
Technical Field
The invention relates to a workpiece rotating device of a film coating vacuum chamber.
Background
When the film of a plane element is plated, in order to ensure the uniformity of the film plating of the working surface of a workpiece, the workpiece is arranged on a rotating umbrella stand, but the relative position between the workpiece and the umbrella stand is fixed. When a cylindrical or hemispherical workpiece needs to be plated, if the workpiece does not rotate, the film layer on the working surface cannot be uniformly and completely covered, so that the workpiece needs to rotate while revolving. However, it is not easy to rotate the workpiece in the vacuum chamber, firstly, the workpiece is mounted on a rotating umbrella stand, and secondly, the temperature in the vacuum chamber is as high as about 300 ℃ because the vacuum chamber is a vacuum environment and a high-temperature environment. Therefore, the rotating device needs to be capable of simultaneously performing revolution and rotation of the workpiece, and to be capable of withstanding a high temperature of about 300 ℃ while preventing vacuum leakage.
The conventional rotating device is realized by using a gear transmission mode. But the method is suitable for large vacuum chamber cavities and also suitable for the situation of large transmission power. And when the structure works, the long-time friction between the gears generates more dust, which is not beneficial to obtaining good smoothness of the coating working surface. For the occasions where the workpiece is very small and the requirement on the finish degree is high, the traditional workpiece rotating device is not suitable.
Disclosure of Invention
The invention provides a workpiece rotating device of a film coating vacuum chamber for solving the technical problems.
In order to achieve the above purpose, the invention is realized by the following technical scheme:
a coating vacuum chamber workpiece rotating apparatus comprising:
a fixed part provided with a first magnetic body;
a rotating part which is rotatably provided with a central axis as a rotation center;
a loading mechanism provided on the rotating portion, the loading mechanism being rotatably provided with a second magnetic body around a central axis thereof as a rotation center;
the first magnetic body and the second magnetic body are arranged at an interval and oppositely.
According to an embodiment of the present invention, the first magnetic body includes a plurality of first magnetic blocks, each of the first magnetic blocks is uniformly distributed along a circumferential direction of a circumference, the circumference is a first circumference, the first circumference is disposed on the fixing portion, a central axis of the first circumference is disposed to coincide with a central axis of the fixing portion, and magnetic poles of adjacent first magnetic blocks are disposed to be opposite to each other.
According to an embodiment of the present invention, the second magnetic body includes a plurality of second magnetic blocks, each of the second magnetic blocks is uniformly distributed along a circumferential direction of a circle, the circle is a second circle, the second circle is disposed on the loading mechanism, a central axis of the second circle is disposed to coincide with a central axis of the loading mechanism, and magnetic poles of adjacent second magnetic blocks are disposed to be opposite to each other.
According to one embodiment of the present invention, the second circumference is rotatably provided around a central axis of the first circumference, and the second circumference is rotatably provided.
According to an embodiment of the present invention, when the second circumference rotates around the central axis of the first circumference and rotates, a distance between a second magnetic block on the second circumference and a first magnetic block on the first circumference is the smallest, and two opposite magnetic poles of the two first magnetic blocks and the two second magnetic blocks are the same.
According to one embodiment of the invention, the rotating part comprises: the loading device comprises a first support and a plurality of first support pieces, wherein the first support can be rotationally arranged by taking a central shaft as a rotation center, one end of each first support piece is connected with the first support, and the other end of each first support piece is provided with a loading mechanism.
According to an embodiment of the invention, the first support is arranged obliquely to the central axis of the first holder.
According to one embodiment of the invention, the loading mechanism comprises: the loading mechanism comprises a first rotating shaft and a bearing piece, wherein the first rotating shaft is rotatably arranged on the first supporting piece, the first rotating shaft is provided with two ends, namely a first end and a second end, the second end of the first rotating shaft is provided with the bearing piece, a second circumference is arranged along the circumferential direction of the first end of the first rotating shaft, and a central shaft of the second circumference and a central shaft of the first rotating shaft are arranged in a manner of being overlapped with a rotating central shaft of the loading mechanism.
According to one embodiment of the invention, the first end of the first rotating shaft is disposed proximate to the first circumference and the second end of the first rotating shaft is disposed distal to the first circumference.
According to an embodiment of the present invention, the fixing portion includes a second bracket and a fixing ring, a central axis of the second bracket is disposed to coincide with a central axis of the first bracket, the fixing ring is disposed on the second bracket, the first circumference is disposed along a circumferential direction of the fixing ring, and a central axis of the first circumference is disposed to coincide with a central axis of the second bracket.
The invention realizes the required rotation function through the action of magnetic force, and can be suitable for a vacuum chamber system with a very small caliber, such as 800 mm. And the magnetic force transmission has no abrasion and less dust, and is beneficial to obtaining good finish on the surface of the workpiece. And the magnetic force transmission is non-contact power transmission and is noiseless. The mounting structure of the invention is simple.
Drawings
FIG. 1 is a schematic diagram of a rotary device for a work piece in a vacuum chamber for coating film in accordance with example 1;
FIG. 2 is a schematic view of a first circumference and a second circumference of embodiment 1;
FIG. 3 is a schematic view showing the interaction of a plurality of first magnetic blocks and second magnetic blocks in example 1;
FIG. 4 is a structural view of a workpiece rotating apparatus of a coating vacuum chamber in example 2;
fig. 5 is a schematic view of the first and second circumferences of embodiment 2.
Detailed Description
The invention is described in detail below with reference to the attached drawing figures:
example 1
As shown in fig. 1, the film coating vacuum chamber workpiece rotating device of the present embodiment includes: a fixed part provided with a first magnetic body; a rotating part which is rotatably provided with a central axis as a rotation center; a loading mechanism provided on the rotating portion, the loading mechanism being rotatably provided with a second magnetic body around a central axis thereof as a rotation center; the first magnetic body and the second magnetic body are arranged at an interval and oppositely.
The first magnetic body comprises a plurality of first magnetic blocks 1, the magnetic blocks are uniformly distributed along the circumferential direction of a circle, the circle is a first circle 14, the first circle 14 is arranged on the fixing part, and the central axis of the first circle 14 is overlapped with the central axis of the fixing part. The magnetic poles of the adjacent first magnetic blocks 1 are arranged opposite to each other.
The second magnetic body comprises a plurality of second magnetic blocks 2, the magnetic blocks are uniformly distributed along the circumferential direction of a circle, the circle is a second circle 15, the second circle 15 is arranged on the loading mechanism, and the central axis of the second circle 15 is overlapped with the central axis of the loading mechanism. The magnetic poles of the adjacent second magnetic blocks 2 are arranged opposite to each other.
The first magnetic block 1 and the second magnetic block 2 are both magnets, specifically high temperature resistant magnets capable of resisting the high temperature of the vacuum chamber, and can be selected according to the condition of the vacuum chamber.
The magnetic poles are arranged oppositely to each other means that, for example, in the first magnetic blocks 1 along the circumferential direction of the first circumference 14, one of the first magnetic blocks 1 is the central axis with the N pole facing the first circumference 14 and the central axis with the S pole facing the first circumference 14, and the first magnetic blocks 1 on two adjacent sides of the first magnetic block 1 are the central axes with the N pole facing the first circumference 14 and the S pole facing the first circumference 14; or one first magnetic block 1 is arranged with the N pole upward and the S pole downward, the first magnetic blocks 1 on two adjacent sides of the first magnetic block 1 are arranged with the N pole downward and the S pole upward. In the circumferential direction of the second circumference 15, one of the second magnetic blocks 2 is the central axis of the second circumference 15 with the N-pole facing the central axis of the second circumference 15 and the S-pole facing the central axis of the second circumference 15, so that the second magnetic blocks 2 on two adjacent sides of the second magnetic block 2 are the central axes of the second circumference 15 with the N-pole facing the central axis of the second circumference 15 and the S-pole facing the central axis of the second circumference 15; or one second magnetic block 2 is arranged with the N pole upward and the S pole downward, the second magnetic blocks 2 on two adjacent sides of the second magnetic block 2 are arranged with the N pole downward and the S pole upward.
The second circumference 15 is rotatably arranged around the central axis of the first circumference 14, the second circumference 15 is rotatably arranged, when the second circumference 15 rotates around the central axis of the first circumference 14 and rotates, the distance between one second magnetic block 2 on the second circumference 15 and one first magnetic block 1 on the first circumference 14 is the minimum, and two opposite magnetic poles of the two first magnetic blocks 1 and the two second magnetic blocks 2 are the same. Thus, when the second circumference 15 rotates around the central axis of the first circumference 14, one second magnetic block 2 gives a repulsive force to the nearest first magnetic block 1 and gives attractive forces to the front and rear first magnetic blocks 1, and when the second circumference 15 rotates around the central axis of the first circumference 14, the front first magnetic block 1 is closer in distance and has a larger attractive force than the rear first magnetic block 1, and thus the second circumference 15 rotates. The second circumference 15 rotates in the opposite direction to the revolution direction of the second circumference 15 around the first circumference 14. Fig. 2 shows an example of a first circumference 14 and a second circumference 15.
As shown in fig. 1, a mechanical structure for realizing that the second circumference 15 can rotate around the central axis of the first circumference 14 and the second circumference 15 can rotate is specifically that the rotating part comprises: the first support 3 and a plurality of first support 4, first support 3 can be set up as the centre of rotation rotatoryly with its center pin, and first support 4 one end links to each other with first support 3, and the other end sets up loading mechanism. The first support 4 is disposed obliquely to the central axis of the first bracket 3.
The loading mechanism comprises: a first rotating shaft 5 and a bearing piece 6, wherein the first rotating shaft 5 is rotatably arranged on the first supporting piece 4, and a bearing is arranged between the first rotating shaft 5 and the first supporting piece 4. The first rotating shaft 5 has two ends, i.e., a first end and a second end, the bearing member 6 is disposed at the second end of the first rotating shaft 5, the second circumference 15 is disposed along the circumferential direction of the first end of the first rotating shaft 5, and the central axis of the second circumference 15 and the central axis of the first rotating shaft 5 are disposed to coincide with the rotation central axis of the loading mechanism and are denoted by a central axis Q. The carrier 6 is used for arranging a workpiece 8 to be coated. The first end of the first rotating shaft 5 is provided with a cylindrical member 7, a second circumference 15 is provided along the circumferential direction of the cylindrical member 7, and the center axis of the second circumference 15 is provided to coincide with the center axis of the cylindrical member 7.
The fixed part include second support 9 and solid fixed ring 10, the center pin of second support 9 sets up with the center pin coincidence of first support 3, gu fixed ring 10 sets up on second support 9, first circumference 14 sets up along solid fixed ring 10's circumferencial direction, the center pin of first circumference 14 sets up with the center pin coincidence of second support 9. The central axis of the second bracket 9 is arranged to coincide with the central axis of the above-indicated fixing portion. In the present embodiment, the center axis of the fixing ring 10 is disposed to overlap the center axis of the second holder 9, and therefore, the center axis of the first circumference 14 is also disposed to overlap the center axis of the fixing ring 10 and is denoted by the center axis P.
The first end of the first rotating shaft 5 is disposed near the first circumference 14, and the second end of the first rotating shaft 5 is disposed far from the first circumference 14. That is, the first supporter 4 is disposed to be inclined toward the central axis of the first supporter 3, the first rotating shaft 5 is disposed to be inclined on the first supporter 4, the first end of the first rotating shaft 5 is close to the fixing ring 10, and the second end of the first rotating shaft 5 and the carrier 6 are far from the fixing ring 10. The fixing ring 10 and the first rotating shaft 5 are made of nonmagnetic materials.
The second bracket 9 is fixedly arranged by means of a fixing base 11. The first support 3 is rotated by a hollow rotating shaft 12. The hollow rotating shaft 12 is hollow, and the fixing seat 11 is arranged in the hollow rotating shaft 12 in a penetrating mode. The hollow rotating shaft 12 rotates to drive the first bracket 3 to rotate, and the fixed seat 11 is static. The space between the fixed seat 11 and the hollow rotating shaft 12 is sealed by magnetic fluid, and the reference numeral 13 indicates a vacuum chamber cavity.
The first support 3 rotates around its central axis as a rotation center, and drives the first support 4 to rotate around the central axis of the first support 3, and the first support 4 rotates to drive the loading mechanism to rotate around the central axis of the first support 3. The fixing ring 10 is fixed on the second bracket 9.
As shown in fig. 3, in the case of clockwise rotation of the loading mechanism around the central axis of the first bracket 3, the column member 7 rotates clockwise around the fixing ring 10, so that the second circumference 15 rotates clockwise around the central axis of the first circumference 14, with the arrow a as the rotation direction, the second magnetic block 2 on the second circumference 15 passes through the first magnetic block 1 on the first circumference 14, there will be a minimum distance between the second magnetic block 201 on the second circumference 15 and the first magnetic block 102 on the first circumference 14, and the two opposite magnetic poles of the two first magnetic blocks 102 and the second magnetic block 201 are the same, i.e. the two first magnetic blocks 102 and the second magnetic block 201 generate an opposing force. Since the magnetic poles of the first two magnetic blocks 103 and the first three magnetic blocks 101 are opposite to the magnetic poles of the adjacent first one magnetic block 102 on the first circumference 14, the first two magnetic block 103 at the front has a certain attraction force to the second magnetic block 201, and due to the forward direction, the attraction force is greater than that of the first three magnetic block 101 at the rear to the second magnetic block 201. Therefore, this gives a rotational moment to the rotating second circumference 15, so that the second circumference 15 rotates, and the rotation of the second circumference 15 is counterclockwise, taking the arrow B as the rotational direction. The second circumference 15 rotates, because the second circumference 15 rotates around the central axis of the first circumference 14 at the same time, when the second circumference 15 rotates to the next second magnetic block 202, the distance between the second magnetic block 202 and the next first second magnetic block 103 on the first circumference 14 is the smallest, two opposite magnetic poles of the two first second magnetic blocks 103 and the second magnetic block 202 are the same, that is, the two first second magnetic blocks 103 and the second magnetic block 202 generate a repulsive force, the first fourth magnetic block 104 in the front has a certain attractive force to the second magnetic block 202, which gives a rotation moment to the rotating second circumference 15, and the second circumference 15 maintains the rotation.
In the above-mentioned manner, since the magnetic poles of the adjacent first magnetic blocks 1 on the first circumference 14 are oppositely arranged, and the magnetic poles of the adjacent second magnetic blocks 2 on the second circumference 15 are oppositely arranged, when the second circumference 15 rotates and simultaneously rotates around the central axis of the first circumference 14, there is always a minimum distance between the pair of second magnetic blocks 2 and the first magnetic block 1, the two opposite magnetic poles of the two second magnetic blocks 2 and the first magnetic block 1 are the same, i.e. the two second magnetic blocks 2 and the first magnetic block 1 generate a repulsive force, and the front first magnetic block 1 has a certain attraction force to the second magnetic block 2, so that the second circumference 15 keeps rotating. Then, the first rotating shaft 5 rotates in the first supporting member 4 to drive the bearing member 6 to rotate, so that the bearing member 6 rotates around the central axis of the first bracket 3, and the workpiece 8 to be coated can be sufficiently coated.
Example 2
As shown in fig. 4 and 5, the mechanical structure of the present embodiment is slightly different from that of embodiment 1. The second circumference 15 is located below the first circumference 14, i.e., the first end of the first rotating shaft 5 is disposed below the fixing ring 10. The second magnetic block 2 is not directly opposite to the first magnetic block 1, but can still function as a magnetic force. The rotation process of this example is the same as example 1.
The invention realizes the required rotation function through the action of magnetic force, and can be suitable for a vacuum chamber system with a small cavity, such as a cavity with the diameter of 800 mm. And the magnetic force transmission has no abrasion and less dust, and is beneficial to obtaining good finish on the surface of the workpiece. And the magnetic force transmission is non-contact power transmission and is noiseless. The mounting structure of the invention is simple.
The embodiments of the present invention are merely illustrative, and not restrictive, of the scope of the claims, and other substantially equivalent alternatives may occur to those skilled in the art and are within the scope of the present invention.
Claims (10)
1. A kind of coating film vacuum chamber work piece swiveling mechanism, characterized by that, comprising:
a fixed part provided with a first magnetic body;
a rotating part which is rotatably provided with a central axis as a rotation center;
a loading mechanism provided on the rotating portion, the loading mechanism being rotatably provided with a second magnetic body around a central axis thereof as a rotation center;
the first magnetic body and the second magnetic body are arranged at an interval and oppositely.
2. The film coating vacuum chamber workpiece rotating device according to claim 1, wherein the first magnetic body comprises a plurality of first magnetic blocks, each of the first magnetic blocks is uniformly distributed along a circumferential direction of a circle, the circle is a first circle, the first circle is disposed on the fixed portion, a central axis of the first circle is disposed to coincide with a central axis of the fixed portion, and magnetic poles of adjacent first magnetic blocks are disposed to be opposite to each other.
3. The apparatus of claim 2, wherein the second magnetic body comprises a plurality of second magnetic blocks, each of the second magnetic blocks is uniformly distributed along a circumference of a circle, the circumference is a second circumference, the second circumference is disposed on the loading mechanism, a central axis of the second circumference is disposed to coincide with a central axis of the loading mechanism, and magnetic poles of adjacent second magnetic blocks are disposed to be opposite to each other.
4. The film coating vacuum chamber workpiece rotating device as claimed in claim 3, wherein the second circumference is rotatably provided around a central axis of the first circumference, and the second circumference is rotatably provided.
5. The film coating vacuum chamber workpiece rotating device as claimed in claim 4, wherein when the second circumference rotates around the central axis of the first circumference and rotates on its own axis, a second magnetic block on the second circumference has the smallest distance with a first magnetic block on the first circumference, and the two opposite magnetic poles of the two first magnetic blocks and the two second magnetic blocks are the same.
6. The coating vacuum chamber workpiece rotating device as claimed in claim 4, wherein the rotating part comprises: the loading device comprises a first support and a plurality of first support pieces, wherein the first support can be rotationally arranged by taking a central shaft as a rotation center, one end of each first support piece is connected with the first support, and the other end of each first support piece is provided with a loading mechanism.
7. The apparatus as claimed in claim 6, wherein the first support member is disposed obliquely to a central axis of the first support member.
8. The coating vacuum chamber workpiece rotating device according to claim 6, wherein the loading mechanism comprises: the loading mechanism comprises a first rotating shaft and a bearing piece, wherein the first rotating shaft is rotatably arranged on the first supporting piece, the first rotating shaft is provided with two ends, namely a first end and a second end, the second end of the first rotating shaft is provided with the bearing piece, a second circumference is arranged along the circumferential direction of the first end of the first rotating shaft, and a central shaft of the second circumference and a central shaft of the first rotating shaft are arranged in a manner of being overlapped with a rotating central shaft of the loading mechanism.
9. The apparatus of claim 8, wherein the first end of the first axis of rotation is disposed proximate to the first circumference and the second end of the first axis of rotation is disposed distal to the first circumference.
10. The vacuum chamber workpiece rotating device for coating film as defined in claim 4, wherein the fixing portion comprises a second support and a fixing ring, the central axis of the second support is disposed to coincide with the central axis of the first support, the fixing ring is disposed on the second support, the first circumference is disposed along the circumferential direction of the fixing ring, and the central axis of the first circumference is disposed to coincide with the central axis of the second support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011240822.9A CN112323037A (en) | 2020-11-09 | 2020-11-09 | Workpiece rotating device for film coating vacuum chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011240822.9A CN112323037A (en) | 2020-11-09 | 2020-11-09 | Workpiece rotating device for film coating vacuum chamber |
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| Publication Number | Publication Date |
|---|---|
| CN112323037A true CN112323037A (en) | 2021-02-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011240822.9A Pending CN112323037A (en) | 2020-11-09 | 2020-11-09 | Workpiece rotating device for film coating vacuum chamber |
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| CN (1) | CN112323037A (en) |
Cited By (1)
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| CN115323339A (en) * | 2022-08-01 | 2022-11-11 | 厦门金鹭特种合金有限公司 | Frock and physical vapor deposition equipment |
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|---|---|---|---|---|
| CN115323339A (en) * | 2022-08-01 | 2022-11-11 | 厦门金鹭特种合金有限公司 | Frock and physical vapor deposition equipment |
| CN115323339B (en) * | 2022-08-01 | 2023-12-05 | 厦门金鹭特种合金有限公司 | Frock and physical vapor deposition equipment |
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