CN112309814A - Plasma equipment, cavity of plasma equipment and central ring structure of cavity - Google Patents
Plasma equipment, cavity of plasma equipment and central ring structure of cavity Download PDFInfo
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- CN112309814A CN112309814A CN201910680168.4A CN201910680168A CN112309814A CN 112309814 A CN112309814 A CN 112309814A CN 201910680168 A CN201910680168 A CN 201910680168A CN 112309814 A CN112309814 A CN 112309814A
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- plasma
- cavity
- side wall
- chamber
- baffle
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
Abstract
The invention discloses plasma equipment, a cavity of the plasma equipment and a central ring structure of the cavity, wherein the central ring structure comprises a circular ring body and a baffle plate; splicing seams distributed along a circle of the inner side wall are formed in the inner side wall of the circular ring body; the baffle is attached to the inner side wall of the circular ring body and covers the splicing seam. According to the invention, the baffle made of aviation aluminum is arranged on the central ring structure in the cavity of the plasma equipment to shield the splicing seam of the inner side wall of the circular ring body; when the plasma nozzle sprays plasma, the baffle is adopted to isolate the damage (such as bombardment and corrosion) of the plasma to the sealing ring, so that on the premise of not influencing the cavity technological parameters, the service life of the sealing ring is effectively prolonged, the maintenance cost is reduced, the equipment maintenance frequency is reduced, the utilization rate of the equipment is improved, and the purposes of cost reduction and efficiency improvement are achieved.
Description
Technical Field
The invention relates to the technical field of semiconductor equipment, in particular to plasma equipment, a cavity of the plasma equipment and a central ring structure of the cavity.
Background
HDP (high density plasma) equipment is the mainstream equipment in the integrated circuit manufacturing process and is mainly used for depositing oxide layers such as shallow trench isolation layers, metal layer front and interlayer dielectric layers, and the like.
When the HDP process is carried out, the plasma density in the cavity is high, the requirement on the vacuum degree of the cavity is high, and therefore the requirement on the material of each sealing ring between the cavities is strict. The perfluor sealing ring has better plasma resistance and corrosion resistance, so that the maintenance period of the sealing ring is prolonged by adopting the perfluor sealing ring generally at present. However, the mode of adopting the perfluoro-material sealing ring still has the situation that the sealing ring needs to be frequently replaced, 2-3 perfluoro-sealing ring products need to be replaced once after 3 times of maintenance, and one perfluoro-sealing ring needs about 6 thousand yuan of renminbi, so the defects of short sealing ring maintenance period, high maintenance cost and the like still exist.
Disclosure of Invention
The invention aims to overcome the defects of short maintenance period, high maintenance cost and the like of a sealing ring in the prior art, and provides plasma equipment, a cavity of the plasma equipment and a central ring structure of the cavity.
The invention solves the technical problems through the following technical scheme:
the invention provides a central ring structure in a cavity of plasma equipment, which comprises a circular ring body and a baffle plate, wherein the circular ring body is provided with a circular ring body;
splicing seams distributed along a circle of the inner side wall are formed in the inner side wall of the circular ring body;
the baffle is attached to the inner side wall of the circular ring body and covers the splicing seam.
Preferably, the ring body comprises a sidewall structure and a platform structure;
the side wall structure and the platform structure are spliced and fixed;
after the side wall structure and the platform structure are spliced, the splicing seam is formed between the side wall structure and the platform structure.
Preferably, a plurality of plasma nozzles are distributed on the side wall structure;
the baffle is provided with a plurality of clamping interfaces;
when the baffle is attached to the inner side wall of the circular ring body, each clamping interface is clamped on one plasma nozzle.
Preferably, a first groove is formed in the platform structure close to the side wall structure;
a boss is arranged at one end of the baffle, which is far away from the clamping interface;
when the baffle is attached to the inner side wall of the circular ring body, the boss is clamped in the first groove.
Preferably, the thickness of the boss is equal to the depth of the first groove; and/or the presence of a gas in the gas,
the baffle comprises an aviation aluminum material; and/or the presence of a gas in the gas,
the plasma apparatus includes a high-density plasma apparatus.
Preferably, a plurality of said plasma nozzles are arranged equidistantly on said sidewall structure.
The invention also provides a cavity of the plasma equipment, which is characterized in that the cavity comprises the central ring structure in the cavity of the plasma equipment.
Preferably, the cavity of the plasma equipment further comprises a cavity bottom structure and a cavity upper cover structure;
the central ring structure is fixedly arranged on the bottom structure of the cavity;
when the cavity upper cover structure is covered on the central ring structure, a complete cavity structure is formed between the cavity upper cover structure and the cavity bottom structure.
Preferably, the cavity further comprises a plurality of perfluoro sealing rings;
a plurality of second grooves are formed in the bottom structure of the cavity close to the inner side wall of the ring body;
each perfluorinated sealing ring is embedded in the second groove and is arranged in the second groove through a platform structure sealing cover of the circular ring body;
the ring body comprises a plasma nozzle, and when the plasma nozzle sprays plasma, the baffle is used for obstructing the bombardment of the plasma on the perfluoro sealing ring.
The invention also provides plasma equipment which comprises at least one cavity of the plasma equipment.
The positive progress effects of the invention are as follows:
according to the invention, the baffle made of aviation aluminum is arranged on the central ring structure in the cavity of the plasma equipment to shield the splicing seam of the inner side wall of the circular ring body; when the plasma nozzle sprays plasma, the baffle is adopted to isolate the damage (such as bombardment and corrosion) of the plasma to the sealing ring, so that on the premise of not influencing the cavity technological parameters, the service life of the sealing ring is effectively prolonged, the maintenance cost is reduced, the equipment maintenance frequency is reduced, the utilization rate of the equipment is improved, and the purposes of cost reduction and efficiency improvement are achieved.
Drawings
Fig. 1 is a schematic structural view of a ring body in a center ring structure in a cavity in a plasma apparatus according to embodiment 1 of the present invention.
Fig. 2 is a schematic structural view of a baffle plate in a center ring structure in a chamber in the plasma apparatus according to embodiment 1 of the present invention.
Fig. 3 is a partially enlarged structural diagram of a splice seam in a central ring structure in a cavity in a plasma apparatus according to embodiment 1 of the present invention.
Fig. 4 is a schematic structural view of a center ring structure in a cavity in a plasma apparatus according to embodiment 1 of the present invention.
Fig. 5 is a first structural diagram of a center ring structure in a cavity in a plasma apparatus according to embodiment 2 of the present invention.
Fig. 6 is a schematic structural view of a baffle plate in a center ring structure in a chamber in a plasma apparatus according to embodiment 2 of the present invention.
Fig. 7 is a second structural diagram of a center ring structure in a cavity in the plasma apparatus according to embodiment 2 of the present invention.
Fig. 8 is a schematic structural view of a chamber in a plasma apparatus according to embodiment 3 of the present invention.
Fig. 9 is a schematic structural diagram of a groove for arranging a seal ring in a cavity in plasma equipment according to embodiment 3 of the present invention.
Detailed Description
The invention is further illustrated by the following examples, which are not intended to limit the scope of the invention.
Example 1
The central ring structure in the cavity of the plasma equipment of the embodiment comprises a circular ring body 1 and a baffle plate 2.
As shown in fig. 1, is a circular ring body 1. Shown in fig. 2, is a baffle 2.
As shown in FIG. 3, the inner side wall of the ring body 1 has a splicing seam A distributed along the inner side wall.
The baffle 2 is a structure which can be flexibly installed and taken out.
When the baffle 2 is installed, as shown in fig. 4, the baffle 2 is attached to the inner side wall of the circular ring body 1 and covers the splicing seam a.
Wherein, the baffle is made of aluminum material; preferably, the aluminum alloy is made of aviation aluminum.
In the embodiment, the baffle made of aviation aluminum is arranged on the central ring structure in the cavity of the plasma equipment to shield the splicing seam of the inner side wall of the circular ring body; when plasma is sprayed in the plasma equipment, the baffle is adopted to isolate the damage (such as bombardment and corrosion) of the plasma to the sealing ring, so that on the premise of not influencing the cavity technological parameters, the service life of the sealing ring is effectively prolonged, the maintenance cost is reduced, the equipment maintenance frequency is reduced, the utilization rate of the equipment is improved, and the purposes of cost reduction and efficiency improvement are achieved.
Example 2
The structure of the central ring in the cavity of the plasma device in this embodiment is a further improvement of embodiment 1, specifically:
as shown in fig. 5, the ring body 1 includes a sidewall structure 3 and a platform structure 4;
the side wall structure 3 and the platform structure 4 are spliced and fixed;
after the side wall structure 3 and the platform structure 4 are spliced, a splicing seam a is formed between the side wall structure 3 and the platform structure 4.
A plurality of plasma nozzles 5 are distributed on the side wall structure 3;
preferably, a plurality of plasma nozzles are arranged equidistantly on the sidewall structure for spraying the plasma.
As shown in fig. 6, the baffle 2 is provided with a plurality of clip interfaces 6.
When baffle 2 and ring body 1 joint, as shown in fig. 4, baffle 2 pastes the inside wall of establishing at ring body 1, and every joint interface joint is on a plasma nozzle.
In addition, as shown in fig. 7, a first groove 7 is formed in the platform structure 4 near the sidewall structure 3;
a boss 8 is arranged at one end of the baffle 2 far away from the clamping interface 6;
when baffle 2 pastes and establishes the inside wall at ring body 1, boss 8 joint is in first recess 7.
The thickness of the boss is equal to the depth of the first groove, so that the plane of the boss 8 clamped with the first groove 7 and the peripheral plane are in the same plane, and the cavity upper cover structure of the cavity in the plasma equipment can be completely covered on the boss.
According to the invention, the baffle made of aviation aluminum is arranged on the central ring structure in the cavity of the plasma equipment to shield the splicing seam of the inner side wall of the circular ring body; when the plasma nozzle sprays plasma, the baffle is adopted to isolate the damage of the plasma to the sealing ring, so that the service life of the sealing ring is effectively prolonged on the premise of not influencing the cavity technological parameters, the maintenance cost is reduced, the equipment maintenance frequency is reduced, the utilization rate of the equipment is improved, and the purposes of cost reduction and efficiency improvement are achieved.
Example 3
As shown in fig. 8, the cavity of the plasma device of this embodiment includes a central ring structure 9 in the cavity of the plasma device in any one of embodiments 1 and 2.
Specifically, the cavity of the plasma equipment further comprises a cavity bottom structure 10 and a cavity upper cover structure 11;
the central ring structure 9 is fixedly arranged on the cavity bottom structure 10;
when the cavity upper cover structure 11 is covered on the central ring structure 9, a complete cavity structure is formed between the cavity upper cover structure 11 and the cavity bottom structure 10.
The cavity further comprises a plurality of perfluorinated sealing rings;
as shown in fig. 9, a plurality of second grooves 12 are formed in the cavity bottom structure 10 near the inner side wall of the ring body 1;
each perfluoro sealing ring is embedded in the second groove 12 and is sealed and arranged in the second groove 12 through a platform structure of the circular ring body.
When the circular ring body comprises the plasma nozzle and the plasma nozzle sprays plasma, the baffle is used for preventing the plasma from bombarding and corroding the perfluorinated sealing ring.
According to the invention, the baffle made of aviation aluminum is arranged on the central ring structure in the cavity of the plasma equipment to shield the splicing seam of the inner side wall of the circular ring body; when the plasma nozzle sprays plasma, the baffle is adopted to isolate the damage of the plasma to the sealing ring, so that the service life of the sealing ring is effectively prolonged on the premise of not influencing the cavity technological parameters, the maintenance cost is reduced, the equipment maintenance frequency is reduced, the utilization rate of the equipment is improved, and the purposes of cost reduction and efficiency improvement are achieved.
Example 4
The plasma device of the present embodiment includes at least one chamber of the plasma device of embodiment 3.
The perfluoro sealing ring in the plasma equipment can depend on the protection of the baffle made of aviation aluminum material, and the service life of the sealing ring is prolonged, so that the maintenance cost is reduced, the equipment maintenance frequency is reduced, and the equipment utilization rate is improved.
While specific embodiments of the invention have been described above, it will be appreciated by those skilled in the art that this is by way of example only, and that the scope of the invention is defined by the appended claims. Various changes and modifications to these embodiments may be made by those skilled in the art without departing from the spirit and scope of the invention, and these changes and modifications are within the scope of the invention.
Claims (10)
1. A center ring structure in a cavity of plasma equipment is characterized in that the center ring structure comprises a circular ring body and a baffle plate;
splicing seams distributed along a circle of the inner side wall are formed in the inner side wall of the circular ring body;
the baffle is attached to the inner side wall of the circular ring body and covers the splicing seam.
2. The center ring structure in a chamber in a plasma apparatus of claim 1, wherein the annular body comprises a sidewall structure and a plateau structure;
the side wall structure and the platform structure are spliced and fixed;
after the side wall structure and the platform structure are spliced, the splicing seam is formed between the side wall structure and the platform structure.
3. The center ring structure in a chamber in a plasma apparatus as claimed in claim 2, wherein a plurality of plasma nozzles are distributed on the sidewall structure;
the baffle is provided with a plurality of clamping interfaces;
when the baffle is attached to the inner side wall of the circular ring body, each clamping interface is clamped on one plasma nozzle.
4. The center ring structure in a chamber in a plasma apparatus as claimed in claim 3, wherein said platform structure is provided with a first groove near said sidewall structure;
a boss is arranged at one end of the baffle, which is far away from the clamping interface;
when the baffle is attached to the inner side wall of the circular ring body, the boss is clamped in the first groove.
5. The center ring structure in a chamber in a plasma apparatus as claimed in claim 4, wherein a thickness of said boss and a depth of said first groove are equal; and/or the presence of a gas in the gas,
the baffle comprises an aviation aluminum material; and/or the presence of a gas in the gas,
the plasma apparatus includes a high-density plasma apparatus.
6. The center ring structure in a chamber in a plasma apparatus as claimed in claim 3, wherein a plurality of said plasma nozzles are disposed on said sidewall structure at equal intervals.
7. A chamber body of a plasma device, characterized in that the chamber body comprises a central ring structure in the chamber body of the plasma device as claimed in any one of claims 1 to 6.
8. The chamber of claim 7, wherein the chamber further comprises a chamber bottom structure and a chamber top cover structure;
the central ring structure is fixedly arranged on the bottom structure of the cavity;
when the cavity upper cover structure is covered on the central ring structure, a complete cavity structure is formed between the cavity upper cover structure and the cavity bottom structure.
9. The chamber of claim 8, wherein the chamber further comprises a plurality of perfluoro-seals;
a plurality of second grooves are formed in the bottom structure of the cavity close to the inner side wall of the ring body;
each perfluorinated sealing ring is embedded in the second groove and is arranged in the second groove through a platform structure sealing cover of the circular ring body;
the ring body comprises a plasma nozzle, and when the plasma nozzle sprays plasma, the baffle is used for obstructing the bombardment of the plasma on the perfluoro sealing ring.
10. A plasma device, characterized in that it comprises at least one chamber of a plasma device according to any of claims 7 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910680168.4A CN112309814A (en) | 2019-07-26 | 2019-07-26 | Plasma equipment, cavity of plasma equipment and central ring structure of cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910680168.4A CN112309814A (en) | 2019-07-26 | 2019-07-26 | Plasma equipment, cavity of plasma equipment and central ring structure of cavity |
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| Publication Number | Publication Date |
|---|---|
| CN112309814A true CN112309814A (en) | 2021-02-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910680168.4A Pending CN112309814A (en) | 2019-07-26 | 2019-07-26 | Plasma equipment, cavity of plasma equipment and central ring structure of cavity |
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| Country | Link |
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| CN (1) | CN112309814A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050284573A1 (en) * | 2004-06-24 | 2005-12-29 | Egley Fred D | Bare aluminum baffles for resist stripping chambers |
| JP2007227443A (en) * | 2006-02-21 | 2007-09-06 | Hitachi High-Technologies Corp | Plasma etching apparatus and method of forming inner wall in plasma processing chamber |
| JP2009194125A (en) * | 2008-02-14 | 2009-08-27 | Seiko Epson Corp | Manufacturing equipment for semiconductor device |
| CN104766778A (en) * | 2015-03-31 | 2015-07-08 | 上海华力微电子有限公司 | Plasma etching equipment cavity sealing face protecting device |
-
2019
- 2019-07-26 CN CN201910680168.4A patent/CN112309814A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050284573A1 (en) * | 2004-06-24 | 2005-12-29 | Egley Fred D | Bare aluminum baffles for resist stripping chambers |
| JP2007227443A (en) * | 2006-02-21 | 2007-09-06 | Hitachi High-Technologies Corp | Plasma etching apparatus and method of forming inner wall in plasma processing chamber |
| JP2009194125A (en) * | 2008-02-14 | 2009-08-27 | Seiko Epson Corp | Manufacturing equipment for semiconductor device |
| CN104766778A (en) * | 2015-03-31 | 2015-07-08 | 上海华力微电子有限公司 | Plasma etching equipment cavity sealing face protecting device |
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Address after: No.385, Hongcao Road, Xuhui District, Shanghai 200233 Applicant after: SHANGHAI ADVANCED SEMICONDUCTO Address before: No.385, Hongcao Road, Xuhui District, Shanghai 200233 Applicant before: ADVANCED SEMICONDUCTOR MANUFACTURING Co.,Ltd. |
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