CN112299728A - Edging etching liquid for camera glass and using method thereof - Google Patents
Edging etching liquid for camera glass and using method thereof Download PDFInfo
- Publication number
- CN112299728A CN112299728A CN202011313127.0A CN202011313127A CN112299728A CN 112299728 A CN112299728 A CN 112299728A CN 202011313127 A CN202011313127 A CN 202011313127A CN 112299728 A CN112299728 A CN 112299728A
- Authority
- CN
- China
- Prior art keywords
- etching
- edging
- camera glass
- solution
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
Abstract
The invention belongs to the technical field of etching solutions, and provides an edging etching solution for camera glass and a using method thereof, wherein the edging etching solution for camera glass contains 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150 parts of water, and the formula system mixes the low-concentration hydrofluoric acid solution and the low-concentration sulfuric acid solution for use, so that the camera glass cannot be damaged while the etching effect is achieved. The application technology of the edging etching solution for camera glass provided by the invention can not cause glass to crack, and can not cause appearance structures such as crack, sharp corner, crack and the like in micro pits on the surface of the glass, so that a rough surface with soft micro pit curve is formed, and the edging etching solution has a good application prospect.
Description
Technical Field
The invention belongs to the technical field of etching solutions, and particularly relates to an edging etching solution for camera glass and a using method thereof.
Background
Along with the development of economy, people's standard of living constantly improves, the cell-phone also more becomes the requisite in our life more and more, along with the constantly issue of scientific and technological, the function of cell-phone is also more and more diversified, people are also more and more strict to the requirement of taking a picture with the function of making a video recording simultaneously, and camera glass is the indispensable component of camera, camera glass's quality direct influence camera performance of taking a picture, so the demand of present manufacture factory for satisfying people, also more and more high to camera glass's requirement, camera glass is a necessary process of polishing in process of production, but prior art is at CNC (finishing impression) stage, camera glass's the processing degree of difficulty is very big and easy breakage, the glass apron is often broken in the CNC stage.
Disclosure of Invention
In order to solve the problems, the invention provides an edging etching solution for camera glass and a using method thereof, the method solves the problem that the laser process of the camera glass has smooth splinters, improves the productivity, and replaces the traditional CNC edging, and the invention has the following technical scheme:
the invention aims to provide an edging etching solution for camera glass, which has the technical points that: the edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight: 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150-200 parts of water.
In some embodiments of the present invention, the hydrofluoric acid solution contains 10 to 40 wt% of hydrofluoric acid molecules, the hydrofluoric acid solution contains 0 to 0.001 wt% of chloride, and the hydrofluoric acid solution contains 0 to 0.002 wt% of sulfate.
In certain embodiments of the invention, the sulfuric acid solution contains a weight fraction of sulfuric acid molecules in the range of 75 to 98.3 wt%.
The invention also aims to provide a using method of the edging etching liquid for processing the camera glass, which comprises the following steps:
the method comprises the following steps: adding 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150-200 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, and diluting to obtain edging etching solution for camera glass;
step two: loading the edging etching solution for the camera glass prepared in the step one into an etching instrument to carry out primary edging etching on the camera glass at the speed of 3.6-4 mu m/min, and removing the head every 20-40 min;
step three: and performing second thinning etching on the camera glass subjected to the first edging etching in the step two at the speed of 3-3.5 mu m/min, and removing the camera every 20-40 min.
In some embodiments of the present invention, the stirring temperature of the mixed solution in the first step of the using method is 30-60 ℃, and the stirring time is 10-20 min.
In some embodiments of the present invention, the concentration of the edge grinding etching solution for camera glass diluted in the first step in the using method is 10 to 50 wt%.
In some embodiments of the present invention, the etching time of the first etching in step two of the above using method is 60-80min, and the etching thickness is 0.735-0.805 μm.
In some embodiments of the present invention, the etching time of the second etching in step three of the above using method is 80-100min, and the etching thickness is 0.705-0.735 μm.
Compared with the prior art, the invention has the beneficial effects that:
the edging etching liquid for the camera glass contains 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150-200 parts of water, and the formula system mixes the low-concentration hydrofluoric acid solution and the low-concentration sulfuric acid solution for use, so that the camera glass cannot be damaged while the etching effect is achieved. The application technology of the edging etching solution for camera glass provided by the invention can not cause glass to crack, and can not cause appearance structures such as crack, sharp corner, crack and the like in micro pits on the surface of the glass, so that a rough surface with soft micro pit curve is formed, and the edging etching solution has a good application prospect.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below so that those skilled in the art can better understand the advantages and features of the present invention, and thus the scope of the present invention will be more clearly defined. The embodiments described herein are only a few embodiments of the present invention, rather than all embodiments, and all other embodiments that can be derived by one of ordinary skill in the art without inventive faculty based on the embodiments described herein are intended to fall within the scope of the present invention.
Example 1
The edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight:
10 parts of hydrofluoric acid solution, wherein the weight fraction of hydrofluoric acid molecules in the hydrofluoric acid solution is 30 wt%, the content of chloride is 0.001 wt%, and the content of sulfate is 0.002 wt%.
7.5 parts of sulfuric acid solution, wherein the weight fraction of sulfuric acid molecules is 80 wt%.
175 parts of water.
The use method of the edging etching solution for processing the camera glass comprises the following steps:
the method comprises the following steps: adding 10 parts of hydrofluoric acid solution, 7.5 parts of sulfuric acid solution and 175 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, and diluting to obtain the edging etching solution for the camera glass, wherein the stirring temperature of the mixed solution is 45 ℃, the stirring time is 15min, and the concentration of the edging etching solution for the camera glass is 30 wt%.
Step two: and (2) filling the edging etching solution for the camera glass prepared in the step one into an etching instrument, and performing first edging etching on the camera glass at the speed of 3.8 mu m/min, wherein the head is removed every 30min, the etching time is 70min, and the etching thickness is 0.765 mu m.
Step three: and performing second thinning etching on the camera glass subjected to the first edging etching in the step two at the speed of 3.4 mu m/min, removing the head every 30min, wherein the etching time is 90min, and the etching thickness is 0.725 mu m.
Example 2
The edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight:
12 parts of hydrofluoric acid solution, wherein the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 40 wt%.
7 parts of sulfuric acid solution, wherein the weight fraction of sulfuric acid molecules is 90 wt%.
150 parts of water.
The use method of the edging etching solution for processing the camera glass comprises the following steps:
the method comprises the following steps: adding 12 parts of hydrofluoric acid solution, 7 parts of sulfuric acid solution and 150 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, and diluting to obtain the edging etching solution for the camera glass, wherein the stirring temperature of the mixed solution is 60 ℃, the stirring time is 10min, and the concentration of the edging etching solution for the camera glass is 10 wt%.
Step two: and (2) loading the edging etching solution for the camera glass prepared in the step one into an etching instrument, and performing first edging etching on the camera glass at the speed of 3.6 mu m/min, wherein the head is removed every 40min, the etching time is 80min, and the etched thickness is 0.805 mu m.
Step three: and (3) thinning and etching the camera glass subjected to the first edging and etching in the second step at the speed of 3 mu m/min for the second time, removing the camera every 40min, wherein the etching time is 100min, and the etching thickness is 0.735 mu m of residual thickness.
Example 3
The edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight:
8 parts of hydrofluoric acid solution, wherein the weight fraction of hydrofluoric acid molecules in the hydrofluoric acid solution is 10 wt%, the content of chloride is 0.001 wt%, and the content of sulfate is 0.002 wt%.
8 parts of sulfuric acid solution, wherein the weight fraction of sulfuric acid molecules is 98.3 wt%.
200 parts of water.
The use method of the edging etching solution for processing the camera glass comprises the following steps:
the method comprises the following steps: adding 8 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution and 200 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, diluting to obtain the edging etching solution for the camera glass, wherein the stirring temperature of the mixed solution is 60 ℃, the stirring time is 10min, and the concentration of the edging etching solution for the camera glass is 10 wt%.
Step two: and (2) filling the edging etching solution for the camera glass prepared in the step one into an etching instrument, and performing first edging etching on the camera glass at a speed of 4 mu m/min, wherein the head is removed every 20min, the etching time is 60min, and the etching thickness is 0.735 mu m.
Step three: and performing second thinning etching on the camera glass subjected to the first edging etching in the step two at the speed of 3.5 mu m/min, removing the head every 20min, wherein the etching time is 80min, and the etching thickness is 0.705 mu m.
Example 4
The edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight:
11 parts of hydrofluoric acid solution, wherein the weight fraction of hydrofluoric acid molecules in the hydrofluoric acid solution is 20 wt%, the content of chloride in the hydrofluoric acid solution is 0-0.0005 wt%, and the content of sulfate in the hydrofluoric acid solution is 0-0.001 wt%.
7 parts of sulfuric acid solution, wherein the weight fraction of sulfuric acid molecules is 95 wt%.
180 parts of water.
The use method of the edging etching solution for processing the camera glass comprises the following steps:
the method comprises the following steps: adding 11 parts of hydrofluoric acid solution, 7 parts of sulfuric acid solution and 180 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, diluting to obtain the edging etching solution for the camera glass, wherein the stirring temperature of the mixed solution is 40 ℃, the stirring time is 18min, and the concentration of the edging etching solution for the camera glass is 30 wt%.
Step two: and (2) loading the edging etching solution for the camera glass prepared in the step one into an etching instrument, and performing first edging etching on the camera glass at the speed of 3.7 mu m/min, wherein the head is removed every 25min, the etching time is 65min, and the etching thickness is 0.745 mu m.
Step three: and performing second thinning etching on the camera glass subjected to the first edging etching in the step two at the speed of 3.2 mu m/min, removing the head every 35min, wherein the etching time is 85min, and the etching thickness is 0.725 mu m.
Examples of the experiments
The camera glasses prepared in examples 1 to 4 and the camera glass prepared by the conventional method (CNC edging) (comparative example 1) were observed under an optical microscope, and the results are shown in table 1:
TABLE 1
Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present invention, and not for limiting the protection scope of the present invention, although the present invention is described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.
Claims (8)
1. The utility model provides a camera glass is with edging etching solution which characterized in that: the edging etching solution for the camera glass comprises the following preparation raw materials in parts by weight: 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150-200 parts of water.
2. The edging etching liquid for camera glass according to claim 1, characterized in that: the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40 wt%, the content of chloride contained in the hydrofluoric acid solution is 0-0.001 wt%, and the content of sulfate contained in the hydrofluoric acid solution is 0-0.002 wt%.
3. The edging etching liquid for camera glass according to claim 1, characterized in that: the weight fraction of the sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3 wt%.
4. The use method of the edging etching liquid for camera glass according to claim 1, characterized in that: the use method of the edging etching solution for processing the camera glass comprises the following steps:
the method comprises the following steps: adding 8-12 parts of hydrofluoric acid solution, 7-8 parts of sulfuric acid solution and 150-200 parts of water into a batching tank, uniformly mixing to obtain a mixed solution, uniformly stirring, and diluting to obtain edging etching solution for camera glass;
step two: loading the edging etching solution for the camera glass prepared in the step one into an etching instrument to carry out primary edging etching on the camera glass at the speed of 3.6-4 mu m/min, and removing the head every 20-40 min;
step three: and performing second thinning etching on the camera glass subjected to the first edging etching in the step two at the speed of 3-3.5 mu m/min, and removing the camera every 20-40 min.
5. The use method of the edging etching liquid for camera glass according to claim 4, characterized in that: the stirring temperature of the mixed solution in the step one is 30-60 ℃, and the stirring time is 10-20 min.
6. The use method of the edging etching liquid for camera glass according to claim 4, characterized in that: the concentration of the edge grinding etching solution for the camera glass diluted in the step one is 10-50 wt%.
7. The use method of the edging etching liquid for camera glass according to claim 4, characterized in that: in the second step, the etching time of the first etching is 60-80min, and the etching thickness is 0.735-0.805 μm.
8. The use method of the edging etching liquid for camera glass according to claim 4, characterized in that: the etching time of the second etching in the third step is 80-100min, and the etching thickness is 0.705-0.735 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011313127.0A CN112299728A (en) | 2020-11-20 | 2020-11-20 | Edging etching liquid for camera glass and using method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011313127.0A CN112299728A (en) | 2020-11-20 | 2020-11-20 | Edging etching liquid for camera glass and using method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112299728A true CN112299728A (en) | 2021-02-02 |
Family
ID=74336212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011313127.0A Pending CN112299728A (en) | 2020-11-20 | 2020-11-20 | Edging etching liquid for camera glass and using method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112299728A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003086567A (en) * | 2001-09-13 | 2003-03-20 | Dainippon Screen Mfg Co Ltd | Apparatus and method for treating peripheral edge of substrate |
| US20060118521A1 (en) * | 2004-12-06 | 2006-06-08 | Asahi Glass Company, Limited | Method for etching doughnut-type glass substrates |
| CN103108842A (en) * | 2010-08-24 | 2013-05-15 | 康宁股份有限公司 | Method of strengthening edge of glass article |
| WO2013137329A1 (en) * | 2012-03-13 | 2013-09-19 | Hoya株式会社 | Glass substrate for cover glass for electronic device, and production method therefor |
| CN103880293A (en) * | 2014-02-12 | 2014-06-25 | 惠晶显示科技（苏州）有限公司 | Etching liquid for secondary reinforcement of glass as well as preparation method and application thereof |
| CN106170848A (en) * | 2014-09-16 | 2016-11-30 | Mt系统公司 | The sapphire using high temperature wet to carry out is thinning and smooths |
-
2020
- 2020-11-20 CN CN202011313127.0A patent/CN112299728A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003086567A (en) * | 2001-09-13 | 2003-03-20 | Dainippon Screen Mfg Co Ltd | Apparatus and method for treating peripheral edge of substrate |
| US20060118521A1 (en) * | 2004-12-06 | 2006-06-08 | Asahi Glass Company, Limited | Method for etching doughnut-type glass substrates |
| CN103108842A (en) * | 2010-08-24 | 2013-05-15 | 康宁股份有限公司 | Method of strengthening edge of glass article |
| WO2013137329A1 (en) * | 2012-03-13 | 2013-09-19 | Hoya株式会社 | Glass substrate for cover glass for electronic device, and production method therefor |
| CN103880293A (en) * | 2014-02-12 | 2014-06-25 | 惠晶显示科技（苏州）有限公司 | Etching liquid for secondary reinforcement of glass as well as preparation method and application thereof |
| CN106170848A (en) * | 2014-09-16 | 2016-11-30 | Mt系统公司 | The sapphire using high temperature wet to carry out is thinning and smooths |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105645785A (en) | Method for reinforcing high-strength protective glass | |
| CN112299728A (en) | Edging etching liquid for camera glass and using method thereof | |
| CN112209625A (en) | AG glass polishing solution and preparation method thereof | |
| CN105617881B (en) | A kind of preparation method for the inoranic membrane for repairing carrier surface defect | |
| CN104724943A (en) | Enhancer for touch screen edge enhancing process | |
| CN106365459A (en) | Chemically thinning method for liquid crystal glass substrate | |
| CN105819700A (en) | Enhancement method for enhancing surface strength of glass | |
| CN111393031A (en) | Etching solution for preparing filter glass and preparation method of filter glass | |
| CN114516729B (en) | Frosting liquid and preparation method thereof, frosted glass and glass cover plate | |
| CN114933419B (en) | Method for preparing ultrathin flexible glass by using bionic weathering enzyme composite glass thinning agent | |
| CN115283422B (en) | Treatment method of glass etching waste residues | |
| WO2021103090A1 (en) | Etching solution for processing cd texture of camera lens, and use method therefor | |
| CN106673455B (en) | Composition for glass substrate of liquid crystal display surface treatment | |
| CN113307296A (en) | Preparation method of low-oxygen-content barium fluoride | |
| CN106587649B (en) | TFT glass substrate thinning technique pretreating agent | |
| CN115594409B (en) | Pretreatment liquid for liquid crystal display screen, preparation method and pretreatment process | |
| CN112299708A (en) | Anti-glare glass and preparation method thereof | |
| CN111847849A (en) | Glass hot bending process and application of glass hot bending process in 3D glass preparation method | |
| CN112745034A (en) | Etching solution for DT-STAR material laser cutting lens and use method thereof | |
| CN112476072A (en) | Preparation method of optical glass with high light transmittance and high stability | |
| CN114436539A (en) | Liquid medicine and process for forming polyhedral square crystalline glittering sand effect on glass surface | |
| CN106519278A (en) | Spectacle lens and preparation method thereof | |
| CN106978058A (en) | Loss prevention liquid that a kind of lens surface is protected temporarily and preparation method thereof | |
| CN106587648B (en) | A kind of TFT glass baseplate surface pretreatment compositions | |
| CN108722981B (en) | Method for quickly removing paraffin in dehydration box |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 516000 south of Hongchuan Avenue, Tongqiao Town, Huizhou City, Guangdong Province Applicant after: HUIZHOU QINGYANG INDUSTRIAL Co.,Ltd. Address before: 516000 south of Hongchuan Avenue, Tongqiao Town, Qingyuan City, Guangdong Province Applicant before: HUIZHOU QINGYANG INDUSTRIAL Co.,Ltd. |
|
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210202 |