CN112292482B - 涂布的切削工具 - Google Patents
涂布的切削工具 Download PDFInfo
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- CN112292482B CN112292482B CN201980038824.9A CN201980038824A CN112292482B CN 112292482 B CN112292482 B CN 112292482B CN 201980038824 A CN201980038824 A CN 201980038824A CN 112292482 B CN112292482 B CN 112292482B
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- 238000005520 cutting process Methods 0.000 title claims abstract description 59
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 69
- 239000010410 layer Substances 0.000 claims abstract description 57
- 238000000576 coating method Methods 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 239000002356 single layer Substances 0.000 claims abstract description 18
- 238000002441 X-ray diffraction Methods 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910000831 Steel Inorganic materials 0.000 claims description 5
- 239000010959 steel Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 229910000997 High-speed steel Inorganic materials 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011195 cermet Substances 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000012360 testing method Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 238000007514 turning Methods 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000005422 blasting Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000012937 correction Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 229910000760 Hardened steel Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910001149 41xx steel Inorganic materials 0.000 description 1
- 229910017488 Cu K Inorganic materials 0.000 description 1
- 229910017541 Cu-K Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
- B23P15/28—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools
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- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B18/00—Layered products essentially comprising ceramics, e.g. refractory products
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- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/022—Mechanical properties
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- C23C16/36—Carbonitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/405—Oxides of refractory metals or yttrium
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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Abstract
本发明涉及涂布的切削工具，包含基底和涂层，其中所述涂层包含内部α‑Al2O3多层和外部α‑Al2O3单层。所述内部α‑Al2O3多层的厚度小于或等于所述内部α‑Al2O3多层的厚度和所述外部α‑Al2O3单层的厚度之和的35％。所述内部α‑Al2O3多层和所述外部α‑Al2O3单层的厚度之和优选地是2‑15μm。所述α‑Al2O3多层由交替的α‑Al2O3亚层和TiCO、TiCNO、AlTiCO或AlTiCNO亚层组成，所述α‑Al2O3多层包含至少5个α‑Al2O3亚层。
Description
技术领域
本发明涉及一种涂布的切削工具，包含基底和涂层，其中所述涂层包含内部α-Al2O3多层和外部α-Al2O3单层。
背景技术
氧化铝的CVD涂层已在金属切削应用中显示出优势，并且CVD涂布车削刀片的主要部分目前就提供有氧化铝的涂层。多年来，所述氧化铝涂层已经变得越来越优化，因为已示出所述涂层中氧化铝晶体的例如晶粒尺寸和晶体取向的变化对金属切削中的磨损性能有大的影响。
一直需要找到能够延长切削工具的寿命和/或能够承受比已知切削工具涂层更高的切削速度的切削工具涂层。
发明内容
本发明的一个目的是提供在金属切削应用中有改善的耐磨性的涂布的切削工具。另一个目的是改善其在车削操作中的耐性，特别是在钢和硬化钢的车削中更是如此。另一个目的是提供耐磨涂层，其在钢和硬化钢的车削中提供高的耐月牙洼磨损性和耐后刀面磨损性。
根据权利要求1所述的涂布的切削工具实现这些目的中的至少一个。
优选的实施方式列于从属权利要求中。
本公开内容涉及一种涂布的切削工具，包含基底和涂层，其中所述涂层包含内部α-Al2O3多层和外部α-Al2O3单层，其中所述外部α-Al2O3单层的厚度是1-10μm、优选地是3-5μm，且其中所述内部α-Al2O3多层的厚度小于或等于所述内部α-Al2O3多层的厚度和所述外部α-Al2O3单层的厚度之和的35％，且其中所述α-Al2O3多层由交替的α-Al2O3亚层和TiCO、TiCNO、AlTiCO或AlTiCNO亚层组成，所述内部α-Al2O3多层包含至少5个α-Al2O3亚层。
令人吃惊地发现，对于α-Al2O3多层和α-Al2O3单层的具体组合，存在性能的最大值。这种组合提供了增加的耐后刀面磨损性和耐月牙洼磨损性。认为所述α-Al2O3单层贡献了高的初始耐月牙洼磨损性，并且当切削刃由于切削刃的磨损和受热而开始变形时，所述α-Al2O3多层对于耐磨性是重要的。
在本发明的一个实施方式中，所述内部α-Al2O3多层相邻于所述外部α-Al2O3单层。
在本发明的一个实施方式中，所述内部α-Al2O3多层和所述外部α-Al2O3单层的厚度之和是2-16μm，优选地是3-8μm，最优选地是4-6μm。
在本发明的一个实施方式中，所述内部α-Al2O3多层的周期是50-900nm，优选地是70-300nm，更优选地是70-150nm，其中一个周期包含一个α-Al2O3亚层和一个TiCO、TiCNO、AlTiCO或AlTiCNO亚层。
在本发明的一个实施方式中，所述内部α-Al2O3多层的厚度是所述内部α-Al2O3多层的厚度和所述外部α-Al2O3单层的厚度之和的12％至35％，优选地15％至30％，最优选地18％至25％。
在本发明的一个实施方式中，所述内部α-Al2O3多层与所述外部α-Al2O3单层的组合在20°-140°的θ-2θ扫描中呈现出XRD衍射，其中0 0 12衍射峰强度(峰面积)I(0 0 12)对1 1 3衍射峰强度(峰面积)I(1 1 3)、1 1 6衍射峰强度(峰面积)I(1 1 6)、和0 2 4衍射峰强度(峰面积)I(0 2 4)的比为I(0 0 12)/I(1 1 3)>1，I(0 0 12)/I(1 1 6)>1且I(0 012)/I(0 2 4)>1。
在本发明的一个实施方式中，所述内部α-Al2O3多层与所述外部α-Al2O3单层的组合在20°-140°的θ-2θ扫描中呈现出XRD衍射，其中0 0 12衍射峰强度(峰面积)I(0 0 12)对1 1 3衍射峰强度(峰面积)I(1 1 3)、1 1 6衍射峰强度(峰面积)I(1 1 6)、和0 2 4衍射峰强度(峰面积)I(0 2 4)的比是I(0 0 12)/I(1 1 3)>1、优选地>5、最优选地>8，I(0 0 12)/I(1 1 6)>1、优选地>3、最优选地>5，且I(0 0 12)/I(0 2 4)>1、优选地>2。
在本发明的一个实施方式中，所述0 1 14衍射峰强度(峰面积)I(0 1 14)对0 012衍射峰强度(峰面积)I(0 0 12)的比I(0 1 14)/I(0 0 12)<2，优选地<1。
在本发明的一个实施方式中，1 1 0衍射峰强度(峰面积)I(1 1 0)与1 1 3衍射峰强度(峰面积)I(1 1 3)以及0 2 4衍射峰强度(峰面积)I(0 2 4)之间的关系为I(110)>I(113)和I(024)中的每一个。
在本发明的一个实施方式中，0 0 12衍射峰强度(峰面积)I(0 0 12)和1 1 0衍射峰强度(峰面积)I(1 1 0)之间的关系为I(0 0 12)>I(110)。
在本发明的一个实施方式中，所述涂布的切削工具包含位于所述基底和所述内部α-Al2O3多层之间的至少一个TiC、TiN、TiAlN或TiCN层，优选地是TiCN层。
在本发明的一个实施方式中，所述TiC、TiN、TiAlN或TiCN层的厚度是2-15μm，优选地是4-10μm。
在本发明的一个实施方式中，所述涂布的切削工具包含用CuKα辐射和θ-2θ扫描测量时呈现出X射线衍射图样的TiCN层，其中根据Harris公式来定义TC(hkl)：
其中I(hkl)是(hkl)反射的测量强度(积分面积)，I0(hkl)是根据ICDD的第42-1489号PDF卡片的标准强度，n是反射数量，计算中所用的反射是(1 1 1)、(2 0 0)、(2 20)、(3 1 1)、(3 3 1)、(4 2 0)、(4 2 2)和(5 1 1)，其中TC(331)+TC(422)>5，优选地>6。
在本发明的一个实施方式中，所述涂层的最外层是所述外部α-Al2O3单层。
在本发明的一个实施方式中，所述基底是硬质合金、金属陶瓷、陶瓷、高速钢或cBN。
在本发明的一个实施方式中，所述基底是包含3-14重量％Co和多于50重量％WC的硬质合金。
本文所述的涂布的切削工具可以经历后处理例如喷砂、刷涂或喷丸的任意组合。喷砂后处理可以是湿喷砂或干喷砂，例如使用氧化铝粒子进行。
本发明的其它目的和特征将通过结合附图考虑以下定义和实施例变得清晰。
附图说明
在图中：
图1显示了本发明涂层的实例样品MS14的横截面的扫描电子显微镜(SEM)图像。
定义
本文的术语“切削工具”旨在表示适合于金属切削应用的切削工具，例如刀片、立铣刀或钻头。应用领域可以是例如在金属(例如钢)中进行车削、铣削或钻孔。
方法
XRD分析
为了研究层的纹理或取向，使用配备有PIXcel检测器的PANalytical CubiX3衍射仪在后刀面上进行了X射线衍射(XRD)。将所述涂布的切削工具安装在样品架中，以确保样品的后刀面与样品架的参考表面平行，并且所述后刀面处于适当的高度。使用Cu-Kα辐射进行测量，电压为45kV，电流为40mA。使用了1/2度的防散射狭缝和1/4度的发散狭缝。在20°至140°的2θ范围内，即在从10°至70°的入射角θ范围内，测量源自涂布的切削工具的衍射强度。数据分析包括背景拟合、Cu-Kα2剥离和数据的图形拟合，都是使用PANalytical公司的X’Pert HighScore Plus软件完成的。随后，使用该程序的输出(图形拟合曲线的积分峰面积)从强度比和/或关系的方面限定本发明的涂层。
通常，所谓的薄膜校正将应用于积分峰面积数据以补偿由于层中吸收和不同路径长度而引起的强度差异，但是由于本发明的TiCO、TiCNO、AlTiCO或AlTiCNO亚层薄并且包含突起，该层的厚度难以设定并且穿过该层的路径长度复杂。因此，基于其中薄膜校正没有被应用于图形拟合曲线的所提取积分峰面积强度的数据，来设置所述α-Al2O3多层与α-Al2O3单层的组合的取向。但是，在计算强度面积之前，将Cu-Kα2剥离应用于所述数据。
由于在所述外部α-Al2O3单层之上可能存在的其它层会影响进入α-Al2O3单层并离开整个涂层的X射线强度，因此需要考虑层中相应化合物的线性吸收系数来完成对这些的校正。或者，可以通过基本上不影响XRD测量结果的方法例如化学蚀刻来去除在α-Al2O3单层之上的其它层。
应当注意，峰重叠是在涂层的X射线衍射分析中可能发生的现象，所述涂层为包含例如若干结晶层的涂层和/或沉积在包含结晶相的基底上的涂层，且技术人员必须考虑和补偿该现象。源自α-Al2O3层的峰与源自TiCN层的峰的峰重叠可能影响测量并需要被考虑。还应当注意，例如所述基底中的WC可能有接近本发明相关峰的衍射峰。
实施例
现在将更加详细地公开本发明的示例性实施方式并将其与参考实施方式比较。制造涂布的切削工具(刀片)，在切削测试中分析并评价。
样品概述
利用常规工序包括研磨、混合、喷雾干燥、压制和烧结来制造硬质合金基底。所述烧结基底在Ionbond型530尺寸的径向CVD反应器中进行CVD涂覆，所述反应器能够容纳10000个半英寸尺寸的切削刀片。硬质合金基底(刀片)的ISO型几何形状为CNMG-120408-PM。所述硬质合金的组成为7.2重量％的Co、2.9重量％的TaC、0.5重量％的NbC、1.9重量％的TiC、0.4重量％的TiN和剩余的WC。样品概述示于表1。
表1样品概述
CVD沉积
在400毫巴和885℃的工序中在所有基底上沉积第一个最内层的约0.4μm的TiN涂层。使用48.8体积％H2、48.8体积％N2和2.4体积％TiCl4的气体混合物。
随后以两步沉积约6.5μm厚的TiCN，即内部TiCN和外部TiCN。
在55毫巴、885℃下在3.0体积％TiCl4、0.45体积％CH3CN、37.6体积％N2和余量H2的气体混合物中沉积所述内部TiCN 10分钟。
在55毫巴、885℃下在7.8体积％N2、7.8体积％HCl、2.4体积％TiCl4、0.65体积％CH3CN和余量H2的气体混合物中沉积所述外部TiCN。
在1000℃下通过由四个单独的反应步骤组成的工序在所述MTCVD TiCN层上沉积1-1.5μm厚的粘结层。
首先，在400毫巴下使用1.5体积％TiCl4、3.4体积％CH4、1.7体积％HCl、25.5体积％N2和67.9体积％H2的气体混合物来沉积HTCVD TiCN。
接下来的三个步骤都是在70毫巴下沉积。在第一个步骤(TiCNO-1)中使用了1.5体积％TiCl4、0.40体积％CH3CN、1.2体积％CO、1.2体积％HCl、12.0体积％N2和余量H2的气体混合物。接下来的步骤(TiCNO-2)中使用了3.1体积％TiCl4、0.63体积％CH3CN、4.6体积％CO、30.6体积％N2和余量H2的气体混合物。在最后的粘结层步骤(TiN)中使用了3.2体积％TiCl4、32.3体积％N2和64.5体积％H2的气体混合物。
在后续的Al2O3成核开始之前，在CO2、CO、N2和H2的混合物中氧化所述粘结层4分钟。
在所有的样品上，在1000℃和60毫巴下以两步在所述粘结层之上沉积α-Al2O3层。第一步包含1.2体积％AlCl3、4.7体积％CO2、1.8体积％HCl和余量H2的气体混合物，并且第二步包含1.2体积％AlCl3、4.7体积％CO2、2.9体积％HCl、0.58体积％H2S和余量H2的气体混合物。在所谓的MS样品(多层+单层样品)和M样品(多层样品)上，该层生长到大约0.1μm。在S样品(单层样品)上，该层构成α-Al2O3单层。
在所述MS样品和所述M样品上沉积α-Al2O3多层，其中TiCO粘结亚层与α-Al2O3亚层交替。对于所有实施例，沉积所述TiCO亚层75秒。在1000℃和60毫巴下在1.7体积％TiCl4、3.5体积％CO、4.3体积％AlCl3和90.5体积％H2的气体混合物中沉积所述TiCO亚层。使用与用于底部α-Al2O3层相同的工序参数以两步沉积所述α-Al2O3亚层。第一步进行了2.5分钟并且第二步的工序时间是约3分钟。
一个周期等于一个TiCO粘结亚层的厚度和一个α-Al2O3亚层的厚度之和。样品中α-Al2O3多层的周期的测量通过将所述α-Al2O3多层的总厚度除以层中的周期数量完成。
在光学显微镜下研究所述样品中层的厚度并示于表2。
表2层厚度
XRD分析结果
如上述方法部分公开的那样完成XRD分析。没有将薄膜校正应用于所述强度数据。源自样品的α-Al2O3的110、113、024、116、0 0 12和0 1 14峰强度呈现于表3，所述值被标准化使得0 0 12的强度被设置为100％。
表3源自α-Al2O3的XRD强度
| 样品 | I(110) | I(113) | I(024) | I(116) | I(0 0 12) | I(0 1 14) |
| MS14 | 37 | 9 | 23 | 14 | 100 | 60 |
| MS23 | 43 | 8 | 31 | 17 | 100 | 62 |
| S5 | 74 | 5 | 16 | 6 | 100 | 53 |
| M5 | 65 | 4 | 19 | 11 | 100 | 45 |
| MS-2 | 48 | 7 | 19 | 12 | 100 | 67 |
| MS-4 | 61 | 5 | 16 | 9 | 100 | 48 |
如表3可见，所有样品显示出非常高的0 0 12峰强度。
在XRD中研究位于样品的基底和α-Al2O3层之间的TiCN层。由于在所有样品上使用了相同的CVD沉积参数，在下文中仅呈现了源自S5样品的TC值。在所述数据的薄膜校正和对α-Al2O3单层的吸收进行的校正之后，用Harris公式来计算TC值。所述TC值显示于表4。
Harris公式：
其中I(hkl)是(hkl)反射的测量强度(积分面积)，I0(hkl)是根据ICDD的第42-1489号PDF卡片的标准强度，n是反射数量，计算中所用的反射是(1 1 1)、(2 0 0)、(2 20)、(3 1 1)、(3 3 1)、(4 2 0)、(4 2 2)和(5 1 1)。
表4样品S5的TiCN层的TC值
| h k l | TC(h k l) |
| 2 2 0 | 0.11 |
| 3 1 1 | 2.18 |
| 4 2 2 | 4.02 |
源自TiCO亚层的XRD信号和源自TiCN层的信号在所述层的分析中是难以分离的，因为TiCO和TiCN两者是具有相似晶胞参数的立方体。为了分析所述TiCN层，应该首先通过机械或化学手段例如蚀刻或抛光来去除所述α-Al2O3多层。此后可以分析所述TiCN层。
切削测试
在两个不同的金属切削测试中来评价所述样品。在所述切削测试前，在所述涂布的切削工具的前刀面进行喷砂。使用的喷砂浆由在水中的20体积％的氧化铝组成，且在切削刀片的前刀面与喷砂浆的方向之间的角为90度。对于所有进行磨损测试的样品，所述浆对喷枪的压力为2.2bar。
PD印痕-后刀面磨损
在干车削测试中切削工件材料SS2541(700×180mm杆)来测试所述样品。在所述杆上从直径178mm至直径60mm应用了面车削。使用了以下切削数据：
切削速度Vc：210m/分钟
进给fn：0.35mm/转
切削深度ap：2mm
停止标准定义为当后刀面磨损(Vb)≥0.4mm或刃破损时。在每5次切削或每3次切削后检查每个刀刃，并测量主刃的后刀面磨损。表5中显示了4个平行测试1-4的Vb＝0.4mm处的切削次数(内插值)。
表5源自PD印痕-后刀面磨损测试的结果
不同的测试各自在一种情况下完成，而且可见相同的一个样品的寿命在不同的测试中是不同的。这可能由于所述工件材料的差异。在一个相同的测试中研究趋势。结论是样品MS14是每个测试中在到达高于0.4mm的Vb之前显示了最高的切削次数的样品。
月牙洼磨损
在球轴承钢Ovako825B(100CrMo7-3)的纵向车削中使用以下切削数据测试了根据上文进行了喷砂的涂布的切削工具；
切削速度vc：220m/分钟
切削进给fn：0.3mm/转
切削深度ap：2mm
刀片样式：CNMG120408-PM
使用了水混溶性金属加工液。
评价了每个切削工具的一个切削刃。
在月牙洼磨损的分析中，用光学显微镜测量了暴露基底的面积。
在测试1中，所述切削进行至30分钟的切削总时间，且暴露基底的面积呈现于表6。
在测试2中，当暴露基底的表面积超过0.2时认为到达了所述工具的寿命。在切削10分钟后，在光学显微镜下评价每个切削工具的磨损。随后继续所述切削工序并在6分钟后测量，且随后在每操作2分钟后测量。除了月牙洼磨损之外，也观察了后刀面磨损，但所述后刀面磨损在此测试中不影响工具寿命。结果显示于表6。
表6源自月牙洼磨损测试的结果
从测试1中可总结出，样品S5和MS14显示出相比于样品MS23和M5更高的耐月牙洼磨损性。从测试2中可总结出，本发明样品MS14显示出最好的耐月牙洼磨损性。
尽管联系多种示例性实施方式描述了本发明，但应当理解本发明不限于所公开的示例性实施方式，相反，本发明旨在涵盖在所附权利要求书范围内的多种修改和等价布置。此外，应当认识到，本发明的任何公开形式或实施方式可以作为设计选择的一般主题整合到任何其它的公开或描述或建议的形式或实施方式中。因此，本发明仅由所附权利要求书的范围限定。
Claims (14)
1.一种涂布的切削工具，包含基底和涂层，其中所述涂层包含内部α-Al2O3多层和外部α-Al2O3单层，
其中所述外部α-Al2O3单层的厚度是1-10μm，且
其中所述内部α-Al2O3多层的厚度为所述内部α-Al2O3多层的厚度和所述外部α-Al2O3单层的厚度之和的15％至30％，且
其中所述α-Al2O3多层由交替的α-Al2O3亚层和TiCO、TiCNO、AlTiCO或AlTiCNO亚层组成，所述内部α-Al2O3多层包含至少5个α-Al2O3亚层，
其中所述涂布的切削工具包含位于所述基底和所述内部α-Al2O3多层之间的至少一个TiC、TiN、TiAlN或TiCN层，
其中所述TiC、TiN、TiAlN或TiCN层的厚度是2-15μm。
2.根据权利要求1所述的涂布的切削工具，其中所述内部α-Al2O3多层相邻于所述外部α-Al2O3单层。
3.根据权利要求1或2所述的涂布的切削工具，其中所述内部α-Al2O3多层和所述外部α-Al2O3单层的厚度之和是2-16μm。
4.根据权利要求1或2所述的涂布的切削工具，其中所述内部α-Al2O3多层的周期是50-900nm，其中一个周期包含一个α-Al2O3亚层和一个TiCO、TiCNO、AlTiCO或AlTiCNO亚层。
5.根据权利要求1或2所述的涂布的切削工具，其中所述内部α-Al2O3多层与所述外部α-Al2O3单层的组合在20°-140°的θ-2θ扫描中呈现出XRD衍射，其中以峰面积计的0 0 12衍射峰强度I(0 0 12)对以峰面积计的1 1 3衍射峰强度I(1 1 3)、以峰面积计的1 1 6衍射峰强度I(1 1 6)、和以峰面积计的0 2 4衍射峰强度I(0 2 4)的比为I(0 0 12)/I(1 1 3)>1，I(0 0 12)/I(1 1 6)>1且I(0 0 12)/I(0 2 4)>1。
6.根据权利要求5所述的涂布的切削工具，其中所述以峰面积计的0 1 14衍射峰强度I(0 1 14)对以峰面积计的0 0 12衍射峰强度I(0 012)的比I(0 1 14)/I(0 0 12)<2。
7.根据权利要求5所述的涂布的切削工具，其中所述以峰面积计的1 1 0衍射峰强度I(1 1 0)与所述以峰面积计的1 1 3衍射峰强度I(1 13)以及所述以峰面积计的0 2 4衍射峰强度I(0 2 4)之间的关系为
I(110)>I(113)和I(024)中的每一个。
8.根据权利要求5所述的涂布的切削工具，其中所述以峰面积计的0 0 12衍射峰强度I(0 0 12)与所述以峰面积计的1 1 0衍射峰强度I(11 0)之间的关系为I(0 0 12)>I(110)。
9.根据权利要求1或2所述的涂布的切削工具，其中所述涂布的切削工具包含用CuKα辐射和θ-2θ扫描测量时呈现出X射线衍射图样的TiCN层，其中根据Harris公式来定义TC(hkl)：
其中I(hkl)是以积分面积计的(hkl)反射的测量强度，I0(hkl)是根据ICDD的第42-1489号PDF卡片的标准强度，n是反射数量，计算中所用的反射是(1 1 1)、(2 0 0)、(2 2 0)、(31 1)、(3 3 1)、(4 2 0)、(4 2 2)和(5 1 1)，其中TC(331)+TC(422)>5。
10.根据权利要求1或2所述的涂布的切削工具，其中所述涂层的最外层是所述外部α-Al2O3单层。
11.根据权利要求1或2所述的涂布的切削工具，其中所述基底是硬质合金、陶瓷或高速钢。
12.根据权利要求1或2所述的涂布的切削工具，其中所述基底是金属陶瓷。
13.根据权利要求1或2所述的涂布的切削工具，其中所述基底是cBN。
14.根据权利要求1或2所述的涂布的切削工具，其中所述基底是包含3-14重量％Co和多于50重量％WC的硬质合金。
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| EP18180519.3 | 2018-06-28 | ||
| PCT/EP2019/067147 WO2020002500A1 (en) | 2018-06-28 | 2019-06-27 | Coated cutting tool |
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| JP7141601B2 (ja) * | 2019-12-19 | 2022-09-26 | 株式会社タンガロイ | 被覆切削工具 |
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| BR112020026642A2 (pt) | 2021-03-30 |
| EP3814547A1 (en) | 2021-05-05 |
| US11628503B2 (en) | 2023-04-18 |
| CN112292482A (zh) | 2021-01-29 |
| JP2021529098A (ja) | 2021-10-28 |
| WO2020002500A1 (en) | 2020-01-02 |
| RU2769502C1 (ru) | 2022-04-01 |
| JP7407747B2 (ja) | 2024-01-04 |
| KR20210023889A (ko) | 2021-03-04 |
| US20210123140A1 (en) | 2021-04-29 |
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