CN112267095B - PVD (physical vapor deposition) coating method for die - Google Patents
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- CN112267095B CN112267095B CN202010965277.3A CN202010965277A CN112267095B CN 112267095 B CN112267095 B CN 112267095B CN 202010965277 A CN202010965277 A CN 202010965277A CN 112267095 B CN112267095 B CN 112267095B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a PVD coating method of a mould, which comprises the steps of polishing, cleaning and drying the surface of the mould; pumping air out of the reaction furnace and heating; the mould is sent into a reaction furnace, and the oxide on the surface of the mould is removed after ventilation; and ionizing the target material into an ionic state in stages by taking time as a unit and respectively using a bias voltage of 20V-40V, a bias pressure environment of 2.0Pa-3.0Pa, a bias pressure environment of 40V-135V and a bias pressure environment of 3.0Pa-5.0Pa, depositing the ionic state on the surface of the die to sequentially form a transition layer and a working layer, and finally forming a coating on the surface of the die. The PVD coating method for the die can improve the surface hardness and the wear resistance of the die, meet the working conditions of the die, and improve the service life of the die and the quality of a formed part.
Description
Technical Field
The invention relates to the field of PVD coatings, in particular to a PVD coating method for a die.
Background
PVD, an acronym of Physical Vapor Deposition, refers to a technique of low-voltage and high-current arc discharge under vacuum conditions, in which a target is evaporated by gas discharge and both the evaporated material and gas are ionized, and the evaporated material and its reaction product are deposited on a workpiece by acceleration of an electric field.
The technology of PVD coating is widely used in industry, where the high and low die life directly determines the production efficiency and the manufacturing cost. And for dies with more stringent operating conditions, surface wear is an important factor affecting die life. Particularly, for a fine stamping die, the punch and die are seriously abraded under a narrow stamping clearance. The surface hardness and the wear resistance of the die can be effectively improved by plating on the surface of the die, and the PVD coating technology is an effective method for prolonging the service life and improving the production efficiency of most dies. At present, for fine blanking dies, common coatings are TiC, TiN and TiAlN, which are all coatings formed by bombarding a target material with electrons to gasify the surface of the target material into gaseous atoms, molecules or partially ionized ions, and depositing a film on the surface of a workpiece through a low-pressure gas process.
Compared with the coatings, the AlCrN coating has higher high-temperature oxidation resistance temperature, smaller friction coefficient and better wear resistance, and when the AlCrN coating is prepared, the coating is formed on the surface of a workpiece by deposition by setting fixed bias voltage and air pressure in the traditional method. By controlling the bias voltage and the air pressure in the preparation process, atoms of the target material can be better deposited on a workpiece panel, so that the hardness of the coating is increased, the oxidation resistance is improved, and the deposition rate is improved.
Disclosure of Invention
In view of the above, the present invention provides a method for PVD coating of a mold, which improves the high temperature oxidation resistance, reduces the friction coefficient, increases the wear resistance, increases the hardness of the coating, and improves the deposition rate of the conventional PVD coating.
In order to achieve the above object, the technical solution of the present invention for solving the technical problems is to provide a PVD coating method for a mold, which comprises the steps of: polishing, cleaning and drying the surface of the die; pumping air out of the reaction furnace and heating; the mould is sent into a reaction furnace, and the oxide on the surface of the mould is removed after ventilation; and ionizing the target material into an ionic state in stages by taking time as a unit and respectively using a bias voltage of 20V-40V, a bias pressure environment of 2.0Pa-3.0Pa, a bias pressure environment of 40V-135V and a bias pressure environment of 3.0Pa-5.0Pa, depositing the ionic state on the surface of the die to sequentially form a transition layer and a working layer, and finally forming a coating on the surface of the die.
Further, the thickness of the coating is 2.5-3.5 mu m.
Further, after the surface of the die is polished, the roughness of the surface of the die is less than Ra0.4.
Further, the heating temperature of the reaction furnace is 500 ℃, and the heating duration is 1 h.
Further, the polishing, cleaning and drying the surface of the mold comprises: polishing the surface of the die; cleaning the mould by using an alkaline cylinder; cleaning the die by using ultrasonic waves; cleaning the mold by combined rinsing; and drying the die.
Further, drying the mold comprises: pumping the reaction furnace; and heating the reaction furnace.
Further, the step of feeding the mold into the reaction furnace and removing the oxide on the surface of the mold after the aeration comprises the following steps: adding argon and hydrogen to form a reaction environment; and controlling the bias voltage and the air pressure to remove the oxide on the surface of the mold.
Further, the step of ionizing the target material into an ionic state by taking time as a unit and respectively using a bias voltage of 20V-40V, a bias pressure environment of 2.0Pa-3.0Pa, a bias pressure environment of 40V-135V and a bias pressure environment of 3.0Pa-5.0Pa, and depositing the ionic state on the surface of the mold to sequentially form the transition layer and the working layer, and finally forming the coating on the surface of the mold comprises the following steps: setting an environment with the bias voltage of 20V and the air pressure of 2.0Pa in the reaction furnace for 60 min; setting an environment with a bias voltage of 40V and a gas pressure of 3.0Pa in the reaction furnace for 20 min; setting the bias voltage in the reaction furnace at 135V and the air pressure at 5.0Pa for 100 min; and setting the internal bias pressure of the reaction furnace to be 40V and the air pressure to be 3.0Pa for 30 min.
Further, the two targets are CrAl and LaB respectively6CrAl。
Furthermore, the number of the two targets is 4, the diameters of the two targets are 160mm, the thicknesses of the two targets are 12mm, and the purities of the two targets are more than 99.98%.
Compared with the prior art, the PVD coating method for the die provided by the invention has the following beneficial effects:
the method can improve the hardness and the wear resistance of the surface of the die, meet the working conditions of the die, and improve the service life of the die and the quality of a formed part.
The above-described embodiments of the present invention should not be construed as limiting the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.
Drawings
FIG. 1 is a schematic flow chart showing steps of a PVD coating method for a mold according to a first embodiment of the invention;
FIG. 2 is a schematic view of a sub-flow of step S1 in FIG. 1;
FIG. 3 is a schematic view of a sub-flowchart of step S2 in FIG. 1;
FIG. 4 is a flowchart illustrating a sub-step of step S3 in FIG. 1;
fig. 5 is a flowchart illustrating a sub-step of step S4 in fig. 1.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1, the present invention provides a PVD coating method for a mold, which includes the steps of:
s1, polishing, cleaning and drying the surface of the die;
specifically, after the mold is machined, the surface roughness of the mold does not necessarily meet the requirement for preparing the coating, so the operations of polishing, cleaning and drying the surface of the mold are required. The surface of the die is polished to ensure that the roughness of the surface of the die is less than Ra0.4, and the die is cleaned and dried by utilizing an alkaline cylinder for cleaning, ultrasonic cleaning and combined rinsing and drying to ensure that no residual moisture, no corrosion and no lubricating oil exist on the die, so that preparation is made for subsequent steps.
S2, exhausting and heating the reaction furnace;
specifically, when the coating is prepared on the surface of the mold, the reaction furnace for preparing the coating needs to be pumped and heated. Wherein, the air extraction is to extract all the air in the reaction furnace from the reaction furnace so as to form a hollow state in the reaction furnace. The heating is to heat the temperature in the reaction furnace to 500 ℃, and continuously heat for 1h, so as to evaporate the water in the reaction furnace and ensure that no residual water exists in the reaction furnace when the surface coating of the die is prepared.
S3, feeding the mould into a reaction furnace, ventilating and removing oxides on the surface of the mould;
specifically, after the mold is polished, cleaned and dried in step S1, the rust and the lubricating oil on the surface of the mold are removed, but the oxidation traces on the surface of the mold are difficult to be polished and cleaned in case the mold is used or prevented for a long time. Therefore, the mold is placed in a reaction furnace, argon and hydrogen are introduced to form a reaction environment, and the oxide on the surface of the mold is removed by controlling the bias voltage and the air pressure.
It can be understood that, depending on the material of the mold, the bias voltage and the gas pressure are not selected when removing the surface oxide, and in this embodiment, the bias voltage is controlled within the range of 100-200V, and the gas pressure is controlled within the range of 2.0-5.0 Pa.
It is understood that the time for removing the surface oxide in step S3 is different according to the material of the mold, and in this embodiment, the visual effect of removing the surface oxide of the mold is 45 min.
And S4, respectively ionizing the target material into an ionic state in stages by taking time as a unit and respectively using a bias voltage of 20V-40V, a bias pressure environment of 2.0Pa-3.0Pa, a bias pressure environment of 40V-135V and a bias pressure environment of 3.0Pa-5.0Pa, and depositing the ionic state on the surface of the mold to sequentially form a transition layer and a working layer, and finally forming a coating on the surface of the mold.
Specifically, after removing oxides on the surface of the mold, nitrogen is introduced into a reaction furnace to form a reaction environment, bias voltage and air pressure are controlled in different stages by taking time as a unit, two targets are bombarded by electrons to sputter target particles, and the target particles are deposited on the surface of the mold to form a film system under the influence of the air pressure, namely a plurality of target particles are coated on the surface of the mold so as to form a coating. Wherein the forming of the transition layer is to control the bias voltage in the reaction furnace to be 20V-40V, the air pressure to be 3.0Pa and the duration to be 80min, and the forming of the working layer is to control the bias voltage in the reaction furnace to be 40-135V, the air pressure to be 3.0Pa-5.0Pa and the duration to be 130 min.
It will be appreciated that the transition layer is located on the surface of the mould and the working layer is located on the surface of the transition layer, i.e. after the transition layer has been formed, the working layer is formed and finally the coating on the surface of the mould is formed. Through the mode of layering, the hardness of the finally formed coating is higher, and the wear resistance is stronger.
It can be understood that the two targets in this embodiment are CrAl and LaB, respectively6CrAl, the size of the target material is 160mm in diameter and 12mm in thickness, and the purity of the two target materials is more than 99.98%.
It can be understood that when the coating is prepared, the La rare earth element is added, so that the thermal stability of the coating can be further improved, and the hardness of the coating can be increased.
It is understood that the reactor is a coater.
It can be understood that the adhesion of the coating to the mold is improved by applying different bias voltages and air pressures in stages, and the deposition of impurities on the surface of the coating is reduced, thereby improving the surface quality of the coating. In this example, the bias voltage of the reaction furnace at the time of preparing the coating was 20 to 140V, and the gas pressure was 2.0 to 5.0 Pa.
It can be understood that the step-by-step application of different bias voltages and air pressures is to divide the process of bombarding the target material by electrons into a plurality of steps, and the bias voltage and the air pressure of each step are different, so that the ions bombarded by the target material can better form a coating in the form of a thin film on the surface of the workpiece.
Furthermore, the LaB6 content of the coating is 5at.%, and the thickness is 2.5-3.5 μm.
Referring to fig. 2, step S1 further includes the sub-steps of:
s11, polishing the surface of the die;
specifically, the surface of the mold is polished to have a roughness less than ra0.4, and the polishing mode can be a polishing machine or manual polishing by using sand paper.
S12, cleaning the die by using an alkaline cylinder;
specifically, the alkaline cylinder is cleaned by using a cleaning agent with the pH value larger than 7 to clean the die.
S13, cleaning the die by using ultrasonic waves;
specifically, ultrasonic cleaning (ultrasonic cleaning) is to disperse, emulsify and peel off a dirt layer to achieve the purpose of cleaning by utilizing the direct and indirect action of cavitation action, acceleration action and direct current action of ultrasonic waves in liquid on liquid and dirt.
S14, washing the die by combined rinsing;
specifically, the mold is cleaned by rinsing the mold from the contaminants cleaned in steps S12 and S13.
S15, drying the die;
specifically, after the mold is cleaned, the moisture on the mold is heated and dried.
Referring to fig. 3, step S2 further includes the sub-steps of:
s21, exhausting the reaction furnace;
specifically, before the reaction furnace is not used, air is arranged in the reaction furnace, and the air is pumped out of the reaction furnace in an air pumping mode, so that the interior of the reaction furnace is hollow.
S22, heating the reaction furnace;
referring to fig. 4, step S3 further includes the sub-steps of:
s31, adding argon and hydrogen to form a reaction environment;
specifically, a mixed gas of argon and hydrogen is added into the reaction furnace to form a reaction environment convenient for preparing coatings with different colors.
It will be appreciated that the addition of different gases to the furnace will have different effects on the colour of the final coating, for example, where the gases added are argon and hydrogen, as opposed to the final colour of a coating prepared with argon alone.
S32, removing the oxide on the surface of the mould by controlling the bias pressure and the air pressure;
specifically, by controlling the bias voltage and the gas in the reaction furnace, the surface of the mold is hit with electrons to remove the oxide on the surface of the mold.
Referring to fig. 5, step S4 further includes the sub-steps of:
s41, setting the internal bias pressure of the reaction furnace to be 20V and the air pressure to be 2.0Pa, and keeping for 60 min;
specifically, in the first stage, the target is impacted by electrons for 60min under the environment of 20V bias and 2.0Pa air pressure.
S42, setting the internal bias pressure of the reaction furnace to be 40V and the air pressure to be 3.0Pa, and keeping for 20 min;
specifically, in the second stage, the target is impacted by electrons for 20min under the environment of 40V bias and 2.0Pa air pressure.
S43, setting the bias voltage in the reaction furnace to be 135V and the air pressure to be 5.0Pa, and keeping for 100 min;
specifically, in the third stage, the target is impacted by electrons for 100min under the environment of bias voltage of 135V and air pressure of 5.0 Pa.
S44, setting the bias voltage in the reaction furnace to be 40V and the air pressure to be 3.0Pa, and keeping for 30 min;
specifically, in the fourth stage, the target is impacted by electrons for 30min under the environment of 40V bias and 3.0Pa air pressure.
The adhesion of the coating and the die is improved by applying different bias voltages and air pressures in stages, and the impurity deposition on the surface of the coating is reduced, so that the surface quality of the coating is improved.
It is understood that steps S41 to S41 are to form a transition layer on the surface of the mold, and steps S43 to S44 are to form a working layer on the surface of the transition layer.
Compared with the prior art, the PVD coating method for the die provided by the invention has the following beneficial effects:
the method can improve the hardness and the wear resistance of the surface of the die, meet the working conditions of the die, and improve the service life of the die and the quality of a formed part.
The above-described embodiments of the present invention should not be construed as limiting the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.
Claims (7)
1. A PVD coating method for a die, comprising the steps of:
polishing, cleaning and drying the surface of the die;
pumping air out of the reaction furnace and heating;
the mould is sent into a reaction furnace, and the oxide on the surface of the mould is removed after ventilation; and
respectively ionizing the target material into an ionic state in stages by taking time as a unit and respectively using a bias voltage of 20V-40V, an air pressure environment of 2.0Pa-3.0Pa, a bias voltage of 40V-135V and an air pressure environment of 3.0Pa-5.0Pa, depositing the ionic state on the surface of the die to sequentially form a transition layer and a working layer, and finally forming a coating on the surface of the die;
the step of ionizing the target material into an ionic state by taking time as a unit and respectively using a bias voltage of 20V-40V, a pressure environment of 2.0Pa-3.0Pa, a bias voltage of 40V-135V and a pressure environment of 3.0Pa-5.0Pa, and depositing the ionic state on the surface of the mold to sequentially form a transition layer and a working layer, and finally forming the coating on the surface of the mold comprises the following steps of:
setting an environment with the bias voltage of 20V and the air pressure of 2.0Pa in the reaction furnace for 60 min;
setting an environment with a bias voltage of 40V and a gas pressure of 3.0Pa in the reaction furnace for 20 min;
setting the bias voltage in the reaction furnace at 135V and the air pressure at 5.0Pa for 100 min; and
setting the internal bias pressure of the reaction furnace to be 40V and the air pressure to be 3.0Pa for 30 min;
the two targets are CrAl and LaB respectively6CrAl；
The number of the two targets is 4, the diameter of each target is 160mm, the thickness of each target is 12mm, the purity of each target is more than 99.98%, the LaB6 content of the coating is 5at.%, and the thickness of each target is 2.5-3.5 μm.
2. A PVD coating process for a mold as in claim 1 wherein:
the thickness of the coating is 2.5-3.5 mu m.
3. A PVD coating process for a mold as in claim 1 wherein:
and after the surface of the die is polished, the roughness of the surface of the die is less than Ra0.4.
4. A PVD coating process for a mold as in claim 1 wherein:
the heating temperature of the reaction furnace is 500 ℃, and the heating duration is 1 h.
5. A PVD coating process for a mold as in claim 1 wherein said polishing, cleaning and drying the mold surface comprises:
polishing the surface of the die;
cleaning the mould by using an alkaline cylinder;
cleaning the die by using ultrasonic waves;
cleaning the mold by combined rinsing; and
and drying the die.
6. A PVD coating process for a mold as in claim 1 wherein said drying the mold comprises:
pumping the reaction furnace; and
and heating the reaction furnace.
7. A PVD coating process for a mold as in claim 1 wherein the step of introducing the mold into a reaction furnace and removing oxides from the mold surface after venting comprises:
adding argon and hydrogen to form a reaction environment; and
and controlling the bias voltage and the air pressure to remove the oxide on the surface of the mold.
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