CN112210758A - 金属化薄膜蒸镀用错位组合式料炉 - Google Patents
金属化薄膜蒸镀用错位组合式料炉 Download PDFInfo
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- CN112210758A CN112210758A CN202011008293.XA CN202011008293A CN112210758A CN 112210758 A CN112210758 A CN 112210758A CN 202011008293 A CN202011008293 A CN 202011008293A CN 112210758 A CN112210758 A CN 112210758A
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- baffle
- baffle plate
- plate
- furnace
- furnace body
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- 238000001704 evaporation Methods 0.000 title claims abstract description 37
- 230000008020 evaporation Effects 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 title claims abstract description 29
- 239000011104 metalized film Substances 0.000 title claims abstract description 14
- 230000007246 mechanism Effects 0.000 claims abstract description 23
- 238000007789 sealing Methods 0.000 claims description 54
- 238000010030 laminating Methods 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 230000000712 assembly Effects 0.000 description 5
- 238000000429 assembly Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011008293.XA CN112210758B (zh) | 2020-09-23 | 2020-09-23 | 金属化薄膜蒸镀用错位组合式料炉 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011008293.XA CN112210758B (zh) | 2020-09-23 | 2020-09-23 | 金属化薄膜蒸镀用错位组合式料炉 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112210758A true CN112210758A (zh) | 2021-01-12 |
CN112210758B CN112210758B (zh) | 2022-08-12 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202011008293.XA Active CN112210758B (zh) | 2020-09-23 | 2020-09-23 | 金属化薄膜蒸镀用错位组合式料炉 |
Country Status (1)
Country | Link |
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CN (1) | CN112210758B (zh) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003253433A (ja) * | 2002-03-01 | 2003-09-10 | Ulvac Japan Ltd | 薄膜形成装置 |
JP2008231446A (ja) * | 2007-03-16 | 2008-10-02 | Seiko Epson Corp | インライン式蒸着装置および成膜方法 |
CN103866238A (zh) * | 2014-03-07 | 2014-06-18 | 京东方科技集团股份有限公司 | 一种真空蒸镀装置 |
US20160122866A1 (en) * | 2014-10-31 | 2016-05-05 | Industrial Technology Research Institute | Evaporation system and evaporation method |
CN106521412A (zh) * | 2016-11-30 | 2017-03-22 | 京东方科技集团股份有限公司 | 一种蒸镀掩模板及蒸镀方法 |
CN107400858A (zh) * | 2017-09-18 | 2017-11-28 | 京东方科技集团股份有限公司 | 蒸发源及蒸镀系统 |
CN208008878U (zh) * | 2018-01-11 | 2018-10-26 | 韦周萍 | 一种高质量氧化铝真空镀膜装置 |
CN208472180U (zh) * | 2018-07-18 | 2019-02-05 | 广东迈特斐薄膜科技有限公司 | 一种低功率损耗电容器用金属化膜的蒸镀装置 |
-
2020
- 2020-09-23 CN CN202011008293.XA patent/CN112210758B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003253433A (ja) * | 2002-03-01 | 2003-09-10 | Ulvac Japan Ltd | 薄膜形成装置 |
JP2008231446A (ja) * | 2007-03-16 | 2008-10-02 | Seiko Epson Corp | インライン式蒸着装置および成膜方法 |
CN103866238A (zh) * | 2014-03-07 | 2014-06-18 | 京东方科技集团股份有限公司 | 一种真空蒸镀装置 |
US20160122866A1 (en) * | 2014-10-31 | 2016-05-05 | Industrial Technology Research Institute | Evaporation system and evaporation method |
CN106521412A (zh) * | 2016-11-30 | 2017-03-22 | 京东方科技集团股份有限公司 | 一种蒸镀掩模板及蒸镀方法 |
CN107400858A (zh) * | 2017-09-18 | 2017-11-28 | 京东方科技集团股份有限公司 | 蒸发源及蒸镀系统 |
CN208008878U (zh) * | 2018-01-11 | 2018-10-26 | 韦周萍 | 一种高质量氧化铝真空镀膜装置 |
CN208472180U (zh) * | 2018-07-18 | 2019-02-05 | 广东迈特斐薄膜科技有限公司 | 一种低功率损耗电容器用金属化膜的蒸镀装置 |
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CN112210758B (zh) | 2022-08-12 |
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Address after: 244000, Floor 1, Building 15, Science and Technology Innovation Park, East of Tongjingshan Avenue and North of Tongjing East Road, Shizishan High tech Zone, Tongguan District, Tongling City, Anhui Province Patentee after: Tongling Chaoyue Electronics Co.,Ltd. Country or region after: China Address before: 244000 No. 1111, east section of Weiyi Road, Shizishan District, Tongling City, Anhui Province (1 plant and 2 warehouse) Patentee before: TONGLING BEYOND ELECTRONICS Co.,Ltd. Country or region before: China |