CN112034626A - High-flux 3D dark spot generating device - Google Patents
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- CN112034626A CN112034626A CN202010863942.8A CN202010863942A CN112034626A CN 112034626 A CN112034626 A CN 112034626A CN 202010863942 A CN202010863942 A CN 202010863942A CN 112034626 A CN112034626 A CN 112034626A
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- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
The invention discloses a high-flux 3D dark spot generating device.A parallel light beam array passes through a device of a transverse high-flux dark spot array, each light beam is modulated into vortex phase light, and transverse dark spots are formed after focusing; focusing the parallel light beam array to form a transverse dark spot array; after the parallel light beam array passes through a device of the longitudinal high-flux dark spot array, each light beam is modulated into 0-pi phase distribution, and each light beam is focused to form a longitudinal dark spot; focusing the parallel light beam array to form a longitudinal dark spot array; and combining the two light beams, and after focusing, carrying out incoherent superposition on the two light spots to form a high-flux 3D dark spot array. The invention can provide a stable high-quality high-flux 3D dark spot array; the device has low cost and small volume, and can realize high integration of the system; the method can be used for realizing parallel double-beam laser direct writing and parallel stimulated emission loss microscopic imaging, and greatly improves the processing and imaging speed.
Description
Technical Field
The invention belongs to the field of optical engineering, and particularly relates to a high-flux 3D dark spot generation device.
Background
Micro-nano manufacturing technology is receiving wide attention as a core technology for micro-nano device preparation and a support technology of modern information industry. The electron beam exposure and focused ion beam etching technology which is widely applied at present has low efficiency and is only suitable for small-area preparation and phenomenon level research. The high-resolution lithography technology applied to large-scale production lines cannot meet the requirements of scientific research and product proofing. With the development of the technology, the demand of people changes from two dimensions to any three-dimensional structure, which cannot be realized by the above technology. Laser direct writing benefits from nonlinear optical effects, has the advantages of no mask and no vacuum, and has been widely used as a three-dimensional nano-fabrication means. But is limited by the diffraction limit and its resolution cannot break through half a wavelength. The adoption of the deep ultraviolet light source can greatly improve the resolution, but the technical difficulty in the design, manufacture and integration of an optical system is increased sharply, and the real application is difficult to realize.
The double-beam laser direct writing technology is a novel three-dimensional nanometer processing technology based on the laser direct writing technology, and on the basis of the traditional laser printing technology, a beam of hollow loss light beam (dark spot) is added and superposed on a direct writing light beam limited by a diffraction limit, so that a direct writing light beam is inhibited from causing a material photopolymerization area, and the direct writing resolution is improved to 50nm or even higher. However, the current technology is limited by single-path optical direct writing, has a slow processing speed, and cannot realize industrialized large-scale application. The parallel processing of multiple direct-writing light beams is the most direct and effective method for improving the processing speed, and therefore a high-flux dark spot array is needed to be matched with the multiple direct-writing light beams to realize rapid laser direct writing. Meanwhile, the method can also be applied to the stimulated depletion super-resolution imaging technology and is used for realizing parallel rapid super-resolution imaging.
Disclosure of Invention
The invention aims to provide a high-throughput 3D dark spot generation device aiming at the defects of the prior art.
The purpose of the invention is realized by the following technical scheme: a high-flux 3D dark spot generating device comprises a beam splitter prism, a first quarter wave plate, a transverse high-flux dark spot generating device, a first reflecting mirror, a second half wave plate, a second quarter wave plate, a longitudinal high-flux dark spot generating device, a beam combiner prism, a micro-lens array, a first lens and a second lens; the beam splitting prism divides incident light into two paths, and one path of the incident light sequentially passes through the first half-wave plate, the first quarter-wave plate, the transverse high-flux dark spot generating device and the first reflector and then enters the beam combining prism; the other path of emergent light of the beam splitting prism sequentially passes through the second reflecting mirror, the second half-wave plate, the second quarter-wave plate and the longitudinal high-flux dark spot generating device and then enters the beam combining prism; the two paths of light pass through the beam-combining prism, then pass through the micro-lens array, the first lens and the second lens in sequence, and finally form an image at the focal plane of the second lens.
Further, the incident light is a linearly polarized parallel square beam array.
Further, the transverse high-flux dark spot generating device and the longitudinal high-flux dark spot generating device are transparent substrates with surfaces on two sides respectively coated with a light shielding layer and an antireflection film, the light shielding layer is etched, an array is formed at the etching position, and the etching positions of the two devices are the same.
Further, the transparent substrate is glass or plastic.
Further, a 0-2 pi vortex phase plate is engraved on the transparent substrate of the transverse high-flux dark spot generating device, the engraving position is the same as the etching position of the light shielding layer, and a 0-2 pi vortex phase array is formed.
Further, the 0-2 pi vortex phase array in the transverse high-flux dark spot generating device is distributed in the same way as the light beam array of the incident light.
Further, a 0-pi phase plate is engraved on the transparent substrate of the longitudinal high-flux dark spot generating device, and the engraving position is the same as the etching position of the light shielding layer, so that a 0-pi phase array is formed.
Further, the 0-pi phase array in the longitudinal high-flux dark spot generating device is distributed in the same way as the light beam array of the incident light.
The invention has the beneficial effects that: after the parallel excitation light array passes through a device of a transverse high-flux dark spot array, each beam of light is modulated into vortex phase light, and transverse dark spots can be formed after each beam of light is focused; a transverse dark spot array is formed after parallel light beams are focused; after parallel exciting light passes through a device of the longitudinal high-flux dark spot array, each beam of light is modulated into 0-pi phase distribution, and a longitudinal dark spot is formed after each beam of light is focused; a longitudinal dark spot array is formed after parallel light beams are focused; and combining the two light beams, and after focusing, carrying out incoherent superposition on the two light spots to form a high-flux 3D dark spot array. The invention can provide a stable high-quality high-flux 3D dark spot array; the device cost is low, the volume is small, and the high integration of the system can be realized; the parallel double-beam laser direct writing and parallel stimulated emission loss microscopic imaging can be realized, and the processing and imaging speeds are greatly improved.
Drawings
FIG. 1 is a schematic diagram of a device for producing lateral high flux dark spots according to the present invention;
FIG. 2 is a schematic of the lateral flux dark spot produced by the present invention;
FIG. 3 is a schematic diagram of a device for producing longitudinal high flux dark spots according to the present invention;
FIG. 4 is a schematic illustration of longitudinal flux dark spots produced by the present invention;
FIG. 5 is a schematic diagram of an apparatus for generating high-flux 3D dark spots according to the present invention;
FIG. 6 is a schematic diagram of the high-throughput 3D dark spots generated by the present invention;
in the figure, a beam splitting prism 1, a first one-half wave plate 2, a first one-quarter wave plate 3, a transverse high-flux dark spot generating device 4, a first reflecting mirror 5, a second reflecting mirror 6, a second one-half wave plate 7, a second one-quarter wave plate 8, a longitudinal high-flux dark spot generating device 9, a beam combining prism 10, a micro-lens array 11, a first lens 12 and a second lens 13.
Detailed Description
The device for generating the high-flux 3D dark spots comprises a transverse high-flux dark spot generating device and a longitudinal high-flux dark spot generating device, wherein the transverse high-flux dark spot generating device and the longitudinal high-flux dark spot generating device are transparent substrates with light shielding layers and anti-reflection films respectively plated on the surfaces of two sides; the transparent substrate is glass or plastic; the antireflection film is used for ensuring the transmittance of the device; in particular, if the transmittance requirement is not high, the antireflection film may be omitted. The two devices adopt a high-precision etching technology to etch the shading layer on the surface of the transparent substrate, the etching positions form an array, and the etching positions of the two devices are the same.
As shown in fig. 1, according to the selected laser wavelength, a 0-2 pi vortex phase plate is engraved on the transparent substrate of the transverse high-flux dark spot generating device, and the engraving position is the same as the etching position of the light shielding layer, so that a 0-2 pi vortex phase array is obtained. When the light beam array passes through the transverse high-flux dark spot generation device, each light beam is modulated by the 0-2 pi vortex phase plate, and a transverse hollow dark spot shown in figure 2 is generated after focusing. This example produces a 10 x 10 array of transverse dark spots comprising 10 x 10 0-2 pi vortex phase plates on the transverse high-throughput dark spot generating device, but the number and arrangement is not limited thereto.
As shown in fig. 3, according to the selected laser wavelength, a 0-pi phase plate is engraved on the transparent substrate of the longitudinal high-flux dark spot generating device, the engraving position is the same as the etching position of the light shielding layer, a 0-pi phase array is obtained, and the arrangement of the 0-pi phase array determines the final arrangement of the longitudinal dark spot array. When the light beam array passes through the longitudinal high-flux dark spot generating device, each light beam is modulated by the 0-pi phase plate, and a longitudinal hollow dark spot shown in figure 4 is generated after focusing. This example produces a 10 x 10 array of transverse dark spots, with 10 x 10 0-pi phase plates on the longitudinal high-throughput dark spot producing device, but the number and arrangement is not limited to this.
The arrangement of the two arrays determines the arrangement of the final dark spot array; the center of each phase mask in the two arrays is coaxial with the center of the light beam incident on the phase mask, and the phase delay is matched with the wavelength of the incident light.
As shown in fig. 5, a high-flux 3D dark spot generating apparatus based on the two devices includes a beam splitter prism 1, a first quarter-wave plate 2, a first quarter-wave plate 3, a transverse high-flux dark spot generating device 4, a first mirror 5, a second mirror 6, a second half-wave plate 7, a second quarter-wave plate 8, a longitudinal high-flux dark spot generating device 9, a beam combiner prism 10, a micro-lens array 11, a first lens 12, and a second lens 13. The light splitting prism 1 splits incident light into two paths, wherein one path is used for generating a transverse high-flux dark spot array, and the other path is used for generating a longitudinal high-flux dark spot array; the first one-half wave plate 2, the first one-quarter wave plate 3, the transverse high-flux dark spot generating device 4 and the first reflector 5 are sequentially arranged on a transverse dark spot array generating light path; the second reflector 6, the second half-wave plate 7, the second quarter-wave plate 8, the longitudinal high-flux dark spot generating device 9 and the beam combining prism 10 are sequentially arranged on a longitudinal high-flux dark spot generating light path; the beam combining prism 10 combines the two paths of light; the microlens array 11, the first lens 12, and the second lens 13 are sequentially disposed on the light path after the closing. The incident light is a square beam array, such as a square or rectangular array; the high-flux 3D dark spot focused on the sample by the beam array can be used for realizing double-beam laser direct writing processing or realizing super-resolution imaging; in order to make the light intensity distribution of the light spot projected on the sample more uniform, both the light beam passing through the device and the light beam before focusing should be converted into circularly polarized light.
Specifically, the linearly polarized parallel light beam array is divided into two paths by a beam splitter prism 1, and one path of the linearly polarized parallel light beam array is modulated into circularly polarized light after passing through a first half wave plate 1 and a first quarter wave plate 3; then passing through a transverse high-flux dark spot generating device 4, wherein the 0-2 pi vortex phase mask distribution in the device corresponds to the light beams in the laser beam array one by one, and each light beam in the laser beam array is modulated by the 0-2 pi vortex phase; the modulated light beam array is reflected to a beam combining prism 10 through a first reflector 5; the other path of light split by the beam splitting prism 1 is reflected by the second reflecting mirror 6 and is modulated into circularly polarized light through the second half wave plate 7 and the second quarter wave plate 8 in sequence; then, a longitudinal high-flux dark spot generating device 9 is used, the 0-pi phase mask distribution in the device corresponds to the light beams in the laser beam array one by one, and each light beam in the laser beam array is modulated by the 0-pi phase; the modulated light is incident on the beam combining prism 10 and is combined with the reflected light on the first reflector 5; the combined light passes through the micro lens array 11, forms a high-flux 3D dark spot array at the focal plane of the micro lens array 11, and is imaged at the focal plane of the second lens 13 by a 4f system consisting of the first lens 12 and the second lens 13. Taking a 10 × 10 beam as an example, the generated high-throughput 3D dark spot array is shown in fig. 6.
The above description is only exemplary of the basic method of the present invention and should not be construed as limiting the present invention, and any modifications, equivalents, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (8)
1. A high-flux 3D dark spot generating device is characterized by comprising a beam splitter prism, a first quarter wave plate, a transverse high-flux dark spot generating device, a first reflecting mirror, a second half wave plate, a second quarter wave plate, a longitudinal high-flux dark spot generating device, a beam combining prism, a micro-lens array, a first lens and a second lens; the beam splitting prism divides incident light into two paths, and one path of the incident light sequentially passes through the first half-wave plate, the first quarter-wave plate, the transverse high-flux dark spot generating device and the first reflector and then enters the beam combining prism; the other path of emergent light of the beam splitting prism sequentially passes through the second reflecting mirror, the second half-wave plate, the second quarter-wave plate and the longitudinal high-flux dark spot generating device and then enters the beam combining prism; the two paths of light pass through the beam-combining prism, then pass through the micro-lens array, the first lens and the second lens in sequence, and finally form an image at the focal plane of the second lens.
2. The high-throughput 3D dark spot generating device according to claim 1, wherein the incident light is an array of linearly polarized light beams with parallel optical axes and the same polarization direction.
3. The high-throughput 3D dark spot generation device according to claim 1, wherein the transverse high-throughput dark spot generation device and the longitudinal high-throughput dark spot generation device are transparent substrates with light shielding layers and antireflection films respectively plated on two side surfaces, the light shielding layers are etched, an array is formed at the etching positions, and the etching positions of the two devices are the same.
4. The high-throughput 3D dark spot generating device according to claim 3, wherein said transparent substrate is glass or plastic.
5. The high-throughput 3D dark spot generation device according to claim 3, wherein a 0-2 pi vortex phase plate is engraved on the transparent substrate of the transverse high-throughput dark spot generation device, and the engraving position is the same as the light shielding layer etching position, so that a 0-2 pi vortex phase array is formed.
6. The high-throughput 3D dark spot generation apparatus of claim 5, wherein the 0-2 pi vortex phased array in the transverse high-throughput dark spot generation device is co-distributed with the incident light beam array.
7. The high-throughput 3D dark spot generation device according to claim 3, wherein a 0-pi phase plate is written on the transparent substrate of the longitudinal high-throughput dark spot generation device at the same position as the light shielding layer etching position to form a 0-pi phase array.
8. The high-throughput 3D dark spot generation device according to claim 3, wherein a 0-pi phase plate is written on the transparent substrate of the longitudinal high-throughput dark spot generation device at the same position as the light shielding layer etching position to form a 0-pi phase array.
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