CN111996500A - Evaporation coating equipment for in-situ Raman spectrum detection - Google Patents

Evaporation coating equipment for in-situ Raman spectrum detection Download PDF

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Publication number
CN111996500A
CN111996500A CN202010946452.4A CN202010946452A CN111996500A CN 111996500 A CN111996500 A CN 111996500A CN 202010946452 A CN202010946452 A CN 202010946452A CN 111996500 A CN111996500 A CN 111996500A
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thermal evaporation
raman spectrum
water
pipe
evaporation
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金炯�
张金徽
王山
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Zhejiang Saiweike Photoelectric Technology Co Ltd
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Zhejiang Saiweike Photoelectric Technology Co Ltd
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Priority to CN202010946452.4A priority Critical patent/CN111996500A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An evaporation coating device for in-situ Raman spectrum detection comprises an end cover, a thermal evaporation cavity, a film thickness detection mechanism, a thermal evaporation mechanism and a vacuum mechanism, wherein the end cover is connected to a coating chamber, a Raman detection port, a photoelectric component and an observation window are arranged on the end cover, the thermal evaporation cavity is positioned on the end cover, the film thickness detection mechanism and the film thickness detection mechanism are used for detecting the thickness of a coated substrate, the vacuum mechanism is used for carrying out vacuum in the thermal evaporation cavity, the thermal evaporation mechanism comprises a power magnetic force rotating shaft, a separation blade, a master water-cooling electrode, a plurality of groups of sub water-cooling electrodes and a plurality of evaporation boats, the evaporation boats are respectively connected between the master water-cooling electrode and each group of sub water-cooling electrodes, one end of the power magnetic force rotating shaft extends into the thermal evaporation cavity and is connected with the separation blade; the invention has the advantages that the invention can respectively carry out thermal evaporation on a plurality of different film materials in the same cavity and carry out Raman spectrum detection on the coated substrate.

Description

Evaporation coating equipment for in-situ Raman spectrum detection
Technical Field
The invention relates to the technical field of coating equipment, in particular to evaporation coating equipment for in-situ Raman spectrum detection.
Background
The coating is widely applied, generally, automobile coating and optical lens coating are common, the coating of the optical lens is aimed at, the modern optical lens is usually coated with a single-layer or multi-layer magnesium fluoride antireflection film, a coating chamber is connected below an end cover in the coating chamber, the two are detachable, the existing coating mode is to gasify and spray a coating material to be coated by a spray gun to spray the coating material on a substrate to be coated, the coating mode is not strict, the gasification of the coating material is not realized in a vacuum environment, the metal coating material is easily oxidized after being gasified, the coating is not uniform due to the influence of air, and the rapid switching of the coating material cannot be realized; in addition, the existing film coating mode is that the substrate is manually taken out after being coated and then put into a detection mechanism for in-situ Raman spectrum detection, so the problem to be solved by the invention is how to switch the film material of the substrate in a vacuum environment, and the in-situ Raman spectrum detection is simultaneously applied to the film coating equipment, and the film coating and the detection are carried out firstly without taking out the film for detection.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide equipment capable of carrying out thermal evaporation on a plurality of different coating materials in the same cavity and carrying out Raman spectrum detection on the coated substrate.
The technical problem to be solved by the invention is realized by adopting the following technical scheme:
the evaporation coating equipment for in-situ Raman spectrum detection comprises an end cover, a thermal evaporation cavity, a film thickness detection mechanism, a thermal evaporation mechanism and a vacuum mechanism, wherein the end cover is connected to a coating chamber, a Raman detection port, a photoelectric component and an observation window are arranged on the end cover, the Raman detection port is provided with the Raman spectrum detector, the photoelectric component is used for controlling the on-off of photoelectric rays, the thermal evaporation cavity is positioned on the end cover, the film thickness detection mechanism, the thermal evaporation mechanism and the vacuum mechanism are all communicated with the thermal evaporation cavity, the film thickness detection mechanism is used for detecting the thickness of a coated substrate, the vacuum mechanism is used for carrying out vacuum in the thermal evaporation cavity, the thermal evaporation mechanism is positioned at the top of the thermal evaporation cavity and comprises a power magnetic rotating shaft, a separation blade, a master water-cooling electrode, a plurality of groups of sub water-cooling electrodes and a, the evaporation boat is respectively connected between the mother water-cooling electrode and each group of the sub water-cooling electrodes, one end of the power magnetic force rotating shaft extends into the thermal evaporation cavity to be connected with the separation blade, the upper surface of the separation blade and the lower surface of the evaporation boat are on the same horizontal plane, and the power magnetic force rotating shaft drives the separation blade to rotate on the horizontal plane so that the separation blade can shield any one evaporation boat.
Preferably, thermal evaporation mechanism still includes support, backup pad, translation power supply and guiding axle support, the top is equipped with the opening on the thermal evaporation cavity, the backup pad sets up on the opening and is used for sealing the opening, the equal fixed connection of power magnetic force pivot, mother water-cooling electrode and the sub-water-cooling electrode of multiunit is in the backup pad, and all passes the backup pad, the support is located thick detection mechanism and vacuum mechanism, the translation power supply is located the support, the output of translation power supply is connected in backup pad center department through the guiding axle support, the drive of translation power supply the backup pad moves in vertical direction, so that the inside power magnetic force pivot of thermal evaporation cavity, mother water-cooling electrode and the sub-water-cooling electrode of multiunit are close to or keep away from the indoor substrate of coating film.
Preferably, vacuum mechanism includes flange welded pipe, second push-pull valve, four-way pipe and molecular pump, flange welded pipe horizontal connection is on a thermal evaporation cavity lateral wall, the second push-pull valve is connected between flange welded pipe and four-way pipe, the molecular pump is connected on the four-way pipe, still be equipped with cold-trap connecting portion and be located liquid nitrogen transfer line and nitrogen gas discharge pipe on the cold-trap connecting portion on the port of four-way pipe.
Preferably, thick detection mechanism of membrane includes that connecting pipe, resistance rule connect, ionization rule connect and thick appearance, the one end of connecting pipe is connected on a thermal evaporation cavity lateral wall, the other end at the connecting pipe is connected to thick appearance, resistance rule connect and ionization rule articulate on the relative outside of connecting pipe, and resistance rule connect and ionization rule connect all communicate with each other with the connecting pipe.
Preferably, a central support and a first gate valve are arranged between the thermal evaporation cavity and the end cover, the first gate valve is located above the central support, the thermal evaporation cavity is communicated with the central support and forms a coating channel, and the first gate valve is used for opening or closing the coating channel.
Preferably, be equipped with flange between first push-pull valve and the thermal evaporation cavity, be equipped with flange down between first push-pull valve and the central support, the interior bottom surface of going up flange all is equipped with O type circle with flange's interior top surface down, the upper surface of going up flange all is equipped with the draw-in groove with flange's lower surface down, it is connected with calliper on flange's the draw-in groove to go up, be connected with calliper down on flange's the draw-in groove, go up calliper with calliper all includes dop and bolt down, first push-pull valve upper surface all is equipped with bolt assorted screw hole with the lower surface, works as go up calliper with when calliper is the coining respectively in the draw-in groove that corresponds, the dop of going up calliper is relative orientation with the dop of calliper down.
Preferably, the bracket is further provided with a guide pillar, one end of the guide pillar penetrates through the bracket, and the other end of the guide pillar is fixedly connected to the supporting plate.
Preferably, the mother water-cooled electrode and the son water-cooled electrode both comprise electrode tubes, water inlet ends and water outlet ends.
Preferably, the separation blade is the petal form, the separation blade includes occlusion part and rotation portion, the diameter of occlusion part is greater than the diameter of rotation portion, rotation portion with the power magnetic force pivot is connected.
Preferably, the outer surface of the thermal evaporation cavity is further provided with a pre-extraction pipe.
The invention has the advantages and positive effects that: the method comprises the following steps that firstly, air in a thermal evaporation cavity is extracted to be in a hollow state through a vacuum mechanism, then metal on evaporation boats is gasified through the matching of a sub water-cooling electrode and a mother water-cooling electrode in the thermal evaporation mechanism, so that the thermal evaporation cavity is filled with the metal, the evaporation boat is connected between each sub water-cooling electrode and the mother water-cooling electrode, and when the metal in one evaporation boat needs to be gasified, a blocking piece is driven by a power magnetic rotating shaft to shield the other evaporation boat, so that different coating raw materials can be gasified in the same equipment under the same condition; the end cover is provided with the photoelectric component and the in-situ Raman spectrum detector, the photoelectric component controls the emission of internal light source rays, and the in-situ Raman spectrum detector receives the light source rays, so that the problem that the existing coating function and the in-situ Raman spectrum detection function are not integrated is solved, and the production efficiency is improved.
Drawings
FIG. 1 is an overall block diagram of the present invention;
FIG. 2 is an overall block diagram of the present invention;
FIG. 3 is a cross-sectional view of a portion of the present invention;
FIG. 4 is a view showing a connection relationship between an upper connecting flange and an upper caliper according to the present invention;
FIG. 5 is a structural view of a thermal evaporation mechanism according to the present invention;
FIG. 6 is a structural view of the thermal evaporation mechanism of the present invention.
In the figure: 1. an end cap; 2. a thermal evaporation cavity; 3. a film thickness detection mechanism; 31. a connecting pipe; 32. a resistance gauge joint; 33. an ionization gauge joint; 34. a film thickness meter; 4. a vacuum mechanism; 41. welding a pipe by using a flange; 42. a second gate valve; 43. a four-way pipe; 44. a molecular pump; 45. a cold trap connection; 46. a liquid nitrogen infusion tube; 47. a nitrogen gas discharge pipe; 5. a thermal evaporation mechanism; 51. a powered magnetic shaft; 52. a baffle plate; 53. a mother water-cooled electrode; 54. a sub water-cooled electrode; 55. evaporating the boat; 56. a support; 57. a support plate; 58. a translation power source; 59. a guide shaft support; 6. a Raman detection port; 71. a photovoltaic mount; 72. a photoelectric switch; 8. an observation window; 9. a central support; 10. a first gate valve; 11. an upper connecting flange; 12. a lower connecting flange; 13. an O-shaped ring; 14. a card slot; 15. an upper caliper; 16. a lower caliper; 161. clamping a head; 162. a stud; 17. a threaded hole; 18. a guide post; 19. an electrode tube; 20. a water inlet end; 21. a water outlet end; 22. and (4) pre-exhausting the air pipe.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When a component is referred to as being "connected" to another component, it can be directly connected to the other component or intervening components may also be present. When a component is referred to as being "disposed on" another component, it can be directly on the other component or intervening components may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
The embodiments of the invention will be described in further detail below with reference to the accompanying drawings:
the existing coating mode is to use a spray gun to gasify and spray a coating material to be coated on a substrate to be coated, the coating mode is not strict, the gasification of the coating material is not realized in a vacuum environment, the metal coating material is easy to oxidize after being gasified, the coating is not uniform due to the influence of air, and the rapid switching of the coating material cannot be realized; the prior film coating mode is to manually take out the substrate after the substrate is coated and put into a detection mechanism for in-situ Raman spectrum detection, so the problem to be solved by the invention is how to switch the film material of the substrate in a vacuum environment, and the in-situ Raman spectrum detection is simultaneously applied to the film coating equipment, and the film coating and the detection are carried out firstly without taking out the film for detection; therefore, the invention designs the equipment which can respectively carry out thermal evaporation on a plurality of different film materials in the same cavity and carry out Raman spectrum detection on the coated substrate; the structure is shown in fig. 1-6, and comprises an end cover 1, a thermal evaporation cavity 2, a film thickness detection mechanism 3, a thermal evaporation mechanism 5 and a vacuum mechanism 4, wherein the end cover 1 is connected to a coating chamber (the structure of the invention is the upper half part of a complete coating device, the complete coating device comprises an in-situ raman spectrum detection thermal evaporation coating of the upper part, weak plasma etching of in-situ evaporation of the lower part is the coating chamber, the two parts can work independently and can be disassembled, the coating chamber of the lower part is not shown in the invention), the end cover 1 is provided with a raman detection port 6, an optoelectronic component and an observation window 8, the raman spectrum detector (the raman spectrum detector is not shown in the invention) is arranged on the raman detection port 6, the optoelectronic component is used for controlling the on-off of an optoelectronic ray, the optoelectronic component comprises an optoelectronic bracket 71 and an optoelectronic switch 72, the coating sequence of the substrate is that the coating is firstly, after coating, the photoelectric switch 72 on the photoelectric support 71 is opened, the internal light source ray emission is controlled by the photoelectric switch 72, the light source ray is received by the in-situ raman spectroscopy detector, and the performance of the coated substrate is finally detected, the observation port is mainly used for observing the internal coating condition, the thermal evaporation cavity 2 is positioned on the end cover 1, the film thickness detection mechanism 3, the thermal evaporation mechanism 5 and the vacuum mechanism 4 are all communicated with the thermal evaporation cavity 2, the film thickness detection mechanism 3 is used for detecting the thickness of the coated substrate, the vacuum mechanism 4 is used for carrying out vacuum in the thermal evaporation cavity 2, the thermal evaporation mechanism 5 is positioned at the top of the thermal evaporation cavity 2, the thermal evaporation mechanism 5 comprises a power magnetic rotating shaft 51, a baffle plate 52, a master water-cooling electrode 53, a plurality of sets of sub water-cooling electrodes 54 and a plurality of evaporation boats 55, as shown in fig. 6, the baffle plate 52 is petal-shaped, the baffle, the diameter of the shielding part is larger than that of the rotating part, and the rotating part is connected with the power magnetic rotating shaft 51; the evaporation boat 55 is respectively connected between the mother water-cooling electrode 53 and each group of the sub water-cooling electrodes 54, one end of the power magnetic force rotating shaft 51 extends into the thermal evaporation cavity 2 and is connected with the baffle plate 52, the upper surface of the baffle plate 52 and the lower surface of the evaporation boat 55 are on the same horizontal plane, the power magnetic force rotating shaft 51 drives the baffle plate 52 to rotate on the horizontal plane so that the baffle plate 52 shields any evaporation boat 55, the evaporation boat 55 is connected between each sub water-cooling electrode 54 and the mother water-cooling electrode 53, when metal in one evaporation boat 55 needs to be gasified, the power magnetic force rotating shaft 51 drives the baffle plate 52 to shield other evaporation boats 55, and therefore gasification of different coating raw materials can be carried out in the same equipment under the same condition.
As shown in fig. 5-6, the thermal evaporation mechanism 5 further includes a support 56, a support plate 57, a translation power source 58 (cylinder) and a guide shaft support 59, the top of the thermal evaporation chamber 2 is provided with an opening (the thermal evaporation chamber 2 of the present invention is a cylindrical cylinder which is vertically through, and the side wall of the thermal evaporation chamber 2 is provided with a connection hole), the support plate 57 is disposed on the opening and used for closing the opening, the power magnetic rotation shaft 51, the mother water-cooled electrode 53 and the plurality of sets of son water-cooled electrodes 54 are all fixedly connected to the support plate 57 and all penetrate through the support plate 57, the support 56 is located on the film thickness detection mechanism 3 and the vacuum mechanism 4 (the film thickness detection mechanism 3 and the vacuum mechanism 4 are respectively and horizontally arranged on the side wall of the thermal evaporation chamber 2, two feet of the support 56 are disposed on the two feet, the translation power source 58 (cylinder) is located on the support 56, the output end of the translation power, the translation power source 58 (air cylinder) drives the supporting plate 57 to move in the vertical direction, so that the power magnetic rotating shaft 51, the main water-cooled electrode 53 and the multiple groups of sub water-cooled electrodes 54 in the thermal evaporation cavity 2 are close to or far away from the substrates in the coating chamber, because the thermal evaporation cavity 2 is internally provided with a chamber for gasifying coating raw materials, the bottom of the end cover 1 is connected with the coating chamber, only one first gate valve 10 is separated between the coating chamber and the thermal evaporation cavity 2, when the evaporation boat 55 needs to move downwards to the bottom of the thermal evaporation chamber, the whole supporting plate 57 is driven to move downwards through the air cylinder, the support 56 is further provided with the guide post 18, one end of the guide post 18 penetrates through the support 56, the other end of the guide post is fixedly connected to the supporting plate 57, the edge of the supporting plate 57 is provided with.
As shown in fig. 1-2, the vacuum mechanism 4 includes a flange welding pipe 41, a second gate valve 42, a four-way pipe 43 and a molecular pump 44, the flange welding pipe 41 is horizontally connected to one side wall of the thermal evaporation chamber 2, the second gate valve 42 is connected between the flange welding pipe 41 and the four-way pipe 43, the molecular pump 44 is connected to the four-way pipe 43, and a cold trap connecting part 45, a liquid nitrogen transfer pipe 46 and a nitrogen discharge pipe 47 are further provided at one port of the four-way pipe 43, the liquid nitrogen transfer pipe 46 and the nitrogen discharge pipe 47 are located at the cold trap connecting part 45 (the cold trap is a trap that traps gas on a cooled surface in a condensation manner, and is a device that is placed between a vacuum container and the pump and is.
As shown in fig. 1-2, the film thickness detection mechanism 3 includes a connection pipe 31, a resistance gauge connector 32, an ionization gauge connector 33, and a film thickness meter 34 (the resistance gauge connector 32 and the ionization gauge connector 33 are both connectors connected to the instrument, and the resistance gauge connector 32 and the ionization gauge connector 33 are both used for detecting the vacuum value inside the thermal evaporation cavity 2), one end of the connection pipe 31 is connected to one side wall of the thermal evaporation cavity 2, the film thickness meter 34 is connected to the other end of the connection pipe 31, the resistance gauge connector 32 and the ionization gauge connector 33 are connected to the opposite outer surface of the connection pipe 31, and the resistance gauge connector 32 and the ionization gauge connector 33 are both communicated with the connection pipe 31, and when the film coating is completed, the film thickness of the substrate needs to be detected, which is mainly realized by the film thickness meter 34, and the film thickness meter 34 includes a probe of the film thickness meter.
As shown in fig. 1, a central support 9 and a first gate valve 10 are arranged between the thermal evaporation cavity 2 and the end cover 1, the first gate valve 10 is located above the central support 9, the thermal evaporation cavity 2 is communicated with the central support 9 and forms a coating channel, and the first gate valve 10 is used for opening or closing the coating channel.
As shown in fig. 3-4, in order to make the sealing performance between the thermal evaporation cavity 2 and the first gate valve 10 and between the central support 9 and the first gate valve 10 higher, an upper connecting flange 11 is disposed between the first gate valve 10 and the thermal evaporation cavity 2, a lower connecting flange 12 is disposed between the first gate valve 10 and the central support 9, O-rings 13 are disposed on the inner bottom surface of the upper connecting flange 11 and the inner top surface of the lower connecting flange 12, clamping grooves 14 are disposed on the upper surface of the upper connecting flange 11 and the lower surface of the lower connecting flange 12, an upper caliper 15 is connected to the clamping groove 14 of the upper connecting flange 11, a lower caliper 16 is connected to the clamping groove 14 of the lower connecting flange 12, the upper caliper 15 and the lower caliper 16 both include a chuck 161 and a bolt, threaded holes 17 matched with the bolt are disposed on the upper surface and the lower surface of the first gate valve 10, when the upper caliper 15 and the lower caliper 16 are respectively inserted and pressed into the corresponding clamping grooves 14, the clamping head 161 of the upper caliper 15 and the clamping head 161 of the lower caliper 16 face to each other, when the bolt at the position of the upper caliper 15 is turned downwards and tightly pressed, the clamping head 161 of the upper caliper 15 can be tightly pressed in the clamping groove 14, so that the O-shaped ring 13 in the upper connecting flange 11 is tightly pressed on the upper surface of the first gate valve 10, and when the bolt at the position of the lower caliper 16 is turned upwards and tightly pressed, the clamping head 161 of the lower caliper 16 can be tightly pressed in the clamping groove 14 on the lower connecting flange 12, so that the O-shaped ring 13 in the lower connecting flange 12 is tightly pressed on the bottom surface of the first gate valve 10.
As shown in fig. 5, the electrode tube 19 generates a large amount of heat during operation, so that the main water-cooled electrode 53 and the sub water-cooled electrode 54 both include the electrode tube 19, the water inlet end 20 and the water outlet end 21, and the purpose of cooling is achieved by flowing water.
It should be emphasized that the embodiments described herein are illustrative rather than restrictive, and thus the present invention is not limited to the embodiments described in the detailed description, but other embodiments derived from the technical solutions of the present invention by those skilled in the art are also within the scope of the present invention.

Claims (10)

1. The evaporation coating equipment for in-situ Raman spectrum detection is characterized in that: the device comprises an end cover (1), a thermal evaporation cavity (2), a film thickness detection mechanism (3), a thermal evaporation mechanism (5) and a vacuum mechanism (4), wherein the end cover (1) is connected to a film coating chamber, a Raman detection port (6), a photoelectric component and an observation window (8) are arranged on the end cover (1), the Raman detection port (6) is provided with a Raman spectrum detector, the photoelectric component is used for controlling the on-off of photoelectric rays, the thermal evaporation cavity (2) is positioned on the end cover (1), the film thickness detection mechanism (3), the thermal evaporation mechanism (5) and the vacuum mechanism (4) are all communicated with the thermal evaporation cavity (2), the film thickness detection mechanism (3) is used for detecting the thickness of a coated substrate, the vacuum mechanism (4) is used for carrying out vacuum in the thermal evaporation cavity (2), and the thermal evaporation mechanism (5) is positioned at the top of the thermal evaporation cavity (2), thermal evaporation mechanism (5) are including power magnetic force pivot (51), separation blade (52), mother water-cooling electrode (53), the sub-water-cooling electrode of multiunit (54) and a plurality of evaporation boat (55), evaporation boat (55) are connected respectively mother water-cooling electrode (53) and each group between sub-water-cooling electrode (54), the one end of power magnetic force pivot (51) extends to and is connected with separation blade (52) in thermal evaporation cavity (2), the upper surface and evaporation boat (55) lower surface of separation blade (52) are on same horizontal plane, power magnetic force pivot (51) drive separation blade (52) rotate so that separation blade (52) shelter from arbitrary evaporation boat (55) on the horizontal plane.
2. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 1, wherein: the thermal evaporation mechanism (5) further comprises a support (56), a support plate (57), a translation power source (58) and a guide shaft support (59), an opening is formed in the top of the thermal evaporation cavity (2), the support plate (57) is arranged on the opening and used for sealing the opening, the power magnetic rotating shaft (51), the mother water-cooling electrode (53) and the multiple groups of sub water-cooling electrodes (54) are fixedly connected to the support plate (57) and penetrate through the support plate (57), the support (56) is located on the film thickness detection mechanism (3) and the vacuum mechanism (4), the translation power source (58) is located on the support (56), the output end of the translation power source (58) is connected to the center of the support plate (57) through the guide shaft support (59), and the translation power source (58) drives the support plate (57) to move in the vertical direction, so that the power magnetic rotating shaft (51) inside the thermal evaporation cavity (2), The mother water-cooled electrode (53) and the plurality of groups of the son water-cooled electrodes (54) are close to or far away from the substrate in the coating chamber.
3. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 1, wherein: vacuum mechanism (4) are including flange welded pipe (41), second push-pull valve (42), cross pipe (43) and molecular pump (44), flange welded pipe (41) horizontal connection is on a thermal evaporation cavity (2) lateral wall, second push-pull valve (42) are connected between flange welded pipe (41) and cross pipe (43), molecular pump (44) are connected on cross pipe (43), still be equipped with cold-trap connecting portion (45) and be located liquid nitrogen transfer pipe (46) and nitrogen gas discharge pipe (47) on cold-trap connecting portion (45) on a port of cross pipe (43).
4. The evaporation coating equipment for in-situ stretched surface spectrum detection according to claim 1, wherein: thick detection mechanism (3) include connecting pipe (31), resistance rule connect (32), ionization rule connect (33) and thick appearance (34), the one end of connecting pipe (31) is connected on a thermal evaporation cavity (2) lateral wall, the other end at connecting pipe (31) is connected to thick appearance (34), resistance rule connects (32) and ionization rule connect (33) and connects on the relative outside of connecting pipe (31), and resistance rule connects (32) and ionization rule connects (33) and all communicates with each other with connecting pipe (31).
5. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 1, wherein: a central support (9) and a first gate valve (10) are arranged between the thermal evaporation cavity (2) and the end cover (1), the first gate valve (10) is located above the central support (9), the thermal evaporation cavity (2) is communicated with the central support (9) and forms a coating channel, and the first gate valve (10) is used for opening or closing the coating channel.
6. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 5, wherein: an upper connecting flange (11) is arranged between the first gate valve (10) and the thermal evaporation cavity (2), a lower connecting flange (12) is arranged between the first gate valve (10) and the central support (9), the inner bottom surface of the upper connecting flange (11) and the inner top surface of the lower connecting flange (12) are respectively provided with an O-shaped ring (13), the upper surface of the upper connecting flange (11) and the lower surface of the lower connecting flange (12) are respectively provided with a clamping groove (14), the clamping groove (14) of the upper connecting flange (11) is connected with an upper caliper (15), the clamping groove (14) of the lower connecting flange (12) is connected with a lower caliper (16), the upper caliper (15) and the lower caliper (16) respectively comprise a clamping head (161) and a bolt, the upper surface and the lower surface of the first gate valve (10) are respectively provided with a threaded hole (17) matched with the bolt, and when the upper caliper (15) and the lower caliper (16) are respectively embedded and pressed in the corresponding clamping grooves (14), the clamping head (161) of the upper caliper (15) and the clamping head (161) of the lower caliper (16) face to each other.
7. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 2, wherein: the support (56) is also provided with a guide post (18), one end of the guide post (18) penetrates through the support (56), and the other end of the guide post (18) is fixedly connected to the support plate (57).
8. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 2, wherein: the mother water-cooling electrode (53) and the son water-cooling electrode (54) respectively comprise an electrode tube (19), a water inlet end (20) and a water outlet end (21).
9. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 1, wherein: separation blade (52) are the petal form, separation blade (52) include occlusion part and rotation portion, the diameter of occlusion part is greater than the diameter of rotation portion, rotation portion with power magnetic force pivot (51) are connected.
10. The evaporation coating equipment for in-situ Raman spectrum detection according to claim 1, wherein: the outer surface of the thermal evaporation cavity (2) is also provided with a pre-extraction pipe (22).
CN202010946452.4A 2020-09-10 2020-09-10 Evaporation coating equipment for in-situ Raman spectrum detection Pending CN111996500A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114672782A (en) * 2022-04-14 2022-06-28 西安交通大学 Integrated sample stage device for thin film deposition and continuous film growth monitoring and monitoring method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114672782A (en) * 2022-04-14 2022-06-28 西安交通大学 Integrated sample stage device for thin film deposition and continuous film growth monitoring and monitoring method
CN114672782B (en) * 2022-04-14 2023-01-03 西安交通大学 Integrated sample stage device for thin film deposition and continuous film growth monitoring and monitoring method

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