CN111983889B - Mask plate device, display and exposure machine - Google Patents
Mask plate device, display and exposure machine Download PDFInfo
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- CN111983889B CN111983889B CN202010805000.4A CN202010805000A CN111983889B CN 111983889 B CN111983889 B CN 111983889B CN 202010805000 A CN202010805000 A CN 202010805000A CN 111983889 B CN111983889 B CN 111983889B
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- mask plate
- exposure
- baffle
- mark
- metal layer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
Abstract
The application discloses mask plate device, display, exposure machine. The mask plate device comprises a mask plate, a baffle, at least one graduated scale and at least one shading belt; the graduated scale is arranged between two adjacent exposure areas and used for confirming the position of the baffle for shielding the mask plate during the first exposure; the shading belt is rectangular and long, is arranged on the mask plate and is positioned on one side of the graduated scale, and is used for automatically identifying the position of the mask plate sheltered by the baffle when the mask plate is exposed for the second time and the second time. This application is through at the other rectangle strip shading area that increases of current baffle position monitoring sign, and it needn't remain the figure that shading area will protect, and the position that the baffle sheltered from the mask plate when can realizing board automatic identification second time and second time after-exposure to improve the discernment precision, reduce the identification error, and can improve production efficiency.
Description
Technical Field
The application relates to the technical field of display panel manufacturing, in particular to a mask plate device, a display and an exposure machine.
Background
When a mask (mask) is used for manufacturing a pattern on a glass substrate, all areas of the mask are not needed to be used for each exposure, so that the upper, lower, left and right non-exposure areas of the mask are shielded by using a baffle. When the production line is actually produced, a baffle position monitoring mark (MB mark) is respectively placed at a set position of a square baffle to monitor the position accuracy of the baffle.
Fig. 1 is a schematic plan structure diagram of a baffle position monitoring mark currently used in the industry, and as shown in fig. 1, the baffle position monitoring mark 90 is a strip mark with scales, and includes a first metal layer mark 91, a second metal layer mark 92, a via hole mark 93, and an indium tin oxide layer mark 94 that are arranged at intervals, and are used for respectively forming structures such as a gate, a source/drain, a routing via hole, and an anode on an array substrate. The use mode is that through shooing, the scale of baffle position in the photo is read to people's eye, but people's eye identification precision is low, and identification error is high.
Disclosure of Invention
The embodiment of the application provides a mask plate device, a display and an exposure machine, and can solve the technical problems that the existing baffle position monitoring mark needs the whole human eyes to read the scales of the position of a baffle when exposure is carried out, the human eyes are low in identification precision and high in identification error.
The embodiment of the application provides a mask plate device, which comprises a mask plate, a baffle, at least one graduated scale and at least one shading belt; a plurality of exposure areas are arranged in the mask plate; the baffle is arranged around the mask plate and used for shielding a non-exposure area of the mask plate; the graduated scale is arranged between two adjacent exposure areas and used for confirming the position of the mask plate shielded by the baffle plate during the first exposure; the shading belt is rectangular and long, is arranged on the mask plate and is positioned on one side of the graduated scale and used for automatically identifying the position of the mask plate sheltered by the baffle when the second and later exposures are carried out by the machine station. The shading band is a rectangular strip shading band which is reserved on the mask plate, and original patterns are not reserved.
When the mask plate is used, the machine table is used for identifying the length value of an unexposed area in a non-exposure area according to the end part of the shading belt and the edge position of the exposure area after the first exposure, so that the position of the mask plate, which is shielded by the baffle plate during the second and the second after-exposure, is automatically identified according to the distance between the end part of the shading belt and the edge position.
Furthermore, the two adjacent exposure areas are mutually overlapped to form an overlapped exposure area, and the shading band is positioned in the overlapped exposure area. In the process of continuously exposing the overlapped exposure area twice, the shading belt protects the primary photoresist, the baffle light blocking part protects the primary photoresist, finally, the pattern outside the baffle on the glass substrate is washed away in the subsequent etching process, the pattern below the baffle is retained, and then the machine station automatically reads the dimension of the retained pattern, namely the position precision of the baffle.
Furthermore, the shading belt is arranged at the four corners of the exposure area.
Furthermore, the material of the shading belt comprises opaque metal, and the opaque metal comprises chromium.
Furthermore, the shading band comprises a first metal layer mark, a second metal layer mark, a via hole mark and an indium tin oxide layer mark which are arranged at intervals.
Furthermore, the first metal layer mark, the second metal layer mark, the via hole mark and the indium tin oxide layer mark are arranged at equal intervals, and the interval distance is 50-100 um.
Furthermore, the lengths of the first metal layer identifier, the second metal layer identifier, the via hole identifier and the indium tin oxide layer identifier are the same, and the lengths are 5000um-10000um; the width range of the first metal layer mark is 30um-60um; the width range of the second metal layer mark is 70um-90um; the width range of the via hole identification is 110um-130um; the width range of the indium tin oxide layer mark is 140um-160um.
Furthermore, the center of the graduated scale is set as a zero point, and the same scale values are uniformly arranged by extending towards the two ends; the scale value of the graduated scale is millimeter level or micron level. The length of the graduated scale is greater than the length of the side length of the exposure area.
The application also provides a display using the mask device, the display is provided with a color film substrate and an array substrate which are oppositely arranged, and the pattern of the color film substrate and/or the array substrate is formed by exposure of the mask device through the text.
The application also provides an exposure machine, which comprises the mask plate device.
The beneficial effects of this application lie in, this application provides a mask plate device, display, exposure machine, through in the other rectangle strip shading band that increases of current baffle position monitoring sign, it needn't remain the figure that shading band will protect, can realize board automatic identification second time and when the second time is exposed later the baffle shelters from the position of mask plate, and need not whole people's eye read the scale of baffle position when exposing to improve the discernment precision, reduce the identification error, and can improve production efficiency. When the exposure process is carried out, the shading belt and the baffle plate respectively protect the primary photoresist, so that only the pattern below the baffle plate is remained, and the position of the baffle plate can be monitored on line by monitoring the size of the implementation pattern remained on the glass substrate.
Drawings
The technical solutions and other advantages of the present application will become apparent from the following detailed description of specific embodiments of the present application when taken in conjunction with the accompanying drawings.
Fig. 1 is a schematic plan view of a position monitoring mark of a baffle currently used in the industry.
Fig. 2 is a schematic plan view of the light-shielding tape in the embodiment of the present application.
The labels in fig. 1 are as follows:
90. a baffle position monitoring mark, 91, a first metal layer mark,
92. a second metal layer identifier 93, a via hole identifier 94 and an indium tin oxide layer identifier;
the labels in fig. 2 are as follows:
10. a shading band 1, a first metal layer mark 2, a second metal layer mark,
3. via hole identification, 4, indium tin oxide layer identification.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Specifically, an embodiment of the present application provides a mask plate device, which includes a mask plate, a baffle, at least one scale and at least one shading band; a plurality of exposure areas are arranged in the mask plate; the baffle is arranged around the mask plate and is used for shielding a non-exposure area of the mask plate; the graduated scale is arranged between two adjacent exposure areas and used for confirming the position of the mask plate shielded by the baffle plate during the first exposure; the shading belt is rectangular and long, is arranged on the mask plate and located on one side of the graduated scale, and is used for automatically identifying the position of the mask plate, which is sheltered by the baffle plate, when the machine station performs secondary and secondary post exposure.
If only the baffle is arranged, the baffle can extend into an adjacent exposure area during actual exposure, incident light of an exposure machine passes through the edge of the baffle and generates a diffraction effect to generate an ash area, and diffraction light of the ash area can react with light resistance of the ash area. This portion of the photoresist should not be reacted away at this time, and therefore needs to be protected with a light-shielding tape.
The shading band is a rectangular strip shading band which is reserved on the mask plate, and original patterns are not reserved. When human eyes are used for reading the scales of the positions of the baffles during exposure, the patterns to be protected by the shading bands are provided. This application increases at least one and is rectangular shading area on this basis, only keeps its shading area appearance, does not keep the original figure that the shading area will protect, just draws the original figure of newly-increased shading area well earlier, then generates original figure has been deleted behind the shading area. During the first exposure, the scales of the positions of the baffles during the exposure are read by human eyes, so that a graduated scale is required for position identification; during the second and subsequent exposures, the machine can automatically recognize the area exposed for the first time.
When the device is used, the machine station is used for identifying the length value of an unexposed area in a non-exposure area according to the end part of the shading strip and the edge position of the exposure area after the first exposure, so that the position of the mask plate, which is shielded by the baffle plate during the second and later exposures, is automatically identified according to the distance between the end part of the shading strip and the edge position.
In the embodiment of the application, two adjacent exposure areas are mutually overlapped to form an overlapped exposure area, and the shading band is positioned in the overlapped exposure area. In the process of continuously exposing the overlapped exposure area twice, the shading belt protects the primary light resistor, the baffle light blocking part protects the primary light resistor, finally, the outer graph of the baffle on the glass substrate is washed off in the subsequent etching process, the graph below the baffle is reserved, and then the machine automatically reads the size of the reserved graph, namely the position accuracy of the baffle.
In the embodiment of the application, the shading bands are arranged at the four corners of the exposure area, so that the space can be saved. Understandably, the graduated scales are also arranged at the four corners of the exposure area. Preferably, the scale and the shading band are both disposed within the overlapping exposure region.
In the embodiment of the application, the shading belt is made of opaque metal, and the opaque metal comprises chromium, so that an opaque shading effect is achieved.
As shown in fig. 2, in the embodiment of the present application, the light-shielding tape 10 includes a first metal layer identifier 1, a second metal layer identifier 2, a via identifier 3, and an ito identifier 4 that are arranged at intervals.
As shown in fig. 2, in the embodiment of the present application, the first metal layer identifier 1, the second metal layer identifier 2, the via hole identifier 3, and the ito layer identifier 4 are equidistantly spaced apart from each other, and the spaced distance is 50um to 100um.
As shown in fig. 2, in the embodiment of the present application, the lengths of the first metal layer identifier 1, the second metal layer identifier 2, the via hole identifier 3, and the ito layer identifier 4 are the same, and the lengths of the first metal layer identifier 1, the second metal layer identifier 2, the via hole identifier 3, and the ito layer identifier 4 are 5000um to 10000um, preferably 6000um; the width range of the first metal layer mark 1 is 30um-60um, preferably 50um; the width range of the second metal layer mark 2 is 70um-90um, preferably 80um; the width range of the via hole identification 3 is 110um-130um, preferably 120um; the width of the ito layer 4 ranges from 140um to 160um, preferably 150um.
In the embodiment of the present application, please refer to fig. 1, the center of the scale is set as a zero point, and the same scale values are uniformly arranged by extending to the two ends; the scale value of the graduated scale is millimeter level or micron level. The length of the graduated scale is greater than the length of the side length of the exposure area.
This application mask plate device is through increasing a rectangle strip shading area by current baffle position monitoring sign, and it needn't remain the figure that shading area will protect, can realize board automatic identification second time and when exposing after the second time the baffle shelters from the position of mask plate, and need not whole people's eye read the scale of baffle position when exposing to improve the discernment precision, reduce identification error, and can improve production efficiency. When exposure process is carried out, the shading belt and the baffle plate respectively protect the primary photoresist, so that only the pattern below the baffle plate is reserved, and the position of the baffle plate can be monitored on line by monitoring the size of the implementation pattern reserved on the glass substrate.
The application also provides a display using the foregoing mask device, the display is provided with a color film substrate and an array substrate which are arranged oppositely, and the pattern of the color film substrate and/or the array substrate is formed by exposure of the foregoing mask device.
The display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. The display device can be implemented by referring to the above embodiments, and repeated descriptions are omitted.
The patterns of the color film substrate and/or the array substrate need to be provided with a light resistance to shield a film layer below the color film substrate and/or the array substrate, the light resistance is protected by the light-shielding belt once in the process of continuously exposing the overlapped exposure area twice, the light resistance is protected by the light-shielding part of the baffle plate once, finally, the patterns outside the baffle plate on the glass substrate are washed away in the subsequent etching process, the patterns below the baffle plate are retained, and then the machine table automatically reads the dimension of the retained patterns, namely the position accuracy of the baffle plate. When the exposure process is carried out, the shading belt and the baffle plate respectively protect the primary photoresist, so that only the pattern below the baffle plate is remained, and the position of the baffle plate can be monitored on line by monitoring the size of the implementation pattern remained on the glass substrate.
The application also provides an exposure machine, which comprises the mask plate device. Understandably, the exposure machine also comprises a light source, a mask plate support frame and other structures.
The beneficial effects of this application lie in, this application provides a mask plate device, display, exposure machine, through in the other rectangle strip shading band that increases of current baffle position monitoring sign, it needn't remain the figure that shading band will protect, can realize board automatic identification second time and when the second time is exposed later the baffle shelters from the position of mask plate, and need not whole people's eye read the scale of baffle position when exposing to improve the discernment precision, reduce the identification error, and can improve production efficiency.
In the foregoing embodiments, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to the related descriptions of other embodiments.
The mask plate device, the display and the exposure machine provided by the embodiment of the application are described in detail, specific examples are applied in the description to explain the principle and the implementation mode of the application, and the description of the embodiment is only used for helping to understand the technical scheme and the core idea of the application; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications or substitutions do not depart from the spirit and scope of the present disclosure as defined by the appended claims.
Claims (9)
1. A mask plate device, comprising:
the mask plate is internally provided with a plurality of exposure areas;
the baffle is arranged around the mask plate and is used for shielding a non-exposure area of the mask plate;
the graduated scale is arranged between two adjacent exposure areas and used for confirming the position of the mask plate shielded by the baffle plate during the first exposure;
the shading belt is a rectangular strip, is arranged on the mask plate and is positioned on one side of the graduated scale, and is used for automatically identifying the position of the mask plate, which is shaded by the baffle plate, when the machine station performs second and later exposure;
the shading tape comprises a first metal layer mark, a second metal layer mark, a via hole mark and an indium tin oxide layer mark which are arranged at intervals.
2. A mask apparatus according to claim 1, wherein adjacent two of the exposure regions overlap each other to form an overlap exposure region, and the light-shielding band is located in the overlap exposure region.
3. A mask plate device according to claim 1, wherein said light-shielding tape is provided at four corners of said exposure region.
4. A mask set according to claim 1, wherein the material of the light-shielding tape comprises an opaque metal, and the opaque metal comprises chromium.
5. A mask plate apparatus according to claim 1, wherein said first metal layer mark, said second metal layer mark, said via hole mark and said indium tin oxide layer mark are equally spaced apart by a distance of 50 μm to 100 μm.
6. A mask plate device according to claim 1, wherein the first metal layer mark, the second metal layer mark, the via hole mark and the ito layer mark have the same length, and the lengths thereof are all 5000 μm to 10000 μm; the width range of the first metal layer mark is 30-60 mu m; the width range of the second metal layer mark is 70-90 μm; the width range of the via hole mark is 110-130 μm; the width of the indium tin oxide layer mark ranges from 140 mu m to 160 mu m.
7. A mask plate device according to claim 1, wherein the center of the scale is set as a zero point, and the same scale values are uniformly arranged to extend to both ends; the scale value of the graduated scale is millimeter level or micron level.
8. A display using a mask set according to any one of claims 1 to 7, wherein the display is provided with a color filter substrate and an array substrate which are oppositely arranged, and patterns on the color filter substrate and/or the array substrate are formed by exposure to the mask set according to any one of claims 1 to 7.
9. An exposure machine comprising a reticle set according to any one of claims 1 to 7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010805000.4A CN111983889B (en) | 2020-08-12 | 2020-08-12 | Mask plate device, display and exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010805000.4A CN111983889B (en) | 2020-08-12 | 2020-08-12 | Mask plate device, display and exposure machine |
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| Publication Number | Publication Date |
|---|---|
| CN111983889A CN111983889A (en) | 2020-11-24 |
| CN111983889B true CN111983889B (en) | 2023-02-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010805000.4A Active CN111983889B (en) | 2020-08-12 | 2020-08-12 | Mask plate device, display and exposure machine |
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| CN (1) | CN111983889B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201001062A (en) * | 2008-06-27 | 2010-01-01 | Au Optronics Corp | Alignment mark on the mask and method for identifying the position of shielding elements via alignment mark |
| CN102902167A (en) * | 2012-11-12 | 2013-01-30 | 上海华力微电子有限公司 | Method for detecting accuracy of mask plate hood of photoetching machine |
| CN103345117A (en) * | 2013-06-24 | 2013-10-09 | 南京中电熊猫液晶显示科技有限公司 | Mask and liquid crystal display manufacturing method |
| CN104199251A (en) * | 2014-09-26 | 2014-12-10 | 南京中电熊猫液晶显示科技有限公司 | Mask plate device and LCD (Liquid Crystal Display) adopting same |
| CN107748479A (en) * | 2017-11-03 | 2018-03-02 | 武汉华星光电半导体显示技术有限公司 | It is a kind of to judge that baffle plate walks the mask plate and its method of precision |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4439690B2 (en) * | 2000-07-19 | 2010-03-24 | Ｎｅｃエレクトロニクス株式会社 | Effective σ measurement reticle and effective σ variation calculation method |
| JP2004047687A (en) * | 2002-07-11 | 2004-02-12 | Renesas Technology Corp | Exposure method |
-
2020
- 2020-08-12 CN CN202010805000.4A patent/CN111983889B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201001062A (en) * | 2008-06-27 | 2010-01-01 | Au Optronics Corp | Alignment mark on the mask and method for identifying the position of shielding elements via alignment mark |
| CN102902167A (en) * | 2012-11-12 | 2013-01-30 | 上海华力微电子有限公司 | Method for detecting accuracy of mask plate hood of photoetching machine |
| CN103345117A (en) * | 2013-06-24 | 2013-10-09 | 南京中电熊猫液晶显示科技有限公司 | Mask and liquid crystal display manufacturing method |
| CN104199251A (en) * | 2014-09-26 | 2014-12-10 | 南京中电熊猫液晶显示科技有限公司 | Mask plate device and LCD (Liquid Crystal Display) adopting same |
| CN107748479A (en) * | 2017-11-03 | 2018-03-02 | 武汉华星光电半导体显示技术有限公司 | It is a kind of to judge that baffle plate walks the mask plate and its method of precision |
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| Publication number | Publication date |
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| CN111983889A (en) | 2020-11-24 |
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