CN217333104U

CN217333104U - Mask plate, color film substrate, display panel and display device

Info

Publication number: CN217333104U
Application number: CN202123214607.4U
Authority: CN
Inventors: 刘超; 黎敏; 查长军
Original assignee: BOE Technology Group Co Ltd; Chongqing BOE Optoelectronics Technology Co Ltd
Current assignee: BOE Technology Group Co Ltd; Chongqing BOE Optoelectronics Technology Co Ltd
Priority date: 2021-12-20
Filing date: 2021-12-20
Publication date: 2022-08-30
Anticipated expiration: 2031-12-20

Abstract

The utility model provides a mask plate, various membrane base plate, display panel and display device. The mask plate comprises a substrate and a mask pattern arranged on the substrate, the mask pattern is used for forming an alignment mark on the color film substrate, the mask pattern comprises a plurality of sub-mask patterns arranged in an array mode, and the length-width ratio of the sub-mask patterns is not more than 5. The embodiment of the utility model provides a mask plate can form the counterpoint mark that is located various membrane base plate, focusing precision when improving the exposure machine and counterpointing.

Description

Mask plate, color film substrate, display panel and display device

Technical Field

The utility model relates to a show technical field, especially indicate a mask plate, various membrane base plate, display panel and display device.

Background

At present, color Film process processes in the field of Thin Film Transistor (TFT) -Liquid Crystal Display (LCD) are as follows: black Matrix (BM), color layer (R/G/B), planarization layer (OC), and Spacer (Photo Spacer, PS). As the demand for high-definition manufacturing processes for high-PPI (pixel density Per inc) products increases, exposure machines are increasingly frequently used for spacer process processes. However, in the process of aligning the exposure machine with the alignment mark of the spacer, problems such as focusing failure and the like often occur, which cause the position precision (Overlay) to be out of limit, thereby causing problems such as reduction of product transmittance or insufficient compression resistance and the like.

In the related art, the exposure machine filters stray light reflected by the flat layer by adding a Filter (Filter) to increase the focusing accuracy; however, the problem of inaccurate focusing still happens occasionally in the process of mass production, and the production capacity guarantee has greater risk.

Disclosure of Invention

The utility model provides a mask plate, various membrane base plate, display panel and display device can solve the problem that exposure machine gathering precision is low.

The utility model discloses a first aspect provides a mask plate, including basement and the mask figure of setting on the basement, the mask figure is used for forming the counterpoint mark on the various membrane base plate, wherein, the mask figure includes the sub-mask figure that a plurality of arrays were arranged, the aspect ratio of sub-mask figure is no longer than 5.

Optionally, the plurality of sub-mask patterns arranged in an array include M rows of sub-mask patterns, the equal distances between the sub-mask patterns in the front n rows and the sub-mask patterns in the back n rows are d, and the distance between the sub-mask patterns in the middle M rows is greater than d.

Optionally, n is 2, and m is 5.

Optionally, the distance d between the sub-mask patterns is 4.5-20 um.

Optionally, the length of the sub-mask pattern is 4.5-20um, and the width of the sub-mask pattern is 4.5-20 um.

Optionally, the mask includes:

at least three groups of mask patterns, wherein each group of mask patterns comprises two mask patterns, and the two mask patterns are respectively positioned on two opposite sides of the mask plate.

The third aspect of the present invention provides a color filter substrate, wherein the color filter substrate comprises a substrate and an alignment mark formed by the mask on the substrate,

the alignment mark comprises a plurality of sub-alignment marks arranged in an array, and the aspect ratio of the sub-alignment marks is not more than 5.

Optionally, the sub-alignment marks arranged in the plurality of arrays include M rows of sub-alignment marks, the equal distances between the sub-alignment marks in the front n rows and the sub-alignment marks in the back n rows are d, and the distance between the sub-alignment marks in the middle M rows is greater than d.

A fourth aspect of the present invention provides a liquid crystal display panel, including the color filter substrate described above.

A fifth aspect of the present invention provides a display device, including the above-mentioned liquid crystal display panel.

The embodiment of the utility model has the following beneficial effect:

the embodiment of the utility model provides a mask plate can form the counterpoint mark that is located various membrane base plate, the focus precision when improving the exposure machine counterpoint.

Drawings

Fig. 1 is a schematic diagram of a first mask for forming a spacer alignment mark on a color filter substrate in the related art;

fig. 2 is a schematic diagram of a second mask for forming a spacer alignment mark on a color filter substrate in the related art;

FIG. 3 is a schematic diagram illustrating a halo phenomenon in an alignment process of an exposure machine in the related art;

fig. 4 is a schematic view of a first mask for forming a spacer alignment mark on a color filter substrate according to an embodiment of the present invention;

fig. 5 is a schematic view of a second mask for forming a spacer alignment mark on a color filter substrate according to an embodiment of the present invention;

fig. 6 is a schematic overall structure diagram of a mask for forming a spacer alignment mark on a color film substrate according to an embodiment of the present invention;

fig. 7 is a schematic alignment diagram of the spacer mask plate and the spacer alignment mark provided by the embodiment of the present invention.

Detailed Description

In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following detailed description will be given with reference to the accompanying drawings and specific embodiments.

Referring to fig. 1 and fig. 2, fig. 1 is a schematic diagram of a first mask for forming spacer alignment marks on a color filter substrate in the related art; fig. 2 is a schematic diagram of a second mask for forming a spacer alignment mark on a color filter substrate in the related art. The mask shown in fig. 1 and 2 includes a substrate 1 and a mask pattern a disposed on the substrate. The mask pattern a of fig. 1 forms opaque regions, and the mask pattern a of fig. 2 forms transparent regions.

In fact, the mask shown in fig. 1 and 2 is a part of a black matrix mask, that is, the black matrix mask is provided with mask patterns for forming the alignment marks of the spacers in addition to the mask patterns for forming the black matrix. In the color film process, the alignment mark of the spacer is formed while the black matrix is formed.

In the color film process, after the black matrix, the color layer and the flat layer are manufactured on the substrate, when the spacer is manufactured, in the alignment process of the exposure machine, the mask patterns b and b' on the mask plate of the spacer need to form a buckling structure with the spacer alignment mark formed by the mask pattern a. Note that, in practice, the mask patterns b, b' and the mask pattern a are located on two different mask plates. Fig. 1 and 2 illustrate snap structures formed by the mask patterns b, b' and the mask pattern a for convenience of description only.

Fig. 3 is a schematic diagram showing a halo phenomenon in the alignment process of the exposure machine in the related art, referring to fig. 3, since a flat layer and a spacer material exist on the spacer alignment mark, the leveling effect is not good enough, when incident light is aligned and focused, the halo is formed by reflection of a transparent material on the spacer alignment mark, so that the alignment focus cannot identify the spacer alignment mark, which causes troubles to continuous production.

The leveling effect refers to the flatness of the planarization layer and spacer material at the spacer alignment marks.

The embodiment of the utility model provides a mask plate, including basement and the mask figure of setting on the basement, the mask figure is used for forming the counterpoint mark on the various membrane base plate, the mask figure includes the sub-mask figure that a plurality of arrays were arranged, the aspect ratio of sub-mask figure is no longer than 5.

The strip-shaped sub-mask patterns are used for forming sub-alignment marks of the shock insulator, the strip-shaped sub-alignment marks can block the leveling of the flat layer material, halos are easily generated after the flat layer material is cured, and alignment failure is caused when the shock insulator is aligned; by changing the sub-mask pattern into a dot shape, the formed spacer alignment mark is also in a dot shape, the leveling resistance of the material of the flat layer is reduced, and the flat layer is easier to flatten.

Referring to fig. 4 and 5, an embodiment of the present invention provides a mask plate, including basement 2 and the mask pattern c of setting on the basement, mask pattern c is used for forming the counterpoint mark on the various membrane base plate, mask pattern c includes the sub-mask figure that a plurality of arrays were arranged, the aspect ratio of sub-mask figure is no more than 5.

Adjusting the distance between the front n lines and the back n lines of sub-mask patterns is equivalent to adjusting the distance between the front n lines and the back n lines of sub-alignment marks, and adjusting the distance between the front n lines and the back n lines of sub-alignment marks can change the leveling resistance of the flat layer material between the sub-alignment marks, so that the flat layer material is ensured to be flat.

Referring to fig. 4 and 5, the distances between the sub-mask patterns of the front n rows and the rear n rows are equal to each other and d, and the distance between the sub-mask patterns of the middle m rows is d1, wherein d1 is greater than d.

Wherein n is 2 and m is 5.

By setting the mask patterns to comprise the first 2 lines of sub-mask patterns, the second 2 lines of sub-mask patterns and the middle 5 lines of sub-mask patterns and adjusting the distance between the sub-mask patterns, the leveling resistance of the flat layer material between the sub-alignment marks formed by the sub-mask patterns of each line can be changed, and the flat layer material can be ensured to be flat.

Optionally, the distance d between the sub-mask patterns is 4.5-20 um.

By setting the distance d between the sub-mask patterns to be 4.5-20um, the leveling resistance of the flat layer material between the sub-alignment marks formed by the sub-mask patterns can be changed, the flatness of the flat layer material is ensured, and meanwhile, the exposure machine is also ensured to be capable of identifying the sub-alignment marks within the range of 4.5-20um, exceeding the range of 4.5-20um and exceeding the identification capability of the exposure machine.

Optionally, the length a of the sub-mask pattern is 4.5-20um, and the width b of the sub-mask pattern is 4.5-20 um.

The minimum resolution of the exposure machine to the sub-alignment mark is 4.5um, and the maximum resolution is 20um, that is, the exposure machine can not identify the sub-alignment mark with the size exceeding the range of 4.5-20um, and optionally, 4-15 sub-mask patterns or sub-alignment marks can be designed for each row and each column.

Optionally, the mask includes:

The embodiment of the utility model provides a mask plate includes three group at least mask figure to two mask figures that make every group mask figure are located the relative both sides of mask plate respectively, can form three group at least counterpoint marks, and then improve the precision when exposure machine counterpoints.

Fig. 6 is a schematic overall structure diagram of a mask for forming a spacer alignment mark on a color film substrate according to an embodiment of the present invention; the mask shown in fig. 6 includes 3 mask patterns, i.e., first mask patterns 4 and 4 ', second mask patterns 5 and 5 ', and third mask patterns 6 and 6 ', and 3 mask patterns on opposite sides of the mask.

In accordance with the foregoing, the mask illustrated in fig. 6 is also a part of a black matrix mask in which the AA region is provided with a mask pattern for forming a black matrix.

Fig. 7 is a schematic alignment diagram of the spacer mask plate and the spacer alignment mark provided by the embodiment of the present invention. After 3 sets of alignment marks are formed by using the mask plate shown in fig. 6, when the spacer is manufactured, in the alignment process of the exposure machine, the mask patterns on the mask plate of the spacer and the alignment marks of the spacer form a buckling structure.

The embodiment of the utility model also provides a manufacturing method of various membrane base plate, include:

forming a metal layer on a substrate;

coating photoresist on the metal layer, and exposing the photoresist by using the mask plate;

after developing, reserving the photoresist of the area corresponding to the alignment mark, and removing the photoresist of the area not corresponding to the alignment mark;

and completely etching away the metal layer in the region not corresponding to the alignment mark by an etching process, and stripping the photoresist in the region corresponding to the alignment mark to form the alignment mark.

The manufacturing method of the color film substrate specifically comprises the following steps:

s101: providing a substrate base plate; the substrate base plate can be a glass base plate or a quartz base plate.

S102: forming a metal layer on a substrate; the metal layer may be Cu, Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, Ta, W, and the like, and alloys of these metals.

S103: coating photoresist on the metal layer, and exposing the photoresist by using the mask plate; and forming photoresist unreserved regions and photoresist reserved regions on the photoresist. The photoresist reserved area corresponds to the area where the alignment mark is located, and the photoresist unreserved area corresponds to the area outside the alignment mark;

s104: carrying out development treatment, reserving the photoresist of the region corresponding to the region where the alignment mark is located after development, and removing the photoresist of the region except the alignment mark;

s105: and completely etching the metal layer in the region outside the alignment mark by an etching process, and stripping the photoresist in the region corresponding to the region where the alignment mark is located to form the alignment mark.

S106: and forming a color layer, a flat layer and a spacer on the alignment mark.

The embodiment of the utility model also provides a color film substrate, wherein, the color film substrate comprises a substrate and an alignment mark which is positioned on the substrate and is formed by the mask plate,

the alignment mark comprises a plurality of sub alignment marks arranged in an array, and the aspect ratio of the sub alignment marks is not more than 5.

Optionally, the plurality of sub-alignment marks arranged in an array include M rows of sub-alignment marks, the equal distances between the sub-alignment marks in the front n rows and the sub-alignment marks in the back n rows are d, and the distance between the sub-alignment marks in the middle M rows is greater than d.

The leveling resistance of the flat layer material between the sub-alignment marks can be changed by adjusting the distance between the front n rows and the back n rows of sub-alignment marks, and the flatness of the flat layer material is ensured.

The embodiment of the utility model provides a still liquid crystal display panel, including foretell various membrane base plate.

The embodiment of the utility model provides a display device still, including foretell liquid crystal display panel.

The display device includes but is not limited to: radio frequency unit, network module, audio output unit, input unit, sensor, display unit, user input unit, interface unit, memory, processor, and power supply. It will be appreciated by those skilled in the art that the above described configuration of the display device does not constitute a limitation of the display device, and that the display device may comprise more or less of the components described above, or some components may be combined, or a different arrangement of components. In the embodiment of the present invention, the display device includes, but is not limited to, a display, a mobile phone, a tablet computer, a television, a wearable electronic device, a navigation display device, etc.

The display device may be: the display device comprises any product or component with a display function, such as a liquid crystal television, a liquid crystal display, a digital photo frame, a mobile phone, a tablet personal computer and the like, wherein the display device further comprises a flexible circuit board, a printed circuit board and a back plate.

In the embodiments of the methods of the present invention, the sequence numbers of the steps cannot be used to define the sequence of the steps, and for those skilled in the art, the sequence of the steps is not changed without creative work.

It should be noted that, in the present specification, all the embodiments are described in a progressive manner, and the same and similar parts among the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. In particular, for the embodiments, since they are substantially similar to the product embodiments, the description is simple, and the relevant points can be referred to the partial description of the product embodiments.

Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.

It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.

In the foregoing description of embodiments, the particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.

The above description is only for the specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and any person skilled in the art can easily think of the changes or substitutions within the technical scope of the present disclosure, and shall cover the scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.

Claims

1. A mask plate comprises a substrate and a mask pattern arranged on the substrate, wherein the mask pattern is used for forming an alignment mark on a color film substrate, and the mask plate is characterized in that the mask pattern comprises a plurality of sub-mask patterns which are arranged in an array mode, and the length-width ratio of the sub-mask patterns is not more than 5.

2. A mask plate according to claim 1, wherein the plurality of sub-mask patterns arranged in an array include M rows of sub-mask patterns, the equal distances between the sub-mask patterns of the front n rows and the sub-mask patterns of the rear n rows are d, and the distance between the sub-mask patterns of the middle M rows is larger than d.

3. A mask according to claim 2, wherein n is 2 and m is 5.

4. A mask according to claim 2, wherein the distance d between the sub-mask patterns is 4.5-20 um.

5. A mask according to claim 1, wherein the length of the sub-mask pattern is 4.5-20um, and the width of the sub-mask pattern is 4.5-20 um.

6. A mask according to claim 1, wherein the mask comprises:

7. A color filter substrate, which is characterized by comprising a substrate and an alignment mark formed on the substrate by using the mask plate as claimed in any one of claims 1 to 6,

8. The color filter substrate of claim 7, wherein the plurality of sub alignment marks arranged in an array comprise M rows of sub alignment marks, the equal distances between the sub alignment marks in the first n rows and the sub alignment marks in the second n rows are d, and the distance between the sub alignment marks in the middle M rows is greater than d.

9. A liquid crystal display panel comprising the color filter substrate according to claim 7.

10. A display device comprising the liquid crystal display panel according to claim 9.