CN111965949A - Exposure apparatus and exposure method - Google Patents

Exposure apparatus and exposure method Download PDF

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Publication number
CN111965949A
CN111965949A CN202010854084.0A CN202010854084A CN111965949A CN 111965949 A CN111965949 A CN 111965949A CN 202010854084 A CN202010854084 A CN 202010854084A CN 111965949 A CN111965949 A CN 111965949A
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China
Prior art keywords
exposure
monitoring
engine
substrate
component
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Granted
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CN202010854084.0A
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Chinese (zh)
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CN111965949B (en
Inventor
朱天宇
杜卫冲
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Zhongshan Xinnuo Microelectronics Co ltd
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Zhongshan Aiscent Technologies Co ltd
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Priority to CN202010854084.0A priority Critical patent/CN111965949B/en
Publication of CN111965949A publication Critical patent/CN111965949A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention discloses an exposure device and an exposure method, wherein the exposure device comprises a frame, a first exposure component, a second exposure component, a monitoring component and a controller, wherein the first exposure component and the second exposure component are both arranged on the frame, and an exposure area is formed between the first exposure component and the second exposure component; the monitoring assembly is arranged on the rack and used for monitoring the position of the substrate; the controller is electrically connected with the first exposure component, the second exposure component and the monitoring component. The exposure method can be applied to the exposure apparatus described above. According to the exposure device, when the substrate passes through the exposure area, the first exposure component and the second exposure component respectively expose two opposite sides of the substrate, so that double-sided exposure is realized, and the exposure efficiency is high; meanwhile, the monitoring component monitors the position of the substrate in real time, and the controller adjusts the exposure paths of the first exposure component and the second exposure component in time according to the real-time position of the substrate so as to improve the exposure precision.

Description

Exposure apparatus and exposure method
Technical Field
The invention relates to the technical field of laser direct writing exposure, in particular to an exposure device and an exposure method.
Background
The information revolution is based on the development of integrated circuit technology, and along with the continuous development of the integrated circuit technology and the rapid iteration of product performance, the demand on the integrated circuit board is more and more vigorous. On the one hand, the need to expand the production capacity of the integrated circuit and on the other hand, the need to ensure the product performance of the integrated circuit poses a higher challenge to manufacturers of the integrated circuit boards.
The Flexible Printed Circuit (FPC) is a Printed Circuit board having high reliability and excellent flexibility, which is made of a polyimide or polyester film as a base material, and has the characteristics of high wiring density, light weight, thin thickness, good flexibility, and the like. Flexible circuit boards are an important component of integrated circuits, most commonly touch screens that overlay the display screen. When a user touches the touch screen, the touch screen can identify information such as the position, the moving direction and the moving speed of a touch point and transmit signals to the processor, so that interaction between the user and the processor is realized.
However, the conventional exposure method for the flexible printed circuit board is an exposure method for a common PCB, that is, the substrate is stopped after being fed to the fixed area, and then is identified and exposed, so that the efficiency of the whole exposure process is extremely low, and not only is the exposure efficiency low and the productivity affected, but also the exposure precision is poor and the performance is affected.
Disclosure of Invention
Accordingly, it is desirable to provide an exposure apparatus and an exposure method; the exposure device has high exposure efficiency and high exposure precision; the exposure method can be applied to the exposure device and has high exposure precision.
The technical scheme is as follows:
an embodiment provides an exposure apparatus including:
a frame;
the first exposure component and the second exposure component are both arranged on the frame, and an exposure area is formed between the first exposure component and the second exposure component;
the monitoring assembly is arranged on the rack and used for monitoring the position of the substrate; and
and the controller is electrically connected with the first exposure component, the second exposure component and the monitoring component.
According to the exposure device, when the substrate passes through the exposure area, the first exposure component and the second exposure component respectively expose two opposite sides of the substrate, so that double-sided exposure is realized, and the exposure efficiency is high; meanwhile, the monitoring component monitors the position of the substrate in real time, and the controller adjusts the exposure paths of the first exposure component and the second exposure component in time according to the real-time position of the substrate so as to improve the exposure precision.
The technical solution is further explained below:
in one embodiment, the rack comprises a bottom plate, a first side plate and a second side plate, the first side plate and the second side plate are respectively fixed at two opposite ends of the bottom plate, and the first exposure assembly and the second exposure assembly are both arranged between the first side plate and the second side plate.
In one embodiment, the first exposure assembly includes a first mounting frame and a first exposure engine, two ends of the first mounting frame are respectively fixed to the first side plate and the second side plate, the first exposure engine is disposed on the first mounting frame, the first exposure engine is provided with at least one and can move along the first mounting frame, and the first exposure engine is electrically connected to the controller;
the second exposure subassembly includes second mounting bracket and second exposure engine, the both ends of second mounting bracket respectively with first curb plate with the second curb plate is fixed, the second exposure engine is established on the second mounting bracket, the second exposure engine be equipped with at least one and can follow the second mounting bracket removes, the second exposure engine with controller electric connection.
In one embodiment, the first exposure assembly further comprises a first support rod, two first support rods are provided and fixed on the first side plate and the second side plate respectively, and two ends of the first mounting frame are fixed with the corresponding first support rods respectively;
the second exposure component further comprises a second supporting rod, the second supporting rod is provided with two parts which are fixed on the first side plate and the second side plate respectively, and two ends of the second mounting rack are fixed on the second supporting rod correspondingly.
In one embodiment, the first exposure assembly further includes a third mounting frame and a third exposure engine, two ends of the third mounting frame are respectively fixed to the corresponding first support rods, the third mounting frame and the first mounting frame are arranged at intervals, the third exposure engine is arranged on the third mounting frame, at least one third exposure engine is arranged on the third mounting frame and can move along the third mounting frame, and the third exposure engine is electrically connected to the controller;
the second exposure subassembly still includes fourth mounting bracket and fourth exposure engine, the both ends of fourth mounting bracket respectively with correspond the second bracing piece is fixed, the fourth mounting bracket with the second mounting bracket is the interval setting, the fourth exposure engine is established on the fourth mounting bracket, the fourth exposure engine be equipped with at least one and can follow the fourth mounting bracket removes, the fourth exposure engine with controller electric connection.
In one embodiment, the exposure area includes a first area corresponding to the exposure ranges of the first exposure engine and the second exposure engine, and the monitoring component includes a first monitoring part and a second monitoring part, both of which are electrically connected to the controller and used for monitoring the position of the substrate in the first area;
the exposure area further comprises a second area, the second area corresponds to the exposure range of the third exposure engine and the exposure range of the fourth exposure engine, the monitoring assembly further comprises a third monitoring piece and a fourth monitoring piece, and the third monitoring piece and the fourth monitoring piece are both electrically connected with the controller and are used for monitoring the position of the substrate in the second area.
In one embodiment, at least two of the first monitoring member and the second monitoring member are provided; the third monitoring piece and the fourth monitoring piece are provided with at least two.
In one embodiment, the exposure device further comprises a rolling component, the rolling component is arranged on the rack, and the first exposure component and the second exposure component are respectively positioned at two opposite sides of the rolling component;
the rolling assembly comprises a first roller and a second roller, and the first roller and the second roller are arranged on the rack in a rotating mode at intervals along the moving direction of the substrate.
Another embodiment provides an exposure method including the steps of:
monitoring first position information of a substrate;
adjusting first original exposure information according to the first position information, and obtaining first exposure information;
and exposing the substrate according to the first exposure information.
According to the exposure method, the first original exposure information is adjusted in time according to the first position information of the substrate, so that the first exposure information is matched with the current position of the substrate, the problem of poor exposure precision caused by substrate deviation or fluctuation is solved, and the exposure precision is improved.
The technical solution is further explained below:
in one embodiment, after the step of exposing the substrate according to the first exposure information, the method further includes the following steps:
monitoring second position information of the substrate;
adjusting second original exposure information according to the second position information, and obtaining second exposure information;
and exposing the substrate according to the second exposure information.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention.
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic view showing an overall configuration of an exposure apparatus according to an embodiment;
FIG. 2 is a front view showing the overall structure of the exposure apparatus in the embodiment of FIG. 1;
FIG. 3 is a schematic diagram of the right side of the exposure apparatus in the embodiment of FIG. 1;
FIG. 4 is a schematic front side view of the exposure apparatus in the embodiment of FIG. 1;
FIG. 5 is a schematic diagram of an exposure track of the exposure apparatus in the embodiment of FIG. 1;
FIG. 6 is a flow chart illustrating an exemplary implementation of an exposure method.
Reference is made to the accompanying drawings in which:
100. a frame; 210. a first exposure component; 211. a first mounting bracket; 212. a first exposure engine; 213. a third mounting bracket; 214. a third exposure engine; 215. a first support bar; 220. a second exposure component; 221. a second mounting bracket; 222. a second exposure engine; 223. a fourth mounting bracket; 224. a fourth exposure engine; 225. a second support bar; 311. a first monitoring member; 312. a second monitoring member; 321. a third monitoring member; 410. a first roller; 420. a second roller; 500. a substrate.
Detailed Description
Embodiments of the present invention are described in detail below with reference to the accompanying drawings:
in order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
Referring to fig. 1 to 4, an embodiment provides an exposure apparatus including a frame 100, a first exposure module 210, a second exposure module 220, a monitoring module, and a controller.
In the embodiment shown in fig. 1 to 4, the frame 100 provides mounting support for the first exposure module 210, the second exposure module 220, the monitoring module, and the like. The frame 100 may be a U-shaped frame structure, the first exposure component 210 is disposed on the upper side of the frame 100, the second exposure component 220 is disposed on the lower side of the frame 100, so that an exposure area is formed between the first exposure component 210 and the second exposure component 220, the substrate 500 passes through the exposure area, and the first exposure component 210 and the second exposure component 220 respectively expose the upper surface and the lower surface of the substrate 500, thereby realizing double-sided exposure and improving the exposure efficiency.
Base plate 500 is the flexbile plate, and as supporting, exposure device can set up unreels subassembly and rolling component, unreels the relative both sides that subassembly and rolling component are located frame 100 respectively, and base plate 500 is given off by unreeling the subassembly to expose through the exposure district, later, base plate 500 is carried out the rolling by the rolling component. The roll-to-roll double-sided exposure fully considers the characteristics of the flexible plate, so that the exposure can be carried out at one time without stopping, identifying and exposing at a certain position like the traditional method, and the exposure efficiency is improved.
Meanwhile, in the process of winding and unwinding, the substrate 500 inevitably generates offset or fluctuation, and at this time, the monitoring assembly monitors the position of the substrate 500 in real time to acquire the condition of the offset or fluctuation, so that the controller can adjust the exposure paths of the first exposure assembly 210 and the second exposure assembly 220 in real time according to the condition of the offset or fluctuation, the exposed pattern is consistent with the expected pattern, the influence of the offset on the exposure is reduced, and the exposure precision is improved.
In one embodiment, referring to fig. 1, fig. 2 and fig. 4, the first exposure module 210 and the second exposure module 220 are both disposed on the frame 100, and an exposure area is formed between the first exposure module 210 and the second exposure module 220.
As shown in fig. 1, when the substrate 500 passes through the exposure area, the first exposure component 210 performs an exposure process on the upper plate surface of the substrate 500 under the control of the controller; meanwhile, the second exposure module 220 performs exposure processing on the lower plate surface of the substrate 500 under the control of the controller, thereby implementing simultaneous double-sided exposure.
In one embodiment, referring to fig. 1, the monitoring assembly is disposed on the frame 100, and the monitoring assembly is used for monitoring the position of the substrate 500.
The monitoring component is used for monitoring the position of the substrate 500 in the winding and unwinding processes to judge whether the substrate 500 has offset, so that the offset condition is provided to the controller, the controller can adjust the exposure paths of the first exposure component 210 and the second exposure component 220 according to the offset condition, and the offset substrate 500 can still obtain the expected exposure position and exposure pattern.
In one embodiment, the controller is electrically connected to the first exposure module 210, the second exposure module 220, and the monitoring module.
The controller can be the industrial computer, also can be PLC etc. first exposure subassembly 210, second exposure subassembly 220 and monitoring subassembly all with controller electric connection, the monitoring subassembly transmits the position information of base plate 500 who monitors to the controller, the controller instructs first exposure subassembly 210 and second exposure subassembly 220 adjustment exposure information according to the position of base plate 500 to realize accurate exposure, improve the exposure accuracy.
According to the exposure device, when the substrate 500 passes through the exposure area, the first exposure component 210 and the second exposure component 220 respectively expose two opposite sides of the substrate 500, so that double-sided exposure is realized, and the exposure efficiency is high; meanwhile, the monitoring device monitors the position of the substrate 500 in real time, and the controller adjusts the exposure paths of the first exposure device 210 and the second exposure device 220 in time according to the real-time position of the substrate 500, so as to improve the exposure accuracy.
In one embodiment, referring to fig. 1, the rack 100 includes a bottom plate, a first side plate and a second side plate, the first side plate and the second side plate are respectively fixed at two opposite ends of the bottom plate, and the first exposure assembly 210 and the second exposure assembly 220 are both disposed between the first side plate and the second side plate.
As shown in fig. 1, the frame 100 includes a bottom plate, a first side plate on the left side, and a second side plate on the right side, so that the entire frame 100 is U-shaped to mount the first exposure module 210 and the second exposure module 220.
In an embodiment, referring to fig. 1 to 4, the first exposure assembly 210 includes a first mounting frame 211 and a first exposure engine 212, two ends of the first mounting frame 211 are respectively fixed to the first side plate and the second side plate, the first exposure engine 212 is disposed on the first mounting frame 211, at least one of the first exposure engine 212 is disposed and can move along the first mounting frame 211, and the first exposure engine 212 is electrically connected to the controller.
As shown in fig. 1, the first mounting frame 211 is a first beam, two first exposure engines 212 are movably connected to the first beam, and both the two first exposure engines 212 can move on the first beam along the length direction to perform exposure under the control of the controller.
The second exposure assembly 220 can be similarly disposed, specifically referring to fig. 1 to 4, the second exposure assembly 220 includes a second mounting bracket 221 and a second exposure engine 222, two ends of the second mounting bracket 221 are respectively fixed to the first side plate and the second side plate, the second exposure engine 222 is disposed on the second mounting bracket 221, the second exposure engine 222 is disposed with at least one and can move along the second mounting bracket 221, and the second exposure engine 222 is electrically connected to the controller.
As shown in fig. 1, the first exposure engine 212 exposes the upper plate surface of the substrate 500, and the second exposure engine 222 exposes the lower plate surface of the substrate 500, thereby performing double-sided exposure.
In an embodiment, referring to fig. 1 to 4, the first exposure assembly 210 further includes a first support rod 215, two first support rods 215 are provided and fixed on the first side plate and the second side plate respectively, and two ends of the first mounting frame 211 are fixed with the corresponding first support rods 215 respectively.
In an embodiment, referring to fig. 1 to 4, the second exposure assembly 220 further includes a second support bar 225, two of the second support bars 225 are respectively fixed to the first side plate and the second side plate, and two ends of the second mounting frame 221 are respectively fixed to the corresponding second support bars 225.
As shown in fig. 1 to 4, the first support bar 215 is used to mount the first mounting bracket 211, and the second support bar 225 is used to mount the second mounting bracket 221.
In an embodiment, referring to fig. 1 to 4, the first exposure assembly 210 further includes a third mounting frame 213 and a third exposure engine 214, two ends of the third mounting frame 213 are respectively fixed to the corresponding first supporting rods 215, the third mounting frame 213 and the first mounting frame 211 are arranged at an interval, the third exposure engine 214 is disposed on the third mounting frame 213, the third exposure engine 214 is provided with at least one and can move along the third mounting frame 213, and the third exposure engine 214 is electrically connected to the controller.
In an embodiment, referring to fig. 1 to 4, the second exposure assembly 220 further includes a fourth mounting frame 223 and a fourth exposure engine 224, two ends of the fourth mounting frame 223 are respectively fixed to the corresponding second support bars 225, the fourth mounting frame 223 and the second mounting frame 221 are arranged at an interval, the fourth exposure engine 224 is disposed on the fourth mounting frame 223, the fourth exposure engine 224 is provided with at least one and can move along the fourth mounting frame 223, and the fourth exposure engine 224 is electrically connected to the controller.
As shown in fig. 1 to 4, the first exposure unit 210 includes two first exposure engines 212 and two third exposure engines 214, and the second exposure unit 220 includes two second exposure engines 222 and two fourth exposure engines 224.
In the embodiment shown in fig. 3, the first and third mounts 211 and 213 are spaced apart from each other and are spaced apart from each other in the advancing direction of the base plate 500; the second mount 221 and the fourth mount 223 are disposed at intervals and arranged in the advancing direction of the base plate 500. The first and second mounts 211 and 221 are positioned to correspond to each other, and the third and fourth mounts 213 and 223 are positioned to correspond to each other.
Referring to fig. 5, during exposure, the monitoring component transmits the position information of the substrate 500 to the controller, and under the control of the controller, the two first exposure engines 212 move on the first mounting rack 211 along the width direction of the substrate 500 (i.e., the length direction of the first mounting rack 211), and the two second exposure engines 222 move on the second mounting rack 221 along the width direction of the substrate 500, so as to perform double-sided exposure on the upper and lower plate surfaces of the substrate 500.
During exposure, two first exposure engines 212 inevitably generate an exposure gap on the upper plate surface of the substrate 500, as shown in fig. 5, there are four first exposure engines 212 in total, and a gap exists between two adjacent first exposure engines 212, where there is no exposure; the two second exposure engines 222 are similarly exposed, and there is a gap between them, resulting in some areas not being exposed. Therefore, in order to solve this problem, the third mount 213 and the fourth mount 223 are provided in front of the advance of the substrate 500 in the direction in which the substrate 500 advances, and at least one third exposure engine 214 is provided on the third mount 213, at least one fourth exposure engine 224 is disposed on the fourth mounting rack 223 such that, when the substrate 500 advances to the corresponding positions of the third mounting rack 213 and the fourth mounting rack 223, after the monitoring assembly transmits the position information of the substrate 500 to the controller, the controller controls the third exposure engine 214 to move on the third mount 213, the controller controls the fourth exposure engine 224 to move on the fourth mount 223, so that the supplementary exposure is performed based on the previous unexposed area, as shown in fig. 5, the third exposure engine 214 just exposes the unexposed area of the first exposure engine 212, so that the exposure is smoothly performed, and the exposure manner also improves the exposure efficiency.
In one embodiment, the exposure area includes a first area corresponding to the exposure range of the first exposure engine 212 and the second exposure engine 222, the monitoring component includes a first monitoring part 311 and a second monitoring part 312, and both the first monitoring part 311 and the second monitoring part 312 are electrically connected to the controller and are used for monitoring the position of the substrate 500 in the first area.
In one embodiment, the exposure area further includes a second area corresponding to the exposure range of the third exposure engine 214 and the fourth exposure engine 224, and the monitoring assembly further includes a third monitoring part 321 and a fourth monitoring part, wherein the third monitoring part 321 and the fourth monitoring part are electrically connected to the controller and are used for monitoring the position of the substrate 500 in the second area.
The first monitoring part 311 and the second monitoring part 312 are used for monitoring the position of the substrate 500 when entering the first region or after entering the first region, so as to feed back the position to the controller to quickly adjust the exposure data, so that the exposure of the first exposure engine 212 and the second exposure engine 222 is matched with the current position of the substrate 500, and the exposure accuracy is improved.
The third monitoring element 321 and the fourth monitoring element are used for monitoring the position of the substrate 500 when entering the second region or after entering the second region, so as to feed back the position to the controller to quickly adjust the exposure data, so that the exposures of the third exposure engine 214 and the fourth exposure engine 224 are matched with the current position of the substrate 500, and the exposure accuracy is improved.
The first area and the second area are relative concepts, and refer to two areas in front of and behind each other in the advancing direction of the substrate 500, the first area corresponds to the exposure areas of the first exposure engine 212 and the second exposure engine 222, and the second area corresponds to the exposure areas of the third exposure engine 214 and the fourth exposure engine 224.
Further, the first monitoring member 311 is movably connected to the first supporting rod 215, and the first monitoring member 311 can move along the length direction of the first supporting rod 215 (i.e. the moving direction of the substrate 500) to monitor the position of the substrate 500.
Similarly, the second monitoring member 312 is movably connected to the second support bar 225, and the second monitoring member 312 can move along the length direction of the second support bar 225 (i.e. the moving direction of the substrate 500) to monitor the position of the substrate 500.
Of course, the third monitoring element 321 is movably connected to the first supporting rod 215, and the third monitoring element 321 can move along the length direction of the first supporting rod 215 (i.e. the moving direction of the substrate 500) to monitor the position of the substrate 500; the fourth monitoring member is movably connected to the second support bar 225, and the fourth monitoring member can move along the length direction of the second support bar 225 (i.e., the moving direction of the substrate 500) to monitor the position of the substrate 500.
In one embodiment, at least two of the first monitoring member 311 and the second monitoring member 312 are provided.
In one embodiment, at least two of the third monitor member 321 and the fourth monitor member are provided.
The first monitor part 311, the second monitor part 312, the third monitor part 321 and the fourth monitor part can be arranged reasonably according to the need of monitoring positions.
Optionally, the first monitoring part 311, the second monitoring part 312, the third monitoring part 321, and the fourth monitoring part may be a visual camera, and information such as the offset position of the substrate 500 is obtained in real time through image processing or monitoring.
In one embodiment, referring to fig. 1 to 4, the exposure apparatus further includes a rolling component, the rolling component is disposed on the frame 100, and the first exposure component 210 and the second exposure component 220 are respectively located at two opposite sides of the rolling component.
The rolling assembly is used for matching with the unreeling assembly and the reeling assembly to realize the movement and the transportation of the substrate 500 during exposure.
In one embodiment, referring to fig. 4, after the substrate 500 is removed, it can be seen that: the rolling assembly includes a first roller 410 and a second roller 420, and the first roller 410 and the second roller 420 are rotatably disposed on the frame 100 at intervals along the moving direction of the substrate 500.
Of course, at the time of the specific arrangement, it should be noted that the positions of the first and second rollers 410 and 420 should not interfere with the exposure process of the first and second exposure assemblies 210 and 220.
In one embodiment, the exposure in this embodiment is maskless exposure, which improves the exposure efficiency.
Referring to fig. 1 to 4, in the whole exposure apparatus, the first exposure module 210 and the second exposure module 220 are disposed on the frame 100 in a vertically symmetrical or mirror image manner, and the monitoring modules are also disposed in a vertically symmetrical or mirror image manner.
It should be noted that, in the embodiment shown in fig. 1 to 4, the exposure apparatus includes a first mounting frame, a second mounting frame, a third mounting frame, and a fourth mounting frame, and the first exposure engine, the second exposure engine, the third exposure engine, and the fourth exposure engine have been respectively disposed thereon, but is not limited thereto. For example, when the skilled in the art is specifically arranged, different numbers of mounting frames and corresponding exposure engines can be arranged according to the specific situation of the exposure gap, so that the exposure gap generated in the front can be subjected to complementary exposure in the back, thereby achieving the technical effect of one-time exposure and improving the exposure accuracy, which is not described herein again.
Referring to fig. 6, the embodiment further provides an exposure method, which can be applied to the exposure apparatus according to any of the above embodiments, and the exposure method includes the following steps:
monitoring first position information of the substrate 500;
adjusting first original exposure information according to the first position information, and obtaining first exposure information;
and exposing the substrate 500 according to the first exposure information.
According to the exposure method, the first original exposure information is timely adjusted according to the first position information of the substrate 500, so that the first exposure information is matched with the current position of the substrate 500, the problem of poor exposure accuracy caused by deviation or fluctuation of the substrate 500 is solved, and the exposure accuracy is improved.
Further, the first position information refers to position information of the substrate 500 when entering the first exposure engine 212 and the second exposure engine 222 for exposure, and the controller adjusts the first original exposure information according to the position information to form new first exposure information, where the first exposure information corresponds to the current position of the substrate 500, so that after the first exposure information is exposed, the influence degree of the substrate 500 on the exposure pattern is reduced, and the exposure accuracy is ensured.
In an embodiment, referring to fig. 6, after the step of exposing the substrate 500 according to the first exposure information, the method further includes the following steps:
monitoring second position information of the substrate 500;
adjusting second original exposure information according to the second position information, and obtaining second exposure information;
and exposing the substrate 500 according to the second exposure information.
Further, the second position information indicates position information of the substrate 500 when the substrate 500 enters the exposure areas of the third exposure engine 214 and the fourth exposure engine 224 after the first exposure engine 212 and the second exposure engine 222 are exposed, and the controller adjusts the second original exposure information based on the position information, so as to obtain the second exposure information, thereby improving the exposure accuracy.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. An exposure apparatus, comprising:
a frame;
the first exposure component and the second exposure component are both arranged on the frame, and an exposure area is formed between the first exposure component and the second exposure component;
the monitoring assembly is arranged on the rack and used for monitoring the position of the substrate; and
and the controller is electrically connected with the first exposure component, the second exposure component and the monitoring component.
2. The exposure apparatus according to claim 1, wherein the frame includes a bottom plate, a first side plate, and a second side plate, the first side plate and the second side plate are fixed to opposite ends of the bottom plate, respectively, and the first exposure unit and the second exposure unit are both disposed between the first side plate and the second side plate.
3. The exposure apparatus according to claim 2, wherein the first exposure assembly includes a first mounting frame and a first exposure engine, two ends of the first mounting frame are respectively fixed to the first side plate and the second side plate, the first exposure engine is disposed on the first mounting frame, the first exposure engine is provided with at least one and can move along the first mounting frame, and the first exposure engine is electrically connected to the controller;
the second exposure subassembly includes second mounting bracket and second exposure engine, the both ends of second mounting bracket respectively with first curb plate with the second curb plate is fixed, the second exposure engine is established on the second mounting bracket, the second exposure engine be equipped with at least one and can follow the second mounting bracket removes, the second exposure engine with controller electric connection.
4. The exposure apparatus according to claim 3, wherein the first exposure assembly further comprises a first support rod, two first support rods are provided and fixed on the first side plate and the second side plate respectively, and two ends of the first mounting bracket are fixed with the corresponding first support rods respectively;
the second exposure component further comprises a second supporting rod, the second supporting rod is provided with two parts which are fixed on the first side plate and the second side plate respectively, and two ends of the second mounting rack are fixed on the second supporting rod correspondingly.
5. The exposure apparatus according to claim 4, wherein the first exposure assembly further comprises a third mounting frame and a third exposure engine, two ends of the third mounting frame are respectively fixed to the corresponding first support rods, the third mounting frame and the first mounting frame are arranged at intervals, the third exposure engine is arranged on the third mounting frame, the third exposure engine is provided with at least one and can move along the third mounting frame, and the third exposure engine is electrically connected to the controller;
the second exposure subassembly still includes fourth mounting bracket and fourth exposure engine, the both ends of fourth mounting bracket respectively with correspond the second bracing piece is fixed, the fourth mounting bracket with the second mounting bracket is the interval setting, the fourth exposure engine is established on the fourth mounting bracket, the fourth exposure engine be equipped with at least one and can follow the fourth mounting bracket removes, the fourth exposure engine with controller electric connection.
6. The exposure apparatus according to claim 5, wherein the exposure field includes a first region corresponding to an exposure range of the first exposure engine and the second exposure engine, and the monitoring unit includes a first monitoring member and a second monitoring member, both of which are electrically connected to the controller and configured to monitor a position of the substrate within the first region;
the exposure area further comprises a second area, the second area corresponds to the exposure range of the third exposure engine and the exposure range of the fourth exposure engine, the monitoring assembly further comprises a third monitoring piece and a fourth monitoring piece, and the third monitoring piece and the fourth monitoring piece are both electrically connected with the controller and are used for monitoring the position of the substrate in the second area.
7. The exposure apparatus according to claim 6, wherein at least two of the first monitor member and the second monitor member are provided; the third monitoring piece and the fourth monitoring piece are provided with at least two.
8. The exposure apparatus according to any one of claims 1 to 7, further comprising a rolling member provided on the frame, the first exposure member and the second exposure member being located on opposite sides of the rolling member, respectively;
the rolling assembly comprises a first roller and a second roller, and the first roller and the second roller are arranged on the rack in a rotating mode at intervals along the moving direction of the substrate.
9. An exposure method, comprising the steps of:
monitoring first position information of a substrate;
adjusting first original exposure information according to the first position information, and obtaining first exposure information;
and exposing the substrate according to the first exposure information.
10. The exposure method according to claim 9, further comprising, after the step of exposing the substrate according to the first exposure information, the step of:
monitoring second position information of the substrate;
adjusting second original exposure information according to the second position information, and obtaining second exposure information;
and exposing the substrate according to the second exposure information.
CN202010854084.0A 2020-08-24 2020-08-24 Exposure apparatus and exposure method Active CN111965949B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001166493A (en) * 1999-12-10 2001-06-22 Toray Eng Co Ltd Aligner
CN1756292A (en) * 2004-09-29 2006-04-05 富士胶片株式会社 Image forming apparatus
JP2013210653A (en) * 2013-05-20 2013-10-10 Nikon Corp Manufacturing method of display element and display element manufacturing device
CN205787590U (en) * 2016-05-22 2016-12-07 东莞市友辉光电科技有限公司 The frame folding structure of double-side membrane exposure machine
CN107203098A (en) * 2017-03-24 2017-09-26 无锡影速半导体科技有限公司 A kind of direct write exposure light path system and its disposable direct write exposure method
CN108762009A (en) * 2018-07-18 2018-11-06 苏州源卓光电科技有限公司 A kind of double-station direct putting type litho machine and its exposure method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001166493A (en) * 1999-12-10 2001-06-22 Toray Eng Co Ltd Aligner
CN1756292A (en) * 2004-09-29 2006-04-05 富士胶片株式会社 Image forming apparatus
JP2013210653A (en) * 2013-05-20 2013-10-10 Nikon Corp Manufacturing method of display element and display element manufacturing device
CN205787590U (en) * 2016-05-22 2016-12-07 东莞市友辉光电科技有限公司 The frame folding structure of double-side membrane exposure machine
CN107203098A (en) * 2017-03-24 2017-09-26 无锡影速半导体科技有限公司 A kind of direct write exposure light path system and its disposable direct write exposure method
CN108762009A (en) * 2018-07-18 2018-11-06 苏州源卓光电科技有限公司 A kind of double-station direct putting type litho machine and its exposure method

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