CN111954850B - 用于使非平面物体曝光的方法、光学部件和曝光系统 - Google Patents
用于使非平面物体曝光的方法、光学部件和曝光系统 Download PDFInfo
- Publication number
- CN111954850B CN111954850B CN201980012383.5A CN201980012383A CN111954850B CN 111954850 B CN111954850 B CN 111954850B CN 201980012383 A CN201980012383 A CN 201980012383A CN 111954850 B CN111954850 B CN 111954850B
- Authority
- CN
- China
- Prior art keywords
- planar
- exposure
- optical component
- exposed
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000000284 resting effect Effects 0.000 claims description 2
- 238000009751 slip forming Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000000227 grinding Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018102943.8 | 2018-02-09 | ||
| DE102018102943.8A DE102018102943B4 (de) | 2018-02-09 | 2018-02-09 | Verfahren zur Belichtung eines nicht ebenen Objekts, optische Komponente und Belichtungssystem |
| PCT/EP2019/050620 WO2019154582A1 (de) | 2018-02-09 | 2019-01-11 | Verfahren zur belichtung eines nicht ebenen objekts, optische komponente und belichtungssystem |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111954850A CN111954850A (zh) | 2020-11-17 |
| CN111954850B true CN111954850B (zh) | 2023-11-14 |
Family
ID=65023898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980012383.5A Active CN111954850B (zh) | 2018-02-09 | 2019-01-11 | 用于使非平面物体曝光的方法、光学部件和曝光系统 |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20200118070A (de) |
| CN (1) | CN111954850B (de) |
| DE (1) | DE102018102943B4 (de) |
| WO (1) | WO2019154582A1 (de) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070175860A1 (en) * | 2005-11-18 | 2007-08-02 | Matsushita Electric Industrial Co., Ltd. | 3d lithography with laser beam writer for making hybrid surfaces |
| CN101191842A (zh) * | 2006-11-22 | 2008-06-04 | 日立麦克赛尔株式会社 | 耦合透镜以及光拾取器装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE20101247U1 (de) * | 2001-01-24 | 2001-04-05 | Sator Laser Gmbh | Vorrichtung zum Beschriften oder Markieren von Gegenständen mittels Laserstrahl |
| US6707534B2 (en) * | 2002-05-10 | 2004-03-16 | Anvik Corporation | Maskless conformable lithography |
| JP2006098719A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 露光装置 |
| US8670106B2 (en) * | 2008-09-23 | 2014-03-11 | Pinebrook Imaging, Inc. | Optical imaging writer system |
-
2018
- 2018-02-09 DE DE102018102943.8A patent/DE102018102943B4/de active Active
-
2019
- 2019-01-11 WO PCT/EP2019/050620 patent/WO2019154582A1/de active Application Filing
- 2019-01-11 KR KR1020207024295A patent/KR20200118070A/ko not_active Application Discontinuation
- 2019-01-11 CN CN201980012383.5A patent/CN111954850B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070175860A1 (en) * | 2005-11-18 | 2007-08-02 | Matsushita Electric Industrial Co., Ltd. | 3d lithography with laser beam writer for making hybrid surfaces |
| CN101191842A (zh) * | 2006-11-22 | 2008-06-04 | 日立麦克赛尔株式会社 | 耦合透镜以及光拾取器装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102018102943B4 (de) | 2020-10-29 |
| CN111954850A (zh) | 2020-11-17 |
| WO2019154582A1 (de) | 2019-08-15 |
| DE102018102943A1 (de) | 2019-08-14 |
| KR20200118070A (ko) | 2020-10-14 |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |