CN1118221C - Method and equipment for cleaning electroluminescent organic glass plate - Google Patents
Method and equipment for cleaning electroluminescent organic glass plate Download PDFInfo
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- CN1118221C CN1118221C CN 00120790 CN00120790A CN1118221C CN 1118221 C CN1118221 C CN 1118221C CN 00120790 CN00120790 CN 00120790 CN 00120790 A CN00120790 A CN 00120790A CN 1118221 C CN1118221 C CN 1118221C
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- vacuum chamber
- cleaning
- glass plate
- ion beam
- ion
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Abstract
The present invention relates to a method and a device for cleaning an organic electroluminescent glass board. A cleaned glass board is placed into a vacuum chamber, high-purity oxygen streams are supplied into the vacuum chamber, and an ion beam is used for impacting the glass board in a certain angle. A cleaning device of the present invention is a vacuum chamber, and the cleaned glass board is placed on a support bracket on the upper part in the vacuum chamber. An ion source is arranged on one side of the lower part of the vacuum chamber, and a baffle is arranged between the ion source and a sample. The ion beam used for cleanness of the method and the device has the incidence in a certain angle. Thus, the surface roughness of the cleaned glass board and the surface contaminant content are reduced. The glass board can not be corroded, and the preparing cost is low.
Description
The present invention relates to a kind of cleaning method and device of electroluminescent organic glass plate, belong to the electronic device preparing technical field.
In the prior art, denomination of invention is the manufacture method and the preparation facilities of organic EL device, and the application people is an Idemitsu Kosen Co., Ltd., patent is the Japan Patent of JP 09232075, disclose a kind of manufacture method and preparation facilities of organic EL device, it installs as shown in Figure 1, and its course of work is:
Be provided with the cleaning chambers 2 different with vacuum chamber 1, in cleaning chambers, will have the ultraviolet ray of directive property or ion beam irradiation to substrate 3, after the cleaning base plate, open the gate of transferring passage 4, substrate 3 is moved on in the vacuum chamber, in vacuum chamber 2, substrate 3 made and contain organic film, i.e. organic EL device.
The impurity that adopts this method to make to exist in vacuum chamber and the cleaning chambers can be attached on the substrate, thereby obtains the organic EL device that the high and low following life-span of voltage of luminous efficiency prolongs.
Use under the ion beam situation, exposure is 100 μ A/cm
2-100mA/cm
2, preferably be controlled at 500 μ A/cm
2-10mA/cm
2, and kinetic energy is 1eV-10keV, preferably selects 100eV-to count keV, the oxide electrode on so can wounded substrate also can be with the organic substance ashing treatment.
Pressure in the cleaning chambers is controlled at 10
-1Below the Pa.In order to obtain better cleaning performance, when adopting ion beam, the pressure suggestion is controlled at 10
-3Below the Pa.
The most handy oxygen ion beam, effect is higher like this.Particularly when using the oxide-base panel material, because oxide can reduce after by ion beam irradiation, make the substrate modification, thereby can avoid the damage of substrate.
Can select the ion of inactive gass such as oxygen ion beam or Ar, He, or CCl
4, the CHCl isoreactivity activates body or ion beam, perhaps with their suitable being used in combination.But when using oxide, should select the ionic species that is not reduced as substrate.Under intense irradiation, oxide can reduce mostly, selects oxygen ion beam perhaps better.
The shortcoming of this patented technology is as follows:
(1) direction of ion beam is vertical with substrate, is difficult to reduce the roughness of substrate;
(2) ion beam energy is too high, and beam current density is too big, can cause etching to substrate, influences every performance of device;
(3) be very crucial parameter the action time of ion beam, but do not have play-by-play.
The objective of the invention is to propose a kind of cleaning method and device of electroluminescent organic glass plate, be specifically designed to the cleaning indium tin oxide-coated glass, use ion beam to bombard substrate from certain angle, and suitably control density, energy and the action time of ion beam, the roughness of indium oxide-Xi conductive glass surface is diminished, and remove organic impurity on surface, can make low-voltage, high brightness, long-life organic electroluminescence device with the glass plate after cleaning.
The cleaning method of the electroluminescent organic glass plate that the present invention proposes comprises following each step:
A) the glass plate that is cleaned being placed pressure is 1 * 10
-3In the vacuum chamber of Pa, feed the high purity oxygen air-flow, make ambient pressure maintain 8 * 10
-3Pa～3 * 10
-2Pa;
B) bombard the glass plate at a certain angle with ion beam, the angle of bombardment is 30 °～60 °, is preferably 45 °, makes beam current density be controlled at 1uA/cm during bombardment
2～10mA/cm
2Scope, be preferably 20uA/cm
2～100uA/cm
2, ion energy is 0.5eV～200eV during bombardment, be 5 seconds～300 seconds action time, is preferably 10 seconds～60 seconds;
C) oxygen ion beam cleans the sheet glass end, promptly finishes cleaning process of the present invention, and the sheet glass after the cleaning can be used for preparing follow-up organic film, promptly prepares organic EL device.
The present invention has designed the cleaning device of special electroluminescent organic glass plate, this device is a vacuum chamber, be cleaned on the support that slide places the vacuum chamber internal upper part, one side of vacuum chamber bottom is an ion source, ionogenic position makes the ion beam of generation become 30 °～60 ° angles with surface of glass slide, is provided with baffle plate between ion source and the sample.
Cleaning method of the present invention and device, the ion beam that is used to clean incident has at a certain angle reduced the surface roughness that is cleaned slide, and greatly reduces the content of surface of glass slide pollutant.Used ion beam energy is low, and beam current density is little, can not produce corrosion to slide, and saves the preparation of product cost.Can make low-voltage, high brightness, long-life organic electroluminescence device with the slide after cleaning.
Description of drawings:
Fig. 1 is the structural representation of prior art.
The structural representation of the cleaning device that Fig. 2 designs for the present invention.
1 is vacuum chamber among Fig. 1 and Fig. 2, the 2nd, and cleaning chambers, the 3rd, substrate, the 4th, passage, the 5th, slide, the 6th, vacuum chamber, the 7th, ion source, the 8th, be used to prepare the evaporation source of follow-up organic film, the 9th, baffle plate, the 10th, slide support.
The cleaning device of the present invention design as shown in Figure 2, this device is a vacuum chamber 46, is cleaned slide 5 and places On the support 10 of vacuum chamber internal upper part, a side of vacuum chamber bottom is ion gun 7, and ionogenic position makes generation Ion beam becomes 30 ° ~ 60 ° angles with surface of glass slide, be provided with baffle plate 9 between ion gun and the sample.
Introduce embodiments of the invention below.
Embodiment one.
A) the glass plate 5 that is cleaned being placed pressure is 1 * 10
-3In the vacuum chamber 6 of Pa, feed the high purity oxygen air-flow, make ambient pressure maintain 2 * 10
-2Pa;
B) open baffle plate 9, the ion beam that produces with ion source 7 bombards the glass plate with the 45 degree, makes beam current density be controlled at 50uA/cm during bombardment
2, ion energy is 125eV, be 20 seconds action time;
C) after the oxygen ion beam end of bombardment, use the sheet glass after cleaning to prepare follow-up organic film, promptly prepare organic EL device.The device that makes like this, it opens bright voltage and has reduced by 1.1 volts, and the brightness under the 10V driving voltage has improved an order of magnitude, and the stability of device has improved 3 times, and concrete data see Table cleaning condition 1 in 1;
Embodiment two.
Ambient pressure maintains 8 * 10
-3Pa, the bombardment angle is 30 °, beam current density is controlled at 20uA/cm
2, ion energy is 80eV during bombardment, bombardment time is 5 seconds, and the device that makes like this, it opens bright voltage and has reduced by 0.8 volt, and the brightness under the 10V driving voltage has improved an order of magnitude, and the stability of device has improved 2 times, and concrete data see Table cleaning condition 2 in 1;
Embodiment three.
Ambient pressure maintains 3 * 10
-3Pa, the bombardment angle is 60 °, beam current density is controlled at 100uA/cm
2, ion energy is 150eV during bombardment, bombardment time is 60 seconds, and the device that makes like this, it opens bright voltage and has reduced by 1.0 volts, and the brightness under the 10V driving voltage has improved an order of magnitude, and device stability has improved 2.5 times, and concrete data see Table cleaning condition 3 in 1;
Table 1
Claims (2)
1, a kind of cleaning method of electroluminescent organic glass plate is characterized in that, this method comprises following each step:
A) the glass plate that is cleaned being placed pressure is 1 * 10
-3In the vacuum chamber of Pa, feed pure oxygen gas flow, make ambient pressure maintain 8 * 10
-3Pa～3 * 10
-2Pa;
B) bombard the glass plate at a certain angle with ion beam, the angle of bombardment is 30 °～60 °, makes beam current density be controlled at 1uA/cm during bombardment
2～10mA/cm
2Scope, ion energy is 0.5eV～200eV during bombardment, be 5 seconds～60 seconds action time, promptly finishes cleaning process.
2, a kind of cleaning device of electroluminescent organic glass plate, it is characterized in that, this device is a vacuum chamber, be cleaned on the support that slide places the vacuum chamber internal upper part, one side of vacuum chamber bottom is an ion source, the ion source position makes the ion beam of generation become 30 °～60 ° angles with surface of glass slide, is provided with baffle plate between ion source and the sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00120790 CN1118221C (en) | 2000-07-14 | 2000-07-14 | Method and equipment for cleaning electroluminescent organic glass plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00120790 CN1118221C (en) | 2000-07-14 | 2000-07-14 | Method and equipment for cleaning electroluminescent organic glass plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1276697A CN1276697A (en) | 2000-12-13 |
| CN1118221C true CN1118221C (en) | 2003-08-13 |
Family
ID=4588404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00120790 Expired - Fee Related CN1118221C (en) | 2000-07-14 | 2000-07-14 | Method and equipment for cleaning electroluminescent organic glass plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1118221C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101147910B (en) * | 2007-10-08 | 2011-05-04 | 叶鹏 | Ion ultrasonic cleaning device |
| CN102247964A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Cleaning device for mask and cleaning method for mask |
| CN107649476A (en) * | 2017-08-17 | 2018-02-02 | 荆门市格林美新材料有限公司 | A kind of scrap glass plate cleaning device |
-
2000
- 2000-07-14 CN CN 00120790 patent/CN1118221C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1276697A (en) | 2000-12-13 |
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|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20030813 Termination date: 20160714 |