CN111799147A - Jig for plasma processing apparatus and plasma processing system - Google Patents
Jig for plasma processing apparatus and plasma processing system Download PDFInfo
- Publication number
- CN111799147A CN111799147A CN202010251728.7A CN202010251728A CN111799147A CN 111799147 A CN111799147 A CN 111799147A CN 202010251728 A CN202010251728 A CN 202010251728A CN 111799147 A CN111799147 A CN 111799147A
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- Prior art keywords
- guide plate
- plasma processing
- slit
- guide
- plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
Abstract
The present invention provides a clamp for a plasma processing device with a plasma generating part for generating plasma, comprising: a support base on which a workpiece to be plasma-processed by the plasma processing apparatus is placed; a support post extending from the support base; and a guide plate supported by the support column and provided with a plurality of slits for guiding the plasma generating part during the plasma processing. At least one end of each of the plurality of slits is adjacent to an end of the other slit via a connecting portion. The support table and the guide plate are configured to be relatively movable as follows: at least one end of at least one of the slits is arranged at an overlapping position overlapping with a position where an end of an adjacent slit is present.
Description
Technical Field
The present invention relates to a jig for a plasma processing apparatus and a plasma processing system.
Background
Today, a technique of performing plasma processing on a predetermined region of a workpiece is known. In the case of performing plasma processing on a predetermined region of a workpiece, a device having an actuator programmed to automatically move a plasma generation unit that generates plasma over the predetermined region of the workpiece is sometimes used. This enables efficient plasma processing of a predetermined region of the workpiece. However, a device including such an actuator is easily large, and is suitable for mass production.
However, in recent years, a technique of stably discharging plasma under atmospheric pressure has been established, and plasma treatment in an open space has been put into practical use. For example, japanese patent application laid-open No. 2007-207475 discloses a portable atmospheric pressure plasma generating apparatus capable of using a small gas cylinder.
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2007-207475
Disclosure of Invention
Problems to be solved by the invention
For example, when it is desired to perform plasma processing on only a small amount of samples, it is advantageous in terms of cost and the like if the apparatus for plasma processing is not large-sized and the plasma generating means is manually moved to perform plasma processing in a predetermined region. However, it is considered that no technique for accurately and efficiently performing plasma processing in a predetermined region of a workpiece by such a method has been established.
An object of the present invention is to provide a technique capable of accurately and efficiently performing plasma processing on a predetermined region of a workpiece by manual operation.
Means for solving the problems
A jig according to an example of the present invention is a jig for a plasma processing apparatus having a plasma generating portion for generating plasma, and includes: a support table on which a workpiece to be plasma-processed by the plasma processing apparatus is placed; a support post extending from the support base; and a guide plate which is supported by the support column and has a plurality of slits for guiding the plasma generating unit when the plasma processing is performed. At least one end of each of the plurality of slits is adjacent to an end of the other slit via a connecting portion. The support table and the guide plate are configured to be relatively movable as follows: at least one end of at least one of the slits is arranged at an overlapping position overlapping with a position where an end of an adjacent slit is present.
A plasma processing system of an example of the present invention has the above-described jig and the above-described plasma processing apparatus. The plasma processing apparatus further includes a casing surrounding the plasma generating portion. The housing has a housing recess recessed in a direction away from the guide plate on a surface that comes into contact with the guide plate during the plasma processing.
ADVANTAGEOUS EFFECTS OF INVENTION
The illustrated invention enables accurate and efficient plasma processing of a predetermined region of a workpiece by manual work.
Drawings
Fig. 1 is a schematic perspective view showing the structure of a plasma processing system according to an embodiment of the present invention.
Fig. 2 is a schematic sectional view showing the plasma processing apparatus in fig. 1 and its peripheral structure.
Fig. 3 is a schematic cross-sectional view showing a relationship between a support table and a workpiece according to an embodiment of the present invention.
Fig. 4 is a schematic plan view showing the structure of a guide plate according to an embodiment of the present invention.
Fig. 5 is a schematic sectional view showing the relationship between the stay and the guide plate according to the embodiment of the present invention.
Fig. 6 is a schematic diagram for explaining the operation of the guide plate according to the embodiment of the present invention.
Fig. 7 is a schematic plan view showing the structure of the guide plate according to the first modification.
Fig. 8 is a first schematic diagram for explaining the operation of the guide plate of the first modification.
Fig. 9 is a second schematic view for explaining the operation of the guide plate of the first modification.
Fig. 10 is a schematic plan view showing the structure of a guide plate according to a second modification.
In the figure:
1-plasma processing apparatus, 2-jig, 11-plasma generating part, 12-housing, 21-support table, 22-support column, 23-guide plate, 100-plasma processing system, 121-housing recess, 200-workpiece, 211-positioning part, 221-support column upper end (one end of support column), 231-slit, 232-coupling part, 233-first guide part, 234-second guide part, 235-hole part, 2321-first coupling part, 2322-second coupling part, OR-overlapping position.
Detailed Description
Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In this specification, the vertical direction is defined by setting the side on which the workpiece 200 is disposed with respect to the support base 21 to be upward. In the drawings, the X direction and the Y direction are directions perpendicular to each other on a plane perpendicular to the vertical direction, and the X direction is referred to as the left-right direction and the Y direction is referred to as the front-rear direction, thereby explaining the shape and positional relationship of each part. The above directions are only names for explanation, and are not intended to limit actual positional relationships and directions.
< 1. plasma processing system
Fig. 1 is a schematic perspective view showing the structure of a plasma processing system 100 according to an embodiment of the present invention. As shown in fig. 1, a plasma processing system 100 has a plasma processing apparatus 1 and a jig 2.
Fig. 2 is a schematic sectional view showing the plasma processing apparatus 1 in fig. 1 and its peripheral structure. The plasma processing apparatus 1 includes a plasma generating portion 11. The plasma processing apparatus 1 also has a housing 12. In the present embodiment, the plasma processing apparatus 1 is preferably an atmospheric pressure plasma processing apparatus that generates plasma under atmospheric pressure. The plasma processing performed by the plasma processing apparatus 1 may include, for example, surface modification processing, thin film formation processing, ashing processing, cleaning processing, or the like.
The plasma generating unit 11 generates plasma. In the present embodiment, the plasma generating unit 11 generates plasma by a remote control method. The plasma generating unit 11 generates plasma between a gap between a high voltage electrode and a ground electrode, not shown, and brings an active material generated by the plasma into contact with the surface of the workpiece 200 by an air flow. The high voltage electrode is connected to a high voltage power supply, not shown, disposed outside the plasma generating section 11 through a lead wire. The type of gas supplied from the outside of the plasma generation part 11 to the plasma generation part 11 may be appropriately selected according to the purpose of the process, and may be, for example, nitrogen gas, or a mixed gas of nitrogen gas and oxygen gas.
The plasma generator 11 may not be remote controlled. For example, the plasma generating unit 11 may generate plasma by direct connection. In this case, for example, the workpiece 200 has conductivity and constitutes an electrode paired with the high-voltage electrode provided in the plasma generating section 11.
The housing 12 surrounds the plasma generating portion 11. In the present embodiment, the housing 12 serves as a gripping portion for allowing an operator to manually move the plasma generating portion 11. The case 12 is made of resin such as abs (acrylonitrile butadiene styrene) resin. Specifically, the plasma generating portion 11 is surrounded by the case 12 in a state where at least a part thereof is exposed. As shown in fig. 2, the plasma generating portion 11 is enclosed by the case 12 so that at least a front end portion 11a of the blown plasma is exposed.
The jig 2 is a jig for the plasma processing apparatus 1. The jig 2 is used when the plasma processing apparatus 1 is used to perform the plasma processing on a predetermined region of the workpiece 200 by manual operation. The jig 2 includes a support base 21, a pillar 22, and a guide plate 23.
A workpiece 200 subjected to plasma processing by the plasma processing apparatus 1 is placed on the support base 21. The support base 21 is made of, for example, metal or resin. In the present embodiment, the support base 21 extends in a direction orthogonal to the vertical direction. The workpiece 200 is placed on the upper surface side of the support base 21. Specifically, the support base 21 has a rectangular shape when viewed in a plan view in the vertical direction. However, the support base 21 may not be rectangular, and may have other shapes such as a circular shape and an elliptical shape.
Fig. 3 is a schematic cross-sectional view showing a relationship between the support table 21 and the workpiece 200 according to the embodiment of the present invention. As shown in fig. 3, in the present embodiment, the support table 21 has a positioning portion 211 for positioning the workpiece 200. This makes it possible to fix the workpiece 200 at a position suitable for plasma processing and perform plasma processing. That is, the accuracy of the plasma processing can be improved. Specifically, the positioning portion 211 is a projection projecting upward from the upper surface of the support base 21. The shape of the protrusion is not particularly limited, and may be, for example, a cylindrical shape or a prismatic shape. The projection and the support base 21 may be a single member or may be separate members. The workpiece 200 is provided with a recess or hole into which the projection constituting the positioning portion 211 is inserted. The number of the positioning portions 211 may be one or plural. In the present embodiment, the number of the positioning portions 211 is plural.
The positioning portion 211 may not be a projection, and may be, for example, a recess recessed downward from the upper surface of the support base 21, a through hole penetrating the support base 21 in the vertical direction, or the like. In this case, the workpiece 200 may be provided with a projection to be inserted into the recess or the through hole. Further, the upper surface of the support base 21 may be provided with a guide portion for guiding the workpiece 200 to an appropriate position on the support base 21, in addition to the positioning portion 211. This makes it possible to easily dispose the workpiece 200 at an appropriate position, and thus to improve workability. The guide portion may be, for example, a columnar portion extending upward from the upper surface of the support base 21 longer than the positioning portion 211.
The support posts 22 extend from the support table 21. The support column 22 is made of, for example, metal or resin. In the present embodiment, the support column 22 extends in the vertical direction. Specifically, the support columns 22 are disposed at four corners of the support base 21, respectively, and extend upward from the upper surface of the support base 21. That is, in the present embodiment, the number of the support columns 22 is plural. However, the number of the support column 22 may be one, and in this case, the support column 22 may have, for example, a ring shape.
The guide plate 23 is supported by the stay 22. The guide plate 23 has a plate shape having a thickness in the vertical direction. The guide plate 23 is made of resin such as polyacetal, for example. The guide plate 23 may be made of a member other than resin. In the present embodiment, the guide plate 23 is disposed above the workpiece 200. The guide plate 23 is supported on the upper portion of the stay 22. The guide plate 23 is provided with a plurality of slits 231 for guiding the plasma generator 11 during plasma processing. In the present embodiment, the number of the slits 231 is two. The slit 231 penetrates the guide plate 23 in the vertical direction, and extends in a slender shape in accordance with the shape of the surface 200a to be processed of the workpiece 200. Specifically, the workpiece 200 has an annular surface to be processed 200a, and the guide plate 23 is provided with two semicircular slits 231 to perform plasma processing on the entire annular surface to be processed 200 a. The details of this are explained below.
The plasma processing apparatus 1 is disposed such that the distal end portion 11a of the plasma generating portion 11 faces downward. As shown in fig. 2, when the plasma processing is performed, the distal end portion 11a of the plasma generating portion 11 enters the slit 231 and faces the surface to be processed 200a of the workpiece 200. By inserting the distal end portion 11a into the slit 231, the movement of the plasma generation portion 11 in the direction orthogonal to the vertical direction is restricted by the slit 231, and the movement can be performed only in the direction in which the slit 231 extends. When the tip end portion 11a enters the slit 231, the plasma blown out from the tip end portion 11a hits the surface 200a to be processed of the workpiece 200, and plasma processing is performed. By moving the plasma generating portion 11 along the slit 231, the region of the workpiece 200 to which the plasma processing is performed moves.
When the plasma generating part 11 moves along the slit 231, the lower surface of the housing 12 comes into contact with the upper surface of the guide plate 23. That is, the housing 12 moves relative to the guide plate 23 in a state where the lower surface of the housing 12 is in contact with the upper surface of the guide plate 23. This keeps the distance between the distal end portion 11a and the surface 200a to be processed of the workpiece 200 constant, and thus the plasma processing can be stably performed.
The housing 12 has a housing recess 121 recessed in a direction away from the guide plate 23 on a surface that comes into contact with the guide plate 23 during plasma processing. In detail, the housing 12 has a housing recess 121 recessed upward on a lower surface. By providing the housing recess 121, the contact area between the housing 12 and the guide plate 23 can be reduced. As a result, the resistance when the plasma processing apparatus 1 is manually moved on the guide plate 23 can be reduced, and the movement of the plasma processing apparatus 1 can be easily performed.
Further, a single or a plurality of housing recesses 121 may be formed on the lower surface of the housing 12. The housing recess 121 may be annular, rectangular, circular, or the like. Instead of providing the housing recess 121 in the housing 12, a recess may be provided in the guide plate 23 for the purpose of reducing the contact area.
< 2. detailed Structure of jig >
The support base 21 and the guide plate 23 are provided to be movable relative to each other. In the present embodiment, the guide plate 23 is provided to be movable relative to the support base 21. Specifically, the support column 22 is fixed to the support base 21. The guide plate 23 is supported to be movable relative to the strut 22. Accordingly, the guide plate 23, which can be made lighter than the support base 21 on which the workpiece 200 is placed, is moved, and the workability can be improved.
The support column 22 may be a single component with the support base 21 or may be a separate component. When the support column 22 and the support base 21 are separate members, the support column 22 may be fixed to the support base 21 by a fixing member such as a screw or an adhesive, for example.
The support table 21 may be configured to be movable relative to the guide plate 23. In this case, for example, the guide plate 23 may be fixed to the pillar 22, and the support table 21 is supported so as to be movable relative to the pillar 22.
The guide plate 23 is movable in at least one direction within a plane orthogonal to the vertical direction. According to this configuration, it is possible to avoid the shape of the jig 2 having a structure in which the guide plate 23 moves relative to the support base 21 from becoming complicated. Fig. 4 is a schematic plan view showing the structure of the guide plate 23 according to the embodiment of the present invention. In the present embodiment, the guide plate 23 is movable in one direction within a plane orthogonal to the vertical direction.
As shown in fig. 4, the guide plate 23 has a rectangular plate shape. However, the guide plate 23 may have another shape such as a circular plate shape. As described above, the guide plate 23 is provided with the plurality of slits 231. At least one end of each of the slits 231 is adjacent to an end of another slit 231 via a connecting portion 232.
In the present embodiment, the guide plate 23 is provided with two slits 231, i.e., a left slit 231L arranged on the left side and a right slit 231R arranged on the right side. The left slit 231L and the right slit 231R are each in a semicircular arc shape. The left slit 231L and the right slit 231R pass through the center in the left-right direction and are arranged line-symmetrically with respect to an axis L1 extending in the front-rear direction. The shape of the slit 231 is appropriately changed in accordance with the shape of the surface 200a to be processed of the workpiece 200. That is, the shape of the slit 231 of the present embodiment is merely an example. Both end portions of the left slit 231L are adjacent to both end portions of the right slit 231R via the connection portion 232. Both end portions of the right slit 231R are adjacent to both end portions of the left slit 231L via the connection portion 232.
The coupling portion 232 includes a first coupling portion 2321 extending in the first direction and connecting between adjacent slits 231. In the present embodiment, the front end of the left slit 231L and the front end of the right slit 231R are connected by a first connecting portion 2321 extending in the left-right direction. The rear end of the left slit 231L and the rear end of the right slit 231R are connected by a first connecting portion 2321 extending in the left-right direction. That is, the coupling parts 232 of the guide plate 23 of the present embodiment are all the first coupling parts 2321. In the present embodiment, the first direction is a left-right direction.
The guide plate 23 is formed with a first guide portion 233 extending in the first direction. In the present embodiment, the first guide part 233 is a through hole that penetrates the guide plate 23 in the up-down direction. However, the first guide part 233 may be a concave part provided on the lower surface of the guide plate 23 and recessed upward. The first guide portion 233 has a rectangular shape extending in the left-right direction when viewed in a plan view in the up-down direction. However, the shape of the first guide 233 may be appropriately changed. As shown in fig. 4, in the present embodiment, the first guide portions 233 are disposed at four corners of the guide plate 23. However, the arrangement and the number of the first guide portions 233 may be changed as appropriate. The first guide 233 is not limited to a plurality of guide portions, and may be a single guide portion.
Fig. 5 is a schematic sectional view showing the relationship between the stay 22 and the guide plate 23 according to the embodiment of the present invention. As shown in fig. 5, one end portion of the stay 22 is inserted into the first guide portion 233. The first guide portion 233 enables the guide plate 23 to move in the first direction in a pair with one end portion of the strut 22. Accordingly, the guide plate 23 can be easily moved to a predetermined position with respect to the support base 21. In the present embodiment, the upper end 221 of the support column 22 is inserted into the first guide 233. As described above, in the present embodiment, there are four support columns 22 and four first guide portions 233, and one support column upper end portion 221 is inserted into each first guide portion 233. The guide plate 23 is supported by the support column 22 in a state where the support column upper end 221 is inserted into the first guide portion 233. The first guide portion 233 enables the guide plate 23 to move in the left-right direction in pairs with the column upper end portion 221.
The pillar upper end 221 has a shorter length in the left-right direction than the first guide 233. The post upper end 221 has substantially the same length in the front-rear direction as the first guide 233. That is, in the plane orthogonal to the vertical direction, the movement of the guide plate 23 in a certain direction is restricted according to the relationship between the pillar upper end 221 and the first guide portion 233, and the movement can be made only in the left-right direction.
The pillar upper end 221 may have, for example, a cylindrical or prismatic pin shape extending in the vertical direction. Further, in the case where the pillar upper end 221 has a portion protruding beyond the upper surface of the first guide portion 233, the width of the protruding portion in the front-rear direction may be increased, and the guide plate 23 may not easily fall off the pillar 22.
The pillar upper end 221 may be a member separate from the pillar body 222 that constitutes most of the pillar 22, or may be a member fixed to the upper surface of the pillar body 222. However, the pillar upper end portion 221 may be formed as a single member with the pillar body portion 222. In the structure in which the column upper end portion 221 is a separate member from the column body 222, the column upper end portion 221 is detachable from the column body 222. For example, the post upper end 221 may be a screw. In this case, the head of the screw may be positioned above the first guide 233, and may function as a stopper for preventing the guide plate 23 from falling off the support column 22.
Fig. 6 is a schematic diagram for explaining the operation of the guide plate 23 according to the embodiment of the present invention. In fig. 6, the upper view shows a state where the left end of the first guide portion 233 is in contact with the column upper end portion 221, and the lower view shows a state where the right end of the first guide portion 233 is in contact with the column upper end portion 221. The guide plate 23 cannot be moved rightward from the state shown in the upper view of fig. 6. The guide plate 23 cannot be moved leftward from the state shown in the lower drawing of fig. 6. Hereinafter, the position of the guide plate 23 in the upper drawing of fig. 6 is referred to as a right limit position, and the position of the guide plate 23 in the lower drawing of fig. 6 is referred to as a left limit position.
When the guide plate 23 is located at the right limit position, the left slit 231L overlaps the upper surface of the workpiece 200 over a slightly larger area than the left half portion in the up-down direction. Specifically, the left slit 231L has a shape slightly extending from a semicircular arc to both sides in the circumferential direction. Therefore, when the guide plate 23 is located at the right limit position, the plasma processing apparatus 1 can perform the plasma processing on a slightly larger area of the upper surface of the workpiece 200 than the left half portion. In the present embodiment, when the guide plate 23 is located at the right limit position, the right slit 231R does not vertically overlap the upper surface of the workpiece 200. However, a part of the right slit 231R may overlap the upper surface of the workpiece 200 in the vertical direction.
On the other hand, in the case where the guide plate 23 is located at the left limit position, the right slit 231R overlaps with a slightly larger area than the right half of the upper surface of the workpiece 200 in the up-down direction. That is, the right slit 231R is also shaped to slightly expand from the semicircular arc to both sides in the circumferential direction. Therefore, when the guide plate 23 is located at the left limit position, the plasma processing apparatus 1 can perform the plasma processing on a region slightly larger than the right half of the upper surface of the workpiece 200. In the present embodiment, when the guide plate 23 is located at the left limit position, the left slit 231L does not vertically overlap the upper surface of the workpiece 200. However, a part of the left slit 231L may overlap the upper surface of the workpiece 200 in the vertical direction.
As shown in fig. 6, the support base 21 and the guide plate 23 are provided so as to be capable of relative displacement as follows: at least one end of at least one slit 231 is arranged at an overlapping position OP overlapping a position where an end of an adjacent slit 231 exists. Specifically, when the guide plate 23 moves relative to the support base 21 and moves from the right limit position to the left limit position, both end portions of the right slit 231R are disposed at the overlapping position OP overlapping positions where both end portions of the adjacent left slit 231L exist. When the guide plate 23 moves relative to the support base 21 from the left limit position to the right limit position, the both end portions of the left slit 231L are disposed at the overlapping positions OP where the both end portions of the adjacent right slit 231R overlap.
Further, the overlapping position OP may be slightly generated by the relative movement, and the size of the overlapped end portion may be appropriately changed. The overlapping end portions may also be end edges to each other. That is, when the guide plate 23 is located at the right limit position, the left slit 231L may vertically overlap with the left half portion of the upper surface of the workpiece 200, and when the guide plate 23 is located at the left limit position, the right slit 231R may vertically overlap with the right half portion of the upper surface of the workpiece 200. Further, the overlapping position may be generated by the relative movement, and the shapes of the left and right slits 231L, 231R are not necessarily symmetrical. The shape of the left and right slits 231L, 231R may be appropriately changed in accordance with the shape of the workpiece 200.
For example, consider the following example: when the guide plate 23 cannot move relative to the support base 21, the upper surface of the annular workpiece 200 is plasma-processed by the plasma processing apparatus 1 through the left and right slits 231L, 231R provided in the guide plate 23. In this example, the left slit 231L vertically overlaps a substantially left half of the upper surface of the annular workpiece 200, and the right slit 231R vertically overlaps a substantially right half of the upper surface of the annular workpiece 200. In this case, by guiding the plasma processing apparatus 1 using the guide plate 23, most of the upper surface of the annular workpiece 200 can be plasma-processed. However, since the coupling portion 232 that couples the left and right slits 231L, 231R is present, a portion where plasma processing cannot be performed on a part of the upper surface of the annular workpiece 200 is generated. Therefore, it is necessary to remove the guide plate 23 and perform plasma processing on a region where plasma processing is not possible. Such a process requires that the region where the plasma process is not performed be determined after the guide plate 23 is removed, and the work load becomes heavy.
In this regard, in the present embodiment, the guide plate 23 is configured to be movable relative to the support base 21. By the relative movement, both end portions of the right slit 231R can be arranged at the overlapping position OP overlapping the position where both end portions of the left slit 231L exist. Therefore, the guide plate 23 may be disposed at the right limit position to perform the plasma processing using the left slit 231L, and then the guide plate 23 may be disposed at the left limit position to perform the plasma processing using the right slit 231R. Accordingly, the entire upper surface of the workpiece 200 can be plasma-treated regardless of the presence or absence of the connection portion 232. That is, in the present embodiment, it is not necessary to remove the guide plate 23 to perform the plasma processing, and the plasma processing can be performed accurately and efficiently by manual work.
In the present embodiment, when the one end portion of the strut 22 comes into contact with one end portion and the other end portion of the first guide portion 233 in the first direction by the movement of the guide plate 23, at least one end portion of the slit 231 is disposed at the overlap position OP. Specifically, when the pillar upper end 221 contacts the left end of the first guide portion 233 by the movement of the guide plate 23, both ends of the left slit 231L are disposed at the overlapping position OP. When the pillar upper end 221 contacts the right end of the first guide portion 233 by the movement of the guide plate 23, both ends of the right slit 231R are disposed at the overlapping position OP. Accordingly, the guide plate 23 can be easily disposed at a position where the overlapping position OP can be obtained, and workability can be improved. However, the above-described overlapping position OP may be arranged at a position where the pillar upper end 221 does not contact both ends of the first guide 233.
< 3. modification example >
(3-1. first modification)
Fig. 7 is a schematic plan view showing the structure of the guide plate 23A of the first modification. The guide plate 23A is provided to be movable relative to the support base 21. In the present modification, the guide plate 23A is movable in two directions within a plane orthogonal to the vertical direction. In detail, the two directions are mutually orthogonal directions.
As shown in fig. 7, in the present modification, the guide plate 23A also has a rectangular plate shape. The guide plate 23A is provided with four slits 231A. The coupling portion 232A has a first coupling portion 2321A extending in the first direction and connecting between the adjacent slits 231A. The coupling portion 232A further has a second coupling portion 2322 extending in the second direction and connected between the adjacent slits 231A. In the present modification, the first direction is a left-right direction, and the second direction is an up-down direction.
Specifically, the guide plate 23A has a left rear slit 231LR, a left front slit 231LF, a right rear slit 231RR, and a right front slit 231 RF. The four slits 231LR, 231LF, 231RR, 231RF are each shaped like an arc 1/4. The left and right rear slits 231LR and 231RR, and the left and right front slits 231LF and 231RF pass through the center in the left-right direction, and are arranged line-symmetrically with respect to an axis L1 extending in the front-rear direction. The left rear slit 231LR and the left front slit 231LF, and the right rear slit 231RR and the right front slit 231RF pass through the center in the front-rear direction, and are arranged line-symmetrically with respect to an axis L2 extending in the left-right direction.
The right rear end portion of the left rear slit 231LR and the left rear end portion of the right rear slit 231RR are connected by a first connecting portion 2321A extending in the left-right direction. The right front end of the left front slit 231LF and the left front end of the right front slit 231RF are connected by a first connection 2321A extending in the left-right direction. The left front end of the left rear slit 231LR and the left rear end of the left front slit 231LF are connected by a second connection portion 2322 extending in the front-rear direction. The right front end of the right rear slit 231RR and the right rear end of the right front slit 231RF are connected by a second connection portion 2322 extending in the front-rear direction.
The guide plate 23A is formed with a first guide portion 233A extending in the first direction into which one end portion of the strut 22 is inserted. Specifically, the pillar upper end 221 is inserted into the first guide portion 233A. The first guide portion 233A is a rectangular through hole that penetrates in the vertical direction and extends in the lateral direction. The first guide portions 233A are disposed at four corners of the guide plate 23A. The first guide portion 233A enables the guide plate 23A to move in the left-right direction in pairs with the column upper end portion 221.
The guide plate 23A is formed with a second guide portion 234 extending in the second direction and into which one end portion of the strut 22 is inserted. The second guide portion 234 enables the guide plate 23A to move in the second direction in pair with the one end portion of the strut 22. In detail, the pillar upper end portion 221 is inserted into the second guide portion 234. The second guide portion 234 is a rectangular through hole that penetrates in the vertical direction and extends in the front-rear direction. The second guide portions 234 are disposed at four corners of the guide plate 23A. The second guide portion 234 enables the guide plate 23A to move in the front-rear direction in pairs with the pillar upper end portion 221.
In the present modification, the second guide portion 234 includes a pair of left and right second guide portions 234L and 234R. The left second guide portion 234L is connected to the first guide portion 233A, and the rear end portion of the left second guide portion 234L also serves as the left end portion of the first guide portion 233A. The right second guide portion 234R is connected to the first guide portion 233A, and the rear end of the right second guide portion 234R also serves as the right end of the first guide portion 233A.
Note that the relationship between the first guide portion 233A and the second guide portion 234 is merely an example. For example, the distal end of the left second guide 234L may also serve as the left end of the first guide 233A, and the distal end of the right second guide 234R may also serve as the right end of the first guide 233A. The first guide portion 233A and the second guide portion 234 may not be connected.
Fig. 8 is a first schematic diagram for explaining the operation of the guide plate 23A of the first modification. In fig. 8, the upper view shows a state where the left end of the first guide portion 233A and the rear end of the left second guide portion 234L are in contact with the column upper end portion 221. In fig. 8, the lower view shows a state where the right end of the first guide portion 233A and the rear end of the right second guide portion 234R are in contact with the column upper end portion 221. The guide plate 23A cannot be moved rightward and forward from the state shown in the upper view of fig. 8. The guide plate 23A cannot be moved leftward and forward from the state shown in the lower drawing of fig. 8. Hereinafter, the position of the guide plate 23A in the upper drawing of fig. 8 is referred to as a right/front limit position, and the position of the guide plate 23A in the lower drawing of fig. 8 is referred to as a left/front limit position.
Fig. 9 is a second schematic diagram for explaining the operation of the guide plate 23A of the first modification. In fig. 9, the left diagram shows the same state as the upper diagram shown in fig. 8. That is, the left diagram of fig. 9 shows a case where the guide plate 23A is located at the right/front limit position. In fig. 9, the right drawing shows a state where the front end of the left second guide portion 234L is in contact with the column upper end portion 221. In the state of the right drawing of fig. 9, the guide plate 23A is located at the right limit position and cannot move rearward. Hereinafter, the position of the guide plate 23A in the right drawing of fig. 9 is referred to as a right/rear limit position.
Although not shown, the guide plate 23A can move to a state where the front end of the right second guide portion 234R contacts the upper end portion 221 of the strut. In this state, the guide plate 23A is located at the left limit position and cannot move rearward. This position of the guide plate 23A is referred to as a left/rear limit position.
In the explanation using fig. 8 and 9, of the regions that bisect the annular upper surface (surface to be processed) of the workpiece 200 into four, the region on the rear left is referred to as a first region R1, the region on the rear right is referred to as a second region R2, the region on the front left is referred to as a third region R3, and the region on the front right is referred to as a fourth region R4.
When the guide plate 23A is located at the right/front limit position (see fig. 8, top view), the left rear slit 231LR and a region slightly larger than the first region R1 of the upper surface of the workpiece 200 overlap in the vertical direction. That is, the left rear slit 231LR has a shape slightly spreading from the 1/4 arc to both sides in the circumferential direction. Therefore, when the guide plate 23A is located at the right/front limit position, the plasma processing apparatus 1 can perform the plasma processing on the region slightly larger than the first region R1 of the upper surface of the workpiece 200.
Further, in the case where the guide plate 23A is located at the left/front limit position (lower drawing of fig. 8), the right rear slit 231RR overlaps with a slightly larger area than the second area R2 of the upper surface of the workpiece 200 in the up-down direction. That is, the right rear slit 231RR is shaped to slightly expand from the 1/4 arc to both sides in the circumferential direction. Therefore, when the guide plate 23A is positioned at the left/front limit position, the plasma processing apparatus 1 can perform the plasma processing on the region slightly larger than the second region R2 of the upper surface of the workpiece 200.
When the guide plate 23A is located at the right/rear limit position (see the left drawing in fig. 9), the left front slit 231LF vertically overlaps an area slightly larger than the third area R3 on the upper surface of the workpiece 200. That is, the left front slit 231LF is slightly expanded from the 1/4 arc to both sides in the circumferential direction. Therefore, when the guide plate 23A is located at the right/rear limit position, the plasma processing apparatus 1 can perform the plasma processing on the region slightly larger than the third region R3 of the upper surface of the workpiece 200.
Further, when the guide plate 23A is located at the left/rear limit position, the right front slit 231RF overlaps a slightly larger area than the fourth area R4 of the upper surface of the workpiece 200 in the up-down direction. That is, the right front slit 231RF has a shape slightly expanding from the 1/4 arc to both sides in the circumferential direction. Therefore, when the guide plate 23A is positioned at the left/rear limit position, the plasma processing apparatus 1 can perform the plasma processing on the region slightly larger than the fourth region R4 of the upper surface of the workpiece 200.
In the present modification, the support base 21 and the guide plate 23A are provided to be relatively movable as follows: one end of the slit 231A is arranged at an overlapping position OP overlapping with a position where an end of an adjacent slit 231A exists.
Specifically, when the guide plate 23A moves relative to the support base 21 and moves from the right/front limit position to the left/front limit position, the left rear end portion of the right rear slit 231RR is arranged at the overlap position OP overlapping the position where the right rear end portion of the adjacent left rear slit 231LR exists. When the guide plate 23A moves relative to the support base 21 and moves from the left/front limit position to the right/front limit position, the right rear end portion of the left rear slit 231LR is disposed at the overlapping position OP overlapping the position where the left rear end portion of the adjacent right rear slit 231RR exists.
When the guide plate 23A moves relative to the support base 21 from the right/front limit position to the right/rear limit position, the left rear end portion of the left front slit 231LF is arranged at the overlapping position OP overlapping the position where the left front end portion of the adjacent left rear slit 231LR exists. When the guide plate 23A moves relative to the support base 21 from the right/rear limit position to the right/front limit position, the left front end portion of the left rear slit 231LR is disposed at the overlapping position OP overlapping the position where the left rear end portion of the adjacent left front slit 231LF exists.
When the guide plate 23A moves relative to the support base 21 and moves from the left/front limit position to the left/rear limit position, the right rear end portion of the right front slit 231RF is disposed at the overlapping position OP overlapping the position where the right front end portion of the adjacent right rear slit 231RR exists. When the guide plate 23A moves relative to the support base 21 and moves from the left/rear limit position to the left/front limit position, the right front end portion of the right rear slit 231RR is arranged at the overlap position OP overlapping the position where the right rear end portion of the adjacent right front slit 231RF exists.
That is, in the present modification, similarly, the entire upper surface of the workpiece 200 can be plasma-processed regardless of the presence or absence of the coupling portion 232A by the movement of the guide plate 23A using the first guide portion 233A and the second guide portion 234. In the present modification as well, the plasma processing can be performed accurately and efficiently by manual work.
In the present modification, in order to increase the direction in which the guide plate 23A can move, the number of the slits 231A is increased to be larger than two, and the length of each slit 231A can be shortened. This increases the number of the connection portions 232A provided in the guide plate 23A, thereby improving the strength of the guide plate 23A.
As can be seen from the above, in the present modification as well, when the one end portion of the stay 22 comes into contact with one end portion and the other end portion of the first guide portion 233A in the first direction by the movement of the guide plate 23A, the one end portion of the slit 231 is disposed at the overlap position OP. When the one end portion of the strut 22 comes into contact with one end portion or the other end portion of the second guide portion 234 in the second direction by the movement of the guide plate 23A, both the one end portions of the slits 231A are disposed at the overlapping position OP. Therefore, the work of moving the guide plate 23A, which is necessary to perform the plasma processing on the entire upper surface of the workpiece 200, is simplified, and the plasma processing can be efficiently performed.
(3-2. second modification)
Fig. 10 is a schematic plan view showing the structure of the guide plate 23B of the second modification. In the second modification, the guide plate 23B is formed with a plurality of holes 235 or recesses into which one end portions of the stays 22 are inserted. In the example shown in fig. 10, the guide plate 23B is formed with a plurality of holes 235 into which the stay upper ends 221 are inserted. The hole 235 penetrates the guide plate 23B in the vertical direction. The diameter of the circular hole 235 is slightly larger than the diameter of the columnar pillar upper end 221 when viewed in a top-bottom direction. Instead of the hole 235, a concave portion recessed upward may be provided on the lower surface of the guide plate 23B.
Specifically, the four pillar upper end portions 221 are formed with left and right holes 235L and 235R, respectively. That is, two holes 235 are formed at each of four corners of the rectangular plate-shaped guide plate 23B. The left hole portion 235L and the right hole portion 235R are provided instead of the first guide portion 233 described above.
In a state where the pillar upper end portion 221 is inserted into the left hole portion 235L, the left slit 231L overlaps the upper surface of the workpiece 200 in the vertical direction over a region slightly larger than the left half portion. In this example, in detail, the left slit 231L has a shape slightly expanding from a semicircular arc to both sides in the circumferential direction. Therefore, in a state where the column upper end portion 221 is inserted into the left hole portion 235L, the plasma processing apparatus 1 can perform the plasma processing on a region slightly larger than the left half portion of the upper surface of the workpiece 200.
On the other hand, in a state where the guide plate 23B is once detached from the stay 22 and the stay upper end 221 is inserted into the right hole 235R, the right slit 231R overlaps the upper surface of the workpiece 200 in the vertical direction over a region slightly larger than the right half. In this example, in detail, the right slit 231R has a shape slightly expanding from a semicircular arc to both sides in the circumferential direction. Therefore, in a state where the column upper end portion 221 is inserted into the right hole portion 235R, the plasma processing apparatus 1 can perform the plasma processing on a region slightly larger than the right half portion of the upper surface of the workpiece 200.
In this example, at least one end of the slit 231 is arranged at the overlapping position OP by changing the relative movement of the hole 235 into which the one end of the strut 22 is inserted or the recess. Specifically, by changing the left hole portion 235L into which the pillar upper end portion 221 is inserted to the relative movement of the right hole portion 235R, both end portions of the right slit 231R are disposed at the overlapping position OP overlapping with the position existing before both end portions of the left slit 231L. Then, by changing the right hole portion 235R into which the pillar upper end portion 221 is inserted to the relative movement of the left hole portion 235L, both end portions of the left slit 231L are disposed at the overlapping position OP overlapping with the position existing before both end portions of the right slit 231R.
In the present modification as well, by simply moving the guide plate 23B relative to the support base 21, the entire upper surface of the workpiece 200 can be plasma-processed regardless of the presence or absence of the connection portion 232. In the present modification as well, the plasma processing can be performed accurately and efficiently by manual work.
< 4. attention to items
Various technical features disclosed in the present specification can be variously modified within a scope not departing from the gist of technical creation thereof. The embodiments and modifications described in the present specification can be combined and implemented within a possible range.
The above shows an example of applying the present invention to a workpiece 200 having a processed portion in a closed curve shape. However, the present invention can also be applied to a workpiece having a portion to be processed which is not in a closed curve shape, such as a C-shape. In this case, the support base and the guide plate may be configured to be relatively movable as follows: one end of each slit is arranged at an overlapping position overlapping with a position where an end of an adjacent slit is present.
In the above, an example in which the present invention is applied to the workpiece 200 having the processed portion in the bilaterally symmetrical shape is shown. However, the present invention can also be applied to a workpiece having a left-right asymmetrical shape of a portion to be processed. For example, when plasma treatment is used to clean the region where the sealant is applied, the sealant-applied regions of the two members bonded by the sealant are in mirror image relationship. When the sealant application region has a laterally asymmetrical shape, the use of the guide plate reversed in the lateral direction enables the plasma treatment of one of the two members in the mirror image relationship using one guide plate 23.
In the above, the guide plate 23 is configured to move linearly in the plane orthogonal to the vertical direction. However, in the case where the surface to be processed of the workpiece is annular, the guide plate may be configured to be rotationally moved with respect to the support base. By this rotational movement, one end of the plurality of slits can be arranged at an overlapping position overlapping with a position existing before the end of the adjacent slit.
Industrial applicability of the invention
The present invention can be utilized when plasma processing is performed on a workpiece.
Claims (10)
1. A jig for a plasma processing apparatus having a plasma generating section for generating plasma, comprising:
a support table on which a workpiece to be plasma-processed by the plasma processing apparatus is placed;
a support post extending from the support base; and
a guide plate supported by the support column and provided with a plurality of slits for guiding the plasma generating part during the plasma processing,
at least one end of each of the plurality of slits is adjacent to an end of the other slit via a connecting portion,
the support table and the guide plate are configured to be relatively movable as follows: at least one end of at least one of the slits is arranged at an overlapping position overlapping with a position where an end of an adjacent slit is present.
2. The clamp of claim 1,
the support column is fixed on the support platform,
the guide plate is supported to be movable relative to the support column.
3. The clamp of claim 2,
the support posts extend in the up-down direction,
the guide plate is movable in at least one direction within a plane orthogonal to the vertical direction.
4. The clamp of claim 2 or 3,
the connecting part has a first connecting part extending along a first direction and connected between the adjacent slits,
a first guide part extending in a first direction and into which one end of the strut is inserted is formed on the guide plate,
the first guide portion enables the guide plate to move in a first direction in a pair with one end portion of the strut.
5. The clamp of claim 4,
when one end of the strut is in contact with one end or the other end of the first guide portion in the first direction by the movement of the guide plate, at least one end of the slit is disposed at the overlapping position.
6. The clamp of claim 4 or 5,
the connecting portion further includes a second connecting portion extending in a second direction orthogonal to the first direction and connected between the slits adjacent to each other,
a second guide part extending along a second direction and allowing one end of the strut to be inserted is formed on the guide plate,
the second guide portion enables the guide plate to move in a second direction in a pair with one end portion of the strut.
7. The clamp of claim 6,
when one end of the strut contacts one end or the other end of the second guide portion in the second direction due to the movement of the guide plate, both ends of the slit are disposed at the overlapping position.
8. The jig as claimed in any one of claims 1 to 7,
the support table has a positioning portion for positioning the workpiece.
9. The clamp of claim 2,
the guide plate is formed with a plurality of holes or recesses into which one end portions of the stays are inserted,
at least one end of the slit is arranged at the overlapping position by changing relative movement of the hole or the recess into which one end of the strut is inserted.
10. A plasma processing system, characterized in that,
having the jig as claimed in any one of claims 1 to 9 and the above plasma processing apparatus,
the plasma processing apparatus further includes a casing surrounding the plasma generating portion,
the housing has a housing recess recessed in a direction away from the guide plate on a surface that comes into contact with the guide plate during the plasma processing.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-072055 | 2019-04-04 | ||
| JP2019072055A JP7215305B2 (en) | 2019-04-04 | 2019-04-04 | JIG FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111799147A true CN111799147A (en) | 2020-10-20 |
Family
ID=72747181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010251728.7A Withdrawn CN111799147A (en) | 2019-04-04 | 2020-04-01 | Jig for plasma processing apparatus and plasma processing system |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7215305B2 (en) |
| CN (1) | CN111799147A (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP7215305B2 (en) | 2023-01-31 |
| JP2020170655A (en) | 2020-10-15 |
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Application publication date: 20201020 |