CN111775437B - Pretreatment device for substrate - Google Patents
Pretreatment device for substrate Download PDFInfo
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- CN111775437B CN111775437B CN202010635419.XA CN202010635419A CN111775437B CN 111775437 B CN111775437 B CN 111775437B CN 202010635419 A CN202010635419 A CN 202010635419A CN 111775437 B CN111775437 B CN 111775437B
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- pretreatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/02—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/0004—Component parts, details or accessories; Auxiliary operations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/08—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the cooling method
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0036—Heat treatment
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- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention discloses a pretreatment device of a substrate.A pretreatment feeding hole is formed on the left side wall of a pretreatment box, and a pretreatment discharging hole is formed on the right side wall of the pretreatment box; a process treatment inlet and outlet is formed on the left side wall of the process box; a left closing plate is arranged on the left end face of the pretreatment tank in a lifting manner; a right closing plate is arranged between the process box and the pretreatment box in a lifting way; a left and a right transfer devices are arranged in the pretreatment box; the left and right transfer device comprises a rectangular frame-shaped substrate limiting frame at the upper part and a rectangular frame-shaped left and right moving frame at the lower part; the left and right moving frames are arranged in the pretreatment box in a left-right moving mode; the substrate limiting frame is arranged on the upper end surface of the left-right moving frame in a left-right moving mode; a plurality of lower supporting plates which are uniformly distributed in the front-back direction are formed between the left side wall and the right side wall of the left moving frame and the right moving frame.
Description
Technical Field
The invention relates to the technical field of substrate pretreatment, in particular to a pretreatment device for a substrate.
Background
In the production process of products such as solar cells, liquid crystal display screens and the like, a workpiece which is used for carrying a plurality of silicon wafers for process coating or is called a substrate is subjected to process coating. The substrate is generally a thin plate-like object having a thickness dimension smaller than the web dimension, and a complete process is completed.
Generally, there are different temperature requirements on the substrate at different stages of the cell production process. For example, in a conventional PECVD coating process, the temperature of the process and the process chamber is usually maintained above 200 ℃, while the temperature of the substrate in the ambient atmosphere is generally only about 20 ℃. At this time, if the substrate can be reasonably preheated, the temperature of the substrate is raised to a certain value, so that the thermal stress and thermal deformation of the substrate caused by large temperature difference after the substrate is sent into the process chamber can be reduced, the temperature uniformity of the substrate can be effectively improved, the substrate can be prevented from being cracked or damaged, and the process effect can be improved.
For example, after a certain process is completed, the substrate needs to be taken out of the apparatus, and at this time, the substrate will have a high temperature close to about 200 ℃, and if the substrate is taken out of the apparatus directly, the substrate is not only dangerous at high temperature, unfavorable for operation, and easy to cause accidents, but also the substrate is exposed to the atmosphere directly at high temperature, and the thermal stress and thermal deformation caused by a large temperature difference are also easy to cause cracks of the process film, chipping or damage of the substrate, and the like. In addition, the high-temperature substrate is easy to react with oxygen, moisture and the like in the atmosphere to directly influence the process result. Therefore, it is necessary to cool the substrate reasonably and take it out of the apparatus after the process.
In view of the above situation, in the prior art, a preheating chamber or a cooling chamber is often added to a vacuum apparatus to achieve a temperature adjustment function, or temperature control and a loading chamber may be combined together. However, in either of the above-mentioned methods, it is necessary to add a separate transfer chamber between the loading chamber and the process chamber, which results in an increase in the footprint of the apparatus.
Disclosure of Invention
The invention aims to solve the technical problem that the existing substrate pretreatment structure occupies large space, and provides a substrate pretreatment device.
The technical scheme for solving the technical problems is as follows: a pretreatment device of a substrate comprises a pretreatment box and a process box; the pretreatment box is positioned on the left side of the process box; the inner top wall of the pretreatment box is provided with a temperature control unit; the temperature control unit is used for heating or cooling the substrate; a pretreatment feeding hole is formed in the left side wall of the pretreatment box, and a pretreatment discharging hole is formed in the right side wall of the pretreatment box; a process treatment inlet and outlet is formed on the left side wall of the process box; a left closing plate is arranged on the left end face of the pretreatment tank in a lifting manner; the left closing plate is used for sealing the pretreatment feeding hole; a right closing plate is arranged between the process box and the pretreatment box in a lifting way; the right closing plate is used for sealing the pretreatment discharge port and the process treatment inlet and outlet; a left and a right transfer devices are arranged in the pretreatment box; the left and right transfer device comprises a rectangular frame-shaped substrate limiting frame at the upper part and a rectangular frame-shaped left and right moving frame at the lower part; the left and right moving frames are arranged in the pretreatment box in a left-right moving mode; the substrate limiting frame moves left and right and is arranged on the upper end surface of the left and right moving frame; a plurality of lower supporting plates which are uniformly distributed front and back are formed between the left side wall and the right side wall of the left moving frame and the right moving frame; a loading and unloading device is arranged in the process box; the loading and unloading device is used for loading and unloading the substrates of the left and right transfer devices.
Preferably, a pair of lower left and right driving racks symmetrically arranged in front and back is fixed between the lower ends of the left and right side walls of the pretreatment tank; the front and rear side walls of the pretreatment box are respectively provided with a lower left guide bar and a lower right guide bar; the front end surface and the rear end surface of the left and right moving frame are respectively provided with a left guide groove and a right guide groove which are matched with the left guide bar and the right guide bar; a lower left driving motor and a lower right driving motor are fixed on the left end surface of the left and right moving frame; a lower left driving rod and a lower right driving rod are pivoted between the left side wall and the right side wall of the left moving frame and the right moving frame; the left end of the lower left and right driving rod is fixedly connected with the output shaft of the lower left and right driving motor; the left part and the right part of the lower left and right driving rods are respectively fixed with a driving worm; a driven central column is respectively pivoted between the left end and the right end of the front side wall and the rear side wall of the left moving frame and the right moving frame; a worm wheel is fixed in the center of the driven central column; the worm wheel is meshed with the driving worm on the corresponding side; driven gears are respectively fixed at the front end and the rear end of the driven central column; the driven gear is meshed with the lower left and right driving racks on the corresponding side.
Preferably, the front and rear ends of the upper end surface of the left and right moving frames are respectively formed with a front and rear blocking plate; the front and the rear blocking plates are provided with upper left and right driving racks; the substrate limiting frame is positioned between the pair of front and rear blocking plates; the centers of the front end surface and the rear end surface of the substrate limiting frame are respectively fixed with an upper driving motor; an upper driving gear is fixed on an output shaft of the upper driving motor; the upper driving gear is meshed with the upper left and right driving racks on the corresponding side.
Preferably, a central isolation chamber is arranged between the pretreatment box and the process box; the central isolation chamber surrounds the gap between the pretreatment box and the process box; the right closing plate is positioned in the central isolation chamber.
Preferably, the feeding and discharging device comprises a feeding and discharging cylinder; the feeding and discharging cylinder is fixed on the upper end surface of the process box; a sucker is fixed at the lower end of a piston rod of the feeding and discharging cylinder; the sucker is positioned in the process box; a workbench is arranged on the lower part of the process box in a left-right moving manner; the upper end surface of the workbench is lower than the lower end surface of the left and right moving frames.
Preferably, a horizontally arranged center cylinder is fixed at the lower end of the right side wall of the process box; the workbench is L-shaped; the vertical part of the workbench is positioned at the left end of the horizontal part of the workbench; the vertical part of the workbench is fixed at the left end of the piston rod of the cylinder in the middle.
The invention has the beneficial effects that: the structure is simple, the substrate is effectively conveyed, but the occupied space is small, and the substrate is effectively heated or cooled.
Drawings
FIG. 1 is a schematic structural view of a cross section at the time of feeding of the present invention;
FIG. 2 is a schematic structural view of a cross section in pretreatment according to the present invention;
FIG. 3 is a schematic structural view of a section of the present invention as it passes to the process box 20;
fig. 4 is a schematic plan view of the left-right transmission device 50 according to the present invention.
In the figure, 10, pretreatment tank; 100. pretreating a feed inlet; 101. pre-treating a discharge hole; 11. a lower left and right driving rack; 12. a lower left guide bar and a lower right guide bar; 20. a process box; 200. an inlet and an outlet for process treatment; 21. a feeding and discharging cylinder; 22. a suction cup; 23. a centering cylinder; 24. a work table; 30. a left closure plate; 40. a central isolation chamber; 41. a right closure plate; 50. a left and right transfer device; 51. moving the frame left and right; 511. a lower support plate; 512. a driven central column; 513. an upper left and right driving rack; 52. a lower left and right driving motor; 53. a lower left and right drive rod; 531. a drive worm; 54. a driven gear; 55. a substrate limiting frame; 551. an upper drive gear; 56. a worm gear; 60. a substrate.
Detailed Description
As shown in fig. 1 to 4, an apparatus for pretreating substrates comprises a pretreatment tank 10 and a process tank 20; the pretreatment tank 10 is located on the left side of the process tank 20; a temperature control unit is arranged on the inner top wall of the pretreatment box 10; the temperature control unit is used for heating or cooling the substrate 60; a pretreatment feeding hole 100 is formed on the left side wall of the pretreatment tank 10, and a pretreatment discharging hole 101 is formed on the right side wall; a process treatment inlet and outlet 200 is formed on the left side wall of the process box 20; a left closing plate 30 is arranged on the left end face of the pretreatment tank 10 in a lifting manner; the left closing plate 30 is used for sealing the pretreatment feed inlet 100; a right closing plate 41 is arranged between the process box 20 and the pretreatment box 10 in a lifting way; the right closing plate 41 is used for sealing the pretreatment discharge port 101 and the process treatment inlet and outlet 200; a left and right transfer device 50 is arranged in the pretreatment tank 10; the left-right transfer device 50 includes a substrate-limiting frame 55 having a rectangular frame shape at an upper portion and a left-right moving frame 51 having a rectangular frame shape at a lower portion; the left and right moving frame 51 is arranged in the pretreatment tank 10 in a left and right moving manner; the substrate limiting frame 55 is arranged on the upper end surface of the left-right moving frame 51 in a left-right moving mode; a plurality of lower supporting plates 511 which are uniformly distributed in the front and back are formed between the left and right side walls of the left and right moving frames 51; a loading and unloading device is arranged in the process box 20; the loading and unloading device is used for loading and unloading the substrate 60 of the left and right transfer device 50.
As shown in FIGS. 1 to 4, a pair of lower left and right driving racks 11, which are symmetrically arranged in front and back, is fixed between the lower ends of the left and right side walls of the pretreatment tank 10; the front and rear side walls of the pretreatment tank 10 are respectively provided with a lower left guide bar 12 and a lower right guide bar 12; the front and rear end surfaces of the left and right moving frames 51 are respectively formed with left and right lower guide grooves which are matched with the left and right lower guide bars 12; a lower left driving motor 52 and a lower right driving motor 52 are fixed on the left end surface of the left and right moving frame 51; a lower left driving rod 53 and a lower right driving rod 53 are pivoted between the left side wall and the right side wall of the left moving frame 51 and the right moving frame 51; the left end of the lower left and right driving rod 53 is fixedly connected with the output shaft of the lower left and right driving motor 52; the left and right parts of the lower left and right drive levers 53 are respectively fixed with drive worms 531; a driven central column 512 is respectively pivoted between the left end and the right end of the front side wall and the rear side wall of the left-right moving frame 51; a worm wheel 56 is fixed at the center of the driven central column 512; the worm wheel 56 meshes with the drive worm 531 on the corresponding side; the front end and the rear end of the driven central column 512 are respectively fixed with a driven gear 54; the driven gear 54 is engaged with the lower left and right drive racks 11 of the respective sides.
As shown in fig. 1 to 4, front and rear stoppers are formed on the front and rear ends of the upper end surface of the left and right moving frames 51, respectively; an upper left and right driving rack 513 is formed on the front and rear blocking plates; the substrate limit frame 55 is positioned between the pair of front and rear barrier plates; the centers of the front end surface and the rear end surface of the substrate limiting frame 55 are respectively fixed with an upper driving motor; an upper driving gear 551 is fixed on an output shaft of the upper driving motor; the upper drive gear 551 is engaged with the upper left and right drive racks 513 on the respective sides.
As shown in fig. 1 to 4, a central isolation chamber 40 is provided between the pretreatment tank 10 and the process tank 20; a central isolation chamber 40 surrounding the gap between the pretreatment tank 10 and the process tank 20; the right closure plate 41 is located within the central isolation chamber 40.
As shown in fig. 1 to 4, the loading and unloading device comprises a loading and unloading cylinder 21; the feeding and discharging cylinder 21 is fixed on the upper end surface of the process box 20; a suction cup 22 is fixed at the lower end of a piston rod of the feeding and discharging cylinder 21; the suction cup 22 is located in the process box 20; a workbench 24 is arranged on the lower part of the process box 20 in a left-right moving manner; the upper end surface of the table 24 is lower than the lower end surface of the left-right moving frame 51.
As shown in fig. 1 to 4, a horizontally arranged centering cylinder 23 is fixed at the lower end of the right side wall of the process box 20; the workbench 24 is L-shaped; the vertical portion of the table 24 is located at the left end of the horizontal portion thereof; the vertical portion of the table 24 is fixed to the left end of the piston rod of the centering cylinder 23.
The working principle of the substrate pretreatment device;
when feeding, as shown in fig. 1, the left closing plate 30 is at the lowermost end, and the pretreatment feed inlet 100 is in an open state; the left-right moving frame 51 is arranged at the leftmost end, the substrate limiting frame 55 is arranged at the leftmost end, and the substrate limiting frame 55 is arranged at the left side of the pretreatment box 10, so that the substrate 60 can be conveniently placed in the substrate limiting frame 55;
then the substrate position limiting frame 55 moves rightwards relative to the left and right moving frame 51, then the left and right moving frame 51 moves rightwards, and then the left closing plate 30 rises to seal the pretreatment feed inlet 100, so that the temperature control unit provided on the inner top wall of the pretreatment tank 10 raises the temperature inside the pretreatment tank 10 to preheat the substrate 60 as shown in fig. 2;
then the right closing plate 41 rises to open the pretreatment discharge hole 101 and the process treatment inlet and outlet 200, then the left and right moving frame 51 moves rightwards to the rightmost end, then the substrate limiting frame 55 moves rightwards relative to the left and right moving frame 51 to the rightmost end, at this time, as shown in fig. 3, the substrate 60 is positioned in the process box 20, then the loading and unloading device takes down the substrate 60, then the substrate limiting frame 55 moves leftwards, then the left and right moving frame 51 moves leftwards, then the right closing plate 41 descends to seal the pretreatment discharge hole 101 and the process treatment inlet and outlet 200, and the substrate 60 is processed in the process box 20;
after processing, the substrate 60 is discharged in the manner of the above-mentioned principle, but the temperature control unit disposed on the inner top wall of the pretreatment tank 10 lowers the temperature in the pretreatment tank 10, so that the substrate 60 is cooled;
this effectively transfers the substrate but occupies a small space, and the heating or cooling of the substrate is effectively performed.
The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description herein, since various changes and modifications can be made in the details of the embodiment and the application range according to the spirit of the present invention.
Claims (5)
1. A pretreatment device for a substrate, characterized in that: comprises a pretreatment box (10) and a process box (20); the pretreatment tank (10) is positioned at the left side of the process tank (20); a temperature control unit is arranged on the inner top wall of the pretreatment box (10); the temperature control unit is used for heating or cooling the substrate (60); a pretreatment feeding hole (100) is formed in the left side wall of the pretreatment box (10), and a pretreatment discharging hole (101) is formed in the right side wall of the pretreatment box; a process treatment inlet and outlet (200) is formed on the left side wall of the process box (20); a left closing plate (30) is arranged on the left end surface of the pretreatment tank (10) in a lifting manner; the left closing plate (30) is used for sealing the pretreatment feeding hole (100); a right closing plate (41) is arranged between the process box (20) and the pretreatment box (10) in a lifting way; the right closing plate (41) is used for sealing the pretreatment discharge hole (101) and the process treatment inlet and outlet (200); a left and a right transfer devices (50) are arranged in the pretreatment box (10); the left-right transfer device (50) comprises a substrate limiting frame (55) in a rectangular frame shape at the upper part and a left-right moving frame (51) in a rectangular frame shape at the lower part; the left and right moving frame (51) is arranged in the pretreatment box (10) in a left-right moving way; the substrate limiting frame (55) is arranged on the upper end surface of the left and right moving frame (51) in a left-right moving mode; a plurality of lower supporting plates (511) which are uniformly distributed front and back are formed between the left side wall and the right side wall of the left moving frame (51) and the right moving frame; a loading and unloading device is arranged in the process box (20); the loading and unloading device is used for loading and unloading the substrate (60) of the left and right transfer device (50);
front and rear stop plates are respectively formed at the front and rear ends of the upper end surface of the left and right moving frame (51); an upper left and right driving rack (513) is formed on the front and rear blocking plates; the substrate limiting frame (55) is positioned between the pair of front and rear blocking plates; an upper driving motor is respectively fixed at the centers of the front end face and the rear end face of the substrate limiting frame (55); an upper driving gear (551) is fixed on an output shaft of the upper driving motor; the upper driving gear (551) is meshed with the upper left and right driving racks (513) on the corresponding side.
2. A pretreatment apparatus for a substrate according to claim 1, characterized in that: a pair of lower left and right driving racks (11) which are symmetrically arranged front and back are fixed between the lower ends of the left and right side walls of the pretreatment box (10); a lower guide bar (12), a left guide bar and a right guide bar are respectively formed on the front side wall and the rear side wall of the pretreatment box (10); the front end surface and the rear end surface of the left-right moving frame (51) are respectively provided with a left-right guide groove matched with the left-right guide strip (12); a lower left driving motor (52) and a lower right driving motor (52) are fixed on the left end surface of the left and right moving frame (51); a lower left driving rod (53) and a lower right driving rod (53) are pivoted between the left side wall and the right side wall of the left moving frame (51) and the right moving frame; the left end of the lower left and right driving rod (53) is fixedly connected with the output shaft of the lower left and right driving motor (52); the left part and the right part of the lower left and right driving rod (53) are respectively fixed with a driving worm (531); a driven central column (512) is respectively pivoted between the left end and the right end of the front side wall and the rear side wall of the left and right moving frame (51); a worm wheel (56) is fixed at the center of the driven central column (512); the worm wheel (56) is meshed with the driving worm (531) on the corresponding side; driven gears (54) are respectively fixed at the front end and the rear end of the driven central column (512); the driven gear (54) is meshed with the lower left and right driving racks (11) on the corresponding side.
3. A pretreatment apparatus for a substrate according to claim 1, characterized in that: a central isolation chamber (40) is arranged between the pretreatment box (10) and the process box (20); a central isolation chamber (40) surrounding the gap between the pretreatment tank (10) and the process tank (20); the right closing plate (41) is located inside the central isolation chamber (40).
4. A pretreatment apparatus for a substrate according to claim 1, characterized in that: the loading and unloading device comprises an loading and unloading cylinder (21); the feeding and discharging cylinder (21) is fixed on the upper end surface of the process box (20); a sucker (22) is fixed at the lower end of a piston rod of the loading and unloading cylinder (21); the sucker (22) is positioned in the process box (20); a workbench (24) is arranged on the lower part of the process box (20) in a left-right moving manner; the upper end surface of the worktable (24) is lower than the lower end surface of the left and right moving frames (51).
5. A pretreatment apparatus for a substrate according to claim 4, characterized in that: a horizontally arranged centering cylinder (23) is fixed at the lower end of the right side wall of the process box (20); the workbench (24) is L-shaped; the vertical part of the workbench (24) is positioned at the left end of the horizontal part thereof; the vertical part of the workbench (24) is fixed at the left end of the piston rod of the centering cylinder (23).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010635419.XA CN111775437B (en) | 2020-07-04 | 2020-07-04 | Pretreatment device for substrate |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202010635419.XA CN111775437B (en) | 2020-07-04 | 2020-07-04 | Pretreatment device for substrate |
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| CN111775437A CN111775437A (en) | 2020-10-16 |
| CN111775437B true CN111775437B (en) | 2022-09-27 |
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| CN101328581A (en) * | 2008-07-22 | 2008-12-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing apparatus and substrate carrier plate thereof |
| DE102013102074A1 (en) * | 2013-03-04 | 2014-09-04 | Schmid Vacuum Technology Gmbh | System for coating substrates with polycrystalline silicon, comprises many process chambers for coating substrates with amorphous silicon and at least one lock for injecting and discharging substrates in process chambers |
| CN104658946A (en) * | 2013-11-25 | 2015-05-27 | 泰拉半导体株式会社 | Cluster-batch type substrate processing system |
| CN204959031U (en) * | 2015-08-05 | 2016-01-13 | 上海理想万里晖薄膜设备有限公司 | Substrate loading chamber |
| CN105448767A (en) * | 2014-06-03 | 2016-03-30 | 上海理想万里晖薄膜设备有限公司 | Vacuum conveying device and method for implementing orthogonal conveying of substrate |
| CN105986251A (en) * | 2015-02-11 | 2016-10-05 | 上海理想万里晖薄膜设备有限公司 | PECVD system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US20130052806A1 (en) * | 2011-08-22 | 2013-02-28 | Soitec | Deposition systems having access gates at desirable locations, and related methods |
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2020
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101328581A (en) * | 2008-07-22 | 2008-12-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing apparatus and substrate carrier plate thereof |
| DE102013102074A1 (en) * | 2013-03-04 | 2014-09-04 | Schmid Vacuum Technology Gmbh | System for coating substrates with polycrystalline silicon, comprises many process chambers for coating substrates with amorphous silicon and at least one lock for injecting and discharging substrates in process chambers |
| CN104658946A (en) * | 2013-11-25 | 2015-05-27 | 泰拉半导体株式会社 | Cluster-batch type substrate processing system |
| CN105448767A (en) * | 2014-06-03 | 2016-03-30 | 上海理想万里晖薄膜设备有限公司 | Vacuum conveying device and method for implementing orthogonal conveying of substrate |
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