CN111763927B - LPCVD furnace tube flange temperature control device and LPCVD furnace equipment - Google Patents
LPCVD furnace tube flange temperature control device and LPCVD furnace equipment Download PDFInfo
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- CN111763927B CN111763927B CN201910257884.1A CN201910257884A CN111763927B CN 111763927 B CN111763927 B CN 111763927B CN 201910257884 A CN201910257884 A CN 201910257884A CN 111763927 B CN111763927 B CN 111763927B
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- temperature
- control device
- lpcvd furnace
- flange
- furnace tube
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a flange temperature control device of an LPCVD furnace tube and LPCVD furnace equipment. The LPCVD furnace tube flange temperature control device comprises a temperature sensor, a temperature controller, a first relay, a solid-state relay, an electromagnetic valve and a cooling fluid pipeline, wherein the temperature sensor is used for detecting the temperature of a flange, the input end of the temperature controller is connected with the temperature sensor to acquire temperature sensing data, the output end of the temperature controller is connected to the input end of the solid-state relay through a first contact of the first relay, the first contact is a normally open contact, the output end of the solid-state relay is connected to the electromagnetic valve arranged in the cooling fluid pipeline, and the electromagnetic valve is a normally open electromagnetic valve; wherein the temperature controller is configured to control the closing and opening of the solid-state relay according to the temperature sensing data. The invention can accurately control the temperature of the flange by controlling the cooling fluid to pass through the flange of the furnace tube, reduce the amount of particles generated in the production of silicon wafers and avoid damaging the flange sealing ring.
Description
Technical Field
The invention relates to the field of LPCVD (low pressure chemical vapor deposition) processes, in particular to a flange temperature control device of an LPCVD furnace tube and LPCVD furnace equipment.
Background
In the very large scale integrated circuit technology, one of the main methods for depositing thin films is the LPVCD (low pressure chemical vapor deposition) method. The equipment used in the LPVCD process is typically a furnace, such as a resistance furnace, and the reaction chamber of the equipment is typically a furnace tube with flanges and seals at both ends.
In the implementation of LPVCD process, the most difficult problem is excessive particulate matter, which causes corrosion to generate film residue and easily damages the sealing ring, thus seriously affecting the product quality.
After research, the inventors of the present application also found that the LPCVD furnace tube is in the process: when the temperature of the flange is too low, a large amount of silicon oxide byproducts are generated on the flange, and the substances may fall on produced silicon wafers when the furnace tube enters and exits the furnace, so that the silicon wafers are scrapped due to over-tolerance of particles; when the temperature of the flange is higher, although the by-product cannot be generated, the flange sealing ring is easy to be caused by overhigh temperature, so that the furnace tube cannot be normally produced.
Some solutions in the prior art control the cooling of the flange by simply manually adjusting the flow of cooling fluid, which makes it difficult to accurately and efficiently control the flange temperature in the appropriate interval. Therefore, a new flange temperature control device for LPCVD furnace is needed.
Disclosure of Invention
The invention provides a temperature control device for an LPCVD furnace tube flange and LPCVD furnace equipment, aiming at overcoming the defect that the produced silicon wafers are possibly scrapped greatly because the temperature of the LPCVD furnace tube flange is difficult to accurately and effectively control in a proper interval in the implementation of an LPCVD process in the prior art.
The invention solves the technical problems through the following technical scheme:
the invention provides an LPCVD furnace tube flange temperature control device which is characterized by comprising a temperature sensor, a temperature controller, a first relay, a solid-state relay, an electromagnetic valve and a cooling fluid pipeline, wherein the temperature sensor is used for detecting the temperature of a flange, the input end of the temperature controller is connected with the temperature sensor to acquire temperature sensing data, the output end of the temperature controller is connected to the input end of the solid-state relay through a first contact of the first relay, the first contact is a normally open contact, the output end of the solid-state relay is connected to the electromagnetic valve arranged in the cooling fluid pipeline, and the electromagnetic valve is a normally open electromagnetic valve;
wherein the temperature controller is configured to control the closing and opening of the solid state relay according to the temperature sensing data.
Preferably, the temperature controller is configured to control the solid-state relay to close when the temperature indicated by the temperature sensing data is lower than a preset first low temperature value, so that the solenoid valve is closed or turned off, and to control the solid-state relay to open when the temperature indicated by the temperature sensing data is not lower than the preset first low temperature value, so that the solenoid valve is kept in an open state.
Preferably, the flange temperature control device for the LPCVD furnace tube further comprises a low-voltage stabilized power supply, and the low-voltage stabilized power supply supplies power to the temperature controller.
Preferably, the flange temperature control device for the LPCVD furnace tube further comprises a leakage protection switch, and the low-voltage stabilized power supply is connected to an alternating current power supply through the leakage protection switch.
Preferably, the flange temperature control device for the LPCVD furnace tube further comprises a second relay, wherein the second relay is connected to the low-voltage stabilized power supply and used for sending an alarm to a control computer of the LPCVD furnace when a power failure is detected.
Preferably, the temperature controller is further configured to, when the temperature displayed by the temperature sensing data is higher than a preset first high temperature value, turn on an alarm unit to give an alarm via a second contact of the first relay.
Preferably, the cooling fluid pipeline is a cooling water pipeline.
Preferably, the temperature sensor is a temperature measuring couple.
The invention also provides LPCVD furnace equipment which comprises the LPCVD furnace tube flange temperature control device.
On the basis of the common knowledge in the field, the above preferred conditions can be combined randomly to obtain the preferred embodiments of the invention.
The positive progress effects of the invention are as follows:
the flange temperature control device for the LPCVD furnace tube and the LPCVD furnace equipment can accurately control the temperature of the flange by controlling the cooling fluid to pass through the flange of the furnace tube, reduce the quantity of particles generated in the production of silicon wafers, do not damage a flange sealing ring and provide reliable guarantee for the production.
Drawings
Fig. 1 is a schematic circuit diagram of an LPCVD furnace tube flange temperature control device according to a preferred embodiment of the present invention.
Detailed Description
The following description of the preferred embodiments of the present invention will be provided with reference to the accompanying drawings to illustrate the technical solutions of the present invention in detail, but not to limit the present invention to the scope of the embodiments.
Referring to fig. 1, the flange temperature control device for LPCVD furnace tube according to a preferred embodiment of the present invention includes a temperature measuring couple TC, a temperature controller, a first relay, a solid state relay, a solenoid valve (i.e., the element connected to the solid state and the right side in fig. 1), and a cooling water pipeline (not shown). The temperature measurement galvanic couple is used for detecting the temperature of flange, and the temperature measurement galvanic couple is connected to temperature controller's input to acquire temperature sensing data, and temperature controller's output is connected to solid state relay's input (being solid state relay's control end) via first relay J1's first contact J1-1, and wherein first contact is normally open contact, and solid state relay's output is connected to the solenoid valve of arranging in the cooling water pipeline, and the solenoid valve is normally open solenoid valve. Wherein the temperature controller is configured to control the closing and opening of the solid-state relay according to the temperature sensing data.
This normally open solenoid valve arrangement provides the following advantages for the present invention. When the flange temperature control device of the LPCVD furnace tube is accidentally powered off, the whole flange can ensure that cooling water passes through. When the temperature measuring couple is accidentally damaged and falls off, the temperature controller can give an alarm due to the temperature over-difference, so that the first relay J1 acts to disconnect the first contact J1-1, and further the solid-state relay is powered off, the electromagnetic valve is powered off, and the cooling water pipeline is normally supplied with water, so that the flange and the sealing ring are protected from being damaged.
The flange temperature control device for the LPCVD furnace tube further comprises a low-voltage stabilized power supply and an electric leakage protection switch, and as shown in the reference figure 1, the low-voltage stabilized power supply is connected to a 220V commercial power alternating-current power supply through the electric leakage protection switch, so that power is supplied to the temperature controller. The safety of the device is improved by such a leakage protection function. Furthermore, most of the components in the flange temperature control device for LPCVD furnace tube according to the preferred embodiment of the present invention can be low-voltage components.
Because the first contact J1-1 of the first relay J1 is a normally open contact, when the temperature controller fails or the temperature measuring couple falls off from the flange and the temperature controller loses control or outputs abnormally, the normally open contact can disconnect the control end of the solid-state relay, and further the solenoid valve is kept in a normally open state. Therefore, the cooling valve still can lead the maximum water to flow to the flange, and the flange is prevented from being overhigh in temperature.
Preferably, the temperature controller may be configured to control the solid-state relay to close when the temperature indicated by the temperature sensing data is lower than a preset first low temperature value, so that the solenoid valve is closed or turned off, and to control the solid-state relay to open when the temperature indicated by the temperature sensing data is not lower than the preset first low temperature value, so that the solenoid valve maintains an open state. And, the temperature controller may be further configured to turn on the alarm unit to give an alarm, for example, an alarm sound or a light alarm, via the second contact J1-2 of the first relay J1 when the temperature indicated by the temperature sensing data is higher than a preset first high temperature value.
According to some preferred embodiments of the invention, the LPCVD furnace tube flange temperature control device further comprises a second relay J2 which is connected to a low-voltage stabilized power supply and is used for closing a first contact J2-1 of the second relay J2 to send an alarm to a control computer of the LPCVD furnace when a power failure is detected. Further, the third contact J1-3 of the first relay J1 can also be configured to trigger an alarm loop to send an alarm to a control computer of the LPCVD furnace according to the instruction of the temperature controller.
According to the test result, the temperature control device for the LPCVD furnace tube flange can accurately and effectively control the temperature of the furnace tube flange, greatly reduce the quantity of particles generated in the production of silicon wafers, do not damage a flange sealing ring and provide reliable guarantee for the production. According to some test results, the flange temperature control device for the LPCVD furnace tube can reduce the quantity of the particles harmful to production from about 30 particles per unit production time to about 10 particles per unit production time, namely, the quantity is reduced by nearly two thirds, and the effect is remarkable.
While specific embodiments of the invention have been described above, it will be understood by those skilled in the art that these are by way of example only, and that the scope of the invention is defined by the appended claims. Various changes and modifications to these embodiments may be made by those skilled in the art without departing from the spirit and scope of the invention, and these changes and modifications are within the scope of the invention.
Claims (6)
1. The flange temperature control device for the LPCVD furnace tube is characterized by comprising a temperature sensor, a temperature controller, a first relay, a solid-state relay, an electromagnetic valve and a cooling fluid pipeline, wherein the temperature sensor is used for detecting the temperature of the flange, the input end of the temperature controller is connected with the temperature sensor to acquire temperature sensing data, the output end of the temperature controller is connected to the input end of the solid-state relay through a first contact of the first relay, the first contact is a normally open contact, the output end of the solid-state relay is connected to the electromagnetic valve arranged in the cooling fluid pipeline, and the electromagnetic valve is a normally open electromagnetic valve;
wherein the temperature controller is configured to control the closing and opening of the solid state relay according to the temperature sensing data;
the temperature controller is configured to control the solid-state relay to be closed when the temperature displayed by the temperature sensing data is lower than a preset first low temperature value, so that the electromagnetic valve is closed or reduced, and control the solid-state relay to be opened when the temperature displayed by the temperature sensing data is not lower than the preset first low temperature value, so that the electromagnetic valve is kept in an open state;
the LPCVD furnace tube flange temperature control device also comprises a low-voltage stabilized power supply which supplies power to the temperature controller;
the LPCVD furnace tube flange temperature control device further comprises a second relay, wherein the second relay is connected to the low-voltage stabilized power supply and used for sending an alarm to a control computer of the LPCVD furnace when a power failure is detected.
2. The LPCVD furnace tube flange temperature control device of claim 1, further comprising an earth leakage protection switch, wherein the low-voltage stabilized power supply is connected to an alternating current power supply via the earth leakage protection switch.
3. The LPCVD furnace tube flange temperature control device according to claim 1, wherein the temperature controller is further configured to activate an alarm unit to issue an alarm via the second contact of the first relay when the temperature indicated by the temperature sensing data is higher than a preset first high temperature value.
4. The LPCVD furnace tube flange temperature control device of claim 1, wherein the cooling fluid line is a cooling water line.
5. The LPCVD furnace tube flange temperature control device of claim 1, wherein the temperature sensor is a temperature thermocouple.
6. An LPCVD furnace apparatus, characterized by comprising the LPCVD furnace tube flange temperature control device according to any one of claims 1-5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910257884.1A CN111763927B (en) | 2019-04-01 | 2019-04-01 | LPCVD furnace tube flange temperature control device and LPCVD furnace equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910257884.1A CN111763927B (en) | 2019-04-01 | 2019-04-01 | LPCVD furnace tube flange temperature control device and LPCVD furnace equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111763927A CN111763927A (en) | 2020-10-13 |
| CN111763927B true CN111763927B (en) | 2023-04-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910257884.1A Active CN111763927B (en) | 2019-04-01 | 2019-04-01 | LPCVD furnace tube flange temperature control device and LPCVD furnace equipment |
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Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5614247A (en) * | 1994-09-30 | 1997-03-25 | International Business Machines Corporation | Apparatus for chemical vapor deposition of aluminum oxide |
| US7044213B2 (en) * | 2002-12-31 | 2006-05-16 | Industrial Technology Research Institute | Constant temperature refrigeration system for extensive temperature range application and control method thereof |
| US9034142B2 (en) * | 2009-12-18 | 2015-05-19 | Novellus Systems, Inc. | Temperature controlled showerhead for high temperature operations |
| CN102234788B (en) * | 2010-05-07 | 2013-07-10 | 北大方正集团有限公司 | Vapor phase deposition system and cooling water device |
| CN201804285U (en) * | 2010-09-04 | 2011-04-20 | 天津力神电池股份有限公司 | Automatic cooling water control system |
| CN203256329U (en) * | 2013-05-13 | 2013-10-30 | 上海微世半导体有限公司 | Flange furnace door of LPCVD (Low Pressure Chemical Vapour Deposition) system |
| CN106886232A (en) * | 2015-12-16 | 2017-06-23 | 成都市创为凯科技信息咨询有限公司 | A kind of automatic temperature control heating stove |
| CN205351649U (en) * | 2015-12-31 | 2016-06-29 | 浙江万里新材料科技有限公司 | Temperature control system |
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