CN111755565B - 一种太阳能电池表面钝化膜生产设备 - Google Patents

一种太阳能电池表面钝化膜生产设备 Download PDF

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CN111755565B
CN111755565B CN202010479500.3A CN202010479500A CN111755565B CN 111755565 B CN111755565 B CN 111755565B CN 202010479500 A CN202010479500 A CN 202010479500A CN 111755565 B CN111755565 B CN 111755565B
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刘群
林佳继
朱太荣
范棋翔
伊凡·裴力林
庞爱锁
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Laplace New Energy Technology Co ltd
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Abstract

本发明公开一种太阳能电池表面钝化膜生产设备，包括两工艺镀膜柜、两石墨舟、传输装置、上料装置、移载装置；所述传输装置布置于两工艺镀膜柜之间，上料装置布置于传输装置的一端；所述工艺镀膜柜内设有可容纳一石墨舟的腔体，每一石墨舟内置于一工艺镀膜柜；所述移栽装置用于将硅片从上料装置移送至石墨舟上，及将硅片从石墨舟移送至传输装置上。本发明可在同一设备中可完成提升开压的隧穿氧化钝化薄膜和减反射膜的制备，采用伯努利吸盘可避免镀膜划伤问题；同时石墨板上硅片定位机构可减少卡点印、硅片变形、碎片率高等问题。

Description

一种太阳能电池表面钝化膜生产设备
本申请是申请号为2018103968281，申请日为2018年4月28日，发明创造名称为一种太阳能电池表面钝化膜生产设备的发明专利申请的分案申请。
技术领域
本发明涉及太阳能电池制造技术领域，尤其涉及一种太阳能电池表面钝化膜生产设备。
背景技术
常规的化石燃料日益消耗殆尽，目前的可持续能源中，太阳能是最清洁、最具有潜力的清洁能源。晶硅太阳能电池已被大规模生产应用，良好的稳定性和成熟的工艺流程是其大规模应用的基础。
等离子增强化学气相沉积系统是借助微波或射频等使含有薄膜组成原子的气体电离，在局部形成等离子体，而等离子体化学活性很强，很容易发生反应，在基片上沉积出所期望的薄膜。为了使化学反应能在较低的温度下进行，利用了等离子体的活性来促进反应，因而这种CVD称为等离子体增强化学气相沉积(PECVD)。低压化学气相沉积设备(LPCVD是一定温度下通过气态的初始化合物之间的气相化学反应而形成固体物质沉积在基体上。
在太阳能光伏产业中，常采用PECVD制备减反射膜如氮化硅膜，碳化硅膜，氧化硅膜等；采用LPCVD制备氧化硅膜，非晶硅和微晶硅薄膜，用于提升电池开压的隧穿氧化钝化薄膜。这使得太阳能光伏电池制造过程变得复杂化，生产完可以提升开压的隧穿氧化钝化薄膜以后，还需要将硅片取出设备，放置到PECVD设备中进行表面减反射膜的制备，该过程需要对电池片进行装载和卸载，比较容易造成刮伤，设备投资较多。此外，在成本推动下，硅片将逐渐变薄至低于160μm，曲翘度变大，传统设备需垂直插拔放片，导致量产高碎片率和高划伤而无法使用。
同时传统的PECVD生产减反射膜，对于膜的单面性要求很高，传统的生产设备容易造成绕镀，不能规避卡点印问题。同时，对于超薄硅片容易造成生产过程中硅片变形，碎片率高等问题。传统的LPCVD生产氧化硅膜，微晶硅的掺杂和非掺杂的薄膜时，容易造成绕镀问题。
发明内容
本发明的目的是提供一种太阳能电池表面钝化膜生产设备，同一设备中可完成提升开压的隧穿氧化钝化薄膜和减反射膜的制备，采用伯努利吸盘可避免镀膜划伤问题；同时石墨板上硅片定位机构可减少卡点印、硅片变形、碎片率高等问题。
为实现上述目的，采用以下技术方案：
一种太阳能电池表面钝化膜生产设备，包括两工艺镀膜柜、两石墨舟、传输装置、上料装置、移载装置；所述传输装置布置于两工艺镀膜柜之间，上料装置布置于传输装置的一端；所述工艺镀膜柜内设有可容纳一石墨舟的腔体，每一石墨舟内置于一工艺镀膜柜；所述移栽装置用于将硅片从上料装置移送至石墨舟上，及将硅片从石墨舟移送至传输装置上。
较佳地，所述石墨舟包括若干石墨板、上盖板、下盖板；所述上盖板水平布置于工艺镀膜柜的顶部内侧，下盖板水平布置于工艺镀膜柜的底部内侧；所述若干石墨板在竖向呈叠层排列，并置于上盖板和下盖板之间；所述石墨板水平布置，相邻的石墨板之间具有间隙，且相邻石墨板之间经若干连接柱连接。
较佳地，每一石墨板上设有若干硅片定位机构；所述硅片定位机构包括若干定位支柱，每一定位支柱的顶部设有防滑纹路。
较佳地，每一石墨板上的硅片定位机构设置为4～9个；每一硅片定位机构上的定位支柱设置为3个或4个。
较佳地，所述移载装置包括移载支架、多轴机械手、扁平吸盘；所述移载支架架设于两工艺镀膜柜的顶部之间；所述多轴机械手的上端吊装于移载支架上，下端安装扁平吸盘；所述扁平吸盘上布置若干吸嘴。
较佳地，所述扁平吸盘采用伯努力吸盘；所述扁平吸盘的厚度小于两石墨板的间距。
较佳地，所述扁平吸盘上的吸嘴数量与每一石墨板上的硅片定位机构数量一致，且位置一一对应。
较佳地，所述钝化膜生产设备还包括石墨舟驱动电机；所述工艺镀膜柜的内侧从其顶部至底部设有第一滑动机构；所述石墨舟驱动电机用于驱动石墨舟经第一滑动机构上下运动。
较佳地，所述传输装置包括两传送带机构、一传送支架，两传送带机构均从传送支架顶部的上料装置一端延伸至另一端。
较佳地，所述上料装置包括升降驱动电机、上料支架、若干上料板、第二滑动机构；所述第二滑动机构从上料支架的顶部布置至底部，升降驱动电机用于驱动若干上料板经第二滑动机构沿上料支架升降。
采用上述方案，本发明的有益效果是：
1)本发明采用水平放片式的等离子增强化学气相沉积，水平放片规避传统垂直放片自动化所需插拔动作，加上伯努利吸盘无接触吸片，减少镀膜划伤问题；
2)结合水平放片设计，自主设计石墨板的定位支柱，实现硅片无绕镀或绕镀可调；
3)集成LPCVD的功能，可以实现提升开压的隧穿氧化钝化薄膜工艺和减反射膜工艺的一次性完成，减少硅片的进出石墨舟，减少刮伤，减少设备投入。
附图说明
图1为本发明的立体图；
图2为本发明的石墨舟立体图；
图3为本发明的石墨板立体图；
图4为本发明的石墨板与硅片的结构示意图；
图5为本发明的扁平吸盘的结构示意图；
图6为本发明的移载装置省却扁平吸盘的立体图；
图7为本发明的传输装置与上料装置的立体图；
其中，附图标识说明：
1—工艺镀膜柜， 2—石墨舟，
3—传输装置， 4—上料装置，
5—移载装置， 6—硅片，
21—石墨板， 22—上盖板，
23—下盖板， 31—传送带机构，
32—传送支架， 41—上料支架，
42—上料板， 51—移载支架，
52—多轴机械手， 53—扁平吸盘，
211—定位支柱， 531—吸嘴。
具体实施方式
以下结合附图和具体实施例，对本发明进行详细说明。
参照图1至7所示，本发明提供一种太阳能电池表面钝化膜生产设备，包括两工艺镀膜柜1、两石墨舟2、传输装置3、上料装置4、移载装置5；所述传输装3置布置于两工艺镀膜柜1之间，上料装置4布置于传输装置3的一端；所述工艺镀膜柜1内设有可容纳一石墨舟2的腔体，每一石墨舟2内置于一工艺镀膜柜1；所述移栽装置5用于将硅片6从上料装置4移送至石墨舟2上，及将硅片6从石墨舟2移送至传输装置3上。
其中，所述石墨舟2包括若干石墨板21、上盖板22、下盖板23；所述上盖板22水平布置于工艺镀膜柜1的顶部内侧，下盖板23水平布置于工艺镀膜柜1的底部内侧；所述若干石墨板21在竖向呈叠层排列，并置于上盖板22和下盖板23之间；所述石墨板21水平布置，相邻的石墨板21之间具有间隙，且相邻石墨板21之间经若干连接柱连接，连接柱可采用陶瓷绝缘棒实现。每一石墨板21上设有若干硅片定位机构；所述硅片定位机构包括若干定位支柱211，每一定位支柱211的顶部设有防滑纹路。每一石墨板21上的硅片定位机构设置为4～9个；每一硅片定位机构上的定位支柱211设置为3个或4个。
所述移载装置5包括移载支架52、多轴机械手53、扁平吸盘53；所述移载支架52架设于两工艺镀膜柜1的顶部之间；所述多轴机械手53的上端吊装于移载支架51上，下端安装扁平吸盘53；所述扁平吸盘53上布置若干吸嘴531。所述扁平吸盘53采用伯努力吸盘；所述扁平吸盘53的厚度小于两石墨板21的间距。所述扁平吸盘53上的吸嘴531数量与每一石墨板21上的硅片定位机构数量一致，且位置一一对应。
所述钝化膜生产设备还包括石墨舟驱动电机(图中未示出)；所述工艺镀膜柜1的内侧从其顶部至底部设有第一滑动机构(图中未示出)；所述石墨舟驱动电机用于驱动石墨舟2经第一滑动机构上下运动。所述传输装置3包括两传送带机构31、一传送支架32，两传送带机构31均从传送支架32顶部的上料装置4一端延伸至另一端。所述上料装置4包括升降驱动电机、上料支架41、若干上料板42、第二滑动机构；所述第二滑动机构从上料支架41的顶部布置至底部，升降驱动电机用于驱动若干上料板42经第二滑动机构沿上料支架41升降。
本发明工作原理：
本发明提供还包括多个射频电源、电气柜、气体混合装置、尾气排放装置等。所述多个射频电源安装在电气柜内，反应气体在射频电源的作用下形成高活性的等离子气体，进而产生化学反应，生产新的化学物质沉积在电极表面的硅片上，从达到镀膜的效果。
具体而言，工艺镀膜柜1上设有进气口(气体混合装置，混合气体的进气口)。工艺镀膜柜上还设有出气口(尾气排放装置，尾气的出气口)，工艺镀膜柜1包括设于传输装置一侧的炉门，炉门上设有密封圈密封。
本发明的工作过程如下：
1)上料装置4将未镀膜的硅片6上料；
2)移载装置5将未镀膜的硅片6从上料板42上移送至空的石墨板21上(扁平吸盘53的厚度小于两石墨板21的间距，整个扁平吸盘53伸进两石墨板21的间隙中，定位支柱211上设有防滑纹路，硅片6在定位支柱211上不会移动)；镀膜工艺柜1内还可安装到位检测传感器，用于检测扁平吸盘53到位后，石墨舟驱动电机驱动石墨舟2经第一滑动机构升降，便于扁平吸盘53放置硅片6；
3)放置好后，扁平吸盘53再将另一石墨板21上的已镀膜完成的硅片6移送至传输装置3中；
4)传输装置3将已镀膜完成的硅片6移送至上料装置4的另一端。
以上仅为本发明的较佳实施例而已，并不用于限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。

Claims (4)

1.一种太阳能电池表面钝化膜生产设备，其特征在于，包括两工艺镀膜柜、两石墨舟、传输装置、上料装置、移载装置；所述传输装置布置于两工艺镀膜柜之间，上料装置布置于传输装置的一端；所述工艺镀膜柜内设有可容纳一石墨舟的腔体，每一石墨舟内置于一工艺镀膜柜；所述移载装置用于将硅片从上料装置移送至石墨舟上，及将硅片从石墨舟移送至传输装置上；
所述石墨舟包括若干石墨板、上盖板、下盖板；所述石墨板水平布置，且在竖向呈叠层排列，相邻的石墨板之间具有间隙，每一石墨板上设有若干硅片定位机构，所述硅片定位机构包括若干定位支柱，每一石墨板上的硅片定位机构设置为4~9个；每一硅片定位机构上的定位支柱设置为3个或4个，每一所述定位支柱的顶部设有防滑纹路；
所述移载装置包括移载支架、多轴机械手、扁平吸盘；所述扁平吸盘采用伯努力吸盘；
所述移载支架架设于两工艺镀膜柜的顶部之间；所述多轴机械手的上端吊装于移载支架上，下端安装扁平吸盘；所述扁平吸盘上布置若干吸嘴；
所述扁平吸盘的厚度小于两石墨板的间距；
所述扁平吸盘上的吸嘴数量与每一石墨板上的硅片定位机构数量一致，且位置一一对应。
2.根据权利要求1所述的太阳能电池表面钝化膜生产设备，其特征在于，所述钝化膜生产设备还包括石墨舟驱动电机；所述工艺镀膜柜的内侧从其顶部至底部设有第一滑动机构；所述石墨舟驱动电机用于驱动石墨舟经第一滑动机构上下运动。
3.根据权利要求2所述的太阳能电池表面钝化膜生产设备，其特征在于，所述传输装置包括两传送带机构、一传送支架，两传送带机构均从传送支架顶部的上料装置一端延伸至另一端。
4.根据权利要求3所述的太阳能电池表面钝化膜生产设备，其特征在于，所述上料装置包括升降驱动电机、上料支架、若干上料板、第二滑动机构；所述第二滑动机构从上料支架的顶部布置至底部，升降驱动电机用于驱动若干上料板经第二滑动机构沿上料支架升降。
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