CN111752100A

CN111752100A - Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device

Info

Publication number: CN111752100A
Application number: CN201910253106.5A
Authority: CN
Inventors: 钱晓春; 胡春青; 于培培
Original assignee: Changzhou Tronly New Electronic Materials Co Ltd; Changzhou Tronly Advanced Electronic Materials Co Ltd
Current assignee: Changzhou Tronly New Electronic Materials Co Ltd; Changzhou Tronly Advanced Electronic Materials Co Ltd
Priority date: 2019-03-29
Filing date: 2019-03-29
Publication date: 2020-10-09

Abstract

The invention provides a photosensitive resin composition containing a bisimidazole photoinitiator, application thereof, a color filter and an image display device. The photosensitive resin composition comprises: the light-emitting diode comprises photoluminescence quantum dot particles, a photopolymerization initiator, alkali-soluble resin, a photopolymerizable compound and a hydrogen donor, wherein the photopolymerization initiator comprises a double-imidazole photoinitiator B1 with a structure shown in a general formula (I) and a second photoinitiator or sensitizer B2-1, and the second photoinitiator is different from the double-imidazole photoinitiator B1. The co-use of the photoinitiator B1 and the second photoinitiator or sensitizer B2-1 enables the photoluminescent quantum dot particles, the photopolymerizable compound and the alkaline resin to perform deep curing reaction at lower energy; meanwhile, the photoinitiator B1 has lighter color and absorbs waves after crackingThe film formed by curing the photosensitive resin composition has excellent yellowing resistance due to long blue shift.

Description

Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device

Technical Field

The invention relates to the field of photocuring, in particular to a photosensitive resin composition containing a bisimidazole photoinitiator, application thereof, a color filter and an image display device.

Background

In general, a color filter is manufactured by forming pixels of red, green, and blue on a transparent substrate by a dyeing method, a printing method, an electro-deposition method, a pigment dispersion method, and the like. Among them, the pigment dispersion method is currently the mainstream method in industry. The pigment dispersion method is a method in which a photosensitive resin composition containing a coloring material is coated on a transparent substrate, followed by image exposure, development and, optionally, post-curing, and a color filter is formed by repeating these processes. The method has the advantages of high heat resistance, no need of dyeing, and can form a high-precision pixel coloring layer.

In the process of the pigment dispersion method, the photosensitive resin composition used comprises the following components: an alkali-soluble resin, a polymerizable compound, a photoinitiator, a colorant, and a solvent.

In recent years, color filters are required to have high chroma, contrast, and the like. However, when a pigment is used as a colorant, problems such as scattering due to coarse particles of the pigment and an increase in viscosity due to poor low-temperature storage stability occur, and there is a limit to further improvement in contrast and brightness. Therefore, when a dye is used as the colorant, the brightness of an image displayed can be improved by utilizing the color purity of the dye itself. In addition, since the dye does not have coarse particles, it is considered that the contrast can be improved. In addition, in the field of color filters, in order to achieve high color purity of display elements and high color resolution of light receiving elements, the concentration of a colorant tends to be high, and residues or stains are likely to be generated on the base or light shielding layer of unexposed portions during development, which may result in insufficient adhesion to a substrate, insufficient hardening, or poor pattern formability in exposed portions. It is mentioned in the prior art that the colorant generally traps the active radicals generated by the initiator, thereby deactivating them and failing to achieve sufficient hardening.

Although color reproduction is achieved by light emitted from a light source passing through a color filter, in this process, a part of the light is absorbed by the color filter, so that light efficiency is lowered, and there is a fundamental limit that perfect color reproduction cannot be achieved due to the characteristics of the pigment as the color filter. In view of the above, quantum dot photoresist technology is continuously developed, and the prior documents disclose the application of different quantum dot-containing photosensitive compositions, which solves the problem of color saturation to some extent, and furthermore, the yellowing performance of the cured film after application is also a factor to be considered.

Compared with the LCD technology, the QLED technology needs water resistance and oxygen resistance, which increases a certain film thickness, but the prior disclosed quantum dot composition formula has the problems of poor thick film curing effect and poor yellowing resistance, which limits the development of the quantum dot technology to a certain extent.

Disclosure of Invention

The invention mainly aims to provide a photosensitive resin composition containing a bisimidazole photoinitiator, application thereof, a color filter and an image display device, and aims to solve the problems of high film curing energy and poor yellowing resistance of the conventional photosensitive resin composition.

In order to achieve the above object, according to one aspect of the present invention, there is provided a photosensitive resin composition comprising: (A) a photoluminescent quantum dot particle, (B) a photopolymerization initiator, (C) an alkali-soluble resin, (D) a photopolymerizable compound, and (E) a hydrogen donor. The photopolymerization initiator comprises a bisimidazole photoinitiator B1 with a structure shown in a general formula (I) and a second photoinitiator or sensitizer B2-1, wherein the second photoinitiator is different from the bisimidazole photoinitiator B1;

wherein in the general formula (I), Ar₁、Ar₂、Ar₃、Ar₄、Ar₅And Ar₆Each independently represents a substituted aryl group orAn unsubstituted aryl group.

According to another aspect of the present invention, there is provided a color filter, including a substrate and a pattern layer disposed on a surface of the substrate, wherein the pattern layer is formed by coating, exposing, developing and curing a photosensitive resin composition, and the photosensitive resin composition includes the photosensitive resin composition containing the bisimidazole photoinitiator.

According to still another aspect of the present invention, there is provided an image display device including a color filter including the above color filter.

According to another aspect of the invention, the application of the photosensitive resin composition containing the bisimidazole photoinitiator in the field of photocuring is provided.

By applying the technical scheme of the invention, the photoinitiator with the structure shown in the general formula (I) has higher stability, and fragments formed by initiation reaction still have higher stability. Meanwhile, the photoinitiator B1 with the structure shown in the general formula (I) and the second photoinitiator or sensitizer B2-1 are matched for use, so that the photoluminescence quantum dot particles, the photopolymerizable compound and the alkaline resin in the photosensitive resin composition can be subjected to deep curing reaction at lower energy; meanwhile, the photoinitiator with the structure shown in the general formula (I) does not contain a coloring group and does not generate the coloring group, so that the film formed after the photosensitive resin is cured has excellent yellowing resistance.

Detailed Description

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail with reference to examples.

As described in the background art, the conventional photosensitive resin composition has problems of high film curing energy and poor yellowing resistance. In order to solve the above technical problems, the present application provides a photosensitive resin composition containing a bisimidazole based photoinitiator, the photosensitive resin composition comprising: (A) photoluminescence quantum dot particles, (B) a photopolymerization initiator, (C) an alkali-soluble resin, (D) a photopolymerizable compound and (E) a hydrogen donor, wherein the photopolymerization initiator comprises a bisimidazole photoinitiator B1 with a structure shown in a general formula (I) and a second photoinitiator or sensitizer B2-1, and the second photoinitiator is different from the bisimidazole photoinitiator B1;

wherein in the general formula (I), Ar₁、Ar₂、Ar₃、Ar₄、Ar₅And Ar₆Each independently represents a substituted aryl group or an unsubstituted aryl group.

Under the irradiation of ultraviolet light, the second photoinitiator or sensitizer B2-1 is firstly excited, and then the photoinitiator with the structure shown in the general formula (I) forms free radicals. The free radicals generate new and more active free radicals by abstracting hydrogen in a hydrogen donor, so that (A) photoluminescence quantum dot particles, (B) a photopolymerization initiator, (C) alkali-soluble resin and (D) a photopolymerizable compound are initiated to perform a polymerization reaction, and a photocuring film is formed after the photocuring reaction.

The photoinitiator with the structure shown in the general formula (I) has high stability, and fragments formed by initiation reaction of the photoinitiator still have high stability. Meanwhile, the photoinitiator B1 with the structure shown in the general formula (I) and the second photoinitiator or sensitizer B2-1 are matched for use, so that the photoluminescence quantum dot particles, the photopolymerizable compound and the alkaline resin in the photosensitive resin composition can be subjected to deep curing reaction at lower energy; meanwhile, the photoinitiator with the structure shown in the general formula (I) is light in color, and absorbs blue shift of wavelength after cracking, so that a film formed after the photosensitive resin is cured has excellent yellowing resistance.

The photosensitive resin composition of the present invention comprises components (a), (B), (C) (D) and (E), each of which will be described in more detail below.

< photoluminescent Quantum dot particles >

The photosensitive resin composition of the present invention contains photoluminescent quantum dot particles.

Quantum dots are semiconductor substances of nanometer size, and are called quantum dots when each of the nanoparticles has semiconductor characteristics, particularly, when atoms form molecules and the molecules form clusters as small molecular aggregates to form nanoparticles.

When the quantum dot receives energy from the outside and becomes a floating state, energy corresponding to its own energy band gap (energy band gap) is released.

The photosensitive resin composition of the present invention contains such photoluminescence quantum dot particles, and a color filter produced from the same can emit light (photoluminescence) by light irradiation.

In a typical image display device including a color filter, white light passes through the color filter to appear in color, but in this process, a part of the light is absorbed by the color filter, and thus the light efficiency is lowered.

However, when the color filter manufactured from the photosensitive resin composition of the present invention is included, the color filter emits light by itself by light from a light source, and thus more excellent light efficiency can be achieved.

Further, since light having a hue is emitted, color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

The quantum dot particles of the present invention are not particularly limited as long as they can emit light by light stimulation, and can be selected from, for example, II-VI semiconductor compounds, III-V semiconductor compounds, IV-VI semiconductor compounds, group IV elements, compounds containing the group IV elements, and combinations thereof. These may be used alone or in combination of two or more.

The above II-VI group semiconductor compound may be selected from a binary compound selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe and mixtures thereof; a ternary compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS s, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and a quaternary element compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe and mixtures thereof, and the above group III-V semiconductor compound may be selected from the group consisting of the following compounds; a binary compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AIN, AIP, AIAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; a tertiary element compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaGaAs, GaPSb, AINP, AINAs, AINSb, AIPAs, AIPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAINP, and mixtures thereof; and a quaternary element compound selected from the group consisting of GaAINAs, GaAINSb, GaAIPAs, GaAIPSb, galnp, GalnNAs, galnsb, GalnPAs, GalnPSb, InAINP, inainainainainainainanas, InAINSb, InAIPAs, InAIPSb and mixtures thereof, wherein the group IV-VI semiconductor compound may be selected from the group consisting of; a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof; a ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a four-element compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof, and the above group IV element or the compound containing the element may be selected from the group consisting of the following compounds; a compound of an element selected from the group consisting of Si, Ge, and mixtures thereof; and a binary compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

The quantum dot particles may be of the following structure: double structures such as homogeneous (homogeneous) single structures, core-shell (core-shell), gradient (gradient) structures, and the like; or a hybrid structure thereof.

In the core-shell (core-shell) dual structure, the substances forming the respective core (core) and shell (shell) may be composed of the above-mentioned semiconductor compounds different from each other. For example, the core may include one or more selected from CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, aglnnzns, and ZnO, but is not limited thereto. The shell may contain one or more substances selected from CdSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto. The diameter of the quantum dot particle of the present invention is not particularly limited, and for example, the average particle diameter may be 1 to 40 nm. In addition, in the case of a core-shell (core-shell) dual structure, the average particle diameter of the core may be 0.5 to 10nm, and the average thickness of the shell may be 0.5 to 30 nm. When the average particle diameter and the thickness are within the above ranges, the composition can have different dispersibility, and can exhibit a color when irradiated with light, and can be used for manufacturing a color filter.

The colored photosensitive resin composition for manufacturing a general color filter includes red, green and blue colorants in order to represent a hue, and the photoluminescence quantum dot particles may be classified into red quantum dot particles, green quantum dot particles and blue quantum dot particles, and the quantum dot particles of the present invention may be red quantum dot particles, green quantum dot particles or blue quantum dot particles.

The red, green, and blue quantum dot particles may be classified according to particle size, but the particle size decreases in the order of red, green, and blue. Specifically, the particle size of the red quantum dot particles can be 5-10 nm, the particle size of the green quantum dot particles can be 3-5 nm, and the particle size of the blue quantum dot particles can be 1-3 nm. The quantum dot particles with the particle size are used as the components of the photosensitive resin composition, so that the luminescence property of the photosensitive resin composition is further improved.

When light is irradiated, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the blue quantum dot particles emit blue light.

The quantum dot particles can be synthesized by a wet chemical process (wet chemical process), a metal organic chemical vapor deposition process, or a molecular beam epitaxy process. The wet chemical process is a method of growing particles by adding a precursor substance to an organic solvent. Since the organic solvent naturally coordinates to the surface of the quantum dot crystal and functions as a dispersant to regulate the crystal growth during crystal growth, the growth of nanoparticles can be controlled by a process that is easier and cheaper than vapor deposition methods such as Metal Organic Chemical Vapor Deposition (MOCVD) or Molecular Beam Epitaxy (MBE).

The content of the quantum dot particles of the present invention is not particularly limited, and for example, the quantum dot particles may be contained in an amount of 3 to 80 wt%, preferably 20 to 50 wt%, based on the total weight of the solid content of the photosensitive resin composition. If the content of the quantum dot particles is less than 3 wt%, the luminous efficiency is not good, and if the content of the quantum dot particles exceeds 80 wt%, the content of other compositions is relatively insufficient, and there is a problem in that it is difficult to form a pixel pattern.

< photopolymerization initiator >

The photopolymerization initiator comprises a bisimidazole photoinitiator B1 with a structure shown in a general formula (I) and a second photoinitiator or sensitizer B2-1, wherein the second photoinitiator is different from the bisimidazole photoinitiator B1.

Bisimidazole mixed photoinitiator (B1)

As described above, the use of the first photoinitiator having the structure shown in formula (I) enables the photosensitive resin composition provided by the present application to undergo a curing reaction at a lower energy, and the formed cured photosensitive resin composition has a superior yellowing resistance. The optional structure of the bisimidazole photoinitiator B1 comprises: a compound of the connecting position of 1 '-2, 2-3', 1-2 ', 2' -3, 1-4 ', 1-5', 3-4 ', 3-5', 1-1 ', 1-3', 3-1 ', 3-3', 4-1 ', 4-3', 5-1 ', 5-3' shown in the general formula (I). In order to further improve the overall performance of the photosensitive resin composition, the bisimidazole-based photoinitiator B1 preferably includes one or more compounds represented by the formulae (ii) to (iv):

more preferably, the total amount of the compounds represented by the formulas (II) to (IV) is more than or equal to 92 wt%, more preferably more than or equal to 95 wt%, and even more preferably 100 wt% based on the weight percentage of the bisimidazole photoinitiator B1.

In a preferred embodiment, Ar₁、Ar₂、Ar₃、Ar₄、Ar₅And Ar₆Optional group of (1) -substituent in substituted aryl is selected fromFrom halogen, nitro, cyano, amino, hydroxy, C₁～C₂₀Alkyl or alkenyl of, C₁～C₈Or at least one methylene group in said substituents is substituted by-O-, -S-, -NH-.

Hexaarylbisimidazole photoinitiators are a well-known class of photoinitiators and can be prepared by oxidative coupling of triarylimidazoles or substituted triarylimidazoles, and specific preparation processes are described in the prior art (the entire contents of which are incorporated herein by reference) such as US3784557, US4622286 and US4311783, and the obtained hexaarylbisimidazole photoinitiators are generally mixtures. On the basis of the prior art, a solvent recrystallization process is added, so that the hexaarylbisimidazole mixed photoinitiator meeting the composition requirements can be conveniently obtained. The solvent can be one or a combination of more than two of toluene, methanol, ethyl acetate, dichloromethane and water.

In particular, hexaarylbisimidazole photoinitiators disclosed in chinese patent application nos. 201811451262.4, 201811451251.6 are preferred.

Second photoinitiator (B2-1)

The photosensitive resin composition for a color filter of the present invention further comprises a second photoinitiator or sensitizer. In order to further reduce the energy required for curing the photosensitive resin composition, the second photoinitiator and the sensitizer are preferably independently selected from oxime ester compounds, triazine compounds, coumarin compounds, acridine compounds, oxadiazole compounds, aromatic ketone compounds, benzoin and benzoin alkyl ether compounds, anthraquinone compounds, thioxanthone compounds, and the like. These photoinitiators may be used alone or in combination of two or more.

In a preferred embodiment, the oxime ester compounds may include: 1- (4-phenylthiophenyl) -n-octane-1, 2-dione-2-benzoxy-ate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -butane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -propane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -1-cyclohexyl-methane- 1-keto-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propane-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (4-benzoyldiphenyl sulfide) -3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) -one-oxime (3-cyclopentyl) -propane-1, 2-dione-2-o-methylbenzoic acid oxime ester, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- (4-thenoyl-diphenylsulfide-4' -yl) -3-cyclopentyl-propane-1-one-acetic acid oxime ester, 1- (4-benzoyldiphenylsulfide) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-nitro-9-ethylcarbazol-3-yl) -3-cyclohexyl-propane-1-one-acetic acid oxime ester, and salts thereof, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (6-furfurylcarbazol-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime acetate, 1, 4-diphenylpropane-1, 3-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-3-oxime benzoate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, oxime, 2- [ (benzoyloxy) imino ] -1-phenylpropan-1-one, 1-phenyl-1, 2-propanedione-2- (oxoacetyl) oxime, 1- (4-phenylthiophenyl) -2- (2-methylphenyl) -ethane-1, 2-dione-2-oxime acetate, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- {4- [4- (thiophene-2-formyl) phenylthiophenyl ] phenyl } -3-cyclopentylpropan-1, 2-dione-2-oxime acetate, and pharmaceutically acceptable salts thereof, 1- [9, 9-dibutyl-2-yl ] -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- [6- (2-benzoyloxyimino) -3-cyclohexylpropyl-9-ethylcarbazol-3-yl ] octane-1, 2-dione-2-oxime benzoate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -3-cyclopentyl-propane-1-one-oxime benzoate, methyl acetate, ethyl acetate, 1- [7- (2-methylbenzoyl) -9, 9-dibutylfluoren-2-yl ] -3-cyclohexylpropane-1, 2-dione-2-oxime acetate, 1- [6- (furan-2-formyl) -9-ethylcarbazol-3-yl ] -3-cyclohexylpropane-1, 2-dione-2-carbethoxyoxime ester, and the like. These oxime ester compounds may be used alone or in combination of two or more.

In a preferred embodiment, the triazine includes: 2- (4-ethylbiphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 2- (3, 4-methyleneoxyphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 1,1,1,3,3, 3-hexafluoroisopropyl-3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoate, ethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, methyl-ethyl-2, 4-bis (trichloromethyl) -s-triazin, 2-ethoxyethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, cyclohexyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, 3- { chloro-4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanamide, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, and the like, 2, 4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2, 4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl) -1, 3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, and the like. These triazine compounds may be used alone or in combination of two or more.

In a preferred embodiment, the coumarins include: 3,3 '-carbonylbis (7-diethylaminocoumarin), 3-benzoyl-7-diethylaminocoumarin, 3' -carbonylbis (7-methoxycoumarin), 7-diethylamino-4-methylcoumarin, 3- (2-benzothiazole) -7- (diethylamino) coumarin, 7- (diethylamino) -4-methyl-2H-1-benzopyran-2-one [7- (diethylamino) -4-methylcoumarin ], 3-benzoyl-7-methoxycoumarin, and the like. These coumarins may be used alone or in combination of two or more.

In a preferred embodiment, the acridine compound comprises: 9-phenylacridine, 9-p-methylacridine, 9-m-methylphenylacridine, 9-o-chlorophenylacridine, 9-o-fluorophenylacridine, [4- (9-acridinyl) phenoxy ] acetate of 2-ethyl-2- (hydroxymethyl) -1, 3-propanediol ether ethylene ether (i.e., TR-PAD-107, from Changzhou powerful new electronic materials, Inc.), 1, 7-bis (9-acridinyl) heptane, 9-ethylaccridine, 9- (4-bromophenyl) acridine, 9- (3-chlorophenyl) acridine, 1, 7-bis (9-acridine) heptane, 1, 5-bis (9-acridinopentane), 1, 3-bis (9-acridine) propane, and the like. These acridine compounds may be used alone or in combination of two or more.

In a preferred embodiment, the oxadiazole compound comprises: 2-trichloromethyl-5-styryl-1, 3, 4-oxadiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3, 4-oxadiazole, 2-trichloromethyl-5- (naphthoyl-1-yl) -1,3, 4-oxadiazole, 2-trichloromethyl-5- (4-styryl) styryl-1, 3, 4-oxadiazole, and the like. These oxadiazole compounds may be used alone or in combination of two or more.

In a preferred embodiment, the aromatic ketones comprise: acetophenone, 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-2-phenylacetophenone, 1-dichloroacetophenone, benzophenone, 4-benzoyldiphenyl sulfide, 4-benzoyl-4 '-methylbenzophenone sulfide, 4-benzoyl-4' -ethyldiphenyl sulfide, 4-benzoyl-4 '-propyldiphenyl sulfide, 4' -bis (diethylamino) benzophenone, 4-p-tolylmercapto benzophenone, 2,4, 6-trimethylbenzophenone, 4-methylbenzophenone, 4 '-bis (dimethylamino) benzophenone, 4' -bis (methyl, ethylamino) benzophenone, acetophenone dimethyl ketal, benzophenone derivatives, and mixtures thereof, Benzil dimethyl ketal,. alpha. '-dimethylbenzyl ketal,. alpha.' -diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropanone, 1-hydroxycyclohexyl benzophenone, 2-hydroxy-2-methyl-1-p-hydroxyethyl etherylphenylacetone, 2-methyl-1- (4-methylmercaptophenyl) -2-morpholine-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) 1-butanone, phenylbis (2,4, 6-trimethylbenzoyl) oxyphosphine, 2,4,6 (trimethylbenzoyl) diphenylphosphine oxide, 2-hydroxy-1- {3- [4- (2-hydroxy-2-methyl-propionyl) -phenyl ] -1,1, 3-trimethyl-inden-5-yl } -2-methyl acetone, 2-hydroxy-1- {1- [4- (2-hydroxy-2-methyl-propionyl) -phenyl ] -1,3, 3-trimethyl-inden-5-yl } -2-methyl acetone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) one, and the like. These aromatic ketone compounds may be used alone or in combination of two or more.

In a preferred embodiment, the benzoin and benzoin alkyl ether compounds include: benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, and the like. These benzoin and benzoin alkyl ether compounds may be used alone or in combination of two or more.

In a preferred embodiment, the anthraquinone-based compound comprises: 2-phenylanthraquinone, 2, 3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone, 2, 3-dimethylanthraquinone, 2-ethylanthraquinone-9, 10-diethyl ester, 1,2, 3-trimethylanthracene-9, 10-dioctyl ester, 2-ethylanthrane-9, 10-bis (methyl chlorobutyrate), 2- {3- [ (3-ethyloxetan-3-yl) methoxy ] -3-oxopropyl } anthracene-9, 10-diethyl ester, 9, 10-dibutoxyanthracene, 9, 10-diethoxy-2-ethylanthrane, 9, 10-bis (3-chloropropoxy) anthracene, 9, 10-bis (2-hydroxyethylmercapto) anthracene, 2-methylanthraquinone, 2, 3-dimethylanthraquinone, 2-ethylanthraquinone, 10-, 9, 10-bis (3-hydroxy-1-propylmercapto) anthracene and the like. These anthraquinone compounds may be used alone or in combination of two or more.

In a preferred embodiment, the thioxanthone-based compound comprises: thioxanthone, 2, 4-dimethylthioxanthone, 2, 4-diethylthioxanthone, 2, 4-diisopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone, diisopropylthioxanthone, and the like. These thioxanthone compounds may be used alone or in combination of two or more.

In order to further improve the sensitivity of the photosensitive resin composition and to reduce the energy required for curing, the second photoinitiator is preferably an oxime ester photoinitiator.

The amount of the photopolymerization initiator (B) used in the photosensitive resin composition is 1 to 20 parts by weight, preferably 1 to 10 parts by weight, per 100 parts by weight of the photosensitive resin composition. If the content of the photopolymerization initiator (B) is too small, there is a defect that photosensitivity is decreased; on the other hand, if the content of the photopolymerization initiator (B) is too large, there is a defect that the resist pattern tends to be widened beyond the line width of the photomask.

When the photopolymerization initiator (B) simultaneously comprises the bisimidazole photoinitiator B1 and the second photoinitiator, the weight ratio of the bisimidazole photoinitiator B1 to the second photoinitiator or sensitizer B2-1 is (1-35): 99-65, preferably (10-30): 90-70.

When the second photoinitiator and the sensitizer B2-1 are simultaneously present, the ratio of the weight of the bisimidazole photoinitiator B1 to the total weight of the second photoinitiator and the sensitizer B2-1 is (1-35): 99-65, preferably (10-30): 90-70.

< alkali-soluble resin (C) >

The alkali-soluble resin (C) of the present invention is not particularly limited, and is preferably selected from the viewpoints of heat resistance, developability, and acquisition properties. The alkali-soluble resin having an acid group such as a carboxyl group or a phenolic hydroxyl group is preferable, the alkali-soluble resin of a carboxyl group-containing copolymer is more preferable, and the copolymer of an ethylenically unsaturated monomer having 1 or more carboxyl groups [ hereinafter referred to as "carboxyl group-containing unsaturated monomer" (P) ] and another copolymerizable ethylenically unsaturated monomer [ hereinafter referred to as "copolymerizable unsaturated monomer" (Q) ] is particularly preferable [ hereinafter referred to as "carboxyl group-containing copolymer" (R) ].

Examples of the carboxyl group-containing unsaturated monomer (P) include the following compounds: unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α -chloroacrylic acid, cinnamic acid, etc.; unsaturated dicarboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic anhydride, citraconic acid, citraconic anhydride, and mesaconic acid, or anhydrides thereof; three or more membered unsaturated polycarboxylic acids or anhydrides thereof; mono [ (meth) acryloyloxyalkyl ] esters of dibasic or higher polycarboxylic acids such as succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl) and phthalic acid mono (2-methacryloyloxyethyl); and mono (meth) acrylates of polymers having carboxyl groups and hydroxyl groups at both ends, such as ω -carboxy polycaprolactone monoacrylate and ω -carboxy polycaprolactone monomethacrylate. These carboxyl group-containing unsaturated monomers may be used alone or in combination of two or more.

Examples of the copolymerizable unsaturated monomer (Q) include aromatic vinyl compounds such as styrene, α -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, and p-vinylbenzyl glycidyl ether; unsaturated carboxylic acid glycidyl esters such as indene-based glycidyl acrylates and glycidyl methacrylates, e.g., indene and 1-methylindene; vinyl carboxylates such as vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl benzoate; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α -chloroacrylonitrile, and vinylidene cyanide; unsaturated amides such as acrylamide, methacrylamide, α -chloroacrylamide, N-2-hydroxyethylacrylamide, and N-2-hydroxyethylmethacrylamide; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; aliphatic conjugated dienes such as 1, 3-butadiene, isoprene and chloroprene; macromonomers having a monoacryloyl group or a monomethacryloyl group at the end of a polymer molecular chain of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane, or the like. These copolymerizable unsaturated monomers may be used alone or in combination of two or more.

The carboxyl group-containing copolymer [ hereinafter referred to as "carboxyl group-containing copolymer" (R) ] preferred in the present invention is obtained by polymerizing (P) and (Q). The (P) is a carboxyl group-containing unsaturated monomer component containing acrylic acid and/or methacrylic acid as an essential component and further containing at least 1 compound selected from the group consisting of succinic acid mono (2-acryloyloxyethyl group), succinic acid mono (2-methacryloyloxyethyl group), omega-carboxy polycaprolactone monoacrylate and omega-carboxy polycaprolactone monomethacrylate, as the case may be; the (Q) is at least 1 monomer selected from styrene, methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, N-phenylmaleimide, polystyrene macromonomer and polymethyl methacrylate macromonomer.

Specific examples of the carboxyl group-containing copolymer (R) include a (meth) acrylic acid/methyl (meth) acrylate copolymer, a (meth) acrylic acid/benzyl (meth) acrylate copolymer, a (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate copolymer, a (meth) acrylic acid/methyl (meth) acrylate/polystyrene macromonomer copolymer, a (meth) acrylic acid/methyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, a (meth) acrylic acid/benzyl (meth) acrylate/polystyrene macromonomer copolymer, a (meth) acrylic acid/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, a, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polystyrene macromonomer copolymer, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, methacrylic acid/styrene/benzyl (meth) acrylate/N-phenylmaleimide copolymer, (meth) acrylic acid/succinic acid mono [2- (meth) acryloyloxyethyl ]/styrene/(meth) acrylic acid allyl ester/N-phenylmaleimide copolymer The substituent present in the molecule of the carboxyl-containing copolymer such as an amine copolymer, a (meth) acrylic acid/styrene/(meth) acrylic acid benzyl ester/glycerin mono (meth) acrylate/N-phenylmaleimide copolymer, a (meth) acrylic acid/ω -carboxypolycaprolactone mono (meth) acrylate/styrene/(meth) acrylic acid benzyl ester/glycerin mono (meth) acrylate/N-phenylmaleimide copolymer, and the like may be modified with other materials.

In the present invention, the alkali-soluble resin (C) may be used alone or in combination of two or more.

From the viewpoints of developability, liquid viscosity, and the like, the alkali-soluble resin is preferably a polymer having a weight average molecular weight (polystyrene equivalent value measured by GPC method) of 1000-200000, more preferably 2000-100000, and most preferably 5000-50000.

The amount of component (C) in the photosensitive resin composition is 5 to 60 parts by weight, preferably 10 to 50 parts by weight, in 100 parts by weight of the photosensitive resin composition. If the content of the alkali-soluble resin is too small, there is a defect that adhesion to the substrate becomes poor or alkali developability of the photocured portion is reduced; on the other hand, if the content of the alkali-soluble resin is too large, there is a defect that the light-shielding property is deteriorated.

In particular, alkali-soluble resins disclosed in patent publication nos. CN106554459A and CN106397660A are preferred.

< photopolymerizable Compound (D) >

The photopolymerizable compound of the invention is a compound polymerizable by the action of a photopolymerization initiator described later, and these compounds may be used alone or in combination of two or more.

Examples of such photopolymerizable compounds include unsaturated carboxylic acids such as acrylates, methacrylates, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid, and salts, esters, urethanes, amides, and anhydrides thereof, acrylonitrile, styrene, and vinyl ethers thereof, and also radical polymerizable compounds such as various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, and unsaturated polyurethanes, but the present invention is not limited thereto.

Preferably, the acrylic compound comprises: methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, isoamyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, decyl acrylate, dodecyl acrylate, octadecyl acrylate, isobornyl acrylate, cyclohexyl acrylate, dicyclopentenyl acrylate, dicyclopentenyloxyethyl acrylate, benzyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxy-3-chloropropyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-allyloxypropyl acrylate, 2-acryloyloxyethyl-2-hydroxypropyl phthalate, methyl acrylate, ethyl acrylate, decyl acrylate, dodecyl acrylate, isobutyl acrylate, dodecyl acrylate, 2,2, 2-trifluoroethyl acrylate, 1, 3-butanediol methyl ether acrylate, butoxyethyl acrylate, beta-carboxyethyl acrylate, monoacryloxyethyl succinate, omega-carboxypolycaprolactone monoacrylate, trimethylsiloxyethyl acrylate, diphenyl-2-acryloxyethyl phosphate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, bisphenol A diacrylate, EO-modified bisphenol A diacrylate, PO-modified bisphenol A diacrylate, hydrogenated bisphenol A diacrylate, EO-modified hydrogenated bisphenol A diacrylate, PO-modified hydrogenated bisphenol A diacrylate, bisphenol F diacrylate, EO-modified bisphenol F diacrylate, PO-modified bisphenol F diacrylate, EO-modified tetrabromobisphenol A diacrylate, bisphenol A diacrylate, Tricyclodecane dihydroxymethyl diacrylate, glycerol PO modified triacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate monopropionate, dipentaerythritol hexaacrylate, tetramethylolmethane tetraacrylate, and the like.

Preferably, the methacrylic compound comprises: methyl methacrylate, ethyl methacrylate, hydroxyethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, isoamyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, octyl methacrylate, decyl methacrylate, dodecyl methacrylate, octadecyl methacrylate, isobornyl methacrylate, cyclohexyl methacrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethyl methacrylate, benzyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxy-3-chloropropyl methacrylate, 2-hydroxy-3-phenoxypropyl methacrylate, methyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, octyl methacrylate, decyl methacrylate, dodecyl methacrylate, octadecyl methacrylate, isobornyl methacrylate, cyclohexyl methacrylate, dicyclopentenyl methacrylate, benzyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, n-butyl methacrylate, n-, 2,2, 2-trifluoroethyl methacrylate, 2,2,3, 3-tetrafluoropropyl methacrylate, 1H-hexafluoroisopropyl methacrylate, 2-methoxyethyl methacrylate, 1, 3-butanediol methyl ether methacrylate, butoxyethyl methacrylate, methoxytriethylene glycol methacrylate, methoxypolyethylene glycol #400 methacrylate, methoxypropylene glycol methacrylate, ethoxydiethylene glycol methacrylate, 2-ethylhexyl carbitol methacrylate, tetrahydrofurfuryl methacrylate, phenoxyethyl methacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentamethacrylate monopropionate, pentaerythritol penta (meth) acrylate, poly, Dipentaerythritol hexamethacrylate, and the like.

Preferably, allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, triallyl isocyanurate, acrylamide, N-methylolacrylamide, diacetoneacrylamide, N-dimethylacrylamide, N-diethylacrylamide, N-isopropylacrylamide, acryloylmorpholine, styrene, p-hydroxystyrene, p-chlorostyrene, p-bromostyrene, p-methylstyrene, vinyl acetate, vinyl monochloroacetate, vinyl benzoate, vinyl pivalate, vinyl butyrate, vinyl laurate, divinyl adipate, and the like are also included.

The compound having at least one polymerizable unsaturated bond of the present invention (D may be used alone, or two or more compounds may be mixed at an arbitrary ratio to improve desired characteristics.

The amount of component (D) in the photosensitive resin composition is 5 to 50 parts by weight, preferably 10 to 30 parts by weight, in 100 parts by weight of the photosensitive resin composition. If the content of the component (D) is too small, there is a defect that photosensitivity is lowered; on the other hand, if the content of the component (D) is too large, there is a defect that the resist pattern tends to be widened beyond the line width of the photomask.

< Hydrogen donor (E) >

The photosensitive resin composition for a color filter of the present invention may further include a hydrogen donor in order to improve the sensitivity. The double imidazole compounds are cracked after illumination, the generated single imidazole free radicals have larger volume, the steric effect causes the activity to be smaller, and the monomer polymerization is difficult to initiate independently, but the single imidazole free radicals are easy to capture active hydrogen on a hydrogen donor to generate new active free radicals to initiate the monomer polymerization.

There is no particular limitation as long as it is a hydrogen donor having the above characteristics, and it may preferably include, for example: and amine compounds, carboxylic acid compounds, mercapto group-containing organic sulfur compounds, alcohol compounds, and the like, and these compounds are used alone or in combination of two or more thereof.

The amine compound is not particularly limited, and preferably may include, for example: aliphatic amine compounds (triethanolamine, methyldiethanolamine, triisopropanolamine, etc.); aromatic amine compounds [ 4-dimethylaminobenzoic acid methyl ester, 4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid isoamyl ester, 4-dimethylaminobenzoic acid 2-ethylhexyl ester, 2-dimethylaminoethylbenzoic acid ester, N-dimethyl-p-toluidine, 4 '-bis (dimethylamino) benzophenone, 4' -bis (diethylamino) benzophenone, etc. ].

The carboxylic acid-based compound is not particularly limited, and preferably may include, for example: aromatic heteroacetic acid, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthyloxyacetic acid and the like.

The organic sulfur compound having a mercapto group is not particularly limited, and may preferably include, for example: 2-Mercaptobenzothiazole (MBO), 2-Mercaptobenzimidazole (MBI), dodecylmercaptan, ethylene glycol bis (3-mercaptobutyrate), 1, 2-propanediol bis (3-mercaptobutyrate), diethylene glycol bis (3-mercaptobutyrate), butanediol bis (3-mercaptobutyrate), octanediol bis (3-mercaptobutyrate), trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakis (3-mercaptobutyrate), dipentaerythritol hexa (3-mercaptobutyrate), ethylene glycol bis (2-mercaptopropionate), propylene glycol bis (2-mercaptopropionate), diethylene glycol bis (2-mercaptopropionate), butanediol bis (2-mercaptopropionate), octanediol bis (2-mercaptopropionate), Trimethylolpropane tris (2-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexa (2-mercaptopropionate), ethylene glycol bis (3-mercaptoisobutyrate), 1, 2-propanediol bis (3-mercaptoisobutyrate), diethylene glycol bis (3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), octanediol bis (3-mercaptoisobutyrate), trimethylolpropane tris (3-mercaptoisobutyrate), pentaerythritol tetrakis (3-mercaptoisobutyrate), dipentaerythritol hexa (3-mercaptoisobutyrate), ethylene glycol bis (2-mercaptoisobutyrate), 1, 2-propanediol bis (2-mercaptoisobutyrate), diethylene glycol bis (2-mercaptoisobutyrate), Butanediol bis (2-mercaptoisobutyrate), octanediol bis (2-mercaptoisobutyrate), trimethylolpropane tris (2-mercaptoisobutyrate), pentaerythritol tetrakis (2-mercaptoisobutyrate), dipentaerythritol hexa (2-mercaptoisobutyrate), ethylene glycol bis (4-mercaptovalerate), 1, 2-propanediol bis (4-mercaptoisovalerate), diethylene glycol bis (4-mercaptovalerate), butanediol bis (4-mercaptovalerate), octanediol bis (4-mercaptovalerate), trimethylolpropane tris (4-mercaptovalerate), pentaerythritol tetrakis (4-mercaptovalerate), dipentaerythritol hexa (4-mercaptovalerate), ethylene glycol bis (3-mercaptovalerate), 1, 2-propanediol bis (3-mercaptovalerate), Aliphatic secondary polyfunctional thiol compounds such as diethylene glycol bis (3-mercaptovalerate), butanediol bis (3-mercaptovalerate), octanediol bis (3-mercaptovalerate), trimethylolpropane tris (3-mercaptovalerate), pentaerythritol tetrakis (3-mercaptovalerate), dipentaerythritol hexa (3-mercaptovalerate), and aromatic secondary polyfunctional thiol compounds include: di (1-mercaptoethyl) phthalate, di (2-mercaptopropyl) phthalate, di (3-mercaptobutyl) phthalate, di (3-mercaptoisobutyl) phthalate, and the like.

The alcohol compound is not particularly limited and may include, for example: methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, neopentyl alcohol, n-ethanol, cyclohexanol, ethylene glycol, 1, 2-propanediol, 1,2, 3-propanetriol, benzyl alcohol, phenethyl alcohol, etc.

The content of the hydrogen donor is not particularly limited, and the content of the hydrogen donor (E) is 0.01 to 20 parts by weight, preferably 0.01 to 10 parts by weight, in 100 parts by weight of the photosensitive resin composition. When the content of the hydrogen donor is within the above range, the sensitivity of the colored photosensitive resin composition can be further improved.

< other optional additives >

Other auxiliaries commonly used in the art, including organic solvents, organic carboxylic acids, pigment dispersants, adhesion enhancers, leveling agents, development improvers, antioxidants, thermal polymerization inhibitors, and the like, may also be optionally added to the photosensitive resin composition of the present invention. In addition, one or more of surfactants, fluorescent whitening agents, plasticizers, flame retardants, ultraviolet absorbers, foaming agents, bactericides, antistatic agents, magnetic substances, conductive materials, antifungal or antibacterial materials, porous adsorbents, aromatic materials, and the like may be added according to the use.

Illustratively, the organic solvent is not particularly limited as long as it can dissolve the aforementioned components, and may include, for example: glycol ether solvents, alcohol solvents, ester solvents, ketone solvents, amide solvents, chlorine-containing solvents, and the like. The selection is preferably made in consideration of, in particular, the solubility of the colorant and the alkali-soluble resin, coatability, safety, and the like. Preferred are ethyl cellosolve (ethylene glycol monoethyl ether), methyl cellosolve (ethylene glycol monomethyl ether), butyl cellosolve (ethylene glycol monobutyl ether), methyl methoxybutanol (3-methyl-3-methoxybutanol), butyl carbitol (diethylene glycol monobutyl ether), ethylene glycol monoethyl ether acetate, ethylene glycol mono-t-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy-2-propanol), propylene glycol monoethyl ether acetate, ethyl acetate, n-butyl acetate, isobutyl acetate, cellosolve acetate (ethylene glycol monomethyl ether acetate), methoxybutyl acetate (3-methoxybutyl acetate), 3-methyl-3-methoxybutyl acetate, methoxybutyl acetate, Ethyl 3-ethoxypropionate (EEP), methyl lactate, ethyl lactate, propyl lactate, butyl lactate, 2-butanone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone, cyclopentanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), isophorone (3,5, 5-trimethyl-2-cyclohexen-1-one), diisobutyl ketone (2, 6-dimethyl-4-heptanone), N-methylpyrrolidone (4-methylaminolactam or NMP), methanol, ethanol, isopropanol, N-propanol, isobutanol, N-butanol, and the like. These solvents are used alone, or in combination of two or more thereof.

Illustratively, the kind of the organic carboxylic acid is not particularly limited, and may include, for example: aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethylacetic acid, heptanoic acid, and octanoic acid; aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassylic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, and citraconic acid; aliphatic tricarboxylic acids such as 1,2, 3-propanetricarboxylic acid, aconitic acid, norbornanetricarboxylic acid, etc.; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, 2, 3-dimethylbenzoic acid and 3, 5-dimethylbenzoic acid; aromatic polycarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, 1,2,3, 5-benzenetetracarboxylic acid, and 1,2,4, 5-benzenetetracarboxylic acid; and other carboxylic acids such as phenylacetic acid, hydroatropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, and umbellic acid. These organic carboxylic acids are used alone or in combination of two or more thereof.

Illustratively, the kind of the dispersant is not particularly limited, and may include, for example: examples of the polymer dispersant include polyamidoamine and salts thereof, polycarboxylic acid and salts thereof, high-molecular-weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (meth) acrylic acid copolymer, and naphthalenesulfonic acid-formaldehyde condensate, and also include polyoxyethylene alkyl phosphate, polyoxyethylene alkylamine, alkanolamine, and pigment derivatives. These dispersants are used alone, or in combination of two or more thereof.

Illustratively, the kind of the adhesion enhancer is not particularly limited, and may include, for example: vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyldimethoxysilane, 2- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-isocyanatopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, N- (2-methoxyethoxy) -3-aminopropyltrimethoxysilane, 3-glycidyloxypropyltrimethoxysilane, vinyltrimethoxysilane, 3, 3-isocyanatopropyltriethoxysilane, and the like. These adhesion enhancers may be used alone, or in combination of two or more thereof.

Illustratively, thermal polymerization inhibitors may include, for example: p-methoxyphenol, hydroquinone, catechol, t-butylcatechol, phenothiazine, p-methoxyphenol, and the like. These thermal polymerization inhibitors are used alone or in combination of two or more thereof.

Illustratively, the kind of the surfactant is not particularly limited, and may include, for example: a fluorine surfactant, a silicon surfactant, or a mixture thereof. These surfactants are used alone, or in combination of two or more thereof.

Illustratively, the kind of the plasticizer is not particularly limited, and may include, for example: dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerol, and the like. These plasticizers are used alone, or in combination of two or more thereof.

< color Filter and method for producing the same >

In addition, the invention also provides a color filter which comprises a substrate and a pattern layer arranged on the surface of the substrate, wherein the pattern layer is formed by coating, exposing, developing and curing the photosensitive resin composition containing the bisimidazole photoinitiator.

When the color filter of the present invention is applied to an image display device, light is emitted by light from a light source of the display device, and therefore, more excellent light efficiency can be achieved. Further, since light having a hue is emitted, color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

The substrate in the color filter may be the color filter itself, or a portion where the color filter is located in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiO)_x) Or a polymer substrate, and the polymer substrate may be polyether sulfone (PES), Polycarbonate (PC), or the like.

The pattern layer is a layer containing the photosensitive resin composition of the present invention, and may be formed by applying the photosensitive resin composition, and then exposing, developing and curing the applied layer in accordance with a predetermined pattern.

The pattern layer formed from the photosensitive resin composition comprises a red pattern layer containing red quantum dot particles; a green pattern layer containing green quantum dot particles; and a blue pattern layer containing blue quantum dot particles. When light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light.

In this case, the light emitted from the light source used in the image display device is not particularly limited, but a light source emitting blue light can be preferably used from the viewpoint of more excellent luminance and color reproducibility.

According to another embodiment of the present invention, the pattern layer includes a red pattern layer, a green pattern layer, and a transparent pattern layer without quantum dot particles. In this case, as a light source of the image display device including the pattern layer, a light source emitting blue light can be used. At this time, the red pattern layer emits red light, the green pattern layer emits green light, and the transparent pattern layer is blue light directly transmitted.

The color filter including the substrate and the pattern layer as described above may further include a rib wall formed between the patterns, and may further include a black matrix. In addition, the color filter may further include a protective film formed on the upper portion of the pattern layer of the color filter.

< image display apparatus >

In addition, the invention also provides an image display device comprising the color filter.

The color filter of the present invention can be applied not only to a general liquid crystal display device but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device.

The image display device of the present invention may include a color filter including a red pattern layer containing red quantum dot particles; a green pattern layer containing green quantum dot particles; and a blue pattern layer containing blue quantum dot particles. In this case, the light emitted from the light source used in the image display device is not particularly limited, but a light source emitting blue light can be preferably used in terms of more excellent color reproducibility.

According to still another embodiment of the present invention, an image display device of the present invention may be provided with a color filter including a red pattern layer, a green pattern layer, and a transparent pattern layer not containing quantum dot particles.

In this case, a light source emitting blue light may be used as the light source. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer is directly transmitted by blue light to exhibit blue color.

The image display device of the present invention has excellent light efficiency, high brightness, excellent color reproducibility and wide viewing angle.

The present invention is further illustrated by the following examples, which should not be construed as limiting the scope of the invention.

(1) Preparation of photosensitive resin composition

The photosensitive resin composition according to the present invention was prepared by diluting the composition (parts by weight) described in table 1 below with propylene glycol monomethyl ether acetate so that the solid content became 18% by weight, and then stirring the resulting solution.

TABLE 1

(2) Manufacture of color filter

After the photosensitive resin compositions of examples and comparative examples were applied onto a glass substrate by a spin coating method, the substrate was placed on a hot plate and held at a temperature of 100 ℃ for 3 minutes to form a thin film. A test photomask having a 20mm × 20mm square transmission pattern and a 1-100 μm line/space pattern was placed on the thin film, and irradiated with ultraviolet light with a gap of 100 μm between the thin film and the test photomask.

In this case, a high-pressure mercury lamp 1PCS light source was used as a light source of ultraviolet rays. The coating film is fully exposed by ultraviolet rays with the wavelength of 365nm through the gaps of the mask plate (the exposure is 200 mJ/cm)²) Then, the resultant was immersed in a 2.5% sodium carbonate solution at 25 ℃ for 20 seconds for development, washed with ultrapure water, air-dried, and hard-baked at 220 ℃ for 30 minutes to fix the pattern, thereby producing a color filter. The thickness of the manufactured color filter pattern layer was 10.0 μm.

Evaluation of Performance

(1) Evaluation of whether or not a fine Pattern can be formed

In the color filters manufactured from the compositions of the examples and comparative examples, the width of the pattern obtained through the line/space pattern mask having an opening width of 100 μm was measured using an OM apparatus (ECLIPSELV100POL, NIKON corporation), and the difference between the opening width and the pattern width of the pattern mask was determined, as shown in table 2 below. The smaller the difference between the opening width of the pattern mask and the pattern width, the more minute the pattern can be formed.

If the absolute value of the difference is 20 μm or more, it is difficult to express fine pixels, and if the difference is a negative value, a process failure may be caused.

(2) Measurement of luminescence intensity

In the color filters manufactured from the compositions of the examples and comparative examples, a pattern portion of 20mm × 20mm was irradiated with light using a 365nm tube type 4WUV irradiator (VL-4LC, vilberlorourmat), and the intensity (intensity) of light in a wavelength region (red quantum dots are 640nm) emitted by photoluminescence was measured using a spectrometer (oceanooptics), as shown in table 2 below.

The stronger the measured light intensity is, the more excellent photoluminescence characteristics can be judged to be exhibited.

TABLE 2

(3) Sensitivity (sensitivity)

The sensitivity of the photosensitive resin compositions of examples 1 to 4 and comparative examples 1 to 4 was evaluated by taking out the photosensitive resin compositions on a PET template and forming films having thicknesses of about 5 μm, 10 μm and 20 μm, respectively, by wire bar coating. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, the coating film was exposed to ultraviolet rays having a wavelength of 365nm through the gap of the mask plate with a 1PCS light source of a high-pressure mercury lamp, and then developed by dipping in a 2.5% sodium carbonate solution at 25 ℃ for 20 seconds, washed with ultrapure water, air-dried, hard-baked at 220 ℃ for 30min to fix the pattern, and the obtained pattern was evaluated.

At the time of exposure, the minimum exposure amount at which the residual film ratio after development of the light-irradiated region in the exposure step is 90% or more is evaluated as the exposure demand. The smaller the exposure requirement, the higher the sensitivity, and the specific evaluation results are shown in Table 3.

(4) Yellowing property

The yellowing is evaluated by using a chromatometer (Aceix-Rite Color i7) to perform full transmission scanning, wherein the scanning wavelength is 400-700nm, and the smaller the Delta b value is, the more obvious the yellowing is represented, otherwise, the more serious the yellowing is.

TABLE 3

From the above descriptions of table 2 and table 3, it can be seen that the above-described embodiments of the present invention achieve the following technical effects: the photosensitive resin composition of the present invention has a small difference between the opening width of a pattern mask and the pattern width, can form a fine pattern, can suppress undercut of the developed pattern, has very excellent photoluminescence intensity and high brightness, and has a small difference in curing effect in thin film curing but a large reduction in energy required for thick film curing and excellent yellowing resistance as compared with a comparative example with an increase in the thickness of the cured film.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A photosensitive resin composition containing a bisimidazole photoinitiator, characterized by comprising:

(A) photoluminescent quantum dot particles;

(B) the photopolymerization initiator comprises a double imidazole photoinitiator B1 with a structure shown in a general formula (I) and a second photoinitiator or sensitizer B2-1, wherein the second photoinitiator is different from the double imidazole photoinitiator B1;

(C) an alkali-soluble resin;

(D) a photopolymerizable compound;

(E) a hydrogen donor;

wherein in the general formula (I), Ar is₁Ar described in₂Ar described in₃Ar described in₄Ar described in₅And said Ar₆Each independently represents a substituted aryl group or an unsubstituted aryl group.

2. The photosensitive resin composition according to claim 1, wherein the bisimidazole-based photoinitiator B1 comprises one or more compounds represented by the formulae (II) to (IV):

3. the photosensitive resin composition according to claim 2, wherein the total amount of the compounds represented by the formulae (II) to (IV) is not less than 92 wt% based on the weight percentage of the bisimidazole photoinitiator B1;

preferably, the total amount of the compounds represented by the formulas (II) to (IV) is more than or equal to 95 wt% based on the weight percentage of the bisimidazole photoinitiator B1;

more preferably, the total amount of the compounds represented by the formulas (II) to (IV) is 100 wt% based on the weight percentage of the bisimidazole photoinitiator B1.

4. The photosensitive resin composition according to claim 1, wherein the substituent in the substituted aryl group is selected from the group consisting of halogen, nitro, cyano, amino, hydroxyl, and C₁～C₂₀Alkyl or alkenyl of, C₁～C₈Or at least one methylene group in said substituents is substituted by-O-, -S-, -NH-.

5. The photosensitive resin composition according to claim 1, wherein the photopolymerization initiator is used in an amount of 1 to 20 parts by weight, preferably 1 to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition.

6. The photosensitive resin composition according to claim 1, wherein the weight ratio of the bisimidazole-based photoinitiator B1 to the second photoinitiator or the sensitizer B2-1 is (1-35): (99-65), preferably (10-30): (90-70);

preferably, the second photoinitiator is one or more selected from the group consisting of oxime ester compounds, triazine compounds, coumarin compounds, acridine compounds, oxadiazole compounds, aromatic ketone compounds, benzoin and benzoin alkyl ether compounds, anthraquinones and thioxanthones.

7. The photosensitive resin composition according to any one of claims 1 to 6, wherein the second photoinitiator and the sensitizer B2-1 are each independently selected from oxime ester compounds, triazine compounds, coumarin compounds, acridine compounds, oxadiazole compounds, aromatic ketone compounds, benzoin and benzoin alkyl ether compounds, anthraquinone compounds, or thioxanthone compounds;

preferably, the oxime ester compound is selected from 1- (4-thiophenylphenyl) -n-octane-1, 2-dione-2-oxime benzoate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -butane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -propane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -1 -cyclohexyl-methano-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-dione-2-oxime benzoate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propan-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1, 2-dione-2-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (4-benzoyldiphenyl sulfide) -3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) -one-oxime (3-cyclopentyl) -propane-1, 2-dione-2-o-methylbenzoic acid oxime ester, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- (4-thenoyl-diphenylsulfide-4' -yl) -3-cyclopentyl-propane-1-one-acetic acid oxime ester, 1- (4-benzoyldiphenylsulfide) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-nitro-9-ethylcarbazol-3-yl) -3-cyclohexyl-propane-1-one-acetic acid oxime ester, and salts thereof, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (6-furfurylcarbazol-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime acetate, 1, 4-diphenylpropane-1, 3-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-3-oxime benzoate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, oxime, 2- [ (benzoyloxy) imino ] -1-phenylpropan-1-one, 1-phenyl-1, 2-propanedione-2- (oxoacetyl) oxime, 1- (4-phenylthiophenyl) -2- (2-methylphenyl) -ethane-1, 2-dione-2-oxime acetate, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- {4- [4- (thiophene-2-formyl) phenylthiophenyl ] phenyl } -3-cyclopentylpropan-1, 2-dione-2-oxime acetate, and pharmaceutically acceptable salts thereof, 1- [9, 9-dibutyl-2-yl ] -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- [6- (2-benzoyloxyimino) -3-cyclohexylpropyl-9-ethylcarbazol-3-yl ] octane-1, 2-dione-2-oxime benzoate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -3-cyclopentyl-propane-1-one-oxime benzoate, methyl acetate, ethyl acetate, One or more of the group consisting of 1- [7- (2-methylbenzoyl) -9, 9-dibutylfluoren-2-yl ] -3-cyclohexylpropane-1, 2-dione-2-oxime acetate and 1- [6- (furan-2-formyl) -9-ethylcarbazol-3-yl ] -3-cyclohexylpropane-1, 2-dione-2-carbethoxyoxime ester;

preferably, the triazine compound is selected from the group consisting of 2- (4-ethylbiphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 2- (3, 4-methyleneoxyphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 1,1,1,3,3, 3-hexafluoroisopropyl-3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoate, ethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, and mixtures thereof, 2-ethoxyethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, cyclohexyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, 3- { chloro-4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanamide, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, and the like, One or more of the group consisting of 2, 4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2, 4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl) -1, 3-butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine;

preferably, the coumarin-based compound is selected from one or more of the group consisting of 3,3 '-carbonylbis (7-diethylamine coumarin), 3-benzoyl-7-diethylamine coumarin, 3' -carbonylbis (7-methoxycoumarin), 7-diethylamino-4-methylcoumarin, 3- (2-benzothiazole) -7- (diethylamino) coumarin, 7- (diethylamino) -4-methyl-2H-1-benzopyran-2-one [7- (diethylamino) -4-methylcoumarin ], 3-benzoyl-7-methoxycoumarin;

preferably, the acridine compound is selected from 9-phenylacridine, 9-p-methylphenylacridine, 9-m-methylphenylacridine, 9-o-chlorophenylacridine, 9-o-fluorophenylacridine, 4- (9-acridinyl) phenoxy ] acetate of 2-ethyl-2- (hydroxymethyl) -1, 3-propanediol ether ethylene ether (TR-PAD-107, available from Changzhou powerful new electron materials, Inc.), 1, 7-bis (9-acridinyl) heptane, one or more selected from the group consisting of 9-ethylacridine, 9- (4-bromophenyl) acridine, 9- (3-chlorophenyl) acridine, 1, 7-bis (9-acridine) heptane, 1, 5-bis (9-acridinopentane), 1, 3-bis (9-acridine) propane;

preferably, the oxadiazole compound is selected from one or more of the group consisting of 2-trichloromethyl-5-styryl-1, 3, 4-oxadiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3, 4-oxadiazole, 2-trichloromethyl-5- (naphthoyl-1-yl) -1,3, 4-oxadiazole, and 2-trichloromethyl-5- (4-styryl) styryl-1, 3, 4-oxadiazole;

preferably, the aromatic ketone compound is selected from the group consisting of acetophenone, 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-2-phenylacetophenone, 1-dichloroacetophenone, benzophenone, 4-benzoyldiphenyl sulfide, 4-benzoyl-4 ' -methylbenzophenone sulfide, 4-benzoyl-4 ' -ethyldiphenyl sulfide, 4-benzoyl-4 ' -propyldiphenyl sulfide, 4 ' -bis (diethylamino) benzophenone, 4-p-tolylmercapto benzophenone, 2,4, 6-trimethylbenzophenone, 4-methylbenzophenone, 4 ' -bis (dimethylamino) benzophenone, 4 ' -bis (methylamino), 4 ' -bis (methyl, 2,4 ' -di-methoxy-2-methyl, 4 ' -di-methoxy-4-methyl diphenyl sulfide, 4 ' -methyl diphenyl sulfide, 4 ' -methyl diphenyl sulfide, ethylamino) benzophenone, acetophenone dimethyl ketal, benzil dimethyl ketal, α '-dimethylbenzyl ketal, α' -diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropanone, 1-hydroxycyclohexyl benzophenone, 2-hydroxy-2-methyl-1-p-hydroxyethyl etheryl phenylpropanone, 2-methyl 1- (4-methylthiophenyl) -2-morpholine 1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) 1-butanone, phenylbis (2,4, 6-trimethylbenzoyl) phosphine oxide, 2,4,6 (trimethylbenzoyl) diphenylphosphine oxide, 2-hydroxy-1- {3- [4- (2-hydroxy-2-morpholinyl) phosphine oxide -methyl-propionyl) -phenyl ] -1,1, 3-trimethyl-inden-5-yl } -2-methyl acetone, 2-hydroxy-1- {1- [4- (2-hydroxy-2-methyl-propionyl) -phenyl ] -1,3, 3-trimethyl-inden-5-yl } -2-methyl acetone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) one;

preferably, the benzoin and benzoin alkyl ether compounds are selected from one or more of the group consisting of benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether;

preferably, the anthraquinone-based compound is selected from the group consisting of 2-phenylanthraquinone, 2, 3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone, 2, 3-dimethylanthraquinone, 2-ethylanthraquinone-9, 10-diethyl ester, 1,2, 3-trimethylanthracene-9, 10-dioctyl ester, 2-ethylanthraene-9, 10-bis (4-chlorobutyric acid methyl ester), 2- {3- [ (3-ethyloxetan-3-yl) methoxy ] -3-oxopropyl } anthracene-9, 10-diethyl ester, 9, 10-dibutoxyanthracene, 9, 10-diethoxy-2-ethylanthracene, 9, 10-bis (3-chloropropoxy) anthracene, 9, 10-bis (2-hydroxyethylmercapto) anthracene, 9-bis (2-hydroxyethylmercapto) anthracene, 2-methylanthraquinone, 3-dimethylanth, One or more of the group consisting of 9, 10-bis (3-hydroxy-1-propylmercapto) anthracene;

preferably, the thioxanthone-based compound is selected from one or more of the group consisting of thioxanthone, 2, 4-dimethylthioxanthone, 2, 4-diethylthioxanthone, 2, 4-diisopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone, diisopropylthioxanthone.

8. A color filter, comprising a substrate and a pattern layer arranged on the surface of the substrate, wherein the pattern layer is formed by coating, exposing, developing and curing a photosensitive resin composition, and the photosensitive resin composition comprises the photosensitive resin composition containing the bisimidazole photoinitiator according to any one of claims 1 to 7.

9. An image display device comprising a color filter, wherein the color filter comprises the color filter according to claim 8.

10. Use of the photosensitive resin composition containing a bisimidazole photoinitiator according to any one of claims 1 to 8 in the field of photocuring.