CN111752098A - Self-luminous photosensitive resin composition, color filter and image display device - Google Patents

Abstract

The invention provides a self-luminous photosensitive resin composition, a color filter and an image display device. The self-luminous photosensitive resin composition comprises the following components: the light-emitting diode comprises photoluminescence quantum dot particles, a photoinitiator, a photopolymerizable compound and an alkali-soluble resin, wherein the photoinitiator comprises at least one free radical initiator and at least one thermal acid generator. The invention provides a light-heat mixed type photosensitive resin composition, which can combine the advantages of two curing systems of free radical photocuring and thermocuring, has excellent response to a light source in the wavelength range of 200-500nm, and can fully play the thermocuring characteristic in a postbaking process so as to achieve the effect of deep curing. By using the self-luminous photosensitive resin composition of the present invention, complete curing can be performed with less energy even in thick film curing, adhesion is excellent, and pattern undercut after development can be suppressed.

Description

Self-luminous photosensitive resin composition, color filter and image display device

Technical Field

The present invention relates to the field of image display technology, and more particularly, to a self-luminous photosensitive resin composition, a color filter, and an image display device.

Background

At present, colorization of the liquid crystal display is realized by means of a Color filter (Color filter). In a conventional color filter, a common photoresist uses a pigment-type photoresist to absorb light with other wavelengths, so as to obtain light with a desired color, for example, a red filter absorbs blue light components and green light components in a white backlight, and only allows red light to pass through, so as to obtain red. In this case, about 2/3 light in the backlight is absorbed by the optical filter, the light utilization rate is greatly reduced, and the half-peak width of the pigment type color film photoresist is more than 50nm, resulting in low color purity.

In recent years, quantum dot semiconductor materials and their products have come into the field of view, for example CN104479680A, CN105629661A, CN108624320A, TW201825549A disclose the use of different quantum dot-containing photosensitive compositions. The quantum dots are also called semiconductor nanocrystals, have the size of 1-10nm generally, and have the characteristics of adjustable light-emitting spectrum, narrow half-wave peak width, high light-emitting efficiency and high stability. The blue light emitting diode is utilized to excite the red and green quantum dot mixture to generate white light, and the quantum dots are widely applied to the fields of electroluminescent devices, photoluminescent devices, displays, solid-state lighting, biological fluorescent marks and the like. The quantum dot color filter prepared by the quantum dot photoresist can completely convert backlight into light with required color, has the advantages of wide color gamut, high color purity, high quantum efficiency, symmetrical emission spectrum peak, narrow half-wave peak width and the like compared with the traditional color filter, and is very suitable for being applied to the field of displays. Independent green light (about 530nm) and red light (about 630nm) can be directly obtained by means of quantum dots, the spectrum interval is narrower, the color is purer, the color of the display can be brighter, and the brightness and the energy conservation are greatly improved.

However, in the field of color filters, in order to ensure high color purity of display devices or high color resolution of light receiving devices, on the one hand, and because quantum dot materials are sensitive to temperature, moisture, and oxygen, quantum dot photoresists (also called self-luminous photosensitive resin compositions) tend to have increased coating thickness compared to photoresists used in conventional color filters, the conventional photoresists are generally 1 to 2 μm thick, and the self-luminous photosensitive resin compositions are generally 10 to 20 μm thick. This has the disadvantage that the curing of the thick film is insufficient, the developability is poor, or higher radiation energy is required.

At present, in the research on quantum dot photoresists, for example, patents CN107880871A, CN105652594A and CN105911820A disclosed in donmitomo fine chemical engineering mainly aim at solving the problems of low solubility, poor stability, poor etching property, poor adhesion with a substrate and the like of quantum dots, and no report on how to solve the problem of curing difficulty of thick films of resin compositions has been found.

Disclosure of Invention

The invention mainly aims to provide a self-luminous photosensitive resin composition to solve the problem that the thick film of the self-luminous photosensitive resin composition in the prior art is difficult to cure.

In order to achieve the above object, according to one aspect of the present invention, there is provided a self-luminous photosensitive resin composition comprising the following components: the light-emitting diode comprises photoluminescence quantum dot particles, a photoinitiator, a photopolymerizable compound and an alkali-soluble resin, wherein the photoinitiator comprises at least one free radical initiator and at least one thermal acid generator.

In order to achieve the above object, according to one aspect of the present invention, there is provided a color filter prepared from the self-luminous photosensitive resin composition described above.

According to another aspect of the present invention, there is provided an image display device including the color filter.

The self-luminous photosensitive resin composition provided by the invention is a light-heat mixed type photosensitive resin composition, can combine the advantages of two curing systems of free radical photocuring and thermocuring, has excellent response to a light source within the wavelength range of 200-500nm, and can fully play the thermocuring characteristic in a postbaking process so as to achieve the effect of deep curing. By using the self-luminous photosensitive resin composition of the present invention, complete curing can be performed with less energy even in thick film curing, adhesion is excellent, and pattern undercut after development can be suppressed.

Detailed Description

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail with reference to examples.

As described in the background of the invention section, the self-luminous photosensitive resin composition of the prior art has a problem that curing of a thick film is difficult. In order to solve this problem, the present invention provides a self-luminous photosensitive resin composition comprising the following components: the photo-luminescent material comprises photo-luminescent quantum dot particles (A), a photoinitiator (B), a photo-polymerizable compound (C) and an alkali-soluble resin (D), wherein the photoinitiator comprises at least one free radical initiator and at least one cationic thermal acid generator.

The composition simultaneously adopts at least one free radical initiator and at least one thermal acid generator, is a photo-thermal mixed type photosensitive resin composition, can combine the advantages of two curing systems of free radical photo-curing and thermal curing, has excellent response to a light source within the wavelength range of 200-500nm, and can fully exert the thermal curing characteristic in the POB process so as to achieve the effect of deep curing. By using the self-luminous photosensitive resin composition of the present invention, complete curing can be performed with less energy even in thick film curing, adhesion is excellent, and pattern undercut after development can be suppressed.

The components will be described in more detail below:

< photoluminescent Quantum dot particles (A) >

Quantum dots are semiconductor substances of nanometer size, and are called quantum dots when each of the nanoparticles has semiconductor characteristics, particularly, when atoms form molecules and the molecules form clusters as small molecular aggregates to form nanoparticles.

When the quantum dot receives energy from the outside and becomes a floating state, energy corresponding to its own energy band gap (energy band gap) is released.

The self-photosensitive resin composition of the present invention contains such photoluminescence quantum dot particles, and a color filter produced from the same can emit light (photoluminescence) by light irradiation. In a typical image display device including a color filter, white light passes through the color filter to appear in color, but in this process, a part of the light is absorbed by the color filter, and thus the light efficiency is lowered. In addition, when the color filter manufactured by the photosensitive resin composition of the present invention is included, the color filter emits light by itself by light of a light source, so that more excellent light efficiency can be achieved. Further, since light having a hue is emitted, color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

The quantum dot particles of the present invention are not particularly limited as long as they can emit light by optical stimulation. In a preferred embodiment, the material of the photoluminescent quantum dot particles is one or more of the following compounds: a group II-VI semiconductor compound, a group III-V semiconductor compound, a group IV-VI semiconductor compound, a group IV element, or a group IV element-containing compound. The quantum dot particles formed of these substances may be used alone or in combination of two or more.

Preferably, the above II-VI semiconductor compound may be selected from compounds of binary elements selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; a ternary compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS s, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and a quaternary element compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe and mixtures thereof.

Preferably, the above group III-V semiconductor compound may be selected from the following compounds; a binary compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AIN, AIP, AIAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; a tertiary element compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaGaAs, GaPSb, AINP, AINAs, AINSb, AIPAs, AIPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAINP, and mixtures thereof; and a quaternary element compound selected from the group consisting of GaAINAs, GaAINSb, GaAIPAs, GaAIPSb, GalnNP, GalnNAs, GalnNSb, GalnPAs, GalnPSb, InAINP, InAIAs, InAISb, InAIPAs, InAIPBs, and mixtures thereof.

Preferably, the above group IV-VI semiconductor compound may be selected from the following compounds: a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof; a ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a quaternary element compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof.

Preferably, the above-mentioned group IV element or a compound containing the element may be selected from the following compounds; a compound of an element selected from the group consisting of Si, Ge, and mixtures thereof; and a binary compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

In a preferred embodiment, the quantum dot particle may have the following structure: double structures such as homogeneous (homogeneous) single structures, core-shell (core-shell), gradient (gradient) structures, and the like; or a hybrid structure thereof.

In the core-shell (core-shell) dual structure, the substances forming the respective core (core) and shell (shell) may be composed of the above-mentioned semiconductor compounds different from each other. For example, the core may include one or more selected from CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, aglnnzns, and ZnO, but is not limited thereto. The shell may contain one or more substances selected from CdSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.

The diameter of the quantum dot particle of the present invention is not particularly limited, and in a preferred embodiment, the average particle diameter of the photoluminescent quantum dot particle is 1 to 40 nm. In addition, in the case of a core-shell (core-shell) dual structure, the average particle diameter of the core may be 0.5 to 10nm, and the average thickness of the shell may be 0.5 to 30 nm. When the average particle diameter and the thickness are within the above ranges, the composition can have different dispersibility, and can exhibit a color by light irradiation, and can be used for manufacturing a color filter.

The colored photosensitive resin composition for manufacturing a general color filter includes red, green and blue colorants in order to represent a hue, and the photoluminescence quantum dot particles may be classified into red quantum dot particles, green quantum dot particles and blue quantum dot particles, and the quantum dot particles of the present invention may be red quantum dot particles, green quantum dot particles or blue quantum dot particles.

The red, green, and blue quantum dot particles may be classified according to particle size, but preferably, the particle size decreases in the order of red, green, and blue. Specifically, in a preferred embodiment, the particle size of the red quantum dot particles is 5nm to 10nm, the particle size of the green quantum dot particles is 3nm to 5nm, and the particle size of the blue quantum dot particles is 1nm to 3 nm. When light is irradiated, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the blue quantum dot particles emit blue light.

The quantum dot particles can be synthesized by a wet chemical process (wet chemical process), a metal organic chemical vapor deposition process, or a molecular beam epitaxy process. The wet chemical process is a method of growing particles by adding a precursor substance to an organic solvent. Since the organic solvent naturally coordinates to the surface of the quantum dot crystal and functions as a dispersant to regulate the crystal growth during crystal growth, the growth of nanoparticles can be controlled by a process that is easier and cheaper than vapor deposition methods such as Metal Organic Chemical Vapor Deposition (MOCVD) or Molecular Beam Epitaxy (MBE).

In a preferred embodiment, the quantum dot particles may be included in an amount of 10 to 80 wt%, preferably 20 to 50 wt%, based on the total weight of the solid components of the photosensitive resin composition. If the content of the quantum dot particles is less than 10%, the luminous efficiency is not good, and if the content of the quantum dot particles exceeds 80%, the content of other components is relatively insufficient, and there is a problem that it is difficult to form a pixel pattern.

< photoinitiator (B) >

The photoinitiator in the photosensitive resin composition is selected from the combination of at least one free radical initiator (B1) and at least one thermal acid generator (B2);

in a preferred embodiment, the free radical initiator is one or more of aromatic ketone, benzoin and benzoin alkyl ethers, anthraquinones, oxime esters, bisimidazoles, pyrazolines, triazines, triphenylamines, coumarins, thioxanthones and acridine photoinitiators. The free radical initiators have faster corresponding effects of photo initiation, and are matched with a cationic initiator for use, so that the curing performance of the thick film is improved.

Preferably, the aromatic ketone photoinitiator includes, but is not limited to, acetophenone, 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-2-phenylacetophenone, 1-dichloroacetophenone, benzophenone, 4-benzoyldiphenyl sulfide, 4-benzoyl-4 '-methylbenzophenone sulfide, 4-benzoyl-4' -ethyldiphenyl sulfide, 4-benzoyl-4 '-propyldiphenyl sulfide, 4' -bis (diethylamino) benzophenone, 4-p-tolylmercapto benzophenone, 2,4, 6-trimethylbenzophenone, 4-methylbenzophenone, 4 '-bis (dimethylamino) benzophenone, 4' -bis (methylamino), 2 '-bis (methyl, 2-methoxy-methyl, 4-methyl-diphenyl sulfide, 4' -bis (dimethylamino) benzophenone, 2 '-methyl-diphenyl sulfide, 4' -methyl-diphenyl sulfide, ethylamino) benzophenone, acetophenone dimethyl ketal, benzil dimethyl ketal, α '-dimethylbenzyl ketal, α' -diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropanone, 1-hydroxycyclohexyl benzophenone, 2-hydroxy-2-methyl-1-p-hydroxyethyl etheryl phenylpropanone, 2-methyl 1- (4-methylthiophenyl) -2-morpholine 1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) 1-butanone, phenylbis (2,4, 6-trimethylbenzoyl) phosphine oxide, 2,4,6 (trimethylbenzoyl) diphenylphosphine oxide, 2-hydroxy-1- {3- [4- (2-hydroxy-2-morpholinyl) phosphine oxide -methyl-propionyl) -phenyl ] -1,1, 3-trimethyl-inden-5-yl } -2-methylacetone, 2-hydroxy-1- {1- [4- (2-hydroxy-2-methyl-propionyl) -phenyl ] -1,3, 3-trimethyl-inden-5-yl } -2-methylacetone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone or 4-p-tolylmercaptobenzophenone.

Preferably, the benzoin and benzoin alkyl ether photoinitiators include, but are not limited to, benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether, or α, α' -dimethyl benzil ketal.

Preferably, the anthraquinone-based photoinitiator includes, but is not limited to, 2-phenylanthraquinone, 2, 3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone, 2, 3-dimethylanthraquinone, 2-ethylanthraquinone-9, 10-diethyl ester, 1,2, 3-trimethylanthracene-9, 10-dioctyl ester, 2-ethylanthraene-9, 10-bis (4-chlorobutyric acid methyl ester), 2- {3- [ (3-ethyloxetan-3-yl) methoxy ] -3-oxopropyl } anthracene-9, 10-diethyl ester, 9, 10-dibutoxyanthracene, 9, 10-diethoxy-2-ethylanthracene, 9, 10-bis (3-chloropropoxy) anthracene, 9, 10-bis (2-hydroxyethylmercapto) anthracene or 9, 10-bis (3-hydroxy-1-propylmercapto) anthracene;

preferably, the oxime ester photoinitiator is 1- (4-thiophenylphenyl) -n-octane-1, 2-dione-2-oxime benzoate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -ethane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -butane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -propane-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -1-ethyl-carbazol -cyclohexyl-methano-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-dione-2-oxime benzoate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propan-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1, 2-dione-2-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (4-benzoyldiphenyl sulfide) -3- (cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) -one-oxime (3-cyclopentyl) -propane-1, 2-dione-2-o-methylbenzoic acid oxime ester, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- (4-thenoyl-diphenylsulfide-4' -yl) -3-cyclopentyl-propane-1-one-acetic acid oxime ester, 1- (4-benzoyldiphenylsulfide) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-nitro-9-ethylcarbazol-3-yl) -3-cyclohexyl-propane-1-one-acetic acid oxime ester, and salts thereof, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (6-furfurylcarbazol-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime acetate, 1, 4-diphenylpropane-1, 3-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-3-oxime benzoate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, oxime, 2- [ (benzoyloxy) imino ] -1-phenylpropan-1-one, 1-phenyl-1, 2-propanedione-2- (oxoacetyl) oxime, 1- (4-phenylthiophenyl) -2- (2-methylphenyl) -ethane-1, 2-dione-2-oxime acetate, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- {4- [4- (thiophene-2-formyl) phenylthiophenyl ] phenyl } -3-cyclopentylpropan-1, 2-dione-2-oxime acetate, and pharmaceutically acceptable salts thereof, 1- [9, 9-dibutyl-2-yl ] -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- [6- (2-benzoyloxyimino) -3-cyclohexylpropyl-9-ethylcarbazol-3-yl ] octane-1, 2-dione-2-oxime benzoate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -3-cyclopentyl-propane-1-one-oxime benzoate, methyl acetate, ethyl acetate, 1- [7- (2-methylbenzoyl) -9, 9-dibutylfluoren-2-yl ] -3-cyclohexylpropane-1, 2-dione-2-acetoxime or 1- [6- (furan-2-formyl) -9-ethylcarbazol-3-yl ] -3-cyclohexylpropane-1, 2-dione-2-ethoxycarbonyloxime ester.

Preferably, bisimidazole photoinitiators include, but are not limited to, 2 '-bis (o-chlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole, 2', 5-tris (o-chlorophenyl) -4- (3, 4-dimethoxyphenyl) -4 ', 5' -diphenyl-1, 1 '-diimidazole, 2', 5-tris (2-fluorophenyl) -4- (3, 4-dimethoxyphenyl) -4 ', 5' -diphenyl-diimidazole, 2 '-bis (2, 4-dichlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole, 2' -bis (2-fluorophenyl) -4- (o-chlorophenyl) -5- (3, 4-dimethoxyphenyl) -4 ', 5 ' -diphenyl-diimidazole, 2 ' -bis (2-fluorophenyl) -4, 4', 5,5 ' -tetraphenyl-diimidazole, 2 ' -bis (2-methoxyphenyl) -4, 4', 5,5 ' -tetraphenyl-diimidazole, 2 ' -bis (2-chloro-5-nitrophenyl) -4, 4' -bis (3, 4-dimethoxyphenyl) -5,5 ' -bis (o-chlorophenyl) -diimidazole, 2 ' -bis (2-chloro-5-nitrophenyl) -4- (3, 4-dimethoxyphenyl) -5- (o-chlorophenyl) -4 ', 5 ' -diphenyl-diimidazole, 2 ' -bis (2, 4-dichlorophenyl) -4, 4' -bis (3, 4-dimethoxyphenyl) -5,5 ' -bis (o-chlorophenyl) -diimidazole, 2- (2, 4-dichlorophenyl) -4- (3, 4-dimethoxyphenyl) -2 ', 5-bis (o-chlorophenyl) -4 ', 5' -diphenyl-diimidazole, 2- (2, 4-dichlorophenyl) -2 '- (o-chlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole or 2, 2' -bis (2, 4-dichlorophenyl) -4, 4', 5, 5' -tetraphenyl-diimidazole.

Preferably, the pyrazoline photoinitiator is 1-phenyl-3- (4-tert-butylstyrene) -5- (4-tert-butylphenyl) pyrazoline, 1-phenyl-3-biphenyl-5- (4-tert-butylphenyl) pyrazoline, ethoxylated (9) trimethylolpropane pyrazoline ester, ethoxylated (10) bisphenol A pyrazoline ester, and the like;

preferably, triazine photoinitiators include, but are not limited to, 2- (4-ethylbiphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 2- (3, 4-methyleneoxyphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 1,1,1,3,3, 3-hexafluoroisopropyl-3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoate, ethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, ethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoate, 2-ethoxyethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, cyclohexyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, 3- { chloro-4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanamide, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, and the like, 2, 4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2, 4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl) -1, 3-butadienyl-s-triazine or 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine.

Preferably, the triphenylamine-based photoinitiator is N, N-bis- [4- (2-styryl-1-yl) -phenyl ] -N, N-bis (2-ethyl-6-methylphenyl) -1, 1-bisphenyl-4, 4-diamine, N-bis- [4- (2-styryl-1-yl) -4' -methylphenyl ] -N, N-bis (2-ethyl-6-methylphenyl) -1, 1-bisphenyl-4, 4-diamine, and the like;

preferably, the coumarin-based photoinitiator includes, but is not limited to, 3 '-carbonylbis (7-diethylaminocoumarin), 3-benzoyl-7-diethylaminocoumarin, 3' -carbonylbis (7-methoxycoumarin), 7-diethylamino-4-methylcoumarin, 3- (2-benzothiazole) -7- (diethylamino) coumarin, 7- (diethylamino) -4-methyl-2H-1-benzopyran-2-one [7- (diethylamino) -4-methylcoumarin ], or 3-benzoyl-7-methoxycoumarin.

Preferably, the thioxanthone-based photoinitiator includes, but is not limited to, thioxanthone, 2, 4-dimethylthioxanthone, 2, 4-diethylthioxanthone, 2, 4-diisopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone, or diisopropylthioxanthone.

Preferably, acridine photoinitiators include, but are not limited to, 9-phenylacridine, 9-p-methylphenylacridine, 9-m-methylphenylacridine, 9-o-chlorophenylacridine, 9-o-fluorophenylacridine, 1, 7-bis (9-acridinyl) heptane, 9-ethylaccridine, 9- (4-bromophenyl) acridine, 9- (3-chlorophenyl) acridine, 1, 7-bis (9-acridine) heptane, 1, 5-bis (9-acridinopentane), or 1, 3-bis (9-acridine) propane.

As the radical photoinitiator (B1), from the viewpoint of achieving a better deep curing effect, it is preferable to use a long-wavelength oxime ester photoinitiator, acylphosphine oxide, or arylketone, aminobenzoic acid, and aliphatic amine in combination with other radical initiators.

The thermal acid generator (B2) is not particularly limited as long as it is a compound capable of generating an acid by the action of heat, and is preferably a double salt of an onium salt which releases a lewis acid by the action of heat, or a derivative thereof, and a cured product obtained by curing a resin composition using the same has a higher heat resistance.

In a preferred embodiment, the thermal acid generator has the structure of formula I, formula II or formula III:

in the general formula I, the compound is shown in the specification,

cation [ A ]]^m+Preference is given to onium which liberates Lewis acid under the action of heat, preferably the cation [ A ]]^m+Represents [ (R)₀)_aQ]^m+Wherein R is₀Is an organic group having 1 to 60 carbon atoms, a is an integer of 1 to 5, a is R₀Each is the same or different; preferably a R₀At least one of them is an organic group containing an aromatic ring, which is advantageous for further improving the curability of the composition; q is S, N, Se, Te, P, As, Sb, Bi, O, I, Br, Cl, F, or N ═ N, and the valency of Q is denoted As Q, m ═ a-Q, where N ═ N is calculated by the valency of 0;

anion [ B ]]^m-Preferably a halide complex, which is advantageous in improving the curing properties of the composition. Preferably, the anion [ B ]]^m-Is [ LX_b]^m-、[LX_b-1(OH)]^m-、(ClO₄)^-、(CF₃SO₃)^-、(FSO₃)^-Toluene sulfonic acid anion, trinitrobenzene sulfonic acid anion, camphor sulfonic acid salt, nonafluorobutane sulfonic acid salt, hexadecafluorooctane sulfonic acid salt, tetraarylborate or tetrakis (pentafluoro)Phenyl) borate;

l is a metal or semimetal which is the central atom of the halide complex, preferably L is B, P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn or Co, X is a halogen atom or pentafluorophenyl, B is an integer from 3 to 7, and the valency of L is represented As P, m ═ B-P. As anions of the above formula [ LX_b]^m-Specific examples of (3) include tetrakis (pentafluorophenyl) borate [ (C)₆F₅)₄B]^-Tetrafluoroborate (BF)₄)^-Hexafluorophosphate (PF)₆)^-Hexafluoroantimonate (SbF)₆)^-Hexafluoroarsenate (AsF)₆)^-Hexachloroantimonate (SbCl)₆)^-And the like.

[LX_b-1(OH)]^m-The meaning of L, X, b is the same as described above. Preferably, [ LX_b]^m-Is [ (C)₆F₅)₄B]^-、(BF₄)^-、(PF₆)^-、(SbF₆)^-、(AsF₆)^-Or (SbCl)₆)^-(ii) a Preferably, [ LX_b-1(OH)]^m-Is (BF)₃(OH))^-、(PF₅(OH))^-、(SbF₅(OH))^-、(AsF₅(OH))^-Or (SbCl)₅(OH))^-。

The thermal acid generator preferably has the general formula II in view of good curability of the resin and high heat resistance of the cured product

Or of the formula III

The structure is as follows:

in the above-mentioned general formula II, the,

R₁and R₂Each independently represents C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀Aralkyl group of (2), the alkyl group, aromatic groupThe hydrogen atom of the aralkyl group may be independently substituted by a hydroxyl group, a halogen group, C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic groups, nitro groups, sulfonic acid groups or cyano groups, or, R₁And R₂Can pass through C₂-C₇The alkyl chain of (a) constitutes a ring structure;

R₃and R₄Each independently represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

An^q’-represents an anion of valence q ', q ' represents 1 or 2, and p ' represents a coefficient for keeping the charge neutral;

in the above-mentioned general formula III,

R₅represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

R₆represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Or C is an aromatic group₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

R₇is represented by C₁-C₁₀And methylene in the alkyl group may be optionally substituted by-O-or-S-, or hydrogen in the alkyl group may be substituted by halogenSubstituted;

An^q”-represents an anion of q "valence, q" represents 1 or 2, and p "represents a coefficient for keeping the charge neutral.

In the compounds represented by the above general formulae II and III, examples of the halogen atom include fluorine, chlorine, bromine, iodine, and the like; examples of the alkyl group of 1 to 10 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, an isobutyl group, a pentyl group, an isopentyl group, a tert-pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, an octyl group, a nonyl group, an ethyloctyl group, a 2-methoxyethyl group, a 3-methoxypropyl group, a 4-methoxybutyl group, a 2-butoxyethyl group, a methoxyethoxyethyl group, a 3-methoxybutyl group, a 2-methylthioethyl group, a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a chloromethyl group, a dichloromethyl group, a trichloromethyl group, a bromomethyl group, a dibromomethyl group, a tribromomethyl group, a difluoroethyl group, a trichloroethyl group, a dichlorodifluoroethyl group, a pentafluoroethyl group, a, 2-epoxyethyl, methoxyethyl, methoxyethoxymethyl, methylthiomethyl, ethoxyethyl, butoxymethyl, t-butylthiomethyl, 4-pentenyloxymethyl, trichloroethoxymethyl, bis (2-chloroethoxy) methyl, methoxycyclohexyl, 1- (2-chloroethoxy) ethyl, 1-methyl-1-methoxyethyl, ethyldithioethyl, trimethylsilylethyl, t-butyldimethylsilyloxymethyl, 2- (trimethylsilyl) ethoxymethyl, t-butoxycarbonylmethyl, ethyloxycarbonylmethyl, ethylcarbonylmethyl, t-butoxycarbonylmethyl, acryloyloxyethyl, methacryloyloxyethyl, 2-methyl-2-adamantyloxycarbonylmethyl, Acetyl ethyl, 2-methoxy-1-propenyl, hydroxymethyl, 2-hydroxyethyl, 1-hydroxyethyl, 2-hydroxypropyl, 3-hydroxybutyl, 4-hydroxybutyl, 1, 2-dihydroxyethyl and the like, and methylene groups in the alkyl groups may be substituted with-O-, -CO-, -OCO-, -COO-, -C ═ C-, -NHCO-, -NH-or-CONH-; c₆-C₂₀Examples of the aromatic group of (b) include phenyl, naphthyl, anthryl and the like; c₇-C₃₀As the aralkyl group in (2), an aralkyl group in which an alkyl group having 1 to 10 carbon atoms and an aromatic group having 6 to 20 carbon atoms described above are combined can be used.

In order to further improve the acid releasing ability of the thermal acid generator under the thermal condition, improve the curing performance of the composition, and simultaneously improve the overall performance such as the thermal stability of the cured resin, in a preferred embodiment, p' An in the general formula II^q’-And p' An in the formula III^q”-Each independently represents a methanesulfonic acid anion, a dodecylsulfonic acid anion, a benzenesulfonic acid anion, a toluenesulfonic acid anion, a trifluoromethanesulfonic acid anion, a naphthalenesulfonic acid anion, a diphenylamine-4-sulfonic acid anion, a 2-amino-4-methyl-5-chlorobenzenesulfonic acid anion, a 2-amino-5-nitrobenzenesulfonic acid anion, Japanese patent application laid-open No. 10-235999, Japanese patent application laid-open No. 10-337959, Japanese patent application laid-open No. 11-102088, Japanese patent application laid-open No. 2000-108510, Japanese patent application laid-open No. 2000-168233, Japanese patent application laid-open No. 2001-962099, Japanese patent application laid-open No. 2001-322354, Japanese patent application laid-open No. 2006-248180, Japanese patent application laid-open No. 2006-297907, Japanese patent application laid-open No. 8-253705, Organic sulfonic acid anions such as sulfonic acid anions described in, for example, JP-A-2004-503379, JP-A-2005-336150 and International publication No. 2006/28006, chloride ions, bromide ions, iodide ions, fluoride ions, chlorate ions, thiocyanate ions, perchlorate ions, hexafluorophosphate ions and hexafluoroantimonate ions, tetrafluoroborate ion, octylphosphate ion, dodecylphosphate ion, octadecylphosphate ion, phenylphosphate ion, nonylphenylphosphate ion, 2' -methylenebis (4, 6-di-t-butylphenyl) phosphonate ion, tetrakis (pentafluorophenyl) borate ion, quencher anion having a function of deactivating an active molecule in an excited state, and metallocene compound anion such as ferrocene or ruthenocene having an anionic group such as a carboxyl group, a phosphonic acid group, or a sulfonic acid group on a cyclopentadienyl ring. Among them, hexafluorophosphate ion, hexafluoroantimonate ion and tetrakis (pentafluorophenyl) borate ion are preferable from the viewpoint of high heat resistance.

More preferably, the thermal acid generator is selected from one or more of the following compounds:

alternatively, commercially available products which can be preferably used as the thermal acid generator (B2) used in the self-luminous resin composition of the present invention include SAN-AID SI-B2A, SAN-AIDSI-B3A, SAN-AIDSI-B3, SAN-AID SI-B4, SAN-AID SI-60, SAN-AID SI-80, SAN-AID SI-100, SAN-AID SI-110 and SAN-AID SI-150, all of which are available from Sanxin chemical industries. These may be used alone in 1 kind or in combination of 2 or more kinds.

The temperature range in which the thermal acid generator (B2) used in the resin composition of the present invention generates an acid by the action of heat to cure the resin composition is not particularly limited, but is preferably 50 to 250 ℃, more preferably 100 to 220 ℃, further preferably 130 to 200 ℃, and further preferably 150 to 180 ℃ from the viewpoint of obtaining a cured product having excellent heat resistance and from the viewpoint of good thermal stability in the process.

The amount of the photoinitiator (B) in the photosensitive resin composition is 1 to 20 parts by mass, preferably 1 to 10 parts by mass, per 100 parts by mass of the photosensitive resin composition. The mass ratio of the radical initiator (B1) to the thermal acid generator (B2) is preferably 0.2 to 5:1, preferably 0.5 to 3:1, from the viewpoint of curing speed and synergistic effect when used in combination.

< photopolymerizable Compound (C) >

The photopolymerizable compound (C) in the above-mentioned spontaneous photosensitive resin composition of the present invention is not particularly limited as long as it is based on an active radical generated by the photoinitiator (B) upon irradiation with light or a compound generating an acid to initiate polymerization. In a preferred embodiment, the photopolymerizable compound is a compound (C1) having a polymerizable ethylenically unsaturated bond and/or an epoxy compound (C2). The weight average molecular weight of the photopolymerizable compound (C) is preferably 3000 or less. The photopolymerizable compound is preferably used to improve the adhesiveness, stability, etc. of the spontaneous photosensitive resin composition.

Preferably, the compound (C1) having a polymerizable ethylenically unsaturated bond is a photopolymerizable compound having at least 3 ethylenically unsaturated bonds, and is preferably trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol octa (meth) acrylate, tripentaerythritol hepta (meth) acrylate, tetrapentaerythritol deca (meth) acrylate, tetrapentaerythritol nona (meth) acrylate, tris (2- (meth) acryloyloxyethyl) isocyanurate, ethylene glycol-modified pentaerythritol tetra (meth) acrylate, ethylene glycol-modified dipentaerythritol hexa (meth) acrylate, propylene glycol-modified pentaerythritol tetra (meth) acrylate, or mixtures thereof, One or more of propylene glycol modified dipentaerythritol hexa (meth) acrylate, caprolactone modified pentaerythritol tetra (meth) acrylate, and caprolactone modified dipentaerythritol hexa (meth) acrylate.

Preferably, the epoxy compound (C2) is an epoxy compound of C3-C20 and/or an oxetane compound of C4-C20.

The above epoxy compound of C3 to C20 may be a monofunctional or polyfunctional epoxy compound.

Examples of the monofunctional epoxy compound include phenyl glycidyl ether, p-tert-butylphenyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, allyl glycidyl ether, 1, 2-epoxybutane, epoxybutene, 1, 2-epoxydodecane, epichlorohydrin, 1, 2-epoxydecane, styrene oxide, epoxycyclohexane, 3-methacryloxymethylcyclohexane, 3-acryloxymethylcyclohexane and 3-vinylepoxycyclohexane.

Examples of the polyfunctional epoxy compound include bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, brominated bisphenol A diglycidyl ether, brominated bisphenol F diglycidyl ether, brominated bisphenol S diglycidyl ether, epoxy novolac resin, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, hydrogenated bisphenol S diglycidyl ether, 3, 4-epoxycyclohexylmethyl-3 ',4' -epoxycyclohexanecarboxylate, 2- (3, 4-epoxycyclohexyl-5, 5-spiro-3, 4-epoxy) cyclohexane-1, 3-dioxane, bis (3, 4-epoxycyclohexylmethyl) adipate, vinylcyclohexane, 4-vinylcyclohexane, bisphenol A diglycidyl ether, brominated bisphenol S diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, 3, 4-epoxycyclohexylmethyl-3 ',4' -epoxycyclohexanecarboxylate, 2- (3, 4-epoxycyclohexyl-5, 5-spiro-3, 4-epoxy) cyclohexane-1, 3, Bis (3, 4-epoxy-6-methylcyclohexylmethyl) adipate, 3, 4-epoxy-6-methylcyclohexyl-3 ',4' -epoxy-6 ' -methylcyclohexaneformate, methylenebis (3, 4-epoxycyclohexane), dicyclopentadiene dioxide, ethylene glycol di (3, 4-epoxycyclohexylmethyl) ether, dioctyl epoxyhexahydrophthalate, di-2-ethylhexyl epoxyhexahydrophthalate, 1, 4-butanediol diglycidyl ether, 1, 6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, 1, 3-tetradecadiene dioxide, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, 1, 3-tetradecadiene dioxide, polyethylene, Limonene dioxide, 1,2,7, 8-diepoxyoctane and 1,2,5, 6-diepoxyoctane.

Among these epoxy compounds (C2), aromatic epoxides and alicyclic epoxides are preferable, and alicyclic epoxides are particularly preferable, from the viewpoint of curing speed.

Examples of the C4-C20 oxetane compound include compounds having 1 to 6 oxetane rings.

Examples of the compound having 1 oxetane ring include 3-ethyl-3-hydroxymethyloxetane, 3- (methyl) allyloxymethyl-3-ethyloxetane, (3-ethyl-3-oxetanylmethoxy) methylbenzene, 4-fluoro- [1- (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, 4-methoxy- [1- (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, [1- (3-ethyl-3-oxetanylmethoxy) ethyl ] phenyl ether, isobutoxymethyl (3-ethyl-3-oxetanylmethyl) ether, and mixtures thereof, Isobornyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, isobornyl (3-ethyl-3-oxetanylmethyl) ether, 2-ethylhexyl (3-ethyl-3-oxetanylmethyl) ether, ethyldiethylene glycol (3-ethyl-3-oxetanylmethyl) ether, dicyclopentadiene (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyl (3-ethyl-3-oxetanylmethyl) ether, tetrahydrofurfuryl (3-ethyl-3-oxetanylmethyl) ether, tetrabromolyl (3-ethyl-3-oxetanylmethyl) ether, 2-tetrabromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether, tribromophenyl (3-ethyl-3-oxetanylmethyl) ether, 2-tribromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether, 2-hydroxyethyl (3-ethyl-3-oxetanylmethyl) ether, 2-hydroxypropyl (3-ethyl-3-oxetanylmethyl) ether, butoxyethyl (3-ethyl-3-oxetanylmethyl) ether, pentachlorophenyl (3-ethyl-3-oxetanylmethyl) ether, pentabromophenyl (3-ethyl-3-oxetanylmethyl) ether and bornyl (3-ethyl-3-oxetanylmethyl) ether.

Examples of the compound having 2 to 6 oxetane rings include 3, 7-bis (3-oxetanyl) -5-oxa-nonane, 3' - (1,3- (2-methylene) propanediyl bis (oxymethylene)) bis (3-ethyloxetane), 1, 4-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, 1, 2-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] ethane, 1, 3-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenylbis (3-ethyl-3-oxetanylmethyl) ether, and mixtures thereof, Triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tricyclodecanediylmethylene (3-ethyl-3-oxetanylmethyl) ether, trimethylolpropane tris (3-ethyl-3-oxetanylmethyl) ether, 1, 4-bis (3-ethyl-3-oxetanylmethoxy) butane, 1, 6-bis (3-ethyl-3-oxetanylmethoxy) hexane, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, polyethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, polyethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, Dipentaerythritol hexa (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol penta (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol tetra (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol hexa (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol penta (3-ethyl-3-oxetanylmethyl) ether, ditrimethylolpropane tetra (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, di-n-butyl-ethyl-3-ethylmethyl ether, di, EO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, and EO-modified bisphenol F (3-ethyl-3-oxetanylmethyl) ether.

Among them, compounds having 1 to 2 oxetane rings are preferable in view of curing speed.

The amount of component (C) in the photosensitive resin composition is 5 to 70 parts by mass, preferably 10 to 60 parts by mass, in 100 parts by mass of the photosensitive resin composition. Within this range, the pixel pattern is easily formed, and the pattern can be prevented from peeling off.

< alkali-soluble resin (D) >

The alkali-soluble resin (D) of the present invention is not particularly limited, and a more preferable type can be selected from the viewpoints of heat resistance, developability, and acquisition properties. In a preferred embodiment, the alkali-soluble resin (D) of the present invention is an alkali-soluble resin having an acid group such as a carboxyl group or a phenolic hydroxyl group. Further preferred are alkali-soluble resins of carboxyl group-containing copolymers, and particularly preferred are copolymers of an ethylenically unsaturated monomer having 1 or more carboxyl groups [ hereinafter referred to as "carboxyl group-containing unsaturated monomer" (P) ] and other copolymerizable ethylenically unsaturated monomer [ hereinafter referred to as "copolymerizable unsaturated monomer" (Q) ] [ hereinafter referred to as "carboxyl group-containing copolymer" (R) ].

In a preferred embodiment, the carboxyl group-containing unsaturated monomer (P) includes the following compounds: unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α -chloroacrylic acid, cinnamic acid, etc.; unsaturated dicarboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic anhydride, citraconic acid, citraconic anhydride, and mesaconic acid, or anhydrides thereof; three or more membered unsaturated polycarboxylic acids or anhydrides thereof; mono [ (meth) acryloyloxyalkyl ] esters of dibasic or higher polycarboxylic acids such as succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl) and phthalic acid mono (2-methacryloyloxyethyl); and mono (meth) acrylates of polymers having carboxyl groups and hydroxyl groups at both ends, such as ω -carboxy polycaprolactone monoacrylate and ω -carboxy polycaprolactone monomethacrylate. These carboxyl group-containing unsaturated monomers may be used alone or in combination of two or more.

In a preferred embodiment, examples of the copolymerizable unsaturated monomer (Q) include aromatic vinyl compounds such as styrene, α -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, and the like; unsaturated carboxylic acid glycidyl esters such as indene-based glycidyl acrylates and glycidyl methacrylates, e.g., indene and 1-methylindene; vinyl carboxylates such as vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl benzoate; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α -chloroacrylonitrile, and vinylidene cyanide; unsaturated amides such as acrylamide, methacrylamide, α -chloroacrylamide, N-2-hydroxyethylacrylamide, and N-2-hydroxyethylmethacrylamide; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; aliphatic conjugated dienes such as 1, 3-butadiene, isoprene and chloroprene; macromonomers having a monoacryloyl group or a monomethacryloyl group at the end of a polymer molecular chain of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane, or the like. These copolymerizable unsaturated monomers may be used alone or in combination of two or more.

The carboxyl group-containing copolymer [ hereinafter referred to as "carboxyl group-containing copolymer" (R) ] preferred in the present invention is obtained by polymerizing (P) and (Q). Wherein (P) is a carboxyl group-containing unsaturated monomer component containing acrylic acid and/or methacrylic acid as an essential component and further containing at least 1 compound selected from the group consisting of succinic acid mono (2-acryloyloxyethyl group), succinic acid mono (2-methacryloyloxyethyl group), ω -carboxy polycaprolactone monoacrylate and ω -carboxy polycaprolactone monomethacrylate, and the like, as the case may be; wherein (Q) is at least 1 monomer selected from the group consisting of styrene, methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, N-phenylmaleimide, polystyrene macromonomer and polymethyl methacrylate macromonomer.

More preferably, specific examples of the carboxyl group-containing copolymer (R) include (meth) acrylic acid/methyl (meth) acrylate copolymer, (meth) acrylic acid/benzyl (meth) acrylate copolymer, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate copolymer, (meth) acrylic acid/methyl (meth) acrylate/polystyrene macromonomer copolymer, (meth) acrylic acid/methyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, (meth) acrylic acid/benzyl (meth) acrylate/polystyrene macromonomer copolymer, (meth) acrylic acid/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, and the like, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polystyrene macromonomer copolymer, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, methacrylic acid/styrene/benzyl (meth) acrylate/N-phenylmaleimide copolymer, (meth) acrylic acid/succinic acid mono [2- (meth) acryloyloxyethyl ]/styrene/(meth) acrylic acid allyl/N-phenylmaleimide copolymer Carboxyl group-containing copolymers such as a copolymer of (meth) acrylic acid/styrene/(meth) acrylic acid benzyl ester/glycerin mono (meth) acrylate/N-phenylmaleimide, a copolymer of (meth) acrylic acid/ω -carboxypolycaprolactone mono (meth) acrylate/styrene/(meth) acrylic acid benzyl ester/glycerin mono (meth) acrylate/N-phenylmaleimide, and the like, and substituents present in the molecule may be modified with other materials.

In the present invention, the alkali-soluble resin (D) may be used alone or in combination of two or more.

From the viewpoints of developability, liquid viscosity, and the like, the alkali-soluble resin is preferably a polymer having a weight average molecular weight (polystyrene equivalent value measured by GPC method) of 1000-200000, more preferably 2000-100000, and most preferably 5000-50000.

In particular, alkali-soluble resins disclosed in patent publication nos. CN106554459A and CN106397660A are preferred.

The amount of component (D) in the photosensitive resin composition is 5 to 80 parts by mass, preferably 10 to 70 parts by mass, in 100 parts by mass of the photosensitive resin composition. Within this range, the solubility in a developer is sufficient, a pattern can be easily formed, and the film of the pixel portion in the exposed region can be prevented from being reduced, so that the non-pixel portion can be favorably exfoliated.

< other optional additives >

Other auxiliaries commonly used in the art, including organic solvents, organic carboxylic acids, pigment dispersants, adhesion enhancers, leveling agents, development improvers, antioxidants, thermal polymerization inhibitors, and the like, may also be optionally added to the photosensitive resin composition of the present invention. In addition, a surfactant, a fluorescent whitening agent, a plasticizer, a flame retardant, an ultraviolet absorber, a foaming agent, a bactericide, an antistatic agent, a magnetic substance, a conductive material, an antifungal or antibacterial material, a porous adsorbent, a fragrant material, or the like may be added according to the use.

Illustratively, the organic solvent is not particularly limited as long as it can dissolve the aforementioned components, and may include, for example: glycol ether solvents, alcohol solvents, ester solvents, ketone solvents, amide solvents, chlorine-containing solvents, and the like. The selection is preferably made in consideration of, in particular, the solubility of the colorant and the alkali-soluble resin, coatability, safety, and the like. Preferred are ethyl cellosolve (ethylene glycol monoethyl ether), methyl cellosolve (ethylene glycol monomethyl ether), butyl cellosolve (ethylene glycol monobutyl ether), methyl methoxybutanol (3-methyl-3-methoxybutanol), butyl carbitol (diethylene glycol monobutyl ether), ethylene glycol monoethyl ether acetate, ethylene glycol mono-t-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy-2-propanol), propylene glycol monoethyl ether acetate, ethyl acetate, n-butyl acetate, isobutyl acetate, cellosolve acetate (ethylene glycol monomethyl ether acetate), methoxybutyl acetate (3-methoxybutyl acetate), 3-methyl-3-methoxybutyl acetate, methoxybutyl acetate, Ethyl 3-ethoxypropionate (EEP), methyl lactate, ethyl lactate, propyl lactate, butyl lactate, 2-butanone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone, cyclopentanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), isophorone (3,5, 5-trimethyl-2-cyclohexen-1-one), diisobutyl ketone (2, 6-dimethyl-4-heptanone), N-methylpyrrolidone (4-methylaminolactam or NMP), methanol, ethanol, isopropanol, N-propanol, isobutanol, N-butanol, and the like. These solvents are used alone, or in combination of two or more thereof.

Illustratively, the kind of the organic carboxylic acid is not particularly limited, and may include, for example: aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethylacetic acid, heptanoic acid, and octanoic acid; aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassylic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, and citraconic acid; aliphatic tricarboxylic acids such as 1,2, 3-propanetricarboxylic acid, aconitic acid, norbornanetricarboxylic acid, etc.; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, 2, 3-dimethylbenzoic acid and 3, 5-dimethylbenzoic acid; aromatic polycarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, 1,2,3, 5-benzenetetracarboxylic acid, and 1,2,4, 5-benzenetetracarboxylic acid; and other carboxylic acids such as phenylacetic acid, hydroatropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, and umbellic acid. These organic carboxylic acids are used alone or in combination of two or more thereof.

Illustratively, the kind of the dispersant is not particularly limited, and may include, for example: examples of the polymer dispersant include polyamidoamine and salts thereof, polycarboxylic acid and salts thereof, high-molecular-weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (meth) acrylic acid copolymer, and naphthalenesulfonic acid-formaldehyde condensate, and also include polyoxyethylene alkyl phosphate, polyoxyethylene alkylamine, alkanolamine, and pigment derivatives. These dispersants are used alone, or in combination of two or more thereof.

Illustratively, the kind of the adhesion enhancer is not particularly limited, and may include, for example: vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyldimethoxysilane, 2- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-isocyanatopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, N- (2-methoxyethoxy) -3-aminopropyltrimethoxysilane, 3-glycidyloxypropyltrimethoxysilane, vinyltrimethoxysilane, 3, 3-isocyanatopropyltriethoxysilane, and the like. These adhesion enhancers may be used alone, or in combination of two or more thereof.

Illustratively, thermal polymerization inhibitors may include, for example: p-methoxyphenol, hydroquinone, catechol, t-butylcatechol, phenothiazine, p-methoxyphenol, and the like. These thermal polymerization inhibitors are used alone or in combination of two or more thereof.

Illustratively, the kind of the surfactant is not particularly limited, and may include, for example: a fluorine surfactant, a silicon surfactant, or a mixture thereof. These surfactants are used alone, or in combination of two or more thereof.

Illustratively, the kind of the plasticizer is not particularly limited, and may include, for example: dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerol, and the like. These plasticizers are used alone, or in combination of two or more thereof.

According to another aspect of the present invention, there is also provided a color filter prepared from the self-luminous photosensitive resin composition. Specifically, when the color filter of the present invention is applied to an image display device, light is emitted by light from a light source of the display device, and therefore, more excellent light efficiency can be achieved. Further, since light having a hue is emitted, color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, the viewing angle can be improved.

The color filter includes a substrate and a pattern layer formed on an upper portion of the substrate.

The substrate may be the color filter itself or a portion where the color filter is located in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiO)_x) Or a polymer substrate, and the polymer substrate may be polyether sulfone (PES), Polycarbonate (PC), or the like.

The pattern layer is a layer containing the photosensitive resin composition of the present invention, and may be a layer formed by applying the photosensitive resin composition, and then exposing, developing, and thermally curing the applied layer in accordance with a predetermined pattern.

The pattern layer formed from the photosensitive resin composition comprises a red pattern layer containing red quantum dot particles; a green pattern layer containing green quantum dot particles; and a blue pattern layer containing blue quantum dot particles. When light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light.

In this case, the light emitted from the light source used in the image display device is not particularly limited, but a light source emitting blue light can be preferably used from the viewpoint of more excellent luminance and color reproducibility.

According to another embodiment of the present invention, the pattern layer includes a red pattern layer, a green pattern layer, and a transparent pattern layer without quantum dot particles. In this case, as a light source of the image display device including the pattern layer, a light source emitting blue light can be used. At this time, the red pattern layer emits red light, the green pattern layer emits green light, and the transparent pattern layer is blue light directly transmitted.

The color filter including the substrate and the pattern layer as described above may further include a rib wall formed between the patterns, and may further include a black matrix. In addition, the color filter may further include a protective film formed on the upper portion of the pattern layer of the color filter.

In addition, the invention also provides an image display device comprising the color filter.

The color filter of the present invention can be applied not only to a general liquid crystal display device but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device.

The image display device of the present invention may include a color filter including a red pattern layer containing red quantum dot particles; a green pattern layer containing green quantum dot particles; and a blue pattern layer containing blue quantum dot particles. In this case, the light emitted from the light source used in the image display device is not particularly limited, but a light source emitting blue light can be preferably used in terms of more excellent color reproducibility.

According to still another embodiment of the present invention, an image display device of the present invention may be provided with a color filter including a red pattern layer, a green pattern layer, and a transparent pattern layer not containing quantum dot particles.

In this case, a light source emitting blue light may be used as the light source. In this case, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer is directly transmitted by blue light to exhibit blue color.

The image display device of the present invention has excellent light efficiency, high brightness, excellent color reproducibility and wide viewing angle.

It will be apparent to those skilled in the art that various changes and modifications can be made in the embodiments within the scope of the invention and the technical spirit, and such changes and modifications also fall within the scope of the appended claims.

Examples

(1) Preparation of self-luminous photosensitive resin composition

The self-luminous photosensitive resin composition was prepared by diluting propylene glycol monomethyl ether acetate so that the solid content became 28% by weight and stirring the mixture in the composition (parts by weight) shown in table 1 below.

Table 1:

(2) manufacture of color filter

After the resin compositions of examples and comparative examples were applied on a glass substrate by a spin coating method, the glass substrate was placed on a hot plate and held at a temperature of 100 ℃ for 3 minutes to form a thin film. A test photomask having a 20mm × 20mm square transmission pattern and a 1-100 μm line/space pattern was placed on the thin film, and irradiated with ultraviolet light with a gap of 100 μm between the thin film and the test photomask.

At this time, the light source of the ultraviolet ray was a high-pressure mercury lamp IPCS light source, and the coating film was sufficiently exposed to ultraviolet rays having a wavelength of 365nm through the slit of the mask plate (exposure amount 200 mJ/cm)²) Subsequently, the resultant was immersed in a 2.5% sodium carbonate solution at 25 ℃ for 30 seconds for development, washed with ultrapure water, dried by blowing nitrogen gas, and heated in an oven at 150 ℃ for 10 minutes to fix the pattern, thereby producing a color filter. The film thickness of the self-luminous color pattern obtained by the above was 15 μm.

Evaluation of Performance

(1) Evaluation of whether or not a fine Pattern can be formed

In the color filters manufactured from the compositions of the examples and comparative examples, the width of the pattern obtained through the line/space pattern mask having an opening width of 100 μm was measured using an OM apparatus (ECLIPSELV100POL, NIKON corporation), and the difference between the opening width and the pattern width of the pattern mask was determined, as shown in table 2 below. The smaller the difference between the opening width of the pattern mask and the pattern width, the more minute the pattern can be formed.

If the absolute value of the difference is 20 μm or more, it is difficult to express fine pixels, and if the difference is a negative value, a process failure may be caused.

(2) Measurement of luminescence intensity

In the color filters manufactured from the compositions of the above examples and comparative examples, a pattern portion of 20mm × 20mm was irradiated with light using a 365nm tube type 4WUV irradiator (VL-4LC, vilberlorourmat), and the intensities of light in the wavelength region (640 nm for red quantum dots) and 545nm for green quantum dots) emitted by photoluminescence were measured using a spectrometer (oceanooptics), as shown in table 2 below.

The stronger the measured light intensity is, the more excellent photoluminescence characteristics can be judged to be exhibited.

TABLE 2

(3) Sensitivity (sensitivity)

The resin compositions of examples 1(a), 3(a), 5(a), 7(b) and comparative examples 1(a), 2(a), 3(b), 4(b) were selected and evaluated for sensitivity according to the following procedure, first, the photosensitive resin compositions were coated on glass substrates using 5#, 10#, and 20# wire rods, respectively, and the substrates were heated on a 100 ℃ hot plate for 3min to form thin films having coating thicknesses of about 5 μm, 10 μm, and 20 μm. The substrate on which the coating film was formed was cooled to room temperature, a mask plate was attached, the coating film was exposed to ultraviolet rays having a wavelength of 365nm through the gap of the mask plate with an IPCS light source of a high-pressure mercury lamp, and then developed by dipping in a 2.5% sodium carbonate solution at 25 ℃ for 30 seconds, washed with ultrapure water, dried by blowing nitrogen gas, heated in an oven at 150 ℃ for 10 minutes to fix the pattern, and the resulting pattern was evaluated.

At the time of exposure, the minimum exposure amount at which the residual film ratio after development of the light-irradiated region in the exposure step is 90% or more is evaluated as the exposure demand. The smaller the exposure requirement, the higher the sensitivity, and the specific evaluation results are shown in Table 3.

(4) Adhesion property

Each of the examples and comparative examples for evaluating sensitivity described above was subjected to 200mJ/cm²The radiation energy of (2) was evaluated by a mesh measuring method of 8.5.2 in jis.k5400(1900)8.5 adhesion test method, and the cured coating was cut into 100 meshes in one hundred, and was peeled off after being stuck with a tape, and the number of meshes peeled off was observed to be smaller, indicating that the adhesion to the substrate was better. The adherence was evaluated according to the following evaluation criteria and using four grades:

very good: no net lattice falls off;

o: the number of the mesh grids which are more than 0% and less than or equal to 5% and fall off;

and (delta): the number of the mesh grids falling off is more than 5% and less than or equal to 35%;

x: the number of the mesh grids which fall off is less than or equal to 35% and less than or equal to 100%.

TABLE 3

As can be seen from table 2 above, the above-described embodiment of the present invention achieves the following technical effects: the resin composition of the present invention has a small difference between the width of the opening of the pattern mask and the width of the pattern, can form a fine pattern, and has excellent photoluminescence intensity and high brightness.

As can be seen from the results of Table 3, the resin composition of the present invention requires little increase in energy for curing and is excellent in adhesion to the substrate as the thickness of the coating layer increases, whereas the composition of the comparative example requires much higher energy for curing as the thickness of the coating layer increases, and when deep curing is incomplete, the primer layer is insufficiently cured and the adhesion to the substrate is greatly lowered.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (13)

1. A self-luminous photosensitive resin composition, characterized in that it comprises the following components: the light-emitting diode comprises photoluminescence quantum dot particles, a photoinitiator, a photopolymerizable compound and an alkali-soluble resin, wherein the photoinitiator comprises at least one free radical initiator and at least one thermal acid generator.

2. The self-luminous photosensitive resin composition according to claim 1, wherein the radical initiator is one or more of aromatic ketone, benzoin and benzoin alkyl ethers, anthraquinones, oxime esters, bisimidazoles, pyrazolines, triazines, triphenylamines, coumarins, thioxanthones and acridine photoinitiators;

preferably, the aromatic ketone photoinitiator is acetophenone, 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-2-phenylacetophenone, 1-dichloroacetophenone, benzophenone, 4-benzoyldiphenyl sulfide, 4-benzoyl-4 ' -methylbenzophenone sulfide, 4-benzoyl-4 ' -ethyldiphenyl sulfide, 4-benzoyl-4 ' -propyldiphenyl sulfide, 4' -bis (diethylamino) benzophenone, 4-p-tolylmercapto benzophenone, 2,4, 6-trimethylbenzophenone, 4-methylbenzophenone, 4' -bis (dimethylamino) benzophenone, 4' -bis (methylamino), 4' -bis (methyl, ethyl, phenyl, Ethylamino) benzophenone, acetophenone dimethyl ketal, benzil dimethyl ketal, α '-dimethylbenzyl ketal, α' -diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropanone, 1-hydroxycyclohexyl benzophenone, 2-hydroxy-2-methyl-1-p-hydroxyethyl etheryl phenylpropanone, 2-methyl 1- (4-methylthiophenyl) -2-morpholine 1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) 1-butanone, phenylbis (2,4, 6-trimethylbenzoyl) phosphine oxide, 2,4,6 (trimethylbenzoyl) diphenylphosphine oxide, 2-hydroxy-1- {3- [4- (2-hydroxy-2-morpholinyl) phosphine oxide -methyl-propionyl) -phenyl ] -1,1, 3-trimethyl-inden-5-yl } -2-methyl acetone, 2-hydroxy-1- {1- [4- (2-hydroxy-2-methyl-propionyl) -phenyl ] -1,3, 3-trimethyl-inden-5-yl } -2-methyl acetone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone or 4-p-tolylmercaptobenzophenone;

preferably, the benzoin and benzoin alkyl ether photoinitiators are benzoin methyl ether, benzoin ethyl ether, benzoin phenyl ether or α, α' -dimethyl benzil ketal;

preferably, the anthraquinone-based photoinitiator is 2-phenylanthraquinone, 2, 3-diphenylanthraquinone, 1-chloroanthraquinone, 2-methylanthraquinone, 2, 3-dimethylanthraquinone, 2-ethylanthraquinone-9, 10-diethyl ester, 1,2, 3-trimethylanthracene-9, 10-dioctyl ester, 2-ethylanthraquinone-9, 10-bis (4-chlorobutyric acid methyl ester), 2- {3- [ (3-ethyloxetan-3-yl) methoxy ] -3-oxopropyl } anthracene-9, 10-diethyl ester, 9, 10-dibutoxyanthracene, 9, 10-diethoxy-2-ethylanthracene, 9, 10-bis (3-chloropropoxy) anthracene, 9, 10-bis (2-hydroxyethylmercapto) anthracene or 9, 10-bis (3-hydroxy-1-propylmercapto) anthracene;

preferably, the oxime ester photoinitiator is 1- (4-thiophenylphenyl) -n-octane-1, 2-dione-2-oxime benzoate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl ] -ethane-1-ketone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl ] -butane-1-ketone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl ] -propane-1-ketone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazole-3-yl ] -ethyl-carbazole-3-yl ] -ketone-oxime acetate 1-cyclohexyl-methano-1-one-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1-one-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclopentyl) -propan-1, 2-dione-2-oxime benzoate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propan-1, 2-dione-2-cyclohexanecarboxylate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] - (3-cyclopentyl) -propan-1, 2-dione-2-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime benzoate, 1- (4-benzoyldiphenyl sulfide) - (3-cyclopentylacetone) -1-oxime acetate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) - (3-cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (4-benzoyldiphenyl sulfide) -3- (cyclopentylacetone) -1-oxime cyclohexanecarboxylate, 1- (6-o-methylbenzoyl-9-ethylcarbazole-3-yl) -one-oxime (3-cyclopentyl) -propane-1, 2-dione-2-o-methylbenzoic acid oxime ester, 1- (4-thiophenylphenyl) - (3-cyclopentyl) -propane-1, 2-dione-2-cyclohexanecarboxylic acid oxime ester, 1- (4-thenoyl-diphenylsulfide-4' -yl) -3-cyclopentyl-propane-1-one-acetic acid oxime ester, 1- (4-benzoyldiphenylsulfide) - (3-cyclopentyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-nitro-9-ethylcarbazol-3-yl) -3-cyclohexyl-propane-1-one-acetic acid oxime ester, and salts thereof, 1- (6-o-methylbenzoyl-9-ethylcarbazol-3-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (6-furfurylcarbazol-9-ethylcarbazol-3-yl) - (3-cyclopentylacetone) -1-oxime acetate, 1, 4-diphenylpropane-1, 3-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, 1- (6-furoyl-9-ethylcarbazol-3-yl) - (3-cyclohexylacetone) -1-oxime acetate, 1- (4-phenylthiophenyl) - (3-cyclohexyl) -propane-1, 2-dione-3-oxime benzoate, 1- (6-thenoyl-9-ethylcarbazol-3-yl) - (3-cyclohexyl) -propane-1, 2-dione-2-oxime acetate, oxime, 2- [ (benzoyloxy) imino ] -1-phenylpropan-1-one, 1-phenyl-1, 2-propanedione-2- (oxoacetyl) oxime, 1- (4-phenylthiophenyl) -2- (2-methylphenyl) -ethane-1, 2-dione-2-oxime acetate, 1- (9, 9-dibutyl-7-nitrofluoren-2-yl) -3-cyclohexyl-propan-1-one-oxime acetate, 1- {4- [4- (thiophene-2-formyl) phenylthiophenyl ] phenyl } -3-cyclopentylpropan-1, 2-dione-2-oxime acetate, and pharmaceutically acceptable salts thereof, 1- [9, 9-dibutyl-2-yl ] -3-cyclohexylpropylpropane-1, 2-dione-2-oxime acetate, 1- [6- (2-benzoyloxyimino) -3-cyclohexylpropyl-9-ethylcarbazol-3-yl ] octane-1, 2-dione-2-oxime benzoate, 1- (7-nitro-9, 9-diallylfluoren-2-yl) -1- (2-methylphenyl) methanone-oxime acetate, 1- [6- (2-methylbenzoyl) -9-ethylcarbazol-3-yl ] -3-cyclopentyl-propane-1-one-oxime benzoate, methyl acetate, ethyl acetate, 1- [7- (2-methylbenzoyl) -9, 9-dibutylfluoren-2-yl ] -3-cyclohexylpropane-1, 2-dione-2-acetic acid oxime or 1- [6- (furan-2-formyl) -9-ethylcarbazol-3-yl ] -3-cyclohexylpropane-1, 2-dione-2-ethoxycarbonyloxime ester;

preferably, the bisimidazole photoinitiator is 2,2 '-bis (o-chlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole, 2', 5-tris (o-chlorophenyl) -4- (3, 4-dimethoxyphenyl) -4 ', 5' -diphenyl-1, 1 '-diimidazole, 2', 5-tris (2-fluorophenyl) -4- (3, 4-dimethoxyphenyl) -4 ', 5' -diphenyl-diimidazole, 2 '-bis (2, 4-dichlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole, 2' -bis (2-fluorophenyl) -4- (o-chlorophenyl) -5- (3, 4-dimethoxyphenyl) -4 ', 5 ' -diphenyl-diimidazole, 2 ' -bis (2-fluorophenyl) -4, 4', 5,5 ' -tetraphenyl-diimidazole, 2 ' -bis (2-methoxyphenyl) -4, 4', 5,5 ' -tetraphenyl-diimidazole, 2 ' -bis (2-chloro-5-nitrophenyl) -4, 4' -bis (3, 4-dimethoxyphenyl) -5,5 ' -bis (o-chlorophenyl) -diimidazole, 2 ' -bis (2-chloro-5-nitrophenyl) -4- (3, 4-dimethoxyphenyl) -5- (o-chlorophenyl) -4 ', 5 ' -diphenyl-diimidazole, 2 ' -bis (2, 4-dichlorophenyl) -4, 4' -bis (3, 4-dimethoxyphenyl) -5,5 ' -bis (o-chlorophenyl) -diimidazole, 2- (2, 4-dichlorophenyl) -4- (3, 4-dimethoxyphenyl) -2 ', 5-bis (o-chlorophenyl) -4 ', 5' -diphenyl-diimidazole, 2- (2, 4-dichlorophenyl) -2 '- (o-chlorophenyl) -4, 4', 5,5 '-tetraphenyl-diimidazole or 2, 2' -bis (2, 4-dichlorophenyl) -4, 4', 5, 5' -tetraphenyl-diimidazole;

preferably, the pyrazoline photoinitiator is 1-phenyl-3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) pyrazoline, 1-phenyl-3-biphenyl-5- (4-tert-butylphenyl) pyrazoline, ethoxylated (9) trimethylolpropane pyrazoline ester, ethoxylated (10) bisphenol A pyrazoline ester, and the like;

preferably, the triazine photoinitiator is 2- (4-ethylbiphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 2- (3, 4-methyleneoxyphenyl) -4, 6-bis (trichloromethyl) -1,3, 5-triazine, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 1,1,1,3,3, 3-hexafluoroisopropyl-3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoate, ethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, or mixtures thereof, 2-ethoxyethyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, cyclohexyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } acetate, 3- { chloro-4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, 3- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanamide, benzyl-2- {4- [2, 4-bis (trichloromethyl) -s-triazin-6-yl ] phenylthio } propanoic acid, and the like, 2, 4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2, 4-bis (trichloromethyl) -6- (1-p-dimethylaminophenyl) -1, 3-butadienyl-s-triazine or 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine;

preferably, the triphenylamine photoinitiator is 1-phenyl-3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) pyrazoline, 1-phenyl-3-biphenyl-5- (4-tert-butylphenyl) pyrazoline, ethoxylated (9) trimethylolpropane pyrazoline ester, ethoxylated (10) bisphenol A pyrazoline ester, and the like;

preferably, the coumarin-based photoinitiator is 3,3 '-carbonylbis (7-diethylamine coumarin), 3-benzoyl-7-diethylamine coumarin, 3' -carbonylbis (7-methoxycoumarin), 7-diethylamino-4-methylcoumarin, 3- (2-benzothiazole) -7- (diethylamino) coumarin, 7- (diethylamino) -4-methyl-2H-1-benzopyran-2-one [7- (diethylamino) -4-methylcoumarin ] or 3-benzoyl-7-methoxycoumarin;

preferably, the thioxanthone photoinitiator is thioxanthone, 2, 4-dimethylthioxanthone, 2, 4-diethylthioxanthone, 2, 4-diisopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, isopropylthioxanthone or diisopropylthioxanthone;

preferably, the acridine photoinitiator is 9-phenylacridine, 9-p-methylphenylacridine, 9-m-methylphenylacridine, 9-o-chlorophenylacridine, 9-o-fluorophenylacridine, 1, 7-bis (9-acridinyl) heptane, 9-ethylaccridine, 9- (4-bromophenyl) acridine, 9- (3-chlorophenyl) acridine, 1, 7-bis (9-acridine) heptane, 1, 5-bis (9-acridinopentane) or 1, 3-bis (9-acridine) propane.

3. The self-luminous photosensitive resin composition according to claim 1, wherein the thermal acid generator has a structure represented by the following general formula I, general formula II or general formula III:

in the general formula I, the compound has the following structure,

cation [ A ]]^m+Represents [ (R)₀)_aQ]^m+Wherein R is₀Is an organic group having 1 to 60 carbon atoms, a is an integer of 1 to 5, a is R₀Each is the same or different; preferably a R₀At least one of which is an organic group containing an aromatic ring; q is S, N, Se, Te, P, As, Sb, Bi, O, I, Br, Cl, F, or N ═ N, and the valency of Q is denoted As Q, m ═ a-Q, where N ═ N is calculated by the valency of 0;

anion [ B ]]^m-Is [ LX_b]^m-、[LX_b-1(OH)]^m-、(ClO₄)^-、(CF₃SO₃)^-、(FSO₃)^-Tosylate anion, trinitrobenzene sulfonate anion, camphor sulfonate anion, nonafluorobutane sulfonate anion, hexadecafluorooctane sulfonate anion, tetraarylborate or tetrakis (pentafluorophenyl) borate anion, wherein L is B, P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn or Co, X is a halogen atom or pentafluorophenyl group, B is an integer of 3 to 7, and the atomic valence of L is represented by P, m ═ B-P; preferably, [ LX_b]^m-Is [ (C)₆F₅)₄B]^-、(BF₄)^-、(PF₆)^-、(SbF₆)^-、(AsF₆)^-Or (SbCl)₆)^-(ii) a Preferably, [ LX_b-1(OH)]^m-Is (BF)₃(OH))^-、(PF₅(OH))^-、(SbF₅(OH))^-、(AsF₅(OH))^-Or (SbCl)₅(OH))^-；

In the general formula II, the compound is shown in the specification,

R₁and R₂Each independently represents C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic groups, nitro groups, sulfonic acid groups or cyano groups, or, R₁And R₂Can pass through C₂-C₇The alkyl chain of (a) constitutes a ring structure;

R₃and R₄Each independently represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

An^q’-represents an anion of valence q ', q ' represents 1 or 2, and p ' represents a coefficient for keeping the charge neutral;

in the general formula (III) described above,

R₅represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Aromatic group of (2), C₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

R₆represents a hydrogen atom, a halogen atom, C₁-C₁₀Alkyl of (C)₆-C₂₀Or C is an aromatic group₇-C₃₀The hydrogen atom of the alkyl group, the aromatic group or the aralkyl group may be independently substituted with a hydroxyl group, a halogen group or C₁-C₁₀Alkyl of (C)₆-C₂₀Substituted by aromatic group, nitro group, sulfonic group or cyano group;

R₇is represented by C₁-C₁₀And methylene in the alkyl group may be optionally substituted by-O-or-S-, or hydrogen in the alkyl group may be substituted by halogen;

An^q”-represents an anion of q "valence, q" represents 1 or 2, and p "represents a coefficient for keeping the charge neutral.

4. The self-luminous photosensitive resin composition according to claim 3, wherein p' An in the general formula II^q’-And p' An in said formula III^q”-Each independently represents a methane sulfonic acid anion, a dodecyl sulfonic acid anion, a benzene sulfonic acid anion, a toluene sulfonic acid anion, a trifluoromethane sulfonic acid anion, a naphthalene sulfonic acid anion, a diphenylamine-4-sulfonic acid anion, a 2-amino-4-methyl-5-chlorobenzene sulfonic acid anion, a 2-amino-5-nitrobenzene sulfonic acid anionA metallocene compound anion such as chloride ion, bromide ion, iodide ion, fluoride ion, chlorate ion, thiocyanate ion, perchlorate ion, hexafluorophosphate ion, hexafluoroantimonate ion, tetrafluoroborate ion, octylphosphate ion, dodecylphosphate ion, octadecylphosphate ion, phenylphosphate ion, nonylphenylphosphate ion, 2' -methylenebis (4, 6-di-t-butylphenyl) phosphonate ion, tetrakis (pentafluorophenyl) borate ion, a quencher anion having a function of deactivating an active molecule in an excited state, and ferrocene or ruthenocene having an anionic group such as a carboxyl group, a phosphonic group, or a sulfonic group on a cyclopentadienyl ring; preferably, p' An in said formula II^q’-And p' An in said formula III^q”-Each independently represents a hexafluorophosphate ion, a hexafluoroantimonate ion or a tetrakis (pentafluorophenyl) borate ion.

5. The self-luminous photosensitive resin composition according to claim 1, wherein the thermal acid generator is selected from one or more of the following compounds:

or the thermal acid generator is selected from one or more of SAN-AID SI-B2A, SAN-AID SI-B3A, SAN-AID SI-B3, SAN-AID SI-B4, SAN-AID SI-60, SAN-AID SI-80, SAN-AID SI-100, SAN-AID SI-110 and SAN-AID SI-150 manufactured by Sanxin chemical industries.

6. The self-luminous photosensitive resin composition according to claim 1, wherein a curing temperature of the self-luminous photosensitive resin composition is 50 ℃ to 250 ℃, preferably 100 ℃ to 220 ℃, more preferably 130 ℃ to 200 ℃, and further preferably 150 ℃ to 180 ℃.

7. The self-luminous photosensitive resin composition according to any one of claims 1 to 6, wherein the photoinitiator is 1 to 20 parts by weight, preferably 1 to 10 parts by weight, based on 100 parts by weight of the self-luminous photosensitive resin composition.

8. The self-luminous photosensitive resin composition according to claim 7, wherein the weight ratio of the radical initiator to the thermal acid generator is 0.2 to 5:1, more preferably 0.5 to 3: 1.

9. The self-luminous photosensitive resin composition according to any one of claims 1 to 8, wherein the photopolymerizable compound is a compound having a polymerizable ethylenically unsaturated bond and/or an epoxy compound;

preferably, the compound having a polymerizable ethylenically unsaturated bond is a photopolymerizable compound having at least 3 ethylenically unsaturated bonds, and is preferably trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol octa (meth) acrylate, tripentaerythritol hepta (meth) acrylate, tetrapentaerythritol deca (meth) acrylate, tetrapentaerythritol nona (meth) acrylate, tris (2- (meth) acryloyloxyethyl) isocyanurate, ethylene glycol-modified pentaerythritol tetra (meth) acrylate, ethylene glycol-modified dipentaerythritol hexa (meth) acrylate, propylene glycol-modified pentaerythritol tetra (meth) acrylate, propylene glycol-modified pentaerythritol hexa (meth) acrylate, or mixtures thereof, One or more of propylene glycol modified dipentaerythritol hexa (meth) acrylate, caprolactone modified pentaerythritol tetra (meth) acrylate, and caprolactone modified dipentaerythritol hexa (meth) acrylate;

preferably, the epoxy compound is an epoxy compound of C3-C20 and/or an oxetane compound of C4-C20;

preferably, the epoxy compound of C3-C20 is one or more of phenyl glycidyl ether, p-tert-butylphenyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, allyl glycidyl ether, 1, 2-epoxybutane, epoxybutene, 1, 2-epoxydodecane, epichlorohydrin, 1, 2-epoxydecane, styrene oxide, epoxycyclohexane, 3-methacryloxymethyl epoxycyclohexane, 3-acryloxymethyl epoxycyclohexane and 3-vinyl epoxycyclohexane; the oxetane compound having C4-C20 is preferably bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, brominated bisphenol A diglycidyl ether, brominated bisphenol F diglycidyl ether, brominated bisphenol S diglycidyl ether, epoxy novolac resin, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, hydrogenated bisphenol S diglycidyl ether, 3, 4-epoxycyclohexylmethyl-3 ',4' -epoxycyclohexanecarboxylate, 2- (3, 4-epoxycyclohexyl-5, 5-spiro-3, 4-epoxy) cyclohexane-1, 3-dioxane, bis (3, 4-epoxycyclohexylmethyl) adipate, vinylcyclohexane, epoxy resin, epoxy, 4-vinylcyclohexane, bis (3, 4-epoxy-6-methylcyclohexylmethyl) adipate, 3, 4-epoxy-6-methylcyclohexyl-3 ',4' -epoxy-6 ' -methylcyclohexaneformate, methylenebis (3, 4-epoxycyclohexane), dicyclopentadiene dioxide, ethylene glycol di (3, 4-epoxycyclohexylmethyl) ether, dioctylphthalate epoxide, di-2-ethylhexyl hexahydrophthalate, 1, 4-butanediol diglycidyl ether, 1, 6-hexanediol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, One or more of 1,1, 3-tetradecadiene dioxide, limonene dioxide, 1,2,7, 8-diepoxyoctane, 1,2,5, 6-diepoxycyclooctane;

preferably, the oxetane compound of C4-C20 is a compound having 1 to 6 oxetane rings, more preferably 3-ethyl-3-hydroxymethyloxetane, 3- (methyl) allyloxymethyl-3-ethyloxetane, (3-ethyl-3-oxetanylmethoxy) methylbenzene, 4-fluoro- [1- (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, 4-methoxy- [1- (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, [1- (3-ethyl-3-oxetanylmethoxy) ethyl ] phenyl ether, isobutoxymethyl (3-ethyl-3-oxetanylmethyl) ether, oxetanylmeth-yl) ether, and the like, Isobornyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, isobornyl (3-ethyl-3-oxetanylmethyl) ether, 2-ethylhexyl (3-ethyl-3-oxetanylmethyl) ether, ethyldiethylene glycol (3-ethyl-3-oxetanylmethyl) ether, dicyclopentadiene (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyl (3-ethyl-3-oxetanylmethyl) ether, tetrahydrofurfuryl (3-ethyl-3-oxetanylmethyl) ether, tetrabromolyl (3-ethyl-3-oxetanylmethyl) ether, 2-tetrabromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether, tribromophenyl (3-ethyl-3-oxetanylmethyl) ether, 2-tribromophenoxyethyl (3-ethyl-3-oxetanylmethyl) ether, 2-hydroxyethyl (3-ethyl-3-oxetanylmethyl) ether, 2-hydroxypropyl (3-ethyl-3-oxetanylmethyl) ether, butoxyethyl (3-ethyl-3-oxetanylmethyl) ether, pentachlorophenyl (3-ethyl-3-oxetanylmethyl) ether, pentabromophenyl (3-ethyl-3-oxetanylmethyl) ether, bornyl (3-ethyl-3-oxetanylmethyl) ether, 3, 7-bis (3-oxetanyl) -5-oxa-nonane, 3' - (1,3- (2-methylene) propanediyl bis (oxymethylene)) bis (3-ethyloxetane), 1, 4-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] benzene, 1, 2-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] ethane, 1, 3-bis [ (3-ethyl-3-oxetanylmethoxy) methyl ] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenylbis (3-ethyl-3-oxetanylmethyl) ether, n-butylidenebis (2-ethylmethyloxetanylmethoxy) ether, n-butylmethyloxetanylmethy-yl (3-ethyl, Triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tricyclodecanediylmethylene (3-ethyl-3-oxetanylmethyl) ether, trimethylolpropane tris (3-ethyl-3-oxetanylmethyl) ether, 1, 4-bis (3-ethyl-3-oxetanylmethoxy) butane, 1, 6-bis (3-ethyl-3-oxetanylmethoxy) hexane, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, polyethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, polyethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, Dipentaerythritol hexa (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol penta (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol tetra (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol hexa (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol penta (3-ethyl-3-oxetanylmethyl) ether, ditrimethylolpropane tetra (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, di-n-butyl-ethyl-3-ethylmethyl ether, di, One or more of EO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol F (3-ethyl-3-oxetanylmethyl) ether; more preferably, the C4-C20 oxetane compound is a compound having 1 to 2 oxetane rings.

10. The self-luminous photosensitive resin composition according to any one of claims 1 to 9, wherein the alkali-soluble resin is a carboxyl group-containing copolymer obtained by copolymerizing a carboxyl group-containing unsaturated monomer and a copolymerizable unsaturated monomer;

preferably, the carboxyl group-containing unsaturated monomer is one or more of an unsaturated monocarboxylic acid monomer, an unsaturated dicarboxylic acid or an anhydride monomer thereof, a tri-or higher unsaturated polycarboxylic acid or an anhydride monomer thereof, a mono [ (meth) acryloyloxyalkyl ] ester monomer of a di-or higher polycarboxylic acid, and a mono (meth) acrylate monomer of a polymer having a carboxyl group and a hydroxyl group at both ends; more preferably, the unsaturated monocarboxylic acid is one or more of acrylic acid, methacrylic acid, crotonic acid, alpha-chloroacrylic acid and cinnamic acid; more preferably, the unsaturated dicarboxylic acid or anhydride thereof is one or more of maleic acid, maleic anhydride, fumaric acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid; more preferably, the mono [ (meth) acryloyloxyalkyl ] ester monomer of the dibasic or higher polycarboxylic acid is one or more of succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl); more preferably, the mono (meth) acrylate monomer of the polymer having carboxyl and hydroxyl groups at both ends is ω -carboxy polycaprolactone monoacrylate and/or ω -carboxy polycaprolactone monomethacrylate;

preferably, the copolymerizable unsaturated monomer is an aromatic vinyl compound, an unsaturated carboxylic acid glycidyl ester compound, a carboxylic acid vinyl ester compound, an unsaturated ether compound, a vinyl cyanide compound, an unsaturated amide compound, an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer compound having a monoacryl group or a monomethacryl group at the end of a polymer molecular chain; more preferably, the aromatic vinyl compound is one or more of styrene, alpha-methyl styrene, o-vinyl toluene, m-vinyl toluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether and p-vinylbenzyl glycidyl ether; more preferably, the unsaturated carboxylic acid glycidyl ester compound is one or more of indene glycidyl acrylate, 1-methylindene and other indenes, glycidyl methacrylate; more preferably, the vinyl carboxylate compound is one or more of vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; more preferably, the unsaturated ether compound is one or more of vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; more preferably, the vinyl cyanide compound is one or more of acrylonitrile, methacrylonitrile, alpha-chloroacrylonitrile; more preferably, the unsaturated amide compound is one or more of acrylamide, methacrylamide, alpha-chloroacrylamide, N-2-hydroxyethyl acrylamide and N-2-hydroxyethyl methacrylamide; more preferably, the unsaturated imide compound is one or more of maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; more preferably, the aliphatic conjugated diene compound is one or more of 1, 3-butadiene, isoprene and chloroprene; more preferably, the macromonomer compound having a monoacryl group or a monomethacryl group at the terminal of the polymer molecular chain is polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, or polysiloxane.

11. The self-luminous photosensitive resin composition according to claim 10, wherein the carboxyl group-containing copolymer is a (meth) acrylic acid/methyl (meth) acrylate copolymer, a (meth) acrylic acid/benzyl (meth) acrylate copolymer, a (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate copolymer, a (meth) acrylic acid/methyl (meth) acrylate/polystyrene macromonomer copolymer, a (meth) acrylic acid/methyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, a (meth) acrylic acid/benzyl (meth) acrylate/polystyrene macromonomer copolymer, a (meth) acrylic acid/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, a copolymer, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polystyrene macromonomer copolymer, (meth) acrylic acid/2-hydroxyethyl (meth) acrylate/benzyl (meth) acrylate/polymethyl methacrylate macromonomer copolymer, methacrylic acid/styrene/benzyl (meth) acrylate/N-phenylmaleimide copolymer, (meth) acrylic acid/succinic acid mono [2- (meth) acryloyloxyethyl ]/styrene/(meth) acrylic acid allyl/N-phenylmaleimide copolymer One or more of a copolymer, a (meth) acrylic acid/styrene/(meth) acrylic acid benzyl ester/glycerol mono (meth) acrylate/N-phenylmaleimide copolymer, a (meth) acrylic acid/omega-carboxy polycaprolactone mono (meth) acrylate/styrene/(meth) acrylic acid benzyl ester/glycerol mono (meth) acrylate/N-phenylmaleimide copolymer.

12. A color filter produced from the self-luminous photosensitive resin composition according to any one of claims 1 to 11.

13. An image display device comprising the color filter according to claim 12.