CN111620493A - Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage - Google Patents

Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage Download PDF

Info

Publication number
CN111620493A
CN111620493A CN202010637370.1A CN202010637370A CN111620493A CN 111620493 A CN111620493 A CN 111620493A CN 202010637370 A CN202010637370 A CN 202010637370A CN 111620493 A CN111620493 A CN 111620493A
Authority
CN
China
Prior art keywords
treatment
sewage
resistant bacteria
ultrasonic
resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010637370.1A
Other languages
Chinese (zh)
Inventor
李红娜
张治国
朱昌雄
李斌绪
叶婧
耿兵
田云龙
郭萍
李莲芳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institute of Environment and Sustainable Development in Agriculturem of CAAS
Original Assignee
Institute of Environment and Sustainable Development in Agriculturem of CAAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Environment and Sustainable Development in Agriculturem of CAAS filed Critical Institute of Environment and Sustainable Development in Agriculturem of CAAS
Priority to CN202010637370.1A priority Critical patent/CN111620493A/en
Publication of CN111620493A publication Critical patent/CN111620493A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
    • C02F1/36—Treatment of water, waste water, or sewage with mechanical oscillations ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/026—Fenton's reagent

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Water Treatments (AREA)

Abstract

The invention relates to a method and special equipment for removing antibiotic resistant bacteria and resistance genes in sewage, belonging to the technical field of sewage treatment. The method for removing antibiotic resistant bacteria and resistant genes in sewage adopts electrochemical reaction, ultraviolet disinfection, ultrasonic treatment and H2O2And (4) carrying out disinfection and treatment at the same time to remove antibiotic resistant bacteria and resistant genes in the sewage. The special equipment comprises a reaction container provided with a water inlet and a water outlet; at least one pair of anode electrode and cathode electrode and at least one ultrasonic element are arranged at the lower part in the reaction container; at least one ultraviolet light source is arranged at the upper part in the reaction container. The method and the special equipment can ensure that H can be realized2O2The disinfection, the electrochemical treatment, the ultraviolet disinfection and the ultrasonic treatment are synergistic, the operation efficiency is high, the cost is low, and no by-product is generated.

Description

Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage
Technical Field
The invention relates to a method and special equipment for removing antibiotic resistant bacteria and resistance genes in sewage, belonging to the technical field of sewage treatment.
Background
The threat of antibiotic resistance to human health and ecological safety is exacerbated by the excessive and unjustified use of antibiotics over the past decades. Researchers detect antibiotic resistant bacteria and resistant genes with higher concentration in environmental media such as water, soil, gas and the like all around the world. The resistance gene can spread in the environment by means of horizontal transfer and the like, and even if the resistance bacteria die, the released resistance gene fragment exists in the environment for a period of time and has potential risk of transferring to other pathogenic bacteria. The water environment is the main habitat and propagation medium of bacteria, and plays an important role in the propagation of antibiotic resistant bacteria and resistant genes. Antibiotic production plant wastewater, hospital wastewater and aquaculture wastewater are the main initial sources of antibiotic resistance in the environment, and are discharged into surface water after being treated by a sewage treatment plant or recycled into a farmland environment. However, the biological treatment process of the sewage treatment plant cannot effectively remove the antibiotic-resistant bacteria and the resistance genes, so that it is necessary to develop a deep removal method for the antibiotic-resistant bacteria and the resistance genes in the effluent of the sewage treatment plant.
At present, most advanced treatment processes of sewage treatment plants are ultraviolet disinfection, chlorine disinfection, ozone disinfection and other processes, and although antibiotic resistant bacteria can be effectively removed by using the single processes, the removal rate of resistant genes is low. And numerous studies have shown that these disinfection treatments also screen for and enrich multiple antibiotic-resistant bacteria, resulting in increased antibiotic resistance levels in the disinfected effluent. The electrochemical treatment can generate hydroxyl free radicals with strong oxidizability and can also generate active chlorine in the presence of chloride ions, thereby greatly improving the disinfection effect. In addition, no reagent is added into the wastewater in the electrochemical treatment, and secondary pollution to treated effluent is avoided. Research has shown that electrochemical treatment has better organic pollutant removal effect and disinfection effect, but the removal effect on antibiotic-resistant bacteria and resistance genes is less investigated.
Disclosure of Invention
In view of the above problems, an object of the present invention is to provide a sewage treatment apparatus that can effectively remove antibiotic-resistant bacteria, particularly, resistant genes, and that does not produce by-products and is low in running cost.
In order to achieve the aim, the invention provides a method for removing antibiotic resistant bacteria and resistant genes in sewage, which adopts the following technical scheme: by electrochemical reaction, ultraviolet sterilization, ultrasonic treatment, H2O2And (4) carrying out disinfection and treatment at the same time to remove antibiotic resistant bacteria and resistant genes in the sewage.
In the above method, the current density flowing through the electrochemical reaction, the anode electrode and the cathode electrode is 10mA/cm2～40mA/cm2Preferably 20mA/cm2。
In the method, the ultraviolet irradiation dose of the ultraviolet disinfection is 20mJ/cm2～80mJ/cm2Preferably 20mJ/cm2。
In the above method, the ultrasonic irradiation frequency of the ultrasonic treatment is 20kHz to 40kHz, preferably 20 kHz.
In the above process, the above-mentioned H2O2Sterilizing to obtain2O2Adding into sewage to be treated to make H2O2The concentration in the sewage is 10mg/L to 40mg/L, preferably 20 mg/L.
In the above method, the time period of the co-treatment is 1-30min, preferably 10 min.
The invention also provides a device for removing the antibiotic resistant bacteria and the resistant genes in the sewage, which is used for the method and comprises a reaction vessel, a water inlet and a water outlet, wherein the reaction vessel is provided with the water inlet and the water outlet; at least one pair of anode electrode and cathode electrode and at least one ultrasonic element are arranged at the lower part in the reaction container; at least one ultraviolet light source is arranged at the upper part in the reaction container.
In the device, the water inlet is arranged at the lower part of the reaction container, the water outlet is arranged at the upper part of the side wall of the reaction container, and water inlet and outlet are driven by a pump. The water is fed from below, the residence time of the water in the container is longer, and the reaction can be more fully performed.
In the device, the anode electrode, the cathode electrode and the ultrasonic element are all immersed in the sewage; the ultraviolet light source is arranged above the sewage liquid level.
In the device, the water inlet is provided with a feed inlet; the feed inlet is T type feed inlet.
In the above apparatus, a stirring member is further provided in the reaction vessel.
In the above apparatus, the stirring member is provided at the bottom in the reaction vessel.
In the device, the anode electrode and the cathode electrode in each pair have the same size and are symmetrically arranged, and the distance between the anode electrode and the cathode electrode is 1-10 cm.
In the device, the ultrasonic element is positioned on one side of the anode electrode and is immersed in the sewage, and the distance between the ultrasonic element and the anode electrode 2 is 1 cm-3 cm.
In the above device, the ultraviolet light source may be constituted by one lamp tube, or by a plurality of lamp tubes arranged in parallel.
The invention also includes the following applications:
1. the method for removing the antibiotic resistant bacteria and the resistant genes in the sewage is applied to sewage treatment;
2. the antibiotic resistant bacteria and resistant gene removing device in the sewage is applied to sewage treatment.
The invention has the following advantages: the method and the device for removing the antibiotic resistant bacteria and the resistant genes in the sewage can simultaneously carry out H2O2Disinfection, electrochemical treatment, ultraviolet disinfection and ultrasonic treatment, four high, the with low costs of operation efficiency in coordination, and do not produce the accessory substance: the ultraviolet disinfection treatment can directly act on bacterial DNA without cell knotsThe structure is seriously damaged, the possibility of revival exists in cells, and the existence of the outer wall of the cells can absorb and block ultraviolet rays and reduce the ultraviolet disinfection effect. The electrochemical treatment generates hydroxyl free radicals and free chlorine, and the two oxidants can cause serious damage to the thallus structure and release DNA. The electrochemical treatment and the ultraviolet disinfection have different disinfection mechanisms, the combination of the two generates a synergistic effect, and the electrochemical treatment improves the damage efficiency of the ultraviolet disinfection on DNA; adding H into the reaction system2O2Under the irradiation of ultraviolet light, a light Fenton reaction is carried out, so that the ultraviolet light is fully utilized, and hydroxyl radicals with strong oxidizing property are generated; the addition of the ultrasonic element not only utilizes the physical crushing function to remove pollutants such as antibiotic resistance genes, but also can promote the hydroxyl free radicals generated by the anode to diffuse into a reaction system through the generated micro cavitation bubbles, thereby increasing the action range of active oxygen free radicals. Invention H2O2The sterilization, the electrochemical treatment, the ultraviolet sterilization and the ultrasonic treatment, after the four synergistic treatments, the antibiotic-resistant bacteria and the resistance genes in the secondary effluent can be almost completely removed, the diffusion of the antibiotic-resistant bacteria in the sewage to the environment is greatly reduced, the pollution risk of the antibiotic-resistant bacteria to a receiving water body is reduced, and the method has a great application prospect.
Drawings
FIG. 1 is a schematic structural view of an apparatus for removing antibiotic-resistant bacteria and resistant genes from wastewater according to example 1 of the present invention.
FIG. 2 is a graph showing the results of the removal rates of antibiotic-resistant bacteria and resistant genes in sewage after different treatments in example 2 of the present invention, wherein the significant difference exists between different lower case letters in the graph, p is less than 0.05, and the number of repetitions is 3.
In the figure, 1 is a reaction vessel, 2 is an anode electrode, 3 is a cathode electrode, 4 is an ultraviolet light source, 5 is an ultrasonic element, 6 is a stirring element, 7 is a water inlet, 8 is a water outlet, and 9 is a charging hole.
Detailed Description
The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings so that the objects, features and advantages of the invention can be more clearly understood. It should be understood that the embodiments shown in the drawings are not intended to limit the scope of the present invention, but are merely intended to illustrate the spirit of the technical solution of the present invention.
In the following, unless otherwise specified, the terms of orientation such as "upper" and "lower" used generally refer to "upper" and "lower" of an element in a normal use state, and specifically refer to the direction of the drawing of fig. 1, and "inner" and "outer" refer to the outline of the element itself.
Example 1 apparatus for removing antibiotic-resistant bacteria and resistant genes from wastewater
Electrochemical treatment, ultraviolet disinfection, ultrasonic treatment and H for experiment2O2The embodiment provides a device for removing antibiotic-resistant bacteria and resistant genes in sewage, and the specific structure of the device is shown in figure 1, and the device is composed of a reaction container 1, a pair of anode electrode 2 and cathode electrode 3 used for electrochemical reaction in the reaction container, an ultraviolet light source 4 and an ultrasonic element 5; a water inlet 7 is formed in the lower portion of the reaction container 1, a water outlet 8 is formed in the upper portion of the side wall of the reaction container, sewage flows into the reaction container 1 from the water inlet 7, and after treatment is completed, the sewage flows out of the reaction container 1 from the water outlet 8; the water inlet 7 is provided with a feed inlet 9 for adding H2O2(ii) a At least one pair of anode electrode 2 and cathode electrode 3 submerged in sewage is arranged in the reaction container 1, and an electric field is formed between each pair of electrodes; at least one ultrasonic element 5 submerged in sewage is also arranged in the reaction container 1; an ultraviolet light source 4 is arranged above the sewage liquid level at the upper part in the reaction container 1; a stirring element 6 is arranged at the bottom in the reaction vessel 1; the anode electrode 2 and the cathode electrode 3 are respectively connected to corresponding electrodes of a power supply, and the ultraviolet light source 4, the ultrasonic element 5 and the stirring element 6 are also respectively connected to the power supply.
The anode electrode 2 can be made of at least one of a platinum electrode, an activated carbon fiber electrode, a boron-doped diamond membrane electrode, a titanium-based lead dioxide/tin dioxide composite electrode and a graphite electrode, and the boron-doped diamond membrane electrode is adopted in the embodiment.
The cathode electrode 3 can be made of at least one of stainless steel, graphite, platinum and titanium mesh, and in this embodiment, a stainless steel electrode is used.
Each pair of anode electrode 2 and cathode electrode 3 has the same size of 1cm2～100cm2Symmetrically placed and immersed in the sewage in the reaction vessel 1, the distance between each pair of the anode electrode 2 and the cathode electrode 3 is 1 cm-10 cm, the electrode area of the embodiment is 1cm2The electrode spacing is 3 cm.
The ultrasonic mechanism 5 is positioned on one side of the anode electrode 2 and is immersed into the sewage water body, and the distance between the ultrasonic mechanism and the anode electrode 2 is 1 cm-3 cm, specifically 1cm in the embodiment. The ultrasonic mechanism 5 of the present embodiment is manufactured by Charpy corporation (UW-A1).
The ultraviolet light source 4 may be any of various types of mercury lamps or UV-LED lamps. The ultraviolet light source 4 may be composed of one or more than one lamp tube, and in this embodiment, 1 UV-LED lamp tube is used, and the power is 20W.
The stirring mechanism 6 of the present embodiment is Shanghai Si le (85-2).
EXAMPLE 2 Effect of different treatments on removal of antibiotic-resistant bacteria and resistance genes from wastewater
With the apparatus for removing antibiotic-resistant bacteria and resistance genes in sewage according to example 1, the sewage was Hebei \28095; (i.e., sewage biologically treated by a sewage plant) from the second-stage sewage treatment plant, and 11 treatments and two controls were set under the following conditions:
in the following treatment, the sewage was supplied through the water inlet 7 at a flow rate of 500mL/min (treatment and timing were started from the start of water supply).
In the following treatment, H is fed into the sewage through the feed inlet 92O2Adding the mixture into the sewage to be treated to ensure that the concentration of the mixture in the sewage is 10 mg/L-40 mg/L.
In the following treatment, the ultraviolet irradiation dose was 20mJ/cm2～80mJ/cm2。
In the following treatment, the current density flowing through the anode electrode 2 and the cathode electrode 3 was controlled to be 10mA/cm by adjusting a DC stabilized voltage supply2～40mA/cm2。
In the following treatment, the ultrasonic wave irradiation frequency was 20kHz to 40 kHz.
In the next hand treatment, the stirring element 6 is used for stirring in the treatment process, and the rotating speed is 200 r/min.
Specific treatments and controls were as follows:
treatment 1: only adopting the anode electrode 2 and the cathode electrode 3, controlling the current density flowing through the anode electrode 2 and the cathode electrode 3 to be 10mA/cm2(ii) a The treatment time is 10 min.
And (3) treatment 2: only the anode electrode 2 and the cathode electrode 3 are adopted, and the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a The treatment time is 10 min.
And (3) treatment: only the anode electrode 2 and the cathode electrode 3 are adopted, and the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 40mA/cm2(ii) a The treatment time is 10 min.
And (4) treatment: the ultraviolet irradiation dose is set to 20mJ/cm by using only the ultraviolet light source 42(ii) a The treatment time is 10 min.
And (4) treatment 5: the ultraviolet irradiation dose is set to 50mJ/cm by using only the ultraviolet light source 42(ii) a The treatment time is 10 min.
And (6) treatment: only the ultraviolet light source 4 is adopted, and the ultraviolet irradiation dose is set to be 80mJ/cm2(ii) a The treatment time is 10 min.
And (7) treatment: adopting an anode electrode 2, a cathode electrode 3, an ultraviolet light source 4, an ultrasonic element 5 and adding H2O2Specifically, the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a The irradiation dose of the ultraviolet light source 4 is set to be 20mJ/cm2(ii) a Setting the ultrasonic radiation frequency of the ultrasonic element 5 to be 20 kHz; h is to be2O2Adding the mixture into sewage to be treated to ensure that the concentration of the mixture in the sewage is 10 mg/L; the treatment time is 10 min.
And (4) treatment 8: adopting an anode electrode 2, a cathode electrode 3, an ultraviolet light source 4, an ultrasonic element 5 and adding H2O2Specifically, the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a The irradiation dose of the ultraviolet light source 4 is set to be 20mJ/cm2(ii) a Setting the ultrasonic radiation frequency of the ultrasonic element 5 to be 20 kHz; h is to be2O2Adding the sewage into the sewage to be treated to ensure that the concentration of the sewage in the sewage is 20 mg/L; the treatment time is 10 min.
And (4) treatment: adopting an anode electrode 2, a cathode electrode 3, an ultraviolet light source 4, an ultrasonic element 5 and adding H2O2Specifically, the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a The irradiation dose of the ultraviolet light source 4 is set to be 20mJ/cm2(ii) a Setting the ultrasonic radiation frequency of the ultrasonic element 5 to be 20 kHz; h is to be2O2Adding the sewage into the sewage to be treated to ensure that the concentration of the sewage in the sewage is 40 mg/L; the treatment time is 10 min.
And (4) treatment 10: adopting an anode electrode 2, a cathode electrode 3 and an ultrasonic element 5, and adding H2O2But without the use of the ultraviolet light source 4; specifically, the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a Setting the ultrasonic radiation frequency of the ultrasonic element 5 to be 20 kHz; h is to be2O2Adding the sewage into the sewage to be treated to ensure that the concentration of the sewage in the sewage is 20 mg/L; the treatment time is 10 min.
And (3) treatment 11: adopting an anode electrode 2, a cathode electrode 3, an ultraviolet light source 4 and H2O2But without the use of ultrasound elements 5; specifically, the current density flowing through the anode electrode 2 and the cathode electrode 3 is controlled to be 20mA/cm2(ii) a The irradiation dose of the ultraviolet light source 4 is set to be 20mJ/cm2H is to be2O2Adding the sewage into the sewage to be treated to ensure that the concentration of the sewage in the sewage is 20 mg/L; the treatment time is 10 min.
Control 1-instead of using the anode electrode 2 and the cathode electrode 3, Fenton oxidation treatment (using the UV light source 4, the ultrasonic element 5, and adding H) was substituted2O2Concentration of 20mg/L, Fe2+The concentration is 1.5mg/L, the pH value of the solution is adjusted to 4, and the irradiation dose of the ultraviolet light source 4 is set to be 20mJ/cm2(ii) a Setting the ultrasonic radiation frequency of the ultrasonic element 5 to be 20 kHz; h is to be2O2Adding the sewage into the sewage to be treated to ensure that the concentration of the sewage in the sewage is 20 mg/L; the treatment time is 10 min.
Control 2: addition of H2O2An anode electrode 2 and a cathode electrode 3, an ultraviolet light source 4, and a cathode electrode are used in this order,Ultrasonic element 5, in particular 1) mixing H2O2Adding into the sewage to be treated to make the concentration of the sewage in the sewage be 20mg/L, and treating for 10min without starting other elements except the stirring element 6; 2) except for the stirring member 6, only the anode electrode 2 and the cathode electrode 3 were used, and the current density flowing through the anode electrode 2 and the cathode electrode 3 was controlled to be 20mA/cm2Treating for 10 min; 3) except for the stirring member 6, only the ultraviolet light source 4 was turned on, and the irradiation dose of the ultraviolet light source 4 was set to 20mJ/cm2Treating for 10 min; 4) except for the stirring member 6, only the ultrasonic member 5 was turned on, and the ultrasonic irradiation frequency of the ultrasonic member 5 was set to 20kHz for 10 min.
And pumping the treated sewage out of the water outlet 8, detecting the removal condition of the antibiotic resistant bacteria and the antibiotic resistant genes in the water, wherein the removal effects of the antibiotic resistant bacteria and the antibiotic resistant genes of the treatment and the comparison are shown in the table 1 and the figure 2, each treatment is repeated for 3 times, the significance analysis adopts SPSS, and p is less than 0.05:
TABLE 1 antibiotic-resistant bacteria and removal effects of resistance genes for each treatment and control
Treatment and control tetA tetC tetM tetW tetX sul1 sul2 Efficiency of sterilization
Process 1 45.02％ -3.21％ 26.62％ 19.49％ 2.24％ 38.56％ 24.02％ 43.70％
Treatment 2 50.45％ 9.90％ 35.98％ 43.14％ 25.12％ 40.81％ 6.22％ 82.81％
Treatment 3 58.71％ 47.09％ 42.27％ 59.38％ 22.91％ 55.14％ 26.31％ 96.99％
Treatment 4 32.64％ 51.63％ 45.10％ 56.06％ 45.79％ 54.63％ 39.50％ 96.00％
Treatment 5 54.00％ 73.87％ 51.73％ 58.70％ 79.48％ 56.65％ 49.19％ 99.80％
Treatment 6 60.41％ 82.08％ 55.85％ 68.94％ 84.07％ 71.34％ 61.99％ 100.00％
Treatment 7 95.60％ 89.90％ 97.40％ 97.90％ 99.40％ 96.60％ 96.60％ 100.00％
Treatment 8 99.20％ 94.80％ 99.50％ 98.70％ 99.50％ 99.10％ 98.50％ 100.00％
Process 9 99.30％ 94.80％ 99.50％ 98.90％ 99.70％ 99.30％ 98.80％ 100.00％
Process 10 52.47％ 10.80％ 36.62％ 21.49％ 22.24％ 41.56％ 6.82％ 85.70％
Process 11 51.71％ 60.30％ 46.12％ 60.58％ 63.42％ 70.75％ 56.38％ 97.90％
Control 1 89.50％ 83.30％ 82.10％ 85.60％ 90.10％ 92.30％ 93.60％ 93.33％
Control 2 90.20％ 89.40％ 95.30％ 92.90％ 95.50％ 95.60％ 93.90％ 95.20％
Wherein tetA, tetC, tetM, tetW and tetX are tetracycline antibiotic resistance genes, sul1 and sul2 are sulfonamide antibiotic resistance genes, and the determination method refers to Zhang Zhiguo, Li Binxu, Li Na, Sardar M Fahad, Songtingling, Zhu Changxiong, Lv Xiwu, Li Hongna. effects of UV rendering on phenotypes and genes of antibiotic-resistant bacteria in secondary antibiotic free from a bacterial water transfer plant, WaterResearch 2019,157: 546-; the technical formula of the sterilization efficiency is as follows:
sterilization efficiency ═ abundance of treatment group-initial abundance of reaction)/initial abundance of reaction × 100%
As can be seen from Table 1, the removal effects of the treatments 1, 2 and 3 by the electrochemical technique alone on the antibiotic resistance gene and the drug-resistant bacteria are limited, and particularly, the current density is 10mA/cm2The treatment of (2) showed almost no effect of removing tetC, the removal rate of other resistant genes was only 19% to 45%, and the inactivation rate of drug-resistant bacteria was 43.7%, which was significantly lower than the treatment effects of the combined processes of treatment 7, treatment 8 and treatment 9 (p)<0.05). From the treatment effect of different current densities, when the current density is 10mA/cm2Increased to 20mA/cm2In time, the removal rate of the resistance genes and the drug-resistant bacteria is obviously improved; when the current density is from 20mA/cm2Increased to 40mA/cm2In the case of the method, although the removal rate of the resistance gene and the drug-resistant bacterium is increased, it is not obvious, and particularly, since a high current density is economically impractical in view of high cost, the optimum current density is 20mA/cm2。
In treatments 4, 5 and 6 with ultraviolet light alone, although effective reduction of antibiotic resistance genes and drug-resistant bacteria can be achieved by 30min treatment, the effect is still significantly lower than that of combined treatments 7, 8 and 9 (p)<0.05). Furthermore, the radiation dose is 50mJ/cm2And 80mJ/cm2In contrast, the radiation dose was 20mA/cm2Still has the optimal performance of comprehensive economy and treatment effect.
Treatment 7, treatment 8, and treatment 9 of the combined process are only H2O2The concentrations differ, and it can be seen that treatment 7 compares to treatment 8, H2O2The reduction in concentration results in a slowing of the removal of the antibiotic resistance gene, e.g.the removal rate of the tetA gene is reduced from 99.2% to 95.60%; however, when H is compared with the case of treatment 9 and treatment 82O2After the concentration was increased to 40mg/L, the removal rate of the tetA gene was increased from 99.2% to 99.3%, indicating that H was present in the reaction system2O2Further increase in concentration is very limited in the effect of the increase in pollution control. And the treatment 8 shows the highest removal effect on tetracycline resistance genes and sulfonamide resistance genes, and the sterilization efficiency on drug-resistant bacteria can reach 100.00%.
In the two combined process treatments of treatment 10 without ultraviolet and treatment 11 without ultrasonic, the reduction effects of the antibiotic resistance genes and the drug-resistant bacteria are lower than those of the combined process treatments 7, 8 and 9(p is less than 0.05).
In comparison with the combined processes of treatment 7, treatment 8 and treatment 9, control 1 used fenton reaction instead of electrochemistry, and the removal rates of the antibiotic resistance gene and the drug-resistant bacteria were not the same as those of treatment 7, treatment 8 and treatment 9(p < 0.05).
Compared with the combined process treatment 7, 8 and 9, the control 2 adopts the mode that the treatments are carried out successively, and the removal rate of the antibiotic resistance genes and the drug-resistant bacteria is different from that of the combined process treatment 7, 8 and 9 (p) due to the lack of the composite action and linkage reaction of electrochemical electrode reaction, ultrasonic action and ultraviolet simultaneous treatment<0.05). Electrochemical treatment alone (treatment 1, treatment 2, treatment 3), uv disinfection mode alone 6 (treatment 4, treatment 5, treatment 6), three combined treatments (treatment 10, treatment 11), and four stepwise processes (comparative 2) in comparison H2O2The disinfection, the electrochemical treatment, the ultraviolet disinfection and the ultrasonic treatment simultaneously generate synergistic action, the removal effect on antibiotic resistant bacteria and resistant genes is better, the operation cost is lower, the energy consumption is lower, and the propagation risk of antibiotic resistance is not increased. The substitution of fenton oxidation for electrochemical treatment does not produce synergistic effect with other three.
To sum up, H is added2O2And the method of synchronously processing the anode electrode 2, the cathode electrode 3, the ultraviolet light source 4 and the ultrasonic element 5 is adopted to generate synergistic effect, the processing period of the antibiotic resistance genes and the drug-resistant bacteria is shorter, the removal rate is higher than that of other processes, the antibiotic resistance bacteria and the drug-resistant genes in the secondary effluent can be almost completely removed, no by-product is generated, and the treated effluent can be dischargedPut into the environment or reused in farmland.
The present invention has been described with reference to the above embodiments, and the structure, arrangement, and connection of the respective members may be changed. On the basis of the technical scheme of the invention, the improvement or equivalent transformation of the individual components according to the principle of the invention is not excluded from the protection scope of the invention.

Claims (10)

1. A method for removing antibiotic resistant bacteria and resistant genes in sewage is characterized by comprising the steps of electrochemical reaction, ultraviolet disinfection, ultrasonic treatment and H2O2And (4) carrying out disinfection and treatment at the same time to remove antibiotic resistant bacteria and resistant genes in the sewage.
2. The method of claim 1, wherein: the current density flowing through the anode electrode and the cathode electrode of the electrochemical reaction is 10mA/cm2～40mA/cm2。
3. The method of claim 1, wherein: the ultraviolet irradiation dose of the ultraviolet disinfection is 20mJ/cm2～80mJ/cm2。
4. The method of claim 1, wherein: the ultrasonic radiation frequency of the ultrasonic treatment is 20 kHz-40 kHz.
5. The method of claim 1, wherein: said H2O2Sterilizing to obtain2O2Adding into sewage to be treated to make H2O2The concentration in the sewage is 10 mg/L-40 mg/L.
6. The method of any one of claims 1-5, wherein: the time length of the common treatment is 5-20 min.
7. The utility model provides a get rid of antibiotic resistant fungus and resistant gene's device in sewage, is including being provided with the reaction vessel of water inlet and delivery port, its characterized in that: at least one pair of anode electrode and cathode electrode and at least one ultrasonic element are arranged at the lower part in the reaction container; at least one ultraviolet light source is arranged at the upper part in the reaction container.
8. The apparatus of claim 7, wherein: and a feed inlet is arranged on the water inlet.
9. The apparatus of claim 7 or 8, wherein: and a stirring element is arranged in the reaction container.
10. Use of the method of any one of claims 1 to 6 or the apparatus of any one of claims 7 to 9 in the treatment of wastewater.
CN202010637370.1A 2020-07-03 2020-07-03 Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage Pending CN111620493A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010637370.1A CN111620493A (en) 2020-07-03 2020-07-03 Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010637370.1A CN111620493A (en) 2020-07-03 2020-07-03 Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage

Publications (1)

Publication Number Publication Date
CN111620493A true CN111620493A (en) 2020-09-04

Family

ID=72269567

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010637370.1A Pending CN111620493A (en) 2020-07-03 2020-07-03 Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage

Country Status (1)

Country Link
CN (1) CN111620493A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112374585A (en) * 2020-09-18 2021-02-19 昆明理工大学 Method for simultaneously removing antibiotics and resistant bacteria in water environment
CN112624455A (en) * 2020-12-18 2021-04-09 华东理工大学 Method for disinfecting gram-negative superbacteria with antibiotic resistance in water
CN113896276A (en) * 2021-09-29 2022-01-07 同济大学 Method for removing antibiotics and resistance genes in sewage by using ultraviolet/peroxyacetic acid

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19958751A1 (en) * 1999-12-07 2001-06-13 Umex Gmbh Water supply disinfected with a single reactor by simultaneous ultra-violet light and electro-chemical processes
DE102008004663A1 (en) * 2008-01-11 2009-07-16 Bergmann Clean Abwassertechnik Gmbh Method for sanitization and germ reduction from biologically cleaned sewage, comprises conducting the sewage or sewage partial flow to a clarification plant through electrolysis cell and subsequently supplying to industrial water container
US20110024361A1 (en) * 2007-06-04 2011-02-03 Schwartzel David T Aqueous treatment apparatus utilizing precursor materials and ultrasonics to generate customized oxidation-reduction-reactant chemistry environments in electrochemical cells and/or similar devices
CN103159314A (en) * 2013-03-28 2013-06-19 中国科学院城市环境研究所 Method for eliminating antibiotics resistance gene pollution in water by hydrogen peroxide coupled ultrasonic method
US20170029300A1 (en) * 2012-11-21 2017-02-02 The Hong Kong University Of Science And Technology Pulsed electric field for drinking water disinfection
CN107986538A (en) * 2018-01-19 2018-05-04 兰州交通大学 A kind of optoacoustic is electrically coupled can field multi-stage oxidizing-UF membrane collaboration water treatment system and technique
CN108002605A (en) * 2017-11-17 2018-05-08 浙江海洋大学 The processing method of antibiotic in a kind of marine culture wastewater
CN109095679A (en) * 2018-11-01 2018-12-28 南京林业大学 A kind of drinking water disinfection purification system and its technique handling antibiotic resistance bacterium and resistant gene
CN209210551U (en) * 2018-11-01 2019-08-06 南京林业大学 A kind of drinking water disinfection purification system handling antibiotic resistance bacterium and resistant gene
CN110759437A (en) * 2019-10-12 2020-02-07 清华苏州环境创新研究院 Method for electrochemical-UV composite treatment of refractory organic matters
CN110980895A (en) * 2019-12-17 2020-04-10 嘉兴学院 Method and device for electro-adsorption and degradation removal of antibiotics from water
CN212559817U (en) * 2020-07-03 2021-02-19 中国农业科学院农业环境与可持续发展研究所 Antibiotic resistant bacteria and resistant gene removing device in sewage

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19958751A1 (en) * 1999-12-07 2001-06-13 Umex Gmbh Water supply disinfected with a single reactor by simultaneous ultra-violet light and electro-chemical processes
US20110024361A1 (en) * 2007-06-04 2011-02-03 Schwartzel David T Aqueous treatment apparatus utilizing precursor materials and ultrasonics to generate customized oxidation-reduction-reactant chemistry environments in electrochemical cells and/or similar devices
DE102008004663A1 (en) * 2008-01-11 2009-07-16 Bergmann Clean Abwassertechnik Gmbh Method for sanitization and germ reduction from biologically cleaned sewage, comprises conducting the sewage or sewage partial flow to a clarification plant through electrolysis cell and subsequently supplying to industrial water container
US20170029300A1 (en) * 2012-11-21 2017-02-02 The Hong Kong University Of Science And Technology Pulsed electric field for drinking water disinfection
CN103159314A (en) * 2013-03-28 2013-06-19 中国科学院城市环境研究所 Method for eliminating antibiotics resistance gene pollution in water by hydrogen peroxide coupled ultrasonic method
CN108002605A (en) * 2017-11-17 2018-05-08 浙江海洋大学 The processing method of antibiotic in a kind of marine culture wastewater
CN107986538A (en) * 2018-01-19 2018-05-04 兰州交通大学 A kind of optoacoustic is electrically coupled can field multi-stage oxidizing-UF membrane collaboration water treatment system and technique
CN109095679A (en) * 2018-11-01 2018-12-28 南京林业大学 A kind of drinking water disinfection purification system and its technique handling antibiotic resistance bacterium and resistant gene
CN209210551U (en) * 2018-11-01 2019-08-06 南京林业大学 A kind of drinking water disinfection purification system handling antibiotic resistance bacterium and resistant gene
CN110759437A (en) * 2019-10-12 2020-02-07 清华苏州环境创新研究院 Method for electrochemical-UV composite treatment of refractory organic matters
CN110980895A (en) * 2019-12-17 2020-04-10 嘉兴学院 Method and device for electro-adsorption and degradation removal of antibiotics from water
CN212559817U (en) * 2020-07-03 2021-02-19 中国农业科学院农业环境与可持续发展研究所 Antibiotic resistant bacteria and resistant gene removing device in sewage

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
李金梅;李曦;张舒婷;: "消毒工艺对水体中抗生素抗性基因的去除效果", 净水技术, no. 02, 10 February 2018 (2018-02-10) *
牛丽春;: "污水处理厂消毒技术对抗生素抗性菌的去除效果分析", 山西化工, no. 01, 15 February 2018 (2018-02-15) *
陈蕾;GEORGE (ZHI) ZHOU;: "污水中抗生素抗性菌及抗性基因的去除技术", 生态环境学报, no. 11, 18 November 2018 (2018-11-18) *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112374585A (en) * 2020-09-18 2021-02-19 昆明理工大学 Method for simultaneously removing antibiotics and resistant bacteria in water environment
CN112374585B (en) * 2020-09-18 2023-03-21 昆明理工大学 Method for simultaneously removing antibiotics and resistant bacteria in water environment
CN112624455A (en) * 2020-12-18 2021-04-09 华东理工大学 Method for disinfecting gram-negative superbacteria with antibiotic resistance in water
CN113896276A (en) * 2021-09-29 2022-01-07 同济大学 Method for removing antibiotics and resistance genes in sewage by using ultraviolet/peroxyacetic acid

Similar Documents

Publication Publication Date Title
Martínez-Huitle et al. A critical review over the electrochemical disinfection of bacteria in synthetic and real wastewaters using a boron-doped diamond anode
CN212559817U (en) Antibiotic resistant bacteria and resistant gene removing device in sewage
CN104787941B (en) A kind of advanced oxidation coupling device processed for organic wastewater with difficult degradation thereby and technique
CN111620493A (en) Method and special equipment for removing antibiotic resistant bacteria and resistant genes in sewage
Sandoval et al. Electrochemical treatment of slaughterhouse and dairy wastewater: Toward making a sustainable process
CN102992455A (en) Novel three-dimensional electrode device for treating wastewater difficult in biologically degrading
CN110980895B (en) Method and device for electro-adsorption and degradation removal of antibiotics from water
CN102180558B (en) Process for treating high-concentration industrial organic wastewater by composite advanced oxidation method
CN101767852A (en) Pulse plasma device for safe disinfection of drinking water
CN113957460A (en) Method for synthesizing hydrogen peroxide based on alternating current electrolysis, device and application thereof
CN111233224A (en) Treatment method for simultaneously removing nitrogen, phosphorus and antibiotics in mariculture wastewater and sterilizing
CN206188442U (en) Circulation mariculture water processing system based on nanometer photoelectrocatalysis technique
CN101417832A (en) Pulsed plasma catalytic means and method for drinking water safety disinfection
CN107585970A (en) The technique of hardly degraded organic substance advanced treating in a kind of Industrial reverse osmosis concentrated water
CN201148361Y (en) Highly effective nano-sterilizing apparatus
CN203715450U (en) Hospital wastewater treatment system
CN102531252B (en) Method and device for sterilizing water body in combination with three-dimensional electrode and photocatalysis , application thereof
CN108191147A (en) A kind of Integral low-energy membrane bioreactor
CN102583695B (en) Ozone and hydrogen peroxide combination system for realizing slightly polluted water treatment
CN113754138A (en) Method for treating antibiotic-containing wastewater by electro-catalytic induced electric Fenton-membrane integration
CN102765787A (en) Method for sterilizing and disinfecting sewage by injecting plasma free radicals and device
CN201746368U (en) Pulse plasma device for safe disinfection of drinking water
CN115784384A (en) Medical sewage treatment device and method
KR101323258B1 (en) plasma sterilization method
CN212425738U (en) Multiple internal circulation controllable electrolytic coupling oxidation treatment device for waste water

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination