CN111586957B - Capacitive coupling plasma discharge device - Google Patents
Capacitive coupling plasma discharge device Download PDFInfo
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- CN111586957B CN111586957B CN201910121096.XA CN201910121096A CN111586957B CN 111586957 B CN111586957 B CN 111586957B CN 201910121096 A CN201910121096 A CN 201910121096A CN 111586957 B CN111586957 B CN 111586957B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
The invention discloses a capacitive coupling plasma discharge device. The plasma discharge device includes: the device comprises a vacuum chamber, an upper flat plate electrode and a lower flat plate electrode which are positioned in the vacuum chamber, and insulating rings which are positioned between the upper flat plate electrode and the lower flat plate electrode and stacked layer by layer; a gap exists between each insulating ring and the adjacent insulating ring; the uppermost insulating ring among the insulating rings stacked layer by layer is contacted with the lower surface of the upper flat plate electrode, and the lowermost insulating ring is contacted with the upper surface of the lower flat plate electrode; the upper flat plate electrode is connected with a first discharge driving rod, and the first discharge driving rod extends out of the vacuum chamber; the lower flat plate electrode is connected with a second discharge driving rod, and the second discharge driving rod extends out of the vacuum chamber. The plasma discharge device can ensure the axial symmetry of the plasma in the experimental process.
Description
Technical Field
The invention relates to the field of plasma discharge, in particular to a capacitive coupling plasma discharge device.
Background
Capacitively Coupled Plasma (CCP) sources are widely used in the material etch and deposition industry due to their simple apparatus and ability to generate large area, uniform plasma. The capacitively coupled (parallel plate electrode configuration) plasma source used in the industry is a closed system that is non-diagnosable (increasing the diagnostic window destroys the plasma state, affecting the material etch or deposition quality). In order to optimize the plasma etching or deposition process, multiple experimental diagnostics and computer simulation studies of the plasma source are required. This requires a reasonable design of the plasma source in the laboratory. In addition, if one-dimensional computer simulation of an actual plasma source is desired, the plasma between the parallel plates is required to have high axial symmetry. However, in the conventional laboratory parallel plate plasma source, due to the use of various diagnostic means, the plasma diffuses toward the grounded chamber sidewall, and the sidewall also becomes a part of the grounded electrode, so that the area of the grounded electrode is much larger than that of the driving electrode, and a direct current negative bias is formed on the surface of the driving electrode, so that the axial symmetry of the plasma is poor, and therefore, the comparison with the computer simulation result is difficult (most one-dimensional models can only simulate the axially symmetric plasma structure).
Disclosure of Invention
The invention aims to provide a capacitive coupling plasma discharge device which can ensure the axial symmetry of plasma in the experimental process.
A capacitively coupled plasma discharge device, comprising: the device comprises a vacuum chamber, an upper flat plate electrode and a lower flat plate electrode which are positioned in the vacuum chamber, and insulating rings which are positioned between the upper flat plate electrode and the lower flat plate electrode and stacked layer by layer; gaps exist between each insulating ring and the adjacent insulating ring; the uppermost insulating ring among the insulating rings stacked layer by layer is in contact with the lower surface of the upper flat electrode, and the lowermost insulating ring is in contact with the upper surface of the lower flat electrode; the upper flat plate electrode is connected with a first discharge driving rod, and the first discharge driving rod extends out of the vacuum chamber; and the lower flat plate electrode is connected with a second discharge driving rod, and the second discharge driving rod extends out of the vacuum chamber.
Optionally, a plurality of insulating ring supports are uniformly distributed between the upper flat electrode and the lower flat electrode along the circumferential direction; each insulating ring bracket is provided with a plurality of horizontal teeth which are uniformly distributed from top to bottom; the insulating ring is embedded between the horizontal teeth.
Optionally, upper electrode insulating media are arranged above and on the side surface of the upper flat plate electrode, and lower electrode insulating media are arranged below and on the side surface of the lower flat plate electrode; the upper electrode insulating medium is used for isolating the vacuum chamber from the upper flat plate electrode; the lower electrode insulating medium is used for isolating the vacuum chamber from the lower flat plate electrode; the insulating ring support is fixed between the upper electrode insulating medium and the lower electrode insulating medium.
Optionally, the upper electrode insulating medium has a first extension portion extending outward of the vacuum chamber around the first discharge driving rod; the first extension is used for isolating the vacuum chamber from the first discharge drive rod; the lower electrode insulating medium is provided with a second extending part extending outwards the vacuum chamber at the periphery of the second discharge driving rod; the second extension is used for isolating the vacuum chamber from the second discharge drive rod.
Optionally, the lower surface of the upper flat electrode is provided with an upwardly concave groove, a horizontal spray plate is arranged below the groove, and the groove and the horizontal spray plate form a gas diffusion space; an air inlet channel is arranged on the first discharge driving rod; one end of the air inlet channel is communicated to the outside of the vacuum chamber, and the other end of the air inlet channel is communicated to the groove.
Optionally, an electromagnetic probe measurement window and an optical diagnosis window are formed in the insulating rings stacked layer by layer.
Optionally, the insulating ring is a quartz ring or a ceramic ring.
Optionally, an air pump interface is disposed at the bottom of the vacuum chamber.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects: according to the capacitive coupling plasma discharge device disclosed by the invention, the insulating rings stacked layer by layer are arranged between the upper flat plate electrode and the lower flat plate electrode, so that the plasma region is surrounded by the insulating rings, neutral gas in the plasma region uniformly flows out through gaps between the insulating rings after reaction, the inside and the outside of the insulating rings, namely the inside and the outside of the plasma region, are ensured to have no gradient in gas pressure, the plasma is prevented from diffusing to the side wall of the vacuum chamber, the areas of the grounding electrode and the driving electrode are equal, and the axial symmetry of the plasma is ensured in the experimental process.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without inventive exercise.
FIG. 1 is a cross-sectional view of an embodiment of a capacitively coupled plasma discharge device of the present invention;
FIG. 2 is a diagram of an embodiment of an insulating ring holder of the capacitively coupled plasma discharge device according to the present invention;
FIG. 3 is a spraying structure diagram of the upper plate electrode of the embodiment of the capacitively coupled plasma discharge device of the present invention;
FIG. 4 is a front view of an outer structure of an insulating ring of an embodiment of a capacitively coupled plasma discharge device of the present invention;
FIG. 5 is a rear view of an outer structure of an insulating ring of an embodiment of a capacitively coupled plasma discharge device of the present invention;
fig. 6 is an overall structure diagram of the insulation rings stacked layer upon layer according to the embodiment of the capacitively coupled plasma discharge device of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention aims to provide a plasma vacuum discharge system, which enlarges the regulation range of self-bias voltage.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
FIG. 1 is a cross-sectional view of an embodiment of a capacitively coupled plasma discharge device of the present invention.
Referring to fig. 1, the capacitively coupled plasma discharge device includes: the device comprises a vacuum chamber 1, an upper flat plate electrode 2 and a lower flat plate electrode 3 which are positioned in the vacuum chamber 1, and insulating rings 4 which are positioned between the upper flat plate electrode 2 and the lower flat plate electrode 3 and stacked layer by layer; gaps exist between each insulating ring 4 and the adjacent insulating ring 4; the uppermost insulating ring 4 of the insulating rings 4 stacked layer by layer is in contact with the lower surface of the upper flat electrode 2, and the lowermost insulating ring 4 is in contact with the upper surface of the lower flat electrode 3; a first discharge driving rod 5 is connected to the upper plate electrode 2, and the first discharge driving rod 5 extends out of the vacuum chamber 1; a second discharge drive rod 6 is connected to the lower plate electrode 3, and the second discharge drive rod 6 extends out of the vacuum chamber 1. The insulating ring 4 is a quartz ring or a ceramic ring. The vacuum chamber 1 is grounded.
The cross section shapes of the upper flat electrode 2 and the lower flat electrode 3 are both circular. The diameter and the thickness of the insulating ring 4 can be adjusted by replacing the type of the insulating ring 4 in the insulating ring 4. Preferably, the outer diameter of the insulating ring 4, the diameter of the upper flat electrode 2 and the diameter of the lower flat electrode 3 are equal, so that the influence of edge effect on the axial symmetry of the plasma can be inhibited.
The side wall of the vacuum chamber 1 is reserved with a flange window to meet the requirements of experimental diagnosis.
An upper electrode insulating medium 7 is wrapped above and on the side surface of the upper flat electrode 2, and a lower electrode insulating medium 8 is wrapped below and on the side surface of the lower flat electrode 3; the upper electrode insulating medium 7 is used for isolating the vacuum chamber 1 from the upper plate electrode 2, and the lower electrode insulating medium 8 is used for isolating the vacuum chamber 1 from the lower plate electrode 3, so that discharge caused by stray capacitance between the upper plate electrode 2 or the lower plate electrode 3 and the grounded side wall of the vacuum chamber 1 is prevented. The upper electrode insulating medium 7 has a first extension part 701 extending outward of the vacuum chamber 1 around the first discharge drive rod 5; the first extension 701 serves to isolate the vacuum chamber 1 from the first discharge drive rod 5; the lower electrode insulating medium 8 has a second extension 801 extending outward from the vacuum chamber 1 around the second discharge drive rod 6; the second extension 801 is used to isolate the vacuum chamber 1 from the second discharge driving rod 6.
The first discharge driving rod 5 and the second discharge driving rod 6 are used for connecting an external power amplifier, and the external power amplifier is used for driving the upper plate electrode 2 and the lower plate electrode 3 to discharge.
The bottom of the vacuum chamber 1 is provided with a suction pump interface 101, and the suction pump interface 101 is a mechanical pump inlet or a turbo molecular pump inlet.
A plurality of insulating ring supports 9 are uniformly distributed between the upper flat electrode 2 and the lower flat electrode 3 along the circumferential direction. The insulating ring support 9 is made of polytetrafluoroethylene.
FIG. 2 is a diagram of an insulating ring holder according to an embodiment of the present invention.
Referring to fig. 2, the insulating ring supports 9 are comb-shaped, that is, each insulating ring support 9 has a plurality of horizontal teeth 901 distributed uniformly from top to bottom; the insulating ring 4 is embedded between the horizontal teeth 901.
The insulating ring support 9 is fixed between the upper electrode insulating medium 7 and the lower electrode insulating medium 8 through rivets.
The horizontal teeth 901 of the insulating ring holder 9 can be chosen with various thicknesses. When the insulating ring supports 9 with the horizontal teeth 901 with different thicknesses are replaced, the adjustment of the gaps between the insulating rings 4 can be realized, and when the insulating ring supports 9 with different numbers are stacked, the adjustment of the number and the overall height of the insulating rings 4 stacked layer by layer can be realized, so that the purpose of researching the plasma characteristics under different electrode distances can be realized.
Fig. 3 is a spraying structure diagram of the upper plate electrode of the embodiment of the capacitively coupled plasma discharge device of the present invention.
Referring to fig. 3, the upper flat electrode 2 adopts a shower nozzle air inlet structure, that is, the lower surface of the upper flat electrode 2 is provided with an upwardly concave groove, a horizontal spray plate 10 is arranged below the groove, and the groove and the horizontal spray plate 10 form a gas diffusion space. An air inlet channel 11 is arranged on the first discharge driving rod 5; one end of the air inlet channel 11 is communicated to the outside of the vacuum chamber 1, and the other end is communicated to the groove. The shower head structure can ensure that neutral gas uniformly flows into a plasma region.
Fig. 4 is a front view of an outer structure of an insulating ring of an embodiment of a capacitively coupled plasma discharge device according to the present invention.
Fig. 5 is a rear view of an outer structure of an insulating ring of an embodiment of a capacitively coupled plasma discharge device according to the present invention.
Fig. 6 is an overall structure diagram of the insulation rings stacked layer upon layer according to the embodiment of the capacitively coupled plasma discharge device of the present invention.
Referring to fig. 4 to 6, an electromagnetic probe measurement window 401 and an optical diagnostic window 402 are disposed on the insulating ring 4 stacked layer by layer. The electromagnetic probe measurement window 401 and the optical diagnostic window 402 are oppositely disposed. The electromagnetic probe measurement window 401 is used for diagnostic tools such as a langmuir single probe, a microwave resonance probe, a microwave interference probe, and the like. The optical diagnostic window 402 is used for spectral analysis, such as absorption spectroscopy, emission spectroscopy, and the like.
As an alternative embodiment, the number of the insulating ring holders 9 is 4, and the central angle corresponding to any two adjacent insulating ring holders 9 is 90 degrees.
According to the specific embodiment provided by the invention, the invention discloses the following technical effects:
1. the insulating rings stacked layer by layer are arranged between the upper flat plate electrode and the lower flat plate electrode, so that the plasma region is surrounded by the insulating rings, neutral gas in the plasma region uniformly flows out through gaps between the insulating rings after reaction, the inside and the outside of the insulating rings are ensured, namely, the inside and the outside air pressure of the plasma region have no gradient, the plasma is prevented from diffusing to the side wall of the vacuum chamber, the area of the grounding electrode is equal to that of the driving electrode, and the axial symmetry of the plasma is ensured in the experimental process.
2. Can be applied to various diagnostic means, such as Langmuir single probe, microwave resonance probe, microwave interference probe, etc.
3. The purpose of researching the plasma characteristics under different electrode distances can be realized by replacing the insulating ring bracket and changing the number of the insulating rings stacked layer by layer.
4. By changing the diameter of the insulating ring, the purpose of researching the plasma characteristics under different electrode sizes can be realized.
The principles and embodiments of the present invention have been described herein using specific examples, which are provided only to help understand the method and the core concept of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In view of the above, the present disclosure should not be construed as limiting the invention.
Claims (7)
1. A capacitively coupled plasma discharge device, comprising: the device comprises a vacuum chamber, an upper flat plate electrode and a lower flat plate electrode which are positioned in the vacuum chamber, and insulating rings which are positioned between the upper flat plate electrode and the lower flat plate electrode and stacked layer by layer; gaps exist between each insulating ring and the adjacent insulating ring; the uppermost insulating ring among the insulating rings stacked layer by layer is in contact with the lower surface of the upper flat electrode, and the lowermost insulating ring is in contact with the upper surface of the lower flat electrode; the upper flat plate electrode is connected with a first discharge driving rod, and the first discharge driving rod extends out of the vacuum chamber; the lower flat plate electrode is connected with a second discharge driving rod, and the second discharge driving rod extends out of the vacuum chamber;
the outer diameter of the insulating ring, the diameter of the upper flat plate electrode and the diameter of the lower flat plate electrode are equal; a plurality of insulating ring supports are uniformly distributed between the upper flat electrode and the lower flat electrode along the circumferential direction; each insulating ring bracket is provided with a plurality of horizontal teeth which are uniformly distributed from top to bottom; the insulating ring is embedded between the horizontal teeth; the horizontal teeth have a variety of thickness options.
2. The capacitively coupled plasma discharge device of claim 1, wherein an upper electrode insulating medium is disposed above and laterally to the upper plate electrode, and a lower electrode insulating medium is disposed below and laterally to the lower plate electrode; the upper electrode insulating medium is used for isolating the vacuum chamber from the upper flat plate electrode; the lower electrode insulating medium is used for isolating the vacuum chamber from the lower flat plate electrode; the insulating ring support is fixed between the upper electrode insulating medium and the lower electrode insulating medium.
3. The capacitively coupled plasma discharge device of claim 2, wherein said upper electrode insulating medium has a first extension extending outward of the vacuum chamber around said first discharge drive rod; the first extension is used for isolating the vacuum chamber from the first discharge drive rod; the lower electrode insulating medium is provided with a second extending part extending outwards the vacuum chamber at the periphery of the second discharge driving rod; the second extension is used for isolating the vacuum chamber from the second discharge drive rod.
4. The capacitively coupled plasma discharge device of claim 1, wherein the lower surface of the upper plate electrode has a groove depressed upward, a horizontal shower plate is disposed below the groove, and the groove and the horizontal shower plate form a gas diffusion space; an air inlet channel is arranged on the first discharge driving rod; one end of the air inlet channel is communicated to the outside of the vacuum chamber, and the other end of the air inlet channel is communicated to the groove.
5. The capacitively coupled plasma discharge device of claim 1, wherein an electromagnetic probe measurement window and an optical diagnostic window are opened on the insulating rings stacked one on top of the other.
6. The capacitively coupled plasma discharge device of claim 1, wherein the insulating ring is a quartz ring or a ceramic ring.
7. The capacitively coupled plasma discharge device of claim 1, wherein a suction pump interface is opened at the bottom of the vacuum chamber.
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| CN201910121096.XA CN111586957B (en) | 2019-02-19 | 2019-02-19 | Capacitive coupling plasma discharge device |
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| CN201910121096.XA CN111586957B (en) | 2019-02-19 | 2019-02-19 | Capacitive coupling plasma discharge device |
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