CN111584131A - Transparent conductive electrode, preparation method thereof, light modulation film and touch screen - Google Patents
Transparent conductive electrode, preparation method thereof, light modulation film and touch screen Download PDFInfo
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- CN111584131A CN111584131A CN202010556042.9A CN202010556042A CN111584131A CN 111584131 A CN111584131 A CN 111584131A CN 202010556042 A CN202010556042 A CN 202010556042A CN 111584131 A CN111584131 A CN 111584131A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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Abstract
The invention relates to a transparent conductive electrode and a preparation method thereof, a light modulation film and a touch screen, wherein the transparent conductive electrode comprises a working electrode, the working electrode is composed of a nano metal wire, a nano metal rod or a nano metal film, the working electrode is positioned on a wiring area and structurally provided with a lapping groove which exposes the section of the working electrode, the depth of the lapping groove is not less than two thirds of the thickness of the working electrode, or the lapping groove penetrates through the working electrode along the thickness direction; the electric connecting piece is positioned at the overlapping groove and is made of solidified conductive slurry; and the electrode lead is electrically connected with the corresponding working electrode through the electric connector. The invention changes the prior surface electrical connection mode, greatly improves the electrical conductivity and the stability after electrical connection, enlarges the application range of the electrode lead, and can be continuously used even if the prior conductive material with large contact resistance after silk-screen printing conductive paste.
Description
Technical Field
The invention relates to the field of transparent conductive electrodes, in particular to a transparent conductive electrode with good and stable electric connectivity, a preparation method thereof, a light modulation film with the transparent conductive electrode and a touch screen.
Background
The nano silver wire conducting film is a basic material for manufacturing nano silver wire large-size touch screens, light-adjustable films, flexible touch screens and other electronic products.
In the prior art, the nano silver wire conductive film includes a patterned working electrode, a conductive silver paste block is coated on a frame wiring area, and an electrode lead is electrically connected with the working electrode through the conductive silver paste block. However, the connection mode of the electrode lead and the working electrode is easy to have the problems of unstable contact and poor electric conduction.
In view of the above, it is necessary to provide a transparent conductive electrode with good and stable electrical connectivity, a method for manufacturing the same, and a light modulation film and a touch panel having the same, so as to solve the above problems.
Disclosure of Invention
The invention aims to provide a transparent conductive electrode with good and stable electric connectivity, a preparation method thereof, a light modulation film with the transparent conductive electrode and a touch screen.
In order to achieve the purpose, the invention adopts the following technical scheme:
a transparent conductive electrode comprising:
the working electrode is composed of a nano metal wire, a nano metal rod or a nano metal film, a lapping groove exposing the section of the working electrode is arranged on the structure of the working electrode in the wiring area, the depth of the lapping groove is not less than two thirds of the thickness of the working electrode, or the lapping groove penetrates through the working electrode along the thickness direction;
the electric connecting piece is positioned at the overlapping groove and is made of solidified conductive slurry;
and the electrode lead is electrically connected with the corresponding working electrode through the electric connector.
Further, the nano metal wire is a nano silver wire with the diameter of 5 nm-100 nm and the length of 15 mu m-25 mu m.
Further, the overlapping groove is a groove, or the overlapping groove comprises several independent subslots.
Furthermore, the electrode lead is an enameled wire, the enameled wire comprises a lapping part, wherein the metal wire is exposed outwards, and the lapping part is electrically connected with the working electrode; or, the electrode lead is an electrode wire formed by screen printing or ink-jet printing of conductive paste solidification; or the electrode lead is an electrode wire formed by coating conductive paste such as silver paste into a conductive film and then etching the conductive film.
Further, the transparent conductive electrode further comprises a transparent substrate, the substrate comprises a visible area and a wiring area located around the visible area, and the working electrode is located on the substrate; or, the transparent conductive electrode further comprises a substrate and a separation layer positioned on the substrate, and the working electrode is positioned on one side of the separation layer, which is far away from the substrate; or, the transparent conductive electrode further comprises a substrate, a separation layer positioned on the substrate, and a resin layer positioned on one side of the separation layer, which deviates from the substrate, and the working electrode is positioned on one side of the resin layer, which deviates from the separation layer.
A preparation method of a transparent conductive electrode comprises the following steps:
s1, forming a working electrode, wherein the working electrode is composed of a nano metal wire, a nano metal rod or a nano metal film;
s2, a cross section of a lapping groove exposing the working electrode is formed on the structure of the working electrode in the wiring area, the depth of the lapping groove is not less than two thirds of the thickness of the working electrode, or the lapping groove penetrates through the working electrode along the thickness direction;
s3, filling conductive paste into the lap joint groove, and solidifying the conductive paste to form an electric connector;
and S4, arranging electrode leads which are electrically connected with the corresponding working electrodes through the electric connectors.
Further, the nano metal wire is a nano silver wire with the diameter of 5 nm-100 nm and the length of 15 mu m-25 mu m.
Further, the temperature during forming the overlapping groove is not higher than 300 ℃.
Further, the method of forming the lap joint groove includes mechanical damage, ultrasonic, plasma ablation, shock wave, hole preparation, chemical etching, the mechanical damage includes scratching, tearing, scraping, drilling, cutting, grinding, vibrating.
Furthermore, the electrode lead is an enameled wire, the enameled wire comprises a lap joint part of the metal wire exposed outwards, and the lap joint part is electrically connected with the electric connecting piece;
or the electrode lead is formed by solidifying the conductive paste and is electrically connected with the electric connecting piece.
Further, forming the working electrode on a substrate; or, sequentially forming a separation layer on a substrate, and then forming the working electrode on the separation layer; alternatively, a separation layer and a resin layer are formed in this order on a substrate, and then the working electrode is formed on the resin layer.
A light modulation film comprises two layers of transparent conductive electrodes and a PDLC film positioned between the two layers of transparent conductive electrodes; at least one of the two layers of transparent conductive electrodes is the transparent conductive electrode.
A touch screen comprises a first touch electrode and a second touch electrode, wherein at least one of the first touch electrode and the second touch electrode is the transparent conductive electrode.
Compared with the prior art, the invention has the beneficial effects that: according to the transparent conductive electrode, the cross section of the working electrode is exposed outwards by arranging the lap joint groove on the conductive electrode, and the cross section is in electrical contact with the electrode lead through the electric connecting piece, so that the conventional surface electrical connection mode is changed, the electrical conductivity and the stability after electrical connection are greatly improved, the application range of the electrode lead is expanded, and even the conductive material with larger contact resistance after the original screen printing conductive paste can be continuously used.
Drawings
FIG. 1 is a schematic structural diagram of a substrate, a working electrode and a protective layer;
FIG. 2 is a schematic illustration of the protective layer of FIG. 1 after screen printing of a plurality of silver paste segments thereon;
FIG. 3 is a schematic view of the protective layer of FIG. 1 after forming a plurality of breaking points and then screen printing silver paste blocks;
FIG. 4 is a schematic view after a lap joint groove is formed on a working electrode on a substrate;
FIG. 5 is a schematic view of the conductive paste filled in the lap joint groove of FIG. 4;
FIG. 6 is a schematic illustration of the formation of transparent conductive electrodes after the electrode leads have been routed on the basis of FIG. 5;
fig. 7 is a schematic structural view of a light adjusting film according to a preferred embodiment of the invention;
fig. 8 is a schematic structural diagram of a touch screen according to a preferred embodiment of the invention.
100-transparent conductive electrode, 1-substrate, 2-working electrode, 21-lap joint groove, 3-protective layer, 31-conductive channel, 4-electric connector, 5-electrode lead, 6-silver paste block, 7-damage point, 8-PDL film, 9-glue layer; 200-a light adjusting film, 300-a touch screen.
Detailed Description
The present application will now be described in detail with reference to specific embodiments thereof as illustrated in the accompanying drawings. These embodiments are not intended to limit the present application, and structural, methodological, or functional changes made by those skilled in the art according to these embodiments are included in the scope of the present application.
In the various illustrations of the present application, certain dimensions of structures or portions may be exaggerated relative to other structures or portions for ease of illustration and, thus, are provided to illustrate only the basic structure of the subject matter of the present application.
Referring to fig. 1 and fig. 4 to 6, the transparent conductive electrode 100 of the present invention includes a substrate 1, and electrode leads 5 of a working electrode 2 located on the substrate 1, wherein the electrode leads 5 are connected to the working electrode in a one-to-one correspondence manner.
The substrate 1 may be a base material in a manufacturing process, or may be a part of a product to which the transparent conductive electrode 100 is applied. Taking a substrate applied in a manufacturing process as an example, the substrate 1 includes, but is not limited to, glass, a plastic plate, and a transparent film, and the transparent film includes, but is not limited to, a PET film, and the like.
In addition, the substrate 1 includes a visible region and a routing region located around the visible region for arranging the electrode leads 5. The visible region can also be understood as a working region, for example, when the transparent conductive electrode 100 is applied to a touch screen, the visible region is a touch region; for example, when the transparent conductive electrode 100 is applied to a light modulation film, the visible region is a light modulation display region.
The thickness of the working electrode 2 is generally 30 nm-100 nm, the working electrode 2 is a patterned conductive structure formed by a nano metal wire, a nano metal rod or a nano metal film, and different working electrodes 2 are insulated, and the insulation can be realized by arranging the insulating structures at intervals or in the middle. It will be appreciated by those skilled in the art that the working electrode 2 generally covers the viewing area and that the end of the working electrode 2 is located at the routing area to facilitate electrical connection with the electrode lead 5.
The nano metal wire or the nano metal rod can be coated on the surface of the substrate 1 in a solution form to form a continuous conductive film layer, and preferably, the nano metal wire is a nano silver wire with the diameter of 5 nm-100 nm and the length of 15 μm-25 μm, has high conductivity and high transparency. Alternatively, the working electrode 2 may be a nano metal film formed by magnetron sputtering, vacuum deposition, or the like, and may have reliable conductivity.
The working electrode 2 located in the wiring area is provided with a lap joint groove 21 exposing the cross section of the working electrode 2, the cross section forms at least part of the groove wall of the lap joint groove 21, and the lap joint groove 21 is opened back to the substrate 1.
The cross section extends from the side of the working electrode 2 departing from the substrate 1 to the side of the substrate 1, and the projection of the cross section on the surface perpendicular to the working electrode 2 is a straight line, an arc line or other irregular lines as long as the nano metal wire, the nano metal rod or the nano metal film can be exposed or protruded from the cross section into the overlapping groove 21.
Further, the depth of the overlapping groove 21 is not less than two thirds of the thickness of the working electrode to form an effective conductive surface; preferably, the overlapping groove 21 penetrates the working electrode in the thickness direction, has a large cross-sectional area, and can be electrically connected with the electrode lead 5 effectively and stably.
In addition, the overlapping groove 21 may be a single groove, or the overlapping groove 21 may include several independent sub-grooves.
The bridging groove 21 is located at the middle position of the working electrode 2, is an internal groove, and is generally a closed figure, such as a circle, when viewed from the top of the transparent conductive electrode 100; or the overlapping groove 21 is opened at the edge of the working electrode 2, and is an edge groove, and is generally in an open pattern, such as a semicircular arc, when viewed from the top of the transparent conductive electrode 100. Filling conductive paste into the overlapping groove 21 and solidifying the conductive paste to form an electric connecting piece 4, wherein the electric connecting piece 4 is directly contacted with the section of the working electrode 2 exposed in the overlapping groove 21 and is electrically connected with the section of the working electrode 2 so as to lead out an electric signal of the section of the working electrode 2; the former surface electrical connection mode is changed, the electrical conductivity and the stability after the electrical connection are greatly improved, the application range of the electrode lead 5 is expanded, and even the existing conductive material with large contact resistance after the screen printing conductive paste is used continuously.
The electric conduction mechanism of the electric connection piece 4 and the section comprises: part of the end parts of the nano metal wires or the nano metal rods extend out of the cross section into the lapping grooves 21 and are electrically connected with the electric connecting pieces 4; or after the overlapping groove 21 is formed, a conductive film layer made of metal nano materials including a nano metal wire or a nano metal rod and the like or the nano metal film is turned outwards at the overlapping groove 21 to form a micron-sized conductive surface which is electrically connected with the electric connecting piece 4; or after the conductive paste is filled into the lapping groove 21, the cross section has better side invasion, so that the electric connector 4 is electrically connected with the working electrode 2.
The conductive paste includes, but is not limited to, conductive carbon paste, conductive silver paste, and when the nano metal wire is a nano silver wire, the conductive silver paste is preferably used, and the contact resistance is low.
The electrode leads 5 are located in the wiring area, the electrode leads 5 are electrically connected with the corresponding working electrodes 2 through the electric connecting pieces 4, and each electrode lead 5 corresponds to one working electrode 2.
In a specific embodiment, the electrode lead 5 is an enameled wire, the enameled wire includes a metal wire and an insulating layer coated outside the metal wire, and the metal wire can be insulated without an additional insulating glue layer, so as to form an enameled wire group with a small wire pitch, and even the enameled wires can be directly overlapped together, that is, the pitch between the enameled wires can be reduced to 0, so that the width of the wire running area can be reduced. In the invention, the enameled wire comprises a lapping part exposed outwards from the metal wire, and the lapping part is electrically connected with the working electrode 2 through the electric connecting piece 4.
In another specific embodiment, the electrode lead 5 is an electrode wire formed by curing conductive paste such as silver paste printed by screen printing or inkjet printing; alternatively, the electrode lead 5 is an electrode wire formed by coating a conductive film with a conductive paste such as silver paste and etching the conductive film. And, this method reduces the requirement for silver paste, even if the contact resistance of the formed electrode lead 5 is more than 100 ohm per square millimeter can be used.
Further, the transparent conductive electrode 100 further includes a separation layer on the substrate 1, and the working electrode 2 is located on a side of the separation layer facing away from the substrate 1, so that the working electrode 2 can be peeled off from the substrate 1 and transferred to a desired device.
Preferably, the transparent conductive electrode 100 further includes a separation layer on the substrate 1, and a resin layer on one side of the separation layer away from the substrate 1, the working electrode 2 is located on one side of the resin layer away from the separation layer, and the resin layer is in direct contact with the separation layer, so as to avoid damaging the nano metal wire, or the nano metal rod, or the nano metal film in the working electrode 2 during the separation process.
The invention also provides a preparation method of the transparent conductive electrode, which comprises the following steps:
s1, forming a working electrode 2, wherein the working electrode 2 is a conductive structure composed of a nano metal wire, a nano metal rod or a nano metal film;
s2, forming a cross section of the working electrode 2 with a lap joint groove 21 on the structure of the working electrode 2 in the wiring area, wherein the depth of the lap joint groove 21 is not less than two thirds of the thickness of the working electrode, or the lap joint groove 21 penetrates the working electrode 2 in the thickness direction;
s3, filling conductive paste into the lapping groove 21, and solidifying the conductive paste to form an electric connector 4;
s4, electrode leads 5 are arranged, and the electrode leads 5 are electrically connected with the corresponding working electrodes 2 through the electric connectors 4.
Wherein, S1-S4 are for descriptive convenience only and do not represent a sequence of steps; according to the different specific processes, the sequence relationship between steps S1 and S2 is: the bridging groove 21 may be formed simultaneously with the formation of the working electrode 2, or the conductive path 31 may be formed after the formation of the working electrode 2; the sequence relationship between step S3 and step S4 is: the electrode lead 5 may be laid first, and the conductive paste may be filled, or the conductive paste may be filled first, and then the electrode lead 5 may be laid.
Moreover, in the method, the process and the sequence of the steps are mainly described, and the positions, the shapes, the structures, and the like of the substrate 1, the working electrode 2, the bonding groove 21, the electric connecting member 4, and the electrode lead 5 are the same as those described in the transparent conductive electrode 100, and are not described in detail.
Specifically, step S1 includes: s11, coating a layer of conducting film on the substrate 1 by adopting nanometer materials such as nanometer metal wires or nanometer metal rods, wherein the coating process comprises but is not limited to the adoption of high-precision slit extrusion coating equipment; s12 etching the conductive film to form a patterned electrode, wherein the etching process includes, but is not limited to, laser thin film etching, gas etching, discharge etching, chemical etching, physical etching, and mechanical etching.
Depending on the specific process, when the etching process of step S12 is the same as that of step S2 of forming the bonding groove 21, the etching process and the bonding groove may be performed simultaneously; of course, the two steps can be carried out, and the sequence can be interchanged.
Or step S1 includes: the patterned working electrode 2 of the nanometal wire or the nanometal rod is screen printed or sprayed directly on the substrate 1 according to a predetermined pattern.
The nano-metal wire or rod material used in step S1 is usually a solution.
In a preferred embodiment, the nano metal wire is a nano silver wire with the diameter of 5 nm-100 nm and the length of 15 μm-25 μm, and the thickness of wet films coated by various processes is 2 μm-10 μm so as to ensure continuous and stable conductivity.
Alternatively, in step S1, a patterned nano metal film may be directly formed by a mask by magnetron sputtering or vacuum evaporation to form the working electrode 2; or a nano metal film is firstly formed on the substrate 2 by adopting a magnetron sputtering or vacuum evaporation mode, and then the patterned working electrode 2 is formed by etching.
Further, the inventor finds in research that the working electrode 2 is in the nanometer level, an inappropriate grooving process can cause the non-conducting cross section, and after many thought and improvements, the temperature in the process of forming the overlapping groove 21 is not higher than 300 ℃, and/or the temperature in the process of forming the conductive channel 31 is not higher than 300 ℃, so as to avoid the phenomenon that the cross section of the working electrode 2 is not conducting due to the heat effect. Preferably, the temperature is not higher than 180 ℃, so that the nano metal wire, the nano metal rod or the nano metal film can not break, and the conductive stability is ensured.
The method for forming the conductive channel 31 and/or the overlap groove 21 comprises mechanical damage, ultrasonic wave, laser etching, plasma ablation, shock wave, hole preparation and chemical etching, wherein the mechanical damage comprises scratching, scraping, drilling, cutting, grinding and vibration, and the laser etching process is preferably femtosecond laser to ensure the conductivity of the section.
In step S4, the method for laying the electrode lead 5 may be any one of the prior art, or a new electrode lead 5 laying process may be designed.
For example, an enameled wire including a lap portion where a metal wire is exposed to the outside may be used as the electrode lead 5, and the laying process is to lay the enameled wire in the routing region and electrically connect the lap portion with the electrical connection member 4.
The electrode lead 5 can also be made of conductive paste such as silver paste, the requirement on the conductivity of the conductive paste is greatly reduced, and the arrangement method comprises but is not limited to the following steps: and screen printing or ink-jet printing conductive paste on the wiring area and curing to form the electrode lead 5. Or, coating conductive slurry on the wiring area to form a conductive film layer, and then etching to form the electrode lead 5.
Further, the preparation method of the transparent conductive electrode further comprises the following steps: first, a separation layer is sequentially formed on the substrate 1, and then the working electrode 2 is formed on the separation layer, so that the working electrode 2 can be peeled off on the substrate 1 and transferred to a desired device.
Preferably, the method for preparing the transparent conductive electrode further comprises: a resin layer is formed on the separation layer, and then the working electrode 2 is formed on the resin layer. The resin layer is in direct contact with the separation layer, so that the nano metal wire or the nano metal rod in the working electrode 2 is prevented from being damaged in the separation process.
The transparent conductive electrode 100 and the method for manufacturing the same according to the present invention will be described below by way of detailed examples.
Comparative example 1
Coating a coating liquid containing a nano silver wire on the surface of a transparent PET film by using high-precision slit extrusion coating equipment, wherein the diameter of the nano silver wire in the coating liquid is about 5-100 nm, the length is 15-25 mu m, and the solid content is 0.5%; the thickness of the coated wet film is 2 mu m-10 mu m, a metal grid layer containing nano silver wires is formed, the sheet resistance is 50ohm/sq after drying, and the visible light transmittance is not lower than 85%.
The protective layer 3 was prepared by coating a transparent UV curable resin solution using a high precision slit extrusion coating apparatus at a coating thickness of 1um, at which time the resistance could not be measured with a four probe sheet resistance meter, which was measured with an eddy current sheet resistance meter at 50 ohm/sq.
And (3) screen-printing conductive silver paste on the protective layer 3 to form silver paste blocks 6 with the thickness of about 5 micrometers-10 micrometers and the size of 2mm x 2mm, wherein the interval between each edge of each silver paste block 6 and the adjacent silver paste block 6 is 5mm, after drying and curing, measuring the resistance between each silver paste block 6, and displaying that the circuit is broken and each silver paste block 6 is not conductive.
Example 1, the difference from comparative example 1 is that:
after the protective layer 3 is formed, in a set silk-screen silver paste area, a tungsten needle is used for impacting and destroying the protective layer 3 and the metal mesh layer to form a plurality of breaking points 7 with the depth of about 1 μm to 50 μm and the diameter of 0.2mm, the plurality of breaking points 7 are uniformly distributed in the overlapping area, as shown in fig. 4, 10 breaking points 7 are formed in the embodiment, each breaking point 7 forms one sub-channel and one sub-groove on the protective layer 3, and according to the depth of the breaking point 7, the sub-groove destroys a part of the metal mesh layer close to the protective layer 3, or the sub-groove penetrates through the metal mesh layer.
And (3) printing conductive silver paste on the screen in the set screen printing silver paste area to form silver paste blocks 6 with the thickness of 5 mu m-10 um and the size of 1mm x 1mm, wherein the intervals between each edge of each silver paste block 6 and the adjacent silver paste block 6 are 2mm, and the silver paste is filled in the sub-channel and the sub-groove due to the adhesion and the fluidity of the silver paste.
After drying and curing, the resistance between the silver paste blocks 6 is measured, and the measured value is less than 50 ohms, which indicates that the silver paste blocks 6 are conducted with the metal grid layer formed by the nano silver wires.
Comparing comparative example 1 with example 1, it can be seen that, when the bridging groove 21 is formed on the nano silver wire conductive film, the cross section has conductive performance, and the silver paste flowing into the bridging groove 21 and the cross section of the metal mesh layer can be effectively electrically connected.
Referring to fig. 7, a light modulation film according to a preferred embodiment of the present invention includes two transparent conductive electrodes, a PDLC film 8 disposed between the two transparent conductive electrodes; at least one of the two layers of transparent conductive electrodes adopts any one of the transparent conductive electrodes. The PDLC film 8 may refer to the prior art, and the PDLC film 8 corresponds to the dimming area of the substrate, and exposes the wiring area, preferably, the wiring areas of the two layers of transparent conductive electrodes are located on different sides of the PDLC film 8, preferably, on two opposite sides, so as to facilitate the arrangement of electrode leads and the connection with a power supply.
Referring to fig. 8, the present invention further provides a touch screen 300, including a first touch electrode and a second touch electrode attached to each other by an adhesive layer 9, where at least one of the first touch electrode and the second touch electrode is any one of the transparent conductive electrodes 100, and other structures and manufacturing methods thereof refer to the prior art and are not repeated.
In summary, in the transparent conductive electrode 100 of the present invention, the cross section of the working electrode 2 is exposed outside by forming the overlapping groove 21 on the conductive electrode 2, and the cross section is electrically connected to the electrode lead 5 through the electrical connector 4, so that the conventional surface electrical connection manner is changed, the conductivity and stability of the electrical connection are improved, the application range of the electrode lead 5 is expanded, and even though the conductive material with larger contact resistance is used after the original screen printing of the conductive paste, the conductive material can be used continuously.
It should be understood that although the present description refers to embodiments, not every embodiment contains only a single technical solution, and such description is for clarity only, and those skilled in the art should make the description as a whole, and the technical solutions in the embodiments can also be combined appropriately to form other embodiments understood by those skilled in the art.
The above-listed detailed description is only a specific description of a possible embodiment of the present invention and is not intended to limit the scope of the present invention, and equivalent embodiments or modifications made without departing from the technical spirit of the present invention are included in the scope of the present invention.
Claims (13)
1. A transparent conductive electrode, comprising:
the working electrode is composed of a nano metal wire, a nano metal rod or a nano metal film, a lapping groove exposing the section of the working electrode is arranged on the structure of the working electrode in the wiring area, the depth of the lapping groove is not less than two thirds of the thickness of the working electrode, or the lapping groove penetrates through the working electrode along the thickness direction;
the electric connecting piece is positioned at the overlapping groove and is made of solidified conductive slurry;
and the electrode lead is electrically connected with the corresponding working electrode through the electric connector.
2. The transparent conductive electrode according to claim 1, wherein the nano metal wire is a nano silver wire having a diameter of 5nm to 100nm and a length of 15 μm to 25 μm.
3. The transparent conductive electrode according to claim 1, wherein the overlapping groove is one groove, or the overlapping groove comprises several independent subslots.
4. The transparent conductive electrode according to claim 1, wherein the electrode lead is an enameled wire including a bonding portion where the metal wire is exposed outward, the bonding portion being electrically connected to the working electrode;
or, the electrode lead is an electrode wire formed by screen printing or ink-jet printing of conductive paste solidification;
or the electrode lead is an electrode wire formed by coating conductive paste such as silver paste into a conductive film and then etching the conductive film.
5. The transparent conductive electrode of claim 1, further comprising a transparent substrate, the substrate comprising a viewing area, a routing area located around the viewing area, the working electrode located on the substrate;
or, the transparent conductive electrode further comprises a substrate and a separation layer positioned on the substrate, and the working electrode is positioned on one side of the separation layer, which is far away from the substrate;
or, the transparent conductive electrode further comprises a substrate, a separation layer positioned on the substrate, and a resin layer positioned on one side of the separation layer, which deviates from the substrate, and the working electrode is positioned on one side of the resin layer, which deviates from the separation layer.
6. A preparation method of a transparent conductive electrode is characterized by comprising the following steps:
s1, forming a working electrode, wherein the working electrode is composed of a nano metal wire, a nano metal rod or a nano metal film;
s2, a cross section of a lapping groove exposing the working electrode is formed on the structure of the working electrode in the wiring area, the depth of the lapping groove is not less than two thirds of the thickness of the working electrode, or the lapping groove penetrates through the working electrode along the thickness direction;
s3, filling conductive paste into the lap joint groove, and solidifying the conductive paste to form an electric connector;
and S4, arranging electrode leads which are electrically connected with the corresponding working electrodes through the electric connectors.
7. The method for producing a transparent conductive electrode according to claim 6,
the nano metal wire is a nano silver wire with the diameter of 5 nm-100 nm and the length of 15 mu m-25 mu m.
8. The method of claim 6, wherein the temperature during the formation of the overlapping groove is not higher than 300 ℃.
9. The method for preparing the transparent conductive electrode according to claim 8, wherein the method for forming the overlapping groove comprises mechanical damage, ultrasonic wave, plasma ablation, shock wave, hole preparation, chemical etching, wherein the mechanical damage comprises scratching, tearing, scraping, drilling, cutting, grinding, and vibrating.
10. The method for preparing a transparent conductive electrode according to claim 6, wherein the electrode lead is an enameled wire including a lap portion where a metal wire is exposed to the outside, the lap portion being electrically connected to the electrical connection member;
or the electrode lead is formed by solidifying the conductive paste and is electrically connected with the electric connecting piece.
11. The method of preparing a transparent conductive electrode according to claim 6, wherein the working electrode is formed on a substrate;
or, sequentially forming a separation layer on a substrate, and then forming the working electrode on the separation layer;
alternatively, a separation layer and a resin layer are formed in this order on a substrate, and then the working electrode is formed on the resin layer.
12. A light modulation film comprises two layers of transparent conductive electrodes and a PDLC film positioned between the two layers of transparent conductive electrodes; wherein at least one of the two layers of transparent conductive electrodes is the transparent conductive electrode according to any one of claims 1 to 5.
13. A touch screen comprises a first touch electrode and a second touch electrode, wherein at least one of the first touch electrode and the second touch electrode is the transparent conductive electrode of any one of claims 1 to 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010556042.9A CN111584131A (en) | 2020-06-17 | 2020-06-17 | Transparent conductive electrode, preparation method thereof, light modulation film and touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010556042.9A CN111584131A (en) | 2020-06-17 | 2020-06-17 | Transparent conductive electrode, preparation method thereof, light modulation film and touch screen |
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