CN111542906B - X射线源以及用于产生x射线辐射的方法 - Google Patents

X射线源以及用于产生x射线辐射的方法 Download PDF

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Publication number
CN111542906B
CN111542906B CN201880077013.5A CN201880077013A CN111542906B CN 111542906 B CN111542906 B CN 111542906B CN 201880077013 A CN201880077013 A CN 201880077013A CN 111542906 B CN111542906 B CN 111542906B
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liquid target
electron beam
ray source
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axis
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CN111542906A (zh
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比约恩·汉森
波尔·塔克曼
王育立
田中志穂
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Excillum AB
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Excillum AB
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/153—Spot position control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
CN201880077013.5A 2017-12-01 2018-11-30 X射线源以及用于产生x射线辐射的方法 Active CN111542906B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202310689884.5A CN116504601A (zh) 2017-12-01 2018-11-30 X射线源以及用于产生x射线辐射的方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17204949.6 2017-12-01
EP17204949.6A EP3493239A1 (en) 2017-12-01 2017-12-01 X-ray source and method for generating x-ray radiation
PCT/EP2018/083138 WO2019106145A1 (en) 2017-12-01 2018-11-30 X-ray source and method for generating x-ray radiation

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CN202310689884.5A Division CN116504601A (zh) 2017-12-01 2018-11-30 X射线源以及用于产生x射线辐射的方法

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CN111542906A CN111542906A (zh) 2020-08-14
CN111542906B true CN111542906B (zh) 2023-06-30

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CN202310689884.5A Pending CN116504601A (zh) 2017-12-01 2018-11-30 X射线源以及用于产生x射线辐射的方法

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US (2) US11342154B2 (cg-RX-API-DMAC7.html)
EP (2) EP3493239A1 (cg-RX-API-DMAC7.html)
JP (2) JP7195648B2 (cg-RX-API-DMAC7.html)
KR (2) KR102714936B1 (cg-RX-API-DMAC7.html)
CN (2) CN111542906B (cg-RX-API-DMAC7.html)
AU (1) AU2018374514B2 (cg-RX-API-DMAC7.html)
TW (1) TWI687959B (cg-RX-API-DMAC7.html)
WO (1) WO2019106145A1 (cg-RX-API-DMAC7.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3493239A1 (en) 2017-12-01 2019-06-05 Excillum AB X-ray source and method for generating x-ray radiation
EP3579664A1 (en) * 2018-06-08 2019-12-11 Excillum AB Method for controlling an x-ray source
EP3648135A1 (en) * 2018-11-05 2020-05-06 Excillum AB Mechanical alignment of x-ray sources
EP4123680A1 (en) * 2020-04-03 2023-01-25 Hamamatsu Photonics K.K. X-ray generation device
EP4075474A1 (en) 2021-04-15 2022-10-19 Excillum AB Liquid jet target x-ray source
CN118974869A (zh) * 2022-03-31 2024-11-15 佳能安内华股份有限公司 X射线产生装置、x射线成像装置以及x射线产生装置的调整方法
CN114945237B (zh) * 2022-04-25 2025-12-05 上海科技大学 桌面型飞秒硬x射线脉冲源装置及脉冲产生方法
SE2351080A1 (en) * 2023-09-18 2025-03-19 Northvolt Ab A battery cell imaging apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6324255B1 (en) * 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
CN103019038A (zh) * 2011-09-23 2013-04-03 Asml荷兰有限公司 辐射源
CN103250226A (zh) * 2010-12-22 2013-08-14 伊克斯拉姆公司 校直和聚焦x射线源内的电子束
CN103854940A (zh) * 2012-12-06 2014-06-11 布鲁克Axs有限公司 具有可偏转电子束的x射线设备

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4608543A (en) 1984-12-17 1986-08-26 Advanced Micro Devices, Inc. Controllable effective resistance and phase lock loop with controllable filter
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
JPH05258692A (ja) 1992-03-10 1993-10-08 Nikon Corp Ｘ線発生方法およびｘ線発生装置
GB9906886D0 (en) * 1999-03-26 1999-05-19 Bede Scient Instr Ltd Method and apparatus for prolonging the life of an X-ray target
EP1155419B1 (en) * 1999-12-20 2007-02-14 Koninklijke Philips Electronics N.V. "x-ray microscope having an x-ray source for soft x-rays
EP1305984B1 (en) * 2000-07-28 2010-11-24 Jettec AB Method and apparatus for generating x-ray radiation
EP1573774A2 (en) * 2002-12-11 2005-09-14 Koninklijke Philips Electronics N.V. X-ray source for generating monochromatic x-rays
DE10326279A1 (de) * 2003-06-11 2005-01-05 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial
DE102004013620B4 (de) * 2004-03-19 2008-12-04 GE Homeland Protection, Inc., Newark Elektronenfenster für eine Flüssigmetallanode, Flüssigmetallanode, Röntgenstrahler und Verfahren zum Betrieb eines solchen Röntgenstrahlers
US7208746B2 (en) * 2004-07-14 2007-04-24 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
US8213576B2 (en) * 2007-08-09 2012-07-03 Shimadzu Corporation X-ray tube apparatus
DE102008026938A1 (de) * 2008-06-05 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strahlungsquelle und Verfahren zum Erzeugen von Röntgenstrahlung
WO2010083854A1 (en) * 2009-01-26 2010-07-29 Excillum Ab X-ray window
EP2415065A1 (en) * 2009-04-03 2012-02-08 Excillum AB Supply of a liquid-metal target in x-ray generation
HUP1000635A2 (en) * 2010-11-26 2012-05-29 Ge Hungary Kft Liquid anode x-ray source
WO2013020130A1 (en) 2011-08-04 2013-02-07 John Lewellen Bremstrahlung target for intensity modulated x-ray radiation therapy and stereotactic x-ray therapy
EP2862182B1 (en) * 2012-06-14 2018-01-31 Excillum AB Limiting migration of target material
JP5976208B2 (ja) * 2012-06-15 2016-08-23 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Ｘ線源、ｘ線源の使用およびｘ線を発生させる方法
CN103543298B (zh) 2012-07-13 2016-03-23 旺矽科技股份有限公司 探针固持结构及其光学检测装置
US20140219424A1 (en) * 2013-02-04 2014-08-07 Moxtek, Inc. Electron Beam Focusing and Centering
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
EP3493239A1 (en) 2017-12-01 2019-06-05 Excillum AB X-ray source and method for generating x-ray radiation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6324255B1 (en) * 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
CN103250226A (zh) * 2010-12-22 2013-08-14 伊克斯拉姆公司 校直和聚焦x射线源内的电子束
CN103019038A (zh) * 2011-09-23 2013-04-03 Asml荷兰有限公司 辐射源
CN103854940A (zh) * 2012-12-06 2014-06-11 布鲁克Axs有限公司 具有可偏转电子束的x射线设备

Also Published As

Publication number Publication date
AU2018374514B2 (en) 2021-11-11
JP2023027189A (ja) 2023-03-01
JP7195648B2 (ja) 2022-12-26
CN111542906A (zh) 2020-08-14
WO2019106145A1 (en) 2019-06-06
JP7488600B2 (ja) 2024-05-22
KR102714936B1 (ko) 2024-10-07
US11342154B2 (en) 2022-05-24
KR20240150529A (ko) 2024-10-15
EP3718127B1 (en) 2023-12-20
US20220254595A1 (en) 2022-08-11
TWI687959B (zh) 2020-03-11
JP2021504906A (ja) 2021-02-15
US20210027974A1 (en) 2021-01-28
KR102997859B1 (ko) 2026-07-29
EP3493239A1 (en) 2019-06-05
US11963286B2 (en) 2024-04-16
CN116504601A (zh) 2023-07-28
AU2018374514A1 (en) 2020-07-16
TW201926396A (zh) 2019-07-01
KR20200090885A (ko) 2020-07-29
EP3718127A1 (en) 2020-10-07

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